TWI843196B - Rotary transfer vertical coating equipment and double-sided multi-layer coating method - Google Patents

Abstract

Translated fromChinese

一種旋轉移載式立式鍍膜設備，包含複數真空製程腔、一第一旋轉腔，及一第二旋轉腔。該等真空製程腔分別設置於一第一軸線及一第二軸線上，且能容置及輸送該待鍍物。該第一旋轉腔設置於該第一軸線上，並連接其中一真空製程腔且可驅動該待鍍物旋轉，並可供該待鍍物移入及移出，該第二旋轉腔設置於該第二軸線上，並連接其中另一真空製程腔且可驅動該待鍍物旋轉，並可供該待鍍物移入及移出。藉此可減少設置腔的數量而減少佔用空間且易於利用空間，並達到雙面鍍膜的功效。A rotary transfer vertical coating equipment includes a plurality of vacuum process chambers, a first rotary chamber, and a second rotary chamber. The vacuum process chambers are respectively arranged on a first axis and a second axis, and can accommodate and transport the object to be coated. The first rotary chamber is arranged on the first axis, and is connected to one of the vacuum process chambers and can drive the object to be coated to rotate, and can allow the object to be coated to be moved in and out. The second rotary chamber is arranged on the second axis, and is connected to another vacuum process chamber and can drive the object to be coated to rotate, and can allow the object to be coated to be moved in and out. In this way, the number of chambers to be arranged can be reduced, the space occupied can be reduced, the space can be easily utilized, and the effect of double-sided coating can be achieved.

Description

Translated fromChinese

旋轉移載式立式鍍膜設備及雙面多層膜的鍍膜方法Rotary transfer vertical coating equipment and double-sided multi-layer coating method

本發明是有關於一種鍍膜設備，特別是指一種旋轉移載式立式鍍膜設備及雙面多層膜的鍍膜方法。The present invention relates to a coating device, in particular to a rotary transfer vertical coating device and a double-sided multi-layer coating method.

參閱圖1、圖2，該鍍膜設備適用於對一待鍍物(圖未示)進行兩種不同鍍膜材質的雙面鍍膜，並包括相反設置的一入料腔11及一出料腔12、一真空除氣腔13、二真空清潔腔14、四真空鍍膜腔15、一回流通道16、複數在設備中循環移動的承載裝置17、四個分別設置於該等真空鍍膜腔15用來供鍍膜使用的靶材18，及二設置於該等真空清潔腔14且分別可對該待鍍物其中一面進行清潔的清潔模組19。該真空除氣腔13、該等真空清潔腔14、該等真空鍍膜腔15依序設置於該入料腔11與該出料腔12間，該回流通道16連接於該入料腔11及該出料腔12間並位於上方。Referring to Figures 1 and 2, the coating equipment is suitable for double-sided coating of two different coating materials on an object to be coated (not shown), and includes aninlet chamber 11 and anoutlet chamber 12 arranged opposite to each other, avacuum degassing chamber 13, twovacuum cleaning chambers 14, fourvacuum coating chambers 15, areflux channel 16, a plurality ofcarriers 17 circulating in the equipment, fourtargets 18 respectively arranged in thevacuum coating chambers 15 for use in coating, and twocleaning modules 19 arranged in thevacuum cleaning chambers 14 and capable of cleaning one side of the object to be coated. Thevacuum degassing chamber 13, thevacuum cleaning chambers 14, and thevacuum coating chambers 15 are sequentially arranged between thefeed chamber 11 and thedischarge chamber 12, and thereflux channel 16 is connected between thefeed chamber 11 and thedischarge chamber 12 and is located above.

運作時，每一承載裝置17移動到該入料腔11後，將該待鍍物設置於該承載裝置17上，該承載裝置17再依序經過該真空除氣腔13、該等真空清潔腔14，及於不同的該等真空鍍膜腔15以該等靶材18對該待鍍物的相反兩面進行鍍膜，最後，該承載裝置17移動到該出料腔12後，卸下該待鍍物以完成雙面鍍膜的製程，該承載裝置17再經由該回流通道16回到該入料腔11，以便進行下一次鍍膜製程。During operation, after eachcarrier 17 moves to thefeed chamber 11, the object to be plated is placed on thecarrier 17, and thecarrier 17 then passes through thevacuum degassing chamber 13, thevacuum cleaning chambers 14, and the differentvacuum coating chambers 15 in sequence to coat the opposite sides of the object to be plated with thetargets 18. Finally, after thecarrier 17 moves to thedischarge chamber 12, the object to be plated is unloaded to complete the double-sided coating process, and thecarrier 17 returns to thefeed chamber 11 through thereflux channel 16 for the next coating process.

然而，由於該等真空清潔腔14只能朝單一方向進行處理，因此必須設置兩個真空清潔腔14，並朝相反的兩個方向對該待鍍物的相反兩面進行清潔。當要進行兩種不同鍍膜材質的雙面鍍膜時，由於鍍膜的方向決定了該等靶材18的設置位置，因而需要配置四個真空鍍膜腔15而形成一狹長條形的格局，進而導致設備的佔用面積較大，及產生狹長型設備的周邊剩餘空間難以利用的問題。而真空腔的數量增加，也導致需消耗更多的能源以維持真空腔內的真空度。However, since thevacuum cleaning chambers 14 can only be processed in a single direction, twovacuum cleaning chambers 14 must be set up to clean the opposite sides of the object to be plated in opposite directions. When double-sided coating of two different coating materials is to be performed, since the coating direction determines the location of thetarget materials 18, fourvacuum coating chambers 15 need to be configured to form a narrow strip pattern, which results in a larger equipment area and the problem of difficulty in utilizing the remaining space around the narrow equipment. The increase in the number of vacuum chambers also results in more energy consumption to maintain the vacuum degree in the vacuum chamber.

此外，由於該回流通道16的長度較長，該等承載裝置17經由該回流通道16回到該入料腔11所需的時間較長，因此需額外準備更多的承載裝置17以利於不間斷的生產，導致其建構成本及後期維護成本較高。In addition, due to the long length of thereflux channel 16, the time required for the supportingdevices 17 to return to thefeeding chamber 11 through thereflux channel 16 is longer, so more supportingdevices 17 need to be prepared to facilitate uninterrupted production, resulting in higher construction costs and later maintenance costs.

因此，本發明之目的，即在提供一種可減少佔地面積、提高生產靈活度與生產效率、降低維護成本，及降低能源消耗的旋轉移載式立式鍍膜設備及雙面多層膜的鍍膜方法。Therefore, the purpose of the present invention is to provide a rotary transfer vertical coating equipment and a double-sided multi-layer coating method that can reduce the floor space occupied, improve production flexibility and production efficiency, reduce maintenance costs, and reduce energy consumption.

於是，本發明旋轉移載式立式鍍膜設備，適用以對至少一待鍍物進行鍍膜，該旋轉移載式立式鍍膜設備包含複數真空製程腔，及一旋轉裝置。Therefore, the rotary transfer type vertical coating equipment of the present invention is suitable for coating at least one object to be coated. The rotary transfer type vertical coating equipment includes a plurality of vacuum process chambers and a rotating device.

該等真空製程腔分別設置於該第一軸線及該第二軸線上，且能容置及沿該第一軸線及該第二軸線輸送該待鍍物，每一真空製程腔進行單向加工。The vacuum process chambers are respectively arranged on the first axis and the second axis, and can accommodate and transport the object to be plated along the first axis and the second axis. Each vacuum process chamber performs unidirectional processing.

該旋轉裝置，包括一第一旋轉腔及一第二旋轉腔。The rotating device includes a first rotating chamber and a second rotating chamber.

該第一旋轉腔設置於該第一軸線上，並包括一位於該第一軸線且連接其中一真空製程腔的後開口、一位於該第一軸線與該第二軸線之間的側開口，及一能容置且可驅動該待鍍物旋轉並具有一頭端及一尾端的旋轉模組，該旋轉模組能以該頭端朝向該後開口、以該尾端朝向該後開口，及以該頭端及該尾端的其中之一朝向該側開口，該待鍍物能自該旋轉模組的頭端或尾端移入及移出，並可往復進入該第一旋轉腔及與該第一旋轉腔連接的該真空製程腔，且可受該旋轉模組翻轉180度後返回同一個該真空製程腔，以使該待鍍物的相反兩面可受該真空製程腔加工。The first rotary chamber is arranged on the first axis and includes a rear opening on the first axis and connected to one of the vacuum process chambers, a side opening between the first axis and the second axis, and a rotary module that can accommodate and drive the object to be plated to rotate and has a head end and a tail end. The rotary module can face the rear opening with the head end, face the rear opening with the tail end, and face the side opening with one of the head end and the tail end. The object to be plated can move in and out from the head end or the tail end of the rotary module, and can reciprocate into the first rotary chamber and the vacuum process chamber connected to the first rotary chamber, and can be turned 180 degrees by the rotary module and return to the same vacuum process chamber, so that the opposite sides of the object to be plated can be processed by the vacuum process chamber.

該第二旋轉腔設置於該第二軸線上，並包括一位於該第二軸線且連接其中另一真空製程腔的後開口、一位於該第一軸線與該第二軸線之間且對應該第一旋轉腔的側開口，及一能容置且可驅動該待鍍物旋轉並具有一頭端及一尾端的旋轉模組，該旋轉模組能以該頭端朝向該後開口、以該尾端朝向該後開口，及以該頭端及該尾端的其中之一朝向該側開口，該待鍍物能自該旋轉模組的頭端或尾端移入及移出，並可往復進入該第二旋轉腔及與該第二旋轉腔連接的該真空製程腔，且可受該旋轉模組翻轉180度後返回同一個該真空製程腔，以使該待鍍物的相反兩面可受該真空製程腔加工。The second rotary chamber is arranged on the second axis and includes a rear opening on the second axis and connected to another vacuum process chamber, a side opening between the first axis and the second axis and corresponding to the first rotary chamber, and a rotary module that can accommodate and drive the object to be plated to rotate and has a head end and a tail end. The rotary module can face the rear opening with the head end, the rear opening with the tail end, and the side opening with one of the head end and the tail end. The object to be plated can move in and out from the head end or the tail end of the rotary module, and can reciprocate into the second rotary chamber and the vacuum process chamber connected to the second rotary chamber, and can be turned 180 degrees by the rotary module and return to the same vacuum process chamber, so that the opposite sides of the object to be plated can be processed by the vacuum process chamber.

於是，本發明雙面多層膜的鍍膜方法，適用於利用複數真空製程腔對一直立設置的待鍍物進行雙面鍍膜，該雙面多層膜的鍍膜方法包含下列步驟：(A)輸送該待鍍物至其中一真空製程腔，該其中一真空製程腔連接一旋轉腔並與該旋轉腔沿一軸線排列，該旋轉腔包括一後開口及一側開口，該後開口連接於該其中一真空製程腔，且該後開口與該側開口不同時位於該軸線上，(B)於該其中一真空製程腔內對該待鍍物的其中一個面進行除氣、清潔及濺鍍鍍膜的其中一種加工，(C)將該待鍍物自該其中一真空製程腔輸送至該旋轉腔，並於該旋轉腔將該待鍍物旋轉180度後，將該待鍍物自該旋轉腔輸送回該其中一真空製程腔，(D)於該其中一真空製程腔內對該待鍍物的其中另一面進行相同於步驟(B)的加工，(E)將該待鍍物自該其中一真空製程腔輸送至該旋轉腔，且於該旋轉腔內旋轉該待鍍物並朝向該側開口後，將該待鍍物自該側開口移出該旋轉腔，及(F)將該待鍍物移入其中另一真空製程腔。Therefore, the double-sided multi-layer film coating method of the present invention is suitable for double-sided coating of a vertically arranged object to be coated using a plurality of vacuum process chambers. The double-sided multi-layer film coating method includes the following steps: (A) transporting the object to be coated to one of the vacuum process chambers, wherein the one of the vacuum process chambers is connected to a rotating chamber and is arranged along an axis with the rotating chamber, wherein the rotating chamber includes a rear opening and a side opening, wherein the rear opening is connected to the one of the vacuum process chambers, and the rear opening and the side opening are not located on the axis at the same time; (B) degassing, cleaning and sputter coating are performed on one of the surfaces of the object to be coated in the one of the vacuum process chambers. (C) transporting the object to be plated from one of the vacuum process chambers to the rotary chamber, and after rotating the object to be plated 180 degrees in the rotary chamber, transporting the object to be plated from the rotary chamber back to one of the vacuum process chambers, (D) performing the same processing as step (B) on the other side of the object to be plated in one of the vacuum process chambers, (E) transporting the object to be plated from one of the vacuum process chambers to the rotary chamber, and after rotating the object to be plated in the rotary chamber and facing the side opening, moving the object to be plated out of the rotary chamber through the side opening, and (F) moving the object to be plated into another of the vacuum process chambers.

於是，本發明雙面多層膜的鍍膜方法，適用於利用複數真空製程腔對一直立設置的待鍍物進行雙面鍍膜，該雙面多層膜的鍍膜方法包含下列步驟：(A)輸送該待鍍物進入至該旋轉腔，該旋轉腔與其中一真空製程腔沿一軸線排列，該旋轉腔包括一後開口及一側開口，該後開口連接於該其中一真空製程腔，該側開口不位於該軸線上，該待鍍物自該側開口進入，(B)該旋轉腔旋轉該待鍍物，並使其自該後開口輸送至該其中一真空製程腔，並於該其中一真空製程腔內對該待鍍物的其中一個面進行除氣、清潔及濺鍍鍍膜的其中一種加工，(C)將該待鍍物自該其中一真空製程腔輸送至該旋轉腔，並於該旋轉腔將該待鍍物旋轉180度後，將該待鍍物自該旋轉腔輸送回該其中一真空製程腔，(D)於該其中一真空製程腔內對該待鍍物的其中另一面進行相同於步驟(B)的加工，(E)將該待鍍物移入其中另一真空製程腔。Therefore, the double-sided multi-layer film coating method of the present invention is suitable for double-sided coating of a vertically arranged object to be coated using a plurality of vacuum process chambers. The double-sided multi-layer film coating method includes the following steps: (A) transporting the object to be coated into the rotating chamber, the rotating chamber and one of the vacuum process chambers are arranged along an axis, the rotating chamber includes a rear opening and a side opening, the rear opening is connected to one of the vacuum process chambers, the side opening is not located on the axis, and the object to be coated enters from the side opening; (B) the rotating chamber rotates the object to be coated and transports it from the rear opening. To one of the vacuum process chambers, and perform one of the processes of degassing, cleaning and sputtering on one of the surfaces of the object to be plated in the vacuum process chamber, (C) transport the object to be plated from the vacuum process chamber to the rotating chamber, and after rotating the object to be plated 180 degrees in the rotating chamber, transport the object to be plated from the rotating chamber back to the vacuum process chamber, (D) perform the same process as step (B) on the other surface of the object to be plated in the vacuum process chamber, (E) move the object to be plated into another vacuum process chamber.

本發明之功效在於：藉由該等真空製程腔、該第一旋轉腔及該第二旋轉腔的設置，使得可用單一個僅能朝單方向進行加工的真空製程腔對該待鍍物的相反兩面進行加工，能提高生產靈活度與生產效率，亦能減少該真空製程腔的數量，進一步降低維持真空所需的能源消耗及維護成本，此外，藉由沿該第一軸線及該第二軸線排列，減少整體在該第一軸線上的長度，達到減少佔地面積且易於利用空間的功效。The effect of the present invention is that: by setting the vacuum process chambers, the first rotary chamber and the second rotary chamber, a single vacuum process chamber that can only process in one direction can be used to process the opposite sides of the object to be plated, which can improve production flexibility and production efficiency, and can also reduce the number of vacuum process chambers, further reducing the energy consumption and maintenance costs required to maintain vacuum. In addition, by arranging along the first axis and the second axis, the overall length on the first axis is reduced, thereby achieving the effect of reducing the floor space occupied and facilitating the use of space.

2:承載裝置2: Carrier device

21:載具21: Vehicles

3:真空製程腔3: Vacuum process chamber

31:裝載腔體31: Loading chamber

32:除氣腔體32: Degassing chamber

33:清潔腔體33: Clean the cavity

34:第一鍍膜腔體34: First coating chamber

35:第二鍍膜腔體35: Second coating chamber

36:緩衝腔體36: Buffer cavity

37:卸載腔體37: Unloading chamber

4:旋轉裝置4: Rotating device

41:第一旋轉腔41: First rotary chamber

411:後開口411: Rear opening

412:前開口412: Front opening

413:側開口413: Side opening

414:旋轉模組414: Rotation module

415:頭端415: Headend

416:尾端416: Tail end

417:外開口417: External opening

42:第二旋轉腔42: Second rotary chamber

421:後開口421: Rear opening

422:前開口422: Front opening

423:側開口423: Side opening

424:旋轉模組424: Rotation module

425:頭端425: Headend

426:尾端426: Tail end

427:外開口427: External opening

43:中繼腔43: Relay cavity

5:回流裝置5: Reflux device

81~86:步驟81~86: Steps

91~95:步驟91~95: Steps

9:待鍍物9: Objects to be plated

L1:第一軸線L1: First axis

L2:第二軸線L2: Second axis

L3:第三軸線L3: The third axis

L4:第四軸線L4: The fourth axis

本發明之其他的特徵及功效，將於參照圖式的實施方式中清楚地呈現，其中：圖1是一側視示意圖，說明一習知的鍍膜設備；圖2是該習知的鍍膜設備的一俯視示意圖；圖3是一立體圖，說明本發明旋轉移載式立式鍍膜設備的一個實施例的一承載裝置及一待鍍物；圖4是該實施例的一俯視圖；圖5是該實施例的另一俯視圖，說明二旋轉模組各自的頭端分別朝向二旋轉裝置的前開口；圖6是該實施例的另一俯視圖，說明該等頭端分別朝向該等旋轉裝置各自的側開口；圖7是一俯視圖，說明該實施例的該旋轉裝置的另一種配置；圖8是一俯視圖，說明本發明旋轉移載式立式鍍膜設備的一個第一變化例；圖9是一俯視圖，說明本發明旋轉移載式立式鍍膜設備的一個第二變化例；圖10是一俯視圖，說明本發明旋轉移載式立式鍍膜設備的一個第三變化例；圖11是一俯視圖，說明本發明旋轉移載式立式鍍膜設備的一個第四變化例；圖12是一俯視圖，說明本發明旋轉移載式立式鍍膜設備的一個第五變化例；圖13是一俯視圖，說明本發明旋轉移載式立式鍍膜設備的一個第六變化例；圖14是一流程圖，說明本發明雙面多層膜的鍍膜方法的一第一實施例；及圖15是一流程圖，說明本發明雙面多層膜的鍍膜方法的一第二實施例。Other features and effects of the present invention will be clearly presented in the implementation method with reference to the drawings, in which: FIG. 1 is a side view schematic diagram illustrating a known coating device; FIG. 2 is a top view schematic diagram of the known coating device; FIG. 3 is a three-dimensional diagram illustrating a carrier device and an object to be coated of an embodiment of the rotary transfer type vertical coating device of the present invention; FIG. 4 is a top view of the embodiment; FIG. 5 is another top view of the embodiment, illustrating that the head ends of the two rotating modules are respectively facing the front openings of the two rotating devices; FIG. 6 is another top view of the embodiment, illustrating that the head ends are respectively facing the side openings of the rotating devices; FIG. 7 is a top view illustrating another configuration of the rotating device of the embodiment; FIG. 8 is a top view illustrating the rotary transfer type of the present invention. FIG9 is a top view illustrating a second variation of the rotary transfer type vertical coating device of the present invention; FIG10 is a top view illustrating a third variation of the rotary transfer type vertical coating device of the present invention; FIG11 is a top view illustrating a fourth variation of the rotary transfer type vertical coating device of the present invention; FIG12 is a top view , illustrating a fifth variation of the rotary transfer vertical coating device of the present invention; FIG. 13 is a top view illustrating a sixth variation of the rotary transfer vertical coating device of the present invention; FIG. 14 is a flow chart illustrating a first embodiment of the double-sided multi-layer coating method of the present invention; and FIG. 15 is a flow chart illustrating a second embodiment of the double-sided multi-layer coating method of the present invention.

參閱圖3、圖4，本發明旋轉移載式立式鍍膜設備的實施例適用於複數直立設置的待鍍物9，該等待鍍物9可以是機殼、面板級扇出型封裝(FOPLP)、晶圓級扇出型封裝(FOWLP)、埋入式基板、無核心基板、玻璃基板、封裝基板、PCB基板、晶圓或晶圓級封裝等金屬及非金屬物。定義一第一軸線L1及一第二軸線L2。該旋轉移載式立式鍍膜設備包含一承載裝置2、複數真空製程腔3、一旋轉裝置4，及一回流裝置5。Referring to Figures 3 and 4, the embodiment of the rotary transfer type vertical coating equipment of the present invention is applicable to a plurality of vertically arranged objects to be coated 9, which can be metal and non-metal objects such as a housing, a panel-level fan-out package (FOPLP), a wafer-level fan-out package (FOWLP), an embedded substrate, a coreless substrate, a glass substrate, a package substrate, a PCB substrate, a wafer or a wafer-level package. A first axis L1 and a second axis L2 are defined. The rotary transfer type vertical coating equipment includes acarrier 2, a plurality ofvacuum process chambers 3, arotary device 4, and areflow device 5.

於本實施例中，該第一軸線L1與該第二軸線L2是平行。惟於其他實施態樣中，也能因廠房的空間配置而略成一角度，並不以此為限。In this embodiment, the first axis L1 and the second axis L2 are parallel.However, in other embodiments, they can also be slightly angled due to the spatial configuration of the factory, and are not limited to this.

該承載裝置2包括複數直立設置且適用以承載該等待鍍物9的載具21，於本實施例中，每一載具21呈矩形框狀，於其他實施態樣中，若該待鍍物9的結構強度較高(例如自身帶框的玻璃基板時)，亦能不設置該承載裝置2。應說明的是，固定於每一載具21的待鍍物9數量也可以是數個，並不以此為限。Thecarrier 2 includes a plurality ofcarriers 21 arranged upright and suitable for carrying theobject 9 to be plated. In this embodiment, eachcarrier 21 is in the shape of a rectangular frame. In other embodiments, if the structural strength of theobject 9 to be plated is relatively high (for example, a glass substrate with a frame), thecarrier 2 may not be provided. It should be noted that the number ofobjects 9 to be plated fixed to eachcarrier 21 may also be several, and is not limited to this.

為了利於後續的說明，以下將以一個載具21及一個待鍍物9為例，此時，該待鍍物9是固定於該載具21的中間部位，藉此保護該待鍍物9不於加工或運輸時受損，並給予該待鍍物9一定張力，使其抵抗因重力而產生之變形，藉此達到均勻的加工品質。該待鍍物9在該載具21的水平方向上開放以接受鍍膜製程中的各種處置。For the convenience of subsequent explanation, acarrier 21 and an object to be plated 9 are taken as an example. At this time, the object to be plated 9 is fixed in the middle of thecarrier 21 to protect the object to be plated 9 from damage during processing or transportation, and to give the object to be plated 9 a certain tension to resist deformation caused by gravity, thereby achieving uniform processing quality. The object to be plated 9 is open in the horizontal direction of thecarrier 21 to accept various treatments in the coating process.

該等真空製程腔3分別設置於該第一軸線L1及該第二軸線L2上，且能容置及分別沿該第一軸線L1及該第二軸線L2輸送該載具21及該待鍍物9，每一真空製程腔3進行單向加工。Thevacuum process chambers 3 are respectively arranged on the first axis L1 and the second axis L2, and can accommodate and transport thecarrier 21 and the object to be plated 9 along the first axis L1 and the second axis L2, respectively. Eachvacuum process chamber 3 performs unidirectional processing.

於本實施例中，該等真空製程腔3的數量是8個，且分別是設置於該第一軸線L1上的一裝載腔體31、二除氣腔體32，及一清潔腔體33，及設置於該第二軸線L2上的一第一鍍膜腔體34、一第二鍍膜腔體35、一緩衝腔體36，及一卸載腔體37。該等真空製程腔3之間可以設置閥門(圖未示)，藉此維持腔內真空度的穩定。In this embodiment, the number of thevacuum process chambers 3 is 8, and they are respectively aloading chamber 31, two degassingchambers 32, and acleaning chamber 33 arranged on the first axis L1, and afirst coating chamber 34, asecond coating chamber 35, abuffer chamber 36, and an unloadingchamber 37 arranged on the second axis L2. Valves (not shown) can be arranged between thevacuum process chambers 3 to maintain the stability of the vacuum degree in the chamber.

該裝載腔體31用於進料。Theloading chamber 31 is used for feeding.

該等除氣腔體32彼此相連接且可對進入內部的該載具21及該待鍍物9進行真空除氣(Degas)，去除因與外界空氣接觸而吸附於該載具21及該待鍍物9的水分子與氣體。藉由設置該等除氣腔體32能提高生產效率，例如將該載具21及該待鍍物9分別於其中一除氣腔體32內置放3分鐘並將其抽至一低真空度，並於其中另一除氣腔體32內置放3分鐘並將其抽至一高真空度，藉此共能累積6分鐘的除氣時間且分散建立真空度所需的時間，進一步達到更佳的製程效率。The degassingchambers 32 are connected to each other and can perform vacuum degassing (Degas) on thecarrier 21 and theobject 9 entering the inside, removing water molecules and gases adsorbed on thecarrier 21 and theobject 9 due to contact with the outside air. The production efficiency can be improved by setting up thedegassing chambers 32. For example, thecarrier 21 and theobject 9 are placed in one of thedegassing chambers 32 for 3 minutes and evacuated to a low vacuum degree, and placed in anotherdegassing chamber 32 for 3 minutes and evacuated to a high vacuum degree. In this way, a total of 6 minutes of degassing time can be accumulated and the time required to establish the vacuum degree can be dispersed, further achieving better process efficiency.

除氣腔體32的數量不以二個為限。除了可增加除氣腔室32的數量以分散降低每一次停留所需的時間之外，於其他實施態樣中，為了進一步提高製程的良率，亦能於該裝載腔體31之前設置至少一烤箱(圖未示)，由於該待鍍物9自其他製程工序移送至本發明的實施例時，可能因暴露於大氣的時間較長而吸附較多的水氣。藉由將該待鍍物9於該至少一烤箱內烘烤一時間，實務上約為烘烤30分鐘至1小時之間，能有效減少該待鍍物9於該等除氣腔體32內所需的除氣時間，進一步能減少該等除氣腔體32的數量或不裝設該除氣腔體32。此外，另於其他實施態樣中，亦能使該裝載腔室31具有真空除氣的功能，藉此能減少該等除氣腔體32的數量或不裝設該除氣腔體32。The number ofdegassing chambers 32 is not limited to two. In addition to increasing the number ofdegassing chambers 32 to disperse and reduce the time required for each stay, in other embodiments, in order to further improve the yield of the process, at least one oven (not shown) can be set before theloading chamber 31. Since theobject 9 to be plated is transferred from other process steps to the embodiment of the present invention, it may absorb more water vapor due to being exposed to the atmosphere for a longer time. By baking theobject 9 to be plated in the at least one oven for a period of time, which is practically about 30 minutes to 1 hour, the degassing time required for theobject 9 to be plated in thedegassing chambers 32 can be effectively reduced, and the number of thedegassing chambers 32 can be further reduced or thedegassing chambers 32 can be omitted. In addition, in other embodiments, theloading chamber 31 can also have a vacuum degassing function, thereby reducing the number of thedegassing chambers 32 or not installing thedegassing chamber 32.

該清潔腔體33與該等除氣腔體32間隔設置，且用來對進入內部的該待鍍物9進行清潔。於本實施例中，是以電漿清洗(Plasma)的製程方法。The cleaningchamber 33 is spaced apart from the degassingchambers 32 and is used to clean the object to be plated 9 that enters the interior. In this embodiment, a plasma cleaning process is used.

該第一鍍膜腔體34及該第二鍍膜腔體35間隔設置，且用來對該待鍍物9進行鍍膜。該第一鍍膜腔體34與該第二鍍膜腔體35用來鍍膜的材質相異。於本實施例中，該第一鍍膜腔體34是用來對該待鍍物9進行鍍鈦(Ti)，該第二鍍膜腔體35是用來對該待鍍物9的進行鍍銅(Cu)，於其他實施態樣中，也可依需求選用其他鍍膜材料。Thefirst coating chamber 34 and thesecond coating chamber 35 are spaced apart and used to coat theobject 9. Thefirst coating chamber 34 and thesecond coating chamber 35 are used to coat different materials. In this embodiment, thefirst coating chamber 34 is used to coat theobject 9 with titanium (Ti), and thesecond coating chamber 35 is used to coat theobject 9 with copper (Cu). In other embodiments, other coating materials can also be selected as required.

此外，也可依鍍膜層數需求增減鍍膜腔體的數量，例如當需要鍍上較厚的銅層時，可以設置二個以上的第二鍍膜腔體35。In addition, the number of coating chambers can be increased or decreased according to the number of coating layers required. For example, when a thicker copper layer needs to be coated, more than twosecond coating chambers 35 can be provided.

能理解的是，該第一鍍膜腔體34除了鍍鈦以外，在一些實施態樣中，也可以鍍TiW、Cr、NiCr、Ni、Ta、CuN、Ti/TiN、Ta/TaN、SUS。而該第二鍍膜腔體35除了鍍銅以外，在一些實施態樣中，也可以鍍銅合金。此外，在不同的實施態樣中，該第一鍍膜腔體34與該第二鍍膜腔體35的鍍膜種類也能互換。鍍膜種類及層數並非本發明的一限制，使用者可依實際鍍膜需求來選用鍍膜材質及配置鍍膜腔體的數量。It is understood that, in addition to titanium plating, thefirst plating chamber 34 can also be plated with TiW, Cr, NiCr, Ni, Ta, CuN, Ti/TiN, Ta/TaN, SUS in some embodiments. In addition to copper plating, thesecond plating chamber 35 can also be plated with copper alloy in some embodiments. In addition, in different embodiments, the types of plating of thefirst plating chamber 34 and thesecond plating chamber 35 can also be interchanged. The type and number of plating layers are not a limitation of the present invention. Users can select the plating material and configure the number of plating chambers according to actual plating requirements.

要特別再說明的是，在上述實施例中的該等真空製程腔3內都能設置高效率的冷卻模組，例如冷卻管路或在腔內通入冷卻氣體，以有效控制該待鍍物9的溫度，及減少該待鍍物9的變形，提升產品良率。It should be particularly noted that in the above-mentioned embodiments, a high-efficiency cooling module can be installed in thevacuum process chamber 3, such as a cooling pipeline or a cooling gas is introduced into the chamber to effectively control the temperature of the object to be plated 9 and reduce the deformation of the object to be plated 9, thereby improving the product yield.

該緩衝腔體36連接於該第二鍍膜腔體35且用來輸送及容置該承載裝置2。於本實施例中，由於該第一鍍膜腔體34及該第二鍍膜腔體35於製程時所需的本底真空度(Base pressure)較高(壓力值約介於10^-5~10^-8Torr，通常為10^-6Torr，較佳的為10^-7Torr)，藉由設置該緩衝腔體36能達到至少以下的功效：Thebuffer chamber 36 is connected to thesecond coating chamber 35 and is used to transport and accommodate thecarrier 2. In this embodiment, since the base vacuum (base pressure) required by thefirst coating chamber 34 and thesecond coating chamber 35 during the process is relatively high (the pressure value is about 10^-5 ~10^-8 Torr, usually 10^-6 Torr, preferably 10^-7 Torr), thebuffer chamber 36 can achieve at least the following effects:

一、利於逐步將該待鍍物9所處的真空度緩降至相同於外界的大氣壓力，能讓該第二鍍膜腔體35將該待鍍物9輸送至該緩衝腔體36時，不會因真空度的落差太大而增加後續重新建立真空度時所需的時間。1. It is helpful to gradually reduce the vacuum degree of the object to be plated 9 to the same atmospheric pressure as the outside, so that when thesecond coating chamber 35 transports the object to be plated 9 to thebuffer chamber 36, the time required to re-establish the vacuum degree will not be increased due to a large drop in the vacuum degree.

二、達到水氣隔絕的目的。由於外界的大氣溼度約介於40%至70%之間，藉由設置該緩衝腔體36能避免外界的水氣擴散至該第一鍍膜腔體34及該第二鍍膜腔體35，進一步避免造成腔內的真空度變差、避免靶材表面氧化、及避免因水氣混雜而造成鍍膜的品質變差。2. Achieve the purpose of water vapor isolation. Since the humidity of the outside atmosphere is approximately between 40% and 70%, thebuffer chamber 36 can prevent the outside water vapor from diffusing into thefirst coating chamber 34 and thesecond coating chamber 35, further preventing the vacuum degree in the chamber from deteriorating, preventing the surface oxidation of the target material, and preventing the quality of the coating from deteriorating due to water vapor mixing.

惟於其他實施態樣中，若外界的大氣濕度已被精確的控制，亦可不設置該緩衝腔體36，不以此為限。However, in other embodiments, if the external atmospheric humidity has been precisely controlled, thebuffer chamber 36 may not be provided, and the present invention is not limited thereto.

該卸載腔體37連接該緩衝腔體36且用於出料。The unloadingchamber 37 is connected to thebuffer chamber 36 and is used for discharging materials.

該旋轉裝置4包括一設置於該第一軸線L1上的第一旋轉腔41、一設置於該第二軸線L2上的第二旋轉腔42，及一位於該第一旋轉腔41及該第二旋轉腔42之間的中繼腔43。該第一旋轉腔41連接於其中一該除氣腔體32與該清潔腔體33間。該第二旋轉腔42連接於該第一鍍膜腔體34與該第二鍍膜腔體35間。該旋轉裝置4內亦為真空狀態。Therotating device 4 includes a firstrotating chamber 41 disposed on the first axis L1, a secondrotating chamber 42 disposed on the second axis L2, and arelay chamber 43 between the firstrotating chamber 41 and the secondrotating chamber 42. The firstrotating chamber 41 is connected between one of thedegassing chambers 32 and thecleaning chamber 33. The secondrotating chamber 42 is connected between thefirst coating chamber 34 and thesecond coating chamber 35. Therotating device 4 is also in a vacuum state.

參閱圖4、圖5、圖6，該第一旋轉腔41包括沿該第一軸線L1相反設置且分別連接其中一該除氣腔體32與該清潔腔體33的一後開口411及一前開口412、一位於該第一軸線L1與該第二軸線L2之間的側開口413，及一旋轉模組414。該旋轉模組414能容置且可驅動該載具21及該待鍍物9以沿一鉛直方向延伸的旋轉軸(圖未示)旋轉，並具有一頭端415及一尾端416。該旋轉模組414能以該頭端415朝向該後開口411(如圖4所示，此時，該尾端416朝向該前開口412)、以該頭端415朝向該前開口412(如圖5所示，此時，該尾端416朝向該後開口411)，及以該頭端415朝向該側開口413(如圖6所示)。該載具21及該待鍍物9能自該旋轉模組414的該頭端415或該尾端416移入及移出，並可往復進入該第一旋轉腔41及與該第一旋轉腔41連接的該等真空製程腔3，且可受該旋轉模組414翻轉180度後返回同一個該真空製程腔3，以使該待鍍物9的相反兩面可受該真空製程腔3加工。Referring to Fig. 4, Fig. 5, and Fig. 6, the firstrotating chamber 41 includes arear opening 411 and afront opening 412 which are arranged oppositely along the first axis L1 and respectively connected to one of thedegassing chamber 32 and thecleaning chamber 33, aside opening 413 located between the first axis L1 and the second axis L2, and arotating module 414. Therotating module 414 can accommodate and drive thecarrier 21 and the object to be plated 9 to rotate along a rotating axis (not shown) extending in a lead vertical direction, and has ahead end 415 and atail end 416. Therotating module 414 can be oriented with thehead end 415 toward the rear opening 411 (as shown in FIG. 4 , at this time, thetail end 416 is oriented toward the front opening 412), with thehead end 415 toward the front opening 412 (as shown in FIG. 5 , at this time, thetail end 416 is oriented toward the rear opening 411), and with thehead end 415 toward the side opening 413 (as shown in FIG. 6 ). Thecarrier 21 and the object to be plated 9 can be moved in and out from thehead end 415 or thetail end 416 of therotating module 414, and can reciprocate into the firstrotating chamber 41 and thevacuum process chambers 3 connected to the firstrotating chamber 41, and can be turned 180 degrees by therotating module 414 and return to the samevacuum process chamber 3, so that the opposite sides of the object to be plated 9 can be processed by thevacuum process chamber 3 .

該第二旋轉腔42包括沿該第二軸線L2相反設置且分別連接該第二鍍膜腔體35與該第一鍍膜腔體34的一後開口421及一前開口422、一位於該第一軸線L1與該第二軸線L2之間且對應該第一旋轉腔41的側開口423，及一旋轉模組424。該旋轉模組424能容置且可驅動該載具21及該待鍍物9以沿該鉛直方向延伸的旋轉軸(圖未示)旋轉，並具有一頭端425及一尾端426。該旋轉模組424能以該頭端425朝向該後開口421(如圖4所示，此時，該尾端426朝向該前開口422)、以該頭端425朝向該前開口422(如圖5所示，此時，該尾端426朝向該後開口421)，及以該頭端425朝向該側開口423(如圖6所示)。該載具21及該待鍍物9能自該旋轉模組424的該頭端425或該尾端426移入及移出，並可往復進入該第二旋轉腔42及與該第二旋轉腔42連接的該等真空製程腔3，且可受該旋轉模組424翻轉180度後返回同一個該真空製程腔3，以使該待鍍物9的相反兩面可受該真空製程腔3加工。The secondrotating chamber 42 includes arear opening 421 and afront opening 422 which are arranged oppositely along the second axis L2 and respectively connect thesecond coating chamber 35 and thefirst coating chamber 34, aside opening 423 located between the first axis L1 and the second axis L2 and corresponding to the firstrotating chamber 41, and arotating module 424. Therotating module 424 can accommodate and drive thecarrier 21 and the object to be plated 9 to rotate along a rotating axis (not shown) extending along the lead vertical direction, and has ahead end 425 and atail end 426. Therotating module 424 can face therear opening 421 with the head end 425 (as shown in FIG. 4, at this time, thetail end 426 faces the front opening 422), thefront opening 422 with the head end 425 (as shown in FIG. 5, at this time, thetail end 426 faces the rear opening 421), and theside opening 423 with the head end 425 (as shown in FIG. 6). Thecarrier 21 and the object to be plated 9 can be moved in and out from thehead end 425 or thetail end 426 of therotating module 424, and can reciprocate into the secondrotating chamber 42 and thevacuum process chambers 3 connected to the secondrotating chamber 42, and can be turned 180 degrees by therotating module 424 and return to the samevacuum process chamber 3, so that the opposite sides of the object to be plated 9 can be processed by thevacuum process chamber 3.

較佳的，於本實施例中，當該第一旋轉腔41的旋轉模組414的該頭端415朝向該後開口411或當該尾端416朝向該後開口411時，該待鍍物9皆位於該第一軸線L1上。當該第二旋轉腔42的旋轉模組424的該頭端425朝向該後開口421或當該尾端426朝向該後開口421時，該待鍍物9皆位於該第二軸線L2上。Preferably, in this embodiment, when thehead end 415 of therotary module 414 of the firstrotary chamber 41 faces therear opening 411 or when thetail end 416 faces therear opening 411, the object to be plated 9 is located on the first axis L1. When thehead end 425 of therotary module 424 of the secondrotary chamber 42 faces therear opening 421 or when thetail end 426 faces therear opening 421, the object to be plated 9 is located on the second axis L2.

該中繼腔43連接於該等側開口413,423間。於本實施例中，該中繼腔43用於容置及輸送該載具21及該待鍍物9。於其他實施態樣中，該中繼腔43也能是較短的長度而僅具輸送的功能。再於其他實施態樣中，也能不設置該中繼腔43，不以此為限。Therelay chamber 43 is connected between theside openings 413, 423. In this embodiment, therelay chamber 43 is used to accommodate and transport thecarrier 21 and the object to be plated 9. In other embodiments, therelay chamber 43 can also be shorter and only have the function of transport. In other embodiments, therelay chamber 43 can also be omitted, but it is not limited to this.

於本實施例中，該第一旋轉腔41及該第二旋轉腔42的外部均設置有馬達(圖未示)，內部均設置有減速齒輪組(圖未示)，馬達與減速齒輪組之間藉由密封的傳動元件(圖未示)傳輸動力，藉此以驅動該旋轉模組414、424轉動，於其他實施態樣中，也可以選用其他可提供動力以轉動該載具21的等效組件，不以此為限。In this embodiment, a motor (not shown) is disposed outside the firstrotating chamber 41 and the secondrotating chamber 42, and a reduction gear set (not shown) is disposed inside. The motor and the reduction gear set transmit power through a sealed transmission element (not shown) to drive the rotatingmodules 414 and 424 to rotate. In other embodiments, other equivalent components that can provide power to rotate thecarrier 21 can also be selected, and the present invention is not limited thereto.

較詳細地說，於本實施例中，是沿該第一軸線L1依序排列該裝載腔體31、該等除氣腔體32、該第一旋轉腔41及該清潔腔體33；沿該第二軸線L2反向依序排列該第一鍍膜腔體34、該第二旋轉腔42、該第二鍍膜腔體35、該緩衝腔體36及該卸載腔體37。該裝載腔體31與該卸載腔體37相鄰。In more detail, in this embodiment, theloading chamber 31, the degassingchambers 32, the firstrotating chamber 41 and thecleaning chamber 33 are arranged in sequence along the first axis L1; thefirst coating chamber 34, the secondrotating chamber 42, thesecond coating chamber 35, thebuffer chamber 36 and the unloadingchamber 37 are arranged in reverse sequence along the second axis L2. Theloading chamber 31 is adjacent to the unloadingchamber 37.

值得一提的是，於本實施例中，該第一軸線L1及該第二軸線L2上的該等真空製程腔3數量相同，於其他實施態樣中，也可依需求調整該第一軸線L1及該第二軸線L2上的真空製程腔數量，此時，該第一、第二旋轉腔41、42的配置如圖7所示。其中，該第一旋轉腔41的側開口413及該第二旋轉腔42的側開口423沿一第三軸線L3間隔設置，該第三軸線L3與該第一軸線L1及該第二軸線L2呈一夾角。It is worth mentioning that in this embodiment, the number ofvacuum process chambers 3 on the first axis L1 and the second axis L2 is the same. In other embodiments, the number of vacuum process chambers on the first axis L1 and the second axis L2 can also be adjusted according to needs. At this time, the configuration of the first and secondrotary chambers 41 and 42 is shown in Figure 7. Theside opening 413 of the firstrotary chamber 41 and theside opening 423 of the secondrotary chamber 42 are arranged along a third axis L3, and the third axis L3 forms an angle with the first axis L1 and the second axis L2.

該回流裝置5跨設在該第一軸線L1及該第二軸線L2上，且與該旋轉裝置4位於該第一軸線L1及該第二軸線L2的兩相反側，並銜接該卸載腔體37及該裝載腔體31，用於將該待鍍物9自該承載裝置2的載具21卸離，再將該載具21回流並裝載下一個新的待鍍物(圖未示)。較佳的，該回流裝置5能整合設備前段模組(Equipment Front End Module；EFEM)，達到自動化入出料的目的。Thereflow device 5 is arranged across the first axis L1 and the second axis L2, and is located on opposite sides of the first axis L1 and the second axis L2 with therotating device 4, and is connected to the unloadingchamber 37 and theloading chamber 31, and is used to unload theobject 9 from thecarrier 21 of thecarrier 2, and then reflow thecarrier 21 and load the next new object (not shown). Preferably, thereflow device 5 can be integrated with the Equipment Front End Module (EFEM) to achieve the purpose of automatic material input and output.

應說明的是，該等真空製程腔3能依據不同的製程需求而彈性配置為不同的功能腔體，例如依序連接該第一旋轉腔41的後開口411、該第一旋轉腔41的前開口412、該第二旋轉腔42的前開口422，及該第二旋轉腔42的後開口421的該等真空製程腔3分別為以下幾種腔體的配置方式：It should be noted that thevacuum process chambers 3 can be flexibly configured as different functional chambers according to different process requirements. For example, thevacuum process chambers 3 sequentially connected to therear opening 411 of the firstrotary chamber 41, thefront opening 412 of the firstrotary chamber 41, thefront opening 422 of the secondrotary chamber 42, and therear opening 421 of the secondrotary chamber 42 are configured in the following ways:

一、該除氣腔體32、該清潔腔體33、該第一鍍膜腔體34，及該第二鍍膜腔體35(同本實施例的配置)。1. Thedegassing chamber 32, the cleaningchamber 33, thefirst coating chamber 34, and the second coating chamber 35 (same configuration as in this embodiment).

二、該清潔腔體33、該清潔腔體33、該第一鍍膜腔體34，及該第二鍍膜腔體35。其目的在於可於不同的真空製程腔3內對於該待鍍物9的兩相反側進行清潔。2. The cleaningchamber 33, the cleaningchamber 33, thefirst coating chamber 34, and thesecond coating chamber 35. The purpose is to clean the two opposite sides of the object to be coated 9 in differentvacuum process chambers 3.

三、該清潔腔體33、該第一鍍膜腔體34、該第二鍍膜腔體35，及該第二鍍膜腔體35。其目的在於藉由設置兩個第二鍍膜腔體35能增加鍍膜的膜厚。3. The cleaningchamber 33, thefirst coating chamber 34, thesecond coating chamber 35, and thesecond coating chamber 35. The purpose is to increase the film thickness of the coating by setting up twosecond coating chambers 35.

四、該清潔腔體33、該第一鍍膜腔體34、該第二鍍膜腔體35，及該第一鍍膜腔體34。舉例來說，該第一鍍膜腔體34可以是鍍不鏽鋼(SUS)，該第二鍍膜腔體35則可以是鍍銅(Cu)，藉此能達到SUS-Cu-SUS的鍍膜層，應用於例如EMI鍍膜。4. The cleaningchamber 33, thefirst coating chamber 34, thesecond coating chamber 35, and thefirst coating chamber 34. For example, thefirst coating chamber 34 can be plated with stainless steel (SUS), and thesecond coating chamber 35 can be plated with copper (Cu), thereby achieving a SUS-Cu-SUS coating layer, which is applied to EMI coating, for example.

五、該清潔腔體33、該第一鍍膜腔體34、該第二鍍膜腔體35，及一第三鍍膜腔體(圖未示)。舉例來說，該第一鍍膜腔體34是鍍鈦(Ti)、該第二鍍膜腔體35是鍍鎳釩合金(NiV)，及該第三鍍膜腔體是鍍金(Au)、銀(Ag)，及銅(Cu)的其中之一，藉此能應用於晶背金屬化製程(Back Side Metal)或圖形化正面金屬製程(Front Side Metallization,FSM)。5. The cleaningchamber 33, thefirst plating chamber 34, thesecond plating chamber 35, and a third plating chamber (not shown). For example, thefirst plating chamber 34 is plated with titanium (Ti), thesecond plating chamber 35 is plated with nickel-vanadium alloy (NiV), and the third plating chamber is plated with one of gold (Au), silver (Ag), and copper (Cu), so that it can be applied to the back side metallization process (Back Side Metal) or the front side metallization process (FSM).

其變化態樣並不以上述的配置為限。例如，於其他實施態樣中，也能將該旋轉裝置4的中繼腔43置換成該第一鍍膜腔體34，該並用於鍍鈦，該第二鍍膜腔體35與該第二旋轉腔42的該前開口422相連接，且用於鍍鎳釩合金(NiV)，該第三鍍膜腔體(圖未示)與該第二旋轉腔42的該後開口421相連接，且用於鍍金(Au)、銀(Ag)，及銅(Cu)的其中之一。並不以此為限。The variation is not limited to the above configuration. For example, in other embodiments, theintermediate cavity 43 of therotating device 4 can be replaced with the first film-platedcavity 34, which is used for titanium plating, the second film-platedcavity 35 is connected to thefront opening 422 of the secondrotating cavity 42, and is used for nickel-vanadium alloy (NiV), and the third film-plated cavity (not shown) is connected to therear opening 421 of the secondrotating cavity 42, and is used for gold (Au), silver (Ag), and copper (Cu). It is not limited to this.

若將該待鍍物9分為A面(圖未示)及B面(圖未示)兩個待加工區域，則該待鍍物9藉由本實施例將依序：一、裝設於該承載裝置的載具21內。二、進入該等除氣腔體32進行除氣。三、進入該清潔腔體33內並對A面進行清潔。四、進入該第一旋轉腔41內旋轉180°後，再使其回到該清潔腔體33內並對B面進行清潔。五、進入該第一旋轉腔41內，再使其進入該第二旋轉腔42內，接著進入該第一鍍膜腔體34內對A面進行鍍膜。六、進入該第二旋轉腔42內旋轉180°，再使其回到該第一鍍膜腔體34內對B面進行鍍膜。七、進入該第二旋轉腔42內，接著再進入該第二鍍膜腔體35內對B面進行鍍膜。八、進入該第二旋轉腔42內旋轉180°，再使其回到該第二鍍膜腔體35內對A面進行鍍膜。九、進入該緩衝腔體36，接著移出該承載裝置的載具21。If the object to be plated 9 is divided into two processing areas, namely, surface A (not shown) and surface B (not shown), the object to be plated 9 will be processed in the following order according to the present embodiment: 1. Installed in thecarrier 21 of the carrier. 2. Entered into thedegassing chamber 32 for degassing. 3. Entered into the cleaningchamber 33 and cleaned the surface A. 4. Entered into the firstrotary chamber 41 and rotated 180°, then returned to thecleaning chamber 33 and cleaned the surface B. 5. Entered into the firstrotary chamber 41, then entered into the secondrotary chamber 42, and then entered into thefirst coating chamber 34 to coat the surface A. 6. Entered into the secondrotary chamber 42 and rotated 180°, then returned to thefirst coating chamber 34 to coat the surface B. 7. Enter the secondrotary chamber 42, then enter thesecond coating chamber 35 to coat the B surface. 8. Enter the secondrotary chamber 42, rotate 180°, then return to thesecond coating chamber 35 to coat the A surface. 9. Enter thebuffer chamber 36, then remove thecarrier 21 of the carrier.

應說明的是，雖然藉由該第一旋轉腔41的旋轉模組414及該第二旋轉腔42的旋轉模組424能達到雙面鍍膜的功效。惟本實施例仍可單純用於單面鍍膜，此時該第一旋轉腔41的旋轉模組414及該第二旋轉腔42的旋轉模組424是用於將該載具21及該待鍍物9自第一軸線L1移動至該第二軸線L2，不以此為限。It should be noted that although therotary module 414 of the firstrotary chamber 41 and therotary module 424 of the secondrotary chamber 42 can achieve the effect of double-sided coating, this embodiment can still be used for single-sided coating. At this time, therotary module 414 of the firstrotary chamber 41 and therotary module 424 of the secondrotary chamber 42 are used to move thecarrier 21 and the object to be coated 9 from the first axis L1 to the second axis L2, but the present invention is not limited thereto.

參閱圖8，是本發明旋轉移載式立式鍍膜設備的一第一變化例，差異處在於：該第一旋轉腔41於該第一軸線L1上僅具有該後開口411(不具有該前開口412)，該第二旋轉腔42於該第二軸線L2上僅具有該後開口421(不具有該前開口422)，該等真空製程腔3的其中之二分別沿該第一、第二軸線L1、L2銜接在該第一、第二旋轉腔41、42的該後開口411、412。於本變化例中，該等真空製程腔3可以分別是該清潔腔體33及該第一鍍膜腔體34，也可以分別是該第一鍍膜腔體34及該第二鍍膜腔體35，不以此為限。Refer to FIG8, which is a first variation of the rotary transfer vertical coating equipment of the present invention. The difference is that the firstrotary chamber 41 only has the rear opening 411 (without the front opening 412) on the first axis L1, and the secondrotary chamber 42 only has the rear opening 421 (without the front opening 422) on the second axis L2. Two of thevacuum process chambers 3 are connected to therear openings 411 and 412 of the first and secondrotary chambers 41 and 42 along the first and second axes L1 and L2, respectively. In this variation, thevacuum process chambers 3 can be the cleaningchamber 33 and thefirst coating chamber 34, or thefirst coating chamber 34 and thesecond coating chamber 35, respectively, but not limited thereto.

參閱圖9，是本發明旋轉移載式立式鍍膜設備的一第二變化例，其類似於該第一變化例，差異處在於：該第一旋轉腔41及該第二旋轉腔42間省略不設置該中繼腔43，而直接相連接。Refer to Figure 9, which is a second variation of the rotary transfer vertical coating equipment of the present invention. It is similar to the first variation, but the difference is that therelay chamber 43 is omitted between the firstrotary chamber 41 and the secondrotary chamber 42, and they are directly connected.

參閱圖10，是本發明旋轉移載式立式鍍膜設備的一第三變化例，差異處在於：該第一旋轉腔41的前開口412不位於該第一軸線L1上，及該第二旋轉腔42的該前開口422不位於該第二軸線L2上。較佳的，該第一旋轉腔41的前開口412、該第一旋轉腔41的側開口413、該第二旋轉腔42的前開口422，及該第二旋轉腔42的側開口423是沿一第四軸線L4共線。藉此能達到彈性配置的優點。Refer to Figure 10, which is a third variation of the rotary transfer vertical coating device of the present invention. The difference is that thefront opening 412 of the firstrotary chamber 41 is not located on the first axis L1, and thefront opening 422 of the secondrotary chamber 42 is not located on the second axis L2. Preferably, thefront opening 412 of the firstrotary chamber 41, theside opening 413 of the firstrotary chamber 41, thefront opening 422 of the secondrotary chamber 42, and theside opening 423 of the secondrotary chamber 42 are collinear along a fourth axis L4. This can achieve the advantage of flexible configuration.

參閱圖11，是本發明旋轉移載式立式鍍膜設備的一第四變化例，其類似於該第三變化例，差異處在於：將兩個該第三變化例結合，並共用一個位於其中間的真空製程腔3。Refer to Figure 11, which is a fourth variation of the rotary transfer vertical coating equipment of the present invention, which is similar to the third variation, and the difference is that two third variations are combined and share avacuum process chamber 3 located in the middle.

參閱圖12，是本發明旋轉移載式立式鍍膜設備的一第五變化例，其類似於該第三變化例，差異處在於：該第一旋轉腔41還具有一位於該第一軸線L1上的外開口417，該第二旋轉腔42還具有一位於該第二軸線L2上的外開口427。該第一旋轉腔41的旋轉模組414還能以該頭端415朝向該外開口417，及以該尾端416朝向該外開口417。該第二旋轉腔42的旋轉模組424還能以該頭端425朝向該外開口427，及以該尾端426朝向該外開口427。Referring to FIG. 12 , it is a fifth variation of the rotary transfer vertical coating device of the present invention, which is similar to the third variation, except that the firstrotary chamber 41 also has anouter opening 417 located on the first axis L1, and the secondrotary chamber 42 also has anouter opening 427 located on the second axis L2. Therotary module 414 of the firstrotary chamber 41 can also face theouter opening 417 with thehead end 415 and theouter opening 417 with thetail end 416. Therotary module 424 of the secondrotary chamber 42 can also face theouter opening 427 with thehead end 425 and thetail end 426.

參閱圖13，是本發明旋轉移載式立式鍍膜設備的一第六變化例，差異處在於：待鍍物9的數量至少為二，該承載裝置2包括至少二個直立設置且適用以承載個別待鍍物9的載具21。Refer to Figure 13, which is a sixth variation of the rotary transfer type vertical coating equipment of the present invention. The difference is that:The number ofobjects 9 to be plated is at least two, and the supportingdevice 2 includes at least twoupright carriers 21 suitable for carryingindividual objects 9 to be plated.

該第一旋轉腔41的旋轉模組414能同時容置及驅動該等載具21及該待鍍物9。該第一旋轉腔41的該後開口411及該前開口412分別連接二個真空製程腔3，每一真空製程腔3容置個別的載具21及待鍍物9。Therotary module 414 of the firstrotary chamber 41 can simultaneously accommodate and drive thecarriers 21 and theobject 9 to be plated. Therear opening 411 and thefront opening 412 of the firstrotary chamber 41 are respectively connected to twovacuum process chambers 3, and eachvacuum process chamber 3 accommodates aseparate carrier 21 andobject 9 to be plated.

該第二旋轉腔42的旋轉模組424能同時容置及驅動該等載具21及該待鍍物9。該第二旋轉腔42的該後開口421及該前開口422分別連接二個真空製程腔3，每一真空製程腔3容置個別的載具21及待鍍物9。Therotary module 424 of the secondrotary chamber 42 can simultaneously accommodate and drive thecarriers 21 and theobject 9 to be plated. Therear opening 421 and thefront opening 422 of the secondrotary chamber 42 are respectively connected to twovacuum process chambers 3, and eachvacuum process chamber 3 accommodates aseparate carrier 21 andobject 9 to be plated.

舉例說明：連接於該第一旋轉腔41的後開口411的二個真空製程腔3為除氣腔體32，連接於該前開口412的二個真空製程腔3為清潔腔體33。連接於該第二旋轉腔42的後開口421的二個真空製程腔3為第二鍍膜腔體35，連接於該前開口422的二個真空製程腔3為第一鍍膜腔體34，藉此能同時針對二個載具21及待鍍物9進行容置、輸送、除氣、清潔，及鍍膜加工，達到倍增產能的功效。惟配置方式不以此為限。For example: the twovacuum process chambers 3 connected to therear opening 411 of the firstrotary chamber 41 are degassingchambers 32, and the twovacuum process chambers 3 connected to thefront opening 412 are cleaningchambers 33. The twovacuum process chambers 3 connected to therear opening 421 of the secondrotary chamber 42 are thesecond coating chambers 35, and the twovacuum process chambers 3 connected to thefront opening 422 are thefirst coating chambers 34, thereby being able to simultaneously accommodate, transport, degas, clean, and coat twocarriers 21 and the objects to be coated 9, thereby doubling the productivity. However, the configuration is not limited to this.

於本變化例的其他實施態樣中(圖未示)，該第一旋轉腔41的該後開口411及該前開口412也能僅分別連接一個真空製程腔3，該第二旋轉腔42的該後開口421及該前開口422也能僅分別連接一個真空製程腔3，此時，每一真空製程腔3能同時容置二個載具21及待鍍物9，不以此為限。In other embodiments of this variation (not shown), therear opening 411 and thefront opening 412 of the firstrotary chamber 41 can also be connected to only onevacuum process chamber 3 respectively, and therear opening 421 and thefront opening 422 of the secondrotary chamber 42 can also be connected to only onevacuum process chamber 3 respectively. In this case, eachvacuum process chamber 3 can simultaneously accommodate twocarriers 21 and the object to be plated 9, but this is not limited to this.

參閱圖4、圖14，及圖15，本發明雙面多層膜的鍍膜方法之一實施例，包含下列步驟：Referring to Figures 4, 14, and 15, one embodiment of the double-sided multi-layer film coating method of the present invention includes the following steps:

步驟81：輸送該待鍍物至其中一該真空製程腔3，該其中一真空製程腔3連接該第一旋轉腔41。Step 81: Transport the object to be plated to one of thevacuum process chambers 3, wherein the one of thevacuum process chambers 3 is connected to the firstrotary chamber 41.

步驟82：於該其中一真空製程腔3內對該待鍍物9的其中一面進行除氣、清潔及濺鍍鍍膜的其中一種加工。Step 82: Perform one of the following processes: degassing, cleaning and sputter coating on one side of theobject 9 in one of thevacuum process chambers 3.

步驟83：將該待鍍物9輸送至該第一旋轉腔41，並旋轉180度後輸送回該其中一真空製程腔3。Step 83: The object to be plated 9 is transported to the firstrotary chamber 41, and after rotating 180 degrees, it is transported back to one of thevacuum process chambers 3.

步驟84：對該待鍍物9的其中另一面進行相同於步驟82的加工。Step 84: Perform the same processing asstep 82 on the other side of theobject 9 to be plated.

步驟85：將該待鍍物9輸送至該第一旋轉腔41，且旋轉該待鍍物9後，將該待鍍物9自該側開口413移出該第一旋轉腔41。Step 85: The object to be plated 9 is transported to the firstrotating chamber 41, and after rotating the object to be plated 9, the object to be plated 9 is moved out of the firstrotating chamber 41 from theside opening 413.

步驟91：將該待鍍物9自該第二旋轉腔42的側開口423輸送進入該第二旋轉腔42。Step 91: The object to be plated 9 is transported into the secondrotary chamber 42 from theside opening 423 of the secondrotary chamber 42.

步驟92：該第二旋轉腔42旋轉該待鍍物9，並使其自該後開口421輸送至該其中另一真空製程腔3，並於該其中另一真空製程腔3內對該待鍍物9的其中一個面進行除氣、清潔及濺鍍鍍膜的其中一種加工。Step 92: The secondrotary chamber 42 rotates the object to be plated 9 and transports it from therear opening 421 to the othervacuum process chamber 3, and performs one of the processes of degassing, cleaning and sputtering coating on one surface of the object to be plated 9 in the othervacuum process chamber 3.

步驟93：將該待鍍物9自該其中另一真空製程腔3輸送至該第二旋轉腔42，並於該第二旋轉腔42將該待鍍物9旋轉180度後，將該待鍍物9自該第二旋轉腔42輸送回該其中另一真空製程腔3。Step 93: The object to be plated 9 is transported from the othervacuum process chamber 3 to the secondrotary chamber 42, and after the object to be plated 9 is rotated 180 degrees in the secondrotary chamber 42, the object to be plated 9 is transported from the secondrotary chamber 42 back to the othervacuum process chamber 3.

步驟94：於該其中一真空製程腔3內對該待鍍物9的其中另一面進行相同於步驟92的加工。Step 94: Perform the same processing asstep 92 on the other side of the object to be plated 9 in one of thevacuum process chambers 3.

步驟95(步驟86)：將該待鍍物9移入又另一真空製程腔3。Step 95 (Step 86): Move the object to be plated 9 into anothervacuum process chamber 3.

其中，步驟95(步驟86)對於步驟81至步驟85而言，該又另一真空製程腔3可以是該清潔腔體33、該第一鍍膜腔體34、該第二旋轉腔42、該第二鍍膜腔體35、該緩衝腔體36，及該卸載腔體37的其中之一；對於步驟91至步驟94而言，該又另一真空製程腔3可以是該第一鍍膜腔體34、該第二鍍膜腔體35、該緩衝腔體36，及該卸載腔體37的其中之一，但不以此為限。Among them, step 95 (step 86) forsteps 81 to 85, the othervacuum process chamber 3 can be one of the cleaningchamber 33, thefirst coating chamber 34, the secondrotating chamber 42, thesecond coating chamber 35, thebuffer chamber 36, and the unloadingchamber 37; forsteps 91 to 94, the othervacuum process chamber 3 can be one of thefirst coating chamber 34, thesecond coating chamber 35, thebuffer chamber 36, and the unloadingchamber 37, but is not limited thereto.

經由以上的說明，可將前述實施例的優點歸納如下：Through the above description, the advantages of the aforementioned embodiments can be summarized as follows:

一、本發明藉由設置該旋轉裝置4，使得該清潔腔體33能對該待鍍物9的相反兩面進行清潔，及該第一鍍膜腔體34及該第二鍍膜腔體35能對該待鍍物9的相反兩面進行鍍膜，可以減少真空製程腔3的數量，而由於真空製程腔3須消耗大量的能源來維持真空度，藉由減少真空製程腔3的數量能同時降低能源消耗，而達到節能減碳及降低營運成本的功效。此外，相較於習知鍍膜設備必須倍數設置真空鍍膜腔以達到雙面鍍膜的目的，一旦僅需單面鍍膜時，另一側(無須被鍍膜的一側)的真空鍍膜腔將無效用。而當本實施例適用於單面鍍膜時，將不會產生無效的第一鍍膜腔體34或第二鍍膜腔體35，達到提高生產靈活性的優點。1. The present invention, by providing therotating device 4, enables the cleaningchamber 33 to clean the opposite sides of theobject 9 to be coated, and thefirst coating chamber 34 and thesecond coating chamber 35 to coat the opposite sides of theobject 9 to be coated, thereby reducing the number ofvacuum process chambers 3. Since thevacuum process chamber 3 needs to consume a large amount of energy to maintain the vacuum degree, by reducing the number ofvacuum process chambers 3, energy consumption can be reduced at the same time, thereby achieving the effects of energy saving, carbon reduction and operating cost reduction. In addition, compared with the conventional coating equipment, which must have multiple vacuum coating chambers to achieve the purpose of double-sided coating, once only one-sided coating is required, the vacuum coating chamber on the other side (the side that does not need to be coated) will be useless. When this embodiment is applied to single-sided coating, no ineffectivefirst coating chamber 34 orsecond coating chamber 35 will be generated, thus achieving the advantage of improving production flexibility.

二、該旋轉裝置4連接的該等真空製程腔3皆可共用該第一旋轉腔41及該第二旋轉腔42，故可減少設置真空腔的數量，進一步減少佔地面積，藉此能提高無塵室的使用坪效。Second, thevacuum process chambers 3 connected to therotating device 4 can all share the firstrotating chamber 41 and the secondrotating chamber 42, so the number of vacuum chambers can be reduced, further reducing the floor space occupied, thereby improving the efficiency of the clean room.

三、藉由沿該第一軸線L1及該第二軸線L2排列的該真空製程腔3、該旋轉裝置4，及該回流裝置5，可避免設備在該第一軸線L1及該第二軸線L2的延伸方向上的長度過長，達到更易於彈性裝設的優點。3. By arranging thevacuum process chamber 3, therotating device 4, and thereflow device 5 along the first axis L1 and the second axis L2, the length of the equipment in the extension direction of the first axis L1 and the second axis L2 can be avoided to be too long, thereby achieving the advantage of easier flexible installation.

四、藉由該承載裝置2的載具21的移動路徑在一水平面上，使得設備的高度得以下降，避免設備受到廠房高度限制，及避免因設備高度較高而導致維護困難，達到易於設置及維修保養的功效。Fourth, by having the moving path of thecarrier 21 of the carryingdevice 2 on a horizontal plane, the height of the equipment can be lowered, avoiding the equipment being restricted by the height of the factory and avoiding the difficulty of maintenance caused by the high height of the equipment, thus achieving the effect of easy installation and maintenance.

五、藉由該裝載腔體31及該卸載腔體37相鄰，使得該承載裝置2回流的路程縮短，除了能減少本發明於實際運轉時所需的承載裝置2的載具21的數量，減少設備的建置成本之外，也能減少因回流而產生的能源消耗，及零配件因耗損或保養而產生的維護成本。此外，回流路程縮短也能有效避免承載裝置2的載具21因長時間暴露在大氣環境下而吸附過多的水分子，藉此降低除氣所需的時間及能源消耗，達到節能減碳的優點。5. By making theloading chamber 31 and the unloadingchamber 37 adjacent to each other, the reflux path of thecarrier 2 is shortened. In addition to reducing the number ofcarriers 21 of thecarrier 2 required for the actual operation of the present invention and reducing the construction cost of the equipment, it can also reduce the energy consumption caused by reflux and the maintenance cost caused by the wear and tear or maintenance of parts. In addition, the shortened reflux path can also effectively prevent thecarrier 21 of thecarrier 2 from absorbing too many water molecules due to long-term exposure to the atmospheric environment, thereby reducing the time and energy consumption required for degassing, achieving the advantages of energy saving and carbon reduction.

綜上所述，本發明旋轉移載式立式鍍膜設備確實能達成本發明之目的。In summary, the rotary transfer vertical coating equipment of the present invention can indeed achieve the purpose of the present invention.

惟以上所述者，僅為本發明之實施例而已，當不能以此限定本發明實施之範圍，凡是依本發明申請專利範圍及專利說明書內容所作之簡單的等效變化與修飾，皆仍屬本發明專利涵蓋之範圍內。However, the above is only an example of the implementation of the present invention, and it cannot be used to limit the scope of the implementation of the present invention. All simple equivalent changes and modifications made according to the scope of the patent application of the present invention and the content of the patent specification are still within the scope of the patent of the present invention.

2:承載裝置 21:載具 3:真空製程腔 31:裝載腔體 32:除氣腔體 33:清潔腔體 34:第一鍍膜腔體 35:第二鍍膜腔體 36:緩衝腔體 37:卸載腔體 4:旋轉裝置 41:第一旋轉腔 411:後開口 412:前開口 413:側開口 414:旋轉模組 415: 頭端 416:尾端 42:第二旋轉腔 421:後開口 422:前開口 423:側開口 424:旋轉模組 425: 頭端 426:尾端 43:中繼腔 5:回流裝置 9:待鍍物 L1:第一軸線 L2:第二軸線2: Carrier21: Carrier3: Vacuum process chamber31: Loading chamber32: Degassing chamber33: Cleaning chamber34: First coating chamber35: Second coating chamber36: Buffer chamber37: Unloading chamber4: Rotating device41: First rotary chamber411: Rear opening412: Front opening413: Side opening414: Rotating module415: Head end416: Tail end42: Second rotary chamber421: Rear opening422: Front opening423: Side opening424: Rotating module425: Head end426: Tail end43: Relay chamber5: Reflow device9: Object to be platedL1: First axisL2: Second axis

Claims (18)

Translated fromChinese

一種旋轉移載式立式鍍膜設備，適用於一直立設置的待鍍物，定義一第一軸線及一第二軸線，該旋轉移載式立式鍍膜設備包含：複數真空製程腔，分別設置於該第一軸線及該第二軸線上，且能容置及沿該第一軸線及該第二軸線輸送該待鍍物，每一真空製程腔進行單向加工；及一旋轉裝置，包括：一第一旋轉腔，設置於該第一軸線上，並具有一位於該第一軸線且連接其中一真空製程腔的後開口、一位於該第一軸線與該第二軸線之間的側開口，及一能容置且可驅動該待鍍物旋轉並具有一頭端及一尾端的旋轉模組，該旋轉模組能以該頭端朝向該後開口、以該尾端朝向該後開口，及以該頭端及該尾端的其中之一朝向該側開口，該待鍍物能自該旋轉模組的頭端或尾端移入及移出，並可往復進入該第一旋轉腔及與該第一旋轉腔連接的該真空製程腔，且可受該旋轉模組翻轉180度後返回同一個該真空製程腔，以使該待鍍物的相反兩面可受該真空製程腔加工，及一第二旋轉腔，設置於該第二軸線上，並具有一位於該第二軸線且連接其中另一真空製程腔的後開口、一位於該第一軸線與該第二軸線之間且對應該第一旋轉腔的側開口，及一能容置且可驅動該待鍍物旋轉並具有一頭端及一尾端的旋轉模組，該旋轉模組能以該頭端朝向該後開口、以該尾端朝向該後開口，及以該頭端及該尾端的其中之一朝向該側開口，該待鍍物能自該旋轉模組的頭端或尾端移入及移出，並可往復進入該第二旋轉腔及與該第二旋轉腔連接的該真空製程腔，且可受該旋轉模組翻轉180度後返回同一個該真空製程腔，以使該待鍍物的相反兩面可受該真空製程腔加工。A rotary transfer type vertical coating equipment is applicable to a vertically arranged object to be coated, defining a first axis and a second axis, and comprising: a plurality of vacuum process chambers, respectively arranged on the first axis and the second axis, and capable of accommodating and conveying the object to be coated along the first axis and the second axis, each vacuum process chamber performing unidirectional processing; and a rotary device, comprising: a first rotary chamber, arranged on the first axis, and having a first axis and a second axis. A rotary module connected to the rear opening of one of the vacuum process chambers, a side opening between the first axis and the second axis, and a rotary module capable of accommodating and driving the object to be plated to rotate and having a head end and a tail end. The rotary module can face the rear opening with the head end, face the rear opening with the tail end, and face the side opening with one of the head end and the tail end. The object to be plated can be moved in and out from the head end or the tail end of the rotary module, and can reciprocate into and out of the first rotary chamber and with the first rotary chamber. The vacuum process chamber connected to the first rotary chamber can be rotated 180 degrees by the rotary module and then returned to the same vacuum process chamber so that the opposite sides of the object to be plated can be processed by the vacuum process chamber, and a second rotary chamber is arranged on the second axis and has a rear opening located on the second axis and connected to another vacuum process chamber, a side opening located between the first axis and the second axis and corresponding to the first rotary chamber, and a rotating chamber that can accommodate and drive the object to be plated to rotate and has a head end and a tail end. The rotating module at the first end and the second end can face the rear opening, the rear end can face the rear opening, and one of the first end and the rear end can face the side opening. The object to be plated can be moved in and out from the first end or the rear end of the rotating module, and can reciprocate into the second rotating chamber and the vacuum process chamber connected to the second rotating chamber, and can be turned 180 degrees by the rotating module and return to the same vacuum process chamber, so that the opposite sides of the object to be plated can be processed by the vacuum process chamber.如請求項1所述的旋轉移載式立式鍍膜設備，其中，該第一旋轉腔還具有一前開口，該等真空製程腔的其中之二分別連接於該第一旋轉腔的該前開口及該後開口，該旋轉模組還能以該頭端朝向該前開口，及以該尾端朝向該前開口。As described in claim 1, the first rotary chamber also has a front opening, two of the vacuum process chambers are respectively connected to the front opening and the rear opening of the first rotary chamber, and the rotary module can also face the front opening with the head end and the front opening with the tail end.如請求項2所述的旋轉移載式立式鍍膜設備，其中，該第一軸線與該第二軸線平行，該第一旋轉腔的該前開口及該後開口皆位於該第一軸線上，且相反設置於該旋轉模組的兩相反側。As described in claim 2, the rotary transfer type vertical coating equipment, wherein the first axis is parallel to the second axis, the front opening and the rear opening of the first rotary chamber are both located on the first axis, and are arranged on opposite sides of the rotary module.如請求項1、請求項2或請求項3所述的旋轉移載式立式鍍膜設備，其中，連接該第一旋轉腔的其中一真空製程腔用於清潔。The rotary transfer vertical coating device as described in claim 1, claim 2 or claim 3, wherein one of the vacuum process chambers connected to the first rotary chamber is used for cleaning.如請求項2或請求項3所述的旋轉移載式立式鍍膜設備，其中，連接該第一旋轉腔的其中二真空製程腔分別用於除氣及清潔。The rotary transfer vertical coating equipment as described in claim 2 or claim 3, wherein two of the vacuum process chambers connected to the first rotary chamber are used for degassing and cleaning respectively.如請求項1所述的旋轉移載式立式鍍膜設備，其中，該第二旋轉腔還具有一前開口，該等真空製程腔的其中之二分別連接於該第二旋轉腔的該前開口及該後開口，該旋轉模組還能以該頭端朝向該前開口，及以該尾端朝向該前開口。As described in claim 1, the second rotary chamber also has a front opening, two of the vacuum process chambers are respectively connected to the front opening and the rear opening of the second rotary chamber, and the rotary module can also face the front opening with the head end and the front opening with the tail end.如請求項6所述的旋轉移載式立式鍍膜設備，其中，該第一軸線與該第二軸線平行，該第二旋轉腔的該前開口及該後開口皆位於該第二軸線上，且相反設置於該旋轉模組的兩相反側。As described in claim 6, the rotary transfer type vertical coating equipment, wherein the first axis is parallel to the second axis, the front opening and the rear opening of the second rotary chamber are both located on the second axis, and are arranged on opposite sides of the rotary module.如請求項1、請求項6或請求項7所述的旋轉移載式立式鍍膜設備，其中，連接該第二旋轉腔的其中一真空製程腔用於鍍膜。The rotary transfer vertical film coating equipment as described in claim 1, claim 6 or claim 7, wherein one of the vacuum process chambers connected to the second rotary chamber is used for film coating.如請求項6或請求項7所述的旋轉移載式立式鍍膜設備，其中，連接該第二旋轉腔的其中二真空製程腔分別用於鍍鈦及鍍銅。The rotary transfer vertical film plating equipment as described in claim 6 or claim 7, wherein two of the vacuum process chambers connected to the second rotary chamber are used for titanium plating and copper plating respectively.如請求項1所述的旋轉移載式立式鍍膜設備，其中，該第一旋轉腔還具有一前開口及一外開口，該等真空製程腔的其中三者分別連接於該第一旋轉腔的該前開口、該後開口及該外開口，該旋轉模組還能以該頭端朝向該前開口、以該尾端朝向該前開口、以該頭端朝向該外開口，及以該尾端朝向該外開口。As described in claim 1, the first rotary chamber also has a front opening and an outer opening, three of the vacuum process chambers are respectively connected to the front opening, the rear opening and the outer opening of the first rotary chamber, and the rotary module can also face the front opening with the head end, the front opening with the tail end, the outer opening with the head end, and the outer opening with the tail end.如請求項1所述的旋轉移載式立式鍍膜設備，其中，該第二旋轉腔還具有一前開口及一外開口，該等真空製程腔的其中三者分別連接於該第二旋轉腔的該前開口、該後開口及該外開口，該旋轉模組還能以該頭端朝向該前開口、以該尾端朝向該前開口、以該頭端朝向該外開口，及以該尾端朝向該外開口。As described in claim 1, the second rotary chamber also has a front opening and an outer opening, three of the vacuum process chambers are respectively connected to the front opening, the rear opening and the outer opening of the second rotary chamber, and the rotary module can also face the front opening with the head end, the front opening with the tail end, the outer opening with the head end, and the outer opening with the tail end.如請求項1所述的旋轉移載式立式鍍膜設備，該旋轉裝置還包括一位於該第一旋轉腔及該第二旋轉腔之間的中繼腔，該中繼腔連通於該第一旋轉腔的側開口及該第二旋轉腔的側開口。As described in claim 1, the rotary transfer type vertical coating equipment, the rotary device also includes a relay chamber between the first rotary chamber and the second rotary chamber, the relay chamber is connected to the side opening of the first rotary chamber and the side opening of the second rotary chamber.如請求項1所述的旋轉移載式立式鍍膜設備，其中，當該第二旋轉腔的旋轉模組的該頭端朝向該後開口或當該尾端朝向該後開口時，該待鍍物皆位於該第二軸線上。The rotary transfer vertical coating device as described in claim 1, wherein when the head end of the rotary module of the second rotary chamber faces the rear opening or when the tail end faces the rear opening, the object to be plated is located on the second axis.如請求項1所述的旋轉移載式立式鍍膜設備，適用於二直立設置的待鍍物，其中，該旋轉裝置的該第二旋轉腔能同時容置該等待鍍物。The rotary transfer vertical coating device as described in claim 1 is suitable for two vertically arranged objects to be coated, wherein the second rotary chamber of the rotary device can simultaneously accommodate the objects to be coated.如請求項14所述的旋轉移載式立式鍍膜設備，其中，該等真空製程腔的其中之二連接於該第二旋轉腔的後開口，每一真空製程腔容置個別的待鍍物。As described in claim 14, the rotary transfer type vertical film coating equipment, wherein two of the vacuum process chambers are connected to the rear opening of the second rotary chamber, and each vacuum process chamber contains a separate object to be plated.如請求項1所述的旋轉移載式立式鍍膜設備，還包含一回流裝置，該回流裝置跨設在該第一軸線及該第二軸線上，且與該旋轉裝置沿該第一軸線的延伸方向間隔設置。The rotary transfer vertical coating device as described in claim 1 further includes a reflow device, which is arranged across the first axis and the second axis and is spaced apart from the rotary device along the extension direction of the first axis.一種雙面多層膜的鍍膜方法，適用於利用複數真空製程腔對一直立設置的待鍍物進行雙面鍍膜，該雙面多層膜的鍍膜方法包含下列步驟：(A)輸送該待鍍物至其中一真空製程腔，該其中一真空製程腔連接一旋轉腔並與該旋轉腔沿一軸線排列，該旋轉腔包括一後開口及一側開口，該後開口連接於該其中一真空製程腔，且該後開口與該側開口不同時位於該軸線上；(B)於該其中一真空製程腔內對該待鍍物的其中一個面進行除氣、清潔及濺鍍鍍膜的其中一種加工；(C)將該待鍍物自該其中一真空製程腔輸送至該旋轉腔，並於該旋轉腔將該待鍍物旋轉180度後，將該待鍍物自該旋轉腔輸送回該其中一真空製程腔；(D)於該其中一真空製程腔內對該待鍍物的其中另一面進行相同於步驟(B)的加工；(E)將該待鍍物自該其中一真空製程腔輸送至該旋轉腔，且於該旋轉腔內旋轉該待鍍物並朝向該側開口後，將該待鍍物自該側開口移出該旋轉腔；及(F)將該待鍍物移入其中另一真空製程腔。A double-sided multi-layer film coating method is suitable for double-sided coating of a vertically arranged object to be coated using a plurality of vacuum process chambers. The double-sided multi-layer film coating method comprises the following steps: (A) transporting the object to be coated to one of the vacuum process chambers, wherein the one of the vacuum process chambers is connected to a rotary chamber and arranged along an axis with the rotary chamber, wherein the rotary chamber comprises a rear opening and a side opening, wherein the rear opening is connected to the one of the vacuum process chambers, and the rear opening and the side opening are not located on the axis at the same time; (B) degassing, cleaning and sputter coating are performed on one of the surfaces of the object to be coated in the one of the vacuum process chambers. (C) transporting the object to be plated from one of the vacuum process chambers to the rotary chamber, and after rotating the object to be plated 180 degrees in the rotary chamber, transporting the object to be plated from the rotary chamber back to one of the vacuum process chambers; (D) performing the same processing as step (B) on the other side of the object to be plated in one of the vacuum process chambers; (E) transporting the object to be plated from one of the vacuum process chambers to the rotary chamber, and after rotating the object to be plated in the rotary chamber and facing the side opening, moving the object to be plated out of the rotary chamber through the side opening; and (F) moving the object to be plated into another of the vacuum process chambers.一種雙面多層膜的鍍膜方法，適用於利用複數真空製程腔及一旋轉腔對一直立設置的待鍍物進行雙面鍍膜，該雙面多層膜的鍍膜方法包含下列步驟：(A)輸送該待鍍物進入至該旋轉腔，該旋轉腔與其中一真空製程腔沿一軸線排列，該旋轉腔包括一後開口及一側開口，該後開口連接於該其中一真空製程腔，該側開口不位於該軸線上，該待鍍物自該側開口進入；(B)該旋轉腔旋轉該待鍍物，並使其自該後開口輸送至該其中一真空製程腔，並於該其中一真空製程腔內對該待鍍物的其中一個面進行除氣、清潔及濺鍍鍍膜的其中一種加工；(C)將該待鍍物自該其中一真空製程腔輸送至該旋轉腔，並於該旋轉腔將該待鍍物旋轉180度後，將該待鍍物自該旋轉腔輸送回該其中一真空製程腔；(D)於該其中一真空製程腔內對該待鍍物的其中另一面進行相同於步驟(B)的加工；(E)將該待鍍物移入其中另一真空製程腔。A double-sided multi-layer film coating method is applicable to double-sided film coating of a vertically arranged object to be coated using a plurality of vacuum process chambers and a rotating chamber. The double-sided multi-layer film coating method comprises the following steps: (A) transporting the object to be coated into the rotating chamber, wherein the rotating chamber and one of the vacuum process chambers are arranged along an axis, the rotating chamber comprises a rear opening and a side opening, the rear opening is connected to one of the vacuum process chambers, the side opening is not located on the axis, and the object to be coated enters from the side opening; (B) the rotating chamber rotates the object to be coated and transports it from the rear opening. (C) transporting the object to be plated from one of the vacuum process chambers to the rotating chamber, rotating the object to be plated 180 degrees in the rotating chamber, and then transporting the object to be plated from the rotating chamber back to one of the vacuum process chambers; (D) performing the same processing as step (B) on another surface of the object to be plated in one of the vacuum process chambers; (E) moving the object to be plated into another of the vacuum process chambers.

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