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SG134203A1 - System and apparatus for cleaning or drying media handling device - Google Patents

System and apparatus for cleaning or drying media handling device

Info

Publication number
SG134203A1
SG134203A1SG200603744-4ASG2006037444ASG134203A1SG 134203 A1SG134203 A1SG 134203A1SG 2006037444 ASG2006037444 ASG 2006037444ASG 134203 A1SG134203 A1SG 134203A1
Authority
SG
Singapore
Prior art keywords
media handling
handling device
reservoirs
enclosure
cleaning
Prior art date
Application number
SG200603744-4A
Inventor
Chua Eng Hwa
Lin Guang Rong
Ser Bee Seong
Original Assignee
Systems Automation S Pte Ltd F
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Systems Automation S Pte Ltd FfiledCriticalSystems Automation S Pte Ltd F
Priority to SG200603744-4ApriorityCriticalpatent/SG134203A1/en
Priority to PCT/SG2006/000410prioritypatent/WO2007084081A1/en
Publication of SG134203A1publicationCriticalpatent/SG134203A1/en

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Abstract

The present invention provides an apparatus for cleaning of drying media handling devices. The apparatus comprises an enclosure disposed between the top cover and the plurality of bottom panels, wherein the enclosure is configured to circumferentially enclose the media handling device. The enclosure has a plurality of depressions at the top surface, wherein the top surface is coupled to the top cover to enclose the plurality of depressions, thereby creating a plurality of channels. Furthermore, the enclosure has a plurality of chambers at the bottom surface; wherein the plurality of bottom panels are coupled to the bottom surface to enclose the plurality of chambers, thereby creating a plurality of reservoirs, the plurality of reservoirs having a plurality of outlets configured to circumferentially surround the media handling device. The plurality of channels are adapted to receive and distribute a fluid to the plurality of reservoirs via the plurality of conduits, wherein the plurality of reservoirs regulate the fluid and evenly distribute the fluid to the plurality of outlets, and wherein the plurality of outlets are configured to release streams of fluid around the media handling device, thereby effectively cleaning or drying the media handling device.
SG200603744-4A2006-01-202006-01-20System and apparatus for cleaning or drying media handling deviceSG134203A1 (en)

Priority Applications (2)

Application NumberPriority DateFiling DateTitle
SG200603744-4ASG134203A1 (en)2006-01-202006-01-20System and apparatus for cleaning or drying media handling device
PCT/SG2006/000410WO2007084081A1 (en)2006-01-202006-12-29System and apparatus for cleaning or drying media handling devices

Applications Claiming Priority (1)

Application NumberPriority DateFiling DateTitle
SG200603744-4ASG134203A1 (en)2006-01-202006-01-20System and apparatus for cleaning or drying media handling device

Publications (1)

Publication NumberPublication Date
SG134203A1true SG134203A1 (en)2007-08-29

Family

ID=38287928

Family Applications (1)

Application NumberTitlePriority DateFiling Date
SG200603744-4ASG134203A1 (en)2006-01-202006-01-20System and apparatus for cleaning or drying media handling device

Country Status (2)

CountryLink
SG (1)SG134203A1 (en)
WO (1)WO2007084081A1 (en)

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US5839455A (en)*1995-04-131998-11-24Texas Instruments IncorporatedEnhanced high pressure cleansing system for wafer handling implements
US5711821A (en)*1995-04-131998-01-27Texas Instruments IncorporatedCleansing process for wafer handling implements
US5551165A (en)*1995-04-131996-09-03Texas Instruments IncorporatedEnhanced cleansing process for wafer handling implements
DE19623766A1 (en)*1996-06-141997-12-18Itt Ind Gmbh Deutsche Device for dry cleaning of dust-soiled auxiliary objects for the handling and storage of semiconductor wafers
US5766061A (en)*1996-10-041998-06-16Eco-Snow Systems, Inc.Wafer cassette cleaning using carbon dioxide jet spray
US6096100A (en)*1997-12-122000-08-01Texas Instruments IncorporatedMethod for processing wafers and cleaning wafer-handling implements
JPH10249289A (en)*1997-03-101998-09-22Ihito TakahiraWashing device
JPH11290791A (en)*1998-04-071999-10-26Hitachi Ltd Washing and drying equipment
US6412502B1 (en)*1999-07-282002-07-02Semitool, Inc.Wafer container cleaning system
US6830057B2 (en)*2002-11-012004-12-14Semitool, Inc.Wafer container cleaning system

Also Published As

Publication numberPublication date
WO2007084081A1 (en)2007-07-26

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