【発明の詳細な説明】［産業上の利用分野］本発明は、案内溝付き情報記録用基板の製造方法に関す
る。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method of manufacturing an information recording substrate with guide grooves.
［従来の技術］従来、この種の案内溝付き情報記録用基板は、例えば特
公昭５３−３３２４４号公報に記載の如く、以下のよう
にして製造されていた。[Prior Art] Conventionally, this type of information recording substrate with guide grooves has been manufactured in the following manner, as described in, for example, Japanese Patent Publication No. 53-33244.
すなわち、先ず案内溝に対応する凹凸を有するスタンパ
−上に高粘性の紫外線硬化型樹脂をデイスペンサーで滴
下する。このデイスペンサーによる樹脂の滴下は、例え
ばスタンパ−を回転させることにより、樹脂が円形のス
タンパ−の半径のほぼ中央部に同心円状に配置されるよ
うに行なわれる。That is, first, a highly viscous ultraviolet curable resin is dropped with a dispenser onto a stamper having irregularities corresponding to the guide grooves. The resin is dropped by the dispenser, for example, by rotating the stamper so that the resin is arranged concentrically at approximately the center of the radius of the circular stamper.
次に樹脂が滴下されたスタンパ−上に、例えばガラス製
の透明ディスク基板を載置した後、油圧機器等により押
圧し、樹脂をスタンパ−と透明ディスク基板との間に押
し拡げ、スタンパ−の凹部にも樹脂を充填させる。Next, a transparent disk substrate made of glass, for example, is placed on the stamper onto which the resin has been dripped, and then pressed with a hydraulic device or the like to spread the resin between the stamper and the transparent disk substrate. The recesses are also filled with resin.
次に透明ディスク基板の上から紫外線を照射して紫外線
硬化型樹脂を硬化させることにより、案内溝を形成する
とともに、この案内溝を透明ディスク基板上に固着させ
た後、透明ディスク基板をスタンパ−から剥離して、目
的とする案内溝付き情報記録用基板を得る。Next, guide grooves are formed by irradiating ultraviolet rays from above the transparent disk substrate to cure the ultraviolet curable resin, and after fixing the guide grooves onto the transparent disk substrate, the transparent disk substrate is attached to the stamper. The desired information recording substrate with guide grooves is obtained by peeling from the substrate.
［発明が解決しようとする課題］しかしながら、前述の従来の情報記録用基板の製造方法
では、一般に１００〜８００セン・チボイズという高粘
性の紫外線硬化型樹脂（例えばジペンタエリスリトール
ペンタアクリレート、ジペンタエリスリトールへキサア
クリレート等の多官能性アクリレート）を用いているた
め、スタンバ−上に押し拡げられた樹脂内に気泡が残留
してしまい、その気泡によって、スタンバ−の凹凸が転
写されることにより形成される案内溝の凸部にカケが生
じたり、最悪の場合には凸部が形成されないという事態
が生じて、スタンバ−の凹凸に忠実に対応する案内溝を
得ることができない。そしてこのような案内溝に欠陥の
ある情報記録用基板を用いて光磁気ディスクを作製する
と、光磁気ディスクの記録特性等の悪化という問題が生
じる。[Problems to be Solved by the Invention] However, in the conventional method for manufacturing information recording substrates described above, ultraviolet curable resins with a high viscosity of 100 to 800 centimeters (for example, dipentaerythritol pentaacrylate, dipentaerythritol pentaacrylate, dipentaerythritol Because polyfunctional acrylate (such as hexaacrylate) is used, air bubbles remain in the resin that is pressed and spread on the stambar, and these air bubbles transfer the unevenness of the stambar. In the worst case, the convex portion of the guide groove may be chipped, or in the worst case, the convex portion may not be formed, making it impossible to obtain a guide groove that faithfully corresponds to the irregularities of the stub bar. If a magneto-optical disk is manufactured using an information recording substrate having such a defective guide groove, a problem arises in that the recording characteristics of the magneto-optical disk deteriorate.
本発明はこのような問題点乃至欠点を除去するためにな
されたものであり、その目的は、硬化型樹脂内の気泡の
残留を防止することにより、スタンバ−の凹凸に忠実に
対応する案内溝を形成することが可能な案内溝付き情報
記録用基板の製造方法を提供することにある。The present invention has been made to eliminate these problems and drawbacks, and its purpose is to create a guide groove that faithfully corresponds to the irregularities of the stub bar by preventing air bubbles from remaining in the hardened resin. An object of the present invention is to provide a method for manufacturing an information recording substrate with guide grooves, which allows formation of a guide groove.
［課題を解決するための手段］本発明は、上述の目的を達成するためになされたもので
あり、本発明の案内溝付き情報記録用基板の製造方法は
、基板上及び／又は案内溝に対応する凹凸形状を有する
スタンバ−の前記凹凸形状面上に硬化型樹脂を塗布した
後、前記基板と前記スタンバ−とを、これらの間に前記
硬化型樹脂が配置されるように積層し、次いで前記基板
と前記スタンバ−との間を減圧にして、前記基板と前記
スタンバ−の少なくとも一方の側から加圧し、しかる後
、前記硬化型樹脂を硬化させ、前記スタンバ−の凹凸形
状が転写された硬化済み樹脂膜が固着された前記基板を
前記スタンバ−から剥離することを特徴とする。[Means for Solving the Problems] The present invention has been made to achieve the above-mentioned object, and the method for manufacturing an information recording substrate with guide grooves of the present invention provides After applying a curable resin onto the uneven surface of the stub bar having a corresponding uneven shape, the substrate and the stub bar are laminated so that the curable resin is placed between them, and then The pressure is reduced between the substrate and the stub bar, and pressure is applied from at least one side of the substrate and the stan bar, and then the curable resin is cured, and the uneven shape of the stan bar is transferred. The method is characterized in that the substrate to which the cured resin film is fixed is peeled off from the stand bar.
［作用］本発明によれば、基板とスタンバ−との間を減圧にする
ことにより、これらの間に存在する硬化型樹脂中の気泡
の残留を防止することができる。[Operation] According to the present invention, by reducing the pressure between the substrate and the stand bar, it is possible to prevent bubbles from remaining in the curable resin existing between them.
［実施例］以下、本発明の実施例を図面を参照しながら説明する。[Example]Embodiments of the present invention will be described below with reference to the drawings.
実施例１ソーダライムガラスからなり、外径１３０■、中心部孔
径１５ｍｍのディスク基板１上に、紫外線硬化型樹脂２
（大日本インキ■製ダイキュアクリアＳＴＭ−４０１，
粘度３２０センチポイズ）をデイスペンサーによりディ
スク基板１の半径方向のほぼ中央部に塗布した（第１図
（ａ）参照）。Example 1 An ultraviolet curable resin 2 was placed on a disk substrate 1 made of soda lime glass and having an outer diameter of 130 mm and a center hole diameter of 15 mm.
(Daicure Clear STM-401 manufactured by Dainippon Ink ■,
A viscosity of 320 centipoise) was applied to approximately the center of the disk substrate 1 in the radial direction using a dispenser (see FIG. 1(a)).
次に、ディスク基板１を紫外線硬化型樹脂２が下向きに
なるよに裏返した後、紫外線硬化型樹脂２とスタンバ−
３の凹凸形状面が向かい合うようにディスク基板１とス
タンバ−３とを積層した（第１図（ｂ）参照）。Next, after turning the disk substrate 1 over so that the ultraviolet curable resin 2 is facing downward, the ultraviolet curable resin 2 and the stand bar are
The disk substrate 1 and the stand bar 3 were stacked so that the uneven surfaces of the disk substrate 3 faced each other (see FIG. 1(b)).
なお、スタンバ−は凸部の幅が０．６〜０．８μ■、凹
部の幅が０．８〜１．０μ履、凹部の深さが約７５０人
のものを用いた。The stambar used had a protrusion width of 0.6 to 0.8 .mu.m, a recess width of 0.8 to 1.0 .mu.m, and a recess depth of about 750 mm.
次に、積層されたディスク基板１とスタンバ−３とを処
理容器４内に入れた後、ディスク基板１とスタンバ−３
との間をＩ Ｔｏｒｒの減圧にすることにより紫外線硬
化型樹脂２中に残留する気泡を除去し、かつディスク基
板１とスタンバ−３との間を減圧にした状態で、ディス
ク基板１とスタンバ−３の両側からそれぞれ圧力０．５
ｋｇ／ｃ−で加圧し、ディスク基板１とスタンバ−３と
の間に、気泡がなく均一な紫外線硬化型樹脂膜２ａを形
成させた（第１図（ｃ）参照）。この処理容器４内の減
圧及び加圧操作を更に説明すると、処理容器４中の内室
５は、内室５の内壁に固着されているＯリング６によっ
て、減圧される空間部分Ａと加圧される空間部分Ｂとが
互いに隔離されており、ディスク基板１とスタンバ−３
との間の減圧化は、前記空間部分Ａに連絡して設けられ
た真空ポンプを作動することにより達成される。またデ
ィスク基板１とスタンバ−３の両側からの加圧化は、Ｎ
２ガス等の加圧用ガスを前記空間部分Ｂに導入すること
により達成される。Next, after putting the laminated disk substrate 1 and stand bar 3 into the processing container 4, the disk substrate 1 and stand bar 3 are placed in the processing container 4.
The air bubbles remaining in the ultraviolet curable resin 2 are removed by reducing the pressure to I Torr between the disc substrate 1 and the stand bar 3, and the pressure is reduced between the disk substrate 1 and the stand bar 3. Pressure 0.5 from each side of 3
A pressure of kg/c- was applied to form a bubble-free and uniform ultraviolet curable resin film 2a between the disk substrate 1 and the stand bar 3 (see FIG. 1(c)). To further explain the depressurization and pressurization operations inside the processing container 4, an inner chamber 5 in the processing container 4 is connected to a space portion A to be depressurized and a pressurized portion by an O-ring 6 fixed to the inner wall of the inner chamber 5. A space portion B is isolated from each other, and the disk substrate 1 and the stand bar 3 are
The pressure reduction between the two spaces is achieved by operating a vacuum pump provided in communication with the space portion A. In addition, the pressure applied from both sides of the disk substrate 1 and stand bar 3 is N
This is achieved by introducing a pressurizing gas such as 2 gas into the space B.
次に、ディスク基板１とスタンバ−３とが圧着された状
態で、処理装置４の外部の紫外線８（紫外線ランプ使用
、出力３００Ｗ）をガラス製の上板７を透過させてディ
スク基板１上に３０秒間照射して紫外線硬化型樹脂膜２
ａを硬化させて案内溝９を形成した（第１図（ｃ）参照
）。なお、この硬化により、紫外線硬化型樹脂膜２ａと
ディスク基板１とが固着された。Next, with the disk substrate 1 and the stand bar 3 pressed together, ultraviolet light 8 (using an ultraviolet lamp, output 300W) from the outside of the processing device 4 is transmitted through the glass upper plate 7 and onto the disk substrate 1. UV curable resin film 2 by irradiating for 30 seconds
A was cured to form a guide groove 9 (see FIG. 1(c)). Note that, by this curing, the ultraviolet curable resin film 2a and the disk substrate 1 were fixed together.
次に、処理装置４から、積層されたディスク基板１とス
タンパ−３とを取り出した後、前者を後者から剥離する
ことにより、目的とする案内溝９付きディスク基板１を
得た（第１図（ｄ）参照）。Next, after taking out the laminated disk substrate 1 and stamper 3 from the processing device 4, the former was peeled off from the latter to obtain the desired disk substrate 1 with guide grooves 9 (see Fig. 1). (see (d)).
なお、紫外線硬化型樹脂２がディスク基板１の側面に金
分に付着しているときは、例えば薄刃等で除去すればよ
い。Incidentally, when the ultraviolet curable resin 2 is attached to gold on the side surface of the disk substrate 1, it may be removed using, for example, a thin blade.
本実施例１においては、ディスク基板１とスタンパ−３
との間を減圧にすることにより、これらの間に存在する
硬化型樹脂中の気泡の残留を防止したために、得られた
案内溝９付きディスク基板１は、スタンパ−の凹凸に忠
実に対応する凹凸が形成されており、上述の従来法と異
なり、案内溝に欠陥は認められなかった。従ってこのよ
うな案内溝付きディスク基板から得られた光磁気ディス
クは記録特性等がすぐれたものであった。In the first embodiment, the disk substrate 1 and the stamper 3 are
By reducing the pressure between them, the remaining air bubbles in the cured resin existing between them are prevented, so that the obtained disc substrate 1 with guide grooves 9 faithfully corresponds to the irregularities of the stamper. Unevenness was formed, and unlike the conventional method described above, no defects were observed in the guide groove. Therefore, the magneto-optical disk obtained from such a disk substrate with guide grooves had excellent recording characteristics.
実施例２実施例１で用いたと同一のディスク基板を用い、このデ
ィスク基板上に紫外線硬化型樹脂として、イソプロピル
アルコールで希釈したポリウレタンアクリレート（大日
本インキ■製、ＳＴＭ−４０１゜希釈後の粘度３０〜５
０センチポイズ）を定量供給ポンプ等によってディスク
基板の中心部の孔側にほぼ同心円状に滴下した。Example 2 Using the same disk substrate as used in Example 1, polyurethane acrylate diluted with isopropyl alcohol (manufactured by Dainippon Ink ■, STM-401, viscosity 30 after dilution) was applied as an ultraviolet curable resin on this disk substrate. ~5
0 centipoise) was dropped approximately concentrically onto the hole side at the center of the disk substrate using a metering pump or the like.
次にＮ−ＴＥＣＨ社製スピナーを用いてスピンコード（
回転数２０００ｒｐｍ）により滴下樹脂をディスク基板
の全面に拡布した。Next, spin code (
The dropped resin was spread over the entire surface of the disk substrate at a rotation speed of 2000 rpm.
以下、実施例１と同様に、ディスク基板の樹脂塗布面と
スタンパ−の凹凸形状面とが向かい合うようにディスク
基板とスタンパ−とを積層した後、実施例１で用いたと
同一の処理容器内でディスク基板とスタンパ−との間を
減圧にしつつ、ディスク基板とスタンパ−の両側から加
圧し、次いで紫外線照射により紫外線硬化型樹脂を硬化
させた後、積層されたディスク基板とスタンパ−とを前
記処理容器から取り出し、前者を後者から剥離すること
により、目的とする案内溝付きディスク基板を得た。Hereinafter, in the same manner as in Example 1, after laminating the disk substrate and the stamper so that the resin-coated surface of the disk substrate and the uneven surface of the stamper faced each other, they were placed in the same processing container used in Example 1. While reducing the pressure between the disk substrate and stamper, pressure is applied from both sides of the disk substrate and stamper, and then the ultraviolet curable resin is cured by ultraviolet irradiation, and then the laminated disk substrate and stamper are subjected to the above treatment. The target disc substrate with guide grooves was obtained by taking it out from the container and peeling the former from the latter.
本実施例２では、硬化型樹脂として、前記実施例１で用
いた紫外線硬化型樹脂よりも低粘性のものを用いている
ため、スピンコード法によりディスク基板上に均一な紫
外線硬化型樹脂膜を形成することができたので、ディス
ク基板とスタンパ−との積層による樹脂のスタンパ−四
部への充填を円滑に行なうことができた。従って本実施
例２においては、樹脂内の気泡の残留は前記実施例１に
おけるよりも少なく、しかもその少ない残留気泡もその
後のディスク基板とスタンパ−との間の減圧処理により
除去されるので、スタンパ−の凹凸に極めて忠実に対応
する案内溝を得ることができた。なお本実施例２で用い
た紫外線硬化型樹脂は希釈剤としてのイソプロピルアル
コール溶剤を含むが、この溶剤は上記減圧処理により揮
散除去されるので、硬化済み樹脂中に溶剤残留の問題は
起らない。In Example 2, the curable resin used is one with a lower viscosity than the ultraviolet curable resin used in Example 1, so a uniform ultraviolet curable resin film is formed on the disk substrate using the spin code method. As a result, it was possible to smoothly fill the four parts of the stamper with the resin by laminating the disk substrate and the stamper. Therefore, in the second embodiment, there are fewer air bubbles remaining in the resin than in the first embodiment, and the remaining air bubbles are removed by the subsequent vacuum treatment between the disk substrate and the stamper. It was possible to obtain a guide groove that corresponds extremely faithfully to the unevenness of -. Note that the ultraviolet curable resin used in Example 2 contains isopropyl alcohol solvent as a diluent, but this solvent is volatilized and removed by the above-mentioned reduced pressure treatment, so there is no problem of the solvent remaining in the cured resin. .
以上、実施例により本発明を説明してきたが、本発明は
以下の応用例や変形例を含むものである。Although the present invention has been described above with reference to examples, the present invention includes the following applications and modifications.
（１）実施例では、紫外線硬化型樹脂を用いたが、電子
線硬化型や熱硬化型等の硬化型樹脂を用いることもでき
る。(1) In the examples, an ultraviolet curable resin was used, but curable resins such as electron beam curable and thermosetting resins may also be used.
（２）実施例では、樹脂をディスク基板上に塗布したが
、スタンパ−上に塗布しても良い。また基板上およびス
タンパ−上に塗布しても良い。塗布方法として、実施例
で用いたデイスペンサーを用いる方法やスピンコード法
以外に、樹脂の性状等に応じてロールコート法等を用い
ることができる。(2) In the embodiment, the resin was applied onto the disk substrate, but it may also be applied onto the stamper. It may also be applied onto the substrate and stamper. As a coating method, in addition to the method using a dispenser and the spin code method used in the examples, a roll coating method or the like can be used depending on the properties of the resin.
（３）実施例では、ディスク基板としてソーダライムガ
ラス製のものを用いたが、その他のガラス基板や、エポ
キシ樹脂、ポリカーボネート等のプラスチック基板を用
いても良い。紫外線硬化型樹脂を用いる場合、基板は、
その上から紫外線を照射できるように、透明である必要
があるが、スタンパ−として透明なものを用いれば、ス
タンパ−側から紫外線照射が可能であるので、非透明の
ものでも良い。(3) In the embodiment, a disk substrate made of soda lime glass was used, but other glass substrates or plastic substrates such as epoxy resin or polycarbonate may also be used. When using ultraviolet curable resin, the substrate is
It needs to be transparent so that ultraviolet rays can be irradiated from above, but if a transparent stamper is used, ultraviolet rays can be irradiated from the stamper side, so it may be non-transparent.
（４）実施例では、スタンバ−としてニッケル製のもの
を用いたが、その他の材質のものであっても良い。上述
の如く、透明のスンタバーを用いればスタンバ−側から
紫外線照射が可能である。(4) In the embodiment, a stub bar made of nickel was used, but it may be made of other materials. As mentioned above, if a transparent suntuber is used, ultraviolet rays can be irradiated from the standbar side.
（５）実施例では、基板とスタンバ−とを積層した後の
加圧を基板とスタンバ−の両側から行なったが、基板又
はスタンバ−の一方を固定すれば、片側のみの加圧でも
良い。加圧手段は加圧用ガスを用いる方法以外に油圧機
器を用いる等の任意の方法を採用することができる。(5) In the embodiment, pressure was applied from both sides of the substrate and the stand bar after the substrate and the stand bar were laminated, but as long as either the board or the stand bar is fixed, pressure may be applied only to one side. As the pressurizing means, any method other than the method using pressurizing gas, such as using hydraulic equipment, can be adopted.
［発明の効果コ以上述べたように、本発明の方法によれば、基板とスタ
ンバ−との間を減圧にすることにより、硬化型樹脂内の
気泡の残留が抑えられ、スタンバ−の凹凸に忠実に対応
する案内溝を有する情報記録用基板を得ることができる
。[Effects of the Invention] As described above, according to the method of the present invention, by reducing the pressure between the substrate and the stand bar, the residual air bubbles in the hardening resin are suppressed, and the unevenness of the stand bar is prevented. An information recording substrate having guide grooves that faithfully correspond to each other can be obtained.
第１図は、本発明の実施例を示す工程図である。１・・・ディスク基板、２・・紫外線硬化型樹脂、２ａ
・・・紫外線硬化型樹脂層、３・・・スタンバ−４・・
・処理装置、５・・・内室、６・・・Ｏリング、７・・
・ガラス製上板、８・・・紫外線、９・・・案内溝、Ａ
・・・減圧される空間部分、Ｂ・・・加圧される空間部
分。FIG. 1 is a process diagram showing an embodiment of the present invention. 1... Disc substrate, 2... Ultraviolet curing resin, 2a
...Ultraviolet curable resin layer, 3...Stambar 4...
・Processing device, 5...Inner chamber, 6...O ring, 7...
・Glass top plate, 8...ultraviolet rays, 9...guide groove, A
... Space portion to be depressurized, B... Space portion to be pressurized.
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24638088AJPH0292603A (en) | 1988-09-30 | 1988-09-30 | Manufacture of data recording board with guide groove |
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24638088AJPH0292603A (en) | 1988-09-30 | 1988-09-30 | Manufacture of data recording board with guide groove |
| Publication Number | Publication Date |
|---|---|
| JPH0292603Atrue JPH0292603A (en) | 1990-04-03 |
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP24638088APendingJPH0292603A (en) | 1988-09-30 | 1988-09-30 | Manufacture of data recording board with guide groove |
| Country | Link |
|---|---|
| JP (1) | JPH0292603A (en) |
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6842229B2 (en) | 2000-07-16 | 2005-01-11 | Board Of Regents, The University Of Texas System | Imprint lithography template comprising alignment marks |
| US6873087B1 (en) | 1999-10-29 | 2005-03-29 | Board Of Regents, The University Of Texas System | High precision orientation alignment and gap control stages for imprint lithography processes |
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| US6964793B2 (en) | 2002-05-16 | 2005-11-15 | Board Of Regents, The University Of Texas System | Method for fabricating nanoscale patterns in light curable compositions using an electric field |
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| US7060324B2 (en) | 2000-10-12 | 2006-06-13 | Board Of Regents, The University Of Texas System | Method of creating a dispersion of a liquid on a substrate |
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| US7071088B2 (en) | 2002-08-23 | 2006-07-04 | Molecular Imprints, Inc. | Method for fabricating bulbous-shaped vias |
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| US7098572B2 (en) | 1999-10-29 | 2006-08-29 | Board Of Regents, The University Of Texas System | Apparatus to control displacement of a body spaced-apart from a surface |
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| US6986975B2 (en) | 2000-07-16 | 2006-01-17 | Board Of Regents, The University Of Texas System | Method of aligning a template with a substrate employing moire patterns |
| US6902853B2 (en) | 2000-07-16 | 2005-06-07 | Board Of Regents, The University Of Texas System | Dual wavelength method of determining a relative position of a substrate and a template |
| US7186483B2 (en) | 2000-07-16 | 2007-03-06 | Board Of Regents, The University Of Texas System | Method of determining alignment of a template and a substrate having a liquid disposed therebetween |
| US6842229B2 (en) | 2000-07-16 | 2005-01-11 | Board Of Regents, The University Of Texas System | Imprint lithography template comprising alignment marks |
| US6954275B2 (en) | 2000-08-01 | 2005-10-11 | Boards Of Regents, The University Of Texas System | Methods for high-precision gap and orientation sensing between a transparent template and substrate for imprint lithography |
| US7229273B2 (en) | 2000-10-12 | 2007-06-12 | Board Of Regents, The University Of Texas System | Imprint lithography template having a feature size under 250 nm |
| US7060324B2 (en) | 2000-10-12 | 2006-06-13 | Board Of Regents, The University Of Texas System | Method of creating a dispersion of a liquid on a substrate |
| US7432634B2 (en) | 2000-10-27 | 2008-10-07 | Board Of Regents, University Of Texas System | Remote center compliant flexure device |
| US6964793B2 (en) | 2002-05-16 | 2005-11-15 | Board Of Regents, The University Of Texas System | Method for fabricating nanoscale patterns in light curable compositions using an electric field |
| US7179079B2 (en) | 2002-07-08 | 2007-02-20 | Molecular Imprints, Inc. | Conforming template for patterning liquids disposed on substrates |
| US6926929B2 (en) | 2002-07-09 | 2005-08-09 | Molecular Imprints, Inc. | System and method for dispensing liquids |
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| US7027156B2 (en) | 2002-08-01 | 2006-04-11 | Molecular Imprints, Inc. | Scatterometry alignment for imprint lithography |
| US7070405B2 (en) | 2002-08-01 | 2006-07-04 | Molecular Imprints, Inc. | Alignment systems for imprint lithography |
| US6916584B2 (en) | 2002-08-01 | 2005-07-12 | Molecular Imprints, Inc. | Alignment methods for imprint lithography |
| US7071088B2 (en) | 2002-08-23 | 2006-07-04 | Molecular Imprints, Inc. | Method for fabricating bulbous-shaped vias |
| US7641840B2 (en) | 2002-11-13 | 2010-01-05 | Molecular Imprints, Inc. | Method for expelling gas positioned between a substrate and a mold |
| US6929762B2 (en) | 2002-11-13 | 2005-08-16 | Molecular Imprints, Inc. | Method of reducing pattern distortions during imprint lithography processes |
| US7019819B2 (en) | 2002-11-13 | 2006-03-28 | Molecular Imprints, Inc. | Chucking system for modulating shapes of substrates |
| US6982783B2 (en) | 2002-11-13 | 2006-01-03 | Molecular Imprints, Inc. | Chucking system for modulating shapes of substrates |
| US6980282B2 (en) | 2002-12-11 | 2005-12-27 | Molecular Imprints, Inc. | Method for modulating shapes of substrates |
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| US7365103B2 (en) | 2002-12-12 | 2008-04-29 | Board Of Regents, The University Of Texas System | Compositions for dark-field polymerization and method of using the same for imprint lithography processes |
| US6990870B2 (en) | 2002-12-12 | 2006-01-31 | Molecular Imprints, Inc. | System for determining characteristics of substrates employing fluid geometries |
| US7323130B2 (en) | 2002-12-13 | 2008-01-29 | Molecular Imprints, Inc. | Magnification correction employing out-of-plane distortion of a substrate |
| US7452574B2 (en) | 2003-02-27 | 2008-11-18 | Molecular Imprints, Inc. | Method to reduce adhesion between a polymerizable layer and a substrate employing a fluorine-containing layer |
| US6951173B1 (en) | 2003-05-14 | 2005-10-04 | Molecular Imprints, Inc. | Assembly and method for transferring imprint lithography templates |
| US7157036B2 (en) | 2003-06-17 | 2007-01-02 | Molecular Imprints, Inc | Method to reduce adhesion between a conformable region and a pattern of a mold |
| US7150622B2 (en) | 2003-07-09 | 2006-12-19 | Molecular Imprints, Inc. | Systems for magnification and distortion correction for imprint lithography processes |
| US7442336B2 (en) | 2003-08-21 | 2008-10-28 | Molecular Imprints, Inc. | Capillary imprinting technique |
| US7136150B2 (en) | 2003-09-25 | 2006-11-14 | Molecular Imprints, Inc. | Imprint lithography template having opaque alignment marks |
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| US7270533B2 (en) | 2003-10-02 | 2007-09-18 | University Of Texas System, Board Of Regents | System for creating a turbulent flow of fluid between a mold and a substrate |
| US7261830B2 (en) | 2003-10-16 | 2007-08-28 | Molecular Imprints, Inc. | Applying imprinting material to substrates employing electromagnetic fields |
| US7122482B2 (en) | 2003-10-27 | 2006-10-17 | Molecular Imprints, Inc. | Methods for fabricating patterned features utilizing imprint lithography |
| US7019835B2 (en) | 2004-02-19 | 2006-03-28 | Molecular Imprints, Inc. | Method and system to measure characteristics of a film disposed on a substrate |
| US7140861B2 (en) | 2004-04-27 | 2006-11-28 | Molecular Imprints, Inc. | Compliant hard template for UV imprinting |
| US7186656B2 (en) | 2004-05-21 | 2007-03-06 | Molecular Imprints, Inc. | Method of forming a recessed structure employing a reverse tone process |
| US7504268B2 (en) | 2004-05-28 | 2009-03-17 | Board Of Regents, The University Of Texas System | Adaptive shape substrate support method |
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| US7105452B2 (en) | 2004-08-13 | 2006-09-12 | Molecular Imprints, Inc. | Method of planarizing a semiconductor substrate with an etching chemistry |
| US7309225B2 (en) | 2004-08-13 | 2007-12-18 | Molecular Imprints, Inc. | Moat system for an imprint lithography template |
| US7282550B2 (en) | 2004-08-16 | 2007-10-16 | Molecular Imprints, Inc. | Composition to provide a layer with uniform etch characteristics |
| US7041604B2 (en) | 2004-09-21 | 2006-05-09 | Molecular Imprints, Inc. | Method of patterning surfaces while providing greater control of recess anisotropy |
| US7241395B2 (en) | 2004-09-21 | 2007-07-10 | Molecular Imprints, Inc. | Reverse tone patterning on surfaces having planarity perturbations |
| US7205244B2 (en) | 2004-09-21 | 2007-04-17 | Molecular Imprints | Patterning substrates employing multi-film layers defining etch-differential interfaces |
| US7547504B2 (en) | 2004-09-21 | 2009-06-16 | Molecular Imprints, Inc. | Pattern reversal employing thick residual layers |
| US7252777B2 (en) | 2004-09-21 | 2007-08-07 | Molecular Imprints, Inc. | Method of forming an in-situ recessed structure |
| US7244386B2 (en) | 2004-09-27 | 2007-07-17 | Molecular Imprints, Inc. | Method of compensating for a volumetric shrinkage of a material disposed upon a substrate to form a substantially planar structure therefrom |
| US7307118B2 (en) | 2004-11-24 | 2007-12-11 | Molecular Imprints, Inc. | Composition to reduce adhesion between a conformable region and a mold |
| US7630067B2 (en) | 2004-11-30 | 2009-12-08 | Molecular Imprints, Inc. | Interferometric analysis method for the manufacture of nano-scale devices |
| US7292326B2 (en) | 2004-11-30 | 2007-11-06 | Molecular Imprints, Inc. | Interferometric analysis for the manufacture of nano-scale devices |
| US7357876B2 (en) | 2004-12-01 | 2008-04-15 | Molecular Imprints, Inc. | Eliminating printability of sub-resolution defects in imprint lithography |
| US7281919B2 (en) | 2004-12-07 | 2007-10-16 | Molecular Imprints, Inc. | System for controlling a volume of material on a mold |
| US7635263B2 (en) | 2005-01-31 | 2009-12-22 | Molecular Imprints, Inc. | Chucking system comprising an array of fluid chambers |
| US7636999B2 (en) | 2005-01-31 | 2009-12-29 | Molecular Imprints, Inc. | Method of retaining a substrate to a wafer chuck |
| WO2006129527A1 (en)* | 2005-05-31 | 2006-12-07 | Matsushita Electric Industrial Co., Ltd. | Method for manufacturing information recording medium and information recording medium |
| US7256131B2 (en) | 2005-07-19 | 2007-08-14 | Molecular Imprints, Inc. | Method of controlling the critical dimension of structures formed on a substrate |
| JP2010179655A (en)* | 2006-04-03 | 2010-08-19 | Molecular Imprints Inc | Lithography imprinting system |
| US7547398B2 (en) | 2006-04-18 | 2009-06-16 | Molecular Imprints, Inc. | Self-aligned process for fabricating imprint templates containing variously etched features |
| JP2011508686A (en)* | 2007-12-18 | 2011-03-17 | モレキュラー・インプリンツ・インコーポレーテッド | Reduction of contact angle on multiple surfaces |
| JP2012190877A (en)* | 2011-03-09 | 2012-10-04 | Fujifilm Corp | Nanoimprint method and nanoimprint device for use therein |
| JP2015116788A (en)* | 2013-12-20 | 2015-06-25 | 日本ゼオン株式会社 | Method for molding optical lens |
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