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TWI319776B - Silver alloy material, circuit substrate, electronic device, and method for manufacturing circuit substrate - Google Patents

Silver alloy material, circuit substrate, electronic device, and method for manufacturing circuit substrate

Info

Publication number
TWI319776B
TWI319776BTW093121925ATW93121925ATWI319776BTW I319776 BTWI319776 BTW I319776BTW 093121925 ATW093121925 ATW 093121925ATW 93121925 ATW93121925 ATW 93121925ATW I319776 BTWI319776 BTW I319776B
Authority
TW
Taiwan
Prior art keywords
circuit substrate
electronic device
alloy material
silver alloy
manufacturing
Prior art date
Application number
TW093121925A
Other languages
Chinese (zh)
Other versions
TW200505310A (en
Inventor
Yuhichi Saitoh
Akiyoshi Fujii
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2004185264Aexternal-prioritypatent/JP4498835B2/en
Priority claimed from JP2004185228Aexternal-prioritypatent/JP4421394B2/en
Application filedfiledCritical
Publication of TW200505310ApublicationCriticalpatent/TW200505310A/en
Application grantedgrantedCritical
Publication of TWI319776BpublicationCriticalpatent/TWI319776B/en

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TW093121925A2003-07-232004-07-22Silver alloy material, circuit substrate, electronic device, and method for manufacturing circuit substrateTWI319776B (en)

Applications Claiming Priority (4)

Application NumberPriority DateFiling DateTitle
JP20032008152003-07-23
JP20032008062003-07-23
JP2004185264AJP4498835B2 (en)2003-07-232004-06-23 Circuit board, manufacturing method thereof, and electronic device
JP2004185228AJP4421394B2 (en)2003-07-232004-06-23 Silver alloy material, circuit board, electronic device, and method of manufacturing circuit board

Publications (2)

Publication NumberPublication Date
TW200505310A TW200505310A (en)2005-02-01
TWI319776Btrue TWI319776B (en)2010-01-21

Family

ID=34084641

Family Applications (1)

Application NumberTitlePriority DateFiling Date
TW093121925ATWI319776B (en)2003-07-232004-07-22Silver alloy material, circuit substrate, electronic device, and method for manufacturing circuit substrate

Country Status (4)

CountryLink
US (1)US20050019203A1 (en)
KR (2)KR100677805B1 (en)
CN (1)CN100339914C (en)
TW (1)TWI319776B (en)

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KR20070019458A (en)*2005-08-122007-02-15삼성전자주식회사 Wiring, its formation method, thin film transistor substrate and its manufacturing method
US7872022B2 (en)*2006-04-032011-01-18Hoffmann-La Roche Inc.Serotonin transporter (SERT) inhibitors for the treatment of depression and anxiety
JP5257965B2 (en)*2006-04-252013-08-07独立行政法人物質・材料研究機構 Method for producing alloy fine particle colloid
EP2185304B1 (en)*2007-09-072013-07-17E. I. du Pont de Nemours and CompanyMethod for the production of a multi-element alloy powder containing silver and at least two non-silver containing elements
JP4636128B2 (en)*2008-06-242011-02-23ソニー株式会社 Input device and display device with input function
JP2010225572A (en)*2008-11-102010-10-07Kobe Steel Ltd Reflective anode electrode and wiring film for organic EL display
EP2325848B1 (en)2009-11-112017-07-19Samsung Electronics Co., Ltd.Conductive paste and solar cell
KR101741683B1 (en)2010-08-052017-05-31삼성전자주식회사Conductive paste and electronic device and solar cell including an electrode formed using the conductive paste
US8668847B2 (en)2010-08-132014-03-11Samsung Electronics Co., Ltd.Conductive paste and electronic device and solar cell including an electrode formed using the conductive paste
US8987586B2 (en)2010-08-132015-03-24Samsung Electronics Co., Ltd.Conductive paste and electronic device and solar cell including an electrode formed using the conductive paste
US8974703B2 (en)2010-10-272015-03-10Samsung Electronics Co., Ltd.Conductive paste and electronic device and solar cell including an electrode formed using the same
US8652860B2 (en)2011-01-092014-02-18Bridgelux, Inc.Packaging photon building blocks having only top side connections in a molded interconnect structure
US9461023B2 (en)*2011-10-282016-10-04Bridgelux, Inc.Jetting a highly reflective layer onto an LED assembly
US9105370B2 (en)2011-01-122015-08-11Samsung Electronics Co., Ltd.Conductive paste, and electronic device and solar cell including an electrode formed using the same
US8940195B2 (en)2011-01-132015-01-27Samsung Electronics Co., Ltd.Conductive paste, and electronic device and solar cell including an electrode formed using the same
SE536911C2 (en)*2011-02-092014-10-28Impact Coatings Ab Material for providing an electrically conductive contact layer, a contact element with such layer, method for providing the contact element, and use of the material
EP2800146A1 (en)*2013-05-032014-11-05Saint-Gobain Glass FranceBack contact substrate for a photovoltaic cell or module
EP2800145B1 (en)*2013-05-032018-11-21Saint-Gobain Glass FranceBack contact substrate for a photovoltaic cell or module
CN104419844A (en)*2013-08-232015-03-18光洋应用材料科技股份有限公司Silver alloy material
JP5924609B2 (en)*2013-12-032016-05-25国立大学法人山形大学 Method for producing metal thin film and method for producing conductive structure
JP5850077B2 (en)*2014-04-092016-02-03三菱マテリアル株式会社 Ag alloy film and sputtering target for forming Ag alloy film
EP3168325B1 (en)2015-11-102022-01-05Materion Advanced Materials Germany GmbHSilver alloy based sputter target
US10504999B2 (en)*2018-03-152019-12-10Taiwan Semiconductor Manufacturing Co., Ltd.Forming semiconductor structures with semimetal features
JP7062528B2 (en)*2018-06-142022-05-06株式会社ジャパンディスプレイ Semiconductor device

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AUPM365594A0 (en)*1994-02-021994-02-24Australian National University, TheMethod and apparatus for coating a substrate
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JP2001237279A (en)*2000-02-232001-08-31Hitachi Ltd Semiconductor device and electronic device using the same
JP2002111001A (en)*2000-09-292002-04-12Toshiba Corp Wiring board and method of manufacturing wiring board
JP4646415B2 (en)*2001-02-082011-03-09株式会社倉元製作所 Ag-based thin film
JP3856386B2 (en)*2001-03-162006-12-13石福金属興業株式会社 Sputtering target material
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JP2003080694A (en)*2001-06-262003-03-19Seiko Epson Corp Film pattern forming method, film pattern forming apparatus, conductive film wiring, electro-optical device, electronic equipment, and non-contact card medium
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Also Published As

Publication numberPublication date
KR100677805B1 (en)2007-02-02
KR20060041198A (en)2006-05-11
CN100339914C (en)2007-09-26
TW200505310A (en)2005-02-01
CN1577637A (en)2005-02-09
KR20050012154A (en)2005-01-31
US20050019203A1 (en)2005-01-27
KR100960181B1 (en)2010-05-26

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Legal Events

DateCodeTitleDescription
MM4AAnnulment or lapse of patent due to non-payment of fees

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