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JPS5248974A - Process for production of diffusion type semiconductor device - Google Patents

Process for production of diffusion type semiconductor device

Info

Publication number
JPS5248974A
JPS5248974AJP50124914AJP12491475AJPS5248974AJP S5248974 AJPS5248974 AJP S5248974AJP 50124914 AJP50124914 AJP 50124914AJP 12491475 AJP12491475 AJP 12491475AJP S5248974 AJPS5248974 AJP S5248974A
Authority
JP
Japan
Prior art keywords
production
semiconductor device
type semiconductor
diffusion type
diffusion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP50124914A
Other languages
Japanese (ja)
Other versions
JPS6011459B2 (en
Inventor
Hirotake Nagai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric CorpfiledCriticalMitsubishi Electric Corp
Priority to JP50124914ApriorityCriticalpatent/JPS6011459B2/en
Publication of JPS5248974ApublicationCriticalpatent/JPS5248974A/en
Publication of JPS6011459B2publicationCriticalpatent/JPS6011459B2/en
Expiredlegal-statusCriticalCurrent

Links

Landscapes

Abstract

PURPOSE: To prevent step-cutting of wiring metal layers, by making the oxide film layers on a diffusion resistance layer for prevention of concentration of emitter current and on a base diffusion layer nearly the same.
COPYRIGHT: (C)1977,JPO&Japio
JP50124914A1975-10-171975-10-17 Method for manufacturing a diffused semiconductor deviceExpiredJPS6011459B2 (en)

Priority Applications (1)

Application NumberPriority DateFiling DateTitle
JP50124914AJPS6011459B2 (en)1975-10-171975-10-17 Method for manufacturing a diffused semiconductor device

Applications Claiming Priority (1)

Application NumberPriority DateFiling DateTitle
JP50124914AJPS6011459B2 (en)1975-10-171975-10-17 Method for manufacturing a diffused semiconductor device

Publications (2)

Publication NumberPublication Date
JPS5248974Atrue JPS5248974A (en)1977-04-19
JPS6011459B2 JPS6011459B2 (en)1985-03-26

Family

ID=14897232

Family Applications (1)

Application NumberTitlePriority DateFiling Date
JP50124914AExpiredJPS6011459B2 (en)1975-10-171975-10-17 Method for manufacturing a diffused semiconductor device

Country Status (1)

CountryLink
JP (1)JPS6011459B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
JPS5746821U (en)*1980-09-011982-03-16
JPH08306959A (en)*1995-09-291996-11-22Rohm Co LtdSurface mounting type chip light-emitting device

Citations (1)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
JPS5024593A (en)*1973-07-031975-03-15

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
JPS5024593A (en)*1973-07-031975-03-15

Also Published As

Publication numberPublication date
JPS6011459B2 (en)1985-03-26

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