201219746 六、發明說明： 【發明所屬之技術領域】 本發明是有關於-種量測裝置，特別是指一種帽 雙進給軸量測裝置。 【先前技術】 如圖1所示’習知—種雙進給轴系統的動柱式龍門加 工機1包含二機台101、-位於該等機台ι〇ι之間的工作台 102、二分別沿向可移動地設置於該等機台⑻上的： 柱103、一沿Y軸向設置於該等立柱1〇3並可沿z軸向昇 降的橫向滑軌104、一沿γ轴向可移動地設置於該橫向滑軌 104的主軸頭1G5，及二分別驅動該等立柱⑻的導螺桿 106。-般而言，該等導螺桿刚纟製造時即會產生製造上 的誤差（例如節距上的誤差），加上該等導螺桿106的長度 又很長，因此，該等導螺桿1G6㈣累積產生的誤差，即 會造成該等導螺桿106在帶動該等立柱103·沿X軸向進給 時’產生線性位移誤差。 為了量測該等導螺# 106的線性位移誤差，目前需使 用兩套雷射干涉儀量測裝置2才能進行量測，該等雷射干 涉儀量測褒置2分別具有一設置於固定位置的雷射發射/接 收頭201、-设置於其中_機台⑻的分光鏡搬、一設置 於其中-立柱1()3底部的第一反射鏡203，及一設置於該分 光鏡202的第二反射鏡2G4e如此，利用該等雷射干涉儀量 署 Λ 、 ^ 里測到的雷射干射量測數據，即可判讀出該等導 '、干6的線性位移誤差，以供使用者作為補償調整的參 201219746 考。 然而，使用兩套雷射干涉儀量測裝置旦 不僅會大幅增加儀器設備成本（約為 仃里測， 需兩個操作人員才能同時進行操作，〇〇萬元)，更 儀量測1置2㈣射發射/接收•，該等雷射干涉 長相斜每兰也 接收碩201彼此之間也會產生波 長相對誤差與溫度相對誤差，如 ^ . t 除τ會影響量測精庶 的準確性與可靠度之外，也導 夂 正操作。 使用者必須進行額外的校 【發明内容】 因此’本發明之目的，即在裎 _ Λ 17在扣供一種可降低設備成本 、操作方便且量測精度佳的同軸向雙進給軸量測裝置。 於是，本發明同軸向雙進給軸量測裝置，包含一光發 ^接收模組、一第一分光鏡、-第二分光鏡，及-反射鏡 早，。該第一分光鏡沿一第一方向與該光發射/接收模組間 隔設置。該第二分光鏡沿一垂直於該第—方向的第二方向 與該第一分光鏡間隔設置。該反射鏡單元具有一第一反射 鏡’及-第二反射鏡，肖第一、二反射鏡相對於該第一、 二分光鏡在一第一狀態、一第二狀態與一第三狀態之間變 換，當該第一、二反射鏡在該第一狀態時，該第一反射鏡 沿該第一方向與該光發射/接收模組間隔設置，該第一反射 鏡與該光發射/接收模組之間定義出一第一光路徑，該第一 分光鏡沿該第一光路徑介於該光發射/接收模組與該第一反 射鏡之間，該第二反射鏡沿該第一方向與該第二分光鏡間 隔设置，該第二分光鏡與該苐一分光鏡之間定義出一第二 201219746 光路徑，該第二反射鏡與該第二分光鏡之間定義出一第三 光路徑，當該第一'二反射鏡在該第二狀態時，該第一反 射鏡沿該第一方向與該光發射/接收模組間隔設置，該第一 反射鏡與該光發射/接收模組之間定義出一第四光路徑，該 第一分光鏡沿該第四光路徑介於該光發射/接收模組與該第 一反射鏡之間，該第二反射鏡與該第二分光鏡鄰接，該第 二反射鏡與該第一分光鏡之.間定義出一第五光路徑，該第 二分光鏡沿該第五光路徑介於該第一分光鏡與該第二反射 鏡之間，當該第一、二反射鏡在該第三狀態時，該第一反 射鏡與該第分光鏡鄰接，該第一反射鏡與該光發射/接收 模組之間定義出一第六光路徑，該第一分光鏡沿該第六光 路徑介於該光發射/接收模組與該第一反射鏡之間，該第二 反射鏡沿該第一方向與該第二分光鏡間隔設置，該第二分 光鏡與該第一分光鏡之間定義出一第七光路徑，該第二反 射鏡與该第二分光鏡之間定義出一第八光路徑。 【實施方式】 有關本發明之前述及其他技術内容、特點與功效，在 以下配合參考圖式之一較佳實施例的詳細說明中，將可清 楚的明白。 參閱圖2，為本發明同軸向雙進給軸量測裝置的較佳實 施例，所欲進行量測的-雙進給轴系、统的動柱式龍門加工 機100,該龍門加工機100包含二機台11〇、一位於該等機 台110之間的工作纟120、二分別沿一第一方向χ可移動地 設置於該等機台110上的立柱130、一沿一垂直於該第一方 201219746 ^的第二方向γ設置於該等立柱13G並可沿—垂直於該. …―、二方向χ、γ的第三方向z昇降的橫向滑軌140、一 。4第一方向γ可移動地設置於該橫向滑軌⑷的主轴頭 150’及二分別驅動該等立柱m沿該第—方向X進給的導 螺桿 160、170。 如圖3 4、5所tf ’該同軸向雙進給轴量測裝置包含 .一光發射/接收模組1G、—第—分光鏡2()、—第二分光鏡 ，及一反射鏡單元40。 該光發射/接收肋1G是—種雷射光發射/接收模組， 可發射出雷射光束並接收反射回來的雷射光束，在本實施 例中，該光發射/接收模組10是採用Hp所生產的型號Ηρ· 5529Α的#射頭。 該第-分光鏡20沿該第一方向χ與該光發射/接收模 組10間隔設置’在本實施例中，該第_分光鏡2〇是一種 分光菱鏡》 該第二分光鏡30沿該第二方向γ與該第一分光鏡2〇 間隔設置，.在丰實施例中，該第二分光鏡3〇是一種分光菱 鏡。 反射鏡41 ’及一第二反勒 該反射鏡單元40具有 鏡42,該第一、二反射鏡41、42相對於該第一、二分光顧 20、30在一第一狀態（見圖3)、—第二狀態（見圖4) j 一第三狀態（見圖5)之間變換。 、42在該第一狀 方向X上互相對 如圖3所示’當該第一、二反射鏡41 態時，該第一、二反射鏡41、42在該第一 201219746 應，該第一反射鏡41沿該第一方向χ與該光發射/接收模 組10間隔設置，該第一反射鏡41與該光發射/接收模組1〇 之間定義出-第-光路徑51，該第—分光鏡2〇沿該第一光 路徑51介於該光發射/接收模組1〇與該第一反射鏡41之間 ，該第二反射鏡42沿該第一方向又與該第二分光鏡3〇間 隔設置，該第二分光鏡30與該第—分光鏡2〇之間定義出201219746 VI. Description of the Invention: [Technical Field of the Invention] The present invention relates to a measuring device, and more particularly to a cap double feed axis measuring device. [Prior Art] As shown in Fig. 1, the movable column type gantry processing machine 1 of the conventional double feed axis system includes two machines 101, a table 102 located between the machines ι, and two The column 103 is movably disposed on the machine table (8), a column 103 disposed along the Y axis and extending along the z axis, and a γ axis along the γ axis. A spindle head 1G5 movably disposed on the lateral rail 104, and two lead screws 106 driving the pillars (8), respectively. In general, the manufacturing lead screw will produce manufacturing errors (such as pitch error), and the length of the lead screw 106 is long. Therefore, the lead screw 1G6 (four) accumulates. The resulting error causes the lead screw 106 to generate a linear displacement error when driving the columns 103. In order to measure the linear displacement error of the guide screw #106, two sets of laser interferometer measuring devices 2 are currently required for measurement, and the laser interferometer measuring devices 2 have a fixed position. a laser emitting/receiving head 201, a beam splitter disposed in the machine table (8), a first mirror 203 disposed at the bottom of the column 1 () 3, and a first portion disposed on the beam splitter 202 In the second mirror 2G4e, by using the laser dryness measurement data measured by the laser interferometers, the linear displacement errors of the guides and stems 6 can be read and read by the user. The compensation adjustment is tested in 201219746. However, the use of two sets of laser interferometer measuring devices will not only greatly increase the cost of the equipment (about 仃 测, requires two operators to operate at the same time, 10,000 yuan), more metering 1 set 2 (four) Shooting/receiving•, these lasers interfere with the long-phase slanting, and each of them receives a wavelength relative error and temperature relative error. For example, τ will affect the accuracy and reliability of the measurement precision. In addition to the degree, it is also guided to operate. The user must carry out an additional school [invention] Therefore, the object of the present invention is to provide a coaxial axial feed axis measuring device capable of reducing equipment cost, convenient operation and good measuring accuracy in the 裎 _ Λ 17 . Therefore, the same axial dual feed axis measuring device of the present invention comprises a light emitting receiving module, a first beam splitter, a second beam splitter, and a mirror mirror. The first beam splitter is spaced apart from the light emitting/receiving module in a first direction. The second beam splitter is spaced apart from the first beam splitter in a second direction perpendicular to the first direction. The mirror unit has a first mirror and a second mirror. The first and second mirrors are in a first state, a second state and a third state with respect to the first and second beamsplitters. Interchanging, when the first and second mirrors are in the first state, the first mirror is spaced apart from the light emitting/receiving module along the first direction, the first mirror and the light emitting/receiving A first light path is defined between the modules, the first beam splitter is interposed between the light emitting/receiving module and the first mirror along the first light path, and the second mirror is along the first The direction is spaced apart from the second beam splitter. A second 201219746 light path is defined between the second beam splitter and the first beam splitter, and a third path is defined between the second mirror and the second beam splitter. a light path, when the first 'second mirror is in the second state, the first mirror is spaced apart from the light emitting/receiving module along the first direction, the first mirror and the light emitting/receiving A fourth optical path is defined between the modules, and the first beam splitter is along the fourth optical path Between the light emitting/receiving module and the first mirror, the second mirror is adjacent to the second beam splitter, and a second light is defined between the second mirror and the first beam splitter a path along which the second beam splitter is interposed between the first beam splitter and the second mirror. When the first and second mirrors are in the third state, the first mirror is The first beam splitter defines a sixth light path between the first mirror and the light emitting/receiving module, and the first beam splitter is interposed between the light emitting/receiving module along the sixth light path. Between the first mirrors, the second mirror is spaced apart from the second beam splitter in the first direction, and a second light path is defined between the second beam splitter and the first beam splitter. An eighth light path is defined between the second mirror and the second beam splitter. The above and other technical contents, features, and advantages of the present invention will become apparent from the following detailed description of the preferred embodiments. 2 is a preferred embodiment of the same-axis dual feed axis measuring device of the present invention, and the double-feed shaft system and the movable column type gantry processing machine 100 for measuring the same, the gantry processing machine 100 The utility model includes a second machine 11 〇, a working raft 120 located between the machines 110, and two gantry 130 movably disposed on the machine 110 in a first direction, respectively, along a vertical The second direction γ of the first party 201219746 ^ is disposed on the uprights 13G and can be moved along the transverse rails 140, one perpendicular to the third direction z of the two directions χ, γ. The first direction γ is movably disposed on the spindle head 150' of the lateral rail (4) and the two lead screws 160, 170 that drive the pillars m to feed in the first direction X, respectively. As shown in Fig. 3, 4, 5, the same axial dual feed axis measuring device comprises: a light emitting/receiving module 1G, a first beam splitter 2 (), a second beam splitter, and a mirror unit 40. The light emitting/receiving rib 1G is a laser light emitting/receiving module that emits a laser beam and receives the reflected laser beam. In this embodiment, the light emitting/receiving module 10 adopts Hp. The #shot of the model Ηρ· 5529Α produced. The first beam splitter 20 is spaced apart from the light emitting/receiving module 10 along the first direction. In the embodiment, the first beam splitter 2 is a beam splitter. The second beam splitter 30 is along the edge. The second direction γ is spaced apart from the first beam splitter 2〇. In the embodiment, the second beam splitter 3〇 is a beam splitter. The mirror 41' and a second mirror unit 40 have a mirror 42, and the first and second mirrors 41, 42 are in a first state with respect to the first and second patrons 20, 30 (see Fig. 3). - The second state (see Figure 4) j changes between the third state (see Figure 5). And the first and second mirrors 41 and 42 are in the first and second mirrors 41, and the first and second mirrors 41 and 42 are in the first state and the second mirror 41 in the first direction X. The mirror 41 is spaced apart from the light emitting/receiving module 10 along the first direction, and a first-light path 51 is defined between the first mirror 41 and the light emitting/receiving module 1〇. - a beam splitter 2 is interposed between the light emitting/receiving module 1 〇 and the first mirror 41 along the first light path 51, and the second mirror 42 is further coupled to the second beam along the first direction The mirrors are spaced apart, and the second beam splitter 30 is defined between the first beam splitter 2 and the first beam splitter 2
一第二光路徑52，該第二反射鏡42與該第二分光鏡3〇之 間定義出一第三光路徑53 。 態時 如圖4所示，當該第一、二反射鏡41、42在該第二狀 ，该第一反射鏡41沿該第—方向χ與該光發射/接收 模組1 〇間隔設置，該第一 反射鏡41與該光發射/接收模組 ⑺之間定義出一第四光路徑54,該第一分光鏡2〇沿該第 四光路徑54介於該光發射/接收模& 1〇與該第一反射鏡41 之間，该第二反射鏡42與該第二分光鏡3〇鄰接，該第二 反射鏡42與該第-分光鏡2G之間^義出—第五光路徑55 ’該第二分光鏡30沿該第五光路徑55介於該第—分光鏡 2〇與該第二反射鏡42之間。 如圖5所示’當該第-、二反射鏡41、42在該第三狀 態時，該第一反射鏡41與該第一分光鏡2〇鄰接，該第— 反射鏡與該光發射/接收模組1()之間定義出―第六光路 徑％，該第-分光鏡20沿該第六光路徑％介於該光發射/ 接收模組1G與該第-反射鏡41之間，該第：反射鏡42沿 該第-方向X與該第二分光鏡3G間隔設置，該第二分光鏡 與該第-分光鏡20之間定義出_第七光路徑57，該第 201219746 二反射鏡42與該第二分光鏡30之間定義出一第八光路徑 58。 藉此，如圖6所示，當要量測該等導螺桿16〇、丨7〇的 動態線性位移誤差或靜態線性位移誤差時，使用者可將該 光發射/接收模組10擺設於預定位置，並利用治具（圖未示 )將該第一、二分光鏡41、42分別固定於該等機台11〇上 ，同時利用治具（圖未示）將該第一、二反射鏡’41、42分 別固定於該等立柱130底部鄰近該等導螺桿16〇、17〇的位 置，使該第一、二反射鏡41、42相對於該第一、二分光鏡 20、30變換至該第一狀態。 在該第一狀態下’該光發射/接收模組1 〇可沿該第一光 路徑51對該第一分光鏡20發射出一雷射光束61，並經該 第一分光鏡20分成二分別沿該第一、二光路徑51、52投 射至該第一反射鏡41與該第二分光鏡30的雷射光束62、 63’其中’該雷射光束62被該第一反射鏡41反射後，由 原光路徑返回該光發射/接收模組丨〇，該雷射光束63經該 第二分光鏡30產生一沿該第三光路徑53投射至該第二反 射鏡42的雷射光束64，該雷射光束64被該第二反射鏡42 反射後’亦由原光路徑返回該光發射/接收模組1〇。 如此，當要量測該等導螺桿160、170的動態線性位移 誤差時，可使該等導螺桿16〇、17〇驅使該等立柱13〇帶動 該第一、二反射鏡41、42連續移動，並進行量測，則該光 發射/接收模組10相互比較該等雷射光束62、64兩者的變 化量’即可計算出該等導螺桿10〇、n〇 #動態線性位移誤 8 201219746 差；當要量測該等導螺桿16G、17G的靜態線性位移誤差時 ’可使該等導螺桿160、170驅使該等立柱13〇帶動該第— 、二反射鏡41、42移動至定位停止後，再進行量測，則該 光發射/接收模組1〇相互比較該等雷射光束62、64兩者的 變化量’即可計算出該料螺桿⑽、m的靜態線性位移 誤差。A second light path 52 defines a third light path 53 between the second mirror 42 and the second beam splitter 3〇. As shown in FIG. 4, when the first and second mirrors 41, 42 are in the second shape, the first mirror 41 is spaced apart from the light emitting/receiving module 1 in the first direction, A fourth light path 54 is defined between the first mirror 41 and the light emitting/receiving module (7), and the first beam splitter 2 is interposed between the light emitting/receiving die & Between the first mirror 41 and the second mirror 41, the second mirror 42 is adjacent to the second beam splitter 3, and the second mirror 42 and the first beam splitter 2G are connected to each other. The path 55 'the second beam splitter 30 is interposed between the first beam splitter 2 〇 and the second mirror 42 along the fifth light path 55 . As shown in FIG. 5, when the first and second mirrors 41, 42 are in the third state, the first mirror 41 is adjacent to the first beam splitter 2, and the first mirror and the light emitting/ A sixth light path % is defined between the receiving module 1 ( ), and the first beam splitter 20 is interposed between the light emitting/receiving module 1G and the first mirror 41 along the sixth light path %, The first mirror: 42 is spaced apart from the second beam splitter 3G along the first direction X, and the second beam path 57 is defined between the second beam splitter and the first beam splitter 20, the 201219746 second reflection An eighth light path 58 is defined between the mirror 42 and the second beam splitter 30. Thereby, as shown in FIG. 6, when the dynamic linear displacement error or the static linear displacement error of the lead screws 16〇, 丨7〇 is to be measured, the user can set the light emitting/receiving module 10 to a predetermined position. Positioning and fixing the first and second beam splitters 41 and 42 to the machine 11 〇 by using a jig (not shown), and simultaneously using the jig (not shown) for the first and second mirrors '41, 42 are respectively fixed at the bottom of the uprights 130 adjacent to the lead screws 16〇, 17〇, so that the first and second mirrors 41, 42 are changed relative to the first and second beamsplitters 20, 30 to The first state. In the first state, the light emitting/receiving module 1 can emit a laser beam 61 to the first beam splitter 20 along the first light path 51, and is divided into two by the first beam splitter 20. Laser beams 62, 63' projected to the first mirror 41 and the second beam splitter 30 along the first and second light paths 51, 52, wherein the laser beam 62 is reflected by the first mirror 41 Returning from the original light path to the light emitting/receiving module 丨〇, the laser beam 63 generates a laser beam 64 that is projected along the third light path 53 to the second mirror 42 via the second beam splitter 30. After the laser beam 64 is reflected by the second mirror 42, it is returned to the light emitting/receiving module 1 by the original light path. In this way, when the dynamic linear displacement errors of the lead screws 160 and 170 are to be measured, the lead screws 16〇, 17〇 can drive the columns 13〇 to continuously move the first and second mirrors 41 and 42. And measuring, the light emitting/receiving module 10 compares the amount of change of the laser beams 62, 64 with each other to calculate the dynamic linear displacement error of the lead screw 10〇, n〇# 201219746 Poor; when measuring the static linear displacement error of the lead screws 16G, 17G, 'the lead screws 160, 170 can be driven to move the first and second mirrors 41, 42 to the positioning After the stop, the measurement is performed, and the light emitting/receiving module 1 比较 compares the amount of change between the laser beams 62 and 64 to calculate the static linear displacement error of the screw (10) and m.
Λ接著，如圖7所示’當要量測該導螺桿160的個別靜 態線性位移誤差時，使用者可改由利用治纟（圖未示）將 該第二反射鏡42固定於該第二分光鏡30，使該第一、二反 射鏡4卜42相對於該第_、二分光鏡2〇、3〇由該第一狀 態（見圖6)變換至該第二狀態。 在該第二狀態下，該光發射/接收模組10可沿該第四光 路徑54對該第一分光鏡2〇發射出一雷射光束71，並經該 第一分光鏡20分成二分別沿該第四、五光路徑Μ、55投 射至該第-反射鏡4!與該第二分光鏡3G的雷射光束 73，其中，該雷射光束72被該第一反射鏡μ反射後，由 原光路徑返回該光發射/接收模組 10 ’該雷射光束73經該 第二分光鏡30產生一沿該第五光路徑55投射至該第二反 射鏡42糊光束74 ’該雷射光束74被該第二反二2 反射後’亦由原光路徑返回該光發射/接收模組1〇。 如此，當要量測該導螺桿160的個別靜態線性位移誤 差時，可使該等導螺桿16〇、17()驅使該等立柱13〇帶動該 第-反射鏡41移動至定位停止後，再崎量測，則該光發 射/接收模組H)以該雷射光束74作為基準，量測該雷射光 201219746 束72的變化長度’即可計算出該螺桿⑽的個別靜態線性 位移誤差。 接著，如圖8所示，當要量測該導螺桿170的個別靜 態線性位移誤差時，使用者可改由利用治圖未示）將 該第一反射鏡41固定於該第一分光鏡2〇，使該第一、二反 射鏡4卜42相躲該第—、二分光鏡2()、3()由該第二狀 態（見圖6 )變換至該第三狀態。 在該第三狀態下，該光發射/接收模組10可沿該第六光 路徑56對該第一分光鏡2〇發射出一雷射光束81，並經該 第一分光鏡20分成二分別沿該第六、七光路徑％、57投 射至該第-反射鏡4!與該第二分光鏡3Q的雷射光束 83 ’其中’該雷射光束82被該第一反射鏡41反射後，由 原光路徑返回該光發射/接收模組1G，該雷射光束Μ經該 第二分光鏡30產生-沿該第八光路徑58投射至該第二反 射鏡42的雷射光束84，該雷射光束84被該第二反射鏡“ 反射後，亦由原光路徑返回該光發射/接收模組1〇。 如此，當要量測該導螺桿170的個別靜態線性位移誤 差時’可使該等導螺捍160、170驅使該等立13〇帶動該 第二反射鏡42移動至定位停止後，再進行量測，則該光發 射/接收模組H)以該雷射Μ 82作為基準，量測該雷射光 束84的變化長度，即可計算出該螺桿17〇的個別靜態線性 位移誤差。 如此，本發明即可量測出該等導螺桿16〇、17〇的動態 線性位移誤差、靜態線性位移誤差與個別靜態線性位移誤 10 201219746 差，以供使用者作為補償調整的參考。 .、、呈由以上的說明，可再將本發明的優點歸納如下： 一、本發明利用該光發射/接收模組1〇搭配該第一 分光鏡20、30與該第一、二反射鏡41、42，使：第 反射鏡4卜42可相對於該第—、二分光鏡Μ、％在該第Next, as shown in FIG. 7, when the individual static linear displacement error of the lead screw 160 is to be measured, the user can fix the second mirror 42 to the second by using a treatment (not shown). The dichroic mirror 30 causes the first and second mirrors 4 to be shifted from the first state (see FIG. 6) to the second state with respect to the first and second dichroic mirrors 2, 3, and 3. In the second state, the light emitting/receiving module 10 can emit a laser beam 71 to the first beam splitter 2 along the fourth light path 54 and split into two by the first beam splitter 20 A laser beam 73 is projected along the fourth and fifth light paths Μ, 55 to the first mirror 4 and the second beam splitter 3G, wherein the laser beam 72 is reflected by the first mirror μ Returning from the original light path to the light emitting/receiving module 10', the laser beam 73 is generated by the second beam splitter 30 to be projected along the fifth light path 55 to the second mirror 42 paste beam 74' After the beam 74 is reflected by the second inverse 2, it is also returned to the light emitting/receiving module 1 by the original light path. Thus, when the individual static linear displacement errors of the lead screw 160 are to be measured, the lead screws 16A, 17() can be driven to drive the first mirrors 13 to move the positioning mirror 41 to stop after positioning, and then For the measurement, the optical transmitting/receiving module H) uses the laser beam 74 as a reference to measure the varying length of the laser beam 201219746 beam 72 to calculate the individual static linear displacement error of the screw (10). Next, as shown in FIG. 8, when the individual static linear displacement error of the lead screw 170 is to be measured, the user may fix the first mirror 41 to the first beam splitter 2 by using a map (not shown). 〇, the first and second mirrors 42 are separated from the first and second dichroic mirrors 2(), 3() by the second state (see FIG. 6) to the third state. In the third state, the light emitting/receiving module 10 can emit a laser beam 81 to the first beam splitter 2 along the sixth light path 56, and divide into two by the first beam splitter 20. A laser beam 83 ′ that is projected along the sixth and seventh light path %, 57 to the first mirror 4 and the second beam splitter 3Q, wherein the laser beam 82 is reflected by the first mirror 41 Returning from the original light path to the light emitting/receiving module 1G, the laser beam is generated by the second beam splitter 30 - a laser beam 84 projected along the eighth light path 58 to the second mirror 42 After the laser beam 84 is "reflected by the second mirror, it is also returned to the light emitting/receiving module 1 by the original light path. Thus, when the individual static linear displacement error of the lead screw 170 is to be measured, The light-emitting/receiving module H) drives the second mirror 42 to move after the positioning of the second mirror 42 is stopped, and then the light-emitting/receiving module H) is used as the reference. By measuring the length of change of the laser beam 84, an individual static linear displacement error of the screw 17〇 can be calculated. Therefore, the present invention can measure the dynamic linear displacement error, the static linear displacement error of the lead screws 16〇, 17〇, and the difference of the individual static linear displacement errors 10 201219746 for the user to use as a reference for compensation adjustment. According to the above description, the advantages of the present invention can be summarized as follows: 1. The present invention utilizes the light emitting/receiving module 1 〇 to match the first beam splitter 20, 30 with the first and second mirrors 41, 42, making: the mirror 4 42 can be relative to the first, the second beam splitter, % in the first
-、二、三狀態之間變換’即可量測出該等導螺桿16〇、 170的動態線性位移誤差、靜態線性位移誤差與個別靜態線 性位移'誤差，相較於習知技術需利心個雷射發射/接收頭 201分別搭配兩個分光鏡與四個反射鏡，才能進行相關的量 測作業，本發明可大幅降低儀器設備成本（約為新台幣120 一、本發明僅需利用—個操作人員操㈣光發射/接收 模組H)’即可進行相關的量測作業，相較於習知技術，本 發明可有效節省人力’且操作方便。 三、本發明僅利㈣光發射/接收模組10發射出量測用 的雷射光束’相較於習知技術需利用兩個不同的雷射發射/ 接收頭2〇1分別發射出量測用的雷射光束，本發明完全不 會發生習知技術的波長相對誤差或溫度相對誤差，而可有 效提昇量測精度的準確性與可靠度。 綜上所述，本發明之同轴向雙進給轴量測裝置，不僅 可降低設Μ本，且便於單人操作，並可改善量測精度的 準確性與可靠度’故確實料縣發明之目的。 准以上所述者，僅為本發明之較佳實施例而已，冬 能以此限定本發明實施之範圍，即大凡依本發明中請^ 201219746 範圍及發明說明内容所作之簡單的等效變化與修飾，皆仍 屬本發明專利涵蓋之範圍内。 12 201219746 【圖式簡單說明】 圖1是習知雷射千涉儀量測裝置安 及又技於—雙進給軸系 統的動柱式龍門加工機的俯視示意圖； ^ 圖2是本發明的同轴向雙進給轴量測裝置—較佳實施 例所搭配使用的-雙進給軸系統的動柱式龍門加卫機的立 體意圖； 圖3是該較佳實施例的配置示意圖，說明該較佳實施-, the change between the two states and the third state can be measured to measure the dynamic linear displacement error, static linear displacement error and individual static linear displacement of the lead screws 16 〇 170, which is more advantageous than the conventional technology. The laser emitting/receiving head 201 is respectively equipped with two beam splitters and four mirrors to perform related measuring operations, and the invention can greatly reduce the equipment cost (about NT 120), the invention only needs to be used - The operator can perform the relevant measurement operations by operating the (four) light emitting/receiving module H)', and the invention can effectively save manpower and is convenient to operate compared with the prior art. 3. The present invention only utilizes (four) the light-emitting/receiving module 10 to emit a laser beam for measurement. Compared with the prior art, two different laser transmitting/receiving heads 2〇1 are respectively used to emit the measurement. With the laser beam used, the wavelength error or temperature relative error of the prior art is not generated at all, and the accuracy and reliability of the measurement accuracy can be effectively improved. In summary, the same axial dual feed axis measuring device of the invention can not only reduce the design of the stencil, but also facilitate single operation, and can improve the accuracy and reliability of the measurement accuracy. The purpose. The above is only the preferred embodiment of the present invention, and Winter can limit the scope of the implementation of the present invention, that is, the simple equivalent change made by the scope of the invention and the description of the invention in the present invention. Modifications are still within the scope of the invention. 12 201219746 [Simple description of the drawing] Fig. 1 is a schematic plan view of a moving column type gantry processing machine of a conventional laser measuring instrument measuring device and a double-feed axis system; ^ Figure 2 is a schematic view of the moving column type gantry processing machine of the present invention; FIG. 3 is a schematic view showing the configuration of the preferred embodiment of the dual-feed axis system of the same embodiment; FIG. Better implementation
例的-第-反射鏡與-第二反射鏡相對於—第—分光鏡與 —第二分光鏡變換至一第一狀態； 圖4是一類似圖3的視圖’說明該第一、二反射鏡相 對於該第一、二分光鏡變換至一第二狀態； 圖5是一類似圖3的視圖，說明該第一、二反射鏡相 對於該第一、二分光鏡變換至一第三狀態； 圖ό是該較佳實施例安裝於該龍門加工機的俯視示意 ，說明該第一、二反射鏡相對於該第一、二分光鏡變換 至該第一狀態； 圖7是一類似圖6的視圖，說明該第一、二反射鏡相 對於該第一、二分光鏡變換至該第二狀態；及 圖8是一類似圖6的視圖，說明該第一、二反射鏡相 詞'於δ玄第一、二分光鏡變換至該第三狀態。 13 201219746 【主要元件符號說明】 1 ....... •…龍門加工機 56·..··_ …第六光路徑 101 .… …·機台 57…… …第七光路徑 102 .... …工作台 58…… …第八光路徑 103 .… …·立柱 61…… …雷射光束 104 .... •…橫向滑軌 62…… …雷射光束 105 ···. •…主軸頭 63…… …雷射光束 106 ···. •…導螺桿 64…… …雷射光束 2 ....... •…雷射干涉儀量測裝置 71…… …雷射光束 201 ···. …雷射發射/接收頭 72…… …·雷射光束 202 ··.. —分光鏡 73…… …·雷射光束 203 ···. •…第一反射鏡 74…… •…雷射光束 204 ·.·. …·第二反射鏡 81…… …·雷射光束 10…… …光發射/接收模組 82…… …·雷射光束 20…… •…第一分光鏡 83······ …雷射光束 30····· …·第二分光鏡 84…… •…雷射光束 40…… …·反射鏡單元 X....... —第 方向 41…… …·第一反射鏡 Y....... …第二方向 42…… …·第二反射鏡 Z....... —第—方向 51…… …·第一光路徑 100… ··.·龍門加工機 52····· •…第二光路徑 110… …·機台 53…… •…第三光路徑 120… •…工作台 54…… •…第四光路徑 130… …·立柱 55 •…第五光路徑 140… •…橫向滑軌 14 201219746 150.......主軸頭 160.......導螺桿 170.......導螺桿Example - the first mirror and the second mirror are converted to a first state with respect to the -first beam splitter and the second beam splitter; FIG. 4 is a view similar to FIG. 3 illustrating the first and second reflections The mirror is transformed to a second state with respect to the first and second beamsplitters; FIG. 5 is a view similar to FIG. 3, illustrating that the first and second mirrors are transformed to a third state with respect to the first and second beamsplitters. Figure 2 is a top plan view of the preferred embodiment mounted on the gantry processing machine, illustrating that the first and second mirrors are transformed to the first state relative to the first and second beamsplitters; Figure 7 is a view similar to Figure 6 a view showing the first and second mirrors changing to the second state with respect to the first and second beamsplitters; and FIG. 8 is a view similar to FIG. 6 illustrating the first and second mirrors The δ first and second dichroic mirrors are transformed to the third state. 13 201219746 [Explanation of main component symbols] 1 ....... •...Gantry machine 56·..··_6th optical path 101 ........machine station 57......seventh light path 102. ... workbench 58 ... ... eighth light path 103 .... ... column 61 ... ... laser beam 104 .... ... ... horizontal slide 62 ... ... laser beam 105 ···. ...spindle head 63...the laser beam 106···.•...the lead screw 64......the laser beam 2..................the laser interferometer measuring device 71...the laser beam 201 ···. ...the laser emitting/receiving head 72...the laser beam 202···.-the beam splitter 73...the laser beam 203···....the first mirror 74... •...laser beam 204 ·.....the second mirror 81...the laser beam 10...the light emitting/receiving module 82...the laser beam 20...the first beam splitting Mirror 83······...the laser beam 30·······the second beam splitter 84...•...the laser beam 40...the mirror unit X....... Direction 41...... ...·first reflection Mirror Y....... ...the second direction 42...the second mirror Z.......the first direction 51...the first light path 100... The gantry Processing Machine 52·····•...Second Light Path 110...·Machine 53...•...Third Light Path 120...•...Workbench 54...•...fourth light path 130......column 55 •...the fifth light path 140... •...the horizontal slide rail 14 201219746 150.......the spindle head 160.......the lead screw 170.......the lead screw