JPH05173065A - Reduction projection lens - Google Patents

Abstract

PURPOSE:To obtain a reduction projection lens using short wavelength light as a light source and having high resolution and wide focal depth by setting up its incident iris position on a position comparatively far from an object face in order to reduce image distortion. CONSTITUTION:The reduction projection lens is constituted of the 1st lens group I including a pair of meniscus lenses whose concaves are mutually opposed, the 2nd lens group II having positive refractive power and constituted of at least two lenses and the 3rd lens group III having positive refractive power and satisfies the conditions of the shown inequalities, provided that E is an incident iris position measured from the 1st face of the lens system, L is a distance between object images and F1 is the focal distance of the 1st lens group.

Description

Translated fromJapanese

【発明の詳細な説明】Detailed Description of the Invention

【０００１】[0001]

【産業上の利用分野】本発明は、投影露光法によってＩ
Ｃ等の集積回路パターン等を描いたマスク等から半導体
ウエーハ上に回路パターン等を転写する際に用いられる
縮小投影レンズに関するものである。BACKGROUND OF THE INVENTION The present invention is based on the projection exposure method.
The present invention relates to a reduction projection lens used when a circuit pattern or the like is transferred onto a semiconductor wafer from a mask or the like on which an integrated circuit pattern or the like such as C is drawn.

【０００２】[0002]

【従来の技術】今日、集積回路等の集積度が上がるにつ
れて、より微細な回路パターンを形成する必要が生じて
いる。このため、高い解像力を得るのにレンズ系のＮＡ
（開口数）を上げるのが一般的方法である。以前は、こ
の方法により高ＮＡ化が行われてきたが、近年では、あ
まりに高ＮＡでは、焦点深度が浅くなり、オートフォー
カスの要求精度が非常に厳しくなったり、半導体ウェー
ハの反り等によって不都合が生じるため、実用的にＮＡ
は０．５前後が最適である。そこで、使用波長の短波長
化に力点が移されてきた。例えば、ｇ線（４３６ｎｍ）
からｉ線（３６５ｎｍ）を使用するレンズ系が発明さ
れ、今後はＫｒＦエキシマレーザ（２４８ｎｍ）を光源
とするレンズ系が主流となると言われているし、特許出
願が盛んに行われている。2. Description of the Related Art Today, as the degree of integration of integrated circuits and the like increases, it becomes necessary to form finer circuit patterns. Therefore, the NA of the lens system is required to obtain high resolution.
It is a general method to raise (numerical aperture). In the past, this method was used to increase the NA, but in recent years, when the NA is too high, the depth of focus becomes shallow, the precision required for autofocus becomes extremely strict, and the semiconductor wafer is warped. Because it occurs, NA is practical
Is optimally around 0.5. Therefore, emphasis has been placed on shortening the wavelength used. For example, g line (436nm)
Therefore, a lens system using the i-line (365 nm) has been invented, and it is said that a lens system using a KrF excimer laser (248 nm) as a light source will become the mainstream in the future, and patent applications have been actively made.

【０００３】一方、回路パターンが微細になればなるほ
ど、回路パターンの歪みもより少ないレンズ系が要求さ
れてきている。しかし、いくらレンズ系の歪みが少なく
ても、露光する半導体ウェーハ基板の平面度を厳しく抑
えないと、ウェーハ基板等の反りによる像の歪みが発生
してしまう。そのために、像側の射出瞳位置を無限遠に
した像側テレセントリック光学系にすることが行われて
いた。On the other hand, as the circuit pattern becomes finer, a lens system with less distortion of the circuit pattern is required. However, no matter how small the distortion of the lens system is, if the flatness of the semiconductor wafer substrate to be exposed is not strictly suppressed, the image distortion will occur due to the warp of the wafer substrate or the like. Therefore, an image-side telecentric optical system has been used in which the position of the exit pupil on the image side is set to infinity.

【０００４】なお、公知の縮小投影露光レンズとしは、
特開昭６３−１５５０１４号、特開昭６０−１４０３１
０号、特開昭６３−１２１８１０号、特開昭６３−１１
８１１５号等のものがある。また、本出願人が出願した
特願平２−２８３８２７号等のものがある。As a known reduction projection exposure lens,
JP-A-63-155014, JP-A-60-14031
No. 0, JP-A-63-121810, JP-A-63-11
There are things such as 8115. In addition, there are Japanese Patent Application No. 2-283827 and the like filed by the applicant.

【０００５】[0005]

【発明が解決しようとする課題】しかしながら、上記の
ような従来の縮小投影法に使用される縮小投影レンズに
は、２４８ｎｍ等の短波長光を光源として、投影レンズ
の射出側のみならず、入射側の入射瞳位置も像面から比
較的遠くにあり、物体面の平面度が悪くても像の歪みが
小さくてすむ高解像力で焦点深度の広い縮小投影レンズ
は存在しなかった。However, the reduction projection lens used in the conventional reduction projection method as described above uses short wavelength light such as 248 nm as a light source, not only on the exit side of the projection lens but also on the incident side. The entrance pupil position on the side is also relatively far from the image plane, and there was no reduction projection lens with a high resolution and a wide depth of focus that can reduce image distortion even if the object plane has poor flatness.

【０００６】本発明はこのような状況に鑑みてなされた
ものであり、その目的は、この像歪みを小さくするため
に、縮小投影レンズの入射瞳位置が物体面から比較的遠
くにあり、短波長光を光源とする高解像力で焦点深度の
広い縮小投影レンズを提供することである。The present invention has been made in view of such a situation, and an object thereof is to reduce the image distortion, because the position of the entrance pupil of the reduction projection lens is relatively far from the object plane and is short. It is an object of the present invention to provide a reduction projection lens which uses a wavelength light as a light source and has a high resolution and a wide depth of focus.

【０００７】[0007]

【課題を解決するための手段】上記目的を達成する本発
明の縮小投影レンズは、物体側より順に、互いに凹面を
向かい合わせた一対のメニスカスレンズを含んでなる第
１レンズ群、正の屈折力を持ち少なくとも２枚のレンズ
により構成された第２レンズ群、正の屈折力を持った第
３レンズ群より構成され、レンズ系の第１面より測った
入射瞳位置をＥ、物像間距離をＬ、第１レンズ群の焦点
距離をＦ₁とするとき、 ０．５＜｜Ｅ／Ｌ｜ ０．２＜｜Ｆ₁／Ｌ｜ なる条件を満足することを特徴とするものである。A reduction projection lens of the present invention which achieves the above object has a first lens group including a pair of meniscus lenses whose concave surfaces face each other in order from the object side, a positive refractive power. And a third lens group having a positive refracting power and having an entrance pupil position E measured from the first surface of the lens system, and an object-image distance Is L and the focal length of the first lens unit is F₁ , the condition of 0.5 <| E / L | 0.2 <| F₁ / L | is satisfied.

【０００８】この場合、第２レンズ群の焦点距離をＦ₂
とするとき、 ０．１＜｜Ｆ₂／Ｌ｜＜０．３ なる条件を満足することが望ましく、また、第３レンズ
群の焦点距離をＦ₃とするとき、 ０．０４＜｜Ｆ₃／Ｌ｜＜０．１ なる条件を満足することが望ましい。In this case, the focal length of the second lens group is F₂
It is desirable to satisfy the following condition: 0.1 <| F₂ /L|<0.3, and when the focal length of the third lens group is F₃ , 0.04 <| F₃ It is desirable to satisfy the condition of /L|<0.1.

【０００９】[0009]

【作用】以下、本発明の構成を採用した理由と作用につ
いて説明する。レンズ系への入射瞳が物体に近いと、軸
外光束が光軸となす角度が大きくなって、物体面の面精
度が悪いと、物点位置の光軸方向へのズレが縮小投影さ
れた像の歪みとして大きくなるという問題がある。物体
高Ｉ、レンズ系の第１面より測った入射瞳位置Ｅ、縮小
倍率Ｂ、物体面の光軸方向の撓み量ｄと像の歪みＤとの
関係は、次式で表される。The reason why the structure of the present invention is adopted and the function thereof will be described below. When the entrance pupil to the lens system is close to the object, the angle formed by the off-axis light beam with the optical axis becomes large, and when the surface accuracy of the object surface is poor, the deviation of the object point position in the optical axis direction was reduced and projected. There is a problem that it becomes large as image distortion. The relationship between the object height I, the entrance pupil position E measured from the first surface of the lens system, the reduction magnification B, the deflection amount d of the object plane in the optical axis direction, and the image distortion D is expressed by the following equation.

【００１０】Ｄ＝Ｉ／Ｅ×Ｂ×ｄ 本出願人が先に出願した特願平２−２８３８２７号のエ
キシマレーザを光源とする実施例の場合には、物体面の
反り量が１μｍの場合に、像面上の歪みとして０．０３
６μｍが発生する（Ｉ＝９０、Ｅ＝４９０、Ｂ＝０．
２）。D = I / E × B × d In the case of the embodiment using the excimer laser of Japanese Patent Application No. 2-283827 previously filed by the applicant of the present invention as the light source, the warp amount of the object surface is 1 μm. Is 0.03 as the distortion on the image plane.
6 μm occurs (I = 90, E = 490, B = 0.
2).

【００１１】この物体面の反りによる像歪みを十分小さ
くするためには、入射瞳位置を物体から遠くにする必要
がある。上記条件式は、この入射瞳位置を規定したも
のである。この条件を満足しないと、物体面を射出す
る軸外主光線傾角が大きくなり、物体面の反りによる像
面上での歪みが無視できなくなる。In order to sufficiently reduce the image distortion due to the warp of the object plane, it is necessary to make the entrance pupil position far from the object. The above conditional expression defines this entrance pupil position. If this condition is not satisfied, the tilt angle of the off-axis chief ray that exits the object plane becomes large, and the distortion on the image plane due to the warp of the object plane cannot be ignored.

【００１２】しかし、単に特願平２−２８３８２７号の
レンズ構成で入射瞳位置を遠くにすると、レンズ系の主
な正の屈折力を持つレンズ群の中央近傍から瞳がズレて
しまう。このため、このレンズ群を通る軸外物点の上側
光束と下側光束の対称性が崩れ、この主な正の屈折力を
持つレンズ群でのコマ収差の発生が大きくなり、広い露
光領域を確保することが不可能となる。However, if the entrance pupil position is made far in the lens construction of Japanese Patent Application No. 2-283827, the pupil will be displaced from the vicinity of the center of the main lens group of the lens system having a positive refractive power. For this reason, the symmetry of the upper and lower light fluxes at the off-axis object point passing through this lens group is broken, and the occurrence of coma aberration in the lens group having the main positive refractive power becomes large, so that a large exposure area is increased. It becomes impossible to secure it.

【００１３】そこで、物体近くに正のレンズ群を付加し
て、主な正の屈折力を持つレンズ群の中央近傍に瞳位置
を投影することが考えられる。しかし、軸外主光線の高
い物体近傍に正レンズ群を配することになり、ペッツバ
ール和が悪化すると共に、この正レンズ群により発生す
るコマ収差が他の群で補正不可能となってしまう。この
コマ収差とペッツバール和を良好に補正するためには、
物体近傍の正のレンズ群のさらに物体側に、凹面が向き
合う一対のメニスカスレンズを含み負の屈折力を持つレ
ンズ群を配置することが収差補正上重要になる。Therefore, it is conceivable to add a positive lens group near the object and project the pupil position near the center of the lens group having a main positive refractive power. However, since the positive lens group is arranged in the vicinity of an object having a high off-axis chief ray, the Petzval sum is deteriorated and the coma aberration generated by this positive lens group cannot be corrected by other groups. In order to satisfactorily correct this coma aberration and Petzval sum,
It is important for aberration correction to dispose a lens group having a negative refracting power including a pair of meniscus lenses whose concave surfaces face each other, further to the object side of the positive lens group near the object.

【００１４】したがって、本発明では、上記物体側の負
のレンズ群を第１群、次の正レンズ群を第２群、主な屈
折力を持つレンズ群を第３群とした３群構成としてい
る。Therefore, in the present invention, the above-mentioned negative lens group on the object side is the first group, the next positive lens group is the second group, and the lens group having the main refractive power is the third group. There is.

【００１５】次に、この第１群、第２群、第３群の役割
に付いて説明する。第１群の互いに向き合った凹面を持
つメニスカスレンズは、コマ収差を負側に補正してい
る。前記条件式の範囲を越えて焦点距離が短くなる
と、第１群で発生するコマ収差が大きくなりすぎ、第２
群とのコマ収差補正のバランスが崩れ、第１群と第２群
を合わせたトータルのコマ収差補正が不可能となる。な
お、条件式に上限を設けて、｜Ｆ₁／Ｌ｜＜１なる条
件を満足するようにすると、他のレンズ群で発生する正
のペッツバール和を補正するために必要な負のペッツバ
ール和を発生させることができ、全系のペッツバール和
をより良好にすることができる。Next, the roles of the first group, the second group and the third group will be described. The meniscus lens having the concave surfaces facing each other in the first group corrects coma to the negative side. If the focal length becomes short beyond the range of the conditional expression, the coma aberration generated in the first lens unit becomes too large,
The balance of coma aberration correction with the group is lost, and total coma aberration correction of the first and second groups becomes impossible. If an upper limit is set in the conditional expression so that the condition of | F₁ / L | <1 is satisfied, the negative Petzval sum required to correct the positive Petzval sum generated in the other lens group can be obtained. Can be generated, and the Petzval sum of the entire system can be improved.

【００１６】さらに好ましくは、第２群は、第１群の負
のパワーによって発散してしまう入射瞳を第３群の中央
付近に投影する役目を持っている。前記条件式は、こ
の入射瞳の投影条件を規定している関係式である。この
条件式の上限を越えても、下限を越えても、瞳の投影を
第３群の中央近傍にすることができなくなる。つまり、
条件は、前記した条件と同様に、レンズ全系で発生
するコマ収差を補正するために必要な条件であり、この
条件を外れると、第３群で発生するコマ収差が大きくな
りすき、他の群でこれを補正することが不可能となって
しまう。More preferably, the second group has a role of projecting the entrance pupil, which is diverged by the negative power of the first group, near the center of the third group. The conditional expression is a relational expression that defines the projection condition of the entrance pupil. If the upper limit or the lower limit of this conditional expression is exceeded, the pupil cannot be projected near the center of the third lens group. That is,
Similar to the above-mentioned conditions, the condition is a condition necessary to correct the coma aberration generated in the entire lens system. If the condition is deviated, the coma aberration generated in the third group becomes large, and It becomes impossible for the group to correct this.

【００１７】また、第１群と第２群の屈折力の配分は、 １＜｜Ｆ₁／Ｆ₂｜＜５ の条件を満足すると、第１群と第２群で発生するコマフ
レアーの発生を全系で補正するのによい結果が得られ
る。As for the distribution of the refracting powers of the first group and the second group, if the condition of 1 <| F₁ / F₂ | <5 is satisfied, the coma flare generated in the first group and the second group is generated. A good result is obtained for correcting in the whole system.

【００１８】第３群は、レンズ系全体の投影倍率等の近
軸量を決定しているレンズ群であり、条件式の上限を
越えると、投影倍率が大きくなり、下限を越えると小さ
くなり、何れも所望の倍率が得られなくなってしまう。The third lens group is a lens group which determines the paraxial amount such as the projection magnification of the entire lens system. When the upper limit of the conditional expression is exceeded, the projection magnification increases, and when it exceeds the lower limit, the projection magnification decreases. In either case, the desired magnification cannot be obtained.

【００１９】さて、縮小投影光学系において、高い解像
力と広い露光領域とを確保するためには、第３群で発生
する像面湾曲をほぼ完全に補正しなくてはならない。こ
のような目的のため、互いに向き合った凹面を持つガウ
スタイプが写真レンズ等ではよく用いられるが、本発明
では、第３群の中に向き合った凹面を持つレンズ群を少
なくとも１組設けることにより、ペッツバール和を補正
する。Now, in the reduction projection optical system, in order to secure high resolution and a wide exposure area, it is necessary to almost completely correct the field curvature generated in the third lens unit. For such a purpose, a Gauss type having concave surfaces facing each other is often used in a photographic lens or the like, but in the present invention, by providing at least one lens group having concave surfaces facing each other in the third group, Correct Petzval sum.

【００２０】また、縮小投影法では、基板の平面度によ
って部分的な像歪が生じないように、射出瞳を無限遠に
近くなるようにしている。本発明でも、少なくとも像面
側の射出瞳を無限遠に近くするために、第３群の向き合
った凹面により構成されたレンズ群のさらに像面側に、
正のレンズ群と像面側に凹面を向けたメニスカスレンズ
を配置している。この正レンズ群は、レンズ系の中にあ
る瞳を無限遠に結像する作用を持つ。像面側に凹面を向
けたメニスカスレンズは、ペッツバール和を補正するた
めのもので、コマ収差を劣化させないようにするため、
面に対する光線の傾角が小さくなる向き、すなわち、凹
面が像面側になるように配置している。Further, in the reduction projection method, the exit pupil is made to be close to infinity so that partial image distortion does not occur due to the flatness of the substrate. Also in the present invention, in order to bring at least the exit pupil on the image plane side to infinity, further to the image plane side of the lens group constituted by the concave surfaces facing each other in the third group,
A positive lens group and a meniscus lens with a concave surface facing the image side are arranged. This positive lens group has a function of forming an image of the pupil in the lens system at infinity. The meniscus lens with the concave surface facing the image side is for correcting the Petzval sum, so as not to deteriorate coma aberration,
The arrangement is such that the inclination angle of the light ray with respect to the surface is small, that is, the concave surface is on the image surface side.

【００２１】なお、この像面側に凹面を向けたメニスカ
スレンズの凹面の屈折力をφ₃、物像間距離をＬとする
と、 １／Ｌ＜｜φ₃｜＜２０／Ｌ なる条件を満足することによって、広い露光領域が確保
される。この条件の下限を越えた場合には、凹面での屈
折力が弱くなりすぎてしまい、広い露光領域を得ること
が難しくなる。また、その上限を越えると、負の屈折力
が強くなりすぎてしまい、ペッツバール和は補正できる
が、コマ収差の発生が大きくなり、他の面で補正するこ
とが難しくなる。When the refractive power of the concave surface of the meniscus lens with the concave surface facing the image surface side is φ₃ and the object-image distance is L, the condition 1 / L <| φ₃ | <20 / L is satisfied. By doing so, a wide exposure area is secured. If the lower limit of this condition is exceeded, the refractive power on the concave surface becomes too weak, and it becomes difficult to obtain a wide exposure area. Further, if the upper limit is exceeded, the negative refractive power becomes too strong, and Petzval sum can be corrected, but coma aberration increases, and it becomes difficult to correct it in other aspects.

【００２２】[0022]

【実施例】以下に、本発明の縮小投影レンズの実施例に
ついて説明する。実施例１〜８のレンズ配置を示すレン
ズ断面図を図１〜図８に示す。本発明の縮小投影レンズ
では、縮小倍率が小さくなると、ペッツバール和が補正
し難くなるため、第３群に設けた向き合った凹面の負の
屈折力が強くなりがちである。しかし、この向き合った
凹面の負の屈折力を強くしすぎると、ペッツバール和は
小さくなるが、あまりに凹面が強くなりすぎると、この
面で発生するコマ収差が大きくなり、他の面ではこれを
補正できなくなってしまう。EXAMPLES Examples of the reduction projection lens of the present invention will be described below. 1 to 8 are lens cross-sectional views showing lens arrangements of Examples 1 to 8. In the reduction projection lens of the present invention, it becomes difficult to correct the Petzval sum when the reduction magnification becomes small, and therefore the negative refractive power of the facing concave surfaces provided in the third lens unit tends to become strong. However, if the negative refractive power of the facing concave surface is made too strong, the Petzval sum will be small, but if the concave surface becomes too strong, the coma aberration generated on this surface will become large, and this will be corrected on other surfaces. I can not do it.

【００２３】この問題に対処するため、実施例１〜５に
示した縮小投影倍率が１／５のレンズ系においては、上
記の向き合った凹面で構成するレンズ群を２組用いてい
る。この場合、２組のレンズ群を単に並べただけでは、
凹面による光線の発散作用を持ったレンズ群がレンズ系
の一部に集まってしまうため、全系の屈折力を所定の屈
折力にするために、上記の向き合った凹面の屈折力が弱
くなってしまう。つまり、ペッツバール和を小さくする
作用を持った向き合った凹面は増えるが、凹面の負の屈
折力が弱くなり、結局ペッツバール和は小さくならな
い。In order to deal with this problem, in the lens system having a reduction projection magnification of ⅕ shown in Examples 1 to 5, two sets of lens groups each having the concave surface facing each other are used. In this case, simply arranging two lens groups
Since the lens group having the diverging action of the light rays by the concave surface gathers in a part of the lens system, the refractive power of the concave surface facing each other becomes weak in order to make the refractive power of the entire system a predetermined refractive power. I will end up. In other words, the number of facing concave surfaces having the effect of reducing the Petzval sum increases, but the negative refractive power of the concave surfaces weakens, and the Petzval sum does not decrease in the end.

【００２４】そこで、これらの実施例１〜５において
は、この向き合った凹面で構成された２組のレンズ群を
有効にペッツバール和の補正に使うため、上記２組のレ
ンズ群の間に少なくとも１つの正の屈折力を持つレンズ
面を配置する。この正の屈折力のレンズ面によってはじ
めて、物体側と像側の向き合った凹面で構成された２組
のレンズ群のそれぞれの凹面が、ペッツバール和とコマ
収差に対して適切な屈折力を持ち得ることになる。上記
の適切な屈折力とは、上記の向き合った２つの凹面の屈
折力を各々φ₁、φ₂とし、物像間距離をＬとしたと
き、上記２組のレンズ群が共に、 １／Ｌ｜φ₁｜＜２０／Ｌ、１／Ｌ｜φ₂｜＜２０／
Ｌ なる条件を満足することである。これらの条件式の上
限、下限の意味は、条件式について述べたことと同じ
である。Therefore, in these Examples 1 to 5, in order to effectively use the two sets of lens groups constituted by the concave surfaces facing each other for the Petzval sum correction, at least 1 is provided between the two sets of lens groups. Two lens surfaces having positive refractive power are arranged. Only by this lens surface having a positive refractive power, the concave surfaces of the two lens groups, which are composed of the concave surfaces facing each other on the object side and the image side, can have appropriate refractive powers for Petzval sum and coma. It will be. When the refractive powers of the two concave surfaces facing each other are φ₁ and φ₂ , respectively, and the object-image distance is L, the above-mentioned appropriate refractive power is 1 / L | Φ₁ | <20 / L, 1 / L | φ₂ | <20 /
That is, the condition L is satisfied. The meanings of the upper and lower limits of these conditional expressions are the same as those described for the conditional expressions.

【００２５】ところで、上記の実施例では、第３群の主
点を像面側に置くために、第３群全体をレトロフォーカ
ス的なパワー配置にしてあり、凹面を向き合わせたレン
ズ群の中の像側にある群が、このレトロフォーカス配置
の負のパワーの役割を担っている。By the way, in the above-mentioned embodiment, in order to place the principal point of the third lens unit on the image plane side, the entire third lens unit is arranged in a retrofocus power arrangement. The group on the image side of is responsible for the negative power of this retrofocus arrangement.

【００２６】しかし、投影倍率が１／４と大きくなる
と、レンズ系の主たる屈折力を負担する第３群の主点位
置が像側から物体側に移動する。このため、上記のレト
ロフォーカス的配置が不要となり、このレンズ群の負の
屈折力を弱くすることができる。その結果、凹面を向き
合わせた２組のレンズ群の一方を省略することができ
る。実施例６〜８では、このような理由により、凹面を
向き合わせたレンズ群の数は１つになっている。However, when the projection magnification increases to 1/4, the principal point position of the third lens group, which bears the main refracting power of the lens system, moves from the image side to the object side. For this reason, the above retrofocus arrangement is unnecessary, and the negative refracting power of this lens group can be weakened. As a result, one of the two lens groups whose concave surfaces face each other can be omitted. In Examples 6 to 8, for the above reason, the number of lens groups having concave surfaces facing each other is one.

【００２７】なお、倍率１／４の実施例６〜８では、後
記のレンズデータから明らかなように、倍率１／５の実
施例１〜５のものに比較して、開口数、露光領域が共に
大きくなっている。In Examples 6 to 8 with a magnification of 1/4, as is apparent from the lens data described later, the numerical aperture and the exposure area are smaller than those in Examples 1 to 5 with a magnification of 1/5. Both are getting bigger.

【００２８】以下、より具体的に、実施例１〜５におい
ては、第１群Ｉは第１レンズから第３レンズの３枚から
なり、第２群IIは第４レンズと第５レンズの２枚からな
る。第３群III は、実施例１から実施例４は、第６レン
ズから第２３レンズの１８枚からなり、実施例５は第６
レンズから第２４レンズの１９枚からなる。また、実施
例６〜８においては、第１群Ｉは第１レンズから第３レ
ンズの３枚からなり、第２群IIは第４レンズから第６レ
ンズの３枚からなる。第３群III は、実施例６、実施例
８は、第７レンズから第２４レンズの１８枚からなり、
実施例７は、第７レンズから第２３レンズの１７枚から
なる。何れのレンズも溶融石英（ＳｉＯ₂）からなる。More specifically, in Examples 1 to 5, the first group I is composed of three lenses, the first lens to the third lens, and the second group II is composed of the fourth lens and the fifth lens. It consists of pieces. The third group III includes 18 lenses from the sixth lens to the 23rd lens in the first to fourth embodiments, and the fifth embodiment includes the sixth lens.
It consists of 19 lenses from the 24th lens to the 24th lens. In Examples 6 to 8, the first group I is composed of the first to third lenses, and the second group II is composed of the fourth to sixth lenses. The third lens group III is composed of eighteen lenses, that is, the seventh lens to the twenty-fourth lens in Example 6 and Example 8,
The seventh embodiment includes 17 lenses, that is, the seventh lens to the 23rd lens. Both lenses are made of fused silica (SiO₂ ).

【００２９】また、第３群中の向き合った凹面について
は、上記したように、実施例１〜５においては２組用い
ており、何れの実施例においても、第１４面（φ₁）と
第１９面（φ₂）、第２８面（φ₁）と第２９面
（φ₂）がそれらの組を構成しており、また、上記メニ
スカスレンズの像面側の面は、第４０面（φ₃）が構成
している。また、実施例６〜８においては、第３群中に
向き合った凹面を１組用いており、実施例６、８におい
ては、第１６面（φ₁）と第２３面（φ₂）がその組を
構成しており、実施例７においては、第１４面（φ₁）
と第２１面（φ₂）がその組を構成している。メニスカ
スレンズの像面側の面は、実施例６、８においては、第
４０面（φ₃）が、実施例７においては、第３６面（φ
₃）が、それぞれ構成している。As to the concave surfaces facing each other in the third group, two sets are used in Examples 1 to 5 as described above. In any of the Examples, the 14th surface (φ₁ ) and the The 19th surface (φ₂ ), the 28th surface (φ₁ ) and the 29th surface (φ₂ ) constitute a set thereof, and the image-side surface of the meniscus lens is the 40th surface (φ₃ ) is composed. Further, in Examples 6 to 8, one set of concave surfaces facing each other in the third group is used, and in Examples 6 and 8, the 16th surface (φ₁ ) and the 23rd surface (φ₂ ) are the same. And the fourteenth surface (φ₁ ) in Example 7.
And the 21st surface (φ₂ ) constitutes the set. The image-side surface of the meniscus lens is the 40th surface (φ₃ ) in Examples 6 and 8 and the 36th surface (φ₃ ) in Example 7.
₃ ), but each constitutes.

【００３０】次に、これら実施例１〜８のレンズデータ
を示すが、記号については、上記の外、ｒ_iは物体側よ
り順に第ｉ番目のレンズ面の曲率半径、ｄ_iは物体側よ
り順に第ｉ番目のレンズ面間間隔（ただし、実施例１〜
８のｄ₀は物体面から第１レンズ面までの距離、実施例
１〜４、７のｄ₄₆、実施例５、６、８のｄ₄₈はレンズ系
の最終レンズ面から像面までの距離）、ｎ_248,iは物体
側より順に第ｉ番目のレンズの波長２４８ｎｍでの屈折
率、ＮＡは開口数、Ｅは第１レンズ面より測った入射瞳
位置であり、また、上記したように、何れのレンズも溶
融石英から構成され、そのｎ_248,iは１．５０８３であ
る。Next, the lens data of these Examples 1 to 8 will be shown. Regarding the symbols, in addition to the above, r_i is the radius of curvature of the i-th lens surface in order from the object side, and d_i is the object side. The i-th lens-to-lens surface interval in order (however, in Examples 1 to
D₀ of 8 is the distance from the object surface to the first lens surface, d₄₆ of Examples 1 to 4 and 7 and d₄₈ of Examples 5, 6 and 8 is the distance from the final lens surface of the lens system to the image surface. ), N_{248, i} is the refractive index of the i-th lens at the wavelength of 248 nm in order from the object side, NA is the numerical aperture, E is the entrance pupil position measured from the first lens surface, and as described above, Each lens is made of fused silica, and its n_{248, i} is 1.5083.

【００３１】なお、実施例１〜５においては、倍率β＝
１／５、物像間距離Ｌ＝１０００ｍｍであり、実施例６
〜８においては、倍率β＝１／４、物像間距離Ｌ＝１０
００ｍｍである。In Examples 1 to 5, the magnification β =
⅕, object-image distance L = 1000 mm, and Example 6
In 8 to 8, magnification β = 1/4, object-image distance L = 10
It is 00 mm.

【００３２】実施例１ ＮＡ=0.50 露光領域16.7×16.7ｍｍ Ｅ= ∞ ｄ₀=41.667 ｒ₁= 158.8180 ｄ₁=41.667 ｎ_248,1=1.5083 (ＳｉＯ₂) ｒ₂= 155.6344 ｄ₂=62.989 ｒ₃= 521.3761 ｄ₃=18.467 ｎ_248,2=1.5083 (ＳｉＯ₂) ｒ₄= 154.8448 ｄ₄=50.923 ｒ₅= -109.4408 ｄ₅=12.500 ｎ_248,3=1.5083 (ＳｉＯ₂) ｒ₆= -119.5306 ｄ₆=16.162 ｒ₇= 366.1980 ｄ₇=37.475 ｎ_248,4=1.5083 (ＳｉＯ₂) ｒ₈= -256.3179 ｄ₈= 0.083 ｒ₉= 353.4320 ｄ₉=40.072 ｎ_248,5=1.5083 (ＳｉＯ₂) ｒ₁₀= -667.9980 ｄ₁₀=35.047 ｒ₁₁= 131.6928 ｄ₁₁=23.349 ｎ_248,6=1.5083 (ＳｉＯ₂) ｒ₁₂= 248.4079 ｄ₁₂= 1.511 ｒ₁₃= 142.7179 ｄ₁₃=41.065 ｎ_248,7=1.5083 (ＳｉＯ₂) ｒ₁₄= 60.8060 ｄ₁₄=27.503 ｒ₁₅= -167.3935 ｄ₁₅=12.500 ｎ_248,8=1.5083 (ＳｉＯ₂) r₁₆= -107.3010 ｄ₁₆= 0.083 ｒ₁₇= -721.4791 ｄ₁₇=12.500 ｎ_248,9=1.5083 (ＳｉＯ₂) ｒ₁₈= 101.6271 ｄ₁₈=20.585 ｒ₁₉= -62.1308 ｄ₁₉=12.500 ｎ_248,10=1.5083 (ＳｉＯ₂) ｒ₂₀= 213.2965 ｄ₂₀=22.453 ｒ₂₁= -290.4600 ｄ₂₁=41.667 ｎ_248,11=1.5083 (ＳｉＯ₂) ｒ₂₂= -142.1379 ｄ₂₂= 0.083 ｒ₂₃= 710.6183 ｄ₂₃=25.767 ｎ_248,12=1.5083 (ＳｉＯ₂) ｒ₂₄= -157.4733 ｄ₂₄= 0.083 ｒ₂₅= 176.7278 ｄ₂₅=20.056 ｎ_248,13=1.5083 (ＳｉＯ₂) ｒ₂₆= 2143.3574 ｄ₂₆= 0.083 ｒ₂₇= 212.7948 ｄ₂₇=38.145 ｎ_248,14=1.5083 (ＳｉＯ₂) ｒ₂₈= 108.7235 ｄ₂₈=25.747 ｒ₂₉= -135.8758 ｄ₂₉=12.500 ｎ_248,15=1.5083 (ＳｉＯ₂) ｒ₃₀= 487.8604 ｄ₃₀=32.627 ｒ₃₁= -559.6964 ｄ₃₁=35.123 ｎ_248,16=1.5083 (ＳｉＯ₂) ｒ₃₂= -219.9666 ｄ₃₂= 0.083 ｒ₃₃= 905.5655 ｄ₃₃=24.259 ｎ_248,17=1.5083 (ＳｉＯ₂) ｒ₃₄= -198.0141 ｄ₃₄= 0.083 ｒ₃₅= 229.0919 ｄ₃₅=40.041 ｎ_248,18=1.5083 (ＳｉＯ₂) ｒ₃₆= -753.1448 ｄ₃₆=12.508 ｒ₃₇= 129.3415 ｄ₃₇=22.495 ｎ_248,19=1.5083 (ＳｉＯ₂) ｒ₃₈= 293.9816 ｄ₃₈= 0.124 ｒ₃₉= 87.6213 ｄ₃₉=41.667 ｎ_248,20=1.5083 (ＳｉＯ₂) ｒ₄₀= 59.4786 ｄ₄₀=18.051 ｒ₄₁=-1548.7213 ｄ₄₁=25.915 ｎ_248,21=1.5083 (ＳｉＯ₂) ｒ₄₂= 161.4997 ｄ₄₂= 0.083 ｒ₄₃= 72.3482 ｄ₄₃=20.560 ｎ_248,22=1.5083 (ＳｉＯ₂) ｒ₄₄= 90.3115 ｄ₄₄= 0.580 r₄₅= 58.8494 ｄ₄₅=20.566 ｎ_248,23=1.5083 (ＳｉＯ₂) ｒ₄₆= ∞ ｄ₄₆=10.000 Ｆ₁=-509.343 Ｆ₂= 187.569 Ｆ₃= 51.157 φ₁=-0.00836 φ₂=-0.00818 φ₁=-0.00468 φ₂=-0.00374 φ₃=-0.00855 。Example 1 NA = 0.50 exposure area 16.7 × 16.7 mm E = ∞ d₀ = 41.667 r₁ = 158.8180 d₁ = 41.667 n_248,1 = 1.5083 (SiO₂ ) r₂ = 155.6344 d₂ = 62.989 r₃ = 521.3761 d₃ = 18.467 n_248,2 = 1.5083 (SiO₂ ) r₄ = 154.8448 d₄ = 50.923 r₅ = -109.4408 d₅ = 12.500 n_248,3 = 1.5083 (SiO₂ ) r₆ = -119.5306 d₆ = 16.162 r₇ = 366.1980 d₇ = 37.475 n_248,4 = 1.5083 (SiO₂ ) r₈ = -256.3179 d₈ = 0.083 r₉ = 353.4320 d₉ = 40.072 n_248,5 = 1.5083 (SiO₂ ) r₁₀ = -667.9980 d₁₀ = 35.047 r₁₁ = 131.6928 d₁₁ = 23.349 n_248,6 = 1.5083 (SiO₂ ) r₁₂ = 248.4079 d₁₂ = 1.511 r₁₃ = 142.7179 d₁₃ = 41.065 n_248,7 = 1.5083 (SiO₂ ). r₁₄ = 60.8060 d₁₄ = 27.503 r₁₅ = -167.3935 d₁₅ = 12.500 n_248,8 = 1.5083 (SiO₂ ) r₁₆ = -107.3010 d₁₆ = 0.083 r₁₇ = -721.4791 d₁₇ = 12.500 n_248,9 = 1.5083 (SiO₂ ) r₁₈ = 101.6271 d₁₈ = 20.585 r₁₉ = -62.1308 d₁₉ = 12 .500 n_248,10 = 1.5083 (SiO₂ ) r₂₀ = 213.2965 d₂₀ = 22.453 r₂₁ = -290.4600 d₂₁ = 41.667 n_248,11 = 1.5083 (SiO₂ ) r₂₂ = -142.1379 d₂₂ = 0.083 r₂₃ = 710.6183 d₂₃ = 25.767 n_248,12 = 1.5083 (SiO₂ ) r₂₄ = -157.4733 d₂₄ = 0.083 r₂₅ = 176.7278 d₂₅ = 20.056 n_248,13 = 1.5083 (SiO₂ ) r₂₆ = 2143.3574 d₂₆ = 0.083 r₂₇ = 212.7948 d₂₇ = 38.145 n_248,14 = 1.5083 (SiO₂ ) r₂₈ = 108.7235 d₂₈ = 25.747 r₂₉ = -135.8758 d₂₉ = 12.500 n_248,15 = 1.5083 (SiO₂ ) r₃₀ = 487.8604 d₃₀ = 32.627 r₃₁ = -559.6964 d₃₁ = 35.123 n_248,16 = 1.5083 (SiO₂ ) r₃₂ = -219.9666 d₃₂ = 0.083 r₃₃ = 905.5655 d₃₃ = 24.259 n_248,17 = 1.5083 (SiO₂ ). r₃₄ = -198.0141 d₃₄ = 0.083 r₃₅ = 229.0919 d₃₅ = 40.041 n_248,18 = 1.5083 (SiO₂ ) r₃₆ = -753.1448 d₃₆ = 12.508 r₃₇ = 129.3415 d₃₇ = 22.495 n_248,19 = 1.5083_{(SiO 2) r 38 = 293.9816} d 38 = 0.124 r 39 = 87.6213_{39 = 41.667 n 248,20 = 1.5083 (} SiO 2) r 40 = 59.4786 d 40 = 18.051 r 41 = -1548.7213 d 41 = 25.915 n 248,21 = 1.5083 (SiO 2) r 42 = 161.4997 d 42 = 0.083 r 43 = 72.3482 d₄₃ = 20.560 n_248,22 = 1.5083 (SiO₂ ) r₄₄ = 90.3115 d₄₄ = 0.580 r₄₅ = 58.8494 d₄₅ = 20.566 n_248,23 = 1.5083 (SiO₂ ) r₄₆ = ∞ d₄₆ = 10.000 F₁ = -509.343 F₂ = 187.569 F₃ = 51.157 φ₁ = -0.00836 φ₂ = -0.00818 φ₁ = -0.00468 φ₂ = -0.00374 φ₃ = -0.00855.

【００３３】実施例２ ＮＡ=0.48 露光領域 20×20 ｍｍ Ｅ=20842.22 ｄ₀=50.000 ｒ₁= 141.2698 ｄ₁=33.671 ｎ_248,1=1.5083 (ＳｉＯ₂) ｒ₂= 152.0192 ｄ₂=29.286 ｒ₃= 666.2277 ｄ₃=15.000 ｎ_248,2=1.5083 (ＳｉＯ₂) ｒ₄= 151.1574 ｄ₄=26.859 ｒ₅= -108.1434 ｄ₅=15.000 ｎ_248,3=1.5083 (ＳｉＯ₂) ｒ₆= -118.8647 ｄ₆=14.745 ｒ₇= 460.9167 ｄ₇=43.187 ｎ_248,4=1.5083 (ＳｉＯ₂) ｒ₈= -276.6500 ｄ₈= 0.100 ｒ₉= 275.5863 ｄ₉=35.557 ｎ_248,5=1.5083 (ＳｉＯ₂) ｒ₁₀=-1203.1428 ｄ₁₀= 0.131 ｒ₁₁= 160.4572 ｄ₁₁=34.632 ｎ_248,6=1.5083 (ＳｉＯ₂) ｒ₁₂= 661.6698 ｄ₁₂= 0.222 ｒ₁₃= 214.4262 ｄ₁₃=41.178 ｎ_248,7=1.5083 (ＳｉＯ₂) ｒ₁₄= 71.8816 ｄ₁₄=64.177 ｒ₁₅= -166.9853 ｄ₁₅=15.006 ｎ_248,8=1.5083 (ＳｉＯ₂) ｒ₁₆= -121.2880 ｄ₁₆= 4.026 ｒ₁₇= -947.7400 ｄ₁₇=24.617 ｎ_248,9=1.5083 (ＳｉＯ₂) ｒ₁₈= 96.3131 ｄ₁₈=21.706 ｒ₁₉= -63.8413 ｄ₁₉=15.000 ｎ_248,10=1.5083 (ＳｉＯ₂) r₂₀= 236.8715 ｄ₂₀=21.763 ｒ₂₁= -295.4267 ｄ₂₁=49.126 ｎ_248,11=1.5083 (ＳｉＯ₂) ｒ₂₂= -152.0088 ｄ₂₂= 0.100 ｒ₂₃= 777.0670 ｄ₂₃=29.069 ｎ_248,12=1.5083 (ＳｉＯ₂) ｒ₂₄= -157.5230 ｄ₂₄= 0.100 ｒ₂₅= 168.4778 ｄ₂₅=22.530 ｎ_248,13=1.5083 (ＳｉＯ₂) ｒ₂₆= 1074.2257 ｄ₂₆= 0.100 ｒ₂₇= 251.5811 ｄ₂₇=20.491 ｎ_248,14=1.5083 (ＳｉＯ₂) ｒ₂₈= 131.9121 ｄ₂₈=28.754 ｒ₂₉= -137.1541 ｄ₂₉=15.000 ｎ_248,15=1.5083 (ＳｉＯ₂) ｒ₃₀= 425.5107 ｄ₃₀=22.730 ｒ₃₁= -682.4012 ｄ₃₁=26.847 ｎ_248,16=1.5083 (ＳｉＯ₂) ｒ₃₂= -241.5028 ｄ₃₂= 0.100 ｒ₃₃= 1049.8203 ｄ₃₃=28.249 ｎ_248,17=1.5083 (ＳｉＯ₂) ｒ₃₄= -182.7013 ｄ₃₄= 0.100 ｒ₃₅= 226.6109 ｄ₃₅=25.505 ｎ_248,18=1.5083 (ＳｉＯ₂) ｒ₃₆=-1068.8899 ｄ₃₆= 0.100 ｒ₃₇= 141.2526 ｄ₃₇=21.972 ｎ_248,19=1.5083 (ＳｉＯ₂) ｒ₃₈= 329.5029 ｄ₃₈= 0.146 ｒ₃₉= 98.8268 ｄ₃₉=41.393 ｎ_248,20=1.5083 (ＳｉＯ₂) ｒ₄₀= 66.7276 ｄ₄₀=26.108 ｒ₄₁= -517.3678 ｄ₄₁=38.814 ｎ_248,21=1.5083 (ＳｉＯ₂) ｒ₄₂= 186.4744 ｄ₄₂= 0.100 ｒ₄₃= 74.2966 ｄ₄₃=36.835 ｎ_248,22=1.5083 (ＳｉＯ₂) ｒ₄₄= 94.9398 ｄ₄₄= 0.101 ｒ₄₅= 58.8202 ｄ₄₅=21.753 ｎ_248,23=1.5083 (ＳｉＯ₂) ｒ₄₆= ∞ ｄ₄₆= 8.013 Ｆ₁=-516.940 Ｆ₂= 198.765 Ｆ₃= 52.931 φ₁=-0.00707 φ₂=-0.00796 φ₁=-0.00385 φ₂=-0.00371 φ₃=-0.00762 。Example 2 NA = 0.48 exposure area 20 × 20 mm E = 20842.22 d₀ = 50.000 r₁ = 141.2698 d₁ = 33.671 n_248,1 = 1.5083 (SiO₂ ) r₂ = 152.0192 d₂ = 29.286 r₃ = 666.2277 d₃ = 15.000 n_248,2 = 1.5083 (SiO₂ ) r₄ = 151.1574 d₄ = 26.859 r₅ = -108.1434 d₅ = 15.000 n_248,3 = 1.5083 (SiO₂ ) r₆ = -118.8647 d₆ = 14.745 r₇ = 460.9167 d₇ = 43.187 n_248,4 = 1.5083 (SiO₂ ) r₈ = -276.6500 d₈ = 0.100 r₉ = 275.5863 d₉ = 35.557 n_248,5 = 1.5083 (SiO₂ ) r₁₀ = -1203.1428 d₁₀ = 0.131 r₁₁ = 160.4572 d₁₁ = 34.632 n_248,6 = 1.5083 (SiO₂ ) r₁₂ = 661.6698 d₁₂ = 0.222 r₁₃ = 214.4262 d₁₃ = 41.178 n_248,7 = 1.5083 (SiO₂ ) r₁₄ = 71.8816 d₁₄ = 64.177 r₁₅ = -166.9853 d₁₅ = 15.006 n_248,8 = 1.5083 (SiO₂ ) r₁₆ = -121.2880 d₁₆ = 4.026 r₁₇ = -947.7400 d₁₇ = 24.617 n_248,9 = 1.5083 (SiO₂ ) r₁₈ = 96.3131 d₁₈ = 21.706 r₁₉ = -63.8413 d₁₉ = 15.000 n_248,10 = 1.5083 (SiO₂ ) r₂₀ = 236.8715 d₂₀ = 21.763 r₂₁ = -295.4267 d₂₁ = 49.126 n_248,11 = 1.5083 (SiO₂ ) r₂₂ = -152.0088 d₂₂ = 0.100 r₂₃ = 777.0670 d₂₃ = 29.069 n_248,12 = 1.5083 (SiO₂ ) r₂₄ = -157.5230 d₂₄ = 0.100 r₂₅ = 168.4778 d₂₅ = 22.530 n_248,13 = 1.5083 (SiO₂ ) r₂₆ = 1074.2257 d₂₆ = 0.100 r₂₇ = 251.5811 d₂₇ = 20.491 n_248,14 = 1.5083 (SiO₂ ) r₂₈ = 131.9121 d₂₈ = 28.754 r₂₉ = -137.1541 d₂₉ = 15.000 n_248,15 = 1.5083 (SiO₂ ) r₃₀ = 425.5107 d₃₀ = 22.730 r₃₁ = -682.4012 d₃₁ = 26.847 n_248,16 = 1.5083 (SiO₂ ) r₃₂ = -241.5028 d₃₂ = 0.100 r₃₃ = 1049.8203 d₃₃ = 28.249 n_248,17 = 1.5083 (SiO₂ ) r₃₄ = -182.7013 d₃₄ = 0.100 r₃₅ = 226.6109 d₃₅ = 25.505 n_248,18 = 1.5083 (SiO₂ ) r₃₆ = -1068.8899 d₃₆ = 0.100 r₃₇ = 141.2526 d₃₇ = 21.972 n_248,19 = 1.5083 (SiO₂ ) r₃₈ = 329.5029 d₃₈ = 0.146 r₃₉ = 98.8268 d₃₉ = 41.393 n_248,20 = 1.5083 (SiO₂ ) r₄₀ = 66.7276 d₄₀ = 26.108 r₄₁ = -517.3678 d₄₁ = 38.814 n_248,21 = 1.5083 (SiO₂ ) r₄₂ = 186.4744 d₄₂ = 0.100 r₄₃ = 74.2966 d₄₃ = 36.835 n_248,22 = 1.5083 (SiO₂ ) r₄₄ = 94.9398 d₄₄ = 0.101 r₄₅ = 58.8202 d₄₅ = 21.753 n_248,23 = 1.5083 (SiO₂ ) r₄₆ = ∞ d₄₆ = 8.013 F₁ = -516.940 F₂ = 198.765 F₃ = 52.931 φ₁ = -0.00707 φ₂ = -0.00796 φ₁ = -0.00385 φ₂ = -0.00371 φ₃ = -0.00762.

【００３４】実施例３ ＮＡ=0.50 露光領域 20×20 ｍｍ Ｅ=725.58 ｄ₀=50.000 ｒ₁= 106.2081 ｄ₁=19.183 ｎ_248,1=1.5083 (ＳｉＯ₂) ｒ₂= 112.7090 ｄ₂=14.582 ｒ₃= 243.1751 ｄ₃=15.000 ｎ_248,2=1.5083 (ＳｉＯ₂) ｒ₄= 102.7156 ｄ₄=59.376 ｒ₅= -121.6125 ｄ₅=15.000 ｎ_248,3=1.5083 (ＳｉＯ₂) ｒ₆= -136.4936 ｄ₆=17.234 ｒ₇= 295.0056 ｄ₇=33.106 ｎ_248,4=1.5083 (ＳｉＯ₂) ｒ₈= -389.3950 ｄ₈= 0.100 ｒ₉= 228.2290 ｄ₉=30.132 ｎ_248,5=1.5083 (ＳｉＯ₂) ｒ₁₀=-1157.4165 ｄ₁₀= 0.100 ｒ₁₁= 239.1661 ｄ₁₁=24.828 ｎ_248,6=1.5083 (ＳｉＯ₂) ｒ₁₂=-2736.2711 ｄ₁₂= 0.239 ｒ₁₃= 200.6372 ｄ₁₃=15.000 ｎ_248,7=1.5083 (ＳｉＯ₂) ｒ₁₄= 74.3536 ｄ₁₄=40.122 ｒ₁₅= -124.0785 ｄ₁₅=15.631 ｎ_248,8=1.5083 (ＳｉＯ₂) ｒ₁₆= -112.5088 ｄ₁₆= 0.100 ｒ₁₇=-1081.6120 ｄ₁₇=75.311 ｎ_248,9=1.5083 (ＳｉＯ₂) ｒ₁₈= 99.0951 ｄ₁₈=25.286 ｒ₁₉= -61.2676 ｄ₁₉=15.000 ｎ_248,10=1.5083 (ＳｉＯ₂) ｒ₂₀= 290.7525 ｄ₂₀=13.838 ｒ₂₁= -264.3925 ｄ₂₁=42.982 ｎ_248,11=1.5083 (ＳｉＯ₂) ｒ₂₂= -142.3785 ｄ₂₂= 0.100 ｒ₂₃=-2574.3470 ｄ₂₃=33.911 ｎ_248,12=1.5083 (ＳｉＯ₂) r₂₄= -128.0224 ｄ₂₄= 0.100 ｒ₂₅= 178.8290 ｄ₂₅=27.785 ｎ_248,13=1.5083 (ＳｉＯ₂) ｒ₂₆=14133.9919 ｄ₂₆= 0.100 ｒ₂₇= 366.2486 ｄ₂₇=15.000 ｎ_248,14=1.5083 (ＳｉＯ₂) ｒ₂₈= 145.1509 ｄ₂₈=39.190 ｒ₂₉= -134.1619 ｄ₂₉=15.000 ｎ_248,15=1.5083 (ＳｉＯ₂) ｒ₃₀= 546.4401 ｄ₃₀=18.673 ｒ₃₁= -510.4058 ｄ₃₁=24.615 ｎ_248,16=1.5083 (ＳｉＯ₂) ｒ₃₂= -230.2698 ｄ₃₂= 0.100 ｒ₃₃= 1032.2937 ｄ₃₃=39.467 ｎ_248,17=1.5083 (ＳｉＯ₂) ｒ₃₄= -175.7421 ｄ₃₄= 0.100 ｒ₃₅= 253.8440 ｄ₃₅=30.345 ｎ_248,18=1.5083 (ＳｉＯ₂) ｒ₃₆= -784.4228 ｄ₃₆= 0.100 ｒ₃₇= 165.8967 ｄ₃₇=22.259 ｎ_248,19=1.5083 (ＳｉＯ₂) ｒ₃₈= 348.5753 ｄ₃₈= 0.100 ｒ₃₉= 111.5420 ｄ₃₉=43.105 ｎ_248,20=1.5083 (ＳｉＯ₂) ｒ₄₀= 79.1769 ｄ₄₀=31.484 ｒ₄₁= -513.011 ｄ₄₁=51.270 ｎ_248,21=1.5083 (ＳｉＯ₂) ｒ₄₂= 236.3217 ｄ₄₂= 0.100 ｒ₄₃= 89.8217 ｄ₄₃=54.275 ｎ_248,22=1.5083 (ＳｉＯ₂) ｒ₄₄= 110.2619 ｄ₄₄= 0.100 ｒ₄₅= 61.3966 ｄ₄₅=22.570 ｎ_248,23=1.5083 (ＳｉＯ₂) ｒ₄₆= ∞ ｄ₄₆= 8.000 Ｆ₁=-449.873 Ｆ₂= 181.832 Ｆ₃= 47.071 φ₁=-0.00684 φ₂=-0.00830 φ₁=-0.00350 φ₂=-0.00379 φ₃=-0.00642 。Example 3 NA = 0.50 exposure area 20 × 20 mm E = 725.58 d₀ = 50.000 r₁ = 106.2081 d₁ = 19.183 n_248,1 = 1.5083 (SiO₂ ) r₂ = 112.7090 d₂ = 14.582 r₃ = 243.1751 d₃ = 15.000 n_248,2 = 1.5083 (SiO₂ ) r₄ = 102.7156 d₄ = 59.376 r₅ = -121.6125 d₅ = 15.000 n_248,3 = 1.5083 (SiO₂ ) r₆ = -136.4936 d₆ = 17.234 r₇ = 295.0056 d₇ = 33.106 n_248,4 = 1.5083 (SiO₂ ) r₈ = -389.3950 d₈ = 0.100 r₉ = 228.2290 d₉ = 30.132 n_248,5 = 1.5083 (SiO₂ ) r₁₀ = -1157.4165 d₁₀ = 0.100 r₁₁ = 239.1661 d₁₁ = 24.828 n_248,6 = 1.5083 (SiO₂ ) r₁₂ = -2736.2711 d₁₂ = 0.239 r₁₃ = 200.6372 d₁₃ = 15.000 n_248,7 = 1.5083 (SiO₂ ) r₁₄ = 74.3536 d₁₄ = 40.122 r₁₅ = -124.0785 d₁₅ = 15.631 n_248,8 = 1.5083 (SiO₂ ) r₁₆ = -112.5088 d₁₆ = 0.100 r₁₇ = -1081.6120 d₁₇ = 75.311 n_248,9 = 1.5083 (SiO₂ ) r₁₈ = 99.0951 d₁₈ = 25.286 r₁₉ = -61.2676 d₁₉ = 15.000 n_248,10 = 1.5083 (SiO₂ ) r₂₀ = 290.7525 d₂₀ = 13.838 r₂₁ = -264.3925 d₂₁ = 42.982 n_248,11 = 1.5083 (SiO₂ ) r₂₂ = -142.3785 d₂₂ = 0.100 r₂₃ = -2574.3470 d₂₃ = 33.911 n_248,12 = 1.5083 (SiO₂ ) r₂₄ = -128.0224 d₂₄ = 0.100 r₂₅ = 178.8290 d₂₅ = 27.785 n_248,13 = 1.5083 (SiO₂ ) r₂₆ = 14133.9919 d₂₆ = 0.100 r₂₇ = 366.2486 d₂₇ = 15.000 n_248,14 = 1.5083 (SiO₂ ) r₂₈ = 145.1509 d₂₈ = 39.190 r₂₉ = -134.1619 d₂₉ = 15.000 n_248,15 = 1.5083 (SiO₂ ) r₃₀ = 546.4401 d₃₀ = 18.673 r₃₁ = -510.4058 d₃₁ = 24.615 n_248,16 = 1.5083 (SiO₂ ) r₃₂ = -230.2698 d₃₂ = 0.100 r₃₃ = 1032.2937 d₃₃ = 39.467 n_248,17 = 1.5083 (SiO₂ ) r₃₄ = -175.7421 d₃₄ = 0.100 r₃₅ = 253.8440 d₃₅ = 30.345 n_248,18 = 1.5083 (SiO₂ ) r₃₆ = -784.4228 d₃₆ = 0.100 r₃₇ = 165.8967 d₃₇ = 22.259 n_248,19 = 1.5083 (SiO₂ ) r₃₈ = 348.5753 d₃₈ = 0.100 r₃₉ = 111.5420 d₃₉ = 43.105 n_248,20 = 1.5083 (SiO₂ ) r₄₀ = 79.1769 d₄₀ = 31.484 r₄₁ = -513.011 d₄₁ = 51.270 n_248,21 = 1.5083 (SiO₂ ) r₄₂ = 236.3217 d₄₂ = 0.100 r₄₃ = 89.8217 d₄₃ = 54.275 n_248,22 = 1.5083 (SiO₂ ) r₄₄ = 110.2619 d₄₄ = 0.100 r₄₅ = 61.3966 d₄₅ = 22.570 n_248,23 = 1.5083 (SiO₂ ) r₄₆ = ∞ d₄₆ = 8.000 F₁ = -449.873 F₂ = 181.832 F₃ = 47.071 φ₁ = -0.00684 φ₂ = -0.00830 φ₁ = -0.00350 φ₂ = -0.00379 φ₃ = -0.00642.

【００３５】実施例４ ＮＡ=0.48 露光領域 20×20 ｍｍ Ｅ=1478.10 ｄ₀=100.000 ｒ₁= 137.2562 ｄ₁=25.000 ｎ_248,1=1.5083 (ＳｉＯ₂) ｒ₂= 147.6178 ｄ₂=15.558 ｒ₃= 444.0530 ｄ₃=25.000 ｎ_248,2=1.5083 (ＳｉＯ₂) ｒ₄= 137.1186 ｄ₄=47.265 ｒ₅= -120.4597 ｄ₅=25.000 ｎ_248,3=1.5083 (ＳｉＯ₂) ｒ₆= -140.3130 ｄ₆= 7.696 ｒ₇= 467.8743 ｄ₇=32.991 ｎ_248,4=1.5083 (ＳｉＯ₂) ｒ₈= -359.6274 ｄ₈= 1.000 ｒ₉= 557.3871 ｄ₉=30.000 ｎ_248,5=1.5083 (ＳｉＯ₂) ｒ₁₀= -515.5693 ｄ₁₀= 1.000 ｒ₁₁= 123.7905 ｄ₁₁=41.484 ｎ_248,6=1.5083 (ＳｉＯ₂) ｒ₁₂= 643.8987 ｄ₁₂= 1.000 ｒ₁₃= 171.4587 ｄ₁₃=25.016 ｎ_248,7=1.5083 (ＳｉＯ₂) ｒ₁₄= 66.5180 ｄ₁₄=41.583 ｒ₁₅= -152.4686 ｄ₁₅=20.000 ｎ_248,8=1.5083 (ＳｉＯ₂) ｒ₁₆= -126.9177 ｄ₁₆=23.751 ｒ₁₇= ∞ ｄ₁₇=15.000 ｎ_248,9=1.5083 (ＳｉＯ₂) ｒ₁₈= 92.5666 ｄ₁₈=24.103 ｒ₁₉= -65.0156 ｄ₁₉=15.000 ｎ_248,10=1.5083 (ＳｉＯ₂) ｒ₂₀= 260.3267 ｄ₂₀=18.623 ｒ₂₁= -272.8242 ｄ₂₁=47.402 ｎ_248,11=1.5083 (ＳｉＯ₂) ｒ₂₂= -150.2897 ｄ₂₂= 1.000 ｒ₂₃= 700.4601 ｄ₂₃=32.885 ｎ_248,12=1.5083 (ＳｉＯ₂) ｒ₂₄= -147.3217 ｄ₂₄= 1.000 ｒ₂₅= 198.8265 ｄ₂₅=23.375 ｎ_248,13=1.5083 (ＳｉＯ₂) ｒ₂₆= ∞ ｄ₂₆= 1.000 ｒ₂₇= 276.9653 ｄ₂₇=22.000 ｎ_248,14=1.5083 (ＳｉＯ₂) r₂₈= 139.4304 ｄ₂₈=30.352 ｒ₂₉= -135.7057 ｄ₂₉=22.000 ｎ_248,15=1.5083 (ＳｉＯ₂) ｒ₃₀= 425.1163 ｄ₃₀=16.299 ｒ₃₁= -488.1142 ｄ₃₁=23.000 ｎ_248,16=1.5083 (ＳｉＯ₂) ｒ₃₂= -221.2312 ｄ₃₂= 1.000 ｒ₃₃= 793.9923 ｄ₃₃=29.322 ｎ_248,17=1.5083 (ＳｉＯ₂) ｒ₃₄= -178.4943 ｄ₃₄= 1.000 ｒ₃₅= 230.7597 ｄ₃₅=24.399 ｎ_248,18=1.5083 (ＳｉＯ₂) ｒ₃₆=-1400.000 ｄ₃₆= 1.000 ｒ₃₇= 143.8285 ｄ₃₇=22.630 ｎ_248,19=1.5083 (ＳｉＯ₂) ｒ₃₈= 346.4978 ｄ₃₈= 1.000 ｒ₃₉= 92.4396 ｄ₃₉=46.822 ｎ_248,20=1.5083 (ＳｉＯ₂) ｒ₄₀= 59.0889 ｄ₄₀=17.769 ｒ₄₁= ∞ ｄ₄₁=48.415 ｎ_248,21=1.5083 (ＳｉＯ₂) ｒ₄₂= 100.6209 ｄ₄₂= 1.000 ｒ₄₃= 59.7465 ｄ₄₃=25.260 ｎ_248,22=1.5083 (ＳｉＯ₂) ｒ₄₄= 92.1960 ｄ₄₄= 1.000 ｒ₄₅= 57.9881 ｄ₄₅=15.000 ｎ_248,23=1.5083 (ＳｉＯ₂) ｒ₄₆= ∞ ｄ₄₆= 8.001 Ｆ₁=-487.258 Ｆ₂= 235.341 Ｆ₃= 67.839 φ₁=-0.00764 φ₂=-0.00782 φ₁=-0.00365 φ₂=-0.00375 φ₃=-0.00860 。Example 4 NA = 0.48 exposure area 20 × 20 mm E = 1478.10 d₀ = 100.000 r₁ = 137.2562 d₁ = 25.000 n_248,1 = 1.5083 (SiO₂ ) r₂ = 147.6178 d₂ = 15.558 r₃ = 444.0530 d₃ = 25.000 n_248,2 = 1.5083 (SiO₂ ) r₄ = 137.1186 d₄ = 47.265 r₅ = -120.4597 d₅ = 25.000 n_248,3 = 1.5083 (SiO₂ ) r₆ = -140.3130 d₆ = 7.696 r₇ = 467.8743 d₇ = 32.991 n_248,4 = 1.5083 (SiO₂ ) r₈ = -359.6274 d₈ = 1.000 r₉ = 557.3871 d₉ = 30.000 n_248,5 = 1.5083 (SiO₂ ) r₁₀ = -515.5693 d₁₀ = 1.000 r₁₁ = 123.7905 d₁₁ = 41.484 n_248,6 = 1.5083 (SiO₂ ) r₁₂ = 643.8987 d₁₂ = 1.000 r₁₃ = 171.4587 d₁₃ = 25.016 n_248,7 = 1.5083 (SiO₂ ). r₁₄ = 66.5180 d₁₄ = 41.583 r₁₅ = -152.4686 d₁₅ = 20.000 n_248,8 = 1.5083 (SiO₂ ) r₁₆ = -126.9177 d₁₆ = 23.751 r₁₇ = ∞ d₁₇ = 15.000 n_248,9 = 1.5083 (SiO₂ ) r₁₈ = 92.5666 d₁₈ = 24.103 r₁₉ = -65.0156 d₁₉ = 15.00 0 n_248,10 = 1.5083 (SiO₂ ) r₂₀ = 260.3267 d₂₀ = 18.623 r₂₁ = -272.8242 d₂₁ = 47.402 n_248,11 = 1.5083 (SiO₂ ) r₂₂ = -150.2897 d₂₂ = 1.000 r₂₃ = 700.4601 d₂₃ = 32.885 n_248,12 = 1.5083 (SiO₂ ) r₂₄ = -147.3217 d₂₄ = 1.000 r₂₅ = 198.8265 d₂₅ = 23.375 n_248,13 = 1.5083 (SiO₂ ) r₂₆ = ∞ d₂₆ = 1.000 r₂₇ = 276.9653 d₂₇ = 22.000 n_248,14 = 1.5083 (SiO₂ ) r₂₈ = 139.4304 d₂₈ = 30.352 r₂₉ = -135.7057 d₂₉ = 22.000 n_248,15 = 1.5083 (SiO₂ ) r₃₀ = 425.1163 d₃₀ = 16.299 r₃₁ = -488.1142 d₃₁ = 23.000 n_248,16 = 1.5083 (SiO₂ ) r₃₂ = -221.2312 d₃₂ = 1.000 r₃₃ = 793.9923 d₃₃ = 29.322 n_248,17 = 1.5083 (SiO₂ ) r₃₄ = -178.4943 d₃₄ = 1.000 r₃₅ = 230.7597 d₃₅ = 24.399 n_248,18 = 1.5083 (SiO₂ ) r₃₆ = -1400.000 d₃₆ = 1.000 r₃₇ = 143.8285 d₃₇ = 22.630 n_248,19 = 1.5083 ( SiO₂ ) r₃₈ = 346.4978 d₃₈ = 1.000 r₃₉ = 92.4396 d₃₉ = 46.822 n_248,20 = 1.5083 (SiO₂ ) r₄₀ = 59.0889 d₄₀ = 17.769 r₄₁ = ∞ d₄₁ = 48.415 n_248,21 = 1.5083 (SiO₂ ) r₄₂ = 100.6209 d₄₂ = 1.000 r₄₃ = 59.7465 d₄₃ = 25.260 n_248,22 = 1.5083 (SiO₂ ) r₄₄ = 92.1960 d₄₄ = 1.000 r₄₅ = 57.9881 d₄₅ = 15.000 n_248,23 = 1.5083 (SiO₂ ) r₄₆ = ∞ d₄₆ = 8.001 F₁ =- 487.258 F₂ = 235.341 F₃ = 67.839 φ₁ = -0.00764 φ₂ = -0.00782 φ₁ = -0.00365 φ₂ = -0.00375 φ₃ = -0.00860.

【００３６】実施例５ ＮＡ=0.47 露光領域 25×25 ｍｍ Ｅ= ∞ ｄ₀=100.000 ｒ₁= 158.8170 ｄ₁=19.241 ｎ_248,1=1.5083 (ＳｉＯ₂) ｒ₂= 239.7566 ｄ₂=25.114 r₃= -520.0778 ｄ₃=15.000 ｎ_248,2=1.5083 (ＳｉＯ₂) ｒ₄= 173.3822 ｄ₄=55.581 ｒ₅= -134.3573 ｄ₅=12.500 ｎ_248,3=1.5083 (ＳｉＯ₂) ｒ₆= -158.9506 ｄ₆= 0.833 ｒ₇=11353.9937 ｄ₇=30.783 ｎ_248,4=1.5083 (ＳｉＯ₂) ｒ₈= -260.7941 ｄ₈= 0.833 ｒ₉= 236.4466 ｄ₉=41.454 ｎ_248,5=1.5083 (ＳｉＯ₂) ｒ₁₀= -965.9305 ｄ₁₀= 0.833 ｒ₁₁= 197.3572 ｄ₁₁=33.902 ｎ_248,6=1.5083 (ＳｉＯ₂) ｒ₁₂= 2305.5231 ｄ₁₂= 0.833 ｒ₁₃= 155.2685 ｄ₁₃=39.333 ｎ_248,7=1.5083 (ＳｉＯ₂) ｒ₁₄= 74.2733 ｄ₁₄=33.505 ｒ₁₅= -833.0055 ｄ₁₅=16.231 ｎ_248,8=1.5083 (ＳｉＯ₂) ｒ₁₆= -173.1079 ｄ₁₆=15.107 ｒ₁₇= -132.3474 ｄ₁₇=12.500 ｎ_248,9=1.5083 (ＳｉＯ₂) ｒ₁₈= 107.5686 ｄ₁₈=39.258 ｒ₁₉= -71.6995 ｄ₁₉=12.500 ｎ_248,10=1.5083 (ＳｉＯ₂) ｒ₂₀= 231.6966 ｄ₂₀=17.492 ｒ₂₁= -526.9275 ｄ₂₁=36.447 ｎ_248,11=1.5083 (ＳｉＯ₂) ｒ₂₂= -188.3114 ｄ₂₂= 0.833 ｒ₂₃= 866.0416 ｄ₂₃=36.994 ｎ_248,12=1.5083 (ＳｉＯ₂) ｒ₂₄= -156.0137 ｄ₂₄= 0.833 ｒ₂₅= 274.4281 ｄ₂₅=33.991 ｎ_248,13=1.5083 (ＳｉＯ₂) ｒ₂₆= -342.0398 ｄ₂₆= 0.833 ｒ₂₇= 228.3407 ｄ₂₇=25.104 ｎ_248,14=1.5083 (ＳｉＯ₂) ｒ₂₈= 113.0798 ｄ₂₈=44.582 ｒ₂₉= -145.4000 ｄ₂₉=12.500 ｎ_248,15=1.5083 (ＳｉＯ₂) ｒ₃₀= 785.8063 ｄ₃₀=14.521 ｒ₃₁= -572.7342 ｄ₃₁=18.677 ｎ_248,16=1.5083 (ＳｉＯ₂) r₃₂= -210.7349 ｄ₃₂= 0.833 ｒ₃₃= 615.9888 ｄ₃₃=33.977 ｎ_248,17=1.5083 (ＳｉＯ₂) ｒ₃₄= -184.3613 ｄ₃₄= 0.833 ｒ₃₅= 243.9015 ｄ₃₅=21.294 ｎ_248,18=1.5083 (ＳｉＯ₂) ｒ₃₆= ∞ ｄ₃₆= 0.833 ｒ₃₇= 145.8836 ｄ₃₇=20.377 ｎ_248,19=1.5083 (ＳｉＯ₂) ｒ₃₈= 349.6684 ｄ₃₈= 0.833 ｒ₃₉= 99.0981 ｄ₃₉=56.543 ｎ_248,20=1.5083 (ＳｉＯ₂) ｒ₄₀= 55.1839 ｄ₄₀=21.646 ｒ₄₁= -279.6333 ｄ₄₁=12.500 ｎ_248,21=1.5083 (ＳｉＯ₂) ｒ₄₂= -140.8099 ｄ₄₂= 8.770 ｒ₄₃= -187.9892 ｄ₄₃=18.628 ｎ_248,22=1.5083 (ＳｉＯ₂) ｒ₄₄= 89.6294 ｄ₄₄= 0.833 ｒ₄₅= 57.9895 ｄ₄₅=30.250 ｎ_248,23=1.5083 (ＳｉＯ₂) ｒ₄₆= 155.8950 ｄ₄₆= 0.833 ｒ₄₇= 57.2342 ｄ₄₇=14.113 ｎ_248,24=1.5083 (ＳｉＯ₂) ｒ₄₈= ∞ ｄ₄₈= 8.750 Ｆ₁=-343.449 Ｆ₂= 217.296 Ｆ₃= 70.923 φ₁=-0.00685 φ₂=-0.00709 φ₁=-0.00450 φ₂=-0.00350 φ₃=-0.00921 。Example 5 NA = 0.47 exposure area 25 × 25 mm E = ∞ d₀ = 100.000 r₁ = 158.8170 d₁ = 19.241 n_248,1 = 1.5083 (SiO₂ ) r₂ = 239.7566 d₂ = 25.114 r₃ = -520.0778 d₃ = 15.000 n_248,2 = 1.5083 (SiO₂ ) r₄ = 173.3822 d₄ = 55.581 r₅ = -134.3573 d₅ = 12.500 n_248,3 = 1.5083 (SiO₂ ) r₆ = -158.9506 d₆ = 0.833 r₇ = 11353.9937 d₇ = 30.783 n_248,4 = 1.5083 (SiO₂ ) r₈ = -260.7941 d₈ = 0.833 r₉ = 236.4466 d₉ = 41.454 n_248,5 = 1.5083 (SiO₂ ) r₁₀ = -965.9305 d₁₀ = 0.833 r₁₁ = 197.3572 d₁₁ = 33.902 n_248,6 = 1.5083 (SiO₂ ) r₁₂ = 2305.5231 d₁₂ = 0.833 r₁₃ = 155.2685 d₁₃ = 39.333 n_248,7 = 1.5083 (SiO₂ ) r₁₄ = 74.2733 d₁₄ = 33.505 r₁₅ = -833.0055 d₁₅ = 16.231 n_248,8 = 1.5083 (SiO₂ ) r₁₆ = -173.1079 d₁₆ = 15.107 r₁₇ = -132.3474 d₁₇ = 12.500 n_248,9 = 1.5083 (SiO₂ ) r₁₈ = 107.5686 d₁₈ = 39.258 r₁₉ = -71.6995 d₁₉ = 12.500 n_248,10 = 1.5083 (SiO₂ ) r₂₀ = 231.6966 d₂₀ = 17.492 r₂₁ = -526.9275 d₂₁ = 36.447 n_248,11 = 1.5083 (SiO₂ ) r₂₂ = -188.3114 d₂₂ = 0.833 r₂₃ = 866.0416 d₂₃ = 36.994 n_248,12 = 1.5083 (SiO₂ ) r₂₄ = -156.0137 d₂₄ = 0.833 r₂₅ = 274.4281 d₂₅ = 33.991 n_248,13 = 1.5083 (SiO₂ ) r₂₆ = -342.0398 d₂₆ = 0.833 r₂₇ = 228.3407 d₂₇ = 25.104 n_248,14 = 1.5083 (SiO₂ ) r₂₈ = 113.0798 d₂₈ = 44.582 r₂₉ = -145.4000 d₂₉ = 12.500 n_248,15 = 1.5083 (SiO₂ ) r₃₀ = 785.8063 d₃₀ = 14.521 r₃₁ = -572.7342 d₃₁ = 18.677 n_248,16 = 1.5083 (SiO₂ ) r₃₂ = -210.7349 d₃₂ = 0.833 r₃₃ = 615.9888 d₃₃ = 33.977 n_248,17 = 1.5083 (SiO₂ ). r₃₄ = -184.3613 d₃₄ = 0.833 r₃₅ = 243.9015 d₃₅ = 21.294 n_248,18 = 1.5083 (SiO₂ ) r₃₆ = ∞ d₃₆ = 0.833 r₃₇ = 145.8836 d₃₇ = 20.377 n_248,19 = 1.5083 ( SiO₂ ) r₃₈ = 349.6684 d₃₈ = 0.833 r₃₉ = 99.0981 d₃₉ = 56.543 n_248,20 = 1.5083 (SiO₂ ) r₄₀ = 55.1839 d₄₀ = 21.646 r₄₁ = -279.6333 d₄₁ = 12.500 n_248,21 = 1.5083 (SiO₂ ) r₄₂ = -140.8099 d₄₂ = 8.770 r₄₃ = -187.9892 d₄₃ = 18.628 n_248,22 = 1.5083 (SiO₂ ) r₄₄ = 89.6294 d₄₄ = 0.833 r₄₅ = 57.9895 d₄₅ = 30.250 n_248,23 = 1.5083 (SiO₂ ) r₄₆ = 155.8950 d₄₆ = 0.833 r₄₇ = 57.2342 d₄₇ = 14.113 n_248,24 = 1.5083 (SiO₂ ) r₄₈ = ∞ d₄₈ = 8.750 F₁ = -343.449 F₂ = 217.296 F₃ = 70.923 φ₁ = -0.00685 φ₂ = -0.00709 φ₁ = -0.00450 φ₂ = -0.00350 φ₃ = -0.00921.

【００３７】実施例６ ＮＡ=0.48 露光領域 25×25 ｍｍ Ｅ=1000 ｄ₀=100.000 ｒ₁= 122.2218 ｄ₁=42.000 ｎ_248,1=1.5083 (ＳｉＯ₂) ｒ₂= 131.8406 ｄ₂=26.527 ｒ₃= -456.7383 ｄ₃=15.000 ｎ_248,2=1.5083 (ＳｉＯ₂) ｒ₄= 146.7156 ｄ₄=58.920 r₅= -109.3340 ｄ₅=15.000 ｎ_248,3=1.5083 (ＳｉＯ₂) ｒ₆= -124.4118 ｄ₆=16.650 ｒ₇=-1603.5903 ｄ₇=30.631 ｎ_248,4=1.5083 (ＳｉＯ₂) ｒ₈= -230.6638 ｄ₈= 1.000 ｒ₉= 306.7289 ｄ₉=40.340 ｎ_248,5=1.5083 (ＳｉＯ₂) ｒ₁₀= -589.4298 ｄ₁₀= 1.000 ｒ₁₁= 344.7579 ｄ₁₁=27.251 ｎ_248,6=1.5083 (ＳｉＯ₂) ｒ₁₂=-7346.6854 ｄ₁₂= 1.000 ｒ₁₃= 208.1925 ｄ₁₃=26.911 ｎ_248,7=1.5083 (ＳｉＯ₂) ｒ₁₄= 663.0676 ｄ₁₄= 1.000 ｒ₁₅= 99.4529 ｄ₁₅=15.000 ｎ_248,8=1.5083 (ＳｉＯ₂) ｒ₁₆= 71.1583 ｄ₁₆=43.911 ｒ₁₇= -572.6484 ｄ₁₇=15.000 ｎ_248,9=1.5083 (ＳｉＯ₂) ｒ₁₈= -241.4067 ｄ₁₈= 9.511 ｒ₁₉= -515.5571 ｄ₁₉=15.000 ｎ_248,10=1.5083 (ＳｉＯ₂) ｒ₂₀= 125.7783 ｄ₂₀= 9.188 ｒ₂₁= 594.4223 ｄ₂₁=15.000 ｎ_248,11=1.5083 (ＳｉＯ₂) ｒ₂₂= 136.9477 ｄ₂₂=24.889 ｒ₂₃= -73.8735 ｄ₂₃=15.000 ｎ_248,12=1.5083 (ＳｉＯ₂) ｒ₂₄= 453.6327 ｄ₂₄=13.350 ｒ₂₅= -173.8233 ｄ₂₅=20.397 ｎ_248,13=1.5083 (ＳｉＯ₂) ｒ₂₆= -131.9886 ｄ₂₆= 1.000 ｒ₂₇= 245.6658 ｄ₂₇=27.993 ｎ_248,14=1.5083 (ＳｉＯ₂) ｒ₂₈= -324.3616 ｄ₂₈= 3.841 ｒ₂₉=-1493.8830 ｄ₂₉=15.000 ｎ_248,15=1.5083 (ＳｉＯ₂) ｒ₃₀= 511.5606 ｄ₃₀= 9.729 ｒ₃₁= -931.9050 ｄ₃₁=15.000 ｎ_248,16=1.5083 (ＳｉＯ₂) ｒ₃₂= 259.1839 ｄ₃₂=14.889 ｒ₃₃=-2876.7613 ｄ₃₃=24.510 ｎ_248,17=1.5083 (ＳｉＯ₂) r₃₄=
-225.4203 ｄ₃₄= 1.000 ｒ₃₅= 396.8058 ｄ₃₅=40.820 ｎ_248,18=1.5083 (ＳｉＯ₂) ｒ₃₆= -211.6756 ｄ₃₆= 1.000 ｒ₃₇= 160.4017 ｄ₃₇=37.780 ｎ_248,19=1.5083 (ＳｉＯ₂) ｒ₃₈= 1933.4335 ｄ₃₈= 1.000 ｒ₃₉= 157.5349 ｄ₃₉=48.675 ｎ_248,20=1.5083 (ＳｉＯ₂) ｒ₄₀= 289.4471 ｄ₄₀=49.305 ｒ₄₁= 603.3704 ｄ₄₁=50.000 ｎ_248,21=1.5083 (ＳｉＯ₂) ｒ₄₂=-4086.5298 ｄ₄₂= 6.206 ｒ₄₃= -128.0736 ｄ₄₃=15.000 ｎ_248,22=1.5080 (ＳｉＯ₂) ｒ₄₄= 80.1338 ｄ₄₄= 1.000 ｒ₄₅= 54.7881 ｄ₄₅=16.776 ｎ_248,23=1.5083 (ＳｉＯ₂) ｒ₄₆= 181.4529 ｄ₄₆= 1.000 ｒ₄₇= 85.3329 ｄ₄₇=10.000 ｎ_248,24=1.5083 (ＳｉＯ₂) ｒ₄₈= ∞ ｄ₄₈= 9.000 Ｆ₁=-287.448 Ｆ₂= 174.217 Ｆ₃= 69.301 φ₁=-0.00714 φ₂=-0.00688 φ₃=-0.00176 。Example 6 NA = 0.48 exposure area 25 × 25 mm E = 1000 d₀ = 100.000 r₁ = 122.2218 d₁ = 42.000 n_248,1 = 1.5083 (SiO₂ ) r₂ = 131.8406 d₂ = 26.527 r₃ = -456.7383 d₃ = 15.000 n_248,2 = 1.5083 (SiO₂ ) r₄ = 146.7156 d₄ = 58.920 r₅ = -109.3340 d₅ = 15.000 n_248,3 = 1.5083 (SiO₂ ) r₆ = -124.4118 d₆ = 16.650 r₇ = -1603.5903 d₇ = 30.631 n_248,4 = 1.5083 (SiO₂ ) r₈ = -230.6638 d₈ = 1.000 r₉ = 306.7289 d₉ = 40.340 n_248,5 = 1.5083 (SiO₂ ) r₁₀ = -589.4298 d₁₀ = 1.000 r₁₁ = 344.7579 d₁₁ = 27.251 n_248,6 = 1.5083 (SiO₂ ) r₁₂ = -7346.6854 d₁₂ = 1.000 r₁₃ = 208.1925 d₁₃ = 26.911 n_248,7 = 1.5083 ( SiO₂ ) r₁₄ = 663.0676 d₁₄ = 1.000 r₁₅ = 99.4529 d₁₅ = 15.000 n_248,8 = 1.5083 (SiO₂ ) r₁₆ = 71.1583 d₁₆ = 43.911 r₁₇ = -572.6484 d₁₇ = 15.000 n_248,9 = 1.5083 (SiO₂ ) r₁₈ = -241.4067 d₁₈ = 9.511 r₁₉ = -515.5571 d₁₉ = 1 5.000 n_248,10 = 1.5083 (SiO₂ ) r₂₀ = 125.7783 d₂₀ = 9.188 r₂₁ = 594.4223 d₂₁ = 15.000 n_248,11 = 1.5083 (SiO₂ ) r₂₂ = 136.9477 d₂₂ = 24.889 r₂₃ = -73.8735 d₂₃ = 15.000 n_248,12 = 1.5083 (SiO₂ ) r₂₄ = 453.6327 d₂₄ = 13.350 r₂₅ = -173.8233 d₂₅ = 20.397 n_248,13 = 1.5083 (SiO₂ ) r₂₆ = -131.9886 d₂₆ = 1.000 r₂₇ = 245.6658 d₂₇ = 27.993 n_248,14 = 1.5083 (SiO₂ ) r₂₈ = -324.3616 d₂₈ = 3.841 r₂₉ = -1493.8830 d₂₉ = 15.000 n_248,15 = 1.5083 (SiO₂ ) r₃₀ = 511.5606 d₃₀ = 9.729 r₃₁ = -931.9050 d₃₁ = 15.000 n_248,16 = 1.5083 (SiO₂ ) r₃₂ = 259.1839 d₃₂ = 14.889 r₃₃ = -2876.7613 d₃₃ = 24.510 n_248,17 = 1.5083 (SiO₂ ) r₃₄ =
-225.4203 d₃₄ = 1.000 r₃₅ = 396.8058 d₃₅ = 40.820 n_248,18 = 1.5083 (SiO₂ ) r₃₆ = -211.6756 d₃₆ = 1.000 r₃₇ = 160.4017 d₃₇ = 37.780 n_248,19 = 1.5083 (SiO₂ ) r₃₈ = 1933.4335 d₃₈ = 1.000 r₃₉ = 157.5349 d₃₉ = 48.675 n_248,20 = 1.5083 (SiO₂ ) r₄₀ = 289.4471 d₄₀ = 49.305 r₄₁ = 603.3704 d₄₁ = 50.000 n_248,21 = 1.5083 ( SiO₂ ) r₄₂ = -4086.5298 d₄₂ = 6.206 r₄₃ = -128.0736 d₄₃ = 15.000 n_248,22 = 1.5080 (SiO₂ ) r₄₄ = 80.1338 d₄₄ = 1.000 r₄₅ = 54.7881 d₄₅ = 16.776 n_{248, 23} = 1.5083 (SiO₂ ) r₄₆ = 181.4529 d₄₆ = 1.000 r₄₇ = 85.3329 d₄₇ = 10.000 n_248,24 = 1.5083 (SiO₂ ) r₄₈ = ∞ d₄₈ = 9.000 F₁ = -287.448 F₂ = 174.217 F₃ = 69.301 φ₁ = -0.00714 φ₂ = -0.00688 φ₃ = -0.00176.

【００３８】実施例７ ＮＡ=0.48 露光領域 25×25 ｍｍ Ｅ=1000 ｄ₀=100.000 ｒ₁= 123.3658 ｄ₁=18.768 ｎ_248,1=1.5083 (ＳｉＯ₂) ｒ₂= 123.8122 ｄ₂=31.218 ｒ₃= -498.8768 ｄ₃=15.000 ｎ_248,2=1.5083 (ＳｉＯ₂) ｒ₄= 172.6737 ｄ₄=49.975 ｒ₅= -110.7247 ｄ₅=15.000 ｎ_248,3=1.5083 (ＳｉＯ₂) ｒ₆= -129.4457 ｄ₆= 1.000 ｒ₇=-3947.7165 ｄ₇=32.190 ｎ_248,4=1.5083 (ＳｉＯ₂) r₈= -232.1087 ｄ₈= 1.000 ｒ₉= 389.1147 ｄ₉=39.911 ｎ_248,5=1.5083 (ＳｉＯ₂) ｒ₁₀= -430.7653 ｄ₁₀= 1.000 ｒ₁₁= 192.5059 ｄ₁₁=44.254 ｎ_248,6=1.5083 (ＳｉＯ₂) ｒ₁₂=-1743.8050 ｄ₁₂= 1.000 ｒ₁₃= 132.0319 ｄ₁₃=34.793 ｎ_248,7=1.5083 (ＳｉＯ₂) ｒ₁₄= 74.3519 ｄ₁₄=42.281 ｒ₁₅= -332.3886 ｄ₁₅=15.827 ｎ_248,8=1.5083 (ＳｉＯ₂) ｒ₁₆= -167.3614 ｄ₁₆= 1.000 ｒ₁₇= -241.8117 ｄ₁₇=43.457 ｎ_248,9=1.5083 (ＳｉＯ₂) ｒ₁₈= 171.1876 ｄ₁₈= 7.936 ｒ₁₉= 1020.6841 ｄ₁₉=15.000 ｎ_248,10=1.5083 (ＳｉＯ₂) ｒ₂₀= 174.9693 ｄ₂₀=28.528 ｒ₂₁= -71.1009 ｄ₂₁=35.689 ｎ_248,11=1.5083 (ＳｉＯ₂) ｒ₂₂= 887.0010 ｄ₂₂=12.714 ｒ₂₃= -285.9543 ｄ₂₃=25.520 ｎ_248,12=1.5083 (ＳｉＯ₂) ｒ₂₄= -167.7632 ｄ₂₄= 1.113 ｒ₂₅=-4840.1342 ｄ₂₅=32.591 ｎ_248,13=1.5083 (ＳｉＯ₂) ｒ₂₆= -178.2112 ｄ₂₆=52.896 ｒ₂₇=80941.2159 ｄ₂₇=33.607 ｎ_248,14=1.5083 (ＳｉＯ₂) ｒ₂₈= -229.9629 ｄ₂₈= 1.000 ｒ₂₉= 546.6617 ｄ₂₉=25.562 ｎ_248,15=1.5083 (ＳｉＯ₂) ｒ₃₀= -718.3377 ｄ₃₀= 1.000 ｒ₃₁= 190.6956 ｄ₃₁=28.558 ｎ_248,16=1.5083 (ＳｉＯ₂) ｒ₃₂= 945.1528 ｄ₃₂= 1.000 ｒ₃₃= 165.1537 ｄ₃₃=19.762 ｎ_248,17=1.5083 (ＳｉＯ₂) ｒ₃₄= 272.3522 ｄ₃₄= 1.000 ｒ₃₅= 108.8985 ｄ₃₅=36.791 ｎ_248,18=1.5083 (ＳｉＯ₂) ｒ₃₆= 82.9680 ｄ₃₆=18.432 r₃₇= 650.5592 ｄ₃₇=25.135 ｎ_248,19=1.5083 (ＳｉＯ₂) ｒ₃₈= -325.9244 ｄ₃₈= 1.986 ｒ₃₉= -275.1850 ｄ₃₉=15.000 ｎ_248,20=1.5083 (ＳｉＯ₂) ｒ₄₀= 68.8076 ｄ₄₀=33.857 ｒ₄₁= 61.0827 ｄ₄₁=26.023 ｎ_248,21=1.5083 (ＳｉＯ₂) ｒ₄₂= 140.8818 ｄ₄₂= 1.000 ｒ₄₃= 76.1085 ｄ₄₃=10.000 ｎ_248,22=1.5083 (ＳｉＯ₂) ｒ₄₄= -210.8257 ｄ₄₄= 1.624 ｒ₄₅= -183.0680 ｄ₄₅=10.000 ｎ_248,23=1.5083 (ＳｉＯ₂) ｒ₄₆= ∞ ｄ₄₆= 9.001 Ｆ₁=-254.075 Ｆ₂= 141.816 Ｆ₃= 49.773 φ₁=-0.00684 φ₂=-0.00715 φ₃=-0.00613 。Example 7 NA = 0.48 exposure area 25 × 25 mm E = 1000 d₀ = 100.000 r₁ = 123.3658 d₁ = 18.768 n_248,1 = 1.5083 (SiO₂ ) r₂ = 123.8122 d₂ = 31.218 r₃ = -498.8768 d₃ = 15.000 n_248,2 = 1.5083 (SiO₂ ) r₄ = 172.6737 d₄ = 49.975 r₅ = -110.7247 d₅ = 15.000 n_248,3 = 1.5083 (SiO₂ ) r₆ = -129.4457 d₆ = 1.000 r₇ = -3947.7165 d₇ = 32.190 n_248,4 = 1.5083 (SiO₂ ) r₈ = -232.1087 d₈ = 1.000 r₉ = 389.1147 d₉ = 39.911 n_248,5 = 1.5083 (SiO₂ ) r₁₀ = -430.7653 d₁₀ = 1.000 r₁₁ = 192.5059 d₁₁ = 44.254 n_248,6 = 1.5083 (SiO₂ ) r₁₂ = -1743.8050 d₁₂ = 1.000 r₁₃ = 132.0319 d₁₃ = 34.793 n_248,7 = 1.5083 ( SiO₂ ) r₁₄ = 74.3519 d₁₄ = 42.281 r₁₅ = -332.3886 d₁₅ = 15.827 n_248,8 = 1.5083 (SiO₂ ) r₁₆ = -167.3614 d₁₆ = 1.000 r₁₇ = -241.8117 d₁₇ = 43.457 n_{248 , 9} = 1.5083 (SiO₂ ) r₁₈ = 171.1876 d₁₈ = 7.936 r₁₉ = 1020.6841 d₁₉ = 15.000 n_248,10 = 1.5083 (SiO₂ ) r₂₀ = 174.9693 d₂₀ = 28.528 r₂₁ = -71.1009 d₂₁ = 35.689 n_248,11 = 1.5083 (SiO₂ ) r₂₂ = 887.0010 d₂₂ = 12.714 r₂₃ = -285.9543 d₂₃ = 25.520 n_248,12 = 1.5083 (SiO₂ ) r₂₄ = -167.7632 d₂₄ = 1.113 r₂₅ = -4840.1342 d₂₅ = 32.591 n_248,13 = 1.5083 (SiO₂ ) r₂₆ = -178.2112 d₂₆ = 52.896 r₂₇ = 80941.2159 d₂₇ = 33.607 n_248,14 = 1.5083 (SiO₂ ) r₂₈ = -229.9629 d₂₈ = 1.000 r₂₉ = 546.6617 d₂₉ = 25.562 n_248,15 = 1.5083 (SiO₂ ) r₃₀ = -718.3377 d₃₀ = 1.000 r₃₁ = 190.6956 d₃₁ = 28.558 n_248,16 = 1.5083 (SiO₂ ) r₃₂ = 945.1528 d₃₂ = 1.000 r₃₃ = 165.1537 d₃₃ = 19.762 n_248,17 = 1.5083 (SiO₂ ) r₃₄ = 272.3522 d₃₄ = 1.000 r₃₅ = 108.8985 d₃₅ = 36.791 n_248,18 = 1.5083 (SiO₂ ) r₃₆ = 82.9680 d₃₆ = 18.432 r₃₇ = 650.5592 d₃₇ = 25.135 n_248,19 = 1.5083 (_{SiO 2) r 38 = -325.9244 d} 38 = 1.986 r 39 = -275.1850_{39 = 15.000 n 248,20 = 1.5083 (} SiO 2) r 40 = 68.8076 d 40 = 33.857 r 41 = 61.0827 d 41 = 26.023 n 248,21 = 1.5083 (SiO 2) r 42 = 140.8818 d 42 = 1.000 r 43 = 76.1085 d₄₃ = 10.000 n_248,22 = 1.5083 (SiO₂ ) r₄₄ = -210.8257 d₄₄ = 1.624 r₄₅ = -183.0680 d₄₅ = 10.000 n_248,23 = 1.5083 (SiO₂ ) r₄₆ = ∞ d₄₆ = 9.001 F₁ = -254.075 F₂ = 141.816 F₃ = 49.773 φ₁ = -0.00684 φ₂ = -0.00715 φ₃ = -0.00613.

【００３９】実施例８ ＮＡ=0.52 露光領域 25×25 ｍｍ Ｅ=874.0 ｄ₀=100.000 ｒ₁= 111.7880 ｄ₁=16.214 ｎ_248,1=1.5083 (ＳｉＯ₂) ｒ₂= 123.4881 ｄ₂=35.706 ｒ₃= -348.6845 ｄ₃=15.000 ｎ_248,2=1.5083 (ＳｉＯ₂) ｒ₄= 164.8758 ｄ₄=56.185 ｒ₅= -104.1790 ｄ₅=19.988 ｎ_248,3=1.5083 (ＳｉＯ₂) ｒ₆= -127.9442 ｄ₆= 1.000 ｒ₇= -988.3088 ｄ₇=35.450 ｎ_248,4=1.5083 (ＳｉＯ₂) ｒ₈= -202.1689 ｄ₈= 1.000 ｒ₉= 396.2774 ｄ₉=42.997 ｎ_248,5=1.5083 (ＳｉＯ₂) ｒ₁₀= -455.9975 ｄ₁₀= 1.000 ｒ₁₁= 317.7947 ｄ₁₁=33.108 ｎ_248,6=1.5083 (ＳｉＯ₂) ｒ₁₂=-2661.3524 ｄ₁₂= 1.000 r₁₃= 190.6737 ｄ₁₃=30.320 ｎ_248,7=1.5083 (ＳｉＯ₂) ｒ₁₄= 565.1670 ｄ₁₄= 1.000 ｒ₁₅= 96.2734 ｄ₁₅=15.000 ｎ_248,8=1.5083 (ＳｉＯ₂) ｒ₁₆= 68.6751 ｄ₁₆=43.994 ｒ₁₇=-9282.0807 ｄ₁₇=16.617 ｎ_248,9=1.5083 (ＳｉＯ₂) ｒ₁₈= -271.6829 ｄ₁₈= 1.000 ｒ₁₉= -406.2942 ｄ₁₉=15.000 ｎ_248,10=1.5083 (ＳｉＯ₂) ｒ₂₀= 118.7133 ｄ₂₀=11.932 ｒ₂₁= 1567.6905 ｄ₂₁=15.000 ｎ_248,11=1.5083 (ＳｉＯ₂) ｒ₂₂= 134.3926 ｄ₂₂=27.019 ｒ₂₃= -74.6080 ｄ₂₃=15.000 ｎ_248,12=1.5083 (ＳｉＯ₂) ｒ₂₄= 503.2389 ｄ₂₄=13.695 ｒ₂₅= -189.2346 ｄ₂₅=16.706 ｎ_248,13=1.5083 (ＳｉＯ₂) ｒ₂₆= -130.1851 ｄ₂₆= 1.000 ｒ₂₇= 247.8524 ｄ₂₇=30.749 ｎ_248,14=1.5083 (ＳｉＯ₂) ｒ₂₈= -271.8151 ｄ₂₈= 1.000 ｒ₂₉= -788.0965 ｄ₂₉=15.000 ｎ_248,15=1.5083 (ＳｉＯ₂) ｒ₃₀= 454.5327 ｄ₃₀=10.242 ｒ₃₁=-1211.5252 ｄ₃₁=15.000 ｎ_248,16=1.5083 (ＳｉＯ₂) ｒ₃₂= 257.7440 ｄ₃₂=15.420 ｒ₃₃=-4049.8333 ｄ₃₃=25.467 ｎ_248,17=1.5083 (ＳｉＯ₂) ｒ₃₄= -229.8300 ｄ₃₄= 1.000 ｒ₃₅= 391.4166 ｄ₃₅=44.040 ｎ_248,18=1.5083 (ＳｉＯ₂) ｒ₃₆= -208.8223 ｄ₃₆= 1.000 ｒ₃₇= 159.7557 ｄ₃₇=40.383 ｎ_248,19=1.5083 (ＳｉＯ₂) ｒ₃₈= 1991.5753 ｄ₃₈= 1.000 ｒ₃₉= 147.8854 ｄ₃₉=49.645 ｎ_248,20=1.5083 (ＳｉＯ₂) ｒ₄₀= 182.5940 ｄ₄₀=50.209 ｒ₄₁= 169.5532 ｄ₄₁=38.119 ｎ_248,21=1.5083 (ＳｉＯ₂) r₄₂= 616.6126 ｄ₄₂= 7.377 ｒ₄₃= -144.3126 ｄ₄₃=15.000 ｎ_248,22=1.5083 (ＳｉＯ₂) ｒ₄₄= 73.4065 ｄ₄₄= 1.000 ｒ₄₅= 53.1077 ｄ₄₅=16.417 ｎ_248,23=1.5083 (ＳｉＯ₂) ｒ₄₆= 138.8285 ｄ₄₆= 1.000 ｒ₄₇= 81.6751 ｄ₄₇=10.000 ｎ_248,24=1.5083 (ＳｉＯ₂) ｒ₄₈= ∞ ｄ₄₈= 9.001 Ｆ₁=-240.598 Ｆ₂= 167.965 Ｆ₃= 66.235 φ₁=-0.00740 φ₂=-0.00681 φ₃=-0.00278 。Example 8 NA = 0.52 exposure area 25 × 25 mm E = 874.0 d₀ = 100.000 r₁ = 111.7880 d₁ = 16.214 n_248,1 = 1.5083 (SiO₂ ) r₂ = 123.4881 d₂ = 35.706 r₃ = -348.6845 d₃ = 15.000 n_248,2 = 1.5083 (SiO₂ ) r₄ = 164.8758 d₄ = 56.185 r₅ = -104.1790 d₅ = 19.988 n_248,3 = 1.5083 (SiO₂ ) r₆ = -127.9442 d₆ = 1.000 r₇ = -988.3088 d₇ = 35.450 n_248,4 = 1.5083 (SiO₂ ) r₈ = -202.1689 d₈ = 1.000 r₉ = 396.2774 d₉ = 42.997 n_248,5 = 1.5083 (SiO₂ ) r₁₀ = -455.9975 d₁₀ = 1.000 r₁₁ = 317.7947 d₁₁ = 33.108 n_248,6 = 1.5083 (SiO₂ ) r₁₂ = -2661.3524 d₁₂ = 1.000 r₁₃ = 190.6737 d₁₃ = 30.320 n_248,7 = 1.5083 ( SiO₂ ) r₁₄ = 565.1670 d₁₄ = 1.000 r₁₅ = 96.2734 d₁₅ = 15.000 n_248,8 = 1.5083 (SiO₂ ) r₁₆ = 68.6751 d₁₆ = 43.994 r₁₇ = -9282.0807 d₁₇ = 16.617 n_248,9 = 1.5083 (SiO₂ ) r₁₈ = -271.6829 d₁₈ = 1.000 r₁₉ = -406.2942 d₁₉ = 15.000 n_248,10 = 1.5083 (SiO₂ ) r₂₀ = 118.7133 d₂₀ = 11.932 r₂₁ = 1567.6905 d₂₁ = 15.000 n_248,11 = 1.5083 (SiO₂ ) r₂₂ = 134.3926 d₂₂ = 27.019 r₂₃ = -74.6080 d₂₃ = 15.000 n_248,12 = 1.5083 (SiO₂ ) r₂₄ = 503.2389 d₂₄ = 13.695 r₂₅ = -189.2346 d₂₅ = 16.706 n_248,13 = 1.5083 (SiO₂ ) r₂₆ = -130.1851 d₂₆ = 1.000 r₂₇ = 247.8524 d₂₇ = 30.749 n_248,14 = 1.5083 (SiO₂ ) r₂₈ = -271.8151 d₂₈ = 1.000 r₂₉ = -788.0965 d₂₉ = 15.000 n_248,15 = 1.5083 (SiO₂ ) r₃₀ = 454.5327 d₃₀ = 10.242 r₃₁ = -1211.5252 d₃₁ = 15.000 n_248,16 = 1.5083 (SiO₂ ) r₃₂ = 257.7440 d₃₂ = 15.420 r₃₃ = -4049.8333 d₃₃ = 25.467 n_248,17 = 1.5083 (SiO₂ ). r₃₄ = -229.8300 d₃₄ = 1.000 r₃₅ = 391.4166 d₃₅ = 44.040 n_248,18 = 1.5083 (SiO₂ ) r₃₆ = -208.8223 d₃₆ = 1.000 r₃₇ = 159.7557 d₃₇ = 40.383 n_248,19 = 1.5083 (SiO₂ ) r₃₈ = 1991.5753 d₃₈ = 1.000 r₃₉ = 147.885 4 d₃₉ = 49.645 n_248,20 = 1.5083 (SiO₂ ) r₄₀ = 182.5940 d₄₀ = 50.209 r₄₁ = 169.5532 d₄₁ = 38.119 n_248,21 = 1.5083 (SiO₂ ) r₄₂ = 616.6126 d₄₂ = 7.377 r₄₃ = -144.3126 d₄₃ = 15.000 n_248,22 = 1.5083 (SiO₂ ) r₄₄ = 73.4065 d₄₄ = 1.000 r₄₅ = 53.1077 d₄₅ = 16.417 n_248,23 = 1.5083 (SiO₂ ) r₄₆ = 138.8285 d₄₆ = 1.000 r₄₇ = 81.6751 d₄₇ = 10.000 n_248,24 = 1.5083 (SiO₂ ) r₄₈ = ∞ d₄₈ = 9.001 F₁ = -240.598 F₂ = 167.965 F₃ = 66.235 φ₁ = -0.00740 φ₂ =- 0.00681 φ₃ = -0.00278.

【００４０】以上の実施例１〜８の球面収差、非点収
差、歪曲収差、コマ収差を表す収差図をそれぞれ図９か
ら図１６に示す。9 to 16 are aberration diagrams showing the spherical aberration, astigmatism, distortion and coma of Examples 1 to 8 described above.

【００４１】[0041]

【発明の効果】以上説明したように、本発明の縮小投影
レンズによると、入射瞳位置を物体面から比較的遠くに
位置させ、像歪みが小さく、短波長光を光源とする高解
像力で焦点深度の広い縮小投影レンズを得ることができ
る。As described above, according to the reduction projection lens of the present invention, the position of the entrance pupil is located relatively far from the object plane, the image distortion is small, and the focal point is high resolution using short wavelength light as the light source. A reduction projection lens with a wide depth can be obtained.

【図面の簡単な説明】[Brief description of drawings]

【図１】本発明の実施例１の縮小投影レンズの断面図で
ある。FIG. 1 is a sectional view of a reduction projection lens according to a first embodiment of the present invention.

【図２】本発明の実施例２の縮小投影レンズの断面図で
ある。FIG. 2 is a sectional view of a reduction projection lens according to a second exemplary embodiment of the present invention.

【図３】本発明の実施例３の縮小投影レンズの断面図で
ある。FIG. 3 is a sectional view of a reduction projection lens according to a third exemplary embodiment of the present invention.

【図４】本発明の実施例４の縮小投影レンズの断面図で
ある。FIG. 4 is a sectional view of a reduction projection lens according to a fourth exemplary embodiment of the present invention.

【図５】本発明の実施例５の縮小投影レンズの断面図で
ある。FIG. 5 is a sectional view of a reduction projection lens according to a fifth exemplary embodiment of the present invention.

【図６】本発明の実施例６の縮小投影レンズの断面図で
ある。FIG. 6 is a sectional view of a reduction projection lens according to embodiment 6 of the present invention.

【図７】本発明の実施例７の縮小投影レンズの断面図で
ある。FIG. 7 is a sectional view of a reduction projection lens according to a seventh embodiment of the present invention.

【図８】本発明の実施例８の縮小投影レンズの断面図で
ある。FIG. 8 is a sectional view of a reduction projection lens according to Example 8 of the present invention.

【図９】実施例１の球面収差、非点収差、歪曲収差、コ
マ収差を表す収差図である。FIG. 9 is an aberration diagram illustrating spherical aberration, astigmatism, distortion, and coma of Example 1.

【図１０】実施例２の図９の同様な収差図である。FIG. 10 is an aberration diagram similar to FIG. 9 of Example 2.

【図１１】実施例３の図９の同様な収差図である。FIG. 11 is a similar aberration diagram of FIG. 9 of Example 3;

【図１２】実施例４の図９の同様な収差図である。FIG. 12 is a similar aberration diagram of FIG. 9 of Example 4.

【図１３】実施例５の図９の同様な収差図である。FIG. 13 is a diagram of aberrations similar to FIG. 9 of Example 5;

【図１４】実施例６の図９の同様な収差図である。FIG. 14 is an aberration diagram similar to that of FIG. 9 of Example 6;

【図１５】実施例７の図９の同様な収差図である。FIG. 15 is a similar aberration diagram of FIG. 9 of Example 7.

【図１６】実施例８の図９の同様な収差図である。FIG. 16 is a similar aberration diagram of FIG. 9 of Example 8.

【符号の説明】[Explanation of symbols]

Ｉ …第１レンズ群 II …第２レンズ群 III …第３レンズ群 I ... 1st lens group II ... 2nd lens group III ... 3rd lens group

Claims (3)

Translated fromJapanese

【特許請求の範囲】[Claims]【請求項１】 物体側より順に、互いに凹面を向かい合
わせた一対のメニスカスレンズを含んでなる第１レンズ
群、正の屈折力を持ち少なくとも２枚のレンズにより構
成された第２レンズ群、正の屈折力を持った第３レンズ
群より構成され、レンズ系の第１面より測った入射瞳位
置をＥ、物像間距離をＬ、第１レンズ群の焦点距離をＦ
₁とするとき、 ０．５＜｜Ｅ／Ｌ｜ ０．２＜｜Ｆ₁／Ｌ｜ なる条件を満足することを特徴とする縮小投影レンズ。1. A first lens group including a pair of meniscus lenses having concave surfaces facing each other in order from the object side, a second lens group having at least two lenses having a positive refractive power, and a positive lens group. E is the entrance pupil position measured from the first surface of the lens system, L is the object-image distance, and F is the focal length of the first lens group.
When the_{1, 0.5 <| E / L} | 0.2 <| F 1 / L | becomes reduction projection lens which satisfies the condition.【請求項２】 第２レンズ群の焦点距離をＦ₂とすると
き、 ０．１＜｜Ｆ₂／Ｌ｜＜０．３ なる条件を満足することを特徴とする請求項１記載の縮
小投影レンズ。2. The reduced projection according to claim 1, wherein when the focal length of the second lens unit is F₂ , the condition 0.1 <| F₂ /L|<0.3 is satisfied. lens.【請求項３】 第３レンズ群の焦点距離をＦ₃とすると
き、 ０．０４＜｜Ｆ₃／Ｌ｜＜０．１ なる条件を満足することを特徴とする請求項１又は２記
載の記載の縮小投影レンズ。3. When the focal length of the third lens group is F₃ , the condition 0.04 <| F₃ /L|<0.1 is satisfied. The reduction projection lens described.