【発明の詳細な説明】本発明は、２光線干渉計等の干渉計によつて得られる干
渉縞の可視度を測定する可視度測定装置に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a visibility measuring device that measures the visibility of interference fringes obtained by an interferometer such as a two-beam interferometer.
干渉縞の可視度Ｖは干渉縞の明部及び暗部の光強度をそ
れぞれ１１、１２とするとＶ＝（１１−１２）／（１１
＋１２）・・・１で与えられる。The visibility V of the interference fringe is V = (11-12)/(11
+12)...Given by 1.
完全に可干渉な光では１２■０となつてＶ＝１であるが
一般には光を完全に単色にすることは不可能であるから
、干渉計の光路差が増大するにつれて異なつたスペクト
ル成分が混在してくる。そのため可視度は０≦Ｖ＜１の
値をとる。従来干渉縞の可視度の測定は、干渉縞を光電
変換器で走査し、その出力を記録計に記録するか、又は
干渉縞を写真撮影した後ミクロデンシトメータで測定し
干渉縞の強度分布を得た後その包路線によつて可視度を
得ていたが、このような測定は信頼性が低くまた煩雑で
あつた。In the case of perfectly coherent light, V=1, which is 12×0, but in general it is impossible to make light completely monochromatic, so as the optical path difference of the interferometer increases, different spectral components It's going to be mixed. Therefore, the visibility takes a value of 0≦V<1. Conventionally, the visibility of interference fringes is measured by scanning the interference fringes with a photoelectric converter and recording the output on a recorder, or by photographing the interference fringes and measuring them with a microdensitometer to determine the intensity distribution of the interference fringes. Visibility was then determined by measuring the envelope line, but such measurements were unreliable and complicated.
本発明は、上述の欠点を解消したレーザ光のごとき擬単
色光源の可視度および可視度曲線を自動的に測定するこ
とができる装置であつて、干渉縞の走査速度を制御して
干渉縞の明暗に対応する光電変換器の出力信号周波数を
一定ならしめることにより、測定精度、信頼性の向上を
はかつたものである。The present invention is an apparatus that can automatically measure the visibility and visibility curve of a quasi-monochromatic light source such as a laser beam, which eliminates the above-mentioned drawbacks, and which controls the scanning speed of the interference fringes to improve the visibility of the interference fringes. By making the output signal frequency of the photoelectric converter constant for brightness and darkness, measurement accuracy and reliability are improved.
以下図を用いて本発明実施例を詳述する。第１図におい
て１は光源であり、これより発せられた光線２はビーム
スプリッタ３によつて振巾・分割され、透過光線４と反
射光線７とにわけられる。透過光線４は光路補償板５を
通り固定反射鏡６によつて反射された後同じ光路を辿つ
てビームスプリッタ３で反射された光線１０となる。一
方反射光７は可動台９に設置された可動反射鏡８で・反
射され再び同一光路を辿つた後ビームスプリッタ３を透
過して光線１０となりここで干渉を生じる。干渉縞の強
度分布はレンズ１１によつて拡大され、回転軸１３を中
心軸としてモータ等（図示せず）により回転する回転反
射鏡１２によつてその方向が変えられ、スリツト１４後
方に設置された光電変換器１５によつて電気信号に変換
され、干渉縞の明暗に対応した電気信号が出力される。
この信号を第２図ａに示す。この出力波形は微分回路１
６によつて微分され、その出力信号は第２図ｂに示され
るように信号ａ波形の極大値、極小値に対応した零点を
有する。この出力信号はパルス発生器１７を駆動する。
パルス発生回路１７は交流波形の電圧がＯになつたとき
にパルスを発生するパルス発生回路でその出力信号は第
２図ｃに示すパルス列となり、この信号がカウンタ１８
に入力される。カウンタ１８はパルス列ｃを奇数番目の
パルス列と偶数番目のパルス列に分離して出力し、それ
ぞれ後続のサンプリング回路２３，２５に入力する回路
であつて、それぞれの信号をＤ，ｅで示す。一方光電変
換器１５の出力は分離されて遅延回路２２を通つた後サ
ンプリング回路２３，２５に入力され、サンプリングパ
ルスＤ，ｅが、Ｚ光電変換器１５の出力信号ａのそれぞ
れ極大値及び極小値の位置に合致するように調整される
。その結果サンプリング回路２３，２５の出力信号は第
２図Ｆ，ｇに示すごとく信号ａの極大値及び極小値に等
しいパルス列となり、これらがそれぞれ積分回路２４，
２６に入力され、その出力は信号は、Ｆ，ｇに破線で示
す波形となるが、これらは信号ａのそれぞれ極大値及び
極小値を結んで得られる包路線と同じである。サンプリ
ング回路２３，２５の出力信号Ｆ，ｇは、それぞれ積分
回路２４，．２６を経て、和電圧発生回路２７および差
電圧発生回路２８に入力され、それぞれ両信号Ｆ，ｇの
和、差が算出される。これらの和、差電圧発生回路２７
，２８の出力は、割算回路２９に入力され、両信号の比
がとられる。この割算回路２９の出力．は、１式に示さ
れた可視度を表わしている。３１はＸ−Ｙレコーダであ
つて割算回路２９の出力をたて軸に、可動台９の移動量
を掃引回路３０によつて横軸掃引電圧とすることによつ
て反射鏡３の種々の位置における可視度が記録され、可
視度曲線が得られる。Embodiments of the present invention will be described in detail below using the figures. In FIG. 1, reference numeral 1 denotes a light source, and a beam 2 emitted from the light source is amplified and split by a beam splitter 3, and is divided into a transmitted beam 4 and a reflected beam 7. The transmitted light ray 4 passes through an optical path compensation plate 5 and is reflected by a fixed reflecting mirror 6, and then follows the same optical path to become a light ray 10 reflected by a beam splitter 3. On the other hand, the reflected light 7 is reflected by a movable reflecting mirror 8 installed on a movable table 9, follows the same optical path again, and then passes through the beam splitter 3 to become a light beam 10, where interference occurs. The intensity distribution of the interference fringes is magnified by a lens 11, and its direction is changed by a rotating reflector 12, which is rotated by a motor or the like (not shown) about a rotating shaft 13, and is installed behind the slit 14. The photoelectric converter 15 converts the light into an electrical signal, and outputs an electrical signal corresponding to the brightness and darkness of the interference fringes.
This signal is shown in Figure 2a. This output waveform is the differential circuit 1
6, and its output signal has zero points corresponding to the maximum and minimum values of the signal a waveform, as shown in FIG. 2b. This output signal drives a pulse generator 17.
The pulse generating circuit 17 is a pulse generating circuit that generates a pulse when the voltage of the AC waveform reaches O, and its output signal is a pulse train shown in FIG.
is input. The counter 18 is a circuit that separates the pulse train c into an odd-numbered pulse train and an even-numbered pulse train, and outputs the separated pulse trains, and inputs them to the subsequent sampling circuits 23 and 25, respectively, and the respective signals are indicated by D and e. On the other hand, the output of the photoelectric converter 15 is separated and passed through a delay circuit 22 and then inputted to sampling circuits 23 and 25, and the sampling pulses D and e correspond to the maximum value and minimum value, respectively, of the output signal a of the Z photoelectric converter 15. is adjusted to match the position of As a result, the output signals of the sampling circuits 23 and 25 become pulse trains equal to the maximum and minimum values of the signal a, as shown in FIG.
26, and its output signal has a waveform shown by broken lines in F and g, which are the same as the envelope lines obtained by connecting the maximum and minimum values of signal a, respectively. The output signals F, g of the sampling circuits 23, 25 are sent to the integrating circuits 24, . 26, the signal is input to a sum voltage generation circuit 27 and a difference voltage generation circuit 28, and the sum and difference of both signals F and g are calculated, respectively. These sum and difference voltage generation circuit 27
, 28 are input to a divider circuit 29, and the ratio of both signals is taken. The output of this division circuit 29. represents the visibility shown in Equation 1. Reference numeral 31 denotes an X-Y recorder, which uses the output of the divider circuit 29 as the vertical axis and converts the amount of movement of the movable base 9 into a horizontal axis sweep voltage using the sweep circuit 30, thereby recording various values of the reflecting mirror 3. The visibility at the location is recorded and a visibility curve is obtained.
１９は一定周波数のパルスを発生する基準パルス発生回
路、２０は、この基準パルス発生回路１９からの出力パ
ルスと、パルス発生回路１７の出力パルスと２入力とす
る差周波数検出回路で、両パルスの周波数差に比例した
電圧信号を出力する。19 is a reference pulse generation circuit that generates pulses of a constant frequency; 20 is a difference frequency detection circuit that has two inputs: the output pulse from this reference pulse generation circuit 19 and the output pulse from the pulse generation circuit 17; Outputs a voltage signal proportional to the frequency difference.
２１は制御回路で、前記検出回路２０の出力信号を受け
て、回転反射鏡１２の回転速度を調整する。A control circuit 21 receives the output signal of the detection circuit 20 and adjusts the rotation speed of the rotary reflecting mirror 12.
かかる回転反射鏡１２は、回転軸１３に取りつけられた
モータ（図示せず）によつて回転し、制御回路２１の制
御電圧は、このモータの回転数を制御するものである。The rotating reflecting mirror 12 is rotated by a motor (not shown) attached to a rotating shaft 13, and the control voltage of the control circuit 21 controls the rotation speed of this motor.
かくして第２図ｃに示す信号のパルス周波数を基準周波
数として、常に一定の周波数で測定を行なうことができ
る。制御回路２１の出力はまた可動台９の駆動モータの
制御にも用いられており、反射鏡１２の回転数に比例し
て反射鏡８の移動速度をかえている。これによつてＸ−
Ｙレコーダ３１の可視度曲線の可視度と光路程差の関係
が補償される。ところで、サンプリングパルスと干渉縞
の極大値、極小値の位置合せは、光電変換器出力を遅延
回路を介してサンプリング回路に入力することによつて
行なう方法も考えられる。In this way, measurements can always be made at a constant frequency using the pulse frequency of the signal shown in FIG. 2c as the reference frequency. The output of the control circuit 21 is also used to control the drive motor of the movable table 9, and changes the moving speed of the reflecting mirror 8 in proportion to the rotation speed of the reflecting mirror 12. This results in X-
The relationship between the visibility of the visibility curve of the Y recorder 31 and the optical path difference is compensated. By the way, a method of aligning the maximum value and minimum value of the sampling pulse and the interference fringe may be performed by inputting the output of the photoelectric converter to the sampling circuit via a delay circuit.
しかしながら干渉縞の本数は、ビームスプリツタ３反射
鏡６，８の僅かな傾角の変化や、光路程差の変化によつ
て大きく変化し、１桁以上異なる場合も生じるから、前
記方法で遅延回路を用いて合致させる際に測度精度を低
下させるおそれがある。これに対し、本発明は干渉縞を
走査する回転反射鏡の回転数を基準パルスに一致するよ
う制御するものであるから前述の遅延回路を用いた装置
に比し、測定精度を向上させることができる。また従来
の測定法においては可視度の低下とともにバツクグラウ
ンドの光が増加し測定の精度が低下したが、本発明の測
定装置では、可視度の低下とともにサンプリング数を増
加するため逆に精度があがるのである。分光学等の分野
において光源の性質を知るには、可視度の低い部分での
可視度曲線の形状が極めて重要であるが、本発明はかか
る分野に使用しても極めて有益である。However, the number of interference fringes changes greatly due to slight changes in the inclination angle of the beam splitter 3 reflecting mirrors 6 and 8 and changes in the difference in optical path length, and may differ by more than one order of magnitude. There is a risk that the measurement accuracy will decrease when matching is performed using . In contrast, the present invention controls the rotational speed of the rotating reflector that scans the interference fringes so that it matches the reference pulse, so it is possible to improve measurement accuracy compared to the device using the delay circuit described above. can. In addition, in conventional measurement methods, background light increases as visibility decreases, resulting in a decrease in measurement accuracy, but with the measurement device of the present invention, the number of samples increases as visibility decreases, so accuracy increases. It is. In the field of spectroscopy and the like, the shape of the visibility curve in the low-visibility area is extremely important to know the properties of a light source, and the present invention is also extremely useful in such fields.
第１図は本発明実施例可視度測定装置のプロツク図、第
２図は同実施例各点における信号波形図である。 ゛１・・・光源、３・・
・ビームスプリツタ、１２・・・回転反射鏡、１６・・
・微分回路、１７・・・パルス発生回路、１８・・・カ
ウンタ、１９・・・基準パルス発生回路、２０・・・差
周波数検出回路、２１・・・制御回路、２３，２５・・
・サンプリング回路、２４，２６・・・積分回路、２７
・・・和電圧発生回路、２８・・・差電圧発生回路、２
９・・・割算回路、３１・・・Ｘ−Ｙレコーダ、３０・
・・掃引回路。FIG. 1 is a block diagram of a visibility measuring device according to an embodiment of the present invention, and FIG. 2 is a signal waveform diagram at various points in the same embodiment.゛1...Light source, 3...
・Beam splitter, 12...Rotating reflector, 16...
- Differentiation circuit, 17... Pulse generation circuit, 18... Counter, 19... Reference pulse generation circuit, 20... Difference frequency detection circuit, 21... Control circuit, 23, 25...
・Sampling circuit, 24, 26... Integrating circuit, 27
. . . Sum voltage generation circuit, 28 . . . Difference voltage generation circuit, 2
9... Division circuit, 31... X-Y recorder, 30.
...Sweep circuit.
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12696377AJPS5942819B2 (en) | 1977-10-19 | 1977-10-19 | Interferometer visibility measuring device |
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12696377AJPS5942819B2 (en) | 1977-10-19 | 1977-10-19 | Interferometer visibility measuring device |
| Publication Number | Publication Date |
|---|---|
| JPS5459166A JPS5459166A (en) | 1979-05-12 |
| JPS5942819B2true JPS5942819B2 (en) | 1984-10-17 |
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12696377AExpiredJPS5942819B2 (en) | 1977-10-19 | 1977-10-19 | Interferometer visibility measuring device |
| Country | Link |
|---|---|
| JP (1) | JPS5942819B2 (en) |
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| US10966874B2 (en) | 2016-12-20 | 2021-04-06 | The Procter & Gamble Company | Absorbent article(s) chassis comprising beamed elastics |
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| US11547613B2 (en) | 2017-12-05 | 2023-01-10 | The Procter & Gamble Company | Stretch laminate with beamed elastics and formed nonwoven layer |
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| GB8525650D0 (en)* | 1985-10-17 | 1985-11-20 | Pilkington Brothers Plc | Interferometer |
| AT512044B1 (en)* | 2012-01-17 | 2013-05-15 | Femtolasers Produktions Gmbh | DEVICE AND METHOD FOR THE OPTICAL CHECKING OF A SAMPLE |
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| US10966874B2 (en) | 2016-12-20 | 2021-04-06 | The Procter & Gamble Company | Absorbent article(s) chassis comprising beamed elastics |
| US10966873B2 (en) | 2016-12-20 | 2021-04-06 | The Procter & Gamble Company | Methods and apparatuses for making elastomeric laminates with elastic strands unwound from spools on surface unwinders |
| US10973699B2 (en) | 2016-12-20 | 2021-04-13 | The Procter & Gamble Company | Methods and apparatuses for making elastomeric laminates with elastic strands unwound from beams |
| US10987253B2 (en) | 2016-12-20 | 2021-04-27 | The Procter & Gamble Company | Beamed elastic laminate properties |
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| US11318052B2 (en) | 2016-12-20 | 2022-05-03 | The Procter & Gamble Company | Methods and apparatuses for making elastomeric laminates with elastic strands unwound from beams |
| US11344453B2 (en) | 2016-12-20 | 2022-05-31 | The Procter & Gamble Company | Methods and apparatuses for making elastomeric laminates with elastic strands unwound from spools on surface unwinders |
| US11147718B2 (en) | 2017-09-01 | 2021-10-19 | The Procter & Gamble Company | Beamed elastomeric laminate structure, fit, and texture |
| US11547613B2 (en) | 2017-12-05 | 2023-01-10 | The Procter & Gamble Company | Stretch laminate with beamed elastics and formed nonwoven layer |
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|---|---|
| JPS5459166A (en) | 1979-05-12 |
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