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SG11201705228PA - Impedance matching method and device for pulsed radio frequency power supply - Google Patents

Impedance matching method and device for pulsed radio frequency power supply

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Publication number
SG11201705228PA
SG11201705228PASG11201705228PASG11201705228PASG11201705228PASG 11201705228P ASG11201705228P ASG 11201705228PASG 11201705228P ASG11201705228P ASG 11201705228PASG 11201705228P ASG11201705228P ASG 11201705228PASG 11201705228P ASG11201705228P ASG 11201705228PA
Authority
SG
Singapore
Prior art keywords
power supply
radio frequency
frequency power
impedance matching
matching method
Prior art date
Application number
SG11201705228PA
Inventor
Xiaoyang Cheng
Original Assignee
Beijing Naura Microelectronics Equipment Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Beijing Naura Microelectronics Equipment Co LtdfiledCriticalBeijing Naura Microelectronics Equipment Co Ltd
Publication of SG11201705228PApublicationCriticalpatent/SG11201705228PA/en

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SG11201705228PA2015-01-062015-04-29Impedance matching method and device for pulsed radio frequency power supplySG11201705228PA (en)

Applications Claiming Priority (2)

Application NumberPriority DateFiling DateTitle
CN201510004040.8ACN105826154B (en)2015-01-062015-01-06For the impedance matching methods and device of pulse radiation frequency power supply
PCT/CN2015/077779WO2016110027A1 (en)2015-01-062015-04-29Impedance matching method and device for pulse radio frequency power supply

Publications (1)

Publication NumberPublication Date
SG11201705228PAtrue SG11201705228PA (en)2017-07-28

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Family Applications (1)

Application NumberTitlePriority DateFiling Date
SG11201705228PASG11201705228PA (en)2015-01-062015-04-29Impedance matching method and device for pulsed radio frequency power supply

Country Status (6)

CountryLink
US (1)US10643822B2 (en)
JP (1)JP6619818B2 (en)
KR (1)KR101902427B1 (en)
CN (1)CN105826154B (en)
SG (1)SG11201705228PA (en)
WO (1)WO2016110027A1 (en)

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WO2017161641A1 (en)*2016-03-232017-09-28北京北方微电子基地设备工艺研究中心有限责任公司Impedance matching system, impedance matching method and semiconductor processing equipment
JP6157036B1 (en)*2016-07-082017-07-05株式会社京三製作所 High frequency power supply device and control method of high frequency power supply device
CN109148250B (en)*2017-06-152020-07-17北京北方华创微电子装备有限公司Impedance matching device and impedance matching method
JP6855989B2 (en)*2017-09-142021-04-07オムロン株式会社 RF tag circuit
US10679825B2 (en)*2017-11-152020-06-09Lam Research CorporationSystems and methods for applying frequency and match tuning in a non-overlapping manner for processing substrate
US10269540B1 (en)*2018-01-252019-04-23Advanced Energy Industries, Inc.Impedance matching system and method of operating the same
CN110416047B (en)*2018-04-272021-03-02北京北方华创微电子装备有限公司Radio frequency impedance matching method and device and semiconductor processing equipment
JP6842443B2 (en)2018-06-222021-03-17東京エレクトロン株式会社 Plasma processing equipment and method of generating plasma
CN110648888B (en)*2018-06-272020-10-13北京北方华创微电子装备有限公司Radio frequency pulse matching method and device and pulse plasma generating system
CN111293022B (en)*2018-12-072023-01-24中微半导体设备(上海)股份有限公司Impedance matching method and device for pulsed radio frequency plasma
CN111293021B (en)*2018-12-072024-01-12中微半导体设备(上海)股份有限公司Impedance matching method and device for pulse radio frequency plasma
CN111341636B (en)*2018-12-192023-07-11北京北方华创微电子装备有限公司Semiconductor device and radio frequency loading method thereof
TWI715921B (en)*2019-01-282021-01-11美商先驅能源工業公司Impedance matching system and method of operating the same
KR102348338B1 (en)*2019-02-072022-01-06엠케이에스코리아 유한회사The Driving Frequency Control Method of The Pulsed Frequency Variable RF Generator
JP7253415B2 (en)*2019-03-222023-04-06株式会社ダイヘン Impedance matching device and impedance matching method
US11107661B2 (en)*2019-07-092021-08-31COMET Technologies USA, Inc.Hybrid matching network topology
JP7557267B2 (en)*2019-12-272024-09-27株式会社ダイヘン Impedance adjustment device and impedance adjustment method
US11848176B2 (en)*2020-07-312023-12-19Applied Materials, Inc.Plasma processing using pulsed-voltage and radio-frequency power
CN116779407A (en)*2020-10-132023-09-19北京北方华创微电子装备有限公司 Obtaining method, impedance matching device and method thereof, and semiconductor process equipment
US11626853B2 (en)*2021-02-052023-04-11Applied Materials, Inc.RF power delivery architecture with switchable match and frequency tuning
US20230050119A1 (en)*2021-08-112023-02-16Mks Instruments, Inc.Hybrid High-Power And Broadband Variable Impedance Modules
CN113921366B (en)*2021-09-302024-07-23北京北方华创微电子装备有限公司Semiconductor process equipment and impedance matching method thereof
CN114288551B (en)*2021-12-282025-07-04未来穿戴技术股份有限公司 Pulse signal output method, device, electric pulse massage equipment and storage medium
CN118588525A (en)*2023-03-032024-09-03北京北方华创微电子装备有限公司 Impedance matching method, plasma device, electronic device and storage medium
DE102023115791A1 (en)*2023-06-162024-12-19TRUMPF Hüttinger GmbH + Co. KG Plasma process supply system, in particular for pulsed plasma processes, and a method for operating such a plasma process supply system
US20250037972A1 (en)*2023-07-262025-01-30Advanced Energy Industries, Inc.Match network design for use with frequency sweeping
CN118944628B (en)*2024-08-082025-05-09深圳捷迅通射频技术有限公司Matching method, device, equipment and medium of radio frequency matcher

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Also Published As

Publication numberPublication date
WO2016110027A1 (en)2016-07-14
US10643822B2 (en)2020-05-05
JP6619818B2 (en)2019-12-11
US20170345621A1 (en)2017-11-30
KR101902427B1 (en)2018-09-28
KR20170103901A (en)2017-09-13
CN105826154A (en)2016-08-03
CN105826154B (en)2017-12-19
JP2018504864A (en)2018-02-15

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