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JPS5845502U - wide angle reflector - Google Patents

wide angle reflector

Info

Publication number
JPS5845502U
JPS5845502UJP14103581UJP14103581UJPS5845502UJP S5845502 UJPS5845502 UJP S5845502UJP 14103581 UJP14103581 UJP 14103581UJP 14103581 UJP14103581 UJP 14103581UJP S5845502 UJPS5845502 UJP S5845502U
Authority
JP
Japan
Prior art keywords
angle
sub
reflecting surface
wide
main
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14103581U
Other languages
Japanese (ja)
Inventor
津山 吉正
Original Assignee
株式会社津山金属製作所
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式会社津山金属製作所filedCritical株式会社津山金属製作所
Priority to JP14103581UpriorityCriticalpatent/JPS5845502U/en
Publication of JPS5845502UpublicationCriticalpatent/JPS5845502U/en
Pendinglegal-statusCriticalCurrent

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Abstract

Translated fromJapanese

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

Translated fromJapanese
【図面の簡単な説明】[Brief explanation of the drawing]

第1図は反射素子の再帰原理説明図、第2図は再帰反射
を示す曲線グラフ、第3図、第4図は公知例の反射器を
それぞれ水平方向に横断した断面図、第5図は公知例の
反射説明図、第6図は本考案実施例の反射説明図、第7
図は本考案実施例反射器の斜視図、第8図は第7図の水
平方向横断面図、第9図は他実施例反射器の斜面図、第
10図は第9図の要部を二段に水平方向に断面して示し
た説明断面図である。Xは主光軸、Y−Y’は副光軸、11.11′は反射器
本体、12.12’は主反射面、13゜13’、14.
14’は副反射面、12a、13a。14aは反射素子。
Fig. 1 is an explanatory diagram of the principle of retroreflection of a reflective element, Fig. 2 is a curve graph showing retroreflection, Figs. 3 and 4 are horizontal cross-sectional views of a known reflector, and Fig. 5 is a diagram illustrating the principle of retroreflection. FIG. 6 is a reflection explanatory diagram of a known example, and FIG. 7 is a reflection explanatory diagram of an embodiment of the present invention.
The figure is a perspective view of a reflector according to an embodiment of the present invention, FIG. 8 is a horizontal cross-sectional view of FIG. 7, FIG. 9 is an oblique view of another embodiment of the reflector, and FIG. FIG. 2 is an explanatory sectional view showing a horizontal section in two stages. X is the main optical axis, Y-Y' is the sub optical axis, 11.11' is the reflector body, 12.12' is the main reflection surface, 13° 13', 14.
14' is a sub-reflection surface, 12a, 13a. 14a is a reflective element.

Claims (5)

Translated fromJapanese
【実用新案登録請求の範囲】[Scope of utility model registration request](1)透明なガラス又は合成樹脂等で裏面に多数のキュ
ービックコーナによる反射素子が集合的に配列されるよ
うに成型された反射器において、正面主光軸をもつ主反
射面と、主反射面に対し対向的に60′以上の傾斜角α
を有する二面以上の副反射面とから成り、該副反射面に
反射素子によって形成される副光軸は副反射面に対して
αとは逆方向のある傾斜角βを有することを特徴とする
広角反射器。
(1) In a reflector molded with transparent glass or synthetic resin, etc., so that reflective elements with a large number of cubic corners are collectively arranged on the back surface, there is a main reflecting surface with a front main optical axis, and a main reflecting surface. An inclination angle α of 60′ or more opposite to
and two or more sub-reflecting surfaces having the following characteristics, and a sub-optical axis formed by a reflective element on the sub-reflecting surface has a certain inclination angle β in a direction opposite to α with respect to the sub-reflecting surface. wide angle reflector.
(2)  主反射面の両側に一対の副反射面をそれぞれ
隣接させた実用新案登録請求の範囲第(1)項記載の広
角反射器。
(2) The wide-angle reflector according to claim (1), which has a pair of sub-reflecting surfaces adjacent to each other on both sides of a main reflecting surface.
(3)二面の副反射面を、互に隣接させると共にその隣
接させた交点を、主反射面の中心線の上方又は下方に位
置させるように設けたことを特徴とする広角反射器。
(3) A wide-angle reflector characterized in that two sub-reflecting surfaces are provided adjacent to each other and the intersection of the adjacent sub-reflecting surfaces is located above or below the center line of the main reflecting surface.
(4)傾斜角βを0°〈β<60°とした実用新案登録
請求の範囲第(1)項〜同第(3)項記載の広角反射器
(4) A wide-angle reflector according to claims (1) to (3) of the utility model registration, in which the angle of inclination β is 0°<β<60°.
(5)  主反射面と両側反射器のなす角度αは61゜
〜90°であり、両側反射面のなす角度α′は58°〜
0°の範囲内にして、主反射面の巾以内において広角反
射を得る゛ことを特徴とする実用新案登録請求の範囲第
(3)項記載の広角反射器。
(5) The angle α between the main reflecting surface and both side reflectors is 61° to 90°, and the angle α′ between both reflecting surfaces is 58° to 90°.
The wide-angle reflector according to claim 3, which is a registered utility model, is characterized in that wide-angle reflection is obtained within the width of the main reflecting surface within the range of 0°.
JP14103581U1981-09-211981-09-21 wide angle reflectorPendingJPS5845502U (en)

Priority Applications (1)

Application NumberPriority DateFiling DateTitle
JP14103581UJPS5845502U (en)1981-09-211981-09-21 wide angle reflector

Applications Claiming Priority (1)

Application NumberPriority DateFiling DateTitle
JP14103581UJPS5845502U (en)1981-09-211981-09-21 wide angle reflector

Publications (1)

Publication NumberPublication Date
JPS5845502Utrue JPS5845502U (en)1983-03-26

Family

ID=29934168

Family Applications (1)

Application NumberTitlePriority DateFiling Date
JP14103581UPendingJPS5845502U (en)1981-09-211981-09-21 wide angle reflector

Country Status (1)

CountryLink
JP (1)JPS5845502U (en)

Cited By (9)

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US20130271945A1 (en)2004-02-062013-10-17Nikon CorporationPolarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US9310696B2 (en)2005-05-122016-04-12Nikon CorporationProjection optical system, exposure apparatus, and exposure method
US9341954B2 (en)2007-10-242016-05-17Nikon CorporationOptical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9423698B2 (en)2003-10-282016-08-23Nikon CorporationIllumination optical apparatus and projection exposure apparatus
US9678437B2 (en)2003-04-092017-06-13Nikon CorporationIllumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9678332B2 (en)2007-11-062017-06-13Nikon CorporationIllumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US9885872B2 (en)2003-11-202018-02-06Nikon CorporationIllumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US10101666B2 (en)2007-10-122018-10-16Nikon CorporationIllumination optical apparatus, exposure apparatus, and device manufacturing method

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US9885959B2 (en)2003-04-092018-02-06Nikon CorporationIllumination optical apparatus having deflecting member, lens, polarization member to set polarization in circumference direction, and optical integrator
US9678437B2 (en)2003-04-092017-06-13Nikon CorporationIllumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9423698B2 (en)2003-10-282016-08-23Nikon CorporationIllumination optical apparatus and projection exposure apparatus
US9760014B2 (en)2003-10-282017-09-12Nikon CorporationIllumination optical apparatus and projection exposure apparatus
US9885872B2 (en)2003-11-202018-02-06Nikon CorporationIllumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US10281632B2 (en)2003-11-202019-05-07Nikon CorporationIllumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power to rotate linear polarization direction
US20130271945A1 (en)2004-02-062013-10-17Nikon CorporationPolarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10241417B2 (en)2004-02-062019-03-26Nikon CorporationPolarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10234770B2 (en)2004-02-062019-03-19Nikon CorporationPolarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10007194B2 (en)2004-02-062018-06-26Nikon CorporationPolarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US9429851B2 (en)2005-05-122016-08-30Nikon CorporationProjection optical system, exposure apparatus, and exposure method
US9891539B2 (en)2005-05-122018-02-13Nikon CorporationProjection optical system, exposure apparatus, and exposure method
US9310696B2 (en)2005-05-122016-04-12Nikon CorporationProjection optical system, exposure apparatus, and exposure method
US9360763B2 (en)2005-05-122016-06-07Nikon CorporationProjection optical system, exposure apparatus, and exposure method
JP5024043B2 (en)*2005-06-282012-09-12株式会社ニコン Measuring system
JP2012147028A (en)*2005-06-282012-08-02Nikon CorpMeasurement device, measurement method and stage device
WO2007001017A1 (en)*2005-06-282007-01-04Nikon CorporationReflective member, optical member, interferometer system, stage device, exposure device, and device manufacturing method
US8693006B2 (en)2005-06-282014-04-08Nikon CorporationReflector, optical element, interferometer system, stage device, exposure apparatus, and device fabricating method
US10101666B2 (en)2007-10-122018-10-16Nikon CorporationIllumination optical apparatus, exposure apparatus, and device manufacturing method
US9857599B2 (en)2007-10-242018-01-02Nikon CorporationOptical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9341954B2 (en)2007-10-242016-05-17Nikon CorporationOptical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9678332B2 (en)2007-11-062017-06-13Nikon CorporationIllumination apparatus, illumination method, exposure apparatus, and device manufacturing method

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