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JPS6439694A - Non-volatile semiconductor memory device - Google Patents

Non-volatile semiconductor memory device

Info

Publication number
JPS6439694A
JPS6439694AJP19682587AJP19682587AJPS6439694AJP S6439694 AJPS6439694 AJP S6439694AJP 19682587 AJP19682587 AJP 19682587AJP 19682587 AJP19682587 AJP 19682587AJP S6439694 AJPS6439694 AJP S6439694A
Authority
JP
Japan
Prior art keywords
erasure
write
voltage
memory cell
floating gates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP19682587A
Other languages
Japanese (ja)
Inventor
Takeshi Nakayama
Kazuo Kobayashi
Yasushi Terada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric CorpfiledCriticalMitsubishi Electric Corp
Priority to JP19682587ApriorityCriticalpatent/JPS6439694A/en
Priority to US07/156,431prioritypatent/US4903236A/en
Publication of JPS6439694ApublicationCriticalpatent/JPS6439694A/en
Pendinglegal-statusCriticalCurrent

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Abstract

PURPOSE:To operate a device only by an internal power source without necessitating an external high voltage, to miniaturize the device, and to lower cost, by performing an erasure and write operation by utilizing a tunnel phenomenon by providing an erasure and write voltage impression means. CONSTITUTION:In a memory cell array 20, a plural memory cells MC are arranged in a matrix shape. Plural bit lines BL and word lines WL are arranged intersecting orthogonally, and the memory cell MC is arranged on respective intersection. The erasure operation is performed in such a way that an erasing state can be obtained by applying a prescribed voltage between the bit line and the word line, generating the tunnel phenomenon between the drain areas of all memory cells and floating gates, and injecting electrons in the floating gates. The write operation is performed in such a way that a write state can be obtained by generating the tunnel phenomenon by applying a voltage between the bit line and the word line of only a selected one memory cell, and extracting the electrons in the floating gates. Thus, it is possible to miniaturize the device, to lower the cost, and to increase the number of times of the erasure and the write.
JP19682587A1987-07-151987-08-05Non-volatile semiconductor memory devicePendingJPS6439694A (en)

Priority Applications (2)

Application NumberPriority DateFiling DateTitle
JP19682587AJPS6439694A (en)1987-08-051987-08-05Non-volatile semiconductor memory device
US07/156,431US4903236A (en)1987-07-151988-02-16Nonvolatile semiconductor memory device and a writing method therefor

Applications Claiming Priority (1)

Application NumberPriority DateFiling DateTitle
JP19682587AJPS6439694A (en)1987-08-051987-08-05Non-volatile semiconductor memory device

Publications (1)

Publication NumberPublication Date
JPS6439694Atrue JPS6439694A (en)1989-02-09

Family

ID=16364291

Family Applications (1)

Application NumberTitlePriority DateFiling Date
JP19682587APendingJPS6439694A (en)1987-07-151987-08-05Non-volatile semiconductor memory device

Country Status (1)

CountryLink
JP (1)JPS6439694A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
WO1992005560A1 (en)*1990-09-251992-04-02Kabushiki Kaisha ToshibaNonvolatile semiconductor memory
KR100495634B1 (en)*1997-09-022005-09-02소니 가부시끼 가이샤 Nonvolatile semiconductor memory device and its writing and erasing method

Citations (2)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
JPS58115691A (en)*1981-12-281983-07-09ヒユ−ズ・エアクラフト・カンパニ−Programmable read only memory cell electrically erasable with single transistor
JPS6199997A (en)*1984-10-231986-05-19エツセジーエツセ ミクロエレツトロニカWriting for merged type non-volatile memory matrix

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
JPS58115691A (en)*1981-12-281983-07-09ヒユ−ズ・エアクラフト・カンパニ−Programmable read only memory cell electrically erasable with single transistor
JPS6199997A (en)*1984-10-231986-05-19エツセジーエツセ ミクロエレツトロニカWriting for merged type non-volatile memory matrix

Cited By (2)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
WO1992005560A1 (en)*1990-09-251992-04-02Kabushiki Kaisha ToshibaNonvolatile semiconductor memory
KR100495634B1 (en)*1997-09-022005-09-02소니 가부시끼 가이샤 Nonvolatile semiconductor memory device and its writing and erasing method

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