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TW200702940A - Exposure apparatus - Google Patents

Exposure apparatus

Info

Publication number
TW200702940A
TW200702940ATW095115059ATW95115059ATW200702940ATW 200702940 ATW200702940 ATW 200702940ATW 095115059 ATW095115059 ATW 095115059ATW 95115059 ATW95115059 ATW 95115059ATW 200702940 ATW200702940 ATW 200702940A
Authority
TW
Taiwan
Prior art keywords
scanning direction
air
cooling air
chamber
along
Prior art date
Application number
TW095115059A
Other languages
Chinese (zh)
Inventor
Akihiro Hashiguchi
Hiroyuki Kohda
Takashi Fukui
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2005133409Aexternal-prioritypatent/JP2006308996A/en
Priority claimed from JP2005150976Aexternal-prioritypatent/JP2006330167A/en
Priority claimed from JP2005150974Aexternal-prioritypatent/JP2006330165A/en
Application filed by Fuji Photo Film Co LtdfiledCriticalFuji Photo Film Co Ltd
Publication of TW200702940ApublicationCriticalpatent/TW200702940A/en

Links

Classifications

Landscapes

Abstract

An accommodation chamber 13 (an exposure chamber 15) of a cover body 12 at which an apparatus main body 20 of an exposure apparatus 10 is accommodated is air conditioned by cooling air from an air conditioner. A photosensitive material 40 is placed on a stage 28 in the accommodation chamber 13 and is conveyed in a scanning direction. Cooling air, which is blown out into the exposure chamber 15 from an outflow port 82B of a duct 82, is blown along the scanning direction by an airflow direction-altering plate 90. A temperature distribution of the accommodation chamber 13 along the scanning direction is made uniform by this cooling air. Air conditioning which inhibits temperature divergences and temperature changes which occur along the scanning direction is realized.
TW095115059A2005-04-282006-04-27Exposure apparatusTW200702940A (en)

Applications Claiming Priority (3)

Application NumberPriority DateFiling DateTitle
JP2005133409AJP2006308996A (en)2005-04-282005-04-28Exposure device
JP2005150976AJP2006330167A (en)2005-05-242005-05-24Exposure apparatus
JP2005150974AJP2006330165A (en)2005-05-242005-05-24Exposure apparatus

Publications (1)

Publication NumberPublication Date
TW200702940Atrue TW200702940A (en)2007-01-16

Family

ID=37308119

Family Applications (1)

Application NumberTitlePriority DateFiling Date
TW095115059ATW200702940A (en)2005-04-282006-04-27Exposure apparatus

Country Status (3)

CountryLink
KR (1)KR20080005382A (en)
TW (1)TW200702940A (en)
WO (1)WO2006118343A1 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
CN113204175A (en)*2021-04-252021-08-03华虹半导体(无锡)有限公司Exposure method of immersion lithography machine
TWI823472B (en)*2021-08-262023-11-21日商斯庫林集團股份有限公司Drawing apparatus

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
JP4950101B2 (en)2008-03-052012-06-13富士フイルム株式会社 Method for processing a workpiece having a photoresist layer
US20140313493A1 (en)2013-04-182014-10-23E I Du Pont De Nemours And CompanyExposure apparatus and a method for exposing a photosensitive element and a method for preparing a printing form from the photosensitive element
JP7045890B2 (en)*2018-03-202022-04-01株式会社Ｓｃｒｅｅｎホールディングス Pattern drawing device and pattern drawing method
CN112612180B (en)*2020-12-072022-10-25华虹半导体(无锡)有限公司Photoetching exposure method
CN112925175A (en)*2021-01-292021-06-08深圳市大族数控科技股份有限公司Exposure machine

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
JPH0580526A (en)*1991-09-251993-04-02Dainippon Screen Mfg Co LtdMovable placing device for photosensing plate
JP3372782B2 (en)*1996-10-042003-02-04キヤノン株式会社 Scanning stage apparatus and scanning type exposure apparatus
JP2001092145A (en)*1999-09-172001-04-06Fuji Photo Film Co LtdDust removing device for printing plate
JP2002202570A (en)*2000-12-282002-07-19Fuji Photo Film Co LtdImage exposure-recording equipment and method
JP2004085664A (en)*2002-08-232004-03-18Pentax Corp Drawing system

Cited By (3)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
CN113204175A (en)*2021-04-252021-08-03华虹半导体(无锡)有限公司Exposure method of immersion lithography machine
CN113204175B (en)*2021-04-252022-10-28华虹半导体(无锡)有限公司Exposure method of immersion lithography machine
TWI823472B (en)*2021-08-262023-11-21日商斯庫林集團股份有限公司Drawing apparatus

Also Published As

Publication numberPublication date
WO2006118343A1 (en)2006-11-09
KR20080005382A (en)2008-01-11

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