JPS6489318A - Vapor growth susceptor - Google Patents

Abstract

PURPOSE:To generate uniform spherical recesses and to prevent the periphery of a wafer from abnormally growing by allowing a section for supporting the wafer at its center to remain and providing a deep groove on the periphery. CONSTITUTION:In a vapor growing susceptor 1 having spherical recesses 2 for placing wafers, a section having smaller area than that of the wafer remains at its center as the bottom of the recess 2, and a deeper groove 28 than the depth 4 of the recess 2 is annularly formed on the periphery of the bottom in contact with the vertical side face 2A of the recess 2. The groove 2B is covered with silicon carbide 1A on the whole surface of the carbon core of the susceptor 1, thereby eliminating an influence to the wafer due to the atmosphere and temperature distribution of the carbon core material at the time of vapor chemical reaction. It can prevent the periphery of the wafer from abnormally growing by utilizing the groove 2A formed by retaining as the bottom of the recess 2.