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SG11201706069WA - Lamp heating for process chamber - Google Patents

Lamp heating for process chamber

Info

Publication number
SG11201706069WA
SG11201706069WASG11201706069WASG11201706069WASG11201706069WASG 11201706069W ASG11201706069W ASG 11201706069WASG 11201706069W ASG11201706069W ASG 11201706069WASG 11201706069W ASG11201706069W ASG 11201706069WASG 11201706069W ASG11201706069W ASG 11201706069WA
Authority
SG
Singapore
Prior art keywords
process chamber
lamp heating
lamp
heating
chamber
Prior art date
Application number
SG11201706069WA
Inventor
Mehmet Tugrul Samir
Schubert S Chu
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials IncfiledCriticalApplied Materials Inc
Publication of SG11201706069WApublicationCriticalpatent/SG11201706069WA/en

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SG11201706069WA2015-01-302016-01-04Lamp heating for process chamberSG11201706069WA (en)

Applications Claiming Priority (3)

Application NumberPriority DateFiling DateTitle
US201562110440P2015-01-302015-01-30
US201562141133P2015-03-312015-03-31
PCT/US2016/012066WO2016122835A1 (en)2015-01-302016-01-04Lamp heating for process chamber

Publications (1)

Publication NumberPublication Date
SG11201706069WAtrue SG11201706069WA (en)2017-08-30

Family

ID=56544155

Family Applications (1)

Application NumberTitlePriority DateFiling Date
SG11201706069WASG11201706069WA (en)2015-01-302016-01-04Lamp heating for process chamber

Country Status (6)

CountryLink
US (1)US10356848B2 (en)
KR (2)KR20230173740A (en)
CN (1)CN107208966B (en)
SG (1)SG11201706069WA (en)
TW (1)TWI686869B (en)
WO (1)WO2016122835A1 (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
EP3488464B1 (en)2016-07-222021-09-08Applied Materials, Inc.Heating modulators to improve epi uniformity tuning
US11057963B2 (en)2017-10-062021-07-06Applied Materials, Inc.Lamp infrared radiation profile control by lamp filament design and positioning
US10732046B2 (en)*2018-09-102020-08-04Asm Ip Holding BvSystem and method for thermally calibrating semiconductor process chambers
CN109489363A (en)*2018-12-242019-03-19国兴(东莞)新能源科技有限公司Water removing device for soft package battery
US11107709B2 (en)2019-01-302021-08-31Applied Materials, Inc.Temperature-controllable process chambers, electronic device processing systems, and manufacturing methods
JP7098677B2 (en)*2020-03-252022-07-11株式会社Kokusai Electric Manufacturing methods and programs for substrate processing equipment and semiconductor equipment
CN113124649B (en)*2021-03-312022-09-23北京印刷学院Control method and device for microwave transmitting array in microwave drying system
US12324061B2 (en)*2021-04-062025-06-03Applied Materials, Inc.Epitaxial deposition chamber
US20230341186A1 (en)*2022-04-262023-10-26Applied Materials, Inc.Air shrouds with integrated heat exchanger
US12417890B2 (en)2022-10-252025-09-16Applied Materials, Inc.Methods, systems, and apparatus for monitoring radiation output of lamps

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US1669005A (en)*1927-04-281928-05-08Hustadt PaulHeating element for tempering machines
TW315493B (en)*1996-02-281997-09-11Tokyo Electron Co LtdHeating apparatus and heat treatment apparatus
US6771895B2 (en)*1999-01-062004-08-03Mattson Technology, Inc.Heating device for heating semiconductor wafers in thermal processing chambers
KR100509085B1 (en)*2000-04-202005-08-18동경 엘렉트론 주식회사Thermal processing system
JP2003059853A (en)*2001-08-082003-02-28Tokyo Electron LtdLamp heater and heat treatment apparatus
JP4294445B2 (en)*2003-11-072009-07-15パナソニック株式会社 Infrared bulb, heating device, and method of manufacturing infrared bulb
US7045746B2 (en)*2003-11-122006-05-16Mattson Technology, Inc.Shadow-free shutter arrangement and method
TWI281833B (en)*2004-10-282007-05-21Kyocera CorpHeater, wafer heating apparatus and method for manufacturing heater
US7262390B2 (en)*2005-05-232007-08-28Chung Shan Institute Of Science And Technology, Armaments Bureau, M.N.D.Apparatus and adjusting technology for uniform thermal processing
US7398693B2 (en)*2006-03-302008-07-15Applied Materials, Inc.Adaptive control method for rapid thermal processing of a substrate
JP4893474B2 (en)*2007-05-292012-03-07ウシオ電機株式会社 Filament lamp and light irradiation type heat treatment equipment
JP2010016225A (en)*2008-07-042010-01-21Tokyo Electron LtdThermal control mechanism and semiconductor manufacturing device using the same
KR101031226B1 (en)*2009-08-212011-04-29에이피시스템 주식회사 Heater Block of Rapid Heat Treatment Device
CN103299422B (en)*2010-12-292016-11-023M创新有限公司 Remote Phosphor LED Unit with Broadband Output and Controllable Color
US10167554B2 (en)*2010-12-302019-01-01Veeco Instruments Inc.Wafer processing with carrier extension
CN103827581A (en)*2011-09-262014-05-28普司科Led股份有限公司Optical semiconductor-based lighting apparatus
US9905444B2 (en)*2012-04-252018-02-27Applied Materials, Inc.Optics for controlling light transmitted through a conical quartz dome
TWI722978B (en)*2013-04-162021-04-01美商應用材料股份有限公司Lamp heater for atomic layer deposition
KR101458963B1 (en)*2014-02-182014-11-12민정은Heater for papid heat treatment apparatus

Also Published As

Publication numberPublication date
KR20170109599A (en)2017-09-29
CN107208966A (en)2017-09-26
TWI686869B (en)2020-03-01
US10356848B2 (en)2019-07-16
CN107208966B (en)2020-01-03
KR102774117B1 (en)2025-03-04
TW201639037A (en)2016-11-01
WO2016122835A1 (en)2016-08-04
KR20230173740A (en)2023-12-27
US20160227606A1 (en)2016-08-04

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