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JPS5222479A - Method of inspecting masks - Google Patents

Method of inspecting masks

Info

Publication number
JPS5222479A
JPS5222479AJP9875175AJP9875175AJPS5222479AJP S5222479 AJPS5222479 AJP S5222479AJP 9875175 AJP9875175 AJP 9875175AJP 9875175 AJP9875175 AJP 9875175AJP S5222479 AJPS5222479 AJP S5222479A
Authority
JP
Japan
Prior art keywords
inspecting masks
masks
inspecting
inspection
troublesomeness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9875175A
Other languages
Japanese (ja)
Other versions
JPS5521459B2 (en
Inventor
Tsunehiro Naganami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu LtdfiledCriticalFujitsu Ltd
Priority to JP9875175ApriorityCriticalpatent/JPS5222479A/en
Publication of JPS5222479ApublicationCriticalpatent/JPS5222479A/en
Publication of JPS5521459B2publicationCriticalpatent/JPS5521459B2/ja
Grantedlegal-statusCriticalCurrent

Links

Landscapes

Abstract

PURPOSE: To solve the troublesomeness of alignments and to shorten the inspection time by performing the comparison inspection of various types of photo masks being measured with the use of one standard mask.
COPYRIGHT: (C)1977,JPO&Japio
JP9875175A1975-08-131975-08-13Method of inspecting masksGrantedJPS5222479A (en)

Priority Applications (1)

Application NumberPriority DateFiling DateTitle
JP9875175AJPS5222479A (en)1975-08-131975-08-13Method of inspecting masks

Applications Claiming Priority (1)

Application NumberPriority DateFiling DateTitle
JP9875175AJPS5222479A (en)1975-08-131975-08-13Method of inspecting masks

Publications (2)

Publication NumberPublication Date
JPS5222479Atrue JPS5222479A (en)1977-02-19
JPS5521459B2 JPS5521459B2 (en)1980-06-10

Family

ID=14228152

Family Applications (1)

Application NumberTitlePriority DateFiling Date
JP9875175AGrantedJPS5222479A (en)1975-08-131975-08-13Method of inspecting masks

Country Status (1)

CountryLink
JP (1)JPS5222479A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
JPS55108738A (en)*1979-02-131980-08-21Fujitsu LtdInspection for registration of photomask
JPS5680132A (en)*1979-12-061981-07-01Nec CorpInspection of mask
US5283205A (en)*1991-03-191994-02-01Semiconductor Energy Laboratory Co., Ltd.Method for manufacturing a semiconductor device on a substrate having an anisotropic expansion/contraction characteristic

Cited By (3)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
JPS55108738A (en)*1979-02-131980-08-21Fujitsu LtdInspection for registration of photomask
JPS5680132A (en)*1979-12-061981-07-01Nec CorpInspection of mask
US5283205A (en)*1991-03-191994-02-01Semiconductor Energy Laboratory Co., Ltd.Method for manufacturing a semiconductor device on a substrate having an anisotropic expansion/contraction characteristic

Also Published As

Publication numberPublication date
JPS5521459B2 (en)1980-06-10

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