本設計之物品是反應管，係在基板處理裝置中，將排列成複數層的基板收容在內部，且在既定的氣體氛圍下進行處理的反應管。The article of this design is a reaction tube, which is a reaction tube in which substrates arranged in multiple layers are accommodated in a substrate processing device and processed under a predetermined gas atmosphere.
立體圖中，未呈現在其他六視圖中的細線，皆為用表現立體表面之形狀的線條。In the three-dimensional diagram, the fine lines that are not shown in the other six views are all lines used to express the shape of the three-dimensional surface.
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022-004140 | 2022-03-01 | ||
| JP2022004140FJP1731878S (en) | 2022-03-01 | 2022-03-01 |
| Publication Number | Publication Date |
|---|---|
| TWD230586Strue TWD230586S (en) | 2024-04-01 |
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW111302869FTWD230586S (en) | 2022-03-01 | 2022-06-15 | reaction tube |
| Country | Link |
|---|---|
| US (1) | USD1022905S1 (en) |
| JP (1) | JP1731878S (en) |
| TW (1) | TWD230586S (en) |
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD1042340S1 (en)* | 2021-09-15 | 2024-09-17 | Kokusai Electric Corporation | Tubular reactor |
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWD166710S (en) | 2013-07-08 | 2015-03-21 | 日立國際電氣股份有限公司 | reaction tube |
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD405429S (en)* | 1997-01-31 | 1999-02-09 | Tokyo Electron Limited | Processing tube for use in a semiconductor wafer heat processing apparatus |
| USD424024S (en)* | 1997-01-31 | 2000-05-02 | Tokyo Electron Limited | Quartz process tube |
| USD405431S (en)* | 1997-08-20 | 1999-02-09 | Tokyo Electron Ltd. | Tube for use in a semiconductor wafer heat processing apparatus |
| JP3985899B2 (en)* | 2002-03-28 | 2007-10-03 | 株式会社日立国際電気 | Substrate processing equipment |
| TWD118408S1 (en)* | 2006-02-20 | 2007-08-01 | 東京威力科創股份有限公司 | Processing tubes for semiconductor manufacturing |
| USD600659S1 (en)* | 2006-09-12 | 2009-09-22 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
| TWD127410S1 (en)* | 2007-04-20 | 2009-02-11 | 東京威力科創股份有限公司 | Process tubes for semiconductor manufacturing |
| TWD125601S (en)* | 2007-05-08 | 2008-10-21 | 東京威力科創股份有限公司 | Processing tubes for semiconductor manufacturing |
| TWD133943S1 (en) | 2008-05-09 | 2010-03-21 | 日立國際電氣股份有限公司 | Reaction tube |
| USD742339S1 (en) | 2014-03-12 | 2015-11-03 | Hitachi Kokusai Electric Inc. | Reaction tube |
| JP1534828S (en)* | 2015-02-23 | 2015-10-13 | ||
| JP1535455S (en)* | 2015-02-25 | 2015-10-19 | ||
| JP1546345S (en)* | 2015-09-04 | 2016-03-22 | ||
| JP1546512S (en)* | 2015-09-04 | 2016-03-22 |
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWD166710S (en) | 2013-07-08 | 2015-03-21 | 日立國際電氣股份有限公司 | reaction tube |
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD1042340S1 (en)* | 2021-09-15 | 2024-09-17 | Kokusai Electric Corporation | Tubular reactor |
| Publication number | Publication date |
|---|---|
| JP1731878S (en) | 2022-12-09 |
| USD1022905S1 (en) | 2024-04-16 |
| Publication | Publication Date | Title |
|---|---|---|
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