【０００１】[0001]
【発明の属する技術分野】本発明は、太陽電池用カバー
ガラス及びその製造方法並びに太陽電池とその製造方法
に関する。特に、透明導電膜層、アモルファスシリコン
層及び裏面電極層より形成されるアモルファス太陽電池
用カバーガラスに係り、反射光公害を防止できる太陽電
池用カバーガラスに関する。また、厚板が要求される大
寸法の結晶系太陽電池において、反射光公害を防止する
太陽電池用カバーガラスに関する。The present invention relates to a cover glass for a solar cell, a method for manufacturing the same, and a solar cell and a method for manufacturing the same. In particular, the present invention relates to a cover glass for an amorphous solar cell formed of a transparent conductive film layer, an amorphous silicon layer, and a back electrode layer, and more particularly to a cover glass for a solar cell that can prevent reflected light pollution. Also, the present invention relates to a cover glass for a solar cell that prevents reflected light pollution in a large-sized crystalline solar cell requiring a thick plate.
【０００２】[0002]
【従来の技術】従来より、地球温暖化防止対策としてＣ
Ｏ2 削減が必須な状況にあり、自然エネルギーの有効利
用として、太陽電池の普及が推進されているなかで、太
陽電池の低コスト化が大きな課題となっている。上記太
陽電池として、例えば、アモルファス太陽電池基板が挙
げられるが、これは、ガラス基板に透明導電膜層、アモ
ルファスシリコン膜層及び裏面電極層を膜付けし構成さ
れている。それぞれの膜付け層は、電極を形成するた
め、レーザースクライビングにてパターンニングが施さ
れる。2. Description of the Related Art Conventionally, C has been used as a measure to prevent global warming.
The reduction of O2 is indispensable, and the spread of solar cells is being promoted as an effective use of natural energy. Therefore, cost reduction of solar cells has become a major issue. An example of the solar cell is an amorphous solar cell substrate, which is formed by attaching a transparent conductive film layer, an amorphous silicon film layer, and a back electrode layer to a glass substrate. Each film-forming layer is patterned by laser scribing to form an electrode.
【０００３】このレーザースクライビングを効率的に行
うためには、ガラス基板面の平滑性が必要で、一般的に
はフロート板ガラスが使用されている。しかし、カバー
ガラスの外表面は平滑なため、屋根又は壁面に施工した
場合、ガラス面の反射光公害の問題が指摘されている。
上記問題となるカバーガラスの外表面の反射を抑えるた
め、当該ガラス面をエッチング、反射防止コーティン
グ、又は当該ガラスの上面に型板ガラスを置くことなど
で対処が行われてきたが、大幅なコスト高となり実用的
ではない。また、カバーガラス外表面のブラスト加工も
反射防止には有効であるが、加工面が汚れ易く、光発電
効率が低下し実用的ではない。In order to carry out the laser scribing efficiently, the glass substrate surface needs to be smooth, and a float plate glass is generally used. However, since the outer surface of the cover glass is smooth, when it is applied to a roof or a wall surface, a problem of reflected light pollution of the glass surface has been pointed out.
In order to suppress the reflection on the outer surface of the cover glass, which is a problem described above, measures have been taken by etching the glass surface, applying an anti-reflection coating, or placing a template glass on the upper surface of the glass, but the cost is greatly increased. Is not practical. Also, blasting of the outer surface of the cover glass is effective for preventing reflection, but the processed surface is easily stained, and the photovoltaic power generation efficiency is reduced, which is not practical.
【０００４】これらに対処すべく、特開昭５９−８２７
７７、特開昭６０−２１６５８５、及び特開平８−３３
０６１８等のように、透光性ガラス基板に凹凸を設ける
ことが考案されたが、表面の乱反射のため表面が白く見
え意匠性に劣る、非常に汚れやすく、経時的に変換効率
が悪化するという問題点を有していた。To cope with these problems, Japanese Patent Laid-Open Publication No.
77, JP-A-60-216585 and JP-A-8-33
It has been devised to provide irregularities on the translucent glass substrate, such as 0618, but the surface appears white due to irregular reflection of the surface, is inferior in design, is very dirty, and the conversion efficiency deteriorates with time. Had problems.
【０００５】一方、結晶系太陽電池にあっては、カバー
ガラスとして型板ガラスが使用されているが、圧延の製
造上の制約のため、厚板ガラスは製造しがたい。太陽電
池の大型化に対し、厚板ガラスの要求がでているが、カ
バーガラスとして相応しい型板ガラスの供給は難しく、
また前記したような表面の反射防止加工では、コストが
高い、表面の汚れやすいなどの問題があった。On the other hand, in the case of a crystalline solar cell, a template glass is used as a cover glass. However, it is difficult to produce a thick glass due to restrictions on the production of rolling. For larger solar cells, there is a demand for thick glass, but it is difficult to supply mold glass suitable for cover glass.
In addition, the antireflection processing of the surface as described above has problems that the cost is high and the surface is easily stained.
【０００６】[0006]
【発明が解決しようとする課題】本発明は、大型化要求
に対応し、反射光防止機能があり、かつ表面が汚れにく
い太陽電池用カバーガラス及びその製造方法並びに該太
陽電池用カバーガラスを用いた太陽電池を提供すること
を目的とする。SUMMARY OF THE INVENTION The present invention is directed to a cover glass for a solar cell, which has a function of preventing reflected light and is hardly stained, and a method of manufacturing the same. The purpose of the present invention is to provide a solar cell.
【０００７】[0007]
【課題を解決するための手段】本発明は、透明導電膜
層、半導体層及び裏面電極層を有してなる太陽電池に用
いられるカバーガラスにおいて、カバーガラスの光入射
側の表面が凹凸を有し、前記凹凸の頂部が平坦化された
ことを特徴とする太陽電池用カバーガラスを提供する。
本発明によれば、反射光の弦しさを防止する機能があ
り、かつ汚れにくく優れた外観特性や耐久性能を有する
低コストの太陽電池用カバーガラスを提供することがで
きる。According to the present invention, there is provided a cover glass used for a solar cell having a transparent conductive film layer, a semiconductor layer and a back electrode layer, wherein the surface of the cover glass on the light incident side has irregularities. Further, the present invention provides a cover glass for a solar cell, wherein the tops of the irregularities are flattened.
According to the present invention, it is possible to provide a low-cost cover glass for a solar cell which has a function of preventing the stringiness of reflected light, is resistant to contamination, and has excellent appearance characteristics and durability.
【０００８】また、結晶系太陽電池の大型化要求に対応
し、反射防止機能のある低コストの太陽電池用カバーガ
ラス（以下、カバーガラスという）を提供することがで
きる。また、本発明は、ガラス基板と、透明導電膜層
と、アモルファスシリコン膜層と、裏面電極層とを順次
有する太陽電池において、ガラス基板が前記の本発明の
カバーガラスであることを特徴とする太陽電池を提供す
る。本発明の太陽電池は、本発明のカバーガラスの利点
が有効に生かされることから、屋根用太陽電池として好
適である。In addition, it is possible to provide a low-cost cover glass for a solar cell (hereinafter referred to as a cover glass) having an antireflection function in response to a demand for an increase in the size of a crystalline solar cell. The present invention also provides a solar cell having a glass substrate, a transparent conductive film layer, an amorphous silicon film layer, and a back electrode layer in that order, wherein the glass substrate is the cover glass of the present invention. Provide solar cells. The solar cell of the present invention is suitable as a roof solar cell because the advantages of the cover glass of the present invention can be effectively utilized.
【０００９】カバーガラスは、例えばフロート板であ
り、カバーガラスとして外表面になる側（光入射側）を
例えば砂、アランダムなどを用いて荒摺りし、さらに酸
化セリウムを用いてポリシングし、荒摺り跡が半分程度
残った段階で、ポリシングを中断することで得られる。The cover glass is, for example, a float plate, and the side (light incident side) which becomes the outer surface as the cover glass is roughly rubbed with, for example, sand, alundum, etc., and further polished with cerium oxide. It can be obtained by interrupting the polishing when about half of the trace remains.
【００１０】カバーガラスの研磨表面の表面粗さはハン
ディサーフで測定して、最大高さＲy （以下、単にＲy
という）が０．１〜５μｍであり、かつ算術平均粗さＲ
a （以下、単にＲa という）が０．０１〜０．３μｍが
好ましい。なお、Ｒy 、ＲaはＪＩＳ Ｂ０６０１で定
義される値である。Ｒy が０．１μｍ未満及び／又はＲ
a が０．０１未満であると反射防止性が不十分となるこ
とがある。Ｒy が５μｍ超及び／又はＲa が０．３μｍ
超であると汚れやすくなるほか、表面の乱反射が強く外
観が白くなり意匠性を阻害することがある。Ｒy は０．
２〜２．５μｍであることが特に好ましい。Ｒa は０．
０２〜０．２μｍであることが特に好ましい。The surface roughness of the polished surface of the cover glass is measured by a handy surf, and the maximum height Ry (hereinafter simply referred to as Ry)
Is 0.1 to 5 μm and the arithmetic average roughness R
a (hereinafter, simply referred to as Ra) it is 0.01~0.3μm are preferred. Incidentally, Ry, Ra is a value defined by JIS B0601.Ry is less than 0.1 μm and / or R
If a is less than 0.01, the antireflection property may be insufficient.Ry is greater than 5 μm and / orRa is 0.3 μm
If it is excessively large, it becomes easy to be stained, and irregular reflection of the surface is strong, and the appearance becomes white, which may impair the design. Ry is 0.
It is particularly preferred that it is 2 to 2.5 μm.Ra is 0.
It is particularly preferred that the thickness be from 02 to 0.2 μm.
【００１１】また、光沢度はハンディ光沢度計で測定し
て２〜１００、特に２０〜８０が好ましい。このガラス
の表面性状は、荒摺り跡の凸部をポリシングして平坦化
されているが、荒摺り跡の凹部が残っているため、ガラ
ス面の反射光の眩しさは、ノングレヤ加工した型板ガラ
スと同等であり、また、ガラス表面の汚れ易さも、ノン
グレヤ加工した型板ガラスと同等である。The gloss is preferably from 2 to 100, particularly preferably from 20 to 80, as measured with a handy gloss meter. The surface properties of this glass are flattened by polishing the protruding portions of the roughing traces, but the glare of the reflected light on the glass surface is reduced by the non-glare-processed template glass In addition, the easiness of soiling of the glass surface is the same as that of the non-glare-processed template glass.
【００１２】また、本発明における半導体層としては、
多結晶シリコンを用いたが、単結晶シリコン、アモルフ
ァスシリコン、ＧａＡｓ等の化合物半導体を用いること
ができる。コストの観点からは、アモルファスシリコン
を用いることが好ましく、変換効率の観点からは、結晶
性シリコンを用いることが好ましい。また、本発明にお
けるカバーガラスは、生産性の観点から裏面側が平滑で
あることが好ましい。Further, the semiconductor layer in the present invention includes:
Although polycrystalline silicon is used, a compound semiconductor such as single crystal silicon, amorphous silicon, or GaAs can be used. It is preferable to use amorphous silicon from the viewpoint of cost, and it is preferable to use crystalline silicon from the viewpoint of conversion efficiency. The cover glass in the present invention preferably has a smooth rear surface from the viewpoint of productivity.
【００１３】本発明における透明導電膜層としては、Ｓ
ｎＯ2 層などが挙げられる。該ＳｎＯ2 層には、フッ素
やアンチモンなどを添加することができる。また、本発
明における裏面電極層としては、Ａｇ層などが挙げられ
る。本発明は、また、透明導電膜層、半導体層及び裏面
電極層を有してなる太陽電池に用いられるカバーガラス
の製造方法において、前記カバーガラスの光入射側の表
面に凹凸を形成する第１の処理工程と、前記凹凸の頂部
のみを平坦化する第２の処理工程と、を有することを特
徴とする太陽電池用カバーガラスの製造方法を提供す
る。In the present invention, the transparent conductive film layer is made of S
nO2 layer and the like. Fluorine, antimony, or the like can be added to the SnO2 layer. The back electrode layer in the present invention includes an Ag layer. The present invention also provides a method of manufacturing a cover glass used for a solar cell having a transparent conductive film layer, a semiconductor layer, and a back electrode layer, wherein a first surface of the cover glass having irregularities is formed on a light incident side. And a second processing step of flattening only the top of the unevenness, to provide a method of manufacturing a cover glass for a solar cell.
【００１４】前記第１の処埋工程後の表面粗さは、Ｒy
が０．２〜１０μｍであり、かつＲa が０．０２〜１μ
ｍであることが好ましい。Ｒy が０．２μｍ未満及び／
又はＲa が０．０２μｍ未満であると、次の第２の処理
工程における頂部研磨により反射防止性が不十分とな
る。また、Ｒy が１０μｍ超及び／又はＲa が１μｍ超
であると、次の第２の処理工程における頂部研磨によっ
ても残る凹部に起因し、外観が白色化し意匠性に劣る、
汚れやすくなるなどの不具合を生じやすい。前記第２の
処理工程後の表面粗さは、Ｒy が０．１〜５μｍであ
り、かつＲaが０．０１〜０．３μｍであることが好ま
しい。The surface roughness after the first embedding step is Ry
Is 0.2 to 10 μm, andRa is 0.02 to 1 μm.
m is preferable. Ry is less than 0.2 μm and / or
Alternatively, whenRa is less than 0.02 μm, the antireflection property becomes insufficient due to the top polishing in the next second processing step. Further, whenRy is more than 10 μm and / orRa is more than 1 μm, the appearance is whitened and the design is poor due to the recesses remaining even after the top polishing in the next second processing step.
It is easy to cause troubles such as soiling. The surface roughness after the second treatment step is preferably such that Ry is 0.1 to 5 μm and Ra is 0.01 to 0.3 μm.
【００１５】第１の処埋としては、例えば、１）水と砂
のスラリー液を介在させてグラインダー加工し、次い
で、水とアランダムのスラリー液を介在させてグライン
ダー加工する方法や、２）サンドブラスト法、等で行う
ことができる。第２の処理としては、例えば、水と酸化
セリウムのスラリー液を介在させてウレタン性パッドの
ポリシャーで研磨加工することで行うことができる。As the first treatment, for example, 1) a method of performing grinder processing with a slurry liquid of water and sand, and then performing a grinder processing with a slurry liquid of water and alundum; It can be performed by a sand blast method or the like. The second treatment can be performed, for example, by polishing with a urethane pad polisher with a slurry of water and cerium oxide interposed therebetween.
【００１６】[0016]
【実施例】（実施例１）本発明の実施例につき図１及び
図３を参照しながら詳細に説明する。まず、寸法が幅
２．５ｍ、長さ２ｍ、厚味４ミリのフロートガラス板１
を、石膏で研磨台車に貼り付け、水と砂のスラリー液を
介在させてグラインダー加工し、次いで、水とアランダ
ムのスラリー液を介在させてグラインダー加工しガラス
表面を凹凸化した（第１の処理）。この段階でのガラス
表面の粗さはハンディサーフで測定して、Ｒy が４μｍ
であり、かつＲa が０．４μｍであった。また、中心線
平均山高さＲpm（以下、単にＲpmという）は１．１６μ
ｍであった。Ｒpmは、粗さ曲線からその中心線方向に測
定長さＬの部分を抜き取り、その測定長さＬを５等分
し、５等分された各々の区間の中心線に平行で最高の山
頂を通る直線との間隔の値を平均した値である。(Embodiment 1) An embodiment of the present invention will be described in detail with reference to FIGS. First, a float glass plate 1 having dimensions of 2.5 m in width, 2 m in length, and 4 mm thick
Was adhered to a polishing cart with gypsum, and subjected to grinder processing with a slurry liquid of water and sand interposed therebetween, and then subjected to grinder processing with a slurry liquid of water and alundum interposed to make the glass surface uneven (first example). processing). The roughness of the glass surface at this stage was measured by a handy surf andRy was 4 μm.
AndRa was 0.4 μm. The center line average peak height Rpm (hereinafter simply referred to as Rpm ) is 1.16 μm.
m. Rpm is obtained by extracting a portion of the measured length L from the roughness curve in the direction of the center line, dividing the measured length L into five equal parts, and the highest peak parallel to the center line of each of the five equally divided sections. Is the average of the values of the distance to the straight line passing through.
【００１７】また、図３（ａ）に、負荷長さ率ｔp （以
下、単にｔp という）と切断レベルとの関係（このグラ
フを以下、アボット負荷曲線という）を示す。ｔp 及び
切断レベル（％）は、ＪＩＳ Ｂ０６０１で定義される
値である。図３（ａ）のアボット負荷曲線では、ｔp が
１０％の時の切断レベルは２０％、ｔp が２０％の時の
切断レベルは２５％であった。第１の処理を行った状態
では、表面の凹凸が大きく、かつ表面がざらざらしてい
るため、使用時ガラス面が汚れやすいなどの問題がある
ので、さらに水と酸化セリウムのスラリー液を介在させ
てウレタン性パッドのポリシャーで研磨加工を行った
（第２の処理）。このポリシャーは、研磨工程の流れ方
向の中央部に主軸をを有し、主軸に複数のポリシャーを
有している。主軸は公転し、ポリシャ自体は自転する構
成になっている。この平坦化のポリシング加工は、研磨
面凹凸の凸部のみが透明になる程度まで行った。Further, in FIG. 3 (a), the load length ratio tp (hereinafter, simply referred tp) relation between cutting levels and (this graph hereinafter referred Abbott load curve) shows a. tp and cutting level (%) is a value defined by JIS B0601. The Abbot load curve in FIG. 3 (a), tp is the cut level when 10% to 20%, cut level when tp 20% was 25%. In the state where the first treatment has been performed, since the surface has large irregularities and the surface is rough, there is a problem that the glass surface is easily stained during use. Therefore, a slurry of water and cerium oxide is further interposed. Polishing was performed using a urethane pad polisher (second process). This polisher has a main shaft at the center in the flow direction of the polishing process, and has a plurality of polishers on the main shaft. The main shaft revolves, and the polisher itself rotates. This polishing for flattening was performed until only the convex portions of the polished surface irregularities became transparent.
【００１８】次に、仕上がったガラス表面２の表面粗さ
をハンディサーフで測定を行った。ガラス表面２の中央
部付近の測定結果では、Ｒy が２．３２μｍであり、か
つＲa が０．１９μｍであった。また、ハンディ光沢度
計で測定した光沢度は３０であった。なお、中央部より
１ｍ離れた端部では、Ｒy が１．６７μｍ、Ｒa が０．
１０μｍであり、ハンディ光沢度計で測定した光沢度は
６５であった。Ｒpmは、中央部付近で０．４８μｍ、端
部付近で０．１９μｍであり、ポリシング前より凸部が
平坦化されていた。Next, the surface roughness of the finished glass surface 2 was measured by handy surf. As a result of measurement near the center of the glass surface 2,Ry was 2.32 μm andRa was 0.19 μm. The glossiness measured with a handy glossmeter was 30. At the end 1 m away from the center,Ry is 1.67 μm andRa is 0.
It was 10 μm, and the glossiness measured by a handy glossiness meter was 65. Rpm was 0.48 μm near the center and 0.19 μm near the ends, and the protrusions were flattened before polishing.
【００１９】また、図３（ｂ）のアボット負荷曲線から
わかるように、ｔp が１０％の時の切断レベルは８％で
あり、また、ｔp が２０％の時の切断レベルは１０％で
あった。この結果、前述したポリシング前のアボット負
荷曲線（図３（ａ））ではｔp １０％の切断レベルが２
０％、ｔp ２０％の切断レベルが２５％であったことか
ら、ポリシングすることで凹凸の頂部が平坦化されたこ
とが判る。Further, as can be seen from Abbott load curve in FIG. 3 (b), the cut level when the tp is 10% is 8% and, tp is cut level when 20% 10% Met. As a result, before policing Abbott load curve (FIG. 3 (a)) in tp 10% of the cutting levels above 2
0%, since tp 20% of the cutting level was 25%, it is seen that the top of the irregularities by police is flattened.
【００２０】なお、前記凹凸の頂部の平坦化について
は、均一の研磨レートを得るため、例えば、１）長方形
のパットがガラス流れ方向に対し前後左右に揺動する方
式のポリシングマシンを用いる、２）主軸に複数の補助
主軸を設け、補助主軸に複数のポリシャーを有するポリ
シングマシンを用いる、あるいは３）エッチング法等の
研磨法で行ってもよい。さらに仕上がったガラスの非研
磨面に、ＳｎＯ2 からなる透明導電膜層３、アモルファ
スシリコン層４及びＡｇからなる裏面電極５を加工後、
ＥＶＡ膜６を介在させて、７のフロート板３ｍｍと積層
してモジュール化し、屋根に施工し６ケ月間の実用性試
験を行った。In order to obtain a uniform polishing rate, for example, 1) use a polishing machine of a type in which a rectangular pad swings back and forth and right and left with respect to the glass flow direction. A plurality of auxiliary spindles may be provided on the main spindle, and a polishing machine having a plurality of polishers on the auxiliary spindle may be used, or 3) a polishing method such as an etching method. Further, after processing the transparent conductive film layer 3 made of SnO2 , the amorphous silicon layer 4 and the back electrode 5 made of Ag on the non-polished surface of the finished glass,
The EVA film 6 was interposed and laminated with a float plate 3 mm of 3 mm to form a module, which was constructed on a roof and subjected to a practicality test for 6 months.
【００２１】従来品のフロート板をカバーガラスとした
アモルファス太陽電池は、太陽を反射させると目がくら
み、瞬時に目をそらしてしまう眩しさのレベルであった
が、本実施例のカバーガラスを用いた太陽電池は、太陽
を反射させても、目が眩むようなことは全くなく実用上
の問題はなかった。また、ガラス表面の汚れも、従来の
結晶系太陽電池モジュールに使用されている汚れの少な
いカバーガラスと同等以上の優れた結果であった。発電
効率も７％であり、フロート板をカバーガラスとしたア
モルファス太陽電池モジュールと同等であった。A conventional amorphous solar cell using a float plate as a cover glass has a dazzling level that causes dazzling when the sun is reflected and instantly distracts the eyes. Even if the solar cell used reflects the sun, there was no dazzling and there was no practical problem. In addition, the stain on the glass surface was an excellent result equal to or better than that of a cover glass with little stain used in a conventional crystalline solar cell module. The power generation efficiency was also 7%, which was equivalent to that of an amorphous solar cell module using a float plate as a cover glass.
【００２２】（実施例２）次に、図２を参照して実施例
２を詳細に説明する。実施例１と同様のガラス板を用
い、実施例１と同様にして第１の処理及び第２の処理を
行った。その後、該ガラス１を幅２ｍ、長さ２ｍに切断
し、さらに、切断したがガラスを面取り、洗浄・乾燥、
加熱、風冷の手順で強化処理して倍強化ガラス（ＪＩＳ
Ｒ３２２２に規定される耐風圧強度が高められたガラ
ス）とした。この段階で、実施例１と同様にガラス表面
の粗さを測定した結果、Ｒy が１．７〜２．３μｍであ
り、かつＲa が０．１０〜０．１９μｍであった。ま
た、光沢度は３０〜６５であった。上記ガラスの研磨面
２がカバーガラスとして外側になるようにし、多結晶シ
リコン太陽電池８をＥＶＡ膜６を介して積層した。さら
に、裏面フィルム９をＥＶＡ膜６を介して積層しモジュ
ール化した。(Embodiment 2) Next, Embodiment 2 will be described in detail with reference to FIG. Using the same glass plate as in Example 1, the first processing and the second processing were performed in the same manner as in Example 1. Thereafter, the glass 1 was cut into a width of 2 m and a length of 2 m, and the cut glass was chamfered, washed, dried,
Double tempered glass by tempering with heating and air cooling procedures (JIS
Glass with increased wind pressure resistance specified in R3222). At this stage, the surface roughness of the glass was measured in the same manner as in Example 1. As a result,Ry was 1.7 to 2.3 μm andRa was 0.10 to 0.19 μm. Moreover, the glossiness was 30-65. The polycrystalline silicon solar cell 8 was laminated via the EVA film 6 so that the polished surface 2 of the glass was outside as a cover glass. Further, the back film 9 was laminated via the EVA film 6 to form a module.
【００２３】実施例１と同様に屋根に施工し、実用性の
確認をした。可視光線反射率は、７．８％と、従来の結
晶系太陽電池に使用されているカバーガラスに比べ約１
％程度押さえられた。また、ガラス表面の汚れも、従来
の結晶系太陽電池モジュールに使用されている汚れの少
ないカバーガラスと同等以上の優れた結果であった。ま
た、発電効率も１２〜１３％と従来の結晶系太陽電池モ
ジュールとほぼ同等であった。The construction was carried out on the roof in the same manner as in Example 1, and the practicability was confirmed. The visible light reflectance is 7.8%, which is about 1 compared with the cover glass used for the conventional crystalline solar cell.
% Was held down. In addition, the stain on the glass surface was an excellent result equal to or better than that of a cover glass with little stain used in a conventional crystalline solar cell module. Further, the power generation efficiency was 12 to 13%, which was almost equal to that of the conventional crystalline solar cell module.
【００２４】[0024]
【発明の効果】本発明によれば、ガラス表面の反射光公
害を防止でき、かつ表面が汚れにくい太陽電池用カバー
ガラス及び太陽電池を、低コストで提供できる。特に、
大寸法の太陽電池に好適である。According to the present invention, it is possible to provide a cover glass for a solar cell and a solar cell at a low cost, which can prevent the reflected light pollution of the glass surface and prevent the surface from being stained. Especially,
Suitable for large size solar cells.
【図１】実施例１のアモルファス太陽電池の構成図であ
る。FIG. 1 is a configuration diagram of an amorphous solar cell of Example 1.
【図２】実施例２の結晶系太陽電池の構成図である。FIG. 2 is a configuration diagram of a crystalline solar cell of Example 2.
【図３】（ａ）は第１の処理後（ｂ）第２の処理後のア
ボット負荷曲線を示すグラフである。FIG. 3 (a) is a graph showing an Abbott load curve after the first processing (b) and after the second processing.
１：太陽電池用カバーガラス ２：太陽電池用カバーガラス研磨面 ３：透明導電膜 ４：アモルファスシリコン膜 ５：裏面電極 ６：ＥＶＡ膜 ７：裏面ガラス ８：結晶系太陽電池 ９：裏面フィルム 1: Cover glass for solar cell 2: Polished surface for cover glass for solar cell 3: Transparent conductive film 4: Amorphous silicon film 5: Back electrode 6: EVA film 7: Back glass 8: Crystalline solar cell 9: Back film
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10509498AJP4010053B2 (en) | 1998-04-15 | 1998-04-15 | Cover glass for solar cell, method for producing the same, and solar cell |
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10509498AJP4010053B2 (en) | 1998-04-15 | 1998-04-15 | Cover glass for solar cell, method for producing the same, and solar cell |
| Publication Number | Publication Date |
|---|---|
| JPH11298030Atrue JPH11298030A (en) | 1999-10-29 |
| JPH11298030A5 JPH11298030A5 (en) | 2004-11-04 |
| JP4010053B2 JP4010053B2 (en) | 2007-11-21 |
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10509498AExpired - Fee RelatedJP4010053B2 (en) | 1998-04-15 | 1998-04-15 | Cover glass for solar cell, method for producing the same, and solar cell |
| Country | Link |
|---|---|
| JP (1) | JP4010053B2 (en) |
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|---|---|---|---|---|
| EP1038850A1 (en)* | 1999-03-19 | 2000-09-27 | Pilkington Plc | Production of sheet glass |
| JP2003110128A (en)* | 2001-09-28 | 2003-04-11 | Sharp Corp | Thin film solar cell module and method of manufacturing the same |
| JP2003124491A (en)* | 2001-10-15 | 2003-04-25 | Sharp Corp | Thin film solar cell module |
| US7026542B2 (en) | 2001-12-13 | 2006-04-11 | Asahi Glass Company, Limited | Cover glass for a solar battery, a method for producing the cover glass and a solar battery module using the cover glass |
| US7087307B2 (en) | 2001-12-28 | 2006-08-08 | Nippon Sheet Glass Company, Limited | Glass sheet and glass sheet photoelectric converter device |
| US7700869B2 (en)* | 2005-02-03 | 2010-04-20 | Guardian Industries Corp. | Solar cell low iron patterned glass and method of making same |
| WO2006121601A1 (en)* | 2005-05-05 | 2006-11-16 | Guardian Industries Corp. | Solar cell using low iron high transmission glass with antimony and corresponding method |
| US8802216B2 (en) | 2005-05-05 | 2014-08-12 | Guardian Industries Corp. | Solar cell using low iron high transmission glass with antimony and corresponding method |
| US7743630B2 (en) | 2005-05-05 | 2010-06-29 | Guardian Industries Corp. | Method of making float glass with transparent conductive oxide (TCO) film integrally formed on tin bath side of glass and corresponding product |
| US7700870B2 (en)* | 2005-05-05 | 2010-04-20 | Guardian Industries Corp. | Solar cell using low iron high transmission glass with antimony and corresponding method |
| EP1829675A1 (en)* | 2006-02-22 | 2007-09-05 | Glaverbel | Glazing panel |
| US7893350B2 (en) | 2006-03-13 | 2011-02-22 | Guardian Industries Corp. | Low iron transmission float glass for solar cell applications and method of making same |
| US7557053B2 (en) | 2006-03-13 | 2009-07-07 | Guardian Industries Corp. | Low iron high transmission float glass for solar cell applications and method of making same |
| US8648252B2 (en)* | 2006-03-13 | 2014-02-11 | Guardian Industries Corp. | Solar cell using low iron high transmission glass and corresponding method |
| US8936842B2 (en) | 2007-01-08 | 2015-01-20 | Guardian Industris Corp. | Low-E coating having zinc aluminum oxide based layer doped with yttrium |
| US8497220B2 (en) | 2007-02-16 | 2013-07-30 | Nippon Electric Glass Co., Ltd. | Glass substrate for solar cell |
| WO2008099687A1 (en) | 2007-02-16 | 2008-08-21 | Nippon Electric Glass Co., Ltd. | Glass substrate for solar battery |
| WO2008117681A1 (en)* | 2007-03-23 | 2008-10-02 | Showa Shell Sekiyu K. K. | Solar battery module |
| JP2009088503A (en)* | 2007-09-14 | 2009-04-23 | Mitsubishi Chemicals Corp | Laminated cover substrate for solar cell, solar cell, and method for producing laminated cover substrate for solar cell |
| WO2009099509A3 (en)* | 2008-02-01 | 2009-11-26 | Guardian Industries Corp. | Transparent front electrode for use in photovoltaic device and method of making same |
| JP2013524499A (en)* | 2010-03-31 | 2013-06-17 | ソーラーエクセル ベスローテン フェノーツハップ | Thin film photovoltaic devices with an enhanced light capture scheme. |
| US9793426B2 (en) | 2013-06-06 | 2017-10-17 | Fuji Manufacturing Co., Ltd. | Method for processing surface of light-transmitting glass and light-transmitting glass processed by said method |
| US10043926B2 (en) | 2013-06-06 | 2018-08-07 | Fuji Manufacturing Co., Ltd. | Method for processing surface of light-transmitting glass and light transmitting glass processed by said method |
| WO2016017645A1 (en)* | 2014-08-01 | 2016-02-04 | 旭硝子株式会社 | Support substrate with inorganic film, glass laminate, method for producing these, and method for producing electronic device |
| CN108321217A (en)* | 2018-02-23 | 2018-07-24 | 晶科能源科技（海宁）有限公司 | Photovoltaic glass and preparation method thereof, solar double-glass assemblies |
| KR20230078884A (en)* | 2021-11-26 | 2023-06-05 | 한국전자기술연구원 | Photovoltaic substrate having contamination-resistant layer and method for manufacturing the same |
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