B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
B08B3/04—Cleaning involving contact with liquid
B—PERFORMING OPERATIONS; TRANSPORTING
B08—CLEANING
B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
B08B5/00—Cleaning by methods involving the use of air flow or gas flow
B08B5/02—Cleaning by the force of jets, e.g. blowing-out cavities
H—ELECTRICITY
H01—ELECTRIC ELEMENTS
H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
H01L21/67005—Apparatus not specifically provided for elsewhere
H01L21/67011—Apparatus for manufacture or treatment
H01L21/67017—Apparatus for fluid treatment
H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
H—ELECTRICITY
H01—ELECTRIC ELEMENTS
H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
H01L21/67005—Apparatus not specifically provided for elsewhere
H01L21/67011—Apparatus for manufacture or treatment
H01L21/67017—Apparatus for fluid treatment
H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
Landscapes
Cleaning Or Drying Semiconductors (AREA)
Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)