【発明の詳細な説明】産業上意El豆団本発明は、例えば半導体装置の製造過程におけるレジス
トプロセスに関係し、試料の樹脂塗布面の背面側に樹脂
を廻り込ませないように改良した樹脂の塗布方法に関す
る。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a resist process in the manufacturing process of semiconductor devices, for example, and relates to an improved resin that prevents resin from going around to the back side of the resin-coated surface of a sample. The present invention relates to a method of applying.
■来二伎亙レジストプロセスにおいて、レジストを塗布するには、
スピンコード、スプレーコートおよびディップコート等
の方法がある。ところで、塗布した膜の安定性および均
一性という点においては、前記スピンコードつまり試料
としてのウェハを真空でチャックして高速回転させなが
ら行う方法が優れているので、この方法が従来では主に
用いられている。■To apply the resist in the Raijiki resist process,
Methods include spin cording, spray coating, and dip coating. By the way, in terms of the stability and uniformity of the coated film, the spin cord, that is, the method of chuckling the wafer as a sample in a vacuum and rotating it at high speed, is superior, so this method has been mainly used in the past. It is being
、■が72しよ゛とするい 占とごろで、上述したスピンコードにおいては、試料を回
転させている際に、当該試料の樹脂塗布面の背面側にレ
ジストが廻り込んでしまうことがある。廻り込んだレジ
ストは、後工程により硬化することとなり、結局廻り込
んだレジストを作業者がカッター等で除去しなければな
らず、煩わしいと共に後工程への進行を妨げてしまうと
いう問題点を生じる。, ■ is about 72. By the way, in the above-mentioned spin code, when the sample is rotated, the resist may get wrapped around the back side of the resin-coated surface of the sample. . The resist that has gone around will be hardened in the subsequent process, and the operator will have to remove the resist that has gone around with a cutter or the like, which is troublesome and will hinder the process from proceeding to the next process.
本発明は上記問題点を解決するために創案されたもので
、その目的は、試料の樹脂塗布面の背面側に樹脂を廻り
込ませない樹脂の塗布方法を提供することにある。The present invention was devised to solve the above-mentioned problems, and its purpose is to provide a resin coating method that does not allow resin to go around to the back side of the resin-coated surface of a sample.
r11占をtL゛るための一交本発明にかかる樹脂の塗布方法は、試料の樹脂塗布面に
樹脂を滴下してから、該試料を回転させると共に、当該
試料の周縁部に対して下方から試料の周縁部に向かう風
を吹きつけるようにしている。The resin coating method according to the present invention for increasing the r11 ratio is to drop the resin onto the resin-coated surface of the sample, rotate the sample, and apply the resin to the periphery of the sample from below. The wind is directed towards the periphery of the sample.
作用−回転によって試料の周縁部に樹脂が広がるが、試料の周
縁部に対して吹きつける下方から上方向きの風により、
前記樹脂が試料の樹脂塗布面の背面側に廻り込みにくく
なる。Effect - The resin spreads around the periphery of the sample due to rotation, but due to the wind blowing from the bottom to the top against the periphery of the sample,
The resin is less likely to go around to the back side of the resin-coated surface of the sample.
災胤医以下、図面を参照して本発明の一実施例を詳細に説明す
る。DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described in detail below with reference to the drawings.
第1図fa)において、符号lは縦断面略T字状の試料
支持台を示しており、真空チャックとしての機能を有し
ている。この支持台1の吸着面11には、例えば半導体
ウェハなどの試料2が吸着保持されている。この試料2
の上方には、例えばレジストなどの樹脂3を滴下させる
樹脂供給器(図示省略)のノズル4が配置されている。In FIG. 1 fa), the reference numeral 1 indicates a sample support stand having a substantially T-shaped longitudinal section, and has a function as a vacuum chuck. A sample 2 such as a semiconductor wafer, for example, is held by suction on the suction surface 11 of the support base 1 . This sample 2
A nozzle 4 of a resin supply device (not shown) for dropping a resin 3 such as resist, for example, is arranged above the nozzle 4 .
そして、支持台1の外周には4本の風供給用のパイプ5
が等角度でもって配設されている。パイプ5の各先端は
、支持台1の吸着面11よりも僅かに低くなるように位
置されている。パイプ5からは、第1図(b)に示すよ
うに、試料2の中央から外方向にかつ下方から斜め上方
に向かう風を送出させるようになっている。There are four wind supply pipes 5 on the outer periphery of the support base 1.
are arranged at equal angles. Each tip of the pipe 5 is positioned slightly lower than the suction surface 11 of the support base 1. As shown in FIG. 1(b), the pipe 5 sends out air outward from the center of the sample 2 and from below to diagonally upward.
このような構成のスピンコード装置を用いて、試料2の
樹脂塗布面21に樹脂膜を形成する方法について説明す
る。A method of forming a resin film on the resin-coated surface 21 of the sample 2 using the spin cord apparatus having such a configuration will be described.
まず、支持台lの吸着面11上に吸着された試料2の樹
脂塗布面21の略中央位置に、適量の樹脂3を滴下して
から、支持台1を約50Orpmで回転させると共に、
パイプ5から所定量の風を送る。さて、支持台1の回転
により樹脂3は遠心力に起因して試料2の樹脂塗布面2
1を外周側に向かって広がっていく。試料2の周縁部2
2に樹脂3が到達して試料2の背面23側に廻り込もう
とするが、試料2の周縁部22に対して風を下方から斜
め上方に向かって吹きつけているので、廻り込もうとす
る樹脂3は試料2表面の周縁部22にせきどめされる。First, an appropriate amount of resin 3 is dropped onto the approximately central position of the resin-coated surface 21 of the sample 2 adsorbed on the suction surface 11 of the support 1, and then the support 1 is rotated at about 50 rpm.
A predetermined amount of air is sent from the pipe 5. Now, due to the rotation of the support base 1, the resin 3 is applied to the resin-coated surface of the sample 2 due to centrifugal force.
1 is expanded toward the outer periphery. Peripheral part 2 of sample 2
The resin 3 reaches the sample 2 and tries to go around the back side 23 of the sample 2, but since the wind is blowing diagonally upward from below against the peripheral edge 22 of the sample 2, the resin 3 tries to go around the back side 23 of the sample 2. The resin 3 is held back at the peripheral edge 22 of the surface of the sample 2.
なお、上記実施例において、樹脂3の硬化温度に基づい
て吹きつけるべき風の温度を設定すると、樹脂3を試料
2の周縁部22で硬化させることができるので、樹脂3
のせきどめがより一層効果的になる。In the above example, if the temperature of the air to be blown is set based on the curing temperature of the resin 3, the resin 3 can be cured at the peripheral edge 22 of the sample 2.
Cough-stopping becomes even more effective.
溌」■と1果本発明によれば、試料の樹脂塗布面の背面側に樹脂が廻
り込もうとするのを有効に防止できるので、従来のよう
に廻り込んだ樹脂の除去といった人手による煩わしい作
業が不要となり、結局工程の進行をスムーズにさせるこ
とができる。According to the present invention, it is possible to effectively prevent the resin from going around to the back side of the resin-coated surface of the sample. This eliminates the need for additional work and allows the process to proceed smoothly.
第1図(a)は本発明の一実施例に用いるスピンコード
装置の構成概略図、第1図(b)は試料に対して吹きつ
ける風の向きを示す説明図である。2・・・試料21・・・樹脂塗布面22・・・周縁部23・・・背面3・・・樹脂。全壱トへ(a)(b)第1図FIG. 1(a) is a schematic diagram of the configuration of a spin code apparatus used in an embodiment of the present invention, and FIG. 1(b) is an explanatory diagram showing the direction of wind blowing against a sample. 2...Sample 21...Resin coated surface 22...Peripheral portion 23...Back surface 3...Resin. To all parts (a) (b) Figure 1
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP400286AJPS62160171A (en) | 1986-01-10 | 1986-01-10 | Method for coating resin |
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP400286AJPS62160171A (en) | 1986-01-10 | 1986-01-10 | Method for coating resin |
| Publication Number | Publication Date |
|---|---|
| JPS62160171Atrue JPS62160171A (en) | 1987-07-16 |
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP400286APendingJPS62160171A (en) | 1986-01-10 | 1986-01-10 | Method for coating resin |
| Country | Link |
|---|---|
| JP (1) | JPS62160171A (en) |
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05200349A (en)* | 1991-12-26 | 1993-08-10 | Chuo Riken:Kk | Spin-coating method and spin coater |
| JPH05266472A (en)* | 1992-03-19 | 1993-10-15 | Sharp Corp | Formation of resin layer |
| JPH06168871A (en)* | 1992-11-30 | 1994-06-14 | Nec Corp | Coater |
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60110118A (en)* | 1983-11-18 | 1985-06-15 | Toshiba Corp | Method and apparatus for coating resist |
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60110118A (en)* | 1983-11-18 | 1985-06-15 | Toshiba Corp | Method and apparatus for coating resist |
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05200349A (en)* | 1991-12-26 | 1993-08-10 | Chuo Riken:Kk | Spin-coating method and spin coater |
| JPH05266472A (en)* | 1992-03-19 | 1993-10-15 | Sharp Corp | Formation of resin layer |
| JPH06168871A (en)* | 1992-11-30 | 1994-06-14 | Nec Corp | Coater |
| Publication | Publication Date | Title |
|---|---|---|
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