本發明涉及一種樣品觀測設備。更確切地說，本發明涉及一種能夠在大氣壓狀態下觀測並分析樣品的包含掃描電子顯微鏡的樣品觀測設備。The invention relates to a sample observation device. More specifically, the present invention relates to a sample observation apparatus including a scanning electron microscope capable of observing and analyzing a sample under atmospheric pressure.
隨著近來對顯示器襯底、太陽能電池襯底、半導體晶片的需求及顯示器襯底、太陽能電池襯底、半導體晶片的大小日趨增加，在其生產中投入很多精力以增加穩定性。為了生產此類大型襯底，檢查並分析大型襯底的缺陷為必需工藝。為了分析在此類襯底中產生的粒子的大小、形態及成分以及其類似者，通常使用掃描電子顯微鏡。在第10-2008-0071793號韓國專利公開案等中揭露了將掃描電子顯微鏡用於半導體生產的相關技術。With the recent increase in the demand for display substrates, solar cell substrates, semiconductor wafers, and display substrates, solar cell substrates, and semiconductor wafers, much effort has been devoted to the production to increase stability. In order to produce such a large substrate, it is necessary to inspect and analyze defects of a large substrate. In order to analyze the size, morphology and composition of particles produced in such substrates and the like, scanning electron microscopy is generally used. A related art for using a scanning electron microscope for semiconductor production is disclosed in Korean Patent Publication No. 10-2008-0071793 and the like.
圖1為說明根據相關技術的掃描電子顯微鏡1的示意圖。FIG. 1 is a schematic view illustrating a scanning electron microscope 1 according to the related art.
參考圖1，相關技術SEM 1可包含SEM鏡筒10及SEM腔室20。SEM鏡筒10包含發出電子束的振盪單元11；控制自振盪單元11發出的電子的量以及電子束大小的包含聚光透鏡及孔隙的光學單元12；調整圖像的焦點的物鏡；以及照射已穿過光學單元12的電子束到樣品21的處理單元13，且SEM腔室包含樣品裝設於上面的平臺22、用於檢測圖像的檢測器23，以及用於自SEM 1的內部移除氣體分子的真空泵24。Referring to FIG. 1, the related art SEM 1 may include a SEM barrel 10 and an SEM chamber 20. The SEM barrel 10 includes an oscillating unit 11 that emits an electron beam; an optical unit 12 that controls the amount of electrons emitted from the oscillating unit 11 and a beam size including a condensing lens and an aperture; an objective lens that adjusts a focus of the image; Through the optical singleThe electron beam of element 12 is directed to processing unit 13 of sample 21, and the SEM chamber contains a platform 22 on which the sample is mounted, a detector 23 for detecting an image, and a gas molecule for removing gas from the inside of SEM 1. Vacuum pump 24.
在SEM 1中，由於樣品21應安置於處於真空狀態的SEM 1內部，因此存在如下限制：難以觀測在真空狀態下保持原始狀態有困難的樣品(例如，在真空狀態下保持其形態有困難的液體)。In the SEM 1, since the sample 21 should be placed inside the SEM 1 in a vacuum state, there is a limitation that it is difficult to observe a sample which is difficult to maintain the original state under a vacuum state (for example, it is difficult to maintain its morphology under vacuum). liquid).
並且，由於樣品應裝載於SEM腔室20內部，因此存在如下限制：SEM腔室20的大小應增加以便觀測大型樣品，或者將大型樣品切割或分成小型樣品以安置於SEM腔室20內部。Also, since the sample should be loaded inside the SEM chamber 20, there is a limitation that the size of the SEM chamber 20 should be increased to observe a large sample, or the large sample can be cut or divided into small samples to be placed inside the SEM chamber 20.
另外，當樣品為絕緣體樣品時，發生充電效應(其中電子在真空狀態下歸因於電子束而積聚於樣品的表面上以產生充電)，且因此充電使電子的軌道扭曲或偏轉，使得無法觀測到正常圖像。為了解決此限制，需要塗布例如鉑、金、碳或類似者的導體的膜的預處理工藝。然而，由於預處理工藝需要額外設備且包含幾個工藝，因此花費大量時間來觀測樣品。In addition, when the sample is an insulator sample, a charging effect occurs in which electrons accumulate on the surface of the sample due to electron beam in a vacuum state to generate charging, and thus charging causes the orbit of the electron to be distorted or deflected, making it impossible to observe To the normal image. In order to address this limitation, a pretreatment process of coating a film of a conductor such as platinum, gold, carbon or the like is required. However, since the pretreatment process requires additional equipment and contains several processes, it takes a lot of time to observe the sample.
本發明提供一種樣品觀測設備，其可並非在真空狀態而是在大氣壓狀態下觀測並分析樣品。The present invention provides a sample observation apparatus which can observe and analyze a sample not in a vacuum state but in an atmospheric pressure state.
本發明還提供一種樣品觀測設備，其可在不切割或劃分樣品的情況下觀測並分析處於原始狀態的樣品。The present invention also provides a sample observation apparatus which can observe and analyze a sample in an original state without cutting or dividing a sample.
本發明還提供一種樣品觀測設備，其可通過省略塗布例如鉑或類似者的導體的膜的預處理工藝來節省處理時間及成本。The present invention also provides a sample observation apparatus which can be omitted by omitting a coating exampleA pretreatment process for a film of a conductor such as platinum or the like to save processing time and cost.
根據示範性實施例，樣品觀測設備包含：工作臺；平臺，其定位於所述工作臺上且在大氣壓狀態下樣品裝設於所述平臺上；第一軸移動單元及第二軸移動單元，其定位於工作臺上且可與平臺一起在第一軸方向及與第一軸方向交叉的第二軸方向上相對移動；以及電子顯微鏡鏡筒，其連接至所述第一移動單元及所述第二軸移動單元以觀測樣品，且具有保持於真空狀態的內部。According to an exemplary embodiment, a sample observation apparatus includes: a table; a platform positioned on the table and mounted on the platform under atmospheric pressure; a first axis moving unit and a second axis moving unit, Positioning on the table and movable relative to the platform in a first axis direction and a second axis direction intersecting the first axis direction; and an electron microscope barrel coupled to the first mobile unit and the The second axis moves the unit to observe the sample and has an interior that is maintained in a vacuum state.
平臺可在第一軸方向及第二軸方向上移動，或第一軸移動單元及第二軸移動單元可在第一軸方向及第二軸方向上移動，且平臺可在上/下方向上移動，或第一軸移動單元及第二軸移動單元可在上/下方向上移動。The platform is movable in the first axis direction and the second axis direction, or the first axis moving unit and the second axis moving unit are movable in the first axis direction and the second axis direction, and the platform can be moved up/down Or the first axis moving unit and the second axis moving unit can move up/down.
第一軸移動單元和第二軸移動單元可包含可在第一軸方向上移動的第一軸移動單元，及可在第二軸方向上移動的第二軸移動單元，且電子顯微鏡鏡筒可安裝於第二軸移動單元中。The first axis moving unit and the second axis moving unit may include a first axis moving unit movable in the first axis direction, and a second axis moving unit movable in the second axis direction, and the electron microscope barrel may be Installed in the second axis moving unit.
電子顯微鏡鏡筒可在第一軸方向及第二軸方向上移動，以便在工作臺的大小範圍內安置於平臺的整個區域的任何位置處。The electron microscope barrel is movable in the first axial direction and the second axial direction so as to be placed at any position of the entire area of the platform within the size range of the table.
電子顯微鏡鏡筒可包含：發出電子束並使電子束照射到樣品的照射單元，及檢測自樣品發出的電子束、電子、能量及X射線中的任一者的信號的檢測器。The electron microscope barrel may include an irradiation unit that emits an electron beam and irradiates the electron beam to the sample, and a detector that detects a signal of any one of electron beams, electrons, energy, and X-rays emitted from the sample.
電子顯微鏡鏡筒可連接至真空泵，從而使其內部維持於真空狀態。The electron microscope barrel can be connected to a vacuum pump to maintain its internal vacuum.
電子顯微鏡鏡筒可通過移動平臺以及第一軸移動單元和第二軸移動單元中的任一者而定位於樣品上的預定位置處，且在大氣壓狀態下觀測樣品。The electron microscope barrel can be positioned at a predetermined position on the sample by the moving platform and any one of the first axis moving unit and the second axis moving unit, and the sample is observed under atmospheric pressure.
以上樣品觀測設備可更包含光學顯微鏡鏡筒，其連接至第一軸移動單元和第二軸移動單元而以低於電子顯微鏡鏡筒的放大率的放大率觀測樣品。The above sample observation apparatus may further include an optical microscope barrel connected to the first axis moving unit and the second axis moving unit to observe the sample at a magnification lower than that of the electron microscope barrel.
以上樣品觀測設備可更包含安置於工作臺下以防止工作臺振動的隔離器。The above sample observation apparatus may further include an isolator disposed under the workbench to prevent vibration of the workbench.
以上樣品觀測設備可更包含銷升/降單元，其提升多個支撐銷以裝載所述樣品，降低多個支撐銷以將所述樣品裝設於所述平臺內。The above sample observation apparatus may further include a pin up/down unit that lifts a plurality of support pins to load the sample, and reduces a plurality of support pins to mount the sample in the platform.
1‧‧‧掃描電子顯微鏡1‧‧‧ scanning electron microscope
10‧‧‧SEM鏡筒10‧‧‧SEM tube
11‧‧‧振盪單元11‧‧‧Oscillation unit
12‧‧‧光學單元12‧‧‧ Optical unit
13‧‧‧處理單元13‧‧‧Processing unit
20‧‧‧SEM腔室20‧‧‧ SEM chamber
21‧‧‧樣品21‧‧‧ samples
22‧‧‧平臺22‧‧‧ platform
23‧‧‧檢測器23‧‧‧Detector
24‧‧‧真空泵24‧‧‧vacuum pump
50‧‧‧樣品50‧‧‧ samples
100‧‧‧樣品觀測設備100‧‧‧Sample observation equipment
110‧‧‧工作臺110‧‧‧Workbench
120‧‧‧平臺120‧‧‧ platform
130‧‧‧第一軸移動單元130‧‧‧First axis mobile unit
131‧‧‧第一導軌131‧‧‧First rail
132‧‧‧第一可移動軌132‧‧‧First movable rail
140‧‧‧第二軸移動單元140‧‧‧Second axis mobile unit
141‧‧‧第二導軌141‧‧‧Second rail
142‧‧‧第二可移動軌142‧‧‧Second movable rail
150‧‧‧銷升/降單元150‧‧‧ pin up/down unit
151‧‧‧支撐銷151‧‧‧Support pin
160‧‧‧夾具160‧‧‧Clamp
200‧‧‧SEM鏡筒200‧‧‧SEM tube
201‧‧‧支撐托架201‧‧‧Support bracket
220‧‧‧真空泵220‧‧‧Vacuum pump
250‧‧‧SEM控制單元250‧‧‧SEM control unit
300‧‧‧光學顯微鏡鏡筒300‧‧‧Light microscope tube
301‧‧‧支撐托架301‧‧‧Support bracket
400‧‧‧隔離400‧‧‧Isolation
X、Y、Z‧‧‧軸方向X, Y, Z‧‧‧ axis direction
可從結合隨附圖式所作的以下描述中更詳細地理解示範性實施例，其中：圖1為說明根據相關技術的掃描電子顯微鏡的示意圖。The exemplary embodiments may be understood in more detail in the following description in conjunction with the accompanying drawings in which: FIG. 1 is a schematic diagram illustrating a scanning electron microscope according to the related art.
圖2為根據示範性實施例的樣品觀測設備的立體圖。2 is a perspective view of a sample observation device, according to an exemplary embodiment.
圖3為根據示範性實施例的樣品觀測設備的正視圖。FIG. 3 is a front view of a sample observation apparatus according to an exemplary embodiment.
圖4為根據示範性實施例的樣品觀測設備中的升/降單元的立體圖。4 is a perspective view of a rising/lowering unit in a sample observation apparatus, according to an exemplary embodiment.
圖5為說明根據示範性實施例的樣品觀測設備的掃描電子顯微鏡鏡筒及光學顯微鏡鏡筒的放大立體圖。FIG. 5 is an enlarged perspective view illustrating a scanning electron microscope barrel and an optical microscope barrel of a sample observation apparatus according to an exemplary embodiment.
圖6為說明根據本發明的示範性實施例的樣品觀測設備的掃描電子顯微鏡鏡筒及光學顯微鏡鏡筒的放大後向立體圖。6 is an enlarged rear perspective view illustrating a scanning electron microscope barrel and an optical microscope barrel of a sample observation apparatus according to an exemplary embodiment of the present invention.
在以下具體實施方式中，參考以實例說明的方式繪示可實踐本發明的具體實施例的隨附圖式。這些實施例描述得足夠詳細以使得所屬領域的技術人員能夠實踐本發明。應理解，儘管不同，但各種實施例不必相互排斥。舉例來說，本文中所描述的特定形狀、結構及特徵可以不同形式具體化而不偏離本發明的精神和範圍。此外，應理解，每一所揭露實施例內個別元件的位置或佈置可經修改而不偏離所主張標的物的精神和範圍。因此，以下詳細描述並非限制性的，而是僅受權利要求書(包含權利要求書的那些等效物)限制，只要恰當地描述了本發明的範圍。在諸圖中類似參考數位指示在各個方面相同或類似的功能，且元件的長度、面積、厚度及形狀為了描述方便起見可予以誇示。In the following detailed description, reference to the accompanying drawings These embodiments are described in sufficient detail to enable those skilled in the art to practice the invention. It should be understood that, although different, the various embodiments are not necessarily mutually exclusive. For example, the particular shapes, structures, and characteristics described herein may be embodied in various forms without departing from the spirit and scope of the invention. In addition, it should be understood that the location or arrangement of the individual elements in the disclosed embodiments may be modified without departing from the spirit and scope of the claimed subject matter. Therefore, the following detailed description is not to be construed as limiting the scope of the invention In the figures, like reference numerals indicate the same or similar functions in various aspects, and the length, area, thickness, and shape of the elements may be exaggerated for convenience of description.
下文中，將參看隨附圖式詳細地描述本發明的各種實施例，以便使得所屬領域的技術人員能夠容易地實踐本發明。Hereinafter, various embodiments of the present invention will be described in detail with reference to the accompanying drawings.
圖2為根據示範性實施例的樣品觀測設備100的立體圖，圖3為根據示範性實施例的樣品觀測設備100的正視圖，且圖4為根據示範性實施例的樣品觀測設備100中的升/降單元150的立體圖。2 is a perspective view of a sample observation apparatus 100 according to an exemplary embodiment, FIG. 3 is a front view of the sample observation apparatus 100 according to an exemplary embodiment, and FIG. 4 is a liter in the sample observation apparatus 100 according to an exemplary embodiment. A perspective view of the /down unit 150.
根據示範性實施例的樣品觀測設備100包含：工作臺110；平臺120，其定位於工作臺110上且樣品50在大氣壓狀態下裝設於所述平臺120上；第一軸移動單元130及第二軸移動單元140，其定位於工作臺110上且可在第一軸方向及與第一軸方向交叉的第二軸方向上相對移動；以及電子顯微鏡鏡筒，其連接至所述第一軸移動單元130及第二軸移動單元140從而觀測樣品50，且具有保持於真空狀態的內部。The sample observation apparatus 100 according to an exemplary embodiment includes: a stage 110; a platform 120 positioned on the stage 110 and the sample 50 is mounted on the stage 120 under atmospheric pressure; the first axis moving unit 130 and the a two-axis moving unit 140 positioned on the table 110 and movable relative to the first axis direction and the second axis direction crossing the first axis direction; and an electron microscope barrel connected to the first axis The moving unit 130 and the second axis moving unit 140 thereby observe the sample 50 and have an inside held in a vacuum state.
本文中，第一軸及第二軸為在同一平面上彼此交叉的軸，且例如，第一軸可為在X方向上延伸的X軸，且第二軸可為在Y方向上延伸的Y軸。當然，第一軸可為Y軸，且第二軸可為X軸。並且，在為垂直的且正交於第一軸和第二軸的方向上延伸的軸可為上/下方向軸。Herein, the first axis and the second axis are axes that cross each other on the same plane, and for example, the first axis may be an X axis extending in the X direction, and the second axis may be Y extending in the Y direction axis. Of course, the first axis can be the Y axis and the second axis can be the X axis. Also, the axis extending in a direction perpendicular to and orthogonal to the first axis and the second axis may be an up/down direction axis.
使平臺以及第一軸移動單元和第二軸移動單元相對移動可意謂：僅移動平臺，僅移動第一軸移動單元和第二軸移動單元，移動平臺以及第一和第二軸移動單元兩者。移動方向可為第一軸方向或第二軸方向。即，移動方向可為X軸方向或Y軸方向。當然，移動方向可為上/下方向。通過移動，在第一軸移動單元和第二軸移動單元中裝備的電子顯微鏡鏡筒可安置于平臺上方或平臺上的樣品上方的所要位置處。因此，電子顯微鏡鏡筒可在第一軸方向及第二軸方向中的任一者上移動，使得電子顯微鏡鏡筒在工作臺110的大小範圍內安置於平臺120的整個區上的所要位置處。工作臺及平臺的大小並不特別受限，但可變化。即，為了觀測作為樣品的例如玻璃面板的大型襯底，可使用大型平臺，且為了觀測作為樣品的小型樣本，可使用小的平臺。因此，根據示範性實施例的樣品觀測設備允許電子顯微鏡鏡筒觀測並分析樣品而不考慮樣品的大小及觀測位置。The relative movement of the platform and the first axis moving unit and the second axis moving unit may mean moving only the platform, moving only the first axis moving unit and the second axis moving unit, the moving platform and the first and second axis moving units By. The moving direction may be the first axis direction or the second axis direction. That is, the moving direction may be the X-axis direction or the Y-axis direction. Of course, the moving direction can be the up/down direction. By moving, the electron microscope barrel equipped in the first axis moving unit and the second axis moving unit can be placed at a desired position above the sample above the platform or on the platform. Therefore, the electron microscope barrel can be moved in either of the first axis direction and the second axis direction such that the electron microscope barrel is disposed at a desired position on the entire area of the stage 120 within the size range of the table 110. . The size of the workbench and platform is not particularly limited, but can vary. That is, for the viewA large substrate such as a glass panel is measured as a sample, a large platform can be used, and in order to observe a small sample as a sample, a small platform can be used. Therefore, the sample observation apparatus according to the exemplary embodiment allows the electron microscope barrel to observe and analyze the sample regardless of the size of the sample and the observation position.
下文中，將示範性地描述一種樣品觀測設備，其包含：具有對應於X軸的第一軸及對應於Y軸的第二軸的X及Y軸移動單元，以及安裝於Y軸移動單元中的電子顯微鏡鏡筒。當然，可以各種方式改變X軸方向及Y軸方向上的移動及電子顯微鏡鏡筒的安裝結構。並且，電子顯微鏡鏡筒用SEM鏡筒200例示。當然，電子顯微鏡鏡筒以及SEM鏡筒可改變至各種形式。Hereinafter, a sample observation apparatus including: an X and Y axis moving unit having a first axis corresponding to an X axis and a second axis corresponding to the Y axis, and being mounted in the Y axis moving unit will be exemplarily described Electron microscope tube. Of course, the movement in the X-axis direction and the Y-axis direction and the mounting structure of the electron microscope lens barrel can be changed in various ways. Further, the electron microscope barrel is exemplified by the SEM barrel 200. Of course, the electron microscope barrel and the SEM barrel can be changed to various forms.
參考圖2，根據示範性實施例的樣品觀測設備100包含工作臺110、平臺120、X軸移動單元130及Y軸移動單元140、銷升/降單元150、夾具160、SEM鏡筒200、光學顯微鏡鏡筒300以及隔離器400。Referring to FIG. 2, a sample observation apparatus 100 according to an exemplary embodiment includes a stage 110, a stage 120, an X-axis moving unit 130 and a Y-axis moving unit 140, a pin lifting/lowering unit 150, a jig 160, an SEM barrel 200, and optical The microscope barrel 300 and the isolator 400.
首先，工作臺110充當基底，其具有平坦頂表面、預定面積及厚度，且支撐稍後描述的平臺。工作臺110可為(例如)具有預定厚度的板。工作臺110安裝於框架結構上，所述框架結構相對於地面穩定地安裝以防止外部振動或衝擊。工作臺110的頂表面經精准地調整以成為水準表面，以便可靠地觀測並分析樣品。First, the stage 110 serves as a substrate having a flat top surface, a predetermined area, and a thickness, and supports a platform described later. Workbench 110 can be, for example, a plate having a predetermined thickness. The table 110 is mounted on a frame structure that is stably mounted with respect to the ground to prevent external vibration or shock. The top surface of the table 110 is precisely adjusted to become a level surface for reliable observation and analysis of the sample.
樣品50裝設於上面且支撐裝設於上面的樣品50的平臺120安裝於工作臺110上。樣品50在大氣壓狀態下裝設於平臺120上。平臺120可包含具有恰當大小(例如，大於或等於樣品50的大小的大小)從而裝設樣品50的板。並且，平臺120可具有對應於樣品50的形狀的形狀。The sample 50 is mounted thereon and the platform 120 supporting the sample 50 mounted thereon is mounted on the table 110. The sample 50 is mounted on the platform 120 under atmospheric pressure.on. The platform 120 can include a plate having a suitable size (eg, a size greater than or equal to the size of the sample 50) to mount the sample 50. Also, the platform 120 may have a shape corresponding to the shape of the sample 50.
樣品50可在由機器人的臂(未圖示)支撐的狀態下移動到平臺120上方。當樣品50移動到平臺120上方時，包含于定位於平臺120下的銷升/降單元150中的多個支撐銷151(參見圖4)上升，且當多個支撐銷151上升時，機器人的臂下降，使得樣品50可裝設於多個支撐銷151上。當樣品50裝設於多個支撐銷151上時，多個支撐銷151下降，且因此樣品50可裝設於平臺120上並由平臺120支撐。多個支撐銷151可通過的多個孔洞(未圖示)可形成於平臺120中，使得多個支撐銷151可上升及下降。The sample 50 can be moved above the platform 120 in a state of being supported by an arm (not shown) of the robot. When the sample 50 moves over the platform 120, the plurality of support pins 151 (see FIG. 4) included in the pin lifting/lowering unit 150 positioned under the platform 120 rise, and when the plurality of support pins 151 rise, the robot The arms are lowered such that the sample 50 can be mounted on a plurality of support pins 151. When the sample 50 is mounted on the plurality of support pins 151, the plurality of support pins 151 are lowered, and thus the sample 50 can be mounted on the platform 120 and supported by the platform 120. A plurality of holes (not shown) through which the plurality of support pins 151 can pass can be formed in the platform 120 such that the plurality of support pins 151 can be raised and lowered.
裝設於平臺120上且由平臺120支撐的樣品50可由安裝於平臺120外部的夾具160對準。The sample 50 mounted on the platform 120 and supported by the platform 120 can be aligned by a clamp 160 mounted external to the platform 120.
與例如泵(未圖示)的泵送構件連通的多個抽吸孔洞(未圖示)可形成於平臺120中。抽吸孔洞抽吸在平臺120上對準的樣品50，使得樣品50穩定地裝設並支撐於平臺120上。A plurality of suction holes (not shown) that communicate with a pumping member such as a pump (not shown) may be formed in the platform 120. The suction holes draw the sample 50 aligned on the platform 120 such that the sample 50 is stably mounted and supported on the platform 120.
以直線形狀形成的一對X軸移動單元130可經安裝以在工作臺110的兩側上一起操作，以直線形狀形成的Y軸移動單元140的兩個末端連接至一對X軸移動單元130中的每一者，使得可通過X軸移動單元130的操作在工作臺110上移動Y軸移動單元140。A pair of X-axis moving units 130 formed in a linear shape may be mounted to operate together on both sides of the table 110, and both ends of the Y-axis moving unit 140 formed in a linear shape are connected to a pair of X-axis moving units 130 Each of them makes it possible to move the Y-axis moving unit 140 on the stage 110 by the operation of the X-axis moving unit 130.
x軸移動單元130包含第一導軌131及第一可移動軌132，Y軸移動單元140包含第二導軌141及第二可移動軌142，且可通過電動機(未圖示)的驅動力來驅動X軸移動單元130及Y軸移動單元140。The x-axis moving unit 130 includes a first rail 131 and a first movable rail 132. The Y-axis moving unit 140 includes a second rail 141 and a second movable rail 142, and can be driven by a driving force of a motor (not shown). The X-axis moving unit 130 and the Y-axis moving unit 140.
一對中且平行於X軸方向的第一導軌131安裝於工作臺110的在平臺120外部的一部分中，且沿著第一導軌131往復的第一可移動軌132可安裝於第一導軌131中。A pair of the first guide rails 131 that are parallel to the X-axis direction are mounted in a portion of the table 110 that is external to the platform 120, and the first movable rails 132 that reciprocate along the first rails 131 are mountable to the first rails 131. in.
第二導軌141可安裝於第一可移動軌132中以便平行于正交於第一導軌131的Y軸方向，且第二可移動軌142可安裝於第二導軌141中。The second rail 141 may be mounted in the first movable rail 132 so as to be parallel to the Y-axis direction orthogonal to the first rail 131, and the second movable rail 142 may be mounted in the second rail 141.
用於觀測樣品50的表面並分析樣品50的表面上的成分的SEM鏡筒200可安裝於第二可移動軌142上。安置於SEM鏡筒200的一個側表面上的支撐托架201耦合到第二可移動軌142，使得SEM鏡筒200可安裝於第二可移動軌142上。因此，由於第二可移動軌142經安裝以通過X軸移動單元130及Y軸移動單元140而可在X軸方向及Y軸方向上移動，因此SEM鏡筒200可一起在X軸方向及Y軸方向上移動。包含SEM鏡筒200的控制單元以及動力單元的SEM控制單元250可安裝於第二可移動軌142上。The SEM barrel 200 for observing the surface of the sample 50 and analyzing the composition on the surface of the sample 50 can be mounted on the second movable rail 142. A support bracket 201 disposed on one side surface of the SEM barrel 200 is coupled to the second movable rail 142 such that the SEM barrel 200 can be mounted on the second movable rail 142. Therefore, since the second movable rail 142 is mounted to be movable in the X-axis direction and the Y-axis direction by the X-axis moving unit 130 and the Y-axis moving unit 140, the SEM barrel 200 can be together in the X-axis direction and Y Move in the direction of the axis. A control unit including the SEM barrel 200 and a SEM control unit 250 of the power unit may be mounted on the second movable rail 142.
同時，光學顯微鏡鏡筒300可進一步安裝於第二可移動軌142上。安置於光學顯微鏡鏡筒300的一個側表面上的支撐托架301耦合至第二可移動軌142，使得光學顯微鏡鏡筒300可安裝於第二可移動軌142上。由於第二可移動軌142經安裝以通過X軸移動單元130及Y軸移動單元140而可在X軸方向及Y軸方向上移動，因此光學顯微鏡鏡筒300可與SEM鏡筒200一起在X軸方向及Y軸方向上移動。替代地，光學顯微鏡鏡筒300可安裝於SEM鏡筒200的側表面上。At the same time, the optical microscope barrel 300 can be further mounted on the second movable rail 142. A support bracket 301 disposed on one side surface of the optical microscope barrel 300 is coupled to the second movable rail 142 such that the optical microscope barrel 300 can be mountedOn the second movable rail 142. Since the second movable rail 142 is mounted to be movable in the X-axis direction and the Y-axis direction by the X-axis moving unit 130 and the Y-axis moving unit 140, the optical microscope barrel 300 can be together with the SEM barrel 200 at X Move in the axial direction and the Y-axis direction. Alternatively, the optical microscope barrel 300 may be mounted on a side surface of the SEM barrel 200.
隔離器400可安裝於樣品觀測設備100中以便防止工作臺120的振動。當使用SEM鏡筒200觀測樣品50時，發生極小振動的環境也會對樣品表面圖像的解析度具有影響。因此，隔離器400(較佳地主動隔離器)可安裝於工作臺110下以防止振動。The isolator 400 can be installed in the sample observation apparatus 100 in order to prevent vibration of the stage 120. When the sample 50 is observed using the SEM barrel 200, an environment in which extremely small vibrations occur also has an effect on the resolution of the sample surface image. Thus, the isolator 400 (preferably an active isolator) can be mounted under the table 110 to prevent vibration.
圖5和6為說明根據示範性實施例的樣品觀測設備的掃描電子顯微鏡鏡筒及光學顯微鏡鏡筒的放大立體圖及放大後向立體圖。5 and 6 are an enlarged perspective view and an enlarged rear perspective view illustrating a scanning electron microscope barrel and an optical microscope barrel of a sample observation apparatus according to an exemplary embodiment.
參考圖5和6，應理解，SEM鏡筒200具有與在圖1中示出的SEM 1相同的配置，不過SEM腔室20提供裝設樣品21的空間。Referring to Figures 5 and 6, it should be understood that the SEM barrel 200 has the same configuration as the SEM 1 shown in Figure 1, but the SEM chamber 20 provides space for mounting the sample 21.
因此，SEM鏡筒200包含：發出電子束並使電子束照射到樣品的照射單元；及檢測器，其檢測自樣品發出的電子束、電子、能量及X射線中的任一者的信號。即，SEM鏡筒200可包含：發出電子束的振盪單元11；控制自振盪單元11發出的電子量以及電子束的大小的包含聚光透鏡以及孔隙的光學單元12；以及調整圖像的焦點的物鏡；以及將已通過光學單元12的電子束照射至樣品21的處理單元13。Therefore, the SEM lens barrel 200 includes: an irradiation unit that emits an electron beam and irradiates the electron beam to the sample; and a detector that detects a signal of any one of electron beams, electrons, energy, and X-rays emitted from the sample. That is, the SEM barrel 200 may include: an oscillating unit 11 that emits an electron beam; an optical unit 12 that includes a condensing lens and an aperture that controls the amount of electrons emitted from the oscillating unit 11 and the size of the electron beam; and adjusts the focus of the image An objective lens; and a processing unit 13 that irradiates the electron beam that has passed through the optical unit 12 to the sample 21.
SEM鏡筒200中可包含二次電子(secondary electron，SE)檢測器、後向散射電子(backscattered electron，BSE)檢測器以及能量色散譜(energy dispersive spectroscopy，EDS)檢測器中的至少一者。因此，SEM鏡筒200可檢測二次電子(SE)或後向散射電子(BSE)的信號以觀測樣品50的表面，且EDS檢測器可檢測自樣品50發出的X射線以分析樣品50的成分。The SEM barrel 200 may include at least one of a secondary electron (SE) detector, a backscattered electron (BSE) detector, and an energy dispersive spectroscopy (EDS) detector. Therefore, the SEM barrel 200 can detect signals of secondary electrons (SE) or backscattered electrons (BSE) to observe the surface of the sample 50, and the EDS detector can detect X-rays emitted from the sample 50 to analyze the composition of the sample 50. .
SEM鏡筒200還可包含用於使其內部維持於真空狀態的真空泵220。尤其較佳的是安裝離子泵，所述離子泵不產生振動，可獲得低真空，且不使用油或汞以將其內部維持于清潔狀態。並且，真空泵220可具有小的大小以相鄰於照射單元安裝，且因此可易於與SEM鏡筒200一起移動。因此，根據根據本發明的樣品觀測設備，僅SEM鏡筒200內部維持於真空狀態，在大氣壓狀態下裝載樣品，且不必形成樣品與SEM鏡筒一體式地安置於其中的腔室。因此，根據本發明的樣品觀測設備可觀測並分析原始狀態的大型樣品而不切割或劃分大型樣品。The SEM barrel 200 may also include a vacuum pump 220 for maintaining its interior in a vacuum state. It is especially preferred to install an ion pump that does not generate vibration, achieves a low vacuum, and does not use oil or mercury to maintain its interior in a clean state. Also, the vacuum pump 220 may have a small size to be mounted adjacent to the irradiation unit, and thus may be easily moved together with the SEM barrel 200. Therefore, according to the sample observation apparatus according to the present invention, only the inside of the SEM barrel 200 is maintained in a vacuum state, the sample is loaded under an atmospheric pressure state, and it is not necessary to form a chamber in which the sample is integrally disposed with the SEM barrel. Therefore, the sample observation apparatus according to the present invention can observe and analyze a large sample in an original state without cutting or dividing a large sample.
如上文所描述，光學顯微鏡鏡筒300安裝於第二可移動軌142上，且可與SEM鏡筒200一起在X軸方向及Y軸方向上移動。SEM可以大約5,000到大約300,000的放大率觀測樣品，且光學顯微鏡可以低於SEM的放大率的約1到約100的放大率觀測樣品。當僅將SEM用以觀測大型樣品的特定部分時，可能難以找出大型樣品的觀測位置。因此，在本發明中，由於SEM鏡筒200及光學顯微鏡鏡筒300一起移動，因此首先通過具有相對低放大率的光學顯微鏡鏡筒300來指定大型樣品的觀測位置，且接著通過具有相對高放大率的SEM鏡筒200來精准地觀測大型樣品。因此，可更高效地觀測並分析樣品。As described above, the optical microscope barrel 300 is mounted on the second movable rail 142 and is movable together with the SEM barrel 200 in the X-axis direction and the Y-axis direction. The SEM can observe the sample at a magnification of about 5,000 to about 300,000, and the optical microscope can observe the sample at a magnification of about 1 to about 100 below the magnification of the SEM. When only the SEM is used to observe a specific portion of a large sample, it may be difficult to find the observation position of a large sample. Therefore, in the present invention, since the SEM barrel 200 and the optical microscope barrel 300 move together, the first pass has a relatively low magnification.The optical microscope barrel 300 of the rate is used to specify the observation position of the large sample, and then the large sample is accurately observed by the SEM barrel 200 having a relatively high magnification. Therefore, the sample can be observed and analyzed more efficiently.
同時，由於甚至SEM的極小振動仍可對樣品的表面觀測有影響，因此可通過以下操作來觀測並分析樣品：固定SEM鏡筒200且在X軸方向及Y軸方向上移動樣品裝設於的平臺120，以及使用X軸移動單元130及Y軸移動單元140移動SEM鏡筒200。為了在X軸方向及Y軸方向上移動平臺120，允許實現平臺120的線性移動的可移動區塊(未圖示)及固定區塊(未圖示)可進一步安裝於工作臺110的在平臺120外部的一部分。並且，平臺120可經配置以在Z軸方向上移動，以便調整樣品50與SEM鏡筒200之間的距離。At the same time, since even the small vibration of the SEM can affect the surface observation of the sample, the sample can be observed and analyzed by fixing the SEM barrel 200 and moving the sample in the X-axis direction and the Y-axis direction. The platform 120, and the SEM barrel 200 are moved using the X-axis moving unit 130 and the Y-axis moving unit 140. In order to move the platform 120 in the X-axis direction and the Y-axis direction, movable blocks (not shown) and fixed blocks (not shown) that allow linear movement of the platform 120 can be further mounted on the platform of the table 110. 120 part of the exterior. Also, the platform 120 can be configured to move in the Z-axis direction to adjust the distance between the sample 50 and the SEM barrel 200.
在根據示範性實施例的樣品觀測設備中，由於僅SEM的內部保持於真空狀態且在大氣壓狀態下安置樣品，因此有可能觀測並分析處於原始狀態的大型樣品。並且，由於在大氣壓狀態下不發生電子積聚於絕緣體樣品的表面上的充電效應，因此可省略塗布導體膜的預處理工藝以節省處理時間及成本。另外，由於可在大氣壓狀態下觀測並分析樣品，因此供觀測及分析的樣品的選擇範圍可拓寬到固體、液體、無機材料、有機材料、導體、絕緣體以及其類似者。In the sample observation apparatus according to the exemplary embodiment, since only the inside of the SEM is kept in a vacuum state and the sample is placed under an atmospheric pressure state, it is possible to observe and analyze a large sample in an original state. Moreover, since the charging effect of electrons accumulating on the surface of the insulator sample does not occur under the atmospheric pressure state, the pretreatment process of coating the conductor film can be omitted to save processing time and cost. In addition, since the sample can be observed and analyzed under atmospheric pressure, the range of samples for observation and analysis can be broadened to solids, liquids, inorganic materials, organic materials, conductors, insulators, and the like.
根據本發明的實施例，由於僅電子顯微鏡的內部保持於真空狀態，且樣品定位於並非在真空狀態而是在大氣壓狀態下的平臺上，因此有可能觀測並分析並非在真空狀態而是在大氣壓狀態下的樣品。According to an embodiment of the present invention, since only the inside of the electron microscope is maintained in a vacuum state, and the sample is positioned not in a vacuum state but in an atmospheric pressure stateOn the platform, it is therefore possible to observe and analyze samples that are not under vacuum but at atmospheric pressure.
並且，根據本發明的實施例，可在不切割或劃分的情況下觀測並分析在原始狀態下的大型樣品，且塗布例如鉑或類似者的導體的膜的預處理工藝被省略以節省處理時間及成本。Also, according to an embodiment of the present invention, a large sample in an original state can be observed and analyzed without cutting or dividing, and a pretreatment process of coating a film of a conductor such as platinum or the like is omitted to save processing time And cost.
另外，根據本發明的實施例，由於可在大氣壓狀態下觀測並分析樣品，因此供觀測並分析的樣品的選擇範圍可拓寬至液體、固體、無機材料、有機材料、導體、絕緣體及類似者。即，有可能用SEM直接觀測具有各種狀態及大小的樣品。Further, according to the embodiment of the present invention, since the sample can be observed and analyzed under the atmospheric pressure state, the selection range of the sample for observation and analysis can be broadened to liquid, solid, inorganic material, organic material, conductor, insulator, and the like. That is, it is possible to directly observe samples having various states and sizes by SEM.
儘管已參看具體實施例描述了樣品觀測設備，但本發明不限於此。因此，所屬領域的技術人員將容易理解，在不偏離通過所附申請專利範圍界定的本發明的精神和範圍的情況下，可以對其進行各種修改以及改變。應理解，此類修改及改變是在所附申請專利範圍的範圍內。Although the sample observation apparatus has been described with reference to the specific embodiments, the invention is not limited thereto. Accordingly, it will be readily understood by those skilled in the art that various modifications and changes may be made in the invention without departing from the spirit and scope of the invention. It is to be understood that such modifications and variations are within the scope of the appended claims.
50‧‧‧樣品50‧‧‧ samples
100‧‧‧樣品觀測設備100‧‧‧Sample observation equipment
110‧‧‧工作臺110‧‧‧Workbench
120‧‧‧平臺120‧‧‧ platform
130‧‧‧第一軸移動單元130‧‧‧First axis mobile unit
131‧‧‧第一導軌131‧‧‧First rail
132‧‧‧第一可移動軌132‧‧‧First movable rail
140‧‧‧第二軸移動單元140‧‧‧Second axis mobile unit
141‧‧‧第二導軌141‧‧‧Second rail
142‧‧‧第二可移動軌142‧‧‧Second movable rail
150‧‧‧銷升/降單元150‧‧‧ pin up/down unit
160‧‧‧夾具160‧‧‧Clamp
200‧‧‧SEM鏡筒200‧‧‧SEM tube
220‧‧‧真空泵220‧‧‧Vacuum pump
250‧‧‧SEM控制單元250‧‧‧SEM control unit
300‧‧‧光學顯微鏡鏡筒300‧‧‧Light microscope tube
400‧‧‧隔離器400‧‧‧Isolator
X、Y、Z‧‧‧軸方向X, Y, Z‧‧‧ axis direction
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020140029703AKR20150107939A (en) | 2014-03-13 | 2014-03-13 | Apparatus for observating specimen |
| Publication Number | Publication Date |
|---|---|
| TW201535459Atrue TW201535459A (en) | 2015-09-16 |
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW104108114ATW201535459A (en) | 2014-03-13 | 2015-03-13 | Specimen observing apparatus |
| Country | Link |
|---|---|
| JP (1) | JP2015176866A (en) |
| KR (1) | KR20150107939A (en) |
| CN (1) | CN104916515B (en) |
| TW (1) | TW201535459A (en) |
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107039694A (en)* | 2017-06-08 | 2017-08-11 | 合肥国轩高科动力能源有限公司 | Device and method for observing electrochemical reaction process of lithium ion battery pole piece |
| JP6916281B2 (en)* | 2018-02-22 | 2021-08-11 | アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ | Automatic limit dimension measurement method on display manufacturing substrate, display manufacturing large area substrate inspection method, display manufacturing large area substrate inspection device and its operation method |
| TWI697658B (en)* | 2019-03-05 | 2020-07-01 | 漢民科技股份有限公司 | Complex inspection system of image |
| KR102181456B1 (en)* | 2019-08-16 | 2020-11-23 | 참엔지니어링(주) | Inspecting apparatus, repairing apparatus and particle beam apparatus |
| KR102854783B1 (en)* | 2023-09-05 | 2025-09-04 | (주)코셈 | Color electron microscope, and its operation method |
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07130315A (en)* | 1993-10-29 | 1995-05-19 | Fujitsu Ltd | Getter pump and electron beam apparatus using the same |
| JPH10241620A (en)* | 1997-02-27 | 1998-09-11 | Nikon Corp | Environmentally controlled scanning electron microscope |
| US6198299B1 (en)* | 1998-08-27 | 2001-03-06 | The Micromanipulator Company, Inc. | High Resolution analytical probe station |
| US6337478B1 (en)* | 1998-11-06 | 2002-01-08 | Trek, Inc. | Electrostatic force detector with cantilever and shield for an electrostatic force microscope |
| JP2001084940A (en)* | 1999-09-13 | 2001-03-30 | Hitachi Ltd | Scanning electron microscope equipped with a sample exchange device |
| JP2001338603A (en)* | 2000-05-30 | 2001-12-07 | Hitachi Ltd | Observation condition support device for scanning electron microscope |
| JP2005291413A (en)* | 2004-04-01 | 2005-10-20 | Jeol Ltd | Vibration damping device |
| JP2007207683A (en)* | 2006-02-03 | 2007-08-16 | Tokyo Seimitsu Co Ltd | Electron microscope |
| JP2013115384A (en)* | 2011-11-30 | 2013-06-10 | Sony Corp | Substrate distortion measuring device, substrate distortion measuring method, and semiconductor device manufacturing method |
| KR101914231B1 (en)* | 2012-05-30 | 2018-11-02 | 삼성디스플레이 주식회사 | Inspection system using scanning electron microscope |
| CN202794696U (en)* | 2012-06-21 | 2013-03-13 | 上海华力微电子有限公司 | Sample table used for stereo optical microscope |
| JP6309195B2 (en)* | 2013-02-18 | 2018-04-11 | 株式会社ホロン | Scanning electron microscope and inspection device |
| Publication number | Publication date |
|---|---|
| JP2015176866A (en) | 2015-10-05 |
| CN104916515B (en) | 2017-04-12 |
| KR20150107939A (en) | 2015-09-24 |
| CN104916515A (en) | 2015-09-16 |
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