【発明の詳細な説明】 産業上の利用分野 本発明は、研磨テープ等の研磨布紙およびその製造方
法に関するものである。TECHNICAL FIELD The present invention relates to an abrasive cloth paper such as an abrasive tape and a method for producing the same.
従来の技術 従来、磁気ヘッドのコアを研磨する等の精密加工用研
磨テープが使用されており、これら従来の研磨テープと
しては、基材面上に設けた研磨材層がほぼ平坦である通
常の研磨テープや、ミクロコーティング社から市販され
ているような研磨材層がベナード・セル（Benard Cel
l）構造を有するような研磨テープがあった。このベナ
ード・セル構造の研磨テープは、添付図面の第８図の平
面図および第９図の断面図に示すように、研磨テープ10
の基材11の面上に形成された研磨材層12が、山状の境界
部12Aとこの境界部12Aによって囲まれた谷部12Bとから
なる亀甲模様状のセル構造を有するものであり、このよ
うないわゆるベナード・セル構造の形成される理由は、
十分に解明されていないが、溶剤の蒸発ともなうビヒク
ルの対流と関係があり、塗膜面で溶剤が蒸発する際、塗
膜内部の溶剤は表面における消失を補う為、表面へ拡散
や移動を始める。この運動を促進する様な逃げ道が表面
上に幾何学的な模様を残す。又この対流作用により粒子
の移動度の差即ち粒度分布により粒子の分級が生ずる。
特にこの現象は低粘度、速乾性塗料において顕著に確認
される。2. Description of the Related Art Conventionally, polishing tapes for precision processing such as polishing the core of a magnetic head have been used. As these conventional polishing tapes, a conventional polishing tape having a substantially flat abrasive layer provided on a substrate surface is used. Abrasive tapes or abrasive layers such as those commercially available from Micro Coating are available from Benard Cel.
l) There was an abrasive tape having a structure. As shown in the plan view of FIG. 8 and the sectional view of FIG. 9 of the accompanying drawings, the polishing tape of the Benard cell structure has a polishing tape 10
The abrasive layer 12 formed on the surface of the base material 11 has a cell structure in a hexagonal pattern composed of a mountain-shaped boundary 12A and a valley 12B surrounded by the boundary 12A, The reason why such a so-called Benard cell structure is formed is
Although not fully clarified, it is related to the convection of the vehicle accompanying the evaporation of the solvent, and when the solvent evaporates on the surface of the coating film, the solvent inside the coating film compensates for the disappearance at the surface and begins to diffuse or move to the surface . An escape route that facilitates this movement leaves a geometric pattern on the surface. Also, due to this convection action, particle classification occurs due to the difference in particle mobility, that is, the particle size distribution.
In particular, this phenomenon is remarkably confirmed in a low-viscosity, quick-drying paint.
発明が解決しようとする問題点 従来の平坦な研磨材層を有する通常の研磨テープで
は、チップポケットが小さく、又研削液を十分に保持で
きず、研磨を繰り返すうちに目詰まりを生じ易い。ま
た、被研磨物との接触面積が大きいので、磁気ヘッド等
のクリーニングディスク等に用いるときその始動時のト
ルクが比較的大きくなってしまい、また、十分なクリー
ニング効果を得ることができなかった。ベナード・セル
構造の研磨テープは、研磨材層が凹凸構造を有するため
に、ある程度研削液を保持でき、凹部がチップポケット
として作用しうるので、目詰まりの防止に役立つと考え
られた。しかし、実際には、それらの凹部は、研磨クズ
等を逃すためのチップポケットとして十分には作用せ
ず、したがって、このベナード・セル構造の研磨テープ
もまた、目詰まりを生じ易く、耐久性に劣るものであっ
た。Problems to be Solved by the Invention In a conventional polishing tape having a conventional flat polishing material layer, the chip pocket is small, the grinding liquid cannot be sufficiently held, and clogging easily occurs during repeated polishing. Further, since the contact area with the object to be polished is large, the torque at the time of starting is relatively large when used for a cleaning disk such as a magnetic head, and a sufficient cleaning effect cannot be obtained. The polishing tape having the Benard cell structure is considered to be useful for preventing clogging because the polishing material layer has an uneven structure, so that it can hold the grinding liquid to some extent and the recesses can function as chip pockets. However, in reality, these recesses do not sufficiently function as chip pockets for releasing polishing debris, etc. Therefore, the polishing tape of this Benard cell structure is also apt to cause clogging and durability. It was inferior.
本発明の目的は、このような従来技術の問題点を解消
しうる研磨布紙およびその製造方法を提供することであ
る。An object of the present invention is to provide an abrasive cloth paper and a method for manufacturing the same, which can solve the problems of the prior art.
問題点を解決するための手段 本発明による研磨布紙の製造方法によれば、溶剤の蒸
発過程で樹脂の相分離が生じうる程度に互いに相溶性の
悪い２種以上の樹脂を、研磨材粒子と共に溶剤中にて混
合してなる研磨材塗料を準備し、基材を準備し、該基材
の面に前記研磨材塗料を塗布して、乾燥させて、樹脂の
相分離により前記研磨材粒子が存在する研磨部と前記研
磨材粒子が存在しない溝部とからなる海島構造の研磨材
層が前記基材の面に形成されるようにすることによっ
て、研磨布紙が製造される。Means for Solving the Problems According to the method for manufacturing an abrasive cloth and paper according to the present invention, two or more kinds of resins having poor compatibility with each other to the extent that phase separation of the resins may occur during the evaporation process of the solvent are made into abrasive particles. An abrasive coating material mixed with a solvent is prepared, a base material is prepared, the abrasive coating material is applied to the surface of the base material and dried, and the abrasive particles are obtained by phase separation of a resin. The abrasive cloth paper is manufactured by forming an abrasive layer having a sea-island structure consisting of an abrasive part having a groove and a groove part having no abrasive particles on the surface of the base material.
実施例 次に、添付図面の第１図から第７図を特に参照して本
発明の実施例について本発明をより詳細に説明する。Embodiments The invention will now be described in more detail with reference to embodiments of the invention, with particular reference to FIGS. 1 to 7 of the accompanying drawings.
第１図は、本発明の一実施例としての研磨テープの一
部を示す平面図であり、第２図は、第１図のＸ−Ｘ線に
沿ってとった拡大断面図である。第１図および第２図に
示す実施例の研磨テープ20は、テープ状の基材21の上面
に研磨材層22が付与されており、この研磨材層22は、海
島構造とされている。すなわち、図中、斜線を施して示
す部分は、研磨材粒子が存在する研磨部とされ、参照番
号23にて示す部分は、研磨材粒子が全く存在しない溝部
とされている。FIG. 1 is a plan view showing a part of an abrasive tape as one embodiment of the present invention, and FIG. 2 is an enlarged sectional view taken along line XX of FIG. The abrasive tape 20 of the embodiment shown in FIGS. 1 and 2 has an abrasive layer 22 provided on the upper surface of a tape-shaped substrate 21, and the abrasive layer 22 has a sea-island structure. That is, in the figure, the hatched portion is a polishing portion where abrasive particles are present, and the portion indicated by reference numeral 23 is a groove portion where no abrasive particles are present.
第３図は、本発明の別の実施例としての研磨テープの
一部分を示す第１図と同様な図である。この第３図の実
施例の研磨テープ30は、基材31の上面に研磨材層32を有
しており、この研磨材層32も海島構造とされており、斜
線を施した部分は、研磨材粒子が存在する研磨部とさ
れ、参照番号33で示した部分は、研磨材粒子が存在して
いない溝部とされている。FIG. 3 is a view similar to FIG. 1 showing a part of an abrasive tape as another embodiment of the present invention. The polishing tape 30 of the embodiment shown in FIG. 3 has a polishing material layer 32 on the upper surface of a base material 31, and this polishing material layer 32 also has a sea-island structure. The abrasive portion where the material particles exist is provided, and the portion indicated by reference numeral 33 is the groove portion where the abrasive material particles do not exist.
第４図は、本発明のさらに別の実施例としての研磨テ
ープの一部分を示す平面図であり、この実施例の研磨テ
ープ40もまた、テープ状の基材41の上面に研磨材層42が
付与されている。この研磨材層42も海島構造を有してお
り、斜線を施した部分は、研磨材粒子が存在する研磨部
とされ、参照番号43で示す部分は、研磨材粒子が存在し
ていない溝部とされている。FIG. 4 is a plan view showing a part of an abrasive tape as still another embodiment of the present invention. The abrasive tape 40 of this embodiment also has an abrasive material layer 42 on the upper surface of a tape-shaped substrate 41. Has been granted. This abrasive layer 42 also has a sea-island structure, the shaded portion is a polishing portion in which abrasive particles are present, and the portion indicated by reference numeral 43 is a groove portion in which abrasive particles are not present. Has been done.
次に、このような海島構造の研磨材層を有する研磨テ
ープの製造方法について説明する。Next, a method for manufacturing a polishing tape having such an abrasive layer having a sea-island structure will be described.
第５図は、その製造方法の一例を説明するための概略
図である。本発明の海島構造の研磨材層を有する研磨テ
ープを製造するには、先ず、適当な溶剤中に、互いに相
溶性の悪い２種以上の樹脂を混合させ且つ研磨材粒子を
含有させた研磨材塗料を調製して準備する。また、ポリ
エステルフィルム等の適当なテープ状基材を準備する。
第５図に概略的に示すように、テープ基材50Aを、巻出
しロール50からコーティングヘッド54および乾燥炉51を
通して、巻取りロール52へと巻き取るようにして、移送
させる。コーティングヘッド54は、ブレードコーターの
ようなものでよく、準備した研磨材塗料を入れた塗料パ
ン53から供給される研磨材塗料を基材50Aの面上に塗布
厚さを調整しつつ付与していくものである。基材50Aの
上面に付与された研磨材塗料の塗膜は、乾燥炉51を通し
て移送されて行く間に、溶剤の蒸発過程で樹脂の相分離
が生ずることにより、第１図から第４図に関して前述し
たような海島構造を有するものとなる。乾燥炉51を出
て、こうして海島構造の研磨材層を付与されたテープ基
材は、研磨テープ50Bとして巻取りロール52に巻き取ら
れる。FIG. 5 is a schematic diagram for explaining an example of the manufacturing method. In order to manufacture the polishing tape having the sea-island structured abrasive layer of the present invention, first, an abrasive containing two or more resins having poor compatibility with each other in an appropriate solvent and containing abrasive particles. Prepare and prepare the paint. Also, a suitable tape-shaped substrate such as a polyester film is prepared.
As schematically shown in FIG. 5, the tape substrate 50A is transferred from the unwinding roll 50 through the coating head 54 and the drying oven 51 to the winding roll 52 so as to be wound up. The coating head 54 may be something like a blade coater and applies the abrasive coating material supplied from the coating pan 53 containing the prepared abrasive coating material onto the surface of the base material 50A while adjusting the coating thickness. It goes. The coating film of the abrasive coating material applied to the upper surface of the base material 50A is transferred through the drying oven 51, and phase separation of the resin occurs in the evaporation process of the solvent, so It will have the sea-island structure as described above. The tape base material, which has left the drying oven 51 and has been provided with the abrasive layer having a sea-island structure in this manner, is wound around the winding roll 52 as the polishing tape 50B.
次に、本発明の研磨テープの製造において使用する研
磨材塗料の組成の好ましい例について挙げておく。Next, preferred examples of the composition of the abrasive coating material used in the production of the polishing tape of the present invention will be described.
塗料組成 樹脂組成 樹脂A:300部 樹脂B:350部 硬化剤:350部 塗料組成 研磨材／樹脂（固形分）＝２ 溶剤:MEK/THF＝1/1 粘度:500〜1000cps 次に、本発明の研磨テープの具体的製造例について挙
げておく。Coating composition Resin composition Resin A: 300 parts Resin B: 350 parts Curing agent: 350 parts Coating composition Abrasive / resin (solid content) = 2 Solvent: MEK / THF = 1/1 Viscosity: 500-1000cps Next, the present invention A specific example of manufacturing the polishing tape will be described.
具体例Ｉ 基材：ポリエステルフィルム（厚さ25μｍ、75μｍ） 研磨材：ダイヤモンド（平均粒径d50＝0.5μｍ） 200部 樹脂A:アクリル樹脂 30部 樹脂B:ポリエステル樹脂 35部 硬化剤：イソシアネート 35部 溶剤:MEK/THF＝1/1 粘度:500cps 塗布厚:5μｍ 具体例II 基材：ポリエステルフィルム（厚さ25μｍ、75μｍ） 研磨材：酸化アルミニウム（平均粒径d50＝0.5μｍ） 100部 樹脂A:アクリル樹脂 25部 樹脂B:ポリエステル樹脂 25部 溶剤:MEK/THF＝1/1 300部 塗布厚:5μｍ 次に、本発明の研磨布紙の効果を確認するために、第
６図に概略的に示す実験装置により研磨実験を行ってみ
た結果について説明する。Example I Substrate: Polyester film (thickness: 25 μm, 75 μm) Abrasive: Diamond (average particle size d50 = 0.5 μm) 200 parts Resin A: Acrylic resin 30 parts Resin B: Polyester resin 35 parts Curing agent: Isocyanate 35 Part Solvent: MEK / THF = 1/1 Viscosity: 500cps Coating thickness: 5μm Example II Base material: Polyester film (thickness 25μm, 75μm) Abrasive material: Aluminum oxide (average particle size d50 = 0.5μm) 100 parts Resin A: Acrylic resin 25 parts Resin B: Polyester resin 25 parts Solvent: MEK / THF = 1/1 300 parts Coating thickness: 5 μm Next, in order to confirm the effect of the abrasive cloth paper of the present invention, the outline is shown in FIG. The result of performing the polishing experiment with the experimental apparatus shown in FIG.
巻出しロール60から研磨テープをテンションコントロ
ール用ローラ60を通して巻取りロール62へと走行させ、
その間にて被研磨物70を研磨してみた。被研磨物70は、
フェライト材で形成され、第７図に概略的に示すような
断面形状を有するもので、Ａ寸法が5mm、Ｂ寸法が4mmで
あり、その上面を、Ｃ寸法が250μｍとなるように、研
磨することを繰り返してみた。研磨条件としては、研磨
スピード10m/分、研磨時間30秒とし、研磨テープとし
て、本発明の海島構造を有する研磨テープと、従来の平
坦面構造の通常の研磨テープと、従来のベナード・セル
構造の研磨テープとをそれぞれ用いて研磨実験を繰り返
し行った。その結果、従来のベナード・セル構造の研磨
テープでは、その１巻当たり150個の被研磨物70しか研
磨できず、従来の平坦面構造の研磨テープでは、１巻当
たり200個の被研磨物70しか研磨できなかったのが、本
発明の海島構造の研磨テープでは、１巻当たり250個も
の被研磨物70を研磨することができた。このことから本
発明の海島構造の研磨布紙は、従来の研磨布紙に比較し
て、非常に耐久性のあることが確認できた。Run the polishing tape from the unwind roll 60 through the tension control roller 60 to the take-up roll 62,
Meanwhile, the object to be polished 70 was polished. The workpiece 70 is
It is made of ferrite material and has a cross-sectional shape as schematically shown in FIG. 7. The A dimension is 5 mm, the B dimension is 4 mm, and the upper surface is polished so that the C dimension is 250 μm. I repeated that. The polishing conditions were a polishing speed of 10 m / min, a polishing time of 30 seconds, a polishing tape having a sea-island structure of the present invention, a conventional polishing tape having a conventional flat surface structure, and a conventional Benard cell structure. The polishing experiment was repeated using the polishing tapes of No. 1 and No. 3, respectively. As a result, with the conventional polishing tape of Benard cell structure, only 150 pieces 70 to be polished can be polished per roll, and with the conventional flat surface structure polishing tape, 200 pieces 70 to be polished per roll can be polished. Although it was only possible to polish, the sea-island structured polishing tape of the present invention could polish as many as 250 objects to be polished 70 per roll. From this, it was confirmed that the sea-island structured abrasive cloth paper of the present invention is much more durable than the conventional abrasive cloth paper.
発明の効果 本発明の研磨布紙は、その研磨材層の構造が海島構造
であるので、研磨材粒子の存在しない溝部に研削液が十
分に保持され、また、この溝部が研磨クズを逃すのに十
分なチップポケットとして作用しうるので、目詰まりを
起こし難く、非常に耐久性のあるものとなる。その上、
本発明の研磨布紙の海島構造によれば、被研磨物との研
磨材層の接触面積が減少するため、磁気ヘッド等のクリ
ーニングディスク等として始動時のトルクの減少および
クリーニング効果を増大させることができる。Effect of the Invention Since the abrasive cloth paper of the present invention has a sea-island structure in its abrasive layer, the grinding liquid is sufficiently retained in the grooves in which the abrasive particles do not exist, and the grooves prevent polishing scraps from being lost. Since it can act as a sufficient chip pocket, it is unlikely to cause clogging and is extremely durable. Moreover,
According to the sea-island structure of the abrasive cloth paper of the present invention, since the contact area of the abrasive layer with the object to be polished is reduced, the torque at the time of starting is reduced and the cleaning effect is increased as a cleaning disk such as a magnetic head. You can
第１図は、本発明の一実施例としての研磨テープの一部
分を示す平面図、第２図は、第１図のＸ−Ｘ線拡大断面
図、第３図は、本発明の別の実施例としての研磨テープ
の一部分を示す平面図、第４図は、本発明のさらに別の
実施例の研磨テープの一部分を示す平面図、第５図は、
本発明の研磨テープの製造方法の一例を説明するための
概略図、第６図は、研磨実験の方法を説明するための概
略図、第７図は、研磨実験を行った被研磨物の形状を説
明するための概略図、第８図および第９図は、従来のベ
ナード・セル構造の研磨テープの構造を示す平面図およ
び断面図である。 20……研磨テープ、21……基材、 22……研磨材層、 23……研磨材粒子の存在しない部分。FIG. 1 is a plan view showing a part of an abrasive tape as one embodiment of the present invention, FIG. 2 is an enlarged sectional view taken along line XX of FIG. 1, and FIG. 3 is another embodiment of the present invention. FIG. 4 is a plan view showing a part of an example abrasive tape, FIG. 4 is a plan view showing a part of an abrasive tape of yet another embodiment of the present invention, and FIG.
FIG. 6 is a schematic diagram for explaining an example of the method for manufacturing the polishing tape of the present invention, FIG. 6 is a schematic diagram for explaining the method of the polishing experiment, and FIG. 7 is a shape of the object to be polished for the polishing experiment. 8 and 9 are a plan view and a sectional view showing the structure of a conventional polishing tape having a Benard cell structure. 20 …… Abrasive tape, 21 …… Base material, 22 …… Abrasive material layer, 23 …… Absent abrasive particles.
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62046988AJP2520626B2 (en) | 1987-03-02 | 1987-03-02 | Abrasive cloth manufacturing method |
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62046988AJP2520626B2 (en) | 1987-03-02 | 1987-03-02 | Abrasive cloth manufacturing method |
| Publication Number | Publication Date |
|---|---|
| JPS63216679A JPS63216679A (en) | 1988-09-08 |
| JP2520626B2true JP2520626B2 (en) | 1996-07-31 |
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62046988AExpired - LifetimeJP2520626B2 (en) | 1987-03-02 | 1987-03-02 | Abrasive cloth manufacturing method |
| Country | Link |
|---|---|
| JP (1) | JP2520626B2 (en) |
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
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| JP2003103470A (en)* | 2001-09-28 | 2003-04-08 | Dainippon Printing Co Ltd | Polishing sheet having concave portions in polishing layer |
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| JPS5939168U (en)* | 1982-09-01 | 1984-03-13 | 東京磁気印刷株式会社 | polishing body |
| JPS60186163U (en)* | 1984-05-18 | 1985-12-10 | 株式会社 エフエスケ− | flexible abrasive sheet |
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| JPH0351100Y2 (en)* | 1985-03-19 | 1991-10-31 |
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|---|---|
| JPS63216679A (en) | 1988-09-08 |
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