Movatterモバイル変換


[0]ホーム

URL:


JPH11183264A - 熱電対をもつ温度測定器 - Google Patents

熱電対をもつ温度測定器

Info

Publication number
JPH11183264A
JPH11183264AJP34652797AJP34652797AJPH11183264AJP H11183264 AJPH11183264 AJP H11183264AJP 34652797 AJP34652797 AJP 34652797AJP 34652797 AJP34652797 AJP 34652797AJP H11183264 AJPH11183264 AJP H11183264A
Authority
JP
Japan
Prior art keywords
thermocouple
groove
temperature measuring
insulating tube
tip
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP34652797A
Other languages
English (en)
Inventor
Hiroshi Suzuki
洋 鈴木
Chikamichi Kajita
慎道 梶田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TYK Corp
Original Assignee
TYK Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TYK CorpfiledCriticalTYK Corp
Priority to JP34652797ApriorityCriticalpatent/JPH11183264A/ja
Publication of JPH11183264ApublicationCriticalpatent/JPH11183264A/ja
Pendinglegal-statusCriticalCurrent

Links

Landscapes

Abstract

(57)【要約】【課題】 特に高温域の温度測定を繰り返し行うことに
より発生する熱電対の断線がおさえられた熱電対をもつ
温度測定器を提供すること。【解決手段】 本発明の温度測定器は、軸長方向に二本
の挿通孔31を持つ絶縁管3と、この挿通孔31に挿入
され挿通孔31の先端から突出した測温接点43を持つ
熱電対4とを有し、この絶縁管3にはその先端部の端面
の中心を通り二本の挿通孔31が底に開口する溝30を
有し熱電対4の測温接点43が溝30内に収納されてい
ることを特徴とする。本発明の熱電対をもつ温度測定器
は、熱電対の断線がおこりにくくなっているため、断線
が原因となる熱電対の寿命の短縮が起こらなくなり、長
寿命化の効果も有するようになる。

Description

【発明の詳細な説明】
【0001】
【発明の属する技術分野】本発明は、例えば溶融金属等
の温度を熱電対を用いて測温する温度測定器に関する。
【0002】
【従来の技術】熱電対温度計には図4の断面図に示され
る測温部を用いた温度測定器がある。この測温部は溶融
金属等の測温というような高温域での温度測定に用いら
れるものであり、先端を閉じた筒形状のサーメットより
なる外周保護管1と、この外周保護管1の内部に挿入さ
れ先端が閉じた筒形状のアルミナよりなる内周保護管2
と、この内周保護管2の内部に挿入され軸長方向に二本
の挿通孔31を持つアルミナよりなる絶縁管3と、挿通
孔31に挿入され挿通孔31の先端から突出した測温接
点43を持つ熱電対4と、からなる。
【0003】
【発明が解決しようとする課題】このような従来の温度
測定器での温度の測定は、測温部内で熱電対の先端が絶
縁管に押しつぶされたり、熱電対の先端が内筒保護管と
絶縁管との間で機械的な応力を繰り返し受けることで、
熱電対の断線が発生し測温部の寿命が短くなる問題があ
った。
【0004】また、温度測定の繰り返し、特に高温域で
の温度測定を繰り返すと、熱電対と絶縁管がそれぞれ熱
膨張により伸び縮みする。このとき、熱電対と絶縁管の
熱膨張率が異なるため、両者の伸び縮みが異なり、場合
によっては熱電対が断線するという問題もあった。熱膨
張率の具体的な値として20℃の熱膨張係数(×10-6
-1)が、熱電対では7.9、絶縁管では8.9であっ
た。
【0005】本発明は上記実状に鑑みてなされたもので
あり、特に高温域の温度測定を繰り返し行うことにより
発生する熱電対の断線がおさえられた熱電対をもつ温度
測定器を提供することを課題とする。
【0006】
【課題を解決するための手段】上記課題を解決するため
に本発明者らは、絶縁管の先端の端面に溝をもうけ、そ
の溝内に測温接点を収納することで、熱電対の断線を防
止できることを見出した。すなわち、本発明の熱電対を
もつ温度測定器は、軸長方向に二本の挿通孔を持つ絶縁
管と、この挿通孔に挿入され挿通孔の先端から突出した
測温接点を持つ熱電対とを有し、この絶縁管にはその先
端部の端面の中心を通り二本の挿通孔が底に開口する溝
を有し熱電対の接合端部が溝内に収納されていることを
特徴とする。
【0007】
【発明の実施の形態】熱電対は、二種類の金属線を接合
しその熱起電力により温度を求めるものであり、二種類
の金属線は測定される温度域等により選択することがで
きる。具体的には、JISで規定されている熱電対など
が用いられる。絶縁管は、測温に用いられる熱電対の測
温接点が測温部の先端部にくるように熱電対を固定する
ものである。この絶縁管の材質としては熱電対を絶縁す
る材料で、かつ耐熱衝撃性および耐物理的衝撃性にすぐ
れた材料が用いられる。例えばアルミナが用いられる。
【0008】絶縁管は、その先端部の端面の中心を通り
かつ二本の挿通孔が底に開口する溝を有する。またこの
溝内には熱電対の測温接点が収納されている。なお、絶
縁管は長い一本からなるものでも、軸方向に積み上げら
れた複数個のもので構成してもよい。絶縁管はその先端
の端面に溝をもつ。そしてこの溝内に熱電対の先端が収
納されている。この熱電対の先端が溝内に収納されてい
るため熱電対の先端が絶縁管に押しつぶされることや、
熱電対の先端がそれを被覆保護する保護管と絶縁管との
間で機械的な応力を繰り返し受けることによる熱電対の
断線を防止することができる。
【0009】絶縁管の先端部に開口する溝は、二本の挿
通孔を結ぶ方向と直交する方向にのびていることが好ま
しい。溝が二本の挿通孔を結ぶ方向と直交する方向にの
びることで、溝内に収納された熱電対が等しく加熱され
る。絶縁管の先端部に開口する溝の大きさ(深さおよび
幅)は、用いられる絶縁管および熱電対の性質により適
宜決定される。すなわち、熱電対と絶縁管の熱膨張率に
より決定される。
【0010】溝の深さが浅い場合には、熱膨張率の差の
ため冷却時には熱電対が絶縁管に対して相対的に縮むこ
とになる。熱電対が相対的に縮むことで、熱電対が突っ
張って断線を生じる。溝の深さが深い場合には、溝内に
収納された熱電対が溝の底に近い部分で短絡し、この短
絡した箇所が新たな測温接点となる。また、この新たな
測温接点を生じることは、前記した溝の深さが浅い場合
と同様のことが発生し熱電対の寿命が短くなる。
【0011】溝の幅について、幅が狭い場合には、熱電
対の測温接点を溝内にもうけられなくなり、絶縁管の先
端面に溝をもうける意味が無くなる。また、幅が広い場
合には、絶縁管の溝の外側の部分の強度が弱くなり、絶
縁管先端が折損しやすくなる。折損が生じると、熱電対
が絶縁管から突出するとともに、前記した溝の深さが浅
い場合と等しくなり熱電対の寿命が短くなる。
【0012】実用的な溝の深さは絶縁管の外径がφ3m
mの場合で2〜12mm、溝の幅は1.6〜2.2mm
程度である。なお、本発明の熱電対を持つ温度測定器は
保護管内に収納して使用できる。特に溶鋼等の高温の測
温に用いられる場合には、保護管は外周保護管および内
周保護管とからなる。
【0013】外周保護管は、熱電対の測温接点を保護す
るために用いられる。この外周保護管には高い熱伝導率
を持ち、かつ耐熱衝撃性および耐物理的衝撃性にすぐれ
た材料が用いられる。例えばMoZrO2等のサーメッ
トを用いることができる。内周保護管は、外周保護管の
内部に挿入される。この内周保護管も、熱電対の測温接
点を保護するために用いられ、高い熱伝導率を持ち、か
つ耐熱衝撃性および耐物理的衝撃性にすぐれた材料が用
いられる。例えばアルミナを用いることができる。
【0014】
【実施例】以下、本発明を実施例を用いて説明する。 (実施例)本発明の実施例は、図1に示されるように、
外周保護管1と、内周保護管2と、先端部の端面に溝3
0が開口した絶縁管3と、熱電対4とを有する熱電対を
持つ温度測定器である。
【0015】外周保護管1はMoZrO2で形成され
る。また、その形状は先端がなめらかな曲面を描くよう
に閉じられた円筒形状をしており、円筒部分の外径はφ
20mm、内径はφ10mmであった。内周保護管2は
アルミナで形成され、外周保護管1内に挿入される。ま
た、その形状は先端がなめらかな曲面を描くように閉じ
られた円筒形状をしており、円筒部分の外径はφ6mm
で、内径はφ4mmであった。
【0016】絶縁管3は長い一本からなるアルミナで形
成され、内周保護管2内に挿入される。この絶縁管3の
先端部の軸方向断面図を図2に、図2のII線での断面
図を図3に示す。ここで、絶縁管3はφ3mmの円柱に
軸直方向にのびる二本のφ0.8mmの挿通孔31を有
し、かつ先端部の端面に溝30を有する形状をしてい
る。この二つの挿通孔31は中心軸の間隔が1.6mm
で、絶縁管3の中心で対称となるようにもうけられてい
る。また、溝30は絶縁管3の端面の中心を通り、かつ
二つの挿通孔31を結ぶ方向と直交する方向にのび、こ
の溝30により絶縁管3の端面は二つに分けられてい
る。溝30は凹状の断面形状をしており、この凹状部は
幅が2mmで、深さが8mmであった。
【0017】絶縁管3の挿通行31に挿入された熱電対
4は、JIS規定のRタイプの熱電対が用いられた。こ
の熱電対4は太さがφ0.5mmの線材であった。JI
SのRタイプの熱電対は、+極が13%Rh−Ptであ
り、−極がPtである。この熱電対の+極と−極の接合
する部分が熱電対4の測温接点43となっている。この
熱電対4の測温接点43は絶縁管3の先端にもうけられ
た溝30内に収納されている。
【0018】また、挿通孔31の中心軸の間隔が1.6
mmであり、溝30の幅が2mmと挿通孔31の中心軸
の間隔より大きいため、挿通孔31の中心軸はともに溝
30の凹部内に位置する。このため、溝30と挿通孔3
1とが重なり、この重なった部分の挿通孔31から突出
する熱電対4は溝30内で露出している。 (比較例1)比較例1は、図4の断面図に示される測温
部を有する。この測温部は、長い一本からなり先端の端
面に溝がない絶縁管を有する従来の熱電対を持つ温度測
定器である。 (比較例2)比較例2は、測温部に用いられる絶縁管の
溝の深さが浅い以外は実施例と同様な熱電対を持つ温度
測定器である。すなわち、比較例2に用いられた絶縁管
は、その先端面に幅が2mmで、深さが2mmの溝を有
する。このとき絶縁管にもうけられた挿通孔からのびる
熱電対が接合する測温接点は溝に収納されていない。 (比較例3)比較例3は、測温部に用いられる絶縁管の
溝の深さが深い以外は実施例と同様な熱電対を持つ温度
測定器である。すなわち、比較例3に用いられた絶縁管
は、その先端面に幅が2mmで、深さが30mmの溝を
有する。 (比較例4)比較例4は、測温部に用いられる絶縁管の
溝の幅が狭い以外は実施例と同様な熱電対を持つ温度測
定器である。すなわち、比較例4に用いられた絶縁管
は、その先端面に幅が1mmで、深さが8mmの溝を有
する。 (試験)実施例および比較例1〜4の熱電対を持つ温度
測定器の熱電対の寿命を求める試験を行った。この試験
は、1550℃の溶鋼に一時間つけた後、室温で一時間
のインターバルをとることを熱電対の寿命が来るまで繰
り返し、熱電対の寿命がきたときの繰り返しの回数を計
測した。実施例および比較例の寿命の計測をそれぞれ十
回繰り返し、熱電対の平均寿命およびその原因を調べ、
表1に示した。なお、比較例1は溝のない例であり、比
較例2は溝の深さの浅い例であり、比較例3は溝の深さ
の深い例であり、比較例4は溝の幅の広い例である。
【0019】
【表1】表1より本実施例の熱電対をもつ温度測定器は熱電対の
寿命までの繰り返し回数が比較例1〜4と比べてかなり
大きくなっている。また、本実施例の熱電対を持つ温度
測定器は熱電対の寿命のきた原因が劣化であって断線で
ないことから、熱電対が外力の影響を受けていないこと
がわかる。対して、比較例1〜4の熱電対を持つ温度測
定器に用いられた熱電対では寿命の原因として断線が半
分以上を占めている。
【0020】
【発明の効果】本発明の熱電対をもつ温度測定器は、測
温に用いられる熱電対にかかる応力がおさえられている
ため、断線がおこりにくくなっている。このため、断線
が原因となる熱電対の寿命の短縮が起こらなくなり、温
度測定器自身の長寿命化の効果も有するようになる。
【図面の簡単な説明】
【図1】 本実施例の熱電対をもつ温度測定器の測温部
の断面を示す図である。
【図2】 本実施例の絶縁管の先端部の軸方向の断面を
示す図である。
【図3】 図2のII線における断面を示す図である。
【図4】 従来の熱電対をもつ温度測定器の測温部の断
面を示す図である。
【符号の説明】
1…外周保護管 2…内周保護管 3…絶縁管 30…溝 31…挿通孔 4…熱電
対 41…+極側熱電対 42…−極側熱電対 43…測温
接点

Claims (2)

    【特許請求の範囲】
  1. 【請求項1】 軸長方向に二本の挿通孔を持つ絶縁管
    と、該挿通孔に挿入され該挿通孔の先端から突出した測
    温接点を持つ熱電対と、を有する温度測定器において、 該絶縁管はその先端部の端面の中心を通り二本の該挿通
    孔が底に開口する溝を有し、該熱電対の接合端部は該溝
    内に収納されていることを特徴とする熱電対をもつ温度
    測定器。
  2. 【請求項2】 前記溝は二本の前記挿通孔を結ぶ方向と
    直交する方向にのびている請求項1記載の熱電対をもつ
    温度測定器。
JP34652797A1997-12-161997-12-16熱電対をもつ温度測定器PendingJPH11183264A (ja)

Priority Applications (1)

Application NumberPriority DateFiling DateTitle
JP34652797AJPH11183264A (ja)1997-12-161997-12-16熱電対をもつ温度測定器

Applications Claiming Priority (1)

Application NumberPriority DateFiling DateTitle
JP34652797AJPH11183264A (ja)1997-12-161997-12-16熱電対をもつ温度測定器

Publications (1)

Publication NumberPublication Date
JPH11183264Atrue JPH11183264A (ja)1999-07-09

Family

ID=18384034

Family Applications (1)

Application NumberTitlePriority DateFiling Date
JP34652797APendingJPH11183264A (ja)1997-12-161997-12-16熱電対をもつ温度測定器

Country Status (1)

CountryLink
JP (1)JPH11183264A (ja)

Cited By (354)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
WO2009154896A1 (en)*2008-06-172009-12-23Asm America, Inc.Thermocouple
US7874726B2 (en)2007-05-242011-01-25Asm America, Inc.Thermocouple
USD702188S1 (en)2013-03-082014-04-08Asm Ip Holding B.V.Thermocouple
US9267850B2 (en)2009-05-062016-02-23Asm America, Inc.Thermocouple assembly with guarded thermocouple junction
US9297705B2 (en)2009-05-062016-03-29Asm America, Inc.Smart temperature measuring device
US10229833B2 (en)2016-11-012019-03-12Asm Ip Holding B.V.Methods for forming a transition metal nitride film on a substrate by atomic layer deposition and related semiconductor device structures
US10249524B2 (en)2017-08-092019-04-02Asm Ip Holding B.V.Cassette holder assembly for a substrate cassette and holding member for use in such assembly
US10249577B2 (en)2016-05-172019-04-02Asm Ip Holding B.V.Method of forming metal interconnection and method of fabricating semiconductor apparatus using the method
US10262859B2 (en)2016-03-242019-04-16Asm Ip Holding B.V.Process for forming a film on a substrate using multi-port injection assemblies
US10269558B2 (en)2016-12-222019-04-23Asm Ip Holding B.V.Method of forming a structure on a substrate
US10276355B2 (en)2015-03-122019-04-30Asm Ip Holding B.V.Multi-zone reactor, system including the reactor, and method of using the same
US10283353B2 (en)2017-03-292019-05-07Asm Ip Holding B.V.Method of reforming insulating film deposited on substrate with recess pattern
US10290508B1 (en)2017-12-052019-05-14Asm Ip Holding B.V.Method for forming vertical spacers for spacer-defined patterning
US10312055B2 (en)2017-07-262019-06-04Asm Ip Holding B.V.Method of depositing film by PEALD using negative bias
US10312129B2 (en)2015-09-292019-06-04Asm Ip Holding B.V.Variable adjustment for precise matching of multiple chamber cavity housings
US10319588B2 (en)2017-10-102019-06-11Asm Ip Holding B.V.Method for depositing a metal chalcogenide on a substrate by cyclical deposition
US10322384B2 (en)2015-11-092019-06-18Asm Ip Holding B.V.Counter flow mixer for process chamber
US10340125B2 (en)2013-03-082019-07-02Asm Ip Holding B.V.Pulsed remote plasma method and system
US10340135B2 (en)2016-11-282019-07-02Asm Ip Holding B.V.Method of topologically restricted plasma-enhanced cyclic deposition of silicon or metal nitride
US10343920B2 (en)2016-03-182019-07-09Asm Ip Holding B.V.Aligned carbon nanotubes
US10361201B2 (en)2013-09-272019-07-23Asm Ip Holding B.V.Semiconductor structure and device formed using selective epitaxial process
US10364496B2 (en)2011-06-272019-07-30Asm Ip Holding B.V.Dual section module having shared and unshared mass flow controllers
US10367080B2 (en)2016-05-022019-07-30Asm Ip Holding B.V.Method of forming a germanium oxynitride film
US10366864B2 (en)2013-03-082019-07-30Asm Ip Holding B.V.Method and system for in-situ formation of intermediate reactive species
US10364493B2 (en)2016-08-252019-07-30Asm Ip Holding B.V.Exhaust apparatus and substrate processing apparatus having an exhaust line with a first ring having at least one hole on a lateral side thereof placed in the exhaust line
US10378106B2 (en)2008-11-142019-08-13Asm Ip Holding B.V.Method of forming insulation film by modified PEALD
US10381226B2 (en)2016-07-272019-08-13Asm Ip Holding B.V.Method of processing substrate
US10381219B1 (en)2018-10-252019-08-13Asm Ip Holding B.V.Methods for forming a silicon nitride film
US10388513B1 (en)2018-07-032019-08-20Asm Ip Holding B.V.Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition
US10388509B2 (en)2016-06-282019-08-20Asm Ip Holding B.V.Formation of epitaxial layers via dislocation filtering
US10395919B2 (en)2016-07-282019-08-27Asm Ip Holding B.V.Method and apparatus for filling a gap
US10403504B2 (en)2017-10-052019-09-03Asm Ip Holding B.V.Method for selectively depositing a metallic film on a substrate
US10410943B2 (en)2016-10-132019-09-10Asm Ip Holding B.V.Method for passivating a surface of a semiconductor and related systems
US10438965B2 (en)2014-12-222019-10-08Asm Ip Holding B.V.Semiconductor device and manufacturing method thereof
US10435790B2 (en)2016-11-012019-10-08Asm Ip Holding B.V.Method of subatmospheric plasma-enhanced ALD using capacitively coupled electrodes with narrow gap
US10446393B2 (en)2017-05-082019-10-15Asm Ip Holding B.V.Methods for forming silicon-containing epitaxial layers and related semiconductor device structures
US10458018B2 (en)2015-06-262019-10-29Asm Ip Holding B.V.Structures including metal carbide material, devices including the structures, and methods of forming same
US10468251B2 (en)2016-02-192019-11-05Asm Ip Holding B.V.Method for forming spacers using silicon nitride film for spacer-defined multiple patterning
US10468262B2 (en)2017-02-152019-11-05Asm Ip Holding B.V.Methods for forming a metallic film on a substrate by a cyclical deposition and related semiconductor device structures
CN110411600A (zh)*2019-08-282019-11-05清河县华源精密仪表厂一种profile热电偶
US10483099B1 (en)2018-07-262019-11-19Asm Ip Holding B.V.Method for forming thermally stable organosilicon polymer film
US10480072B2 (en)2009-04-062019-11-19Asm Ip Holding B.V.Semiconductor processing reactor and components thereof
US10501866B2 (en)2016-03-092019-12-10Asm Ip Holding B.V.Gas distribution apparatus for improved film uniformity in an epitaxial system
US10504742B2 (en)2017-05-312019-12-10Asm Ip Holding B.V.Method of atomic layer etching using hydrogen plasma
US10510536B2 (en)2018-03-292019-12-17Asm Ip Holding B.V.Method of depositing a co-doped polysilicon film on a surface of a substrate within a reaction chamber
US10529554B2 (en)2016-02-192020-01-07Asm Ip Holding B.V.Method for forming silicon nitride film selectively on sidewalls or flat surfaces of trenches
US10529563B2 (en)2017-03-292020-01-07Asm Ip Holdings B.V.Method for forming doped metal oxide films on a substrate by cyclical deposition and related semiconductor device structures
US10529542B2 (en)2015-03-112020-01-07Asm Ip Holdings B.V.Cross-flow reactor and method
US10535516B2 (en)2018-02-012020-01-14Asm Ip Holdings B.V.Method for depositing a semiconductor structure on a surface of a substrate and related semiconductor structures
US10541333B2 (en)2017-07-192020-01-21Asm Ip Holding B.V.Method for depositing a group IV semiconductor and related semiconductor device structures
US10541173B2 (en)2016-07-082020-01-21Asm Ip Holding B.V.Selective deposition method to form air gaps
US10559458B1 (en)2018-11-262020-02-11Asm Ip Holding B.V.Method of forming oxynitride film
US10561975B2 (en)2014-10-072020-02-18Asm Ip Holdings B.V.Variable conductance gas distribution apparatus and method
US10566223B2 (en)2012-08-282020-02-18Asm Ip Holdings B.V.Systems and methods for dynamic semiconductor process scheduling
US10590535B2 (en)2017-07-262020-03-17Asm Ip Holdings B.V.Chemical treatment, deposition and/or infiltration apparatus and method for using the same
US10600673B2 (en)2015-07-072020-03-24Asm Ip Holding B.V.Magnetic susceptor to baseplate seal
US10604847B2 (en)2014-03-182020-03-31Asm Ip Holding B.V.Gas distribution system, reactor including the system, and methods of using the same
US10605530B2 (en)2017-07-262020-03-31Asm Ip Holding B.V.Assembly of a liner and a flange for a vertical furnace as well as the liner and the vertical furnace
US10607895B2 (en)2017-09-182020-03-31Asm Ip Holdings B.V.Method for forming a semiconductor device structure comprising a gate fill metal
US10612137B2 (en)2016-07-082020-04-07Asm Ip Holdings B.V.Organic reactants for atomic layer deposition
US10612136B2 (en)2018-06-292020-04-07ASM IP Holding, B.V.Temperature-controlled flange and reactor system including same
USD880437S1 (en)2018-02-012020-04-07Asm Ip Holding B.V.Gas supply plate for semiconductor manufacturing apparatus
US10622375B2 (en)2016-11-072020-04-14Asm Ip Holding B.V.Method of processing a substrate and a device manufactured by using the method
US10643826B2 (en)2016-10-262020-05-05Asm Ip Holdings B.V.Methods for thermally calibrating reaction chambers
US10643904B2 (en)2016-11-012020-05-05Asm Ip Holdings B.V.Methods for forming a semiconductor device and related semiconductor device structures
US10658205B2 (en)2017-09-282020-05-19Asm Ip Holdings B.V.Chemical dispensing apparatus and methods for dispensing a chemical to a reaction chamber
US10658181B2 (en)2018-02-202020-05-19Asm Ip Holding B.V.Method of spacer-defined direct patterning in semiconductor fabrication
US10655221B2 (en)2017-02-092020-05-19Asm Ip Holding B.V.Method for depositing oxide film by thermal ALD and PEALD
US10665452B2 (en)2016-05-022020-05-26Asm Ip Holdings B.V.Source/drain performance through conformal solid state doping
US10685834B2 (en)2017-07-052020-06-16Asm Ip Holdings B.V.Methods for forming a silicon germanium tin layer and related semiconductor device structures
US10683571B2 (en)2014-02-252020-06-16Asm Ip Holding B.V.Gas supply manifold and method of supplying gases to chamber using same
US10692741B2 (en)2017-08-082020-06-23Asm Ip Holdings B.V.Radiation shield
US10707106B2 (en)2011-06-062020-07-07Asm Ip Holding B.V.High-throughput semiconductor-processing apparatus equipped with multiple dual-chamber modules
US10714315B2 (en)2012-10-122020-07-14Asm Ip Holdings B.V.Semiconductor reaction chamber showerhead
US10714335B2 (en)2017-04-252020-07-14Asm Ip Holding B.V.Method of depositing thin film and method of manufacturing semiconductor device
US10714385B2 (en)2016-07-192020-07-14Asm Ip Holding B.V.Selective deposition of tungsten
US10714350B2 (en)2016-11-012020-07-14ASM IP Holdings, B.V.Methods for forming a transition metal niobium nitride film on a substrate by atomic layer deposition and related semiconductor device structures
US10734244B2 (en)2017-11-162020-08-04Asm Ip Holding B.V.Method of processing a substrate and a device manufactured by the same
US10731249B2 (en)2018-02-152020-08-04Asm Ip Holding B.V.Method of forming a transition metal containing film on a substrate by a cyclical deposition process, a method for supplying a transition metal halide compound to a reaction chamber, and related vapor deposition apparatus
US10734497B2 (en)2017-07-182020-08-04Asm Ip Holding B.V.Methods for forming a semiconductor device structure and related semiconductor device structures
US10741385B2 (en)2016-07-282020-08-11Asm Ip Holding B.V.Method and apparatus for filling a gap
US10755922B2 (en)2018-07-032020-08-25Asm Ip Holding B.V.Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition
US10770286B2 (en)2017-05-082020-09-08Asm Ip Holdings B.V.Methods for selectively forming a silicon nitride film on a substrate and related semiconductor device structures
US10767789B2 (en)2018-07-162020-09-08Asm Ip Holding B.V.Diaphragm valves, valve components, and methods for forming valve components
US10770336B2 (en)2017-08-082020-09-08Asm Ip Holding B.V.Substrate lift mechanism and reactor including same
US10787741B2 (en)2014-08-212020-09-29Asm Ip Holding B.V.Method and system for in situ formation of gas-phase compounds
US10797133B2 (en)2018-06-212020-10-06Asm Ip Holding B.V.Method for depositing a phosphorus doped silicon arsenide film and related semiconductor device structures
US10804098B2 (en)2009-08-142020-10-13Asm Ip Holding B.V.Systems and methods for thin-film deposition of metal oxides using excited nitrogen-oxygen species
US10811256B2 (en)2018-10-162020-10-20Asm Ip Holding B.V.Method for etching a carbon-containing feature
USD900036S1 (en)2017-08-242020-10-27Asm Ip Holding B.V.Heater electrical connector and adapter
US10818758B2 (en)2018-11-162020-10-27Asm Ip Holding B.V.Methods for forming a metal silicate film on a substrate in a reaction chamber and related semiconductor device structures
US10829852B2 (en)2018-08-162020-11-10Asm Ip Holding B.V.Gas distribution device for a wafer processing apparatus
US10832903B2 (en)2011-10-282020-11-10Asm Ip Holding B.V.Process feed management for semiconductor substrate processing
US10847366B2 (en)2018-11-162020-11-24Asm Ip Holding B.V.Methods for depositing a transition metal chalcogenide film on a substrate by a cyclical deposition process
US10847371B2 (en)2018-03-272020-11-24Asm Ip Holding B.V.Method of forming an electrode on a substrate and a semiconductor device structure including an electrode
US10847365B2 (en)2018-10-112020-11-24Asm Ip Holding B.V.Method of forming conformal silicon carbide film by cyclic CVD
US10844484B2 (en)2017-09-222020-11-24Asm Ip Holding B.V.Apparatus for dispensing a vapor phase reactant to a reaction chamber and related methods
US10851456B2 (en)2016-04-212020-12-01Asm Ip Holding B.V.Deposition of metal borides
USD903477S1 (en)2018-01-242020-12-01Asm Ip Holdings B.V.Metal clamp
US10854498B2 (en)2011-07-152020-12-01Asm Ip Holding B.V.Wafer-supporting device and method for producing same
US10858737B2 (en)2014-07-282020-12-08Asm Ip Holding B.V.Showerhead assembly and components thereof
US10865475B2 (en)2016-04-212020-12-15Asm Ip Holding B.V.Deposition of metal borides and silicides
US10867788B2 (en)2016-12-282020-12-15Asm Ip Holding B.V.Method of forming a structure on a substrate
US10867786B2 (en)2018-03-302020-12-15Asm Ip Holding B.V.Substrate processing method
US10872771B2 (en)2018-01-162020-12-22Asm Ip Holding B. V.Method for depositing a material film on a substrate within a reaction chamber by a cyclical deposition process and related device structures
US10886123B2 (en)2017-06-022021-01-05Asm Ip Holding B.V.Methods for forming low temperature semiconductor layers and related semiconductor device structures
US10883175B2 (en)2018-08-092021-01-05Asm Ip Holding B.V.Vertical furnace for processing substrates and a liner for use therein
US10892156B2 (en)2017-05-082021-01-12Asm Ip Holding B.V.Methods for forming a silicon nitride film on a substrate and related semiconductor device structures
US10896820B2 (en)2018-02-142021-01-19Asm Ip Holding B.V.Method for depositing a ruthenium-containing film on a substrate by a cyclical deposition process
US10910262B2 (en)2017-11-162021-02-02Asm Ip Holding B.V.Method of selectively depositing a capping layer structure on a semiconductor device structure
US10914004B2 (en)2018-06-292021-02-09Asm Ip Holding B.V.Thin-film deposition method and manufacturing method of semiconductor device
US10923344B2 (en)2017-10-302021-02-16Asm Ip Holding B.V.Methods for forming a semiconductor structure and related semiconductor structures
US10928731B2 (en)2017-09-212021-02-23Asm Ip Holding B.V.Method of sequential infiltration synthesis treatment of infiltrateable material and structures and devices formed using same
US10934619B2 (en)2016-11-152021-03-02Asm Ip Holding B.V.Gas supply unit and substrate processing apparatus including the gas supply unit
US10941490B2 (en)2014-10-072021-03-09Asm Ip Holding B.V.Multiple temperature range susceptor, assembly, reactor and system including the susceptor, and methods of using the same
US10975470B2 (en)2018-02-232021-04-13Asm Ip Holding B.V.Apparatus for detecting or monitoring for a chemical precursor in a high temperature environment
US11001925B2 (en)2016-12-192021-05-11Asm Ip Holding B.V.Substrate processing apparatus
US11015245B2 (en)2014-03-192021-05-25Asm Ip Holding B.V.Gas-phase reactor and system having exhaust plenum and components thereof
US11018002B2 (en)2017-07-192021-05-25Asm Ip Holding B.V.Method for selectively depositing a Group IV semiconductor and related semiconductor device structures
US11018047B2 (en)2018-01-252021-05-25Asm Ip Holding B.V.Hybrid lift pin
US11022879B2 (en)2017-11-242021-06-01Asm Ip Holding B.V.Method of forming an enhanced unexposed photoresist layer
US11024523B2 (en)2018-09-112021-06-01Asm Ip Holding B.V.Substrate processing apparatus and method
US11031242B2 (en)2018-11-072021-06-08Asm Ip Holding B.V.Methods for depositing a boron doped silicon germanium film
USD922229S1 (en)2019-06-052021-06-15Asm Ip Holding B.V.Device for controlling a temperature of a gas supply unit
US11049751B2 (en)2018-09-142021-06-29Asm Ip Holding B.V.Cassette supply system to store and handle cassettes and processing apparatus equipped therewith
US11056567B2 (en)2018-05-112021-07-06Asm Ip Holding B.V.Method of forming a doped metal carbide film on a substrate and related semiconductor device structures
US11053591B2 (en)2018-08-062021-07-06Asm Ip Holding B.V.Multi-port gas injection system and reactor system including same
US11056344B2 (en)2017-08-302021-07-06Asm Ip Holding B.V.Layer forming method
US11069510B2 (en)2017-08-302021-07-20Asm Ip Holding B.V.Substrate processing apparatus
US11081345B2 (en)2018-02-062021-08-03Asm Ip Holding B.V.Method of post-deposition treatment for silicon oxide film
US11087997B2 (en)2018-10-312021-08-10Asm Ip Holding B.V.Substrate processing apparatus for processing substrates
US11088002B2 (en)2018-03-292021-08-10Asm Ip Holding B.V.Substrate rack and a substrate processing system and method
US11114294B2 (en)2019-03-082021-09-07Asm Ip Holding B.V.Structure including SiOC layer and method of forming same
US11114283B2 (en)2018-03-162021-09-07Asm Ip Holding B.V.Reactor, system including the reactor, and methods of manufacturing and using same
USD930782S1 (en)2019-08-222021-09-14Asm Ip Holding B.V.Gas distributor
US11127617B2 (en)2017-11-272021-09-21Asm Ip Holding B.V.Storage device for storing wafer cassettes for use with a batch furnace
US11127589B2 (en)2019-02-012021-09-21Asm Ip Holding B.V.Method of topology-selective film formation of silicon oxide
USD931978S1 (en)2019-06-272021-09-28Asm Ip Holding B.V.Showerhead vacuum transport
US11139191B2 (en)2017-08-092021-10-05Asm Ip Holding B.V.Storage apparatus for storing cassettes for substrates and processing apparatus equipped therewith
US11139308B2 (en)2015-12-292021-10-05Asm Ip Holding B.V.Atomic layer deposition of III-V compounds to form V-NAND devices
US11158513B2 (en)2018-12-132021-10-26Asm Ip Holding B.V.Methods for forming a rhenium-containing film on a substrate by a cyclical deposition process and related semiconductor device structures
USD935572S1 (en)2019-05-242021-11-09Asm Ip Holding B.V.Gas channel plate
US11171025B2 (en)2019-01-222021-11-09Asm Ip Holding B.V.Substrate processing device
US11205585B2 (en)2016-07-282021-12-21Asm Ip Holding B.V.Substrate processing apparatus and method of operating the same
US11217444B2 (en)2018-11-302022-01-04Asm Ip Holding B.V.Method for forming an ultraviolet radiation responsive metal oxide-containing film
USD940837S1 (en)2019-08-222022-01-11Asm Ip Holding B.V.Electrode
US11222772B2 (en)2016-12-142022-01-11Asm Ip Holding B.V.Substrate processing apparatus
US11227789B2 (en)2019-02-202022-01-18Asm Ip Holding B.V.Method and apparatus for filling a recess formed within a substrate surface
US11227782B2 (en)2019-07-312022-01-18Asm Ip Holding B.V.Vertical batch furnace assembly
US11230766B2 (en)2018-03-292022-01-25Asm Ip Holding B.V.Substrate processing apparatus and method
US11232963B2 (en)2018-10-032022-01-25Asm Ip Holding B.V.Substrate processing apparatus and method
US11233133B2 (en)2015-10-212022-01-25Asm Ip Holding B.V.NbMC layers
US11251068B2 (en)2018-10-192022-02-15Asm Ip Holding B.V.Substrate processing apparatus and substrate processing method
US11251040B2 (en)2019-02-202022-02-15Asm Ip Holding B.V.Cyclical deposition method including treatment step and apparatus for same
USD944946S1 (en)2019-06-142022-03-01Asm Ip Holding B.V.Shower plate
US11270899B2 (en)2018-06-042022-03-08Asm Ip Holding B.V.Wafer handling chamber with moisture reduction
US11274369B2 (en)2018-09-112022-03-15Asm Ip Holding B.V.Thin film deposition method
US11282698B2 (en)2019-07-192022-03-22Asm Ip Holding B.V.Method of forming topology-controlled amorphous carbon polymer film
US11286562B2 (en)2018-06-082022-03-29Asm Ip Holding B.V.Gas-phase chemical reactor and method of using same
US11286558B2 (en)2019-08-232022-03-29Asm Ip Holding B.V.Methods for depositing a molybdenum nitride film on a surface of a substrate by a cyclical deposition process and related semiconductor device structures including a molybdenum nitride film
US11289326B2 (en)2019-05-072022-03-29Asm Ip Holding B.V.Method for reforming amorphous carbon polymer film
USD947913S1 (en)2019-05-172022-04-05Asm Ip Holding B.V.Susceptor shaft
US11295980B2 (en)2017-08-302022-04-05Asm Ip Holding B.V.Methods for depositing a molybdenum metal film over a dielectric surface of a substrate by a cyclical deposition process and related semiconductor device structures
USD948463S1 (en)2018-10-242022-04-12Asm Ip Holding B.V.Susceptor for semiconductor substrate supporting apparatus
USD949319S1 (en)2019-08-222022-04-19Asm Ip Holding B.V.Exhaust duct
US11306395B2 (en)2017-06-282022-04-19Asm Ip Holding B.V.Methods for depositing a transition metal nitride film on a substrate by atomic layer deposition and related deposition apparatus
US11315794B2 (en)2019-10-212022-04-26Asm Ip Holding B.V.Apparatus and methods for selectively etching films
US11342216B2 (en)2019-02-202022-05-24Asm Ip Holding B.V.Cyclical deposition method and apparatus for filling a recess formed within a substrate surface
US11339476B2 (en)2019-10-082022-05-24Asm Ip Holding B.V.Substrate processing device having connection plates, substrate processing method
US11345999B2 (en)2019-06-062022-05-31Asm Ip Holding B.V.Method of using a gas-phase reactor system including analyzing exhausted gas
US11355338B2 (en)2019-05-102022-06-07Asm Ip Holding B.V.Method of depositing material onto a surface and structure formed according to the method
US11361990B2 (en)2018-05-282022-06-14Asm Ip Holding B.V.Substrate processing method and device manufactured by using the same
US11374112B2 (en)2017-07-192022-06-28Asm Ip Holding B.V.Method for depositing a group IV semiconductor and related semiconductor device structures
US11378337B2 (en)2019-03-282022-07-05Asm Ip Holding B.V.Door opener and substrate processing apparatus provided therewith
US11390946B2 (en)2019-01-172022-07-19Asm Ip Holding B.V.Methods of forming a transition metal containing film on a substrate by a cyclical deposition process
US11390945B2 (en)2019-07-032022-07-19Asm Ip Holding B.V.Temperature control assembly for substrate processing apparatus and method of using same
US11393690B2 (en)2018-01-192022-07-19Asm Ip Holding B.V.Deposition method
US11401605B2 (en)2019-11-262022-08-02Asm Ip Holding B.V.Substrate processing apparatus
US11414760B2 (en)2018-10-082022-08-16Asm Ip Holding B.V.Substrate support unit, thin film deposition apparatus including the same, and substrate processing apparatus including the same
US11424119B2 (en)2019-03-082022-08-23Asm Ip Holding B.V.Method for selective deposition of silicon nitride layer and structure including selectively-deposited silicon nitride layer
US11430674B2 (en)2018-08-222022-08-30Asm Ip Holding B.V.Sensor array, apparatus for dispensing a vapor phase reactant to a reaction chamber and related methods
US11430640B2 (en)2019-07-302022-08-30Asm Ip Holding B.V.Substrate processing apparatus
US11437241B2 (en)2020-04-082022-09-06Asm Ip Holding B.V.Apparatus and methods for selectively etching silicon oxide films
US11443926B2 (en)2019-07-302022-09-13Asm Ip Holding B.V.Substrate processing apparatus
US11447861B2 (en)2016-12-152022-09-20Asm Ip Holding B.V.Sequential infiltration synthesis apparatus and a method of forming a patterned structure
US11447864B2 (en)2019-04-192022-09-20Asm Ip Holding B.V.Layer forming method and apparatus
USD965044S1 (en)2019-08-192022-09-27Asm Ip Holding B.V.Susceptor shaft
USD965524S1 (en)2019-08-192022-10-04Asm Ip Holding B.V.Susceptor support
US11469098B2 (en)2018-05-082022-10-11Asm Ip Holding B.V.Methods for depositing an oxide film on a substrate by a cyclical deposition process and related device structures
US11476109B2 (en)2019-06-112022-10-18Asm Ip Holding B.V.Method of forming an electronic structure using reforming gas, system for performing the method, and structure formed using the method
US11473195B2 (en)2018-03-012022-10-18Asm Ip Holding B.V.Semiconductor processing apparatus and a method for processing a substrate
US11482418B2 (en)2018-02-202022-10-25Asm Ip Holding B.V.Substrate processing method and apparatus
US11482533B2 (en)2019-02-202022-10-25Asm Ip Holding B.V.Apparatus and methods for plug fill deposition in 3-D NAND applications
US11482412B2 (en)2018-01-192022-10-25Asm Ip Holding B.V.Method for depositing a gap-fill layer by plasma-assisted deposition
US11488819B2 (en)2018-12-042022-11-01Asm Ip Holding B.V.Method of cleaning substrate processing apparatus
US11488854B2 (en)2020-03-112022-11-01Asm Ip Holding B.V.Substrate handling device with adjustable joints
US11495459B2 (en)2019-09-042022-11-08Asm Ip Holding B.V.Methods for selective deposition using a sacrificial capping layer
US11492703B2 (en)2018-06-272022-11-08Asm Ip Holding B.V.Cyclic deposition methods for forming metal-containing material and films and structures including the metal-containing material
US11501968B2 (en)2019-11-152022-11-15Asm Ip Holding B.V.Method for providing a semiconductor device with silicon filled gaps
US11499226B2 (en)2018-11-022022-11-15Asm Ip Holding B.V.Substrate supporting unit and a substrate processing device including the same
US11499222B2 (en)2018-06-272022-11-15Asm Ip Holding B.V.Cyclic deposition methods for forming metal-containing material and films and structures including the metal-containing material
US11515188B2 (en)2019-05-162022-11-29Asm Ip Holding B.V.Wafer boat handling device, vertical batch furnace and method
US11515187B2 (en)2020-05-012022-11-29Asm Ip Holding B.V.Fast FOUP swapping with a FOUP handler
US11521851B2 (en)2020-02-032022-12-06Asm Ip Holding B.V.Method of forming structures including a vanadium or indium layer
US11527400B2 (en)2019-08-232022-12-13Asm Ip Holding B.V.Method for depositing silicon oxide film having improved quality by peald using bis(diethylamino)silane
US11527403B2 (en)2019-12-192022-12-13Asm Ip Holding B.V.Methods for filling a gap feature on a substrate surface and related semiconductor structures
US11532757B2 (en)2016-10-272022-12-20Asm Ip Holding B.V.Deposition of charge trapping layers
US11530876B2 (en)2020-04-242022-12-20Asm Ip Holding B.V.Vertical batch furnace assembly comprising a cooling gas supply
US11530483B2 (en)2018-06-212022-12-20Asm Ip Holding B.V.Substrate processing system
US11551925B2 (en)2019-04-012023-01-10Asm Ip Holding B.V.Method for manufacturing a semiconductor device
US11551912B2 (en)2020-01-202023-01-10Asm Ip Holding B.V.Method of forming thin film and method of modifying surface of thin film
USD975665S1 (en)2019-05-172023-01-17Asm Ip Holding B.V.Susceptor shaft
US11557474B2 (en)2019-07-292023-01-17Asm Ip Holding B.V.Methods for selective deposition utilizing n-type dopants and/or alternative dopants to achieve high dopant incorporation
US11562901B2 (en)2019-09-252023-01-24Asm Ip Holding B.V.Substrate processing method
US11572620B2 (en)2018-11-062023-02-07Asm Ip Holding B.V.Methods for selectively depositing an amorphous silicon film on a substrate
US11581186B2 (en)2016-12-152023-02-14Asm Ip Holding B.V.Sequential infiltration synthesis apparatus
US11587815B2 (en)2019-07-312023-02-21Asm Ip Holding B.V.Vertical batch furnace assembly
US11587814B2 (en)2019-07-312023-02-21Asm Ip Holding B.V.Vertical batch furnace assembly
USD979506S1 (en)2019-08-222023-02-28Asm Ip Holding B.V.Insulator
US11594450B2 (en)2019-08-222023-02-28Asm Ip Holding B.V.Method for forming a structure with a hole
USD980813S1 (en)2021-05-112023-03-14Asm Ip Holding B.V.Gas flow control plate for substrate processing apparatus
US11605528B2 (en)2019-07-092023-03-14Asm Ip Holding B.V.Plasma device using coaxial waveguide, and substrate treatment method
USD980814S1 (en)2021-05-112023-03-14Asm Ip Holding B.V.Gas distributor for substrate processing apparatus
US11610775B2 (en)2016-07-282023-03-21Asm Ip Holding B.V.Method and apparatus for filling a gap
US11610774B2 (en)2019-10-022023-03-21Asm Ip Holding B.V.Methods for forming a topographically selective silicon oxide film by a cyclical plasma-enhanced deposition process
US11615970B2 (en)2019-07-172023-03-28Asm Ip Holding B.V.Radical assist ignition plasma system and method
USD981973S1 (en)2021-05-112023-03-28Asm Ip Holding B.V.Reactor wall for substrate processing apparatus
US11626316B2 (en)2019-11-202023-04-11Asm Ip Holding B.V.Method of depositing carbon-containing material on a surface of a substrate, structure formed using the method, and system for forming the structure
US11626308B2 (en)2020-05-132023-04-11Asm Ip Holding B.V.Laser alignment fixture for a reactor system
US11629407B2 (en)2019-02-222023-04-18Asm Ip Holding B.V.Substrate processing apparatus and method for processing substrates
US11629406B2 (en)2018-03-092023-04-18Asm Ip Holding B.V.Semiconductor processing apparatus comprising one or more pyrometers for measuring a temperature of a substrate during transfer of the substrate
US11637014B2 (en)2019-10-172023-04-25Asm Ip Holding B.V.Methods for selective deposition of doped semiconductor material
US11637011B2 (en)2019-10-162023-04-25Asm Ip Holding B.V.Method of topology-selective film formation of silicon oxide
US11639548B2 (en)2019-08-212023-05-02Asm Ip Holding B.V.Film-forming material mixed-gas forming device and film forming device
US11639811B2 (en)2017-11-272023-05-02Asm Ip Holding B.V.Apparatus including a clean mini environment
US11646205B2 (en)2019-10-292023-05-09Asm Ip Holding B.V.Methods of selectively forming n-type doped material on a surface, systems for selectively forming n-type doped material, and structures formed using same
US11643724B2 (en)2019-07-182023-05-09Asm Ip Holding B.V.Method of forming structures using a neutral beam
US11644758B2 (en)2020-07-172023-05-09Asm Ip Holding B.V.Structures and methods for use in photolithography
US11646184B2 (en)2019-11-292023-05-09Asm Ip Holding B.V.Substrate processing apparatus
US11646204B2 (en)2020-06-242023-05-09Asm Ip Holding B.V.Method for forming a layer provided with silicon
US11658029B2 (en)2018-12-142023-05-23Asm Ip Holding B.V.Method of forming a device structure using selective deposition of gallium nitride and system for same
US11658035B2 (en)2020-06-302023-05-23Asm Ip Holding B.V.Substrate processing method
US11664199B2 (en)2018-10-192023-05-30Asm Ip Holding B.V.Substrate processing apparatus and substrate processing method
US11664267B2 (en)2019-07-102023-05-30Asm Ip Holding B.V.Substrate support assembly and substrate processing device including the same
US11664245B2 (en)2019-07-162023-05-30Asm Ip Holding B.V.Substrate processing device
US11674220B2 (en)2020-07-202023-06-13Asm Ip Holding B.V.Method for depositing molybdenum layers using an underlayer
US11680839B2 (en)2019-08-052023-06-20Asm Ip Holding B.V.Liquid level sensor for a chemical source vessel
USD990534S1 (en)2020-09-112023-06-27Asm Ip Holding B.V.Weighted lift pin
US11688603B2 (en)2019-07-172023-06-27Asm Ip Holding B.V.Methods of forming silicon germanium structures
USD990441S1 (en)2021-09-072023-06-27Asm Ip Holding B.V.Gas flow control plate
US11685991B2 (en)2018-02-142023-06-27Asm Ip Holding B.V.Method for depositing a ruthenium-containing film on a substrate by a cyclical deposition process
US11705333B2 (en)2020-05-212023-07-18Asm Ip Holding B.V.Structures including multiple carbon layers and methods of forming and using same
US11718913B2 (en)2018-06-042023-08-08Asm Ip Holding B.V.Gas distribution system and reactor system including same
US11725280B2 (en)2020-08-262023-08-15Asm Ip Holding B.V.Method for forming metal silicon oxide and metal silicon oxynitride layers
US11725277B2 (en)2011-07-202023-08-15Asm Ip Holding B.V.Pressure transmitter for a semiconductor processing environment
US11735422B2 (en)2019-10-102023-08-22Asm Ip Holding B.V.Method of forming a photoresist underlayer and structure including same
US11742198B2 (en)2019-03-082023-08-29Asm Ip Holding B.V.Structure including SiOCN layer and method of forming same
US11769682B2 (en)2017-08-092023-09-26Asm Ip Holding B.V.Storage apparatus for storing cassettes for substrates and processing apparatus equipped therewith
US11767589B2 (en)2020-05-292023-09-26Asm Ip Holding B.V.Substrate processing device
US11776846B2 (en)2020-02-072023-10-03Asm Ip Holding B.V.Methods for depositing gap filling fluids and related systems and devices
US11781221B2 (en)2019-05-072023-10-10Asm Ip Holding B.V.Chemical source vessel with dip tube
US11781243B2 (en)2020-02-172023-10-10Asm Ip Holding B.V.Method for depositing low temperature phosphorous-doped silicon
US11804364B2 (en)2020-05-192023-10-31Asm Ip Holding B.V.Substrate processing apparatus
US11814747B2 (en)2019-04-242023-11-14Asm Ip Holding B.V.Gas-phase reactor system-with a reaction chamber, a solid precursor source vessel, a gas distribution system, and a flange assembly
US11823876B2 (en)2019-09-052023-11-21Asm Ip Holding B.V.Substrate processing apparatus
US11821078B2 (en)2020-04-152023-11-21Asm Ip Holding B.V.Method for forming precoat film and method for forming silicon-containing film
US11823866B2 (en)2020-04-022023-11-21Asm Ip Holding B.V.Thin film forming method
US11830738B2 (en)2020-04-032023-11-28Asm Ip Holding B.V.Method for forming barrier layer and method for manufacturing semiconductor device
US11828707B2 (en)2020-02-042023-11-28Asm Ip Holding B.V.Method and apparatus for transmittance measurements of large articles
US11830730B2 (en)2017-08-292023-11-28Asm Ip Holding B.V.Layer forming method and apparatus
US11827981B2 (en)2020-10-142023-11-28Asm Ip Holding B.V.Method of depositing material on stepped structure
US11840761B2 (en)2019-12-042023-12-12Asm Ip Holding B.V.Substrate processing apparatus
US11876356B2 (en)2020-03-112024-01-16Asm Ip Holding B.V.Lockout tagout assembly and system and method of using same
US11873557B2 (en)2020-10-222024-01-16Asm Ip Holding B.V.Method of depositing vanadium metal
US11885023B2 (en)2018-10-012024-01-30Asm Ip Holding B.V.Substrate retaining apparatus, system including the apparatus, and method of using same
US11887857B2 (en)2020-04-242024-01-30Asm Ip Holding B.V.Methods and systems for depositing a layer comprising vanadium, nitrogen, and a further element
US11885013B2 (en)2019-12-172024-01-30Asm Ip Holding B.V.Method of forming vanadium nitride layer and structure including the vanadium nitride layer
USD1012873S1 (en)2020-09-242024-01-30Asm Ip Holding B.V.Electrode for semiconductor processing apparatus
US11885020B2 (en)2020-12-222024-01-30Asm Ip Holding B.V.Transition metal deposition method
US11891696B2 (en)2020-11-302024-02-06Asm Ip Holding B.V.Injector configured for arrangement within a reaction chamber of a substrate processing apparatus
US11901179B2 (en)2020-10-282024-02-13Asm Ip Holding B.V.Method and device for depositing silicon onto substrates
US11898243B2 (en)2020-04-242024-02-13Asm Ip Holding B.V.Method of forming vanadium nitride-containing layer
US11915929B2 (en)2019-11-262024-02-27Asm Ip Holding B.V.Methods for selectively forming a target film on a substrate comprising a first dielectric surface and a second metallic surface
US11923181B2 (en)2019-11-292024-03-05Asm Ip Holding B.V.Substrate processing apparatus for minimizing the effect of a filling gas during substrate processing
US11929251B2 (en)2019-12-022024-03-12Asm Ip Holding B.V.Substrate processing apparatus having electrostatic chuck and substrate processing method
US11946137B2 (en)2020-12-162024-04-02Asm Ip Holding B.V.Runout and wobble measurement fixtures
US11961741B2 (en)2020-03-122024-04-16Asm Ip Holding B.V.Method for fabricating layer structure having target topological profile
US11959168B2 (en)2020-04-292024-04-16Asm Ip Holding B.V.Solid source precursor vessel
US11967488B2 (en)2013-02-012024-04-23Asm Ip Holding B.V.Method for treatment of deposition reactor
US11976359B2 (en)2020-01-062024-05-07Asm Ip Holding B.V.Gas supply assembly, components thereof, and reactor system including same
US11987881B2 (en)2020-05-222024-05-21Asm Ip Holding B.V.Apparatus for depositing thin films using hydrogen peroxide
US11986868B2 (en)2020-02-282024-05-21Asm Ip Holding B.V.System dedicated for parts cleaning
US11996292B2 (en)2019-10-252024-05-28Asm Ip Holding B.V.Methods for filling a gap feature on a substrate surface and related semiconductor structures
US11996289B2 (en)2020-04-162024-05-28Asm Ip Holding B.V.Methods of forming structures including silicon germanium and silicon layers, devices formed using the methods, and systems for performing the methods
US11993843B2 (en)2017-08-312024-05-28Asm Ip Holding B.V.Substrate processing apparatus
US11996309B2 (en)2019-05-162024-05-28Asm Ip Holding B.V.Wafer boat handling device, vertical batch furnace and method
US11993847B2 (en)2020-01-082024-05-28Asm Ip Holding B.V.Injector
US12009241B2 (en)2019-10-142024-06-11Asm Ip Holding B.V.Vertical batch furnace assembly with detector to detect cassette
US12009224B2 (en)2020-09-292024-06-11Asm Ip Holding B.V.Apparatus and method for etching metal nitrides
US12006572B2 (en)2019-10-082024-06-11Asm Ip Holding B.V.Reactor system including a gas distribution assembly for use with activated species and method of using same
US12020934B2 (en)2020-07-082024-06-25Asm Ip Holding B.V.Substrate processing method
US12025484B2 (en)2018-05-082024-07-02Asm Ip Holding B.V.Thin film forming method
US12027365B2 (en)2020-11-242024-07-02Asm Ip Holding B.V.Methods for filling a gap and related systems and devices
US12033885B2 (en)2020-01-062024-07-09Asm Ip Holding B.V.Channeled lift pin
US12040177B2 (en)2020-08-182024-07-16Asm Ip Holding B.V.Methods for forming a laminate film by cyclical plasma-enhanced deposition processes
US12040200B2 (en)2017-06-202024-07-16Asm Ip Holding B.V.Semiconductor processing apparatus and methods for calibrating a semiconductor processing apparatus
US12040199B2 (en)2018-11-282024-07-16Asm Ip Holding B.V.Substrate processing apparatus for processing substrates
US12043899B2 (en)2017-01-102024-07-23Asm Ip Holding B.V.Reactor system and method to reduce residue buildup during a film deposition process
US12051567B2 (en)2020-10-072024-07-30Asm Ip Holding B.V.Gas supply unit and substrate processing apparatus including gas supply unit
US12057314B2 (en)2020-05-152024-08-06Asm Ip Holding B.V.Methods for silicon germanium uniformity control using multiple precursors
US12074022B2 (en)2020-08-272024-08-27Asm Ip Holding B.V.Method and system for forming patterned structures using multiple patterning process
US12087586B2 (en)2020-04-152024-09-10Asm Ip Holding B.V.Method of forming chromium nitride layer and structure including the chromium nitride layer
US12106944B2 (en)2020-06-022024-10-01Asm Ip Holding B.V.Rotating substrate support
US12107005B2 (en)2020-10-062024-10-01Asm Ip Holding B.V.Deposition method and an apparatus for depositing a silicon-containing material
US12112940B2 (en)2019-07-192024-10-08Asm Ip Holding B.V.Method of forming topology-controlled amorphous carbon polymer film
US12125700B2 (en)2020-01-162024-10-22Asm Ip Holding B.V.Method of forming high aspect ratio features
US12129545B2 (en)2020-12-222024-10-29Asm Ip Holding B.V.Precursor capsule, a vessel and a method
US12131885B2 (en)2020-12-222024-10-29Asm Ip Holding B.V.Plasma treatment device having matching box
US12148609B2 (en)2020-09-162024-11-19Asm Ip Holding B.V.Silicon oxide deposition method
US12154824B2 (en)2020-08-142024-11-26Asm Ip Holding B.V.Substrate processing method
US12159788B2 (en)2020-12-142024-12-03Asm Ip Holding B.V.Method of forming structures for threshold voltage control
US12169361B2 (en)2019-07-302024-12-17Asm Ip Holding B.V.Substrate processing apparatus and method
US12173404B2 (en)2020-03-172024-12-24Asm Ip Holding B.V.Method of depositing epitaxial material, structure formed using the method, and system for performing the method
US12195852B2 (en)2020-11-232025-01-14Asm Ip Holding B.V.Substrate processing apparatus with an injector
US12209308B2 (en)2020-11-122025-01-28Asm Ip Holding B.V.Reactor and related methods
US12211742B2 (en)2020-09-102025-01-28Asm Ip Holding B.V.Methods for depositing gap filling fluid
US12217954B2 (en)2020-08-252025-02-04Asm Ip Holding B.V.Method of cleaning a surface
US12218269B2 (en)2020-02-132025-02-04Asm Ip Holding B.V.Substrate processing apparatus including light receiving device and calibration method of light receiving device
US12218000B2 (en)2020-09-252025-02-04Asm Ip Holding B.V.Semiconductor processing method
USD1060598S1 (en)2021-12-032025-02-04Asm Ip Holding B.V.Split showerhead cover
US12217946B2 (en)2020-10-152025-02-04Asm Ip Holding B.V.Method of manufacturing semiconductor device, and substrate treatment apparatus using ether-CAT
US12221357B2 (en)2020-04-242025-02-11Asm Ip Holding B.V.Methods and apparatus for stabilizing vanadium compounds
US12230531B2 (en)2018-04-092025-02-18Asm Ip Holding B.V.Substrate supporting apparatus, substrate processing apparatus including the same, and substrate processing method
US12243747B2 (en)2020-04-242025-03-04Asm Ip Holding B.V.Methods of forming structures including vanadium boride and vanadium phosphide layers
US12241158B2 (en)2020-07-202025-03-04Asm Ip Holding B.V.Method for forming structures including transition metal layers
US12243757B2 (en)2020-05-212025-03-04Asm Ip Holding B.V.Flange and apparatus for processing substrates
US12243742B2 (en)2020-04-212025-03-04Asm Ip Holding B.V.Method for processing a substrate
US12247286B2 (en)2019-08-092025-03-11Asm Ip Holding B.V.Heater assembly including cooling apparatus and method of using same
US12252785B2 (en)2019-06-102025-03-18Asm Ip Holding B.V.Method for cleaning quartz epitaxial chambers
US12255053B2 (en)2020-12-102025-03-18Asm Ip Holding B.V.Methods and systems for depositing a layer
US12266524B2 (en)2020-06-162025-04-01Asm Ip Holding B.V.Method for depositing boron containing silicon germanium layers
US12266695B2 (en)2019-11-052025-04-01Asm Ip Holding B.V.Structures with doped semiconductor layers and methods and systems for forming same
US12272527B2 (en)2018-05-092025-04-08Asm Ip Holding B.V.Apparatus for use with hydrogen radicals and method of using same
US12276023B2 (en)2017-08-042025-04-15Asm Ip Holding B.V.Showerhead assembly for distributing a gas within a reaction chamber
US12278129B2 (en)2020-03-042025-04-15Asm Ip Holding B.V.Alignment fixture for a reactor system
US12288710B2 (en)2020-12-182025-04-29Asm Ip Holding B.V.Wafer processing apparatus with a rotatable table
US12322591B2 (en)2020-07-272025-06-03Asm Ip Holding B.V.Thin film deposition process
US12378665B2 (en)2018-10-262025-08-05Asm Ip Holding B.V.High temperature coatings for a preclean and etch apparatus and related methods
US12406846B2 (en)2020-05-262025-09-02Asm Ip Holding B.V.Method for depositing boron and gallium containing silicon germanium layers
US12410515B2 (en)2020-01-292025-09-09Asm Ip Holding B.V.Contaminant trap system for a reactor system
US12431354B2 (en)2020-07-012025-09-30Asm Ip Holding B.V.Silicon nitride and silicon oxide deposition methods using fluorine inhibitor
US12428726B2 (en)2019-10-082025-09-30Asm Ip Holding B.V.Gas injection system and reactor system including same
US12431334B2 (en)2020-02-132025-09-30Asm Ip Holding B.V.Gas distribution assembly
US12444599B2 (en)2021-12-082025-10-14Asm Ip Holding B.V.Method for forming an ultraviolet radiation responsive metal oxide-containing film

Cited By (453)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US7874726B2 (en)2007-05-242011-01-25Asm America, Inc.Thermocouple
US7946762B2 (en)2008-06-172011-05-24Asm America, Inc.Thermocouple
JP2011524535A (ja)*2008-06-172011-09-01エーエスエム アメリカ インコーポレイテッド熱電対
WO2009154896A1 (en)*2008-06-172009-12-23Asm America, Inc.Thermocouple
US10378106B2 (en)2008-11-142019-08-13Asm Ip Holding B.V.Method of forming insulation film by modified PEALD
US10480072B2 (en)2009-04-062019-11-19Asm Ip Holding B.V.Semiconductor processing reactor and components thereof
US10844486B2 (en)2009-04-062020-11-24Asm Ip Holding B.V.Semiconductor processing reactor and components thereof
US9297705B2 (en)2009-05-062016-03-29Asm America, Inc.Smart temperature measuring device
US9267850B2 (en)2009-05-062016-02-23Asm America, Inc.Thermocouple assembly with guarded thermocouple junction
US10804098B2 (en)2009-08-142020-10-13Asm Ip Holding B.V.Systems and methods for thin-film deposition of metal oxides using excited nitrogen-oxygen species
US10707106B2 (en)2011-06-062020-07-07Asm Ip Holding B.V.High-throughput semiconductor-processing apparatus equipped with multiple dual-chamber modules
US10364496B2 (en)2011-06-272019-07-30Asm Ip Holding B.V.Dual section module having shared and unshared mass flow controllers
US10854498B2 (en)2011-07-152020-12-01Asm Ip Holding B.V.Wafer-supporting device and method for producing same
US11725277B2 (en)2011-07-202023-08-15Asm Ip Holding B.V.Pressure transmitter for a semiconductor processing environment
US10832903B2 (en)2011-10-282020-11-10Asm Ip Holding B.V.Process feed management for semiconductor substrate processing
US10566223B2 (en)2012-08-282020-02-18Asm Ip Holdings B.V.Systems and methods for dynamic semiconductor process scheduling
US10714315B2 (en)2012-10-122020-07-14Asm Ip Holdings B.V.Semiconductor reaction chamber showerhead
US11501956B2 (en)2012-10-122022-11-15Asm Ip Holding B.V.Semiconductor reaction chamber showerhead
US11967488B2 (en)2013-02-012024-04-23Asm Ip Holding B.V.Method for treatment of deposition reactor
US10340125B2 (en)2013-03-082019-07-02Asm Ip Holding B.V.Pulsed remote plasma method and system
US10366864B2 (en)2013-03-082019-07-30Asm Ip Holding B.V.Method and system for in-situ formation of intermediate reactive species
USD702188S1 (en)2013-03-082014-04-08Asm Ip Holding B.V.Thermocouple
US10361201B2 (en)2013-09-272019-07-23Asm Ip Holding B.V.Semiconductor structure and device formed using selective epitaxial process
US10683571B2 (en)2014-02-252020-06-16Asm Ip Holding B.V.Gas supply manifold and method of supplying gases to chamber using same
US10604847B2 (en)2014-03-182020-03-31Asm Ip Holding B.V.Gas distribution system, reactor including the system, and methods of using the same
US11015245B2 (en)2014-03-192021-05-25Asm Ip Holding B.V.Gas-phase reactor and system having exhaust plenum and components thereof
US10858737B2 (en)2014-07-282020-12-08Asm Ip Holding B.V.Showerhead assembly and components thereof
US10787741B2 (en)2014-08-212020-09-29Asm Ip Holding B.V.Method and system for in situ formation of gas-phase compounds
US11795545B2 (en)2014-10-072023-10-24Asm Ip Holding B.V.Multiple temperature range susceptor, assembly, reactor and system including the susceptor, and methods of using the same
US10561975B2 (en)2014-10-072020-02-18Asm Ip Holdings B.V.Variable conductance gas distribution apparatus and method
US10941490B2 (en)2014-10-072021-03-09Asm Ip Holding B.V.Multiple temperature range susceptor, assembly, reactor and system including the susceptor, and methods of using the same
US10438965B2 (en)2014-12-222019-10-08Asm Ip Holding B.V.Semiconductor device and manufacturing method thereof
US10529542B2 (en)2015-03-112020-01-07Asm Ip Holdings B.V.Cross-flow reactor and method
US11742189B2 (en)2015-03-122023-08-29Asm Ip Holding B.V.Multi-zone reactor, system including the reactor, and method of using the same
US10276355B2 (en)2015-03-122019-04-30Asm Ip Holding B.V.Multi-zone reactor, system including the reactor, and method of using the same
US10458018B2 (en)2015-06-262019-10-29Asm Ip Holding B.V.Structures including metal carbide material, devices including the structures, and methods of forming same
US11242598B2 (en)2015-06-262022-02-08Asm Ip Holding B.V.Structures including metal carbide material, devices including the structures, and methods of forming same
US10600673B2 (en)2015-07-072020-03-24Asm Ip Holding B.V.Magnetic susceptor to baseplate seal
US10312129B2 (en)2015-09-292019-06-04Asm Ip Holding B.V.Variable adjustment for precise matching of multiple chamber cavity housings
US11233133B2 (en)2015-10-212022-01-25Asm Ip Holding B.V.NbMC layers
US10322384B2 (en)2015-11-092019-06-18Asm Ip Holding B.V.Counter flow mixer for process chamber
US11956977B2 (en)2015-12-292024-04-09Asm Ip Holding B.V.Atomic layer deposition of III-V compounds to form V-NAND devices
US11139308B2 (en)2015-12-292021-10-05Asm Ip Holding B.V.Atomic layer deposition of III-V compounds to form V-NAND devices
US11676812B2 (en)2016-02-192023-06-13Asm Ip Holding B.V.Method for forming silicon nitride film selectively on top/bottom portions
US10720322B2 (en)2016-02-192020-07-21Asm Ip Holding B.V.Method for forming silicon nitride film selectively on top surface
US10468251B2 (en)2016-02-192019-11-05Asm Ip Holding B.V.Method for forming spacers using silicon nitride film for spacer-defined multiple patterning
US10529554B2 (en)2016-02-192020-01-07Asm Ip Holding B.V.Method for forming silicon nitride film selectively on sidewalls or flat surfaces of trenches
US10501866B2 (en)2016-03-092019-12-10Asm Ip Holding B.V.Gas distribution apparatus for improved film uniformity in an epitaxial system
US12240760B2 (en)2016-03-182025-03-04Asm Ip Holding B.V.Aligned carbon nanotubes
US10343920B2 (en)2016-03-182019-07-09Asm Ip Holding B.V.Aligned carbon nanotubes
US10262859B2 (en)2016-03-242019-04-16Asm Ip Holding B.V.Process for forming a film on a substrate using multi-port injection assemblies
US10865475B2 (en)2016-04-212020-12-15Asm Ip Holding B.V.Deposition of metal borides and silicides
US10851456B2 (en)2016-04-212020-12-01Asm Ip Holding B.V.Deposition of metal borides
US10665452B2 (en)2016-05-022020-05-26Asm Ip Holdings B.V.Source/drain performance through conformal solid state doping
US10367080B2 (en)2016-05-022019-07-30Asm Ip Holding B.V.Method of forming a germanium oxynitride film
US11101370B2 (en)2016-05-022021-08-24Asm Ip Holding B.V.Method of forming a germanium oxynitride film
US10249577B2 (en)2016-05-172019-04-02Asm Ip Holding B.V.Method of forming metal interconnection and method of fabricating semiconductor apparatus using the method
US10388509B2 (en)2016-06-282019-08-20Asm Ip Holding B.V.Formation of epitaxial layers via dislocation filtering
US10541173B2 (en)2016-07-082020-01-21Asm Ip Holding B.V.Selective deposition method to form air gaps
US11749562B2 (en)2016-07-082023-09-05Asm Ip Holding B.V.Selective deposition method to form air gaps
US11094582B2 (en)2016-07-082021-08-17Asm Ip Holding B.V.Selective deposition method to form air gaps
US10612137B2 (en)2016-07-082020-04-07Asm Ip Holdings B.V.Organic reactants for atomic layer deposition
US11649546B2 (en)2016-07-082023-05-16Asm Ip Holding B.V.Organic reactants for atomic layer deposition
US10714385B2 (en)2016-07-192020-07-14Asm Ip Holding B.V.Selective deposition of tungsten
US10381226B2 (en)2016-07-272019-08-13Asm Ip Holding B.V.Method of processing substrate
US11694892B2 (en)2016-07-282023-07-04Asm Ip Holding B.V.Method and apparatus for filling a gap
US11205585B2 (en)2016-07-282021-12-21Asm Ip Holding B.V.Substrate processing apparatus and method of operating the same
US11610775B2 (en)2016-07-282023-03-21Asm Ip Holding B.V.Method and apparatus for filling a gap
US11107676B2 (en)2016-07-282021-08-31Asm Ip Holding B.V.Method and apparatus for filling a gap
US10395919B2 (en)2016-07-282019-08-27Asm Ip Holding B.V.Method and apparatus for filling a gap
US10741385B2 (en)2016-07-282020-08-11Asm Ip Holding B.V.Method and apparatus for filling a gap
US10364493B2 (en)2016-08-252019-07-30Asm Ip Holding B.V.Exhaust apparatus and substrate processing apparatus having an exhaust line with a first ring having at least one hole on a lateral side thereof placed in the exhaust line
US10410943B2 (en)2016-10-132019-09-10Asm Ip Holding B.V.Method for passivating a surface of a semiconductor and related systems
US10643826B2 (en)2016-10-262020-05-05Asm Ip Holdings B.V.Methods for thermally calibrating reaction chambers
US10943771B2 (en)2016-10-262021-03-09Asm Ip Holding B.V.Methods for thermally calibrating reaction chambers
US11532757B2 (en)2016-10-272022-12-20Asm Ip Holding B.V.Deposition of charge trapping layers
US11810788B2 (en)2016-11-012023-11-07Asm Ip Holding B.V.Methods for forming a transition metal niobium nitride film on a substrate by atomic layer deposition and related semiconductor device structures
US10714350B2 (en)2016-11-012020-07-14ASM IP Holdings, B.V.Methods for forming a transition metal niobium nitride film on a substrate by atomic layer deposition and related semiconductor device structures
US10720331B2 (en)2016-11-012020-07-21ASM IP Holdings, B.V.Methods for forming a transition metal nitride film on a substrate by atomic layer deposition and related semiconductor device structures
US10229833B2 (en)2016-11-012019-03-12Asm Ip Holding B.V.Methods for forming a transition metal nitride film on a substrate by atomic layer deposition and related semiconductor device structures
US10435790B2 (en)2016-11-012019-10-08Asm Ip Holding B.V.Method of subatmospheric plasma-enhanced ALD using capacitively coupled electrodes with narrow gap
US10643904B2 (en)2016-11-012020-05-05Asm Ip Holdings B.V.Methods for forming a semiconductor device and related semiconductor device structures
US10622375B2 (en)2016-11-072020-04-14Asm Ip Holding B.V.Method of processing a substrate and a device manufactured by using the method
US10644025B2 (en)2016-11-072020-05-05Asm Ip Holding B.V.Method of processing a substrate and a device manufactured by using the method
US10934619B2 (en)2016-11-152021-03-02Asm Ip Holding B.V.Gas supply unit and substrate processing apparatus including the gas supply unit
US11396702B2 (en)2016-11-152022-07-26Asm Ip Holding B.V.Gas supply unit and substrate processing apparatus including the gas supply unit
US10340135B2 (en)2016-11-282019-07-02Asm Ip Holding B.V.Method of topologically restricted plasma-enhanced cyclic deposition of silicon or metal nitride
US11222772B2 (en)2016-12-142022-01-11Asm Ip Holding B.V.Substrate processing apparatus
US11851755B2 (en)2016-12-152023-12-26Asm Ip Holding B.V.Sequential infiltration synthesis apparatus and a method of forming a patterned structure
US12000042B2 (en)2016-12-152024-06-04Asm Ip Holding B.V.Sequential infiltration synthesis apparatus and a method of forming a patterned structure
US11970766B2 (en)2016-12-152024-04-30Asm Ip Holding B.V.Sequential infiltration synthesis apparatus
US11447861B2 (en)2016-12-152022-09-20Asm Ip Holding B.V.Sequential infiltration synthesis apparatus and a method of forming a patterned structure
US11581186B2 (en)2016-12-152023-02-14Asm Ip Holding B.V.Sequential infiltration synthesis apparatus
US11001925B2 (en)2016-12-192021-05-11Asm Ip Holding B.V.Substrate processing apparatus
US10784102B2 (en)2016-12-222020-09-22Asm Ip Holding B.V.Method of forming a structure on a substrate
US11251035B2 (en)2016-12-222022-02-15Asm Ip Holding B.V.Method of forming a structure on a substrate
US10269558B2 (en)2016-12-222019-04-23Asm Ip Holding B.V.Method of forming a structure on a substrate
US10867788B2 (en)2016-12-282020-12-15Asm Ip Holding B.V.Method of forming a structure on a substrate
US12043899B2 (en)2017-01-102024-07-23Asm Ip Holding B.V.Reactor system and method to reduce residue buildup during a film deposition process
US10655221B2 (en)2017-02-092020-05-19Asm Ip Holding B.V.Method for depositing oxide film by thermal ALD and PEALD
US10468262B2 (en)2017-02-152019-11-05Asm Ip Holding B.V.Methods for forming a metallic film on a substrate by a cyclical deposition and related semiconductor device structures
US12106965B2 (en)2017-02-152024-10-01Asm Ip Holding B.V.Methods for forming a metallic film on a substrate by cyclical deposition and related semiconductor device structures
US10468261B2 (en)2017-02-152019-11-05Asm Ip Holding B.V.Methods for forming a metallic film on a substrate by cyclical deposition and related semiconductor device structures
US11410851B2 (en)2017-02-152022-08-09Asm Ip Holding B.V.Methods for forming a metallic film on a substrate by cyclical deposition and related semiconductor device structures
US10529563B2 (en)2017-03-292020-01-07Asm Ip Holdings B.V.Method for forming doped metal oxide films on a substrate by cyclical deposition and related semiconductor device structures
US11658030B2 (en)2017-03-292023-05-23Asm Ip Holding B.V.Method for forming doped metal oxide films on a substrate by cyclical deposition and related semiconductor device structures
US10283353B2 (en)2017-03-292019-05-07Asm Ip Holding B.V.Method of reforming insulating film deposited on substrate with recess pattern
US10950432B2 (en)2017-04-252021-03-16Asm Ip Holding B.V.Method of depositing thin film and method of manufacturing semiconductor device
US10714335B2 (en)2017-04-252020-07-14Asm Ip Holding B.V.Method of depositing thin film and method of manufacturing semiconductor device
US11848200B2 (en)2017-05-082023-12-19Asm Ip Holding B.V.Methods for selectively forming a silicon nitride film on a substrate and related semiconductor device structures
US10446393B2 (en)2017-05-082019-10-15Asm Ip Holding B.V.Methods for forming silicon-containing epitaxial layers and related semiconductor device structures
US10770286B2 (en)2017-05-082020-09-08Asm Ip Holdings B.V.Methods for selectively forming a silicon nitride film on a substrate and related semiconductor device structures
US10892156B2 (en)2017-05-082021-01-12Asm Ip Holding B.V.Methods for forming a silicon nitride film on a substrate and related semiconductor device structures
US10504742B2 (en)2017-05-312019-12-10Asm Ip Holding B.V.Method of atomic layer etching using hydrogen plasma
US10886123B2 (en)2017-06-022021-01-05Asm Ip Holding B.V.Methods for forming low temperature semiconductor layers and related semiconductor device structures
US12040200B2 (en)2017-06-202024-07-16Asm Ip Holding B.V.Semiconductor processing apparatus and methods for calibrating a semiconductor processing apparatus
US11976361B2 (en)2017-06-282024-05-07Asm Ip Holding B.V.Methods for depositing a transition metal nitride film on a substrate by atomic layer deposition and related deposition apparatus
US11306395B2 (en)2017-06-282022-04-19Asm Ip Holding B.V.Methods for depositing a transition metal nitride film on a substrate by atomic layer deposition and related deposition apparatus
US10685834B2 (en)2017-07-052020-06-16Asm Ip Holdings B.V.Methods for forming a silicon germanium tin layer and related semiconductor device structures
US11164955B2 (en)2017-07-182021-11-02Asm Ip Holding B.V.Methods for forming a semiconductor device structure and related semiconductor device structures
US11695054B2 (en)2017-07-182023-07-04Asm Ip Holding B.V.Methods for forming a semiconductor device structure and related semiconductor device structures
US10734497B2 (en)2017-07-182020-08-04Asm Ip Holding B.V.Methods for forming a semiconductor device structure and related semiconductor device structures
US11374112B2 (en)2017-07-192022-06-28Asm Ip Holding B.V.Method for depositing a group IV semiconductor and related semiconductor device structures
US10541333B2 (en)2017-07-192020-01-21Asm Ip Holding B.V.Method for depositing a group IV semiconductor and related semiconductor device structures
US12363960B2 (en)2017-07-192025-07-15Asm Ip Holding B.V.Method for depositing a Group IV semiconductor and related semiconductor device structures
US11018002B2 (en)2017-07-192021-05-25Asm Ip Holding B.V.Method for selectively depositing a Group IV semiconductor and related semiconductor device structures
US11004977B2 (en)2017-07-192021-05-11Asm Ip Holding B.V.Method for depositing a group IV semiconductor and related semiconductor device structures
US10590535B2 (en)2017-07-262020-03-17Asm Ip Holdings B.V.Chemical treatment, deposition and/or infiltration apparatus and method for using the same
US10605530B2 (en)2017-07-262020-03-31Asm Ip Holding B.V.Assembly of a liner and a flange for a vertical furnace as well as the liner and the vertical furnace
US11802338B2 (en)2017-07-262023-10-31Asm Ip Holding B.V.Chemical treatment, deposition and/or infiltration apparatus and method for using the same
US10312055B2 (en)2017-07-262019-06-04Asm Ip Holding B.V.Method of depositing film by PEALD using negative bias
US12276023B2 (en)2017-08-042025-04-15Asm Ip Holding B.V.Showerhead assembly for distributing a gas within a reaction chamber
US11587821B2 (en)2017-08-082023-02-21Asm Ip Holding B.V.Substrate lift mechanism and reactor including same
US11417545B2 (en)2017-08-082022-08-16Asm Ip Holding B.V.Radiation shield
US10692741B2 (en)2017-08-082020-06-23Asm Ip Holdings B.V.Radiation shield
US10770336B2 (en)2017-08-082020-09-08Asm Ip Holding B.V.Substrate lift mechanism and reactor including same
US10672636B2 (en)2017-08-092020-06-02Asm Ip Holding B.V.Cassette holder assembly for a substrate cassette and holding member for use in such assembly
US10249524B2 (en)2017-08-092019-04-02Asm Ip Holding B.V.Cassette holder assembly for a substrate cassette and holding member for use in such assembly
US11769682B2 (en)2017-08-092023-09-26Asm Ip Holding B.V.Storage apparatus for storing cassettes for substrates and processing apparatus equipped therewith
US11139191B2 (en)2017-08-092021-10-05Asm Ip Holding B.V.Storage apparatus for storing cassettes for substrates and processing apparatus equipped therewith
USD900036S1 (en)2017-08-242020-10-27Asm Ip Holding B.V.Heater electrical connector and adapter
US11830730B2 (en)2017-08-292023-11-28Asm Ip Holding B.V.Layer forming method and apparatus
US11069510B2 (en)2017-08-302021-07-20Asm Ip Holding B.V.Substrate processing apparatus
US11056344B2 (en)2017-08-302021-07-06Asm Ip Holding B.V.Layer forming method
US11581220B2 (en)2017-08-302023-02-14Asm Ip Holding B.V.Methods for depositing a molybdenum metal film over a dielectric surface of a substrate by a cyclical deposition process and related semiconductor device structures
US11295980B2 (en)2017-08-302022-04-05Asm Ip Holding B.V.Methods for depositing a molybdenum metal film over a dielectric surface of a substrate by a cyclical deposition process and related semiconductor device structures
US11993843B2 (en)2017-08-312024-05-28Asm Ip Holding B.V.Substrate processing apparatus
US10607895B2 (en)2017-09-182020-03-31Asm Ip Holdings B.V.Method for forming a semiconductor device structure comprising a gate fill metal
US10928731B2 (en)2017-09-212021-02-23Asm Ip Holding B.V.Method of sequential infiltration synthesis treatment of infiltrateable material and structures and devices formed using same
US10844484B2 (en)2017-09-222020-11-24Asm Ip Holding B.V.Apparatus for dispensing a vapor phase reactant to a reaction chamber and related methods
US11387120B2 (en)2017-09-282022-07-12Asm Ip Holding B.V.Chemical dispensing apparatus and methods for dispensing a chemical to a reaction chamber
US10658205B2 (en)2017-09-282020-05-19Asm Ip Holdings B.V.Chemical dispensing apparatus and methods for dispensing a chemical to a reaction chamber
US11094546B2 (en)2017-10-052021-08-17Asm Ip Holding B.V.Method for selectively depositing a metallic film on a substrate
US12033861B2 (en)2017-10-052024-07-09Asm Ip Holding B.V.Method for selectively depositing a metallic film on a substrate
US10403504B2 (en)2017-10-052019-09-03Asm Ip Holding B.V.Method for selectively depositing a metallic film on a substrate
US10319588B2 (en)2017-10-102019-06-11Asm Ip Holding B.V.Method for depositing a metal chalcogenide on a substrate by cyclical deposition
US10734223B2 (en)2017-10-102020-08-04Asm Ip Holding B.V.Method for depositing a metal chalcogenide on a substrate by cyclical deposition
US10923344B2 (en)2017-10-302021-02-16Asm Ip Holding B.V.Methods for forming a semiconductor structure and related semiconductor structures
US12040184B2 (en)2017-10-302024-07-16Asm Ip Holding B.V.Methods for forming a semiconductor structure and related semiconductor structures
US10734244B2 (en)2017-11-162020-08-04Asm Ip Holding B.V.Method of processing a substrate and a device manufactured by the same
US10910262B2 (en)2017-11-162021-02-02Asm Ip Holding B.V.Method of selectively depositing a capping layer structure on a semiconductor device structure
US11022879B2 (en)2017-11-242021-06-01Asm Ip Holding B.V.Method of forming an enhanced unexposed photoresist layer
US11639811B2 (en)2017-11-272023-05-02Asm Ip Holding B.V.Apparatus including a clean mini environment
US11127617B2 (en)2017-11-272021-09-21Asm Ip Holding B.V.Storage device for storing wafer cassettes for use with a batch furnace
US11682572B2 (en)2017-11-272023-06-20Asm Ip Holdings B.V.Storage device for storing wafer cassettes for use with a batch furnace
US10290508B1 (en)2017-12-052019-05-14Asm Ip Holding B.V.Method for forming vertical spacers for spacer-defined patterning
US10872771B2 (en)2018-01-162020-12-22Asm Ip Holding B. V.Method for depositing a material film on a substrate within a reaction chamber by a cyclical deposition process and related device structures
US11501973B2 (en)2018-01-162022-11-15Asm Ip Holding B.V.Method for depositing a material film on a substrate within a reaction chamber by a cyclical deposition process and related device structures
US12119228B2 (en)2018-01-192024-10-15Asm Ip Holding B.V.Deposition method
US11972944B2 (en)2018-01-192024-04-30Asm Ip Holding B.V.Method for depositing a gap-fill layer by plasma-assisted deposition
US11482412B2 (en)2018-01-192022-10-25Asm Ip Holding B.V.Method for depositing a gap-fill layer by plasma-assisted deposition
US11393690B2 (en)2018-01-192022-07-19Asm Ip Holding B.V.Deposition method
USD903477S1 (en)2018-01-242020-12-01Asm Ip Holdings B.V.Metal clamp
US11018047B2 (en)2018-01-252021-05-25Asm Ip Holding B.V.Hybrid lift pin
USD880437S1 (en)2018-02-012020-04-07Asm Ip Holding B.V.Gas supply plate for semiconductor manufacturing apparatus
USD913980S1 (en)2018-02-012021-03-23Asm Ip Holding B.V.Gas supply plate for semiconductor manufacturing apparatus
US10535516B2 (en)2018-02-012020-01-14Asm Ip Holdings B.V.Method for depositing a semiconductor structure on a surface of a substrate and related semiconductor structures
US11735414B2 (en)2018-02-062023-08-22Asm Ip Holding B.V.Method of post-deposition treatment for silicon oxide film
US11081345B2 (en)2018-02-062021-08-03Asm Ip Holding B.V.Method of post-deposition treatment for silicon oxide film
US11685991B2 (en)2018-02-142023-06-27Asm Ip Holding B.V.Method for depositing a ruthenium-containing film on a substrate by a cyclical deposition process
US10896820B2 (en)2018-02-142021-01-19Asm Ip Holding B.V.Method for depositing a ruthenium-containing film on a substrate by a cyclical deposition process
US11387106B2 (en)2018-02-142022-07-12Asm Ip Holding B.V.Method for depositing a ruthenium-containing film on a substrate by a cyclical deposition process
US12173402B2 (en)2018-02-152024-12-24Asm Ip Holding B.V.Method of forming a transition metal containing film on a substrate by a cyclical deposition process, a method for supplying a transition metal halide compound to a reaction chamber, and related vapor deposition apparatus
US10731249B2 (en)2018-02-152020-08-04Asm Ip Holding B.V.Method of forming a transition metal containing film on a substrate by a cyclical deposition process, a method for supplying a transition metal halide compound to a reaction chamber, and related vapor deposition apparatus
US11482418B2 (en)2018-02-202022-10-25Asm Ip Holding B.V.Substrate processing method and apparatus
US10658181B2 (en)2018-02-202020-05-19Asm Ip Holding B.V.Method of spacer-defined direct patterning in semiconductor fabrication
US10975470B2 (en)2018-02-232021-04-13Asm Ip Holding B.V.Apparatus for detecting or monitoring for a chemical precursor in a high temperature environment
US11939673B2 (en)2018-02-232024-03-26Asm Ip Holding B.V.Apparatus for detecting or monitoring for a chemical precursor in a high temperature environment
US11473195B2 (en)2018-03-012022-10-18Asm Ip Holding B.V.Semiconductor processing apparatus and a method for processing a substrate
US11629406B2 (en)2018-03-092023-04-18Asm Ip Holding B.V.Semiconductor processing apparatus comprising one or more pyrometers for measuring a temperature of a substrate during transfer of the substrate
US11114283B2 (en)2018-03-162021-09-07Asm Ip Holding B.V.Reactor, system including the reactor, and methods of manufacturing and using same
US10847371B2 (en)2018-03-272020-11-24Asm Ip Holding B.V.Method of forming an electrode on a substrate and a semiconductor device structure including an electrode
US12020938B2 (en)2018-03-272024-06-25Asm Ip Holding B.V.Method of forming an electrode on a substrate and a semiconductor device structure including an electrode
US11398382B2 (en)2018-03-272022-07-26Asm Ip Holding B.V.Method of forming an electrode on a substrate and a semiconductor device structure including an electrode
US11088002B2 (en)2018-03-292021-08-10Asm Ip Holding B.V.Substrate rack and a substrate processing system and method
US10510536B2 (en)2018-03-292019-12-17Asm Ip Holding B.V.Method of depositing a co-doped polysilicon film on a surface of a substrate within a reaction chamber
US11230766B2 (en)2018-03-292022-01-25Asm Ip Holding B.V.Substrate processing apparatus and method
US10867786B2 (en)2018-03-302020-12-15Asm Ip Holding B.V.Substrate processing method
US12230531B2 (en)2018-04-092025-02-18Asm Ip Holding B.V.Substrate supporting apparatus, substrate processing apparatus including the same, and substrate processing method
US11469098B2 (en)2018-05-082022-10-11Asm Ip Holding B.V.Methods for depositing an oxide film on a substrate by a cyclical deposition process and related device structures
US12025484B2 (en)2018-05-082024-07-02Asm Ip Holding B.V.Thin film forming method
US12272527B2 (en)2018-05-092025-04-08Asm Ip Holding B.V.Apparatus for use with hydrogen radicals and method of using same
US11056567B2 (en)2018-05-112021-07-06Asm Ip Holding B.V.Method of forming a doped metal carbide film on a substrate and related semiconductor device structures
US11361990B2 (en)2018-05-282022-06-14Asm Ip Holding B.V.Substrate processing method and device manufactured by using the same
US11908733B2 (en)2018-05-282024-02-20Asm Ip Holding B.V.Substrate processing method and device manufactured by using the same
US11270899B2 (en)2018-06-042022-03-08Asm Ip Holding B.V.Wafer handling chamber with moisture reduction
US11718913B2 (en)2018-06-042023-08-08Asm Ip Holding B.V.Gas distribution system and reactor system including same
US11837483B2 (en)2018-06-042023-12-05Asm Ip Holding B.V.Wafer handling chamber with moisture reduction
US11286562B2 (en)2018-06-082022-03-29Asm Ip Holding B.V.Gas-phase chemical reactor and method of using same
US11296189B2 (en)2018-06-212022-04-05Asm Ip Holding B.V.Method for depositing a phosphorus doped silicon arsenide film and related semiconductor device structures
US11530483B2 (en)2018-06-212022-12-20Asm Ip Holding B.V.Substrate processing system
US10797133B2 (en)2018-06-212020-10-06Asm Ip Holding B.V.Method for depositing a phosphorus doped silicon arsenide film and related semiconductor device structures
US11952658B2 (en)2018-06-272024-04-09Asm Ip Holding B.V.Cyclic deposition methods for forming metal-containing material and films and structures including the metal-containing material
US11814715B2 (en)2018-06-272023-11-14Asm Ip Holding B.V.Cyclic deposition methods for forming metal-containing material and films and structures including the metal-containing material
US11492703B2 (en)2018-06-272022-11-08Asm Ip Holding B.V.Cyclic deposition methods for forming metal-containing material and films and structures including the metal-containing material
US11499222B2 (en)2018-06-272022-11-15Asm Ip Holding B.V.Cyclic deposition methods for forming metal-containing material and films and structures including the metal-containing material
US10612136B2 (en)2018-06-292020-04-07ASM IP Holding, B.V.Temperature-controlled flange and reactor system including same
US10914004B2 (en)2018-06-292021-02-09Asm Ip Holding B.V.Thin-film deposition method and manufacturing method of semiconductor device
US11168395B2 (en)2018-06-292021-11-09Asm Ip Holding B.V.Temperature-controlled flange and reactor system including same
US11923190B2 (en)2018-07-032024-03-05Asm Ip Holding B.V.Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition
US10755922B2 (en)2018-07-032020-08-25Asm Ip Holding B.V.Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition
US10755923B2 (en)2018-07-032020-08-25Asm Ip Holding B.V.Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition
US10388513B1 (en)2018-07-032019-08-20Asm Ip Holding B.V.Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition
US11646197B2 (en)2018-07-032023-05-09Asm Ip Holding B.V.Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition
US10767789B2 (en)2018-07-162020-09-08Asm Ip Holding B.V.Diaphragm valves, valve components, and methods for forming valve components
US10483099B1 (en)2018-07-262019-11-19Asm Ip Holding B.V.Method for forming thermally stable organosilicon polymer film
US11053591B2 (en)2018-08-062021-07-06Asm Ip Holding B.V.Multi-port gas injection system and reactor system including same
US10883175B2 (en)2018-08-092021-01-05Asm Ip Holding B.V.Vertical furnace for processing substrates and a liner for use therein
US10829852B2 (en)2018-08-162020-11-10Asm Ip Holding B.V.Gas distribution device for a wafer processing apparatus
US11430674B2 (en)2018-08-222022-08-30Asm Ip Holding B.V.Sensor array, apparatus for dispensing a vapor phase reactant to a reaction chamber and related methods
US11804388B2 (en)2018-09-112023-10-31Asm Ip Holding B.V.Substrate processing apparatus and method
US11024523B2 (en)2018-09-112021-06-01Asm Ip Holding B.V.Substrate processing apparatus and method
US11274369B2 (en)2018-09-112022-03-15Asm Ip Holding B.V.Thin film deposition method
US11049751B2 (en)2018-09-142021-06-29Asm Ip Holding B.V.Cassette supply system to store and handle cassettes and processing apparatus equipped therewith
US11885023B2 (en)2018-10-012024-01-30Asm Ip Holding B.V.Substrate retaining apparatus, system including the apparatus, and method of using same
US11232963B2 (en)2018-10-032022-01-25Asm Ip Holding B.V.Substrate processing apparatus and method
US11414760B2 (en)2018-10-082022-08-16Asm Ip Holding B.V.Substrate support unit, thin film deposition apparatus including the same, and substrate processing apparatus including the same
US10847365B2 (en)2018-10-112020-11-24Asm Ip Holding B.V.Method of forming conformal silicon carbide film by cyclic CVD
US10811256B2 (en)2018-10-162020-10-20Asm Ip Holding B.V.Method for etching a carbon-containing feature
US11251068B2 (en)2018-10-192022-02-15Asm Ip Holding B.V.Substrate processing apparatus and substrate processing method
US11664199B2 (en)2018-10-192023-05-30Asm Ip Holding B.V.Substrate processing apparatus and substrate processing method
USD948463S1 (en)2018-10-242022-04-12Asm Ip Holding B.V.Susceptor for semiconductor substrate supporting apparatus
US10381219B1 (en)2018-10-252019-08-13Asm Ip Holding B.V.Methods for forming a silicon nitride film
US12378665B2 (en)2018-10-262025-08-05Asm Ip Holding B.V.High temperature coatings for a preclean and etch apparatus and related methods
US11087997B2 (en)2018-10-312021-08-10Asm Ip Holding B.V.Substrate processing apparatus for processing substrates
US11735445B2 (en)2018-10-312023-08-22Asm Ip Holding B.V.Substrate processing apparatus for processing substrates
US11499226B2 (en)2018-11-022022-11-15Asm Ip Holding B.V.Substrate supporting unit and a substrate processing device including the same
US11866823B2 (en)2018-11-022024-01-09Asm Ip Holding B.V.Substrate supporting unit and a substrate processing device including the same
US11572620B2 (en)2018-11-062023-02-07Asm Ip Holding B.V.Methods for selectively depositing an amorphous silicon film on a substrate
US11031242B2 (en)2018-11-072021-06-08Asm Ip Holding B.V.Methods for depositing a boron doped silicon germanium film
US10818758B2 (en)2018-11-162020-10-27Asm Ip Holding B.V.Methods for forming a metal silicate film on a substrate in a reaction chamber and related semiconductor device structures
US11411088B2 (en)2018-11-162022-08-09Asm Ip Holding B.V.Methods for forming a metal silicate film on a substrate in a reaction chamber and related semiconductor device structures
US11798999B2 (en)2018-11-162023-10-24Asm Ip Holding B.V.Methods for forming a metal silicate film on a substrate in a reaction chamber and related semiconductor device structures
US10847366B2 (en)2018-11-162020-11-24Asm Ip Holding B.V.Methods for depositing a transition metal chalcogenide film on a substrate by a cyclical deposition process
US11244825B2 (en)2018-11-162022-02-08Asm Ip Holding B.V.Methods for depositing a transition metal chalcogenide film on a substrate by a cyclical deposition process
US10559458B1 (en)2018-11-262020-02-11Asm Ip Holding B.V.Method of forming oxynitride film
US12040199B2 (en)2018-11-282024-07-16Asm Ip Holding B.V.Substrate processing apparatus for processing substrates
US11217444B2 (en)2018-11-302022-01-04Asm Ip Holding B.V.Method for forming an ultraviolet radiation responsive metal oxide-containing film
US11488819B2 (en)2018-12-042022-11-01Asm Ip Holding B.V.Method of cleaning substrate processing apparatus
US11158513B2 (en)2018-12-132021-10-26Asm Ip Holding B.V.Methods for forming a rhenium-containing film on a substrate by a cyclical deposition process and related semiconductor device structures
US11769670B2 (en)2018-12-132023-09-26Asm Ip Holding B.V.Methods for forming a rhenium-containing film on a substrate by a cyclical deposition process and related semiconductor device structures
US11658029B2 (en)2018-12-142023-05-23Asm Ip Holding B.V.Method of forming a device structure using selective deposition of gallium nitride and system for same
US11390946B2 (en)2019-01-172022-07-19Asm Ip Holding B.V.Methods of forming a transition metal containing film on a substrate by a cyclical deposition process
US11959171B2 (en)2019-01-172024-04-16Asm Ip Holding B.V.Methods of forming a transition metal containing film on a substrate by a cyclical deposition process
US11171025B2 (en)2019-01-222021-11-09Asm Ip Holding B.V.Substrate processing device
US11127589B2 (en)2019-02-012021-09-21Asm Ip Holding B.V.Method of topology-selective film formation of silicon oxide
US11342216B2 (en)2019-02-202022-05-24Asm Ip Holding B.V.Cyclical deposition method and apparatus for filling a recess formed within a substrate surface
US11227789B2 (en)2019-02-202022-01-18Asm Ip Holding B.V.Method and apparatus for filling a recess formed within a substrate surface
US11251040B2 (en)2019-02-202022-02-15Asm Ip Holding B.V.Cyclical deposition method including treatment step and apparatus for same
US11615980B2 (en)2019-02-202023-03-28Asm Ip Holding B.V.Method and apparatus for filling a recess formed within a substrate surface
US11798834B2 (en)2019-02-202023-10-24Asm Ip Holding B.V.Cyclical deposition method and apparatus for filling a recess formed within a substrate surface
US11482533B2 (en)2019-02-202022-10-25Asm Ip Holding B.V.Apparatus and methods for plug fill deposition in 3-D NAND applications
US12176243B2 (en)2019-02-202024-12-24Asm Ip Holding B.V.Method and apparatus for filling a recess formed within a substrate surface
US11629407B2 (en)2019-02-222023-04-18Asm Ip Holding B.V.Substrate processing apparatus and method for processing substrates
US12410522B2 (en)2019-02-222025-09-09Asm Ip Holding B.V.Substrate processing apparatus and method for processing substrates
US11424119B2 (en)2019-03-082022-08-23Asm Ip Holding B.V.Method for selective deposition of silicon nitride layer and structure including selectively-deposited silicon nitride layer
US11114294B2 (en)2019-03-082021-09-07Asm Ip Holding B.V.Structure including SiOC layer and method of forming same
US11901175B2 (en)2019-03-082024-02-13Asm Ip Holding B.V.Method for selective deposition of silicon nitride layer and structure including selectively-deposited silicon nitride layer
US11742198B2 (en)2019-03-082023-08-29Asm Ip Holding B.V.Structure including SiOCN layer and method of forming same
US11378337B2 (en)2019-03-282022-07-05Asm Ip Holding B.V.Door opener and substrate processing apparatus provided therewith
US11551925B2 (en)2019-04-012023-01-10Asm Ip Holding B.V.Method for manufacturing a semiconductor device
US11447864B2 (en)2019-04-192022-09-20Asm Ip Holding B.V.Layer forming method and apparatus
US11814747B2 (en)2019-04-242023-11-14Asm Ip Holding B.V.Gas-phase reactor system-with a reaction chamber, a solid precursor source vessel, a gas distribution system, and a flange assembly
US11289326B2 (en)2019-05-072022-03-29Asm Ip Holding B.V.Method for reforming amorphous carbon polymer film
US11781221B2 (en)2019-05-072023-10-10Asm Ip Holding B.V.Chemical source vessel with dip tube
US11355338B2 (en)2019-05-102022-06-07Asm Ip Holding B.V.Method of depositing material onto a surface and structure formed according to the method
US11515188B2 (en)2019-05-162022-11-29Asm Ip Holding B.V.Wafer boat handling device, vertical batch furnace and method
US11996309B2 (en)2019-05-162024-05-28Asm Ip Holding B.V.Wafer boat handling device, vertical batch furnace and method
USD975665S1 (en)2019-05-172023-01-17Asm Ip Holding B.V.Susceptor shaft
USD947913S1 (en)2019-05-172022-04-05Asm Ip Holding B.V.Susceptor shaft
USD935572S1 (en)2019-05-242021-11-09Asm Ip Holding B.V.Gas channel plate
USD922229S1 (en)2019-06-052021-06-15Asm Ip Holding B.V.Device for controlling a temperature of a gas supply unit
US11345999B2 (en)2019-06-062022-05-31Asm Ip Holding B.V.Method of using a gas-phase reactor system including analyzing exhausted gas
US12195855B2 (en)2019-06-062025-01-14Asm Ip Holding B.V.Gas-phase reactor system including a gas detector
US12252785B2 (en)2019-06-102025-03-18Asm Ip Holding B.V.Method for cleaning quartz epitaxial chambers
US11908684B2 (en)2019-06-112024-02-20Asm Ip Holding B.V.Method of forming an electronic structure using reforming gas, system for performing the method, and structure formed using the method
US11476109B2 (en)2019-06-112022-10-18Asm Ip Holding B.V.Method of forming an electronic structure using reforming gas, system for performing the method, and structure formed using the method
USD944946S1 (en)2019-06-142022-03-01Asm Ip Holding B.V.Shower plate
USD931978S1 (en)2019-06-272021-09-28Asm Ip Holding B.V.Showerhead vacuum transport
US11390945B2 (en)2019-07-032022-07-19Asm Ip Holding B.V.Temperature control assembly for substrate processing apparatus and method of using same
US11746414B2 (en)2019-07-032023-09-05Asm Ip Holding B.V.Temperature control assembly for substrate processing apparatus and method of using same
US11605528B2 (en)2019-07-092023-03-14Asm Ip Holding B.V.Plasma device using coaxial waveguide, and substrate treatment method
US11664267B2 (en)2019-07-102023-05-30Asm Ip Holding B.V.Substrate support assembly and substrate processing device including the same
US12107000B2 (en)2019-07-102024-10-01Asm Ip Holding B.V.Substrate support assembly and substrate processing device including the same
US11664245B2 (en)2019-07-162023-05-30Asm Ip Holding B.V.Substrate processing device
US11996304B2 (en)2019-07-162024-05-28Asm Ip Holding B.V.Substrate processing device
US11688603B2 (en)2019-07-172023-06-27Asm Ip Holding B.V.Methods of forming silicon germanium structures
US11615970B2 (en)2019-07-172023-03-28Asm Ip Holding B.V.Radical assist ignition plasma system and method
US12129548B2 (en)2019-07-182024-10-29Asm Ip Holding B.V.Method of forming structures using a neutral beam
US11643724B2 (en)2019-07-182023-05-09Asm Ip Holding B.V.Method of forming structures using a neutral beam
US12112940B2 (en)2019-07-192024-10-08Asm Ip Holding B.V.Method of forming topology-controlled amorphous carbon polymer film
US11282698B2 (en)2019-07-192022-03-22Asm Ip Holding B.V.Method of forming topology-controlled amorphous carbon polymer film
US11557474B2 (en)2019-07-292023-01-17Asm Ip Holding B.V.Methods for selective deposition utilizing n-type dopants and/or alternative dopants to achieve high dopant incorporation
US11430640B2 (en)2019-07-302022-08-30Asm Ip Holding B.V.Substrate processing apparatus
US11443926B2 (en)2019-07-302022-09-13Asm Ip Holding B.V.Substrate processing apparatus
US12169361B2 (en)2019-07-302024-12-17Asm Ip Holding B.V.Substrate processing apparatus and method
US11876008B2 (en)2019-07-312024-01-16Asm Ip Holding B.V.Vertical batch furnace assembly
US11227782B2 (en)2019-07-312022-01-18Asm Ip Holding B.V.Vertical batch furnace assembly
US11587814B2 (en)2019-07-312023-02-21Asm Ip Holding B.V.Vertical batch furnace assembly
US11587815B2 (en)2019-07-312023-02-21Asm Ip Holding B.V.Vertical batch furnace assembly
US11680839B2 (en)2019-08-052023-06-20Asm Ip Holding B.V.Liquid level sensor for a chemical source vessel
US12247286B2 (en)2019-08-092025-03-11Asm Ip Holding B.V.Heater assembly including cooling apparatus and method of using same
USD965524S1 (en)2019-08-192022-10-04Asm Ip Holding B.V.Susceptor support
USD965044S1 (en)2019-08-192022-09-27Asm Ip Holding B.V.Susceptor shaft
US11639548B2 (en)2019-08-212023-05-02Asm Ip Holding B.V.Film-forming material mixed-gas forming device and film forming device
USD979506S1 (en)2019-08-222023-02-28Asm Ip Holding B.V.Insulator
USD949319S1 (en)2019-08-222022-04-19Asm Ip Holding B.V.Exhaust duct
US12040229B2 (en)2019-08-222024-07-16Asm Ip Holding B.V.Method for forming a structure with a hole
USD930782S1 (en)2019-08-222021-09-14Asm Ip Holding B.V.Gas distributor
US11594450B2 (en)2019-08-222023-02-28Asm Ip Holding B.V.Method for forming a structure with a hole
USD940837S1 (en)2019-08-222022-01-11Asm Ip Holding B.V.Electrode
US11527400B2 (en)2019-08-232022-12-13Asm Ip Holding B.V.Method for depositing silicon oxide film having improved quality by peald using bis(diethylamino)silane
US11898242B2 (en)2019-08-232024-02-13Asm Ip Holding B.V.Methods for forming a polycrystalline molybdenum film over a surface of a substrate and related structures including a polycrystalline molybdenum film
US11286558B2 (en)2019-08-232022-03-29Asm Ip Holding B.V.Methods for depositing a molybdenum nitride film on a surface of a substrate by a cyclical deposition process and related semiconductor device structures including a molybdenum nitride film
US12033849B2 (en)2019-08-232024-07-09Asm Ip Holding B.V.Method for depositing silicon oxide film having improved quality by PEALD using bis(diethylamino)silane
US11827978B2 (en)2019-08-232023-11-28Asm Ip Holding B.V.Methods for depositing a molybdenum nitride film on a surface of a substrate by a cyclical deposition process and related semiconductor device structures including a molybdenum nitride film
CN110411600A (zh)*2019-08-282019-11-05清河县华源精密仪表厂一种profile热电偶
US11495459B2 (en)2019-09-042022-11-08Asm Ip Holding B.V.Methods for selective deposition using a sacrificial capping layer
US11823876B2 (en)2019-09-052023-11-21Asm Ip Holding B.V.Substrate processing apparatus
US11562901B2 (en)2019-09-252023-01-24Asm Ip Holding B.V.Substrate processing method
US11610774B2 (en)2019-10-022023-03-21Asm Ip Holding B.V.Methods for forming a topographically selective silicon oxide film by a cyclical plasma-enhanced deposition process
US12230497B2 (en)2019-10-022025-02-18Asm Ip Holding B.V.Methods for forming a topographically selective silicon oxide film by a cyclical plasma-enhanced deposition process
US11339476B2 (en)2019-10-082022-05-24Asm Ip Holding B.V.Substrate processing device having connection plates, substrate processing method
US12428726B2 (en)2019-10-082025-09-30Asm Ip Holding B.V.Gas injection system and reactor system including same
US12006572B2 (en)2019-10-082024-06-11Asm Ip Holding B.V.Reactor system including a gas distribution assembly for use with activated species and method of using same
US11735422B2 (en)2019-10-102023-08-22Asm Ip Holding B.V.Method of forming a photoresist underlayer and structure including same
US12009241B2 (en)2019-10-142024-06-11Asm Ip Holding B.V.Vertical batch furnace assembly with detector to detect cassette
US11637011B2 (en)2019-10-162023-04-25Asm Ip Holding B.V.Method of topology-selective film formation of silicon oxide
US11637014B2 (en)2019-10-172023-04-25Asm Ip Holding B.V.Methods for selective deposition of doped semiconductor material
US11315794B2 (en)2019-10-212022-04-26Asm Ip Holding B.V.Apparatus and methods for selectively etching films
US11996292B2 (en)2019-10-252024-05-28Asm Ip Holding B.V.Methods for filling a gap feature on a substrate surface and related semiconductor structures
US11646205B2 (en)2019-10-292023-05-09Asm Ip Holding B.V.Methods of selectively forming n-type doped material on a surface, systems for selectively forming n-type doped material, and structures formed using same
US12266695B2 (en)2019-11-052025-04-01Asm Ip Holding B.V.Structures with doped semiconductor layers and methods and systems for forming same
US11501968B2 (en)2019-11-152022-11-15Asm Ip Holding B.V.Method for providing a semiconductor device with silicon filled gaps
US11626316B2 (en)2019-11-202023-04-11Asm Ip Holding B.V.Method of depositing carbon-containing material on a surface of a substrate, structure formed using the method, and system for forming the structure
US11915929B2 (en)2019-11-262024-02-27Asm Ip Holding B.V.Methods for selectively forming a target film on a substrate comprising a first dielectric surface and a second metallic surface
US11401605B2 (en)2019-11-262022-08-02Asm Ip Holding B.V.Substrate processing apparatus
US11923181B2 (en)2019-11-292024-03-05Asm Ip Holding B.V.Substrate processing apparatus for minimizing the effect of a filling gas during substrate processing
US11646184B2 (en)2019-11-292023-05-09Asm Ip Holding B.V.Substrate processing apparatus
US11929251B2 (en)2019-12-022024-03-12Asm Ip Holding B.V.Substrate processing apparatus having electrostatic chuck and substrate processing method
US11840761B2 (en)2019-12-042023-12-12Asm Ip Holding B.V.Substrate processing apparatus
US11885013B2 (en)2019-12-172024-01-30Asm Ip Holding B.V.Method of forming vanadium nitride layer and structure including the vanadium nitride layer
US12119220B2 (en)2019-12-192024-10-15Asm Ip Holding B.V.Methods for filling a gap feature on a substrate surface and related semiconductor structures
US11527403B2 (en)2019-12-192022-12-13Asm Ip Holding B.V.Methods for filling a gap feature on a substrate surface and related semiconductor structures
US11976359B2 (en)2020-01-062024-05-07Asm Ip Holding B.V.Gas supply assembly, components thereof, and reactor system including same
US12033885B2 (en)2020-01-062024-07-09Asm Ip Holding B.V.Channeled lift pin
US11993847B2 (en)2020-01-082024-05-28Asm Ip Holding B.V.Injector
US12125700B2 (en)2020-01-162024-10-22Asm Ip Holding B.V.Method of forming high aspect ratio features
US11551912B2 (en)2020-01-202023-01-10Asm Ip Holding B.V.Method of forming thin film and method of modifying surface of thin film
US12410515B2 (en)2020-01-292025-09-09Asm Ip Holding B.V.Contaminant trap system for a reactor system
US11521851B2 (en)2020-02-032022-12-06Asm Ip Holding B.V.Method of forming structures including a vanadium or indium layer
US11828707B2 (en)2020-02-042023-11-28Asm Ip Holding B.V.Method and apparatus for transmittance measurements of large articles
US11776846B2 (en)2020-02-072023-10-03Asm Ip Holding B.V.Methods for depositing gap filling fluids and related systems and devices
US12218269B2 (en)2020-02-132025-02-04Asm Ip Holding B.V.Substrate processing apparatus including light receiving device and calibration method of light receiving device
US12431334B2 (en)2020-02-132025-09-30Asm Ip Holding B.V.Gas distribution assembly
US11781243B2 (en)2020-02-172023-10-10Asm Ip Holding B.V.Method for depositing low temperature phosphorous-doped silicon
US11986868B2 (en)2020-02-282024-05-21Asm Ip Holding B.V.System dedicated for parts cleaning
US12278129B2 (en)2020-03-042025-04-15Asm Ip Holding B.V.Alignment fixture for a reactor system
US11837494B2 (en)2020-03-112023-12-05Asm Ip Holding B.V.Substrate handling device with adjustable joints
US11876356B2 (en)2020-03-112024-01-16Asm Ip Holding B.V.Lockout tagout assembly and system and method of using same
US11488854B2 (en)2020-03-112022-11-01Asm Ip Holding B.V.Substrate handling device with adjustable joints
US11961741B2 (en)2020-03-122024-04-16Asm Ip Holding B.V.Method for fabricating layer structure having target topological profile
US12173404B2 (en)2020-03-172024-12-24Asm Ip Holding B.V.Method of depositing epitaxial material, structure formed using the method, and system for performing the method
US11823866B2 (en)2020-04-022023-11-21Asm Ip Holding B.V.Thin film forming method
US11830738B2 (en)2020-04-032023-11-28Asm Ip Holding B.V.Method for forming barrier layer and method for manufacturing semiconductor device
US11437241B2 (en)2020-04-082022-09-06Asm Ip Holding B.V.Apparatus and methods for selectively etching silicon oxide films
US11821078B2 (en)2020-04-152023-11-21Asm Ip Holding B.V.Method for forming precoat film and method for forming silicon-containing film
US12087586B2 (en)2020-04-152024-09-10Asm Ip Holding B.V.Method of forming chromium nitride layer and structure including the chromium nitride layer
US11996289B2 (en)2020-04-162024-05-28Asm Ip Holding B.V.Methods of forming structures including silicon germanium and silicon layers, devices formed using the methods, and systems for performing the methods
US12243742B2 (en)2020-04-212025-03-04Asm Ip Holding B.V.Method for processing a substrate
US12243747B2 (en)2020-04-242025-03-04Asm Ip Holding B.V.Methods of forming structures including vanadium boride and vanadium phosphide layers
US12221357B2 (en)2020-04-242025-02-11Asm Ip Holding B.V.Methods and apparatus for stabilizing vanadium compounds
US11898243B2 (en)2020-04-242024-02-13Asm Ip Holding B.V.Method of forming vanadium nitride-containing layer
US11530876B2 (en)2020-04-242022-12-20Asm Ip Holding B.V.Vertical batch furnace assembly comprising a cooling gas supply
US11887857B2 (en)2020-04-242024-01-30Asm Ip Holding B.V.Methods and systems for depositing a layer comprising vanadium, nitrogen, and a further element
US12130084B2 (en)2020-04-242024-10-29Asm Ip Holding B.V.Vertical batch furnace assembly comprising a cooling gas supply
US11959168B2 (en)2020-04-292024-04-16Asm Ip Holding B.V.Solid source precursor vessel
US11515187B2 (en)2020-05-012022-11-29Asm Ip Holding B.V.Fast FOUP swapping with a FOUP handler
US11798830B2 (en)2020-05-012023-10-24Asm Ip Holding B.V.Fast FOUP swapping with a FOUP handler
US11626308B2 (en)2020-05-132023-04-11Asm Ip Holding B.V.Laser alignment fixture for a reactor system
US12057314B2 (en)2020-05-152024-08-06Asm Ip Holding B.V.Methods for silicon germanium uniformity control using multiple precursors
US11804364B2 (en)2020-05-192023-10-31Asm Ip Holding B.V.Substrate processing apparatus
US11705333B2 (en)2020-05-212023-07-18Asm Ip Holding B.V.Structures including multiple carbon layers and methods of forming and using same
US12243757B2 (en)2020-05-212025-03-04Asm Ip Holding B.V.Flange and apparatus for processing substrates
US11987881B2 (en)2020-05-222024-05-21Asm Ip Holding B.V.Apparatus for depositing thin films using hydrogen peroxide
US12406846B2 (en)2020-05-262025-09-02Asm Ip Holding B.V.Method for depositing boron and gallium containing silicon germanium layers
US11767589B2 (en)2020-05-292023-09-26Asm Ip Holding B.V.Substrate processing device
US12106944B2 (en)2020-06-022024-10-01Asm Ip Holding B.V.Rotating substrate support
US12266524B2 (en)2020-06-162025-04-01Asm Ip Holding B.V.Method for depositing boron containing silicon germanium layers
US11646204B2 (en)2020-06-242023-05-09Asm Ip Holding B.V.Method for forming a layer provided with silicon
US11658035B2 (en)2020-06-302023-05-23Asm Ip Holding B.V.Substrate processing method
US12431354B2 (en)2020-07-012025-09-30Asm Ip Holding B.V.Silicon nitride and silicon oxide deposition methods using fluorine inhibitor
US12020934B2 (en)2020-07-082024-06-25Asm Ip Holding B.V.Substrate processing method
US11644758B2 (en)2020-07-172023-05-09Asm Ip Holding B.V.Structures and methods for use in photolithography
US12055863B2 (en)2020-07-172024-08-06Asm Ip Holding B.V.Structures and methods for use in photolithography
US11674220B2 (en)2020-07-202023-06-13Asm Ip Holding B.V.Method for depositing molybdenum layers using an underlayer
US12241158B2 (en)2020-07-202025-03-04Asm Ip Holding B.V.Method for forming structures including transition metal layers
US12322591B2 (en)2020-07-272025-06-03Asm Ip Holding B.V.Thin film deposition process
US12154824B2 (en)2020-08-142024-11-26Asm Ip Holding B.V.Substrate processing method
US12040177B2 (en)2020-08-182024-07-16Asm Ip Holding B.V.Methods for forming a laminate film by cyclical plasma-enhanced deposition processes
US12217954B2 (en)2020-08-252025-02-04Asm Ip Holding B.V.Method of cleaning a surface
US11725280B2 (en)2020-08-262023-08-15Asm Ip Holding B.V.Method for forming metal silicon oxide and metal silicon oxynitride layers
US12074022B2 (en)2020-08-272024-08-27Asm Ip Holding B.V.Method and system for forming patterned structures using multiple patterning process
US12211742B2 (en)2020-09-102025-01-28Asm Ip Holding B.V.Methods for depositing gap filling fluid
USD990534S1 (en)2020-09-112023-06-27Asm Ip Holding B.V.Weighted lift pin
US12148609B2 (en)2020-09-162024-11-19Asm Ip Holding B.V.Silicon oxide deposition method
USD1012873S1 (en)2020-09-242024-01-30Asm Ip Holding B.V.Electrode for semiconductor processing apparatus
US12218000B2 (en)2020-09-252025-02-04Asm Ip Holding B.V.Semiconductor processing method
US12009224B2 (en)2020-09-292024-06-11Asm Ip Holding B.V.Apparatus and method for etching metal nitrides
US12107005B2 (en)2020-10-062024-10-01Asm Ip Holding B.V.Deposition method and an apparatus for depositing a silicon-containing material
US12051567B2 (en)2020-10-072024-07-30Asm Ip Holding B.V.Gas supply unit and substrate processing apparatus including gas supply unit
US11827981B2 (en)2020-10-142023-11-28Asm Ip Holding B.V.Method of depositing material on stepped structure
US12217946B2 (en)2020-10-152025-02-04Asm Ip Holding B.V.Method of manufacturing semiconductor device, and substrate treatment apparatus using ether-CAT
US11873557B2 (en)2020-10-222024-01-16Asm Ip Holding B.V.Method of depositing vanadium metal
US11901179B2 (en)2020-10-282024-02-13Asm Ip Holding B.V.Method and device for depositing silicon onto substrates
US12209308B2 (en)2020-11-122025-01-28Asm Ip Holding B.V.Reactor and related methods
US12195852B2 (en)2020-11-232025-01-14Asm Ip Holding B.V.Substrate processing apparatus with an injector
US12027365B2 (en)2020-11-242024-07-02Asm Ip Holding B.V.Methods for filling a gap and related systems and devices
US11891696B2 (en)2020-11-302024-02-06Asm Ip Holding B.V.Injector configured for arrangement within a reaction chamber of a substrate processing apparatus
US12255053B2 (en)2020-12-102025-03-18Asm Ip Holding B.V.Methods and systems for depositing a layer
US12159788B2 (en)2020-12-142024-12-03Asm Ip Holding B.V.Method of forming structures for threshold voltage control
US11946137B2 (en)2020-12-162024-04-02Asm Ip Holding B.V.Runout and wobble measurement fixtures
US12288710B2 (en)2020-12-182025-04-29Asm Ip Holding B.V.Wafer processing apparatus with a rotatable table
US11885020B2 (en)2020-12-222024-01-30Asm Ip Holding B.V.Transition metal deposition method
US12131885B2 (en)2020-12-222024-10-29Asm Ip Holding B.V.Plasma treatment device having matching box
US12129545B2 (en)2020-12-222024-10-29Asm Ip Holding B.V.Precursor capsule, a vessel and a method
US12442082B2 (en)2021-05-042025-10-14Asm Ip Holding B.V.Reactor system comprising a tuning circuit
USD980813S1 (en)2021-05-112023-03-14Asm Ip Holding B.V.Gas flow control plate for substrate processing apparatus
USD980814S1 (en)2021-05-112023-03-14Asm Ip Holding B.V.Gas distributor for substrate processing apparatus
USD981973S1 (en)2021-05-112023-03-28Asm Ip Holding B.V.Reactor wall for substrate processing apparatus
USD990441S1 (en)2021-09-072023-06-27Asm Ip Holding B.V.Gas flow control plate
USD1060598S1 (en)2021-12-032025-02-04Asm Ip Holding B.V.Split showerhead cover
US12444599B2 (en)2021-12-082025-10-14Asm Ip Holding B.V.Method for forming an ultraviolet radiation responsive metal oxide-containing film

Similar Documents

PublicationPublication DateTitle
JPH11183264A (ja)熱電対をもつ温度測定器
US3232794A (en)Thermocouple probe
US5863123A (en)Profile thermocouple of a transverse-type diffusion furnace
US5711608A (en)Thermocouple assemblies
JPH10153494A (ja)熱電対
JPH0364810B2 (ja)
US4499330A (en)Anti-vibration support for thermocouple tip
EP0329323A2 (en)Thermocouples
EP2068137A2 (en)Temperature sensor
US7771116B2 (en)Ceramic thermocouple
US3024295A (en)Immersion pyrometer with non-directional contact structure
JP2018100965A (ja)高温排出センサ
JP2018036188A (ja)温度センサ
JPH02183127A (ja)サーモカツプル装置およびその製造方法
JPH0797049B2 (ja)温度センサの製造方法
CN106482854B (zh)一种细丝热电偶保护装置
JP2024008126A (ja)熱電対
JP2576678Y2 (ja)耐熱用熱電対
JPH01233332A (ja)熱電対
JP3350190B2 (ja)熱電対装置
CN219087722U (zh)热电偶
JPH06160200A (ja)気密端子付シース型熱電対
JPS5848825A (ja)耐熱用熱電対中継コネクタ
JPH01233331A (ja)シース熱電対
JPH11223560A (ja)白金系熱電対

Legal Events

DateCodeTitleDescription
A621Written request for application examination

Free format text:JAPANESE INTERMEDIATE CODE: A621

Effective date:20040426

A977Report on retrieval

Free format text:JAPANESE INTERMEDIATE CODE: A971007

Effective date:20050519

A131Notification of reasons for refusal

Free format text:JAPANESE INTERMEDIATE CODE: A131

Effective date:20050524

A02Decision of refusal

Effective date:20050927

Free format text:JAPANESE INTERMEDIATE CODE: A02


[8]ページ先頭

©2009-2025 Movatter.jp