【０００１】[0001]
【産業上の利用分野】本発明は、金属板や非金属板の表
面を平面研摩するための平板の研摩装置に関するもの
で、特に大形の平板の研摩に好適なものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a flat plate polishing apparatus for flat-polishing the surface of a metal plate or a non-metal plate, and is particularly suitable for polishing a large flat plate.
【０００２】[0002]
【従来の技術】従来より、この種の研摩方法としてよく
知られているものに、回転バフ研摩法、回転ロール研摩
法、真円回転ラッピング研摩法、多軸式真円回転ラッピ
ング研摩法、電解複合研摩法などがある。しかし、これ
らの研摩方法によると、研摩面に目視できる程度の研摩
跡が色ムラとして残るため、製品の商品価値を損なう欠
点があった。また、エッチングステンレス材に適用する
と、回転するバフの内外で押圧力が均等でないため円形
のバフ跡が残り、そのまま前処理なしにエッチングする
と彫りムラが発生する。そのため、エッチングの前処理
として塩化第二鉄の希薄溶液で酸化クローム層を溶解除
去する必要があった。さらに、金めっき等のめっき材に
適用すると、ピッチング等の集中腐食を起こして無数の
ピンホールが発生し、めっきの色や光沢がぼけてめっき
ムラが残り、製品の５％程度にクレームがつく欠点があ
った。そこで、本発明者らは、上記のような欠点を解消
するために、平板状の研摩部材を研摩対象の平板の表面
に所定圧力で押し付けながらクランクを介して回転運動
させることにより前記平板の表面を平面研摩する研摩方
法を先に提供した（特願平４−１１０７６９号明細書参
照）。2. Description of the Related Art Conventionally, there are well-known polishing methods of this kind, such as a rotating buff polishing method, a rotating roll polishing method, a perfect circular rotating lapping polishing method, a multiaxial perfect circular rotating lapping polishing method, There is a combined polishing method. However, according to these polishing methods, there is a disadvantage that the commercial value of the product is impaired because polishing marks that remain visible on the polished surface remain as color unevenness. In addition, when applied to an etched stainless steel material, the pressing force is not uniform inside and outside the rotating buff, so that a circular buff mark remains. Therefore, it was necessary to dissolve and remove the chromium oxide layer with a dilute solution of ferric chloride as a pretreatment for etching. Furthermore, when applied to plating materials such as gold plating, concentrated corrosion such as pitching occurs, innumerable pinholes are generated, plating color and gloss are blurred, plating unevenness remains, and complaints are made in about 5% of products. There were drawbacks. In order to solve the above-mentioned drawbacks, the inventors of the present invention rotate a plate-like polishing member through a crank while pressing the plate-like polishing member against a surface of a plate to be polished with a predetermined pressure, thereby rotating the surface of the plate. (See Japanese Patent Application No. 4-110767).
【０００３】[0003]
【発明が解決しようとする課題】しかし、上記研摩方法
においても、めっき材に適用した場合に製品の数％にめ
っきムラが残ってクレームがつくことがあったり、また
研摩速度が必ずしも十分に速くないなどの問題があっ
た。本発明は、以上のような問題点に鑑みなされたもの
であって、製品に色ムラ、彫りムラ、めっきムラなどを
発生させることがなく、且つ研摩速度が十分に速い研摩
装置を提供することを目的とする。However, even in the above-mentioned polishing method, when applied to a plating material, plating unevenness may remain in a few percent of the product to cause a complaint, and the polishing speed is not always sufficiently high. There was no problem. The present invention has been made in view of the above problems, and provides a polishing apparatus that does not cause color unevenness, engraving unevenness, plating unevenness, and the like in a product, and has a sufficiently high polishing speed. With the goal.
【０００４】[0004]
【課題を解決するための手段】上記目的を達成するため
に、本発明の平板の研摩装置は、上面に研摩対象の平板
を載置するテーブルを架台上に水平状態に設けるととも
に、前記架台上に門型架構を走行手段を介して走行自在
に且つ前記テーブルの上方を跨ぐように立設し、該門型
架構に前後一対の研摩ヘッドを門型架構の走行方向に配
置して昇降手段により昇降自在に吊り下げ、これら両研
摩ヘッドに水平面内で互いに逆回転するクランクを備え
た一対の軌道運動手段を設けるとともに、両クランクに
一対の平板状の研摩部材を取り付けた構成としている。
そして、前記前後一対の研摩部材を左右方向に搖動させ
ることが好ましく、そのためには、前記門型架構に前後
一対の研摩ヘッドを左右方向に搖動させる搖動手段を設
ける。In order to achieve the above-mentioned object, a flat plate polishing apparatus according to the present invention is provided with a table on which a flat plate to be polished is placed on a top surface in a horizontal state. The portal frame is erected so that it can run freely through the traveling means and straddles above the table, and a pair of front and rear polishing heads are disposed on the portal frame in the traveling direction of the portal frame, and the lifting means The two polishing heads are suspended so as to be able to move up and down, and a pair of orbital movement means having cranks that rotate in opposite directions in a horizontal plane are provided on both of these polishing heads, and a pair of plate-like polishing members are attached to both cranks.
It is preferable to swing the pair of front and rear polishing members in the left-right direction. For this purpose, the portal frame is provided with a rocking means for swinging the pair of front and rear polishing heads in the left-right direction.
【０００５】[0005]
【作用】上記構成の本発明においては、研摩対象の平板
をテーブル上面に水平状態に載置し、昇降手段により両
研摩ヘッドを下降させて両研摩部材を平板の表面に所定
圧力で押し付けながら、軌道運動手段のクランクにより
両研摩部材を水平面内で互いに逆方向に円軌道に沿って
軌道運動させると同時に、走行手段により門型架構を走
行させて両研摩部材を前後方向に走行させることにより
平板の表面を平面研摩する。このように本発明では、前
後一対の研摩部材を互いに逆方向に円軌道に沿って軌道
運動させながら前後方向に走行させるので、製品に色ム
ラ、彫りムラ、めっきムラなどが発生せず、また両研摩
部材の相乗効果により研摩速度が著しく向上する。そし
て、搖動手段により両研摩部材を左右方向に搖動させる
と、オシレーション効果が増大してより良好な均一研摩
が可能となる。In the present invention having the above construction, the flat plate to be polished is placed horizontally on the upper surface of the table, and both polishing heads are lowered by the lifting / lowering means to press both polishing members against the surface of the flat plate at a predetermined pressure. The orbital motion of the two polishing members in the horizontal plane in the opposite direction along the circular orbit by the crank of the orbital motion means, and at the same time, the traveling means travels the portal frame to cause the two polishing members to travel in the front-rear direction. Surface is polished. As described above, in the present invention, the pair of front and rear polishing members are caused to travel in the front-rear direction while orbiting along the circular orbit in opposite directions, so that the product does not have color unevenness, engraving unevenness, plating unevenness, etc. The polishing speed is remarkably improved by the synergistic effect of the two polishing members. When the two polishing members are oscillated in the left-right direction by the oscillating means, the oscillation effect is increased and more uniform polishing can be performed.
【０００６】[0006]
【実施例】以下、本発明の一実施例を図１〜図６に基づ
いて説明する。本実施例に使用する研摩装置において
は、図１及び図２に示すように、架台１上にテーブル２
を設けるとともに走行手段４を介して門型架構３を立設
し、門型架構３に搖動手段５及び昇降手段６を介して前
後一対の研摩ヘッド７を吊り下げ、両研摩ヘッド７に軌
道運動手段８を介して前後一対の研摩部材９を取り付け
ている。１０は研摩対象の平板である。なお、本装置で
は、架台１の長辺方向を前後方向とし、短辺方向を左右
方向とする（図２参照）。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS One embodiment of the present invention will be described below with reference to FIGS. In the polishing apparatus used in the present embodiment, as shown in FIGS.
And the portal frame 3 is erected via the traveling means 4, and a pair of front and rear polishing heads 7 are suspended from the portal frame 3 via the swinging means 5 and the lifting / lowering means 6, and the orbital motion is applied to both the polishing heads 7. A pair of front and rear polishing members 9 are attached via means 8. Reference numeral 10 denotes a flat plate to be polished. In the present apparatus, the long side direction of the gantry 1 is the front-back direction, and the short side direction is the left-right direction (see FIG. 2).
【０００７】架台１は、平面形状が長方形で、上面に走
行レール１１とラックレール１２とが前後方向に２条ず
つ敷設されている。テーブル２は、上面に研摩対象の平
板１０を載置するための定盤で、架台１上に水平状態に
設置されている。平板１０には、長方形の大形切板を使
用している。テーブル２の上面には、平板１０と同一の
板厚を有する当て板１３が平板１０の側面に沿うように
固設され、研摩部材９が平板１０の側面エッジ部により
損傷するのを防止する。そのため、当て板１３の幅は、
研摩部材９の運動範囲が当て板１３から食み出さないよ
うに設定されている。The gantry 1 has a rectangular shape in plan view, and a traveling rail 11 and a rack rail 12 are laid on the upper surface in two rows in the front-rear direction. The table 2 is a surface plate on which the flat plate 10 to be polished is placed on the upper surface, and is set on the gantry 1 in a horizontal state. As the flat plate 10, a rectangular large-sized cut plate is used. A patch plate 13 having the same thickness as the flat plate 10 is fixed on the upper surface of the table 2 along the side surface of the flat plate 10 to prevent the polishing member 9 from being damaged by the side edge of the flat plate 10. Therefore, the width of the contact plate 13 is
The movement range of the polishing member 9 is set so as not to protrude from the backing plate 13.
【０００８】門型架構３は、テーブル２の上方を跨ぐよ
うに架台１の走行レール１１上に立設され、走行手段４
により前後方向に走行駆動される。走行手段４は、図３
に示すように、門型架構３の脚部に回動自在に取り付け
た走行車輪１４及び走行ギヤ１５と、走行ギヤ１５を駆
動する走行駆動装置１６とからなり、さらに浮上り防止
機構１７及び横搖れ防止機構１８が付設されている。走
行車輪１４は、門型架構３を支持して走行レール１１上
を転動する。走行ギヤ１５は、架台１のラックレール１
２と噛合し、走行駆動装置１６により回転されて門型架
構３を走行させる。走行駆動装置１６は、前記脚部の間
に左右方向に設けた駆動軸１９の両端に走行ギヤ１５と
噛合する駆動ギヤ２０を設けるとともに、駆動軸１９の
中央部を一対の減速ギヤ２１、２２を介して減速機２３
に接続し、減速機２３に駆動チエーン２４を介して走行
モータ２５を接続したものである。また、浮上り防止機
構１７及び横搖れ防止機構１８は、それぞれ前記脚部に
回動自在に取り付けた浮上り防止ローラ２６及び横搖れ
防止ローラ２７からなり、浮上り防止ローラ２６は架台
１の下面に沿って走行することにより門型架構３が走行
レール１１から浮き上がるのを防止し、また横搖れ防止
ローラ２７は走行レール１１の側面に沿って走行するこ
とにより門型架構３の横搖れを防止し、いずれも研摩ム
ラの発生を防止する。The portal frame 3 is erected on the traveling rail 11 of the gantry 1 so as to straddle above the table 2,
, Thereby driving the vehicle in the front-rear direction. The traveling means 4 is shown in FIG.
As shown in FIG. 5, the vehicle comprises a traveling wheel 14 and a traveling gear 15 rotatably attached to the legs of the portal frame 3, and a traveling driving device 16 for driving the traveling gear 15. A swing prevention mechanism 18 is provided. The traveling wheels 14 roll on the traveling rail 11 while supporting the portal frame 3. The traveling gear 15 is mounted on the rack rail 1 of the gantry 1.
2 and is rotated by the traveling drive unit 16 to travel the portal frame 3. The traveling driving device 16 has a driving gear 20 that meshes with the traveling gear 15 at both ends of a driving shaft 19 provided between the legs in the left-right direction, and a central portion of the driving shaft 19 is connected to a pair of reduction gears 21 and 22. Through the speed reducer 23
And a traveling motor 25 is connected to the speed reducer 23 via a drive chain 24. The lifting prevention mechanism 17 and the anti-rolling mechanism 18 include a lifting prevention roller 26 and a anti-rolling roller 27 rotatably attached to the legs, respectively. By running along, the portal frame 3 is prevented from rising from the traveling rail 11, and the anti-rolling roller 27 is traveling along the side surface of the traveling rail 11 to prevent the portal frame 3 from rolling. In any case, the occurrence of polishing unevenness is prevented.
【０００９】搖動手段５は、門型架構３の桁部上に配置
した左右二対の搖動案内部材２８により前後一対の搖動
板２９を左右方向に搖動自在に支持し、搖動板２９に搖
動シリンダ３０を接続してなるものである。昇降手段６
は、各搖動板２９上に左右一対ずつ設けた昇降シリンダ
３１及び圧力調整機構３２からなり、これらが前後一対
の研摩ヘッド７を昇降自在に吊り下げている。昇降シリ
ンダ３１は、そのピストン棒３３の出退により研摩ヘッ
ド７を昇降させる。圧力調整機構３２は、搖動板２９上
に立設した案内筒３４に研摩ヘッド７を吊り下げた吊り
棒３５を昇降自在に挿通し、吊り棒３５の上端部に螺着
した調整ナット３６と案内筒３４の底部との間に圧縮ば
ね３７を介設してなり、昇降シリンダ３１が圧縮ばね３
７に抗して研摩部材９の研摩面を平板１０に押し付ける
研摩圧力を調整ナット３６の締め加減により適正値に調
整する。The rocking means 5 supports a pair of front and rear rocking plates 29 so as to be able to rock in the left and right directions by two pairs of right and left rocking guide members 28 disposed on the girder of the portal frame 3. 30 are connected. Lifting means 6
Comprises a pair of left and right lifting cylinders 31 and a pressure adjusting mechanism 32 provided on each rocking plate 29, which suspend the pair of front and rear polishing heads 7 so as to be able to move up and down. The lifting cylinder 31 raises and lowers the polishing head 7 by moving the piston rod 33 back and forth. The pressure adjusting mechanism 32 inserts a suspending rod 35, which suspends the polishing head 7, into a guide cylinder 34 erected on the swinging plate 29 so as to be able to move up and down, and guides an adjusting nut 36 screwed to an upper end of the suspending rod 35. A compression spring 37 is interposed between the bottom of the cylinder 34 and the lifting cylinder 31 so that the compression spring 3
The polishing pressure for pressing the polished surface of the polishing member 9 against the flat plate 10 against the plate 7 is adjusted to an appropriate value by tightening and reducing the adjusting nut 36.
【００１０】研摩ヘッド７は、昇降手段６を介して各搖
動板２９に吊り下げられた前後一対の支持梁３８を門型
架構３の両脚部に設けた左右二対の昇降案内部材３９の
間に介設し、各支持梁３８に軌道運動手段８を介して前
後一対の回転板４０を吊り下げ、各回転板４０を下面に
ゴム等からなる緩衝部材４１を介して研摩部材取付板４
２を固設してなるものである。The polishing head 7 has a pair of front and rear support beams 38 suspended on each rocking plate 29 via the lifting / lowering means 6 between two pairs of right and left lifting guide members 39 provided on both legs of the portal frame 3. And a pair of front and rear rotary plates 40 are suspended from each support beam 38 via the orbital motion means 8, and each rotary plate 40 is provided on the lower surface thereof with a buffer member 41 made of rubber or the like.
2 is fixedly provided.
【００１１】軌道運動手段８は、前後一対の研摩ヘッド
７の支持梁３８と回転板４０との間に主クランク４３と
２個の補助クランク４４とを主クランク４３を中央にし
て左右方向に一列に並設し、各支持梁３８上に駆動モー
タ４５を設けてなるものである。主クランク４３は、上
端部が駆動モータ４５に接続され、下端部が回転板４０
に回動自在に接続されている。また、補助クランク４４
は、上下両端部がそれぞれ支持梁３８及び回転板４０に
回動自在に接続されており、主クランク４３が回転する
と回転板４０を介して連れ回りして、回転板４０を回転
運動させる。この回転板４０の回転運動の長軸は左右方
向に向いている。各駆動モータ４５は、前記一対の主ク
ランク４３を互いに逆方向に回転させるように設定され
ている。The orbital movement means 8 includes a main crank 43 and two auxiliary cranks 44 arranged in a line between the support beam 38 of the pair of front and rear polishing heads 7 and the rotary plate 40 in the left-right direction with the main crank 43 as a center. And a drive motor 45 is provided on each support beam 38. The main crank 43 has an upper end connected to the drive motor 45 and a lower end connected to the rotary plate 40.
Are rotatably connected. Also, the auxiliary crank 44
The upper and lower ends are rotatably connected to the support beam 38 and the rotating plate 40, respectively. When the main crank 43 rotates, the main crank 43 rotates via the rotating plate 40 to rotate the rotating plate 40. The major axis of the rotational movement of the rotary plate 40 is oriented in the left-right direction. Each drive motor 45 is set to rotate the pair of main cranks 43 in directions opposite to each other.
【００１２】研摩部材９は、長方形板状の砥石、スコッ
チライト、バフ等からなり、前後一対の研摩ヘッド７の
研摩部材取付板４２の下面に着脱自在に取り付けられて
いる。各研摩部材９は、主クランク４３により回転板４
０とともに互いに逆方向に軌道運動する。研摩部材９の
左右方向の幅は、研摩対象の平板１０の左右方向の幅よ
りも大きく設定してあり、均一研摩を可能にしている。
図１に示す研摩部材９は、バフの場合であって、バフケ
ース４６に収容され、研摩面には図４〜図６に示すよう
な研摩液貯留用凹溝４７が前後方向に対して傾斜するよ
うに複数条形成されるとともに、研摩液定量供給用給液
孔４８が複数個穿設されている。これら凹溝４７及び給
液孔４８は、研摩面に含浸させた研摩剤を含む研摩液を
研摩時に掻き寄せて保持し、研摩液が研摩面から散逸す
るのを防止するとともに、研摩中に貯留した研摩液を徐
々に放出供給して研摩効率を高める。平板１０は、ステ
ンレス板、真鍮板、アルミニウム板等の金属板やガラス
板等の非金属板からなる研摩対象である。図２に示す平
板１０は、幅１．２ｍ×長さ３ｍの長方形の大形切板
で、テーブル２の上面に水平状態に載置され、側板が当
て板１３により固定されている。The polishing member 9 is made of a rectangular plate-shaped grindstone, scotch light, buff, or the like, and is detachably attached to the lower surface of the polishing member mounting plate 42 of the pair of front and rear polishing heads 7. Each polishing member 9 is connected to the rotating plate 4 by the main crank 43.
It orbits in the opposite direction with 0. The width in the left-right direction of the polishing member 9 is set to be larger than the width in the left-right direction of the flat plate 10 to be polished, thereby enabling uniform polishing.
The polishing member 9 shown in FIG. 1 is a buff case, and is accommodated in a buff case 46, and a polishing liquid storage groove 47 as shown in FIGS. As described above, a plurality of liquid supply holes 48 for quantitatively supplying the polishing liquid are formed. The concave groove 47 and the liquid supply hole 48 hold the polishing liquid containing the abrasive impregnated on the polishing surface by being raked during polishing, prevent the polishing liquid from dissipating from the polishing surface, and store the polishing liquid during polishing. The polishing liquid is gradually released and supplied to increase the polishing efficiency. The flat plate 10 is an object to be polished made of a metal plate such as a stainless steel plate, a brass plate, or an aluminum plate, or a non-metallic plate such as a glass plate. The flat plate 10 shown in FIG. 2 is a large rectangular cut plate having a width of 1.2 m and a length of 3 m, is placed horizontally on the upper surface of the table 2, and a side plate is fixed by a backing plate 13.
【００１３】上記構成の研摩装置を使用して、本発明の
研摩方法により平板１０の表面を平面研摩するには、前
後一対の研摩部材９の研摩面に研摩剤を含んだ研摩液を
含浸させた後、昇降シリンダ３１により面研摩ヘッド７
を下降させて両研摩部材９を平板１０の表面に所定圧力
で押し付けながら、駆動モータ４５により各クランク４
３、４４を介して両研摩部材９を水平面内で互いに逆方
向に円軌道に沿って軌道運動させる。この場合の前記所
定圧力は０．５〜１．５kg／cm2程度が適正で、圧力調
整機構３２の調整ナット３６の締め加減により予め調整
しておく。また、両駆動モータ４５の回転速度はベクト
ルインバータ制御により毎分１００〜４５０回軌道運動
するように制御し、各クランク４３、４４の回転半径は
５０〜１００mmとしておく。In order to planarly polish the surface of the flat plate 10 by the polishing method of the present invention using the polishing apparatus having the above-described structure, the polishing surfaces of the pair of front and rear polishing members 9 are impregnated with a polishing liquid containing a polishing agent. After that, the surface polishing head 7 is
Is lowered to press the two polishing members 9 against the surface of the flat plate 10 at a predetermined pressure, and the drive motor 45 rotates each of the cranks 4.
The two polishing members 9 are orbited along circular orbits in directions opposite to each other in a horizontal plane via the members 3 and 44. In this case, the predetermined pressure is appropriately about 0.5 to 1.5 kg / cm2, and is adjusted in advance by tightening or reducing the adjusting nut 36 of the pressure adjusting mechanism 32. The rotational speeds of both drive motors 45 are controlled by vector inverter control so as to orbit 100 to 450 times per minute, and the rotational radii of the cranks 43 and 44 are set to 50 to 100 mm.
【００１４】続いて、搖動シリンダ３０により搖動板２
９を介して前後一対の研摩ヘッド７を左右方向に搖動さ
せると同時に、走行駆動装置１６により門型架構３を前
後方向に走行させる。この場合の両搖動シリンダ３０の
搖動ストロークはインバータ制御により１００〜２００
mmに制御するとともに、搖動サイクルを毎分６〜３０ス
トローク程度にしておく。また、門型架構３の研摩時の
走行速度は毎分１〜５ｍ程度が好ましい。かくして、両
研摩部材９は平板１０の表面を適正な条件で平面研摩す
る。その際、前後一対の研摩部材９がクランク４３、４
４を介して互いに逆方向に軌道運動しながら前後方向に
走行するので、両研摩部材９が平板１０を押し付ける圧
力が研摩面全体に均一に分布するとともに、研摩ヘッド
７に伴って左右方向に搖動するのでそのオシレーション
効果が加わり、大形の平板１０に対しても精密な均一鏡
面研摩が可能となっている。したがって、製品に色ム
ラ、彫りムラ、めっきムラなどが発生せず、平板１０が
エッチング材の場合でも前処理が不要である。また、研
摩時間は、従来は１２分を要したのに対し、本実施例で
は前後一対の研摩部材９の相乗効果により２分ですみ、
従来の１／６に短縮される。なお、本実施例では、平板
１０を切板としたので門型架構３を前後方向に走行させ
たが、他の実施例として（図示省略）、平板１０が帯板
をコイル状に巻回したようなものである場合には、門型
架構３を走行させる代わりに、コイル状の平板１０を解
いて前後方向に送給する送給手段を設けてもよい。これ
により、連続研摩が可能となり、生産性が著しく向上す
る。Subsequently, the swing plate 2 is moved by the swing cylinder 30.
At the same time, the pair of front and rear polishing heads 7 are swung in the left-right direction via the driving mechanism 9, and at the same time, the portal frame 3 is moved in the front-rear direction by the traveling driving device 16. In this case, the oscillating stroke of both oscillating cylinders 30 is 100 to 200 by inverter control.
mm and the swing cycle is set to about 6 to 30 strokes per minute. The traveling speed during polishing of the portal frame 3 is preferably about 1 to 5 m per minute. Thus, the two polishing members 9 flat-polish the surface of the flat plate 10 under appropriate conditions. At this time, the pair of front and rear polishing members 9
Since the vehicle travels in the front-rear direction while orbiting in the opposite direction via 4, the pressure of the two polishing members 9 pressing the flat plate 10 is uniformly distributed over the entire polishing surface, and swings in the left-right direction with the polishing head 7. Therefore, the oscillation effect is added, and precise uniform mirror polishing can be performed even on the large flat plate 10. Therefore, color unevenness, engraving unevenness, plating unevenness, and the like do not occur in the product, and no pretreatment is required even when the flat plate 10 is an etching material. In addition, the polishing time conventionally required 12 minutes, but in the present embodiment, only 2 minutes is required due to the synergistic effect of the pair of front and rear polishing members 9.
It is reduced to 1/6 of the conventional one. In this embodiment, since the flat plate 10 is a cut plate, the portal frame 3 is run in the front-rear direction. However, as another embodiment (not shown), the flat plate 10 is formed by winding a band plate into a coil shape. In such a case, a feeding means for unwinding the coiled flat plate 10 and feeding it in the front-rear direction may be provided instead of running the portal frame 3. Thereby, continuous polishing becomes possible, and productivity is remarkably improved.
【００１５】[0015]
【発明の効果】本発明は、以上説明したように構成され
ているので、以下の利点を有する。 （１）前後一対の平板状の研摩部材がクランクを介して
互いに逆方向に軌道運動しながら前後方向に走行するこ
とにより研摩対象の平板の表面を平面研摩するので、両
研摩部材が平板を押し付ける圧力が研摩面全体に均一に
分布し、大形の平板に対しても精密な均一鏡面研摩をす
ることができる。そのため、製品に色ムラ、彫りムラ、
めっきムラなどが発生せず、クレームもつかない。 （２）前後一対の研摩部材の相乗効果により、一個の研
摩部材の場合に比べて研摩速度が約４〜６倍に向上す
る。 （３）両研摩部材を左右方向に搖動させるとそのオシレ
ーション効果が加わり、より良好な均一研摩が可能とな
る。 （４）両研摩部材を前後方向に走行させる代わりに、研
摩対象の平板を前後方向に送給するようにすると、研摩
対象が帯板をコイル状に巻回したようなものである場合
に連続研摩が可能となり、生産性が著しく向上する。Since the present invention is configured as described above, it has the following advantages. (1) A pair of front and rear plate-like polishing members travel in the front-rear direction while orbiting in opposite directions via a crank to flatten the surface of the plate to be polished, so that both polishing members press the flat plates. The pressure is uniformly distributed over the entire polished surface, so that even a large flat plate can be precisely and precisely mirror-polished. Therefore, the product may have uneven color, uneven engraving,
No uneven plating and no complaints. (2) By the synergistic effect of the pair of front and rear polishing members, the polishing speed is improved about 4 to 6 times as compared with the case of one polishing member. (3) When both polishing members are swung in the left-right direction, the oscillation effect is added, and better uniform polishing becomes possible. (4) When the flat plate to be polished is fed in the front-rear direction instead of running the two polishing members in the front-rear direction, continuous operation is performed when the polished object is like a strip wound in a coil shape. Polishing becomes possible and productivity is remarkably improved.
【図面の簡単な説明】[Brief description of the drawings]
【図１】本発明の研摩方法に使用する研摩装置の一実施
例を示す正面図である。FIG. 1 is a front view showing one embodiment of a polishing apparatus used for a polishing method of the present invention.
【図２】図１の平面図である。FIG. 2 is a plan view of FIG.
【図３】図１の研摩装置に使用した走行手段の正面図で
ある。FIG. 3 is a front view of a traveling unit used in the polishing apparatus of FIG. 1;
【図４】図１の研摩装置に使用した前後一対の研摩部材
の拡大平面図である。FIG. 4 is an enlarged plan view of a pair of front and rear polishing members used in the polishing apparatus of FIG. 1;
【図５】図４の正面図である。FIG. 5 is a front view of FIG. 4;
【図６】図４のＡ矢視図である。FIG. 6 is a view taken in the direction of arrow A in FIG. 4;
１ 架台 ２ テーブル ３ 門型架構 ４ 走行手段 ５ 搖動手段 ６ 昇降手段 ７ 研摩ヘッド ８ 軌道運動手段 ９ 研摩部材 １０ 平板 ４３ クランク（主） ４４ クランク（補
助）REFERENCE SIGNS LIST 1 base 2 table 3 portal frame 4 running means 5 rocking means 6 elevating means 7 polishing head 8 orbital movement means 9 polishing member 10 flat plate 43 crank (main) 44 crank (auxiliary)
───────────────────────────────────────────────────── フロントページの続き (72)発明者 吉原 義人 兵庫県加古川市尾上町池田美サシ830 (72)発明者 澤田 康弘 大阪府東大阪市四条町19−５ (72)発明者 森下 一夫 大阪府大阪市中央区瓦屋町３−２−24本 田実ビル (72)発明者 倉野 玉樹 大阪府大東市諸福５丁目７−10 ボンジ ュール木村302 (56)参考文献 特開 平４−146072（ＪＰ，Ａ) 特開 昭51−51089（ＪＰ，Ａ) 特開 昭62−228364（ＪＰ，Ａ) 特開 平５−277914（ＪＰ，Ａ) 実開 平１−170556（ＪＰ，Ｕ) (58)調査した分野(Int.Cl.7，ＤＢ名) B24B 29/00 - 29/02 B24B 29/06 B24B 37/04──────────────────────────────────────────────────続 き Continued on the front page (72) Yoshito Yoshihara, Inventor 830 Misashi Ikeda, Onoe-cho, Kakogawa-shi, Hyogo (72) Inventor Yasuhiro Sawada 19-5, Shijo-cho, Higashi-Osaka-shi, Osaka (72) Kazuo Morishita, Osaka 3-2-24 Honda Minami Building, Kawaraya-cho, Chuo-ku, Osaka (72) Inventor Tamaki Kurano 5-7-10 Morofuku, Daito-shi, Osaka Bondimu Kimura 302 (56) References JP-A-4-146607 (JP, A JP-A-51-51089 (JP, A) JP-A-62-228364 (JP, A) JP-A-5-277914 (JP, A) JP-A-1-170556 (JP, U) (58) Field (Int.Cl.7 , DB name) B24B 29/00-29/02 B24B 29/06 B24B 37/04
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7536493AJP3103456B2 (en) | 1993-03-08 | 1993-03-08 | Flat plate polishing equipment |
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7536493AJP3103456B2 (en) | 1993-03-08 | 1993-03-08 | Flat plate polishing equipment |
| Publication Number | Publication Date |
|---|---|
| JPH06262511A JPH06262511A (en) | 1994-09-20 |
| JP3103456B2true JP3103456B2 (en) | 2000-10-30 |
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7536493AExpired - Fee RelatedJP3103456B2 (en) | 1993-03-08 | 1993-03-08 | Flat plate polishing equipment |
| Country | Link |
|---|---|
| JP (1) | JP3103456B2 (en) |
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| Publication number | Publication date |
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| JPH06262511A (en) | 1994-09-20 |
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| Date | Code | Title | Description |
|---|---|---|---|
| A01 | Written decision to grant a patent or to grant a registration (utility model) | Free format text:JAPANESE INTERMEDIATE CODE: A01 Effective date:20000725 | |
| LAPS | Cancellation because of no payment of annual fees |