【発明の詳細な説明】［゛産業上の利用分野］ 、本発明は、射出成形法による光デイスク製造工程での使
用途中のスタンパの表面状態の改質を行う光デイスク用
スタンパ洗浄方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a method for cleaning an optical disk stamper for modifying the surface condition of a stamper during use in an optical disk manufacturing process by injection molding.
［従来の技術］従来、光デイスク製造工程において射出成形数が増加す
るにつれてスタンパ表面状態が変化していき、次第に光
ディスクの外観に曇りがかった模様やすじ状の模様が発
生する。この欠陥が発生した時点で成形条件の変更を行
い、特性良好の光ディスクを得ている。[Prior Art] Conventionally, as the number of injection moldings increases in the optical disk manufacturing process, the surface condition of the stamper changes, and a cloudy pattern or a streak-like pattern gradually appears on the appearance of the optical disk. When this defect occurred, the molding conditions were changed and an optical disk with good characteristics was obtained.
［発明が解決しようとする課題］しかし前述の成形条件の変更による対応では、目視で識
別できる外観特性不良の光ディスクが発生してから成形
条件の変更を行っている。この場合外観特性不良が発生
する直前の光ディスクに機械的・電気的特性が許容外と
なる光ディスクが発生する。それゆえ外観特性不良の光
ディスクが発生してから成形条件を変更する場合、外観
不良の光ディスクと機械的・電気的特性が不良の光ディ
スクが発生することになり、歩留シを低下させる要因と
なっている。また成形条件の変更にあたっては、温度、
射出速度、射出圧力等の変更を行うが、これらの要因を
変更し特性良好の光ディ不りが得られる成形条件を決め
るまでの間、製造が停止するため生産性が低下する。さ
らに成形条件設定のために射出成形した回数分、スタン
ノくの耐久性が低下する点や、成形条件を多水型変更・
検討しても特性良好の光ディスクが得られない場合とい
った課題がある。また成形条件変更後、別のスタンパを
引き続いて使用する場合、成形条件を再設定する必要が
あり、作業者の設定ミスといった要因で歩留シが低下す
るという課題もある。[Problems to be Solved by the Invention] However, in the above-mentioned solution by changing the molding conditions, the molding conditions are changed only after an optical disk with visually discernible poor appearance characteristics occurs. In this case, an optical disk whose mechanical and electrical characteristics are out of tolerance occurs in the optical disk immediately before the appearance characteristic defect occurs. Therefore, if the molding conditions are changed after an optical disk with poor appearance characteristics occurs, optical disks with poor appearance and optical disks with poor mechanical and electrical characteristics will be produced, which will cause a decrease in yield. ing. In addition, when changing molding conditions, temperature,
Injection speed, injection pressure, etc. are changed, but until these factors are changed and molding conditions that provide good characteristics and no optical defects are determined, production is halted, resulting in a decrease in productivity. Furthermore, the durability of the stun glue will decrease due to the number of times injection molding is performed to set the molding conditions, and if the molding conditions are changed to a polyhydric type.
There is a problem that an optical disk with good characteristics cannot be obtained even after such studies. In addition, if another stamper is subsequently used after changing the molding conditions, it is necessary to reset the molding conditions, and there is also the problem that the yield rate decreases due to factors such as setting errors by the operator.
本発明はこのような課題を解決するもので、その目的と
するところは、射出成形枚数の増加につれてスタンパ表
面状態が変化することによって発生する光ディスクの欠
陥を無くシ、同一スタンノくで同一成形条件下での射出
成形の歩留シの向上を図るものである。The present invention is intended to solve these problems, and its purpose is to eliminate defects in optical discs that occur due to changes in the stamper surface condition as the number of injection molded discs increases, and to eliminate defects in optical discs that occur when the stamper surface condition changes as the number of injection molded discs increases. The aim is to improve the yield of injection molding at the bottom.
［課題を解決するための手段］本発明の光デイスク用スタンパ洗浄方法は、有機溶剤に
よる湿式洗浄を行い、次に乾式洗浄を行うことを特徴と
する。[Means for Solving the Problems] The optical disk stamper cleaning method of the present invention is characterized by performing wet cleaning with an organic solvent and then dry cleaning.
［実施例］本発明の光デイスク用スタンパ洗浄方法は、基本的には
第１図に示すプロセスになっている。以下に本発明につ
いて実施例に基づいて説明する。[Example] The method of cleaning a stamper for an optical disk according to the present invention is basically a process shown in FIG. The present invention will be described below based on examples.
まず射出成形によって離型剤や熱安定剤が表面に極薄く
付着し表面状態が射出成形前と異なってしまったため外
観特性不良の光ディスクや機械的・電気的特性が不良と
なる光ディスクが発生するようになったスタンパを第１
図ａのように塩化メチレンの入っている浴槽に６０秒以
上浸漬する。First, during injection molding, mold release agents and heat stabilizers adhere to the surface extremely thinly, making the surface condition different from before injection molding, resulting in optical discs with poor appearance characteristics and optical disks with poor mechanical and electrical properties. The stamper that became the first
Immerse it in a bath containing methylene chloride for at least 60 seconds as shown in Figure a.
スタンパの使用度に応じて超音波洗浄を併用する。液温
度は室温付近とする。次にスタンノくを塩化メチレンの
浴槽から取シ出し、スタンノく付着の塩化メチレンが乾
燥する前に第１図すのようにメチルエチルケトン、又は
アセトンの入っている浴槽に３０秒以上浸漬する。スタ
ンパの使用度に応じて超音波洗浄を併用する。液温度は
室温付近とする。次にスタンパをメチルエチルケトンア
セトンの浴槽から取り出し、スタンノく付着のメチルエ
チルケトン、またはアセトンが乾燥する前に第１図Ｃの
ようにポジ型レジストの剥離液、たとえばピロリドン類
やピペラジン類の液体に浸漬する。この時液は６０℃〜
２００℃に加熱されている。浸漬時間は１分以上であり
、スタンパの使用度に応じて超音波洗浄を併用する。こ
のあとスタンパは剥離液中で室温付近まで冷却した後、
室温付近の超純水中に移すか、もしくは剥離液から６０
℃〜９０℃の超純水中に移したのち室温付近の超純水に
移す（第１図ｄ）。この室温付近の超純水への浸漬時間
は３分以上とする。またスタンパの使用度に応じて超音
波洗浄を併用する。次にスタンパの水切りを行い、乾燥
した後、第１図Ｃのように酸素プラズマアッシングを行
う。アッシング条件は使用する機械によって異なるため
、ある目安として条件を挙げると酸素圧力１１８ｔＯｒ
ｒ、電力３００Ｗ’，時間６分、チャンバー内温度４５
°Ｃ以下とする。以上のスタンパ洗浄により、スタンパ
表面の状態は、成形前のスタンパ表面状態と同様の状態
となり、射出成形をある一定数行った場合にスタンパ表
面状態が変化することに起因して発生する光ディスクの
欠陥の発生を防止する効果を有する。Ultrasonic cleaning is also used depending on the degree of use of the stamper. The liquid temperature should be around room temperature. Next, remove the stan glue from the methylene chloride bath, and before the methylene chloride adhering to the stan glue dries, immerse it in a bath containing methyl ethyl ketone or acetone for at least 30 seconds as shown in Figure 1. Ultrasonic cleaning is also used depending on the degree of use of the stamper. The liquid temperature should be around room temperature. Next, the stamper is taken out of the methyl ethyl ketone acetone bath, and before the methyl ethyl ketone or acetone adhering to the stamp dries, it is immersed in a positive resist stripping solution, such as a pyrrolidone or piperazine liquid, as shown in FIG. 1C. At this time, the liquid is 60℃ ~
It is heated to 200°C. The immersion time is 1 minute or more, and ultrasonic cleaning is also used depending on the degree of use of the stamper. After this, the stamper is cooled down to around room temperature in a stripping solution, and then
Transfer it to ultrapure water near room temperature or remove it from the stripping solution for 60 minutes.
The sample is transferred to ultrapure water at a temperature of 90°C to 90°C, and then to ultrapure water at around room temperature (Fig. 1d). The immersion time in this ultrapure water near room temperature is 3 minutes or more. Ultrasonic cleaning is also used depending on the degree of use of the stamper. Next, the stamper is drained and dried, and then oxygen plasma ashing is performed as shown in FIG. 1C. Ashing conditions vary depending on the machine used, so as a guide, the conditions are oxygen pressure 118tOr.
r, power 300W', time 6 minutes, chamber temperature 45
The temperature should be below °C. By cleaning the stamper as described above, the condition of the stamper surface becomes the same as the condition of the stamper surface before molding, and defects in optical disks that occur due to changes in the surface condition of the stamper after a certain number of injection molding operations are performed. It has the effect of preventing the occurrence of.
［発明の効果］本発明の光デイスク用スタンパ洗浄方法によれば、射出
成形によってスタンパ表面状態が変化し特性不良の光デ
ィスクが発生するようになったスタンパを、射出成形条
件の変更・条件出しをしなくても、特性良好の光ディス
クが得られるスタンパ表面状態にすることができる。こ
のスタンパ洗浄を一定数射出成形後に定期的に行うこと
によってスタンパの光ディスクの歩留シ向上、生産性の
向上、およびスタンパの耐用成形枚数の増加が図れる。[Effects of the Invention] According to the method for cleaning a stamper for an optical disk of the present invention, a stamper whose surface condition has changed due to injection molding, resulting in an optical disk with poor characteristics, can be removed by changing the injection molding conditions or setting the conditions. Even without this, the stamper surface condition can be made such that an optical disc with good characteristics can be obtained. By periodically performing this stamper cleaning after a certain number of injection moldings, it is possible to improve the yield of optical disks of the stamper, improve productivity, and increase the number of molded stampers that can last for a long time.
第１図（Ｌ ％ ｅは本発明の光ディスク用スタンノく
洗浄方法の実施例の工程図である。１ ・・・・・・・スタンパ２・・・・・・・・・塩化メチレン６・・・・・・・・・メチルエチルケトン、またはアセ
トン４・・・・・・・・・ポジ型レジストの剥離液５・
・・・・・・・・超純水６・・・・・・・・・酸素プラズマ以上出願人 セイコーエプソン株式会社代理人 弁理士 鈴木喜三部（他１名）Ｉ−ｒＳＪ
（ト） φし）
−ムいにFIG. 1 (L % e is a process diagram of an embodiment of the optical disc stamp cleaning method of the present invention. 1 Stamper 2 Methylene chloride 6...・・・・・・Methyl ethyl ketone or acetone 4・・・・・・Positive resist stripper 5・
・・・・・・・・・Ultra pure water 6・・・・・・・・・Oxygen plasma and above Applicant Seiko Epson Co., Ltd. Agent Patent attorney Kizobe Suzuki (1 other person) I-rSJ
(G) φshi)
-Muini
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12941189AJPH02307737A (en) | 1989-05-23 | 1989-05-23 | Method for washing stamper for optical disk |
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12941189AJPH02307737A (en) | 1989-05-23 | 1989-05-23 | Method for washing stamper for optical disk |
| Publication Number | Publication Date |
|---|---|
| JPH02307737Atrue JPH02307737A (en) | 1990-12-20 |
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12941189APendingJPH02307737A (en) | 1989-05-23 | 1989-05-23 | Method for washing stamper for optical disk |
| Country | Link |
|---|---|
| JP (1) | JPH02307737A (en) |
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0693001A4 (en)* | 1992-11-30 | 1996-11-27 | Massachusetts Inst Technology | Cleaning and finishing a ceramic mold |
| US5660621A (en)* | 1995-12-29 | 1997-08-26 | Massachusetts Institute Of Technology | Binder composition for use in three dimensional printing |
| US5814161A (en)* | 1992-11-30 | 1998-09-29 | Massachusetts Institute Of Technology | Ceramic mold finishing techniques for removing powder |
| US6086798A (en)* | 1998-12-17 | 2000-07-11 | Abante Corporation | Method for removing contaminant from surface of mold die |
| US6354361B1 (en) | 1995-10-31 | 2002-03-12 | Massachusetts Institute Of Technology | Tooling having advantageously located heat transfer channels |
| US6461548B1 (en)* | 1999-01-20 | 2002-10-08 | Robert J. Shine | Method for improving injection molding of transparent optical components |
| JP2013503766A (en)* | 2009-09-09 | 2013-02-04 | エルジー エレクトロニクス インコーポレイティド | Manufacturing method of stamper for injection molding |
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0693001A4 (en)* | 1992-11-30 | 1996-11-27 | Massachusetts Inst Technology | Cleaning and finishing a ceramic mold |
| US5814161A (en)* | 1992-11-30 | 1998-09-29 | Massachusetts Institute Of Technology | Ceramic mold finishing techniques for removing powder |
| US6109332A (en)* | 1992-11-30 | 2000-08-29 | Massachusetts Institute Of Technology | Ceramic mold finishing |
| US6354361B1 (en) | 1995-10-31 | 2002-03-12 | Massachusetts Institute Of Technology | Tooling having advantageously located heat transfer channels |
| US5660621A (en)* | 1995-12-29 | 1997-08-26 | Massachusetts Institute Of Technology | Binder composition for use in three dimensional printing |
| US5851465A (en)* | 1995-12-29 | 1998-12-22 | Massachusetts Institute Of Technology | Binder composition for use in three dimensional printing |
| US6086798A (en)* | 1998-12-17 | 2000-07-11 | Abante Corporation | Method for removing contaminant from surface of mold die |
| US6461548B1 (en)* | 1999-01-20 | 2002-10-08 | Robert J. Shine | Method for improving injection molding of transparent optical components |
| JP2013503766A (en)* | 2009-09-09 | 2013-02-04 | エルジー エレクトロニクス インコーポレイティド | Manufacturing method of stamper for injection molding |
| KR101537619B1 (en)* | 2009-09-09 | 2015-07-17 | 엘지전자 주식회사 | A production method of a stamper for an injection molding |
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