

















| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010050947 | 2010-03-08 | ||
| JPJP-P-2010-050947 | 2010-03-08 | ||
| PCT/JP2011/053590WO2011111504A1 (en) | 2010-03-08 | 2011-02-14 | Electronic device and electronic system |
| Publication Number | Publication Date |
|---|---|
| KR20130005278A KR20130005278A (ko) | 2013-01-15 |
| KR101791253B1true KR101791253B1 (ko) | 2017-11-20 |
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020127025475AExpired - Fee RelatedKR101791253B1 (ko) | 2010-03-08 | 2011-02-14 | 전자기기 및 전자 시스템 |
| Country | Link |
|---|---|
| US (1) | US9261998B2 (ko) |
| JP (3) | JP5106647B2 (ko) |
| KR (1) | KR101791253B1 (ko) |
| TW (1) | TWI659338B (ko) |
| WO (1) | WO2011111504A1 (ko) |
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101751902B1 (ko)* | 2009-10-26 | 2017-06-28 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 표시 장치 및 반도체 장치 |
| WO2011089848A1 (en) | 2010-01-20 | 2011-07-28 | Semiconductor Energy Laboratory Co., Ltd. | Electronic device and electronic system |
| WO2011145537A1 (en) | 2010-05-21 | 2011-11-24 | Semiconductor Energy Laboratory Co., Ltd. | Liquid crystal display device |
| KR101160681B1 (ko) | 2011-10-19 | 2012-06-28 | 배경덕 | 이동 통신 단말기의 활성화 시에 특정 동작이 수행되도록 하기 위한 방법, 이동 통신 단말기 및 컴퓨터 판독 가능 기록 매체 |
| KR101909985B1 (ko)* | 2011-12-03 | 2018-10-22 | 엘지디스플레이 주식회사 | 액정 디스플레이 장치와 이의 구동방법 |
| WO2013125851A1 (en)* | 2012-02-24 | 2013-08-29 | Samsung Electronics Co., Ltd. | Device and method for moving display window on screen |
| TWI670553B (zh) | 2012-05-16 | 2019-09-01 | 日商半導體能源研究所股份有限公司 | 半導體裝置及觸控面板 |
| US9147706B2 (en) | 2012-05-29 | 2015-09-29 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device having sensor circuit having amplifier circuit |
| US8994677B2 (en)* | 2012-07-03 | 2015-03-31 | Innocom Technology (Shenzhen) Co., Ltd. | Touch sensing structure |
| KR20150085035A (ko) | 2012-11-15 | 2015-07-22 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 액정 디스플레이 장치 |
| TWI554993B (zh)* | 2012-11-20 | 2016-10-21 | 劍揚股份有限公司 | 具有光感應輸入的顯示驅動電路 |
| US9817520B2 (en)* | 2013-05-20 | 2017-11-14 | Semiconductor Energy Laboratory Co., Ltd. | Imaging panel and imaging device |
| JP5953289B2 (ja)* | 2013-11-29 | 2016-07-20 | 藤森工業株式会社 | 粘着剤組成物及び表面保護フィルム |
| CN103680385B (zh)* | 2013-11-29 | 2017-01-11 | 合肥京东方光电科技有限公司 | 触控电路及其驱动方法、阵列基板、触控显示装置 |
| JP2015108735A (ja)* | 2013-12-05 | 2015-06-11 | 旭硝子株式会社 | 電子デバイスの製造方法 |
| CN103680454A (zh)* | 2013-12-20 | 2014-03-26 | 深圳市华星光电技术有限公司 | 显示装置及显示驱动方法 |
| JP6506961B2 (ja)* | 2013-12-27 | 2019-04-24 | 株式会社半導体エネルギー研究所 | 液晶表示装置 |
| CN103676388A (zh)* | 2013-12-30 | 2014-03-26 | 合肥京东方光电科技有限公司 | 阵列基板、显示面板及其显示方法、显示装置 |
| TWI679624B (zh)* | 2014-05-02 | 2019-12-11 | 日商半導體能源研究所股份有限公司 | 半導體裝置 |
| JP2016066065A (ja) | 2014-09-05 | 2016-04-28 | 株式会社半導体エネルギー研究所 | 表示装置、および電子機器 |
| KR20190006101A (ko) | 2014-10-28 | 2019-01-16 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 발광 장치 및 전자 장치 |
| US10706790B2 (en) | 2014-12-01 | 2020-07-07 | Semiconductor Energy Laboratory Co., Ltd. | Display device, display module including the display device, and electronic device including the display device or the display module |
| TWI765634B (zh) | 2015-03-27 | 2022-05-21 | 日商半導體能源研究所股份有限公司 | 觸控面板 |
| US9684162B2 (en)* | 2015-04-09 | 2017-06-20 | Goodrich Corporation | Optical sensors |
| TWI598722B (zh)* | 2015-10-07 | 2017-09-11 | 宏碁股份有限公司 | 電子裝置及其外觀模組 |
| CN107422877B (zh)* | 2016-03-08 | 2020-07-17 | 禾瑞亚科技股份有限公司 | 提供倾斜角与笔身轴向的触控笔与其控制方法 |
| KR102365543B1 (ko)* | 2016-06-10 | 2022-02-18 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 정보 단말 |
| TWI697818B (zh)* | 2018-08-23 | 2020-07-01 | 緯創資通股份有限公司 | 可攜式電子裝置與控制顯示模組之畫面之方法 |
| KR102083413B1 (ko)* | 2018-10-02 | 2020-03-02 | 주식회사 넥슨코리아 | 모바일 단말기 및 모바일 단말기에서 사용자 인터페이스를 제공하는 방법 |
| KR102554262B1 (ko)* | 2018-12-28 | 2023-07-11 | 엘지디스플레이 주식회사 | 구동 회로, 디스플레이 패널 및 디스플레이 장치 |
| US11842002B2 (en)* | 2019-10-04 | 2023-12-12 | Semiconductor Energy Laboratory Co., Ltd. | Display device |
| KR102401789B1 (ko) | 2019-10-18 | 2022-05-26 | 이용훈 | 고정핀 기능을 갖는 장식 소품 |
| KR20210064483A (ko)* | 2019-11-25 | 2021-06-03 | 삼성디스플레이 주식회사 | 입력 감지 기능을 갖는 표시 패널 및 표시 장치 |
| KR102775873B1 (ko)* | 2020-06-30 | 2025-03-07 | 삼성디스플레이 주식회사 | 표시 장치 |
| CN113571557B (zh)* | 2021-07-09 | 2022-09-09 | 深圳市华星光电半导体显示技术有限公司 | 显示面板及显示装置 |
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009157367A (ja) | 2007-12-03 | 2009-07-16 | Semiconductor Energy Lab Co Ltd | 表示装置およびその作製方法 |
| JP2009271308A (ja)* | 2008-05-07 | 2009-11-19 | Seiko Epson Corp | 表示装置および電子機器 |
| JP2010026467A (ja) | 2008-07-24 | 2010-02-04 | Sony Corp | 表示装置および電子機器 |
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4285796A (en)* | 1978-08-21 | 1981-08-25 | The University Of Virginia | Electrolysis electrode |
| JPS60198861A (ja) | 1984-03-23 | 1985-10-08 | Fujitsu Ltd | 薄膜トランジスタ |
| JPH0244256B2 (ja) | 1987-01-28 | 1990-10-03 | Kagaku Gijutsucho Mukizaishitsu Kenkyushocho | Ingazn2o5deshimesarerurotsuhoshokeinosojokozoojusurukagobutsuoyobisonoseizoho |
| JPH0244258B2 (ja) | 1987-02-24 | 1990-10-03 | Kagaku Gijutsucho Mukizaishitsu Kenkyushocho | Ingazn3o6deshimesarerurotsuhoshokeinosojokozoojusurukagobutsuoyobisonoseizoho |
| JPH0244260B2 (ja) | 1987-02-24 | 1990-10-03 | Kagaku Gijutsucho Mukizaishitsu Kenkyushocho | Ingazn5o8deshimesarerurotsuhoshokeinosojokozoojusurukagobutsuoyobisonoseizoho |
| JPS63210023A (ja) | 1987-02-24 | 1988-08-31 | Natl Inst For Res In Inorg Mater | InGaZn↓4O↓7で示される六方晶系の層状構造を有する化合物およびその製造法 |
| JPH0244262B2 (ja) | 1987-02-27 | 1990-10-03 | Kagaku Gijutsucho Mukizaishitsu Kenkyushocho | Ingazn6o9deshimesarerurotsuhoshokeinosojokozoojusurukagobutsuoyobisonoseizoho |
| JPH0244263B2 (ja) | 1987-04-22 | 1990-10-03 | Kagaku Gijutsucho Mukizaishitsu Kenkyushocho | Ingazn7o10deshimesarerurotsuhoshokeinosojokozoojusurukagobutsuoyobisonoseizoho |
| JPH05251705A (ja) | 1992-03-04 | 1993-09-28 | Fuji Xerox Co Ltd | 薄膜トランジスタ |
| JP3479375B2 (ja) | 1995-03-27 | 2003-12-15 | 科学技術振興事業団 | 亜酸化銅等の金属酸化物半導体による薄膜トランジスタとpn接合を形成した金属酸化物半導体装置およびそれらの製造方法 |
| KR100394896B1 (ko) | 1995-08-03 | 2003-11-28 | 코닌클리케 필립스 일렉트로닉스 엔.브이. | 투명스위칭소자를포함하는반도체장치 |
| JPH09175232A (ja) | 1995-12-28 | 1997-07-08 | Sanyo Electric Works Ltd | 車両用モニタ装置 |
| JP3625598B2 (ja) | 1995-12-30 | 2005-03-02 | 三星電子株式会社 | 液晶表示装置の製造方法 |
| JP2978835B2 (ja) | 1997-05-15 | 1999-11-15 | 静岡日本電気株式会社 | タッチパネルつき情報端末 |
| JP2940539B1 (ja) | 1998-03-31 | 1999-08-25 | 日本電気株式会社 | 表示部照明付き情報端末装置 |
| JP4170454B2 (ja) | 1998-07-24 | 2008-10-22 | Hoya株式会社 | 透明導電性酸化物薄膜を有する物品及びその製造方法 |
| JP2000150861A (ja) | 1998-11-16 | 2000-05-30 | Tdk Corp | 酸化物薄膜 |
| JP3276930B2 (ja) | 1998-11-17 | 2002-04-22 | 科学技術振興事業団 | トランジスタ及び半導体装置 |
| JP2000173384A (ja) | 1998-12-02 | 2000-06-23 | Rohm Co Ltd | タッチパネル一体型の画像表示装置、および画像表示盤に対するタッチパネルの位置補正方法 |
| TW460731B (en) | 1999-09-03 | 2001-10-21 | Ind Tech Res Inst | Electrode structure and production method of wide viewing angle LCD |
| JP4112184B2 (ja) | 2000-01-31 | 2008-07-02 | 株式会社半導体エネルギー研究所 | エリアセンサ及び表示装置 |
| US6747638B2 (en) | 2000-01-31 | 2004-06-08 | Semiconductor Energy Laboratory Co., Ltd. | Adhesion type area sensor and display device having adhesion type area sensor |
| KR100771258B1 (ko)* | 2000-05-09 | 2007-10-29 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 본인 인증 시스템과 본인 인증 방법 및 휴대 전화 장치 |
| JP4089858B2 (ja) | 2000-09-01 | 2008-05-28 | 国立大学法人東北大学 | 半導体デバイス |
| KR20020038482A (ko) | 2000-11-15 | 2002-05-23 | 모리시타 요이찌 | 박막 트랜지스터 어레이, 그 제조방법 및 그것을 이용한표시패널 |
| JP2002236541A (ja) | 2001-02-09 | 2002-08-23 | Ricoh Co Ltd | 位置検出装置およびそれを用いたタッチパネルと携帯機器と形状検出装置 |
| JP3997731B2 (ja) | 2001-03-19 | 2007-10-24 | 富士ゼロックス株式会社 | 基材上に結晶性半導体薄膜を形成する方法 |
| JP2002289859A (ja) | 2001-03-23 | 2002-10-04 | Minolta Co Ltd | 薄膜トランジスタ |
| JP3925839B2 (ja) | 2001-09-10 | 2007-06-06 | シャープ株式会社 | 半導体記憶装置およびその試験方法 |
| JP4090716B2 (ja) | 2001-09-10 | 2008-05-28 | 雅司 川崎 | 薄膜トランジスタおよびマトリクス表示装置 |
| WO2003040441A1 (fr) | 2001-11-05 | 2003-05-15 | Japan Science And Technology Agency | Film mince monocristallin homologue a super-reseau naturel, procede de preparation et dispositif dans lequel est utilise ledit film mince monocristallin |
| JP4164562B2 (ja) | 2002-09-11 | 2008-10-15 | 独立行政法人科学技術振興機構 | ホモロガス薄膜を活性層として用いる透明薄膜電界効果型トランジスタ |
| JP4083486B2 (ja) | 2002-02-21 | 2008-04-30 | 独立行政法人科学技術振興機構 | LnCuO(S,Se,Te)単結晶薄膜の製造方法 |
| CN1445821A (zh) | 2002-03-15 | 2003-10-01 | 三洋电机株式会社 | ZnO膜和ZnO半导体层的形成方法、半导体元件及其制造方法 |
| JP3933591B2 (ja) | 2002-03-26 | 2007-06-20 | 淳二 城戸 | 有機エレクトロルミネッセント素子 |
| US7339187B2 (en) | 2002-05-21 | 2008-03-04 | State Of Oregon Acting By And Through The Oregon State Board Of Higher Education On Behalf Of Oregon State University | Transistor structures |
| JP2004022625A (ja) | 2002-06-13 | 2004-01-22 | Murata Mfg Co Ltd | 半導体デバイス及び該半導体デバイスの製造方法 |
| US7105868B2 (en) | 2002-06-24 | 2006-09-12 | Cermet, Inc. | High-electron mobility transistor with zinc oxide |
| US7067843B2 (en) | 2002-10-11 | 2006-06-27 | E. I. Du Pont De Nemours And Company | Transparent oxide semiconductor thin film transistors |
| US7042444B2 (en)* | 2003-01-17 | 2006-05-09 | Eastman Kodak Company | OLED display and touch screen |
| JP4166105B2 (ja) | 2003-03-06 | 2008-10-15 | シャープ株式会社 | 半導体装置およびその製造方法 |
| JP2004273732A (ja) | 2003-03-07 | 2004-09-30 | Sharp Corp | アクティブマトリクス基板およびその製造方法 |
| JP4108633B2 (ja) | 2003-06-20 | 2008-06-25 | シャープ株式会社 | 薄膜トランジスタおよびその製造方法ならびに電子デバイス |
| US7262463B2 (en) | 2003-07-25 | 2007-08-28 | Hewlett-Packard Development Company, L.P. | Transistor including a deposited channel region having a doped portion |
| JP2005122450A (ja) | 2003-10-16 | 2005-05-12 | Kyocera Mita Corp | 表示入力部を備える機器 |
| US20050200291A1 (en) | 2004-02-24 | 2005-09-15 | Naugler W. E.Jr. | Method and device for reading display pixel emission and ambient luminance levels |
| US20050200296A1 (en) | 2004-02-24 | 2005-09-15 | Naugler W. E.Jr. | Method and device for flat panel emissive display using shielded or partially shielded sensors to detect user screen inputs |
| AU2005216038A1 (en) | 2004-02-24 | 2005-09-09 | Nuelight Corporation | Penlight and touch screen data input system and method for flat panel displays |
| US20050200292A1 (en) | 2004-02-24 | 2005-09-15 | Naugler W. E.Jr. | Emissive display device having sensing for luminance stabilization and user light or touch screen input |
| US20050200294A1 (en) | 2004-02-24 | 2005-09-15 | Naugler W. E.Jr. | Sidelight illuminated flat panel display and touch panel input device |
| CN1998087B (zh) | 2004-03-12 | 2014-12-31 | 独立行政法人科学技术振兴机构 | 非晶形氧化物和薄膜晶体管 |
| US7282782B2 (en) | 2004-03-12 | 2007-10-16 | Hewlett-Packard Development Company, L.P. | Combined binary oxide semiconductor device |
| US7145174B2 (en) | 2004-03-12 | 2006-12-05 | Hewlett-Packard Development Company, Lp. | Semiconductor device |
| US7297977B2 (en) | 2004-03-12 | 2007-11-20 | Hewlett-Packard Development Company, L.P. | Semiconductor device |
| US7211825B2 (en) | 2004-06-14 | 2007-05-01 | Yi-Chi Shih | Indium oxide-based thin film transistors and circuits |
| US20060007205A1 (en) | 2004-06-29 | 2006-01-12 | Damoder Reddy | Active-matrix display and pixel structure for feedback stabilized flat panel display |
| AU2005260738A1 (en) | 2004-06-29 | 2006-01-12 | Nuelight Corporation | System and method for a high-performance display device having individual pixel luminance sensing and control |
| JP2006079589A (ja) | 2004-08-05 | 2006-03-23 | Sanyo Electric Co Ltd | タッチパネル |
| JP2006100760A (ja) | 2004-09-02 | 2006-04-13 | Casio Comput Co Ltd | 薄膜トランジスタおよびその製造方法 |
| US7285501B2 (en) | 2004-09-17 | 2007-10-23 | Hewlett-Packard Development Company, L.P. | Method of forming a solution processed device |
| US7298084B2 (en) | 2004-11-02 | 2007-11-20 | 3M Innovative Properties Company | Methods and displays utilizing integrated zinc oxide row and column drivers in conjunction with organic light emitting diodes |
| AU2005302964B2 (en) | 2004-11-10 | 2010-11-04 | Canon Kabushiki Kaisha | Field effect transistor employing an amorphous oxide |
| EP2453481B1 (en) | 2004-11-10 | 2017-01-11 | Canon Kabushiki Kaisha | Field effect transistor with amorphous oxide |
| US7863611B2 (en) | 2004-11-10 | 2011-01-04 | Canon Kabushiki Kaisha | Integrated circuits utilizing amorphous oxides |
| US7829444B2 (en) | 2004-11-10 | 2010-11-09 | Canon Kabushiki Kaisha | Field effect transistor manufacturing method |
| US7453065B2 (en) | 2004-11-10 | 2008-11-18 | Canon Kabushiki Kaisha | Sensor and image pickup device |
| KR100953596B1 (ko) | 2004-11-10 | 2010-04-21 | 캐논 가부시끼가이샤 | 발광장치 |
| US7791072B2 (en) | 2004-11-10 | 2010-09-07 | Canon Kabushiki Kaisha | Display |
| US7579224B2 (en) | 2005-01-21 | 2009-08-25 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing a thin film semiconductor device |
| TWI445178B (zh) | 2005-01-28 | 2014-07-11 | Semiconductor Energy Lab | 半導體裝置,電子裝置,和半導體裝置的製造方法 |
| TWI505473B (zh) | 2005-01-28 | 2015-10-21 | Semiconductor Energy Lab | 半導體裝置,電子裝置,和半導體裝置的製造方法 |
| US7858451B2 (en) | 2005-02-03 | 2010-12-28 | Semiconductor Energy Laboratory Co., Ltd. | Electronic device, semiconductor device and manufacturing method thereof |
| US7948171B2 (en) | 2005-02-18 | 2011-05-24 | Semiconductor Energy Laboratory Co., Ltd. | Light emitting device |
| JP4609168B2 (ja) | 2005-02-28 | 2011-01-12 | セイコーエプソン株式会社 | 電気泳動表示装置の駆動方法 |
| US20060197092A1 (en) | 2005-03-03 | 2006-09-07 | Randy Hoffman | System and method for forming conductive material on a substrate |
| US8681077B2 (en) | 2005-03-18 | 2014-03-25 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device, and display device, driving method and electronic apparatus thereof |
| US7544967B2 (en) | 2005-03-28 | 2009-06-09 | Massachusetts Institute Of Technology | Low voltage flexible organic/transparent transistor for selective gas sensing, photodetecting and CMOS device applications |
| US7645478B2 (en) | 2005-03-31 | 2010-01-12 | 3M Innovative Properties Company | Methods of making displays |
| US8300031B2 (en) | 2005-04-20 | 2012-10-30 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device comprising transistor having gate and drain connected through a current-voltage conversion element |
| JP2006344849A (ja) | 2005-06-10 | 2006-12-21 | Casio Comput Co Ltd | 薄膜トランジスタ |
| US7691666B2 (en) | 2005-06-16 | 2010-04-06 | Eastman Kodak Company | Methods of making thin film transistors comprising zinc-oxide-based semiconductor materials and transistors made thereby |
| US7402506B2 (en) | 2005-06-16 | 2008-07-22 | Eastman Kodak Company | Methods of making thin film transistors comprising zinc-oxide-based semiconductor materials and transistors made thereby |
| US7507618B2 (en) | 2005-06-27 | 2009-03-24 | 3M Innovative Properties Company | Method for making electronic devices using metal oxide nanoparticles |
| KR100711890B1 (ko) | 2005-07-28 | 2007-04-25 | 삼성에스디아이 주식회사 | 유기 발광표시장치 및 그의 제조방법 |
| JP2007059128A (ja) | 2005-08-23 | 2007-03-08 | Canon Inc | 有機el表示装置およびその製造方法 |
| JP5116225B2 (ja) | 2005-09-06 | 2013-01-09 | キヤノン株式会社 | 酸化物半導体デバイスの製造方法 |
| JP4280736B2 (ja) | 2005-09-06 | 2009-06-17 | キヤノン株式会社 | 半導体素子 |
| JP2007073705A (ja) | 2005-09-06 | 2007-03-22 | Canon Inc | 酸化物半導体チャネル薄膜トランジスタおよびその製造方法 |
| JP4850457B2 (ja) | 2005-09-06 | 2012-01-11 | キヤノン株式会社 | 薄膜トランジスタ及び薄膜ダイオード |
| EP1770788A3 (en) | 2005-09-29 | 2011-09-21 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device having oxide semiconductor layer and manufacturing method thereof |
| JP5037808B2 (ja) | 2005-10-20 | 2012-10-03 | キヤノン株式会社 | アモルファス酸化物を用いた電界効果型トランジスタ、及び該トランジスタを用いた表示装置 |
| CN101577231B (zh) | 2005-11-15 | 2013-01-02 | 株式会社半导体能源研究所 | 半导体器件及其制造方法 |
| TWI292281B (en) | 2005-12-29 | 2008-01-01 | Ind Tech Res Inst | Pixel structure of active organic light emitting diode and method of fabricating the same |
| US7867636B2 (en) | 2006-01-11 | 2011-01-11 | Murata Manufacturing Co., Ltd. | Transparent conductive film and method for manufacturing the same |
| JP4977478B2 (ja) | 2006-01-21 | 2012-07-18 | 三星電子株式会社 | ZnOフィルム及びこれを用いたTFTの製造方法 |
| US7576394B2 (en) | 2006-02-02 | 2009-08-18 | Kochi Industrial Promotion Center | Thin film transistor including low resistance conductive thin films and manufacturing method thereof |
| US7977169B2 (en) | 2006-02-15 | 2011-07-12 | Kochi Industrial Promotion Center | Semiconductor device including active layer made of zinc oxide with controlled orientations and manufacturing method thereof |
| KR20070101595A (ko) | 2006-04-11 | 2007-10-17 | 삼성전자주식회사 | ZnO TFT |
| US20070252928A1 (en) | 2006-04-28 | 2007-11-01 | Toppan Printing Co., Ltd. | Structure, transmission type liquid crystal display, reflection type display and manufacturing method thereof |
| JP5028033B2 (ja) | 2006-06-13 | 2012-09-19 | キヤノン株式会社 | 酸化物半導体膜のドライエッチング方法 |
| JP4609797B2 (ja) | 2006-08-09 | 2011-01-12 | Nec液晶テクノロジー株式会社 | 薄膜デバイス及びその製造方法 |
| JP4999400B2 (ja) | 2006-08-09 | 2012-08-15 | キヤノン株式会社 | 酸化物半導体膜のドライエッチング方法 |
| JP4332545B2 (ja) | 2006-09-15 | 2009-09-16 | キヤノン株式会社 | 電界効果型トランジスタ及びその製造方法 |
| JP4274219B2 (ja) | 2006-09-27 | 2009-06-03 | セイコーエプソン株式会社 | 電子デバイス、有機エレクトロルミネッセンス装置、有機薄膜半導体装置 |
| JP5164357B2 (ja) | 2006-09-27 | 2013-03-21 | キヤノン株式会社 | 半導体装置及び半導体装置の製造方法 |
| US7622371B2 (en) | 2006-10-10 | 2009-11-24 | Hewlett-Packard Development Company, L.P. | Fused nanocrystal thin film semiconductor and method |
| US7772021B2 (en) | 2006-11-29 | 2010-08-10 | Samsung Electronics Co., Ltd. | Flat panel displays comprising a thin-film transistor having a semiconductive oxide in its channel and methods of fabricating the same for use in flat panel displays |
| JP2008140684A (ja) | 2006-12-04 | 2008-06-19 | Toppan Printing Co Ltd | カラーelディスプレイおよびその製造方法 |
| KR101303578B1 (ko) | 2007-01-05 | 2013-09-09 | 삼성전자주식회사 | 박막 식각 방법 |
| JP2008182555A (ja) | 2007-01-25 | 2008-08-07 | Fujifilm Corp | 録音再生装置 |
| US8207063B2 (en) | 2007-01-26 | 2012-06-26 | Eastman Kodak Company | Process for atomic layer deposition |
| JP5391519B2 (ja) | 2007-02-06 | 2014-01-15 | 三菱電機株式会社 | 画像表示装置 |
| KR100851215B1 (ko) | 2007-03-14 | 2008-08-07 | 삼성에스디아이 주식회사 | 박막 트랜지스터 및 이를 이용한 유기 전계 발광표시장치 |
| JP4897525B2 (ja) | 2007-03-16 | 2012-03-14 | 株式会社 日立ディスプレイズ | 画像表示装置 |
| US7795613B2 (en) | 2007-04-17 | 2010-09-14 | Toppan Printing Co., Ltd. | Structure with transistor |
| KR101325053B1 (ko) | 2007-04-18 | 2013-11-05 | 삼성디스플레이 주식회사 | 박막 트랜지스터 기판 및 이의 제조 방법 |
| KR20080094300A (ko) | 2007-04-19 | 2008-10-23 | 삼성전자주식회사 | 박막 트랜지스터 및 그 제조 방법과 박막 트랜지스터를포함하는 평판 디스플레이 |
| KR101334181B1 (ko) | 2007-04-20 | 2013-11-28 | 삼성전자주식회사 | 선택적으로 결정화된 채널층을 갖는 박막 트랜지스터 및 그제조 방법 |
| CN101663762B (zh) | 2007-04-25 | 2011-09-21 | 佳能株式会社 | 氧氮化物半导体 |
| KR101345376B1 (ko) | 2007-05-29 | 2013-12-24 | 삼성전자주식회사 | ZnO 계 박막 트랜지스터 및 그 제조방법 |
| JP2008310374A (ja) | 2007-06-12 | 2008-12-25 | Mitsubishi Electric Corp | タッチパネル機能の検査方法およびタッチパネル機能の検査装置 |
| US7667177B2 (en) | 2007-07-19 | 2010-02-23 | Tpo Displays Corp. | Reading circuit, display panel and electronic system utilizing the same |
| JP2009128520A (ja) | 2007-11-21 | 2009-06-11 | Sharp Corp | 表示装置およびその製造方法 |
| US8202365B2 (en) | 2007-12-17 | 2012-06-19 | Fujifilm Corporation | Process for producing oriented inorganic crystalline film, and semiconductor device using the oriented inorganic crystalline film |
| JP4571198B2 (ja) | 2008-03-07 | 2010-10-27 | 京セラ株式会社 | 携帯通信端末 |
| JP4623179B2 (ja) | 2008-09-18 | 2011-02-02 | ソニー株式会社 | 薄膜トランジスタおよびその製造方法 |
| BRPI0919549A2 (pt) | 2008-09-30 | 2019-09-10 | Sharp Kk | dispositivo de exibição |
| KR20100038046A (ko) | 2008-10-02 | 2010-04-12 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 터치 패널 및 터치 패널의 구동방법 |
| JP5451280B2 (ja) | 2008-10-09 | 2014-03-26 | キヤノン株式会社 | ウルツ鉱型結晶成長用基板およびその製造方法ならびに半導体装置 |
| CN102265244B (zh) | 2008-12-24 | 2015-08-26 | 株式会社半导体能源研究所 | 触摸面板及其驱动方法 |
| JP5313853B2 (ja) | 2008-12-24 | 2013-10-09 | 株式会社半導体エネルギー研究所 | センサを有する装置、及び表示装置 |
| JP5100670B2 (ja) | 2009-01-21 | 2012-12-19 | 株式会社半導体エネルギー研究所 | タッチパネル、電子機器 |
| JP2010191288A (ja) | 2009-02-19 | 2010-09-02 | Autonetworks Technologies Ltd | 表示制御装置 |
| JP5202395B2 (ja) | 2009-03-09 | 2013-06-05 | 株式会社半導体エネルギー研究所 | タッチパネル、電子機器 |
| US8982099B2 (en) | 2009-06-25 | 2015-03-17 | Semiconductor Energy Laboratory Co., Ltd. | Touch panel and driving method of the same |
| JP5340837B2 (ja) | 2009-07-16 | 2013-11-13 | 株式会社半導体エネルギー研究所 | タッチパネル及びタッチパネルの作製方法 |
| JP5204815B2 (ja) | 2010-08-11 | 2013-06-05 | 京セラ株式会社 | 携帯通信端末 |
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009157367A (ja) | 2007-12-03 | 2009-07-16 | Semiconductor Energy Lab Co Ltd | 表示装置およびその作製方法 |
| JP2009271308A (ja)* | 2008-05-07 | 2009-11-19 | Seiko Epson Corp | 表示装置および電子機器 |
| JP2010026467A (ja) | 2008-07-24 | 2010-02-04 | Sony Corp | 表示装置および電子機器 |
| Publication number | Publication date |
|---|---|
| US9261998B2 (en) | 2016-02-16 |
| JP2011210241A (ja) | 2011-10-20 |
| US20110216023A1 (en) | 2011-09-08 |
| JP5711714B2 (ja) | 2015-05-07 |
| JP5106647B2 (ja) | 2012-12-26 |
| TWI659338B (zh) | 2019-05-11 |
| JP2013020640A (ja) | 2013-01-31 |
| WO2011111504A1 (en) | 2011-09-15 |
| JP5878997B2 (ja) | 2016-03-08 |
| KR20130005278A (ko) | 2013-01-15 |
| JP2015144003A (ja) | 2015-08-06 |
| TW201205379A (en) | 2012-02-01 |
| Publication | Publication Date | Title |
|---|---|---|
| KR101791253B1 (ko) | 전자기기 및 전자 시스템 | |
| JP6785918B2 (ja) | 電子機器 | |
| JP6317412B2 (ja) | 表示装置及び表示装置の作製方法 | |
| US8144102B2 (en) | Memory element and display device | |
| CN114556580B (zh) | 显示基板及显示装置 | |
| US7995026B2 (en) | Sensor and display device including the sensor | |
| KR102513405B1 (ko) | 표시장치 | |
| JP2005346238A (ja) | 画像読取装置 |
| Date | Code | Title | Description |
|---|---|---|---|
| PA0105 | International application | St.27 status event code:A-0-1-A10-A15-nap-PA0105 | |
| PG1501 | Laying open of application | St.27 status event code:A-1-1-Q10-Q12-nap-PG1501 | |
| A201 | Request for examination | ||
| PA0201 | Request for examination | St.27 status event code:A-1-2-D10-D11-exm-PA0201 | |
| D13-X000 | Search requested | St.27 status event code:A-1-2-D10-D13-srh-X000 | |
| D14-X000 | Search report completed | St.27 status event code:A-1-2-D10-D14-srh-X000 | |
| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection | St.27 status event code:A-1-2-D10-D21-exm-PE0902 | |
| P11-X000 | Amendment of application requested | St.27 status event code:A-2-2-P10-P11-nap-X000 | |
| P13-X000 | Application amended | St.27 status event code:A-2-2-P10-P13-nap-X000 | |
| E701 | Decision to grant or registration of patent right | ||
| PE0701 | Decision of registration | St.27 status event code:A-1-2-D10-D22-exm-PE0701 | |
| GRNT | Written decision to grant | ||
| PR0701 | Registration of establishment | St.27 status event code:A-2-4-F10-F11-exm-PR0701 | |
| PR1002 | Payment of registration fee | St.27 status event code:A-2-2-U10-U12-oth-PR1002 Fee payment year number:1 | |
| PG1601 | Publication of registration | St.27 status event code:A-4-4-Q10-Q13-nap-PG1601 | |
| PG1701 | Publication of correction | St.27 status event code:A-5-5-P10-P19-oth-PG1701 Patent document republication publication date:20171206 Republication note text:Request for Correction Notice (Document Request) Gazette number:1017912530000 Gazette reference publication date:20171120 | |
| PR1001 | Payment of annual fee | St.27 status event code:A-4-4-U10-U11-oth-PR1001 Fee payment year number:4 | |
| P22-X000 | Classification modified | St.27 status event code:A-4-4-P10-P22-nap-X000 | |
| PC1903 | Unpaid annual fee | St.27 status event code:A-4-4-U10-U13-oth-PC1903 Not in force date:20211024 Payment event data comment text:Termination Category : DEFAULT_OF_REGISTRATION_FEE | |
| PC1903 | Unpaid annual fee | St.27 status event code:N-4-6-H10-H13-oth-PC1903 Ip right cessation event data comment text:Termination Category : DEFAULT_OF_REGISTRATION_FEE Not in force date:20211024 |