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JPS5317078A - Etching end point detection circuit - Google Patents

Etching end point detection circuit

Info

Publication number
JPS5317078A
JPS5317078AJP9111376AJP9111376AJPS5317078AJP S5317078 AJPS5317078 AJP S5317078AJP 9111376 AJP9111376 AJP 9111376AJP 9111376 AJP9111376 AJP 9111376AJP S5317078 AJPS5317078 AJP S5317078A
Authority
JP
Japan
Prior art keywords
detection circuit
end point
point detection
etching end
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9111376A
Other languages
Japanese (ja)
Inventor
Tamio Nakai
Teruo Yoneyama
Mitsusada Shibasaka
Shinichi Yamamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co LtdfiledCriticalToshiba Corp
Priority to JP9111376ApriorityCriticalpatent/JPS5317078A/en
Publication of JPS5317078ApublicationCriticalpatent/JPS5317078A/en
Pendinglegal-statusCriticalCurrent

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Abstract

PURPOSE: To shorten working time and eliminate personal error by dipping Si wafers in a bath filled with an etching solution and utilizing the change in reflection intensity along with the lapse of etching time of the coherent monochromatic light projected to the surface being etched.
COPYRIGHT: (C)1978,JPO&Japio
JP9111376A1976-07-301976-07-30Etching end point detection circuitPendingJPS5317078A (en)

Priority Applications (1)

Application NumberPriority DateFiling DateTitle
JP9111376AJPS5317078A (en)1976-07-301976-07-30Etching end point detection circuit

Applications Claiming Priority (1)

Application NumberPriority DateFiling DateTitle
JP9111376AJPS5317078A (en)1976-07-301976-07-30Etching end point detection circuit

Publications (1)

Publication NumberPublication Date
JPS5317078Atrue JPS5317078A (en)1978-02-16

Family

ID=14017451

Family Applications (1)

Application NumberTitlePriority DateFiling Date
JP9111376APendingJPS5317078A (en)1976-07-301976-07-30Etching end point detection circuit

Country Status (1)

CountryLink
JP (1)JPS5317078A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
JPS59500892A (en)*1982-12-201984-05-17ウエスタ−ン　エレクトリツク　カムパニ−，インコ−ポレ−テツド Stopping point detection method
JPS6249233U (en)*1985-09-131987-03-26
JPS62110158A (en)*1985-09-031987-05-21テクニコン　インストルメンツ　コ−ポレ−シヨン Sampling device and method
US5021362A (en)*1989-12-291991-06-04At&T Bell LaboratoriesLaser link blowing in integrateed circuit fabrication
US5439551A (en)*1994-03-021995-08-08Micron Technology, Inc.Chemical-mechanical polishing techniques and methods of end point detection in chemical-mechanical polishing processes

Cited By (5)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
JPS59500892A (en)*1982-12-201984-05-17ウエスタ−ン　エレクトリツク　カムパニ−，インコ−ポレ−テツド Stopping point detection method
JPS62110158A (en)*1985-09-031987-05-21テクニコン　インストルメンツ　コ−ポレ−シヨン Sampling device and method
JPS6249233U (en)*1985-09-131987-03-26
US5021362A (en)*1989-12-291991-06-04At&T Bell LaboratoriesLaser link blowing in integrateed circuit fabrication
US5439551A (en)*1994-03-021995-08-08Micron Technology, Inc.Chemical-mechanical polishing techniques and methods of end point detection in chemical-mechanical polishing processes

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