第1図はこの考案の一実施例を示す磁気デイス
クの断面図、第2図は同デイスク基板の平面図、
第3図は磁気シートの変形量の比較説明図、第4
図は従来例の磁気デイスクの断面図である。  1……磁気デイスク、2……デイスク基板、2
a……内周縁部、2b……外周縁部、4……凹部
、5……磁気シート、6,7,8……流体ガイド
。  FIG. 1 is a sectional view of a magnetic disk showing an embodiment of this invention, FIG. 2 is a plan view of the disk substrate,
 Figure 3 is a comparative explanatory diagram of the amount of deformation of the magnetic sheet, Figure 4
 The figure is a sectional view of a conventional magnetic disk. 1...Magnetic disk, 2...Disk substrate, 2
 a... Inner peripheral edge, 2b... Outer peripheral edge, 4... Recess, 5... Magnetic sheet, 6, 7, 8... Fluid guide.
| Application Number | Priority Date | Filing Date | Title | 
|---|---|---|---|
| JP4961488UJPH01154511U (en) | 1988-04-13 | 1988-04-13 | 
| Application Number | Priority Date | Filing Date | Title | 
|---|---|---|---|
| JP4961488UJPH01154511U (en) | 1988-04-13 | 1988-04-13 | 
| Publication Number | Publication Date | 
|---|---|
| JPH01154511Utrue JPH01154511U (en) | 1989-10-24 | 
| Application Number | Title | Priority Date | Filing Date | 
|---|---|---|---|
| JP4961488UPendingJPH01154511U (en) | 1988-04-13 | 1988-04-13 | 
| Country | Link | 
|---|---|
| JP (1) | JPH01154511U (en) | 
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| US6951804B2 (en) | 2001-02-02 | 2005-10-04 | Applied Materials, Inc. | Formation of a tantalum-nitride layer | 
| US7085616B2 (en) | 2001-07-27 | 2006-08-01 | Applied Materials, Inc. | Atomic layer deposition apparatus | 
| US7049226B2 (en) | 2001-09-26 | 2006-05-23 | Applied Materials, Inc. | Integration of ALD tantalum nitride for copper metallization | 
| US6911391B2 (en) | 2002-01-26 | 2005-06-28 | Applied Materials, Inc. | Integration of titanium and titanium nitride layers |