Movatterモバイル変換


[0]ホーム

URL:


JPS643605A - Production of color filter - Google Patents

Production of color filter

Info

Publication number
JPS643605A
JPS643605AJP15938587AJP15938587AJPS643605AJP S643605 AJPS643605 AJP S643605AJP 15938587 AJP15938587 AJP 15938587AJP 15938587 AJP15938587 AJP 15938587AJP S643605 AJPS643605 AJP S643605A
Authority
JP
Japan
Prior art keywords
film
pad part
color filter
aluminum
aluminum pad
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15938587A
Other languages
Japanese (ja)
Inventor
Toshifumi Suganaga
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric CorpfiledCriticalMitsubishi Electric Corp
Priority to JP15938587ApriorityCriticalpatent/JPS643605A/en
Publication of JPS643605ApublicationCriticalpatent/JPS643605A/en
Pendinglegal-statusCriticalCurrent

Links

Landscapes

Abstract

PURPOSE:To prevent corrosion of aluminum of an aluminum pad part and to shorten a stage for the production of a color filter by carrying out patterning of a resin to be used for color filter prior to an etching stage of a glass coating film on the aluminum pad part, and carrying out the etching using a polyimide resin film as a mask. CONSTITUTION:A glass coating film 2 is formed on a substrate 5 having an aluminum pad part 1 formed thereon, and a pattern of a color filter resin is formed on the glass coating film 2. Then, a polyimide resin film 3 and a photoresist film 4 are coated thereon,and the photoresist film 4 is developed and the polyimide resin film 3 is etched. Remaining photoresist film 4 is stripped, and the glass coating film 2 on the aluminum pad part 1 is etched using the polyimide resin film 3 as mask. By this method, corrosion of aluminum in the aluminum pad part is prevented, the production stage is shortened, and the prepn. cost is reduced.
JP15938587A1987-06-251987-06-25Production of color filterPendingJPS643605A (en)

Priority Applications (1)

Application NumberPriority DateFiling DateTitle
JP15938587AJPS643605A (en)1987-06-251987-06-25Production of color filter

Applications Claiming Priority (1)

Application NumberPriority DateFiling DateTitle
JP15938587AJPS643605A (en)1987-06-251987-06-25Production of color filter

Publications (1)

Publication NumberPublication Date
JPS643605Atrue JPS643605A (en)1989-01-09

Family

ID=15692639

Family Applications (1)

Application NumberTitlePriority DateFiling Date
JP15938587APendingJPS643605A (en)1987-06-251987-06-25Production of color filter

Country Status (1)

CountryLink
JP (1)JPS643605A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
DE4007119A1 (en)*1989-12-021991-06-13Samsung Electronics Co Ltd COLOR FILTER AND METHOD FOR THE PRODUCTION THEREOF

Cited By (1)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
DE4007119A1 (en)*1989-12-021991-06-13Samsung Electronics Co Ltd COLOR FILTER AND METHOD FOR THE PRODUCTION THEREOF

Similar Documents

PublicationPublication DateTitle
JPS5669835A (en)Method for forming thin film pattern
DE69515571D1 (en) Process for producing a glass substrate coated with a finely structured Nesa glass membrane
EP0304077A3 (en)Method of forming a fine pattern
JPS643605A (en)Production of color filter
JPS649618A (en)Pattern formation
JPS6421450A (en)Production of mask
JPS5610930A (en)Manufacture of semiconductor device
JPS57136646A (en)Positive type photoresist developing method
JPS641215A (en)Manufacture of magnetic thin film
JPS5527639A (en)Photo-resist pattern forming method
JPS5655950A (en)Photographic etching method
JPS5541721A (en)Carrier tape for semiconductor device
JPS5690539A (en)Production of semiconductor device
JPS57118641A (en)Lifting-off method
ES2006071A6 (en)Cladding of substrates with thick metal circuit patterns
JPS6447025A (en)Etching
JPS57102051A (en)Manufacture of semiconductor device
JPS57112018A (en)Correction of pattern
JPS57102025A (en)Manufacture of semiconductor device
JPS648622A (en)Manufacture of semiconductor device
JPS57211785A (en)Electrode formation of semiconductor device
JPS6489540A (en)Formation of wiring pattern
JPS5557229A (en)Method for forming patterned conductor layer
JPS56135944A (en)Manufacture of semiconductor device
JPS6482092A (en)Manufacture of surface colored body

[8]ページ先頭

©2009-2025 Movatter.jp