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JPS6482674A - Thin film transistor - Google Patents

Thin film transistor

Info

Publication number
JPS6482674A
JPS6482674AJP24160787AJP24160787AJPS6482674AJP S6482674 AJPS6482674 AJP S6482674AJP 24160787 AJP24160787 AJP 24160787AJP 24160787 AJP24160787 AJP 24160787AJP S6482674 AJPS6482674 AJP S6482674A
Authority
JP
Japan
Prior art keywords
electrode
gate
thin film
film transistor
capacity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP24160787A
Other languages
Japanese (ja)
Inventor
Minoru Kanbara
Nobuyuki Yamamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Casio Computer Co Ltd
Original Assignee
Casio Computer Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Casio Computer Co LtdfiledCriticalCasio Computer Co Ltd
Priority to JP24160787ApriorityCriticalpatent/JPS6482674A/en
Priority to US07/241,304prioritypatent/US5032883A/en
Publication of JPS6482674ApublicationCriticalpatent/JPS6482674A/en
Priority to US07/503,268prioritypatent/US5003356A/en
Priority to US07/503,270prioritypatent/US5055899A/en
Priority to US07/503,269prioritypatent/US5166085A/en
Priority to US07/831,002prioritypatent/US5229644A/en
Priority to US08/041,537prioritypatent/US5327001A/en
Pendinglegal-statusCriticalCurrent

Links

Classifications

Landscapes

Abstract

PURPOSE:To reduce a capacity component generated between a gate electrode and a source electrode and to improve an S/N ratio by reducing the area of the superposing region of the gate electrode and the source electrode. CONSTITUTION:In a thin film transistor 19, its source electrode 15 is formed to be smaller than its drain region 16, and the superposing area of the electrode 15 and a gate electrode 12 is extremely smaller than that of the drain and gate electrodes 16 and 12. Accordingly, a gate-source capacity CGS presented between the electrodes 12 and 15 is extremely small. If an equivalent capacity CLC between the opposite electrodes facing through a pixel electrode 18 and a liquid crystal is 0.1PF, the voltage drop V of the source electrode is extremely small. Accordingly, the electrode 18 can be miniaturized. Since the electrode 16 is so formed as to surround the electrode 15, its substantial channel width can be increased, thereby providing large driving capacity of the thin film transistor.
JP24160787A1987-09-091987-09-25Thin film transistorPendingJPS6482674A (en)

Priority Applications (7)

Application NumberPriority DateFiling DateTitle
JP24160787AJPS6482674A (en)1987-09-251987-09-25Thin film transistor
US07/241,304US5032883A (en)1987-09-091988-09-07Thin film transistor and method of manufacturing the same
US07/503,268US5003356A (en)1987-09-091990-04-02Thin film transistor array
US07/503,270US5055899A (en)1987-09-091990-04-02Thin film transistor
US07/503,269US5166085A (en)1987-09-091990-04-02Method of manufacturing a thin film transistor
US07/831,002US5229644A (en)1987-09-091992-02-05Thin film transistor having a transparent electrode and substrate
US08/041,537US5327001A (en)1987-09-091993-04-01Thin film transistor array having single light shield layer over transistors and gate and drain lines

Applications Claiming Priority (1)

Application NumberPriority DateFiling DateTitle
JP24160787AJPS6482674A (en)1987-09-251987-09-25Thin film transistor

Publications (1)

Publication NumberPublication Date
JPS6482674Atrue JPS6482674A (en)1989-03-28

Family

ID=17076834

Family Applications (1)

Application NumberTitlePriority DateFiling Date
JP24160787APendingJPS6482674A (en)1987-09-091987-09-25Thin film transistor

Country Status (1)

CountryLink
JP (1)JPS6482674A (en)

Cited By (21)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US5049952A (en)*1989-12-301991-09-17Samsung Electron Devices Co., Ltd.Thin film transistor for use in a flat plate display
US5183271A (en)*1990-01-251993-02-02Nok CorporationSealing device and manufacturing method of the same
US5414283A (en)*1993-11-191995-05-09Ois Optical Imaging Systems, Inc.TFT with reduced parasitic capacitance
US5595697A (en)*1990-01-251997-01-21Nok CorporationMethod of manufacturing a sealing device
KR20020016311A (en)*2000-08-252002-03-04주식회사 현대 디스플레이 테크놀로지Liquid crystal display device of thin film transistor
WO2002031887A1 (en)*2000-10-122002-04-18Sanyo Electric Co., Ltd.Transistor and display comprising it
KR100336898B1 (en)*1998-12-302003-06-09주식회사 현대 디스플레이 테크놀로지 Thin film transistor of liquid crystal display device
US6664569B2 (en)*2000-06-092003-12-16Lg. Philips Lcd Co., Ltd.Liquid crystal display device array substrate and method of manufacturing the same
KR20040032603A (en)*2002-10-102004-04-17비오이 하이디스 테크놀로지 주식회사Digital x-ray detector
JP2004274050A (en)*2003-03-042004-09-30Samsung Electronics Co Ltd An amorphous-silicon thin film transistor and a shift register including the same.
JP2005093633A (en)*2003-09-172005-04-07Sony Corp Field effect transistor
JP2006310636A (en)*2005-04-282006-11-09Lg Phillips Lcd Co Ltd Thin film transistor
JP2007173307A (en)*2005-12-192007-07-05Lg Phillips Lcd Co Ltd Thin film transistor
KR100767631B1 (en)*2001-06-192007-10-17엘지.필립스 엘시디 주식회사 Manufacturing method of array substrate for liquid crystal display device
JP2009086118A (en)*2007-09-282009-04-23Epson Imaging Devices Corp Liquid crystal display device and electronic device
JP2009288625A (en)*2008-05-302009-12-10Sony CorpElectronic circuit and panel
US7688392B2 (en)2006-04-062010-03-30Chunghwa Picture Tubes, Ltd.Pixel structure including a gate having an opening and an extension line between the data line and the source
CN105116653A (en)*2015-09-142015-12-02深超光电(深圳)有限公司Display panel
JP2016225991A (en)*2008-11-282016-12-28株式会社半導体エネルギー研究所Semiconductor device, display device, display module, and electronic apparatus
JP2022095719A (en)*2009-01-162022-06-28株式会社半導体エネルギー研究所 Semiconductor device
JP2023178298A (en)*2009-10-092023-12-14株式会社半導体エネルギー研究所Light-emitting display device

Citations (1)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
JPS60192369A (en)*1984-03-131985-09-30Matsushita Electric Ind Co Ltd thin film transistor

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
JPS60192369A (en)*1984-03-131985-09-30Matsushita Electric Ind Co Ltd thin film transistor

Cited By (41)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US5049952A (en)*1989-12-301991-09-17Samsung Electron Devices Co., Ltd.Thin film transistor for use in a flat plate display
US5183271A (en)*1990-01-251993-02-02Nok CorporationSealing device and manufacturing method of the same
US5595697A (en)*1990-01-251997-01-21Nok CorporationMethod of manufacturing a sealing device
US5414283A (en)*1993-11-191995-05-09Ois Optical Imaging Systems, Inc.TFT with reduced parasitic capacitance
KR100336898B1 (en)*1998-12-302003-06-09주식회사 현대 디스플레이 테크놀로지 Thin film transistor of liquid crystal display device
US6664569B2 (en)*2000-06-092003-12-16Lg. Philips Lcd Co., Ltd.Liquid crystal display device array substrate and method of manufacturing the same
KR20020016311A (en)*2000-08-252002-03-04주식회사 현대 디스플레이 테크놀로지Liquid crystal display device of thin film transistor
WO2002031887A1 (en)*2000-10-122002-04-18Sanyo Electric Co., Ltd.Transistor and display comprising it
KR100798787B1 (en)*2000-10-122008-01-29산요덴키가부시키가이샤 Transistor and display device having same
JP2008004957A (en)*2000-10-122008-01-10Seiko Epson Corp Transistor and display device including the same
US6897482B2 (en)2000-10-122005-05-24Sanyo Electric Co., Ltd.Transistor and display comprising it
KR100767631B1 (en)*2001-06-192007-10-17엘지.필립스 엘시디 주식회사 Manufacturing method of array substrate for liquid crystal display device
KR20040032603A (en)*2002-10-102004-04-17비오이 하이디스 테크놀로지 주식회사Digital x-ray detector
US8008690B2 (en)2003-03-042011-08-30Samsung Electronics Co., Ltd.Amorphous-silicon thin film transistor and shift register having the same
US8610179B2 (en)2003-03-042013-12-17Samsung Display Co., Ltd.Amorphous-silicon thin film transistor and shift register having the same
JP2004274050A (en)*2003-03-042004-09-30Samsung Electronics Co Ltd An amorphous-silicon thin film transistor and a shift register including the same.
JP2005093633A (en)*2003-09-172005-04-07Sony Corp Field effect transistor
JP2006310636A (en)*2005-04-282006-11-09Lg Phillips Lcd Co Ltd Thin film transistor
JP2007173307A (en)*2005-12-192007-07-05Lg Phillips Lcd Co Ltd Thin film transistor
US7688392B2 (en)2006-04-062010-03-30Chunghwa Picture Tubes, Ltd.Pixel structure including a gate having an opening and an extension line between the data line and the source
JP2009086118A (en)*2007-09-282009-04-23Epson Imaging Devices Corp Liquid crystal display device and electronic device
JP2009288625A (en)*2008-05-302009-12-10Sony CorpElectronic circuit and panel
US10971075B2 (en)2008-11-282021-04-06Semiconductor Energy Laboratory Co., Ltd.Display device and electronic device including the same
US11776483B2 (en)2008-11-282023-10-03Semiconductor Energy Laboratory Co., Ltd.Display device and electronic device including the same
US9941308B2 (en)2008-11-282018-04-10Semiconductor Energy Laboratory Co., Ltd.Display device and electronic device including the same
US10008519B1 (en)2008-11-282018-06-26Semiconductor Energy Laboratory Co., Ltd.Display device and electronic device including the same
US12131706B2 (en)2008-11-282024-10-29Semiconductor Energy Laboratory Co., Ltd.Display device and electronic device including the same
US10304873B2 (en)2008-11-282019-05-28Semiconductor Energy Laboratory Co., Ltd.Display device and electronic device including the same
US10629134B2 (en)2008-11-282020-04-21Semiconductor Energy Laboratory Co., Ltd.Display device and electronic device including the same
US12046203B2 (en)2008-11-282024-07-23Semiconductor Energy Laboratory Co., Ltd.Display device and electronic device including the same
US11250785B2 (en)2008-11-282022-02-15Semiconductor Energy Laboratory Co., Ltd.Display device and electronic device including the same
JP2016225991A (en)*2008-11-282016-12-28株式会社半導体エネルギー研究所Semiconductor device, display device, display module, and electronic apparatus
US11527208B2 (en)2008-11-282022-12-13Semiconductor Energy Laboratory Co., Ltd.Display device and electronic device including the same
JP2023076500A (en)*2009-01-162023-06-01株式会社半導体エネルギー研究所 liquid crystal display
US11735133B2 (en)2009-01-162023-08-22Semiconductor Energy Laboratory Co., Ltd.Liquid crystal display device and electronic device including the same
JP2022095719A (en)*2009-01-162022-06-28株式会社半導体エネルギー研究所 Semiconductor device
US12027133B2 (en)2009-01-162024-07-02Semiconductor Energy Laboratory Co., Ltd.Liquid crystal display device and electronic device including the same
JP2023178298A (en)*2009-10-092023-12-14株式会社半導体エネルギー研究所Light-emitting display device
US12224376B2 (en)2009-10-092025-02-11Semiconductor Energy Laboratory Co., Ltd.Light-emitting display device and electronic device including a first pixel and a second pixel and an oxide semiconductor region overlapping a light-emitting region
CN105116653A (en)*2015-09-142015-12-02深超光电(深圳)有限公司Display panel
CN105116653B (en)*2015-09-142019-02-15深超光电(深圳)有限公司 display panel

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