【発明の詳細な説明】〔産業上の利用分野〕本発明は、感光性印刷版の製造にあたり感光液を塗布す
る方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a method of applying a photosensitive liquid in the production of photosensitive printing plates.
感光性のネガ型印刷板は、一般に、アルミニウム板等の
支持体上に感光性組成物を塗布し、陰画等を通して紫外
線等の活性光線を照射し、光が照射された部分を重合あ
るいは架橋させ現像液に不溶化させ、光の非照射部分を
現像液に溶出させ、それぞれの部分を、水を反発して油
性インキを受容する画像部、および水を受容して油性イ
ンキを反発する非画像部とすることにより得られる。Photosensitive negative printing plates are generally produced by coating a photosensitive composition on a support such as an aluminum plate, irradiating it with active light such as ultraviolet rays through a negative image, and polymerizing or crosslinking the irradiated areas. The areas that are not irradiated with light are insolubilized in a developing solution and eluted into the developing solution, and each area is divided into an image area that repels water and receives oil-based ink, and a non-image area that receives water and repels oil-based ink. It can be obtained by
この場合における感光性組成物としては、特にネガ型２
３版では、Ｐ−ジアゾジフェニルアミンとホルムアルデ
ヒドとの縮合物などのジアゾ樹脂が広く用いられてきた
。In this case, the photosensitive composition is particularly suitable for negative type 2
In the third edition, diazo resins such as the condensate of P-diazodiphenylamine and formaldehyde have been widely used.
また、感光性組成物として、キノンジアゾ類を用いると
、活性光線の照射によって、アルカリ水溶液に対いする
溶解度が増大し、露光後アルカリ現像の−よって未露光
部分をレジスト画像として残すことができ、ポジ型の感
光性印刷版を得ることができる。Furthermore, when a quinone diazo is used as a photosensitive composition, its solubility in an alkaline aqueous solution is increased by irradiation with actinic rays, and the unexposed portions can be left as a resist image after exposure with alkaline development. A positive photosensitive printing plate can be obtained.
いずれにしても、この種の印刷版の製造に当っては、砂
目室て、電解研磨、陽極酸化等の前処理した支持体、通
常アルミニウム板上に前記感光性組成物を含む感光液を
塗布することによって得られる。In any case, in producing this type of printing plate, a photosensitive solution containing the photosensitive composition is placed on a support, usually an aluminum plate, which has been pretreated by electropolishing, anodizing, etc. in a grain chamber. Obtained by applying.
通常、この感光液の塗布に当っては、第４図のリバース
ロールコート法が主に採用されている。Normally, the reverse roll coating method shown in FIG. 4 is mainly used to apply this photosensitive liquid.
すなわち、バット１内の感光液Ｉ、に一部浸漬されたア
プリケータロール２により感光液【、を、ピックアップ
し、アプリケータロール２と対向するバックアップロー
ル３により搬送される支持体８表面上に転写塗布した後
、メタリングロール４により余分の感光液Ｉ５をぬぐい
取り、パン５を通して感光液Ｉ、を前記バラ＋−ｉ内に
戻す方式である。That is, the photosensitive liquid I, which is partially immersed in the photosensitive liquid I in the vat 1, is picked up by the applicator roll 2 and placed on the surface of the support 8, which is conveyed by the backup roll 3 facing the applicator roll 2. After transfer coating, excess photosensitive liquid I5 is wiped off with a metering roll 4, and the photosensitive liquid I is returned to the above-mentioned rose +-i through a pan 5.
６は金属製、たとえぼりん青銅製ドクターブレードで、
未だ垂れ落ちずメタリングロール４に付着している感光
液りをパン５１に掻き落した後、バラｌ−１内に戻すも
のである。また、この塗布に当って、主に、アプリケー
タロール２と支持体Ｂとのギャップ、ならびに支持体Ｂ
の搬送速度に対するアプリケータロール３の回転数（速
度）を定めて、支持体Ｂへの一次膜厚を、所望の最終膜
厚（液膜厚）より厚くし、その後、塗布液にメタリング
ロール４を位置を設定しながら当てることで、所望の最
終ｌｌ＊厚を得ている。したがって、アプリケ−クロー
ル２によって塗布される感光液の一次膜厚に対してメタ
リングロール４が最終膜厚を得るための膜厚制御手段と
して作用する。6 is a doctor blade made of metal, even Borin bronze.
After scraping off the photosensitive liquid that has not yet dripped and adhered to the metering roll 4 onto the pan 51, it is returned to the chamber 1-1. In addition, during this application, the gap between the applicator roll 2 and the support B, and the support B
The number of revolutions (speed) of the applicator roll 3 is determined relative to the conveyance speed of 4 while setting the position, the desired final ll* thickness is obtained. Therefore, the metering roll 4 acts as a film thickness control means for obtaining the final film thickness for the primary film thickness of the photosensitive liquid applied by the applicator roll 2.
しかし、上記の従来の塗布方法では、バラ１）に対して
感光液Ｉ４が間欠的に補充するものであるため、感光液
りの液面変動を生じ、液面の高い場合と低い場合とで一
定膜厚が変動してしまう。特に液面の高い場合には、過
剰の塗布量となって支持体Ｂ上に一次膜の流れがみられ
、その後メタリングロール４によって膜厚を規制しても
支持体Ｂの幅方向（場合により流れ方向にも）に厚みの
ムラを生じる。However, in the conventional coating method described above, since the photosensitive liquid I4 is intermittently replenished to the rose 1), the liquid level of the photosensitive liquid varies, and the liquid level is high and low. The constant film thickness fluctuates. Particularly when the liquid level is high, an excessive amount of coating occurs and a flow of the primary film is observed on the support B, and even if the film thickness is subsequently controlled by the metering roll 4, the width direction of the support B (in some cases This results in uneven thickness (also in the flow direction).
他方、この種の感光液中には、塗布性向ト剤と（７て界
面活性剤、特にフッ素糸界面活性剤を添加することが多
い。特に界面活性剤を添加した場合には、バット１内に
おいて、アプリケ−クロール２の回転に伴って感光液が
流動化し２で発泡しやすい。この泡はアプリゲータロー
ル２によって感光液とともにピックアップされて支持体
Ｂ上に塗布され、結果的に塗布故障となってしまう。On the other hand, in this type of photosensitive liquid, a coating property improving agent (7) and a surfactant, especially a fluorine thread surfactant, are often added. As the applicator roll 2 rotates, the photosensitive liquid becomes fluidized and tends to foam.The bubbles are picked up by the applicator roll 2 along with the photosensitive liquid and applied onto the support B, resulting in coating failure. turn into.
さらに、掻き取り用のドクターブレード６から感光液が
パン５内に垂れ落ちるとき、感光液に発泡を牛じる。発
泡は、バット１内に新感光液を補充する際にも生じる虞
れがある。Further, when the photosensitive liquid drips into the pan 5 from the scraping doctor blade 6, the photosensitive liquid causes foaming. Foaming may also occur when the vat 1 is replenished with new photosensitive liquid.
そこで、本発明の主たる目的は、泡故障のない塗布方法
を提供することにある。Therefore, the main object of the present invention is to provide a coating method that does not cause bubble failure.
上記課題は、支持体上るご対し７て、感光液タンクから
の感光液を、幅方向に沿うスリットから感光液を押１−
出ず押出ノズルによって塗布するとともに、前記感光液
タンクにおいて脱泡を行うことで解決できる。The above problem was solved by pushing the photosensitive liquid from the photosensitive liquid tank through the slit along the width direction.
This problem can be solved by applying the film using an extrusion nozzle and defoaming it in the photosensitive liquid tank.
本発明に従って、アプリゲータ日−ルへの感光液の供給
を押出ノズルによって行うと、一定の供給速度で感光液
を提供している限り、−火成厚の変動を防止できるばか
りでなく、前述のような泡の発生要因が全くなくなるの
で、泡故障を確実に防止できる。In accordance with the present invention, when the photosensitive liquid is supplied to the applicator tube by an extrusion nozzle, as long as the photosensitive liquid is provided at a constant supply rate, it is possible not only to prevent variations in the igneous thickness, but also to prevent the above-mentioned Since such bubble generation factors are completely eliminated, bubble failures can be reliably prevented.
さらに２．感光液タンク中へ新感光液を補充する際や、
ドクターブレードから感光液がパン５へ垂れ落ちる際に
泡が生じたとしても、感光液タンクにおいて脱泡を図る
ので、泡故障を防止できる。Further 2. When replenishing new photosensitive liquid into the photosensitive liquid tank,
Even if bubbles are generated when the photosensitive liquid drips from the doctor blade into the pan 5, bubble failure can be prevented since bubbles are removed in the photosensitive liquid tank.
以下本発明を第１図に示す具体例によってさらに詳説す
る。The present invention will be explained in more detail below with reference to a specific example shown in FIG.
本発明では、押出ノズル２０によって感光液をアプリケ
ータロール２に経時的に一定の供給速度で供給１２、支
持体Ｂ上に対して塗布しようとするものである。In the present invention, the extrusion nozzle 20 supplies the photosensitive liquid to the applicator roll 2 at a constant supply rate over time and applies the photosensitive liquid onto the support B.
押出ノズル２０の構造例としては、第３図のように支持
体Ｂの幅方向に沿う一対のノズルへメト２１Ａ、 ２１
Ｂを合わせるとともに、塗布側に狭いスリット２２を確
保するとともに、このスリット２２をボゲッＩ・２３に
連通し、ポケット２３に対シ１，７感光液■４の流入孔
２４を形成し、ヘッド２１Ａ、 ２１Ｂの両端には端板
２５Ａ、 ２５Ｂを当てたものである。As an example of the structure of the extrusion nozzle 20, as shown in FIG.
At the same time, a narrow slit 22 is secured on the coating side, and this slit 22 is communicated with the bogette I. , 21B are fitted with end plates 25A and 25B at both ends.
この押出ノズル２０においては、感光液タンク７からの
感光液りをポンプ８によりフィルタ・−９を通して圧送
すると、感光液■、はポケット２３の全幅に行きわたり
ながら、スリット２２から流出する。流出した感光液り
はアプリケータロール２に塗布された後、支持体Ｂ上に
転写される。したがって、ポンプ８により感光液りを押
出ノズル２０に一定の供給速度で供給する限り、−火成
厚は一定となる。In this extrusion nozzle 20, when the photosensitive liquid from the photosensitive liquid tank 7 is pumped through the filter -9 by the pump 8, the photosensitive liquid (2) flows out from the slit 22 while spreading over the entire width of the pocket 23. The outflowing photosensitive liquid is applied to the applicator roll 2 and then transferred onto the support B. Therefore, as long as the pump 8 supplies the photosensitive liquid to the extrusion nozzle 20 at a constant supply rate, the igneous thickness remains constant.
ここで、フィルター９は感光液中のゴミ類とともに、も
し泡を生じているのであれば、それをトラップする機能
がある。ＬＯは補充用新感光液である。Here, the filter 9 has the function of trapping bubbles, if any, along with dust in the photosensitive liquid. LO is a new photosensitive liquid for replenishment.
一方、本発明においては、上記感光液タンクとして脱泡
機能を有するタンク７が用いられる。この脱泡用タンク
としては、静置脱泡を図ることができる大型タンクのほ
か、第１図のように、サイクロンタンク７を好適に用い
ることができる。この例では、パン５からの戻り液をタ
ンクの接線方向に入れることによって螺旋流を生じさせ
、滞留時間を長くし、泡を上昇させ、その過程で破泡を
図るようにしである。さらに好ましくは、第１図のよう
に、タンク７を外槽１）内に収容し、それらの間に水Ｗ
を満し、水中の適宜の箇所に超音波振動子１２を設けて
、超音波を感光液りに照射して、泡の凝集、上昇を促進
する。On the other hand, in the present invention, a tank 7 having a defoaming function is used as the photosensitive liquid tank. As this defoaming tank, a cyclone tank 7 as shown in FIG. 1 can be suitably used in addition to a large tank capable of static defoaming. In this example, the liquid returned from the pan 5 is introduced tangentially into the tank to generate a spiral flow, lengthen the residence time, cause bubbles to rise, and break the bubbles in the process. More preferably, as shown in FIG. 1, the tank 7 is housed in the outer tank 1), and the water
An ultrasonic vibrator 12 is provided at an appropriate location in the water to irradiate the photosensitive liquid with ultrasonic waves to promote agglomeration and rise of bubbles.
なお、上記サイクロン方式は、感光液中に感脂化剤を添
加するとき、分離し易い感脂化剤の分離を防止できる点
でも好適である。The cyclone method is also suitable in that it can prevent separation of the oil-sensitizing agent, which tends to separate, when the oil-sensitizing agent is added to the photosensitive liquid.
また、第２図のように、押出ノズル２０から、感光液を
直接支持体上に塗布する例も本発明は包含する。Further, as shown in FIG. 2, the present invention also includes an example in which the photosensitive liquid is applied directly onto the support from an extrusion nozzle 20.
本発明において、感光液としては、従来、感光性印刷版
の感光液として公知のものの全てを用いることができる
。この感光液は、感光性樹脂、結合剤を必須とし、これ
に必要により、着色材料、アルキルエーテル類、フッ素
系界面活性剤やノニオン系界面活性剤等の塗布性向上剤
、可塑剤、感脂化剤等を添加し、溶剤に溶解したもので
ある。In the present invention, as the photosensitive liquid, all conventionally known photosensitive liquids for photosensitive printing plates can be used. This photosensitive liquid requires a photosensitive resin and a binder, and if necessary, coloring materials, alkyl ethers, coating improvers such as fluorosurfactants and nonionic surfactants, plasticizers, and photosensitive resins. It is prepared by adding a curing agent, etc. and dissolving it in a solvent.
本発明法が有効に適用される感光液粘度（２５℃、Ｂ型
粘度計での測定値）としては、５００ｃｐ以下が好まし
い。さらに、界面活性剤を含有し発泡性の感光液である
ときに、本発明の効果がより顕著になる。The viscosity of the photosensitive liquid (measured at 25° C. with a B-type viscometer) to which the method of the present invention is effectively applied is preferably 500 cp or less. Furthermore, the effects of the present invention are more pronounced when the photosensitive liquid contains a surfactant and is foamable.
上記界面活性剤の添加量は、感光液中に０．１〜５重量
部が好ましい。活性剤の具体例としては、３Ｍ社製ｒＦ
Ｃ−４３０Ｊ 、大日本インキ化学社製［メガファック
Ｆ−１７１，Ｆ−１７３，Ｆ−８１５，Ｆ−１４２ＤＪ
、旭硝子社製「サーフロンＳ−１）２，Ｓ−１）３，Ｓ
−１２１゜Ｓ−１３１，Ｓ−１４５Ｊ 、新秋田化成［
エフトップＥＦ−１０１，１０２，１２１，１２２Ｊ
（フッ素系界面活性剤）、花王マドラス社製「スパン
６５」 （ソルビタントリアセテート）、「エマルゲン
４０４Ｊ （ポリオキシンエチレンオレイルエーテル
）、「エマゲン９０５Ｊ （ポリオキシエチレンノニ
ルフェノールエーテル）等がある。The amount of the surfactant added to the photosensitive liquid is preferably 0.1 to 5 parts by weight. A specific example of the activator is rF manufactured by 3M Company.
C-430J, manufactured by Dainippon Ink Chemical Co., Ltd. [Megafac F-171, F-173, F-815, F-142DJ
, Asahi Glass "Surflon S-1)2, S-1)3, S
-121゜S-131, S-145J, Shin Akita Kasei [
F-TOP EF-101, 102, 121, 122J
(fluorine-based surfactant), "Span 65" (sorbitan triacetate) manufactured by Kao Madras, "Emulgen 404J (polyoxine ethylene oleyl ether),""Emulgen 905J (polyoxyethylene nonylphenol ether), etc."
一方、印刷版の支持体にはアルミニウム板を用いること
が好ましい。硝酸又は硝酸を主成分とする電解溶液中、
もしくは塩酸又は塩酸を主成分とする電解溶液中で電解
粗面化することにより砂目立て処理し、好ましくは、更
に陽極酸化処理及び必要に応じて封孔処理等の表面処理
したものを使用する。On the other hand, it is preferable to use an aluminum plate as the support for the printing plate. In nitric acid or an electrolytic solution containing nitric acid as the main component,
Alternatively, the surface may be grained by electrolytic roughening in hydrochloric acid or an electrolytic solution containing hydrochloric acid as a main component, and preferably further subjected to surface treatment such as anodizing treatment and, if necessary, sealing treatment.
感光液に塗布後は、乾燥、裁断、表面検査などの検査を
経る。得られた感光性印刷版素板は、その後、これにフ
ィルムを密着し、活性光線を照射して像様露光し、現像
液により現像し、画像部を残して最終印刷版とする。After applying the photosensitive liquid, it undergoes inspections such as drying, cutting, and surface inspection. The obtained photosensitive printing plate blank is then adhered to a film, imagewise exposed by irradiation with actinic light, and developed with a developer, leaving an image area to form the final printing plate.
次に実施例を示し本発明の効果を明らかにする。Next, Examples will be shown to clarify the effects of the present invention.
厚さ０．２４鰭のアルミニウム板を脱脂処理した後、塩
酸水溶液で電解研磨処理し、カセイソーダデスマットし
た。次に硫酸水溶液中で陽極酸化処理、熱水封孔処理を
行ない、平版印刷版用アルミニウム板を得た。After degreasing an aluminum plate having a thickness of 0.24 fin, it was electrolytically polished with an aqueous hydrochloric acid solution and desmutted with caustic soda. Next, anodization treatment and hot water sealing treatment were performed in an aqueous sulfuric acid solution to obtain an aluminum plate for a lithographic printing plate.
次にこのアルミニウム板に、第１図および第３図の塗布
装置により、次記の感光液をそれぞれ塗布・乾燥し、感
光性平版印刷版試料を得た。Next, the following photosensitive liquids were applied to the aluminum plate using the coating apparatus shown in FIGS. 1 and 3 and dried to obtain a photosensitive lithographic printing plate sample.
く感光液〉○ピロガロールアセトン樹脂（重量平均分子量１６００）とナフトキノン（１，２） リアジド−５−スルホニルクロライドとの縮合物（縮合率：水酸基の縮合率３３モル’ｔ＞ ２重量部０
混合クレゾール（フェノ−ル：ｍ−りＩ／ゾール：ｐクレゾール−２：５１）（重量平均分子量： １００００） ８重量部
０２−トリクロロメチル−β（２’−ベンゾフリル）ビニル１、３．４−オキサジアゾール ０．０６重量部Ｏ
ｐ−オクチルフェノールとナフトキノン（１，２）−リアジド−５−スルホニルクロライドとの縮合物（縮合率：水酸基の縮合率５０モルχ）０．１重量部○ビクトリ
アピュアブルーＢＯＨ（保十力谷化学社製） ０．０８重量部○フ
ッ素界面活性剤ｒｌ？ｃ−４３０Ｊ（３Ｍ社製）０．１
本所部○メチルセロソルブ ２０重量部○エチル
セロソルブ ３２重量部一方、本発明例と
従来例とにおいて、塗布条件を次のように設定した。Photosensitive liquid> ○Condensation product of pyrogallol acetone resin (weight average molecular weight 1600) and naphthoquinone (1,2) lyazide-5-sulfonyl chloride (condensation rate: condensation rate of hydroxyl group 33 mol't> 2 parts by weight 0
Mixed cresol (phenol: m-ri I/sol: p-cresol-2:51) (weight average molecular weight: 10,000) 8 parts by weight 02-trichloromethyl-β (2'-benzofuryl) vinyl 1,3.4- Oxadiazole 0.06 parts by weight O
Condensation product of p-octylphenol and naphthoquinone (1,2)-lyazide-5-sulfonyl chloride (condensation rate: condensation rate of hydroxyl group 50 mol χ) 0.1 part by weight ○ Victoria Pure Blue BOH (Hojurikiya Chemical Co., Ltd.) (manufactured by) 0.08 parts by weight ○ Fluorine surfactant rl? c-430J (manufactured by 3M) 0.1
Honjo Department ○ Methyl cellosolve 20 parts by weight ○ Ethyl cellosolve 32 parts by weight On the other hand, in the present invention example and the conventional example, the coating conditions were set as follows.
このような塗布によって、その塗布性を従来例と本発明
例とで比較したところ、第２表の通りであった。Through such coating, the coating properties of the conventional example and the example of the present invention were compared, and the results were as shown in Table 2.
第２表他方、かくしてでき上がった感光性平版印刷版をド記露
光条件現像条件で製版し、次の印刷条件で印刷を行なっ
た結果塗布性の良好な版おいては、印刷の刷り初めにお
いて、インキ着肉の良好な、ツヤとポリｊ、−ムのある
印刷物が得られた。Table 2 On the other hand, the resulting photosensitive lithographic printing plate was plate-made under the exposure and development conditions described above, and when printing was performed under the following printing conditions, the plates with good coating properties showed that at the beginning of printing, A printed matter with good ink adhesion and gloss and polychrome was obtained.
露光条件： フィルム原稿： へり部と４０χのＳｌ’
１点からなる原稿露光材 二 アイドルフィン露光条件 ： ８．Ｏｍｗ／ｃｍ” ９０秒現像
条件： 自現材 ： ＰＳＱ−９１０（コニカＫ
Ｋ製）現像液 ： ５ＤＲ−１（コニカｋｋ製）の６倍
希釈液現像条件 ： ２７℃、２０″印刷条件： 印刷材 ： ハイデルＧＴＯインキ
： 東洋インキ祇 ： コート紙ブランケット： 金陽社印刷スピード： ７０００枚／時また、感光性平版印刷版に自動［・ンボ描画材のボール
ペンにて“トンボ”を描きその目視での見やすさを比較
した結果、塗布性の良好は版は、はっきりその位置を確
認することができた。Exposure conditions: Film original: Edge and 40χ Sl'
Original exposure material consisting of one point 2. Idle fin exposure conditions: 8. Omw/cm” 90 seconds Development conditions: Automatic development material: PSQ-910 (Konica K
(manufactured by K) Developer: 6 times diluted solution of 5DR-1 (manufactured by Konica KK) Development conditions: 27°C, 20'' Printing conditions: Printing material: Heidel GTO ink
: Toyo Ink Gi : Coated paper blanket : Kinyosha Printing speed : 7,000 sheets/hour In addition, we drew "dragon marks" on a photosensitive lithographic printing plate automatically with a ballpoint pen made of drawing material and compared their visual visibility. The plate had good coating properties and its position could be clearly confirmed.
以上の通り、本発明によれば、泡故障が全く無くなり、
か・つ生産性が向−トするなどの利点がもたらされる。As described above, according to the present invention, there is no bubble failure at all,
This brings about advantages such as increased productivity.
第１図および第２図は本発明法を実施するための装置例
の概要図、第３図は押出ノズルの構造例の斜視図、第４
図は従来の塗布法の概要図である。１・・・・・・バット、２・・・・・・アプリケ−クロ
ール、３・・・・・・バックアップロール、４・・・・
・・メタリングロール、６・・・・・・ドクターブレー
ド、７・・・・・・感光液タンク、８・・・・・・ポン
プ、９・・・・・・フィルター１２・・・・・・超音波
振動子、２０・・・・・・押出ノズル、２１八、２１Ｂ
・・・・・・ノズルへ・ンド、２２・・・・・・スリッ
ト、２３・・・・・・ポケット特許出願人 コ ニ カ 株式会社第図第図第図手続補正書（自発）平成１年６月１３日事件の表示昭和６３年 特許願 第３２０８５３号発明の名称感光性印刷版製造用感光液の塗布方法補正をする者事件との関係 特許出願人４゜1 and 2 are schematic diagrams of an example of an apparatus for carrying out the method of the present invention, FIG. 3 is a perspective view of an example of the structure of an extrusion nozzle, and FIG.
The figure is a schematic diagram of a conventional coating method. 1...bat, 2...application roll, 3...backup roll, 4...
... Metering roll, 6 ... Doctor blade, 7 ... Photosensitive liquid tank, 8 ... Pump, 9 ... Filter 12 ...・Ultrasonic vibrator, 20... Extrusion nozzle, 218, 21B
...Nozzle end, 22...Slit, 23...Pocket patent applicant Konica Co., Ltd. Figure Figure Figure Procedure Amendment (Voluntary) 1999 Display of case dated June 13, 1988 Patent application No. 320853 Name of invention Person amending the method of applying photosensitive liquid for manufacturing photosensitive printing plates Relationship to case Patent applicant 4゜
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32085388AJPH02165149A (en) | 1988-12-20 | 1988-12-20 | Method of applying photosensitive liquid for manufacturing photosensitive printing plate |
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32085388AJPH02165149A (en) | 1988-12-20 | 1988-12-20 | Method of applying photosensitive liquid for manufacturing photosensitive printing plate |
| Publication Number | Publication Date |
|---|---|
| JPH02165149Atrue JPH02165149A (en) | 1990-06-26 |
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP32085388APendingJPH02165149A (en) | 1988-12-20 | 1988-12-20 | Method of applying photosensitive liquid for manufacturing photosensitive printing plate |
| Country | Link |
|---|---|
| JP (1) | JPH02165149A (en) |
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH066150A (en)* | 1992-06-18 | 1994-01-14 | Mitsubishi Electric Corp | High frequency transistor circuit |
| WO2000033975A3 (en)* | 1998-12-08 | 2000-09-08 | Avery Dennison Corp | Extrusion coating process for making high transparency protective and decorative films |
| US6336988B1 (en) | 1995-06-07 | 2002-01-08 | Avery Dennison Corporation | Extrusion coating process for making protective and decorative films |
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5695363A (en)* | 1979-12-28 | 1981-08-01 | Daicel Chem Ind Ltd | Painting method |
| JPS62110776A (en)* | 1985-11-08 | 1987-05-21 | Fuji Photo Film Co Ltd | Method and device for coating |
| JPS63231353A (en)* | 1987-03-19 | 1988-09-27 | Konica Corp | How to apply photosensitive liquid to photosensitive printing plates |
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5695363A (en)* | 1979-12-28 | 1981-08-01 | Daicel Chem Ind Ltd | Painting method |
| JPS62110776A (en)* | 1985-11-08 | 1987-05-21 | Fuji Photo Film Co Ltd | Method and device for coating |
| JPS63231353A (en)* | 1987-03-19 | 1988-09-27 | Konica Corp | How to apply photosensitive liquid to photosensitive printing plates |
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH066150A (en)* | 1992-06-18 | 1994-01-14 | Mitsubishi Electric Corp | High frequency transistor circuit |
| US6336988B1 (en) | 1995-06-07 | 2002-01-08 | Avery Dennison Corporation | Extrusion coating process for making protective and decorative films |
| US6547912B2 (en) | 1995-06-07 | 2003-04-15 | Avery Dennison Corporation | Extrusion coating process for making high transparency protective and decorative films |
| US6733870B2 (en) | 1995-06-07 | 2004-05-11 | Avery Dennison Corporation | Extrusion coating process for making protective and decorative films |
| US6773804B2 (en) | 1997-08-06 | 2004-08-10 | Avery Dennison Corporation | Extruded polymeric high transparency films |
| WO2000033975A3 (en)* | 1998-12-08 | 2000-09-08 | Avery Dennison Corp | Extrusion coating process for making high transparency protective and decorative films |
| US6254712B1 (en) | 1998-12-08 | 2001-07-03 | Avery Dennison Corporation | Extrusion coating process for making high transparency protective and decorative films |
| Publication | Publication Date | Title |
|---|---|---|
| JPS648819B2 (en) | ||
| JPS6151311B2 (en) | ||
| EP0323836B1 (en) | Method for manufacturing lithographic printing plates | |
| JPH02165149A (en) | Method of applying photosensitive liquid for manufacturing photosensitive printing plate | |
| US4880724A (en) | Method for manufacture of lithographic printing plate with disposable developer with surfactant | |
| EP0066990B1 (en) | Process for production of presensitized lithographic printing plates | |
| JPS5957242A (en) | Photoengraving method of lithographic printing plate | |
| JPH02165152A (en) | Device applying photosensitive liquid for manufacturing photosensitive printing plate | |
| JPH02165151A (en) | Device applying photosensitive liquid to photosensitive printing plate | |
| JPH02165150A (en) | Method of applying photosensitive liquid to photosensitive printing plate | |
| JPS62187856A (en) | Processing method for photosensitive lithographic printing plate | |
| JPS63109442A (en) | Method for stably processing negative and positive photosensitive materials in common | |
| JP2516001B2 (en) | How to make a planographic printing plate | |
| JPH02165148A (en) | Method of applying photosensitive liquid to photosensitive printing plate | |
| JP3361613B2 (en) | Rinse water for lithographic printing plates and plate making method for lithographic printing plates | |
| JPS63100460A (en) | Method for processing photosensitive material improved in stability or the like of development processing and automatic developing machine | |
| JP2627572B2 (en) | Burning pretreatment agent and plate making method using the same | |
| JPH0343739A (en) | Method for development processing of damping waterless photosensitive planographic printing plate | |
| JPS6262339B2 (en) | ||
| JPH037937A (en) | Method for developing photosensitive material | |
| JPH063542B2 (en) | Photosensitive lithographic printing plate processing method | |
| JPS6315252A (en) | Processing method for photosensitive lithographic printing plate which is improved in development stability or the like | |
| JPS63197951A (en) | Method for processing photosensitive material | |
| JPH02250056A (en) | Method and device for processing photosensitive planographic printing plate | |
| JPH0411859B2 (en) |