JP2005172348A - drying furnace - Google Patents

Abstract

Translated fromJapanese

【課題】乾燥工程の効率がアップし、生産効率の向上を図ることのできる乾燥炉を提供する。
【解決手段】炉本体は上下３段構成で、中段位置を前後装置の搬送レベルとしてあり、前後装置のコンベアと炉本体との間で基板ａ〜ｃの受入及び払出を行う昇降コンベアとして、炉本体の搬送ラインピッチと共通のピッチ構成を有する２段式の昇降コンベアＬｉを配置する。また、炉本体は上下２段構成で、上下段の中間位置を前後装置の搬送レベルとしてあり、前後装置のコンベアと炉本体との間で基板の受入及び払出を行う昇降コンベアとして、炉本体の搬送ライン前後装置の搬送ライン間のピッチと共通のピッチ構成を有する２段式の昇降コンベアを配置する。いずれも、パスライン以外の段への払出時にパスライン上のもう一つのコンベアで受入動作を並行して行え、実質的に２ステップで１枚の基板を振り分けることができ、タクトが短縮する。
【選択図】図２The present invention provides a drying furnace capable of improving the efficiency of a drying process and improving the production efficiency.
The furnace body has a three-stage structure in the upper and lower stages, the middle position is set as the transport level of the front and rear apparatuses, and the furnace is used as a lifting conveyor for receiving and discharging substrates a to c between the conveyor and the furnace body of the front and rear apparatuses. A two-stage elevating conveyor Li having a pitch configuration common to the conveyance line pitch of the main body is arranged. In addition, the furnace body has a two-stage configuration with the intermediate position between the upper and lower stages as the transport level of the front and rear apparatus, and as a lifting conveyor that receives and discharges substrates between the conveyor of the front and rear apparatus and the furnace body, A two-stage lifting conveyor having a pitch configuration common to the pitch between the conveying lines of the conveying line front and rear devices is arranged. In any case, when paying out to a stage other than the pass line, the receiving operation can be performed in parallel with another conveyor on the pass line, and one substrate can be distributed in substantially two steps, thereby reducing the tact time.
[Selection] Figure 2

Description

Translated fromJapanese

本発明は、プラズマディスプレイパネル（以下、ＰＤＰと記す）を構成する基板の製造工程において使用される乾燥炉に関するものである。  The present invention relates to a drying furnace used in a manufacturing process of a substrate constituting a plasma display panel (hereinafter referred to as PDP).

一般にＰＤＰは、２枚の対向するガラス基板にそれぞれ規則的に配列した一対の電極を設け、その間にＮｅ，Ｘｅ等を主体とするガスを封入した構造になっている。そして、これらの電極間に電圧を印加し、電極周辺の微小なセル内で放電を発生させることにより、各セルを発光させて表示を行うようにしている。情報表示をするためには、規則的に並んだセルを選択的に放電発光させる。このＰＤＰには、電極が放電空間に露出している直流型（ＤＣ型）と絶縁層で覆われている交流型（ＡＣ型）の２タイプがあり、双方とも表示機能や駆動方法の違いによって、さらにリフレッシュ駆動方式とメモリー駆動方式とに分類される。  In general, a PDP has a structure in which a pair of electrodes regularly arranged on two opposing glass substrates are provided, and a gas mainly composed of Ne, Xe, or the like is enclosed therebetween. Then, a voltage is applied between these electrodes, and discharge is generated in minute cells around the electrodes, thereby causing each cell to emit light for display. In order to display information, cells arranged regularly are selectively discharged. There are two types of PDPs: a DC type (DC type) with electrodes exposed in the discharge space and an AC type (AC type) covered with an insulating layer, both of which vary depending on the display function and driving method. Further, it is classified into a refresh driving method and a memory driving method.

図１にＡＣ型ＰＤＰの一構成例を示してある。この図は前面板と背面板を離した状態で示したもので、図示のように２枚のガラス基板１，２が互いに平行に且つ対向して配設されており、両者は背面板となるガラス基板２上に互いに平行に設けられたストライプ状のリブ３により一定の間隔に保持されるようになっている。前面板となるガラス基板１の背面側には維持電極である透明電極４とバス電極である金属電極５とで構成される複合電極が互いに平行に形成され、これを覆って誘電体層６が形成されており、さらにその上に保護層７（ＭｇＯ層）が形成されている。また、背面板となるガラス基板２の前面側には前記複合電極と直交するようにリブ３の間に位置してアドレス電極８が互いに平行に形成され、必要に応じてその上に誘電体層９が形成されており、さらにリブ３の壁面とセル底面を覆うようにして蛍光体層１０が設けられている。  FIG. 1 shows an example of the configuration of an AC type PDP. This figure shows a state in which the front plate and the back plate are separated from each other. As shown in the figure, twoglass substrates 1 and 2 are arranged in parallel and facing each other, and both serve as a back plate. Theglass substrate 2 is held at regular intervals by striped ribs 3 provided in parallel to each other. On the back side of the glass substrate 1 serving as the front plate, a composite electrode composed of atransparent electrode 4 serving as a sustain electrode and a metal electrode 5 serving as a bus electrode is formed in parallel to each other, and adielectric layer 6 is formed covering the composite electrode. The protective layer 7 (MgO layer) is further formed thereon. Further,address electrodes 8 are formed between the ribs 3 so as to be orthogonal to the composite electrode on the front side of theglass substrate 2 serving as a back plate, and are formed in parallel with each other, and a dielectric layer is formed thereon if necessary. 9 is formed, and aphosphor layer 10 is provided so as to cover the wall surface of the rib 3 and the cell bottom surface.

このＡＣ型ＰＤＰは面放電型であって、前面板上の複合電極間に交流電圧を印加し、空間に漏れた電解で放電させる構造である。この場合、交流をかけているために電解の向きは周波数に対応して変化する。そしてこの放電により生じる紫外線により蛍光体層１０を発光させ、前面板を透過する光を観察者が視認するようになっている。  This AC type PDP is a surface discharge type, and has a structure in which an AC voltage is applied between the composite electrodes on the front plate, and discharge is caused by electrolysis leaked into the space. In this case, since alternating current is applied, the direction of electrolysis changes corresponding to the frequency. Thephosphor layer 10 is caused to emit light by the ultraviolet rays generated by the discharge, and the observer can visually recognize the light transmitted through the front plate.

上記の如きＰＤＰにおける背面板は、ガラス基板２の表面にアドレス電極８を形成し、それを覆うようにベタ膜の誘電体層９を形成した後、リブ３を形成してそのリブ３の間に蛍光体１０を設けることによって製造される。また、前面板は、ガラス基板１の表面に維持電極４とバス電極５を重ねて形成し、それを覆って誘電体層６を形成し、さらに保護層７を形成することで作製される。そして、このようにそれぞれ膜面を形成した両基板を、外周に沿ってシール剤にて貼り合わせてから、ガスを封入することによりＰＤＰが製造される。  In the back plate of the PDP as described above, theaddress electrode 8 is formed on the surface of theglass substrate 2, the solid dielectric layer 9 is formed so as to cover it, the rib 3 is formed, and the gap between the ribs 3 is formed. It is manufactured by providing thephosphor 10. The front plate is produced by forming thesustain electrode 4 and the bus electrode 5 on the surface of the glass substrate 1, covering the same with thedielectric layer 6, and further forming the protective layer 7. Then, the two substrates having the respective film surfaces are bonded together with a sealant along the outer periphery, and then a gas is sealed to manufacture a PDP.

このようなＰＤＰの製造工程において、最近では、電極の形成はフォトリソグラフィー法により、またリブの形成はサンドブラスト法により行われることが多くなってきているが、いずれにしても電極やリブを始めとするガラス基板上の各構成要素の形成時には、基板に塗布した電極用導電性ペーストやリブ用低融点ガラスペーストなどの各種ペーストの乾燥工程が行われる。そして、この乾燥工程は、乾燥炉を使用して行われるが、少ない設置スペースで多くの基板を効率良く乾燥させるために、最近では２段構成や３段構成の乾燥炉が使用されるようになっている。
特開平１１−２２３４６２号公報In such a PDP manufacturing process, recently, electrodes are often formed by a photolithography method and ribs are formed by a sandblasting method. At the time of forming each component on the glass substrate, various pastes such as electrode conductive paste and rib low-melting glass paste applied to the substrate are dried. This drying process is performed using a drying furnace. Recently, a two-stage or three-stage drying furnace is used to efficiently dry many substrates with a small installation space. It has become.
JP-A-11-223462

上記した２段構成や３段構成の乾燥炉は、設置スペースの縮小には効果的ではあるが、乾燥炉の前後装置が１段の搬送ラインであるため、乾燥炉内とのアクセスは乾燥炉の各段への振分け動作を行う昇降コンベアが不可欠となる。しかしながら、従来の１段式の昇降コンベアでは、ローダー部を例に取ると、パスライン以外の段への１タクトの動作が、基板の受入、上昇（又は下降）、払出、下降（又は上昇）と４ステップになり、タクト短縮の弊害となる。  The above-described two-stage or three-stage drying furnace is effective in reducing the installation space, but the front and rear devices of the drying furnace are a single-stage transport line, so access to the inside of the drying furnace is a drying furnace. An elevating conveyor that performs the distribution operation to each stage is indispensable. However, in a conventional one-stage lifting conveyor, taking a loader unit as an example, one-tact operation to a stage other than the pass line is to accept, raise (or lower), dispense, and lower (or rise) a board. 4 steps, which is an adverse effect of tact shortening.

本発明は、このような背景に鑑みてなされたものであり、その目的とするところは、乾燥工程の効率がアップし、生産効率の向上を図ることのできる乾燥炉を提供することにある。  This invention is made | formed in view of such a background, The place made into the objective is to improve the efficiency of a drying process and to provide the drying furnace which can aim at the improvement of production efficiency.

上記の目的を達成するため、本発明に係る第１のタイプの乾燥炉は、ＰＤＰ用基板の製造工程で使用される乾燥炉であって、炉本体は上下３段構成で、中段位置を前後装置の搬送レベルとしてあり、前後装置のコンベアと炉本体との間で基板の受入及び払出を行う昇降コンベアとして、炉本体の搬送ラインピッチと共通のピッチ構成を有する２段式の昇降コンベアを配置したことを特徴とする。  In order to achieve the above object, a first type of drying furnace according to the present invention is a drying furnace used in a manufacturing process of a substrate for a PDP, and the furnace body has a top and bottom three-stage configuration, and a middle stage position is moved back and forth. A two-stage lifting conveyor that has the same pitch configuration as the conveyor line pitch of the furnace body is placed as a lifting conveyor that accepts and discharges substrates between the conveyor of the front and rear devices and the furnace body. It is characterized by that.

また、同様の目的を達成するため、本発明に係る第２のタイプの乾燥炉は、ＰＤＰ用基板の製造工程で使用される乾燥炉であって、炉本体は上下２段構成で、上下段の中間位置を前後装置の搬送レベルとしてあり、前後装置のコンベアと炉本体との間で基板の受入及び払出を行う昇降コンベアとして、炉本体の搬送ライン前後装置の搬送ライン間のピッチと共通のピッチ構成を有する２段式の昇降コンベアを配置したことを特徴とする。  In order to achieve the same object, a second type of drying furnace according to the present invention is a drying furnace used in a manufacturing process of a substrate for PDP, and the furnace body has a two-stage configuration, and the upper and lower stages. The intermediate position is the transfer level of the front and rear apparatus, and as a lifting conveyor that receives and discharges the substrate between the conveyor of the front and rear apparatus and the furnace body, it is common to the pitch between the transfer lines of the front and rear apparatuses of the furnace body. A two-stage lifting conveyor having a pitch configuration is arranged.

本発明の乾燥炉によれば、前後装置のコンベアと炉本体との間で基板の受入及び払出を行う昇降コンベアとして２段式の昇降コンベアを採用したことにより、パスライン以外の段への払出時にパスライン上のもう一つのコンベアで受入動作を並行して行え、実質的に２ステップで１枚の基板を振り分けることができ、タクトが短縮して乾燥工程の効率がアップすることから、ＰＤＰ用基板の生産効率の向上を図ることができる。  According to the drying furnace of the present invention, the two-stage lifting conveyor is adopted as the lifting conveyor for receiving and discharging the substrate between the conveyor of the front and rear apparatus and the furnace main body, thereby discharging to a stage other than the pass line. Sometimes the receiving operation can be performed in parallel on the other conveyor on the pass line, and one board can be distributed in substantially two steps, the tact time is shortened and the efficiency of the drying process is increased. The production efficiency of the industrial board can be improved.

次に、本発明の実施の形態について図面参照しながら詳細に説明する。  Next, embodiments of the present invention will be described in detail with reference to the drawings.

図２は上下３段構成の炉本体とその前後装置との間に２段式の昇降コンベアを配置した乾燥炉におけるローダー部での作動を説明するための工程図である。この乾燥炉は、炉本体の中段位置が前装置の搬送レベルと合致するように設置される。  FIG. 2 is a process diagram for explaining the operation of the loader unit in a drying furnace in which a two-stage lifting conveyor is disposed between a furnace body having a three-stage structure and upper and lower apparatuses. This drying furnace is installed so that the middle position of the furnace body matches the transport level of the previous apparatus.

図２のステップ１では、昇降コンベアＬｉが下位置にあり、昇降コンベアＬｉの上段に位置する基板ｂが炉本体の中段Ｂに払い出され、前装置の出口に位置する基板ａが昇降コンベアＬｉの上段に受け入れられる。次のステップ２では、基板ａが昇降コンベアＬｉの上段に位置した状態で昇降コンベアＬｉが上位置へ移動する。ステップ３では、昇降コンベアＬｉの上段に位置する基板ａが炉本体の上段Ａに払い出され、前装置の出口に位置する基板ｃが昇降コンベアＬｉの下段に受け入れられる。続くステップ４では、基板ｃが昇降コンベアＬｉの下段に位置した状態で昇降コンベアＬｉが下位置に移動する。ステップ５では、昇降コンベアＬｉの下段に位置する基板ｃが炉本体の下段Ｃに払い出され、前装置の出口に位置する基板ｂが昇降コンベアＬｉの上段に受け入れられる。続くステップ６では、基板ｂが昇降コンベアＬｉの上段に位置した状態となる。その後、ステップ１の状態になり、各ステップが繰り返される。このように、前装置から搬送されてくる３枚の基板ａ〜ｃは、６ステップで炉本体の各段に振り分けられ、実質的に２ステップで１枚の基板の振分けができることになる。  In step 1 of FIG. 2, the lifting conveyor Li is in the lower position, the substrate b positioned on the upper stage of the lifting conveyor Li is discharged to the middle stage B of the furnace body, and the substrate a positioned at the outlet of the previous apparatus is moved to the lifting conveyor Li. It is accepted in the upper stage. In thenext step 2, the elevating conveyor Li moves to the upper position in a state where the substrate a is positioned on the upper stage of the elevating conveyor Li. In step 3, the board | substrate a located in the upper stage of the raising / lowering conveyor Li is discharged | emitted to the upper stage A of a furnace main body, and the board | substrate c located in the exit of a front apparatus is received by the lower stage of the raising / lowering conveyor Li. In thesubsequent step 4, the lifting conveyor Li moves to the lower position in a state where the substrate c is positioned in the lower stage of the lifting conveyor Li. In step 5, the board | substrate c located in the lower stage of the raising / lowering conveyor Li is discharged | emitted to the lower stage C of a furnace main body, and the board | substrate b located in the exit of a front apparatus is received by the upper stage of the raising / lowering conveyor Li. In thesubsequent step 6, the substrate b is in a state positioned on the upper stage of the elevating conveyor Li. Then, it will be in the state of step 1, and each step will be repeated. As described above, the three substrates a to c conveyed from the previous apparatus are distributed to each stage of the furnace body in 6 steps, and one substrate can be distributed in substantially 2 steps.

図３は上下３段構成の炉本体とその前後装置との間に２段式の昇降コンベアを配置した乾燥炉におけるアンローダー部での作動を説明するための工程図である。この乾燥炉は、炉本体の中段位置が後装置の搬送レベルと合致するように設置される。  FIG. 3 is a process diagram for explaining the operation of the unloader unit in a drying furnace in which a two-stage lifting conveyor is arranged between the furnace body having a three-stage upper and lower structure and its front and rear devices. This drying furnace is installed so that the middle position of the furnace body matches the transport level of the rear apparatus.

図３のステップ１では、昇降コンベアＬｏが上位置にあり、昇降コンベアＬｏの下段に位置する基板ｃが後装置に払い出され、炉本体の中段Ｂに位置する基板ｂが昇降コンベアＬｏの下段に受け入れられる。次のステップ２では、昇降コンベアＬｏが上位置のままで、昇降コンベアＬｏの下段に基板ｂが位置し、炉本体の上段Ａに基板ａが位置する。ステップ３では、昇降コンベアＬｏの下段に位置する基板ｂが後装置に払い出され、炉本体の上段Ａに位置する基板ａが昇降コンベアＬｏの上段に受け入れられる。続くステップ４では、昇降コンベアＬｏが上位置のままで、昇降コンベアＬｏの上段に基板ａが位置し、炉本体の下段Ｃに基板ｃが位置する。ステップ５では、昇降コンベアＬｏが下位置へ移動し、昇降コンベアＬｏの上段に位置する基板ａが後装置に払い出され、炉本体の下段Ｃに位置する基板ｃが昇降コンベアＬｏの下段に受け入れられる。続くステップ６では、昇降コンベアＬｏの下段に基板ｃが位置した状態で昇降コンベアＬｏが上位置へ移動し、炉本体の中段Ｂに基板ｂが位置する。その後、ステップ１の状態になり、各ステップが繰り返される。このように、炉本体の各段から排出されてくる３枚の基板ａ〜ｃは、６ステップで後装置に供給され、実質的に２ステップで１枚の基板の排出ができることになる。  In step 1 of FIG. 3, the lifting conveyor Lo is in the upper position, the substrate c positioned in the lower stage of the lifting conveyor Lo is discharged to the rear apparatus, and the substrate b positioned in the middle stage B of the furnace body is lower in the lifting conveyor Lo. To be accepted. In thenext step 2, the elevating conveyor Lo remains at the upper position, the substrate b is positioned at the lower stage of the elevating conveyor Lo, and the substrate a is positioned at the upper stage A of the furnace body. In step 3, the board | substrate b located in the lower stage of the raising / lowering conveyor Lo is discharged | emitted to a back apparatus, and the board | substrate a located in the upper stage A of a furnace main body is received by the upper stage of the raising / lowering conveyor Lo. In thesubsequent step 4, the substrate conveyor a is positioned on the upper stage of the elevator conveyor Lo and the substrate c is positioned on the lower stage C of the furnace body while the elevator conveyor Lo remains in the upper position. In step 5, the elevating conveyor Lo moves to the lower position, the substrate a positioned at the upper stage of the elevating conveyor Lo is discharged to the rear apparatus, and the substrate c positioned at the lower stage C of the furnace body is received by the lower stage of the elevating conveyor Lo. It is done. In thesubsequent step 6, the elevating conveyor Lo moves to the upper position with the substrate c positioned at the lower stage of the elevating conveyor Lo, and the substrate b is positioned at the middle stage B of the furnace body. Then, it will be in the state of step 1, and each step will be repeated. As described above, the three substrates a to c discharged from each stage of the furnace body are supplied to the subsequent apparatus in six steps, and one substrate can be discharged substantially in two steps.

図４は上下２段構成の炉本体とその前後装置との間に２段式の昇降コンベアを配置した乾燥炉におけるローダー部での作動を説明するための工程図である。この乾燥炉は、炉本体の上下段の中間位置が前装置の搬送レベルと合致するように設置される。  FIG. 4 is a process diagram for explaining the operation of the loader unit in the drying furnace in which a two-stage lifting conveyor is arranged between the furnace body having a two-stage upper and lower structure and its front and rear devices. This drying furnace is installed so that the intermediate position between the upper and lower stages of the furnace body matches the transport level of the previous apparatus.

図４のステップ１では、昇降コンベアＬｉが下位置にあり、昇降コンベアＬｉの下段に位置する基板ｅが炉本体の下段Ｅに払い出され、前装置の出口に位置する基板ｄが昇降コンベアＬｉの上段に受け入れられる。次のステップ２では、基板ｄが昇降コンベアＬｉの上段に位置した状態で昇降コンベアＬｉが上位置へ移動する。ステップ３では、昇降コンベアＬｉの上段に位置する基板ｄが炉本体の上段Ｄに払い出され、前装置の出口に位置する次の基板ｅが昇降コンベアＬｉの下段に受け入れられる。続くステップ４では、基板ｅが昇降コンベアＬｉの下段に位置した状態で昇降コンベアＬｉが下位置へ移動する。その後、ステップ１の状態になり、各ステップが繰り返される。このように、前装置から搬送されてくる２枚の基板ｄ，ｅは、４ステップで炉本体の各段に振り分けられ、実質的に２ステップで１枚の基板の振分けができることになる。  In step 1 of FIG. 4, the elevating conveyor Li is in the lower position, the substrate e positioned at the lower stage of the elevating conveyor Li is discharged to the lower stage E of the furnace body, and the substrate d positioned at the outlet of the previous apparatus is moved to the elevating conveyor Li. It is accepted in the upper stage. In thenext step 2, the elevating conveyor Li moves to the upper position in a state where the substrate d is positioned on the upper stage of the elevating conveyor Li. In step 3, the board | substrate d located in the upper stage of the raising / lowering conveyor Li is discharged | emitted to the upper stage D of a furnace main body, and the next board | substrate e located in the exit of a front apparatus is received by the lower stage of the raising / lowering conveyor Li. Insubsequent step 4, the elevating conveyor Li moves to the lower position in a state where the substrate e is positioned in the lower stage of the elevating conveyor Li. Then, it will be in the state of step 1, and each step will be repeated. As described above, the two substrates d and e conveyed from the previous apparatus are distributed to each stage of the furnace main body in four steps, and one substrate can be distributed in substantially two steps.

図５は上下２段構成の炉本体とその前後装置との間に２段式の昇降コンベアを配置した乾燥炉におけるアンローダー部での作動を説明するための工程図である。この乾燥炉は、炉本体の上下段の中間位置が後装置の搬送レベルと合致するように設置される。  FIG. 5 is a process diagram for explaining the operation of the unloader unit in the drying furnace in which a two-stage lifting conveyor is arranged between the furnace body having a two-stage upper and lower structure and its front and rear devices. This drying furnace is installed so that the intermediate position between the upper and lower stages of the furnace body matches the transport level of the rear apparatus.

図５のステップ１では、昇降コンベアＬｏが上位置にあり、昇降コンベアＬｏの下段に位置する基板ｅが後装置に払い出され、炉本体の上段Ｄに位置する基板ｄが昇降コンベアＬｏの上段に受け入れられる。次のステップ２では、昇降コンベアＬｏの上段に基板ｄが位置した状態で昇降コンベアＬｏが下位置へ移動する。ステップ３では、昇降コンベアＬｏの上段に位置する基板ｄが後装置に払い出され、炉本体の下段Ｅに位置する基板ｅが昇降コンベアＬｏの下段に受け入れられる。続くステップ４では、昇降コンベアＬｏの下段に基板ｃが位置した状態で昇降コンベアＬｏが上位置へ移動し、炉本体の上段Ｄに次の基板ｄが位置する。その後、ステップ１の状態になり、各ステップが繰り返される。このように、炉本体の各段から排出されてくる２枚の基板ｄ，ｅは、４ステップで後装置に供給され、実質的に２ステップで１枚の基板の排出ができることになる。  In step 1 of FIG. 5, the elevating conveyor Lo is in the upper position, the substrate e located in the lower stage of the elevating conveyor Lo is dispensed to the rear apparatus, and the substrate d located in the upper stage D of the furnace body is placed in the upper stage of the elevating conveyor Lo. To be accepted. In thenext step 2, the elevating conveyor Lo moves to the lower position with the substrate d positioned on the upper stage of the elevating conveyor Lo. In step 3, the board | substrate d located in the upper stage of the raising / lowering conveyor Lo is discharged | emitted to a rear apparatus, and the board | substrate e located in the lower stage E of a furnace main body is received by the lower stage of the raising / lowering conveyor Lo. In thesubsequent step 4, the lifting conveyor Lo is moved to the upper position with the substrate c positioned at the lower stage of the lifting conveyor Lo, and the next substrate d is positioned at the upper stage D of the furnace body. Then, it will be in the state of step 1, and each step will be repeated. In this way, the two substrates d and e discharged from each stage of the furnace body are supplied to the subsequent apparatus in four steps, and one substrate can be discharged substantially in two steps.

プラズマディスプレイパネルの一例をその前面板と背面板とを離間状態で示す斜視図である。It is a perspective view which shows an example of a plasma display panel in the state which separated the front plate and the backplate.上下３段構成の炉本体とその前後装置との間に２段式の昇降コンベアを配置した乾燥炉におけるローダー部での作動を説明するための工程図である。It is process drawing for demonstrating the action | operation in the loader part in the drying furnace which has arrange | positioned the two-stage type raising / lowering conveyor between the furnace main body of the upper and lower 3 steps | paragraph structure, and its front-back apparatus.上下３段構成の炉本体とその前後装置との間に２段式の昇降コンベアを配置した乾燥炉におけるアンローダー部での作動を説明するための工程図である。It is process drawing for demonstrating the action | operation in the unloader part in the drying furnace which has arrange | positioned the two-step type raising / lowering conveyor between the furnace main body of the upper and lower 3 steps | paragraph structure, and its front-back apparatus.上下２段構成の炉本体とその前後装置との間に２段式の昇降コンベアを配置した乾燥炉におけるローダー部での作動を説明するための工程図である。It is process drawing for demonstrating the action | operation in the loader part in the drying furnace which has arrange | positioned the two-stage lifting conveyor between the furnace main body of 2 steps | paragraphs of upper and lower structures, and its front-back apparatus.上下２段構成の炉本体とその前後装置との間に２段式の昇降コンベアを配置した乾燥炉におけるアンローダー部での作動を説明するための工程図である。It is process drawing for demonstrating the action | operation in the unloader part in the drying furnace which has arrange | positioned the 2 steps | paragraph type raising / lowering conveyor between the furnace main body of 2 steps | paragraphs of upper and lower structures, and its front-back apparatus.

符号の説明Explanation of symbols

１，２ ガラス基板
３ リブ
４ 維持電極
５ バス電極
６ 誘電体層
７ 保護層
８ アドレス電極
９ 誘電体層
１０ 蛍光体層
Ａ 上段
Ｂ 中段
Ｃ 下段
Ｄ 上段
Ｅ 下段
Ｌｉ，Ｌｏ 昇降コンベア
ａ〜ｅ 基板
1, 2 glass substrate 3rib 4 sustain electrode 5bus electrode 6 dielectric layer 7protective layer 8 address electrode 9dielectric layer 10 phosphor layer A upper stage B middle stage C lower stage D upper stage E lower stage Li, Lo lift conveyor a to e board

Claims (2)

Translated fromJapanese

プラズマディスプレイパネル用基板の製造工程で使用される乾燥炉であって、炉本体は上下３段構成で、中段位置を前後装置の搬送レベルとしてあり、前後装置のコンベアと炉本体との間で基板の受入及び払出を行う昇降コンベアとして、炉本体の搬送ラインピッチと共通のピッチ構成を有する２段式の昇降コンベアを配置したことを特徴とする乾燥炉。  A drying furnace used in a manufacturing process of a substrate for a plasma display panel, wherein the furnace main body has a three-stage upper and lower structure, a middle position is set as a transport level of the front and rear apparatus, and the substrate is disposed between the conveyor of the front and rear apparatus and the furnace main body. A drying furnace characterized in that a two-stage lifting conveyor having a pitch configuration common to the conveying line pitch of the furnace body is disposed as a lifting conveyor for receiving and discharging the above. プラズマディスプレイパネル用基板の製造工程で使用される乾燥炉であって、炉本体は上下２段構成で、上下段の中間位置を前後装置の搬送レベルとしてあり、前後装置のコンベアと炉本体との間で基板の受入及び払出を行う昇降コンベアとして、炉本体の搬送ライン前後装置の搬送ライン間のピッチと共通のピッチ構成を有する２段式の昇降コンベアを配置したことを特徴とする乾燥炉。

A drying furnace used in a manufacturing process of a substrate for a plasma display panel, wherein the furnace main body has a two-stage configuration, an intermediate position between the upper and lower stages is used as a transport level of the front and rear apparatus, and the conveyor of the front and rear apparatus and the furnace main body A drying furnace characterized in that a two-stage lifting conveyor having a pitch configuration common to the pitch between the conveying lines of the conveying line front and rear devices of the furnace main body is arranged as a lifting conveyor for receiving and dispensing substrates between them.

Images