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JP1746406S - Susceptor unit - Google Patents

Susceptor unit

Info

Publication number
JP1746406S
JP1746406SJP2023000285FJP2023000285FJP1746406SJP 1746406 SJP1746406 SJP 1746406SJP 2023000285 FJP2023000285 FJP 2023000285FJP 2023000285 FJP2023000285 FJP 2023000285FJP 1746406 SJP1746406 SJP 1746406S
Authority
JP
Japan
Prior art keywords
susceptor unit
susceptor
unit
wafer
article
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2023000285F
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filedfiledCritical
Priority to JP2023000285FpriorityCriticalpatent/JP1746406S/en
Application grantedgrantedCritical
Publication of JP1746406SpublicationCriticalpatent/JP1746406S/en
Priority to US29/896,274prioritypatent/USD1094323S1/en
Activelegal-statusCriticalCurrent
Anticipated expirationlegal-statusCritical

Links

Abstract

Translated fromJapanese

本物品は、半導体製造装置等においてウェハを保持するために用いるサセプタユニットである。This article is a susceptor unit used for holding a wafer in a semiconductor manufacturing apparatus or the like.

JP2023000285F2023-01-112023-01-11 Susceptor unitActiveJP1746406S (en)

Priority Applications (2)

Application NumberPriority DateFiling DateTitle
JP2023000285FJP1746406S (en)2023-01-112023-01-11 Susceptor unit
US29/896,274USD1094323S1 (en)2023-01-112023-06-30Susceptor unit

Applications Claiming Priority (1)

Application NumberPriority DateFiling DateTitle
JP2023000285FJP1746406S (en)2023-01-112023-01-11 Susceptor unit

Publications (1)

Publication NumberPublication Date
JP1746406Strue JP1746406S (en)2023-06-15

Family

ID=86720906

Family Applications (1)

Application NumberTitlePriority DateFiling Date
JP2023000285FActiveJP1746406S (en)2023-01-112023-01-11 Susceptor unit

Country Status (2)

CountryLink
US (1)USD1094323S1 (en)
JP (1)JP1746406S (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
USD1082730S1 (en)*2023-01-112025-07-08Nuflare Technology, Inc.Cover base for susceptors
USD1082731S1 (en)*2023-01-112025-07-08Nuflare Technology, Inc.Susceptor
USD1082729S1 (en)*2023-01-112025-07-08Nuflare Technology, Inc.Susceptor cover
USD1082728S1 (en)*2023-01-112025-07-08Nuflare Technology, Inc.Susceptor

Family Cites Families (87)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US4978567A (en)*1988-03-311990-12-18Materials Technology Corporation, Subsidiary Of The Carbon/Graphite Group, Inc.Wafer holding fixture for chemical reaction processes in rapid thermal processing equipment and method for making same
US5304248A (en)*1990-12-051994-04-19Applied Materials, Inc.Passive shield for CVD wafer processing which provides frontside edge exclusion and prevents backside depositions
US5584936A (en)*1995-12-141996-12-17Cvd, IncorporatedSusceptor for semiconductor wafer processing
US6214122B1 (en)*1997-03-172001-04-10Motorola, Inc.Rapid thermal processing susceptor
US5840124A (en)*1997-06-301998-11-24Emcore CorporationWafer carrier with flexible wafer flat holder
USD404370S (en)*1997-08-201999-01-19Tokyo Electron LimitedCap for use in a semiconductor wafer heat processing apparatus
US6436228B1 (en)*1998-05-152002-08-20Applied Materials, Inc.Substrate retainer
JP3551867B2 (en)*1999-11-092004-08-11信越化学工業株式会社 Silicon focus ring and manufacturing method thereof
US6717121B2 (en)*2001-09-282004-04-06Graphic Packaging International, Inc.Patterned microwave susceptor element and microwave container incorporating same
US7381276B2 (en)*2002-07-162008-06-03International Business Machines CorporationSusceptor pocket with beveled projection sidewall
CN100565786C (en)*2002-12-092009-12-02Nxp股份有限公司The system and method that in the cold wall CVD system, suppresses the chip temperature skew
JP4744855B2 (en)*2003-12-262011-08-10日本碍子株式会社 Electrostatic chuck
US20050217585A1 (en)*2004-04-012005-10-06Blomiley Eric RSubstrate susceptor for receiving a substrate to be deposited upon
US7585371B2 (en)*2004-04-082009-09-08Micron Technology, Inc.Substrate susceptors for receiving semiconductor substrates to be deposited upon
US20060005767A1 (en)*2004-06-282006-01-12Applied Materials, Inc.Chamber component having knurled surface
USD559993S1 (en)*2005-03-302008-01-15Tokyo Electron LimitedCover ring
TWD121115S1 (en)*2005-03-302008-01-21東京威力科創股份有限公司Cover ring
USD557226S1 (en)*2005-08-252007-12-11Hitachi High-Technologies CorporationElectrode cover for a plasma processing apparatus
USD548705S1 (en)*2005-09-292007-08-14Tokyo Electron LimitedAttracting disc for an electrostatic chuck for semiconductor production
US7651571B2 (en)*2005-12-222010-01-26Kyocera CorporationSusceptor
US20090050272A1 (en)*2007-08-242009-02-26Applied Materials, Inc.Deposition ring and cover ring to extend process components life and performance for process chambers
JP2009283904A (en)*2008-04-252009-12-03Nuflare Technology IncCoating apparatus and coating method
WO2010021890A2 (en)*2008-08-192010-02-25Lam Research CorporationEdge rings for electrostatic chucks
US20100098519A1 (en)*2008-10-172010-04-22Memc Electronic Materials, Inc.Support for a semiconductor wafer in a high temperature environment
TW201630105A (en)*2015-02-122016-08-16漢民科技股份有限公司Wafer holder
USD646764S1 (en)*2010-11-042011-10-11Faster S.P.A.Sealing gasket
WO2012142408A2 (en)*2011-04-142012-10-18Veeco Instruments Inc.Substrate holders and methods of substrate mounting
USD709536S1 (en)*2011-09-302014-07-22Tokyo Electron LimitedFocusing ring
USD709537S1 (en)*2011-09-302014-07-22Tokyo Electron LimitedFocusing ring
USD709539S1 (en)*2011-09-302014-07-22Tokyo Electron LimitedFocusing ring
USD709538S1 (en)*2011-09-302014-07-22Tokyo Electron LimitedFocusing ring
US20150041314A1 (en)*2012-03-292015-02-12Kyocera CorporationAnnular member and film-forming device in which same is used
US9376752B2 (en)*2012-04-062016-06-28Applied Materials, Inc.Edge ring for a deposition chamber
CN104704626B (en)*2012-10-242017-12-05应用材料公司 Minimal contact edge ring for rapid heat treatment
KR101317942B1 (en)*2013-03-132013-10-16(주)테키스트Edge ring cooling module for semi-conductor manufacture chuck
USD724553S1 (en)*2013-09-132015-03-17Asm Ip Holding B.V.Substrate supporter for semiconductor deposition apparatus
TWI734668B (en)*2014-06-232021-08-01美商應用材料股份有限公司Substrate thermal control in an epi chamber
US10000847B2 (en)*2014-09-242018-06-19Applied Materials, Inc.Graphite susceptor
US10269614B2 (en)*2014-11-122019-04-23Applied Materials, Inc.Susceptor design to reduce edge thermal peak
USD783922S1 (en)*2014-12-082017-04-11Entegris, Inc.Wafer support ring
JP1530148S (en)*2015-02-262015-08-03
USD767234S1 (en)*2015-03-022016-09-20Entegris, Inc.Wafer support ring
JP1546800S (en)*2015-06-122016-03-28
USD810705S1 (en)*2016-04-012018-02-20Veeco Instruments Inc.Self-centering wafer carrier for chemical vapor deposition
DE102015220924B4 (en)*2015-10-272018-09-27Siltronic Ag Susceptor for holding a semiconductor wafer with orientation notch, method for depositing a layer on a semiconductor wafer and semiconductor wafer
USD830434S1 (en)*2015-12-282018-10-09Ntn CorporationInner ring for tapered roller bearing
US10777442B2 (en)*2016-11-182020-09-15Applied Materials, Inc.Hybrid substrate carrier
US10704147B2 (en)*2016-12-032020-07-07Applied Materials, Inc.Process kit design for in-chamber heater and wafer rotating mechanism
JP1584906S (en)*2017-01-312017-08-28
USD876504S1 (en)*2017-04-032020-02-25Asm Ip Holding B.V.Exhaust flow control ring for semiconductor deposition apparatus
USD830981S1 (en)*2017-04-072018-10-16Asm Ip Holding B.V.Susceptor for semiconductor substrate processing apparatus
CN110770877B (en)*2017-06-132024-06-18日本碍子株式会社Component for semiconductor manufacturing device
JP1598997S (en)*2017-08-312018-03-05
JP1598998S (en)*2017-08-312018-03-05
JP6878212B2 (en)*2017-09-072021-05-26昭和電工株式会社 Manufacturing method for susceptors, CVD equipment and epitaxial wafers
CN112204725B (en)*2018-04-202025-07-11朗姆研究公司 Edge Exclusion Control
EP3863043A4 (en)*2018-10-042021-11-03Toyo Tanso Co., Ltd.Susceptor
USD909323S1 (en)*2018-10-122021-02-02Valqua, Ltd.Seal member for use in semiconductor production apparatus
USD948463S1 (en)*2018-10-242022-04-12Asm Ip Holding B.V.Susceptor for semiconductor substrate supporting apparatus
JP1646504S (en)*2018-12-062019-11-25
JP1646505S (en)*2018-12-072019-11-25
US11961723B2 (en)*2018-12-172024-04-16Applied Materials, Inc.Process kit having tall deposition ring for PVD chamber
USD888903S1 (en)*2018-12-172020-06-30Applied Materials, Inc.Deposition ring for physical vapor deposition chamber
USD933725S1 (en)*2019-02-082021-10-19Applied Materials, Inc.Deposition ring for a substrate processing chamber
KR102305539B1 (en)*2019-04-162021-09-27주식회사 티씨케이SiC EDGE RING
JP7400461B2 (en)*2019-12-262023-12-19株式会社レゾナック susceptor
TWI861334B (en)*2020-01-212024-11-11荷蘭商Asm Ip私人控股有限公司Susceptor with sidewall humps for uniform deposition and method of processing crystalline substrate
EP4089065A4 (en)*2020-02-122024-03-27SK enpulse Co., Ltd. CERAMIC COMPONENT AND PLASMA ETCHING APPARATUS USING SAME
US11404250B2 (en)*2020-07-082022-08-02Taiwan Semiconductor Manufacturing Company, Ltd.Plasma etcher edge ring with a chamfer geometry and impedance design
USD1034491S1 (en)*2020-07-272024-07-09Applied Materials, Inc.Edge ring
USD1038049S1 (en)*2020-11-182024-08-06Applied Materials, Inc.Cover ring for use in semiconductor processing chamber
JP1692954S (en)*2020-12-102021-08-16
TWD235071S (en)*2020-12-102024-12-01日商紐富來科技股份有限公司 (日本)Top plate
US20220361300A1 (en)*2021-05-102022-11-10The Boeing CompanyInduction-heating system including a susceptor for generating induction heating below a selected curie temperature
JP7488796B2 (en)*2021-06-102024-05-22日本碍子株式会社 Focus ring mounting stand
JP1711119S (en)*2021-10-222022-03-29 Susceptoring
JP1711120S (en)*2021-10-222022-03-29 Suceptor cover
USD1049067S1 (en)*2022-04-042024-10-29Applied Materials, Inc.Ring for an anti-rotation process kit for a substrate processing chamber
USD1053230S1 (en)*2022-05-192024-12-03Applied Materials, Inc.Sputter target for a physical vapor deposition chamber
USD1069054S1 (en)*2022-08-082025-04-01As America, Inc.Gasket
JP1741176S (en)*2022-10-202023-04-06 Cover base for susceptor
JP1741172S (en)*2022-10-202023-04-06 Susceptor cover
JP1741174S (en)*2022-10-202023-04-06 Susceptor
US12243761B2 (en)*2022-10-272025-03-04Applied Materials, Inc.Detection and analysis of substrate support and pre-heat ring in a process chamber via imaging
USD1034493S1 (en)*2022-11-252024-07-09Ap Systems Inc.Chamber wall liner for a semiconductor manufacturing apparatus
TW202434759A (en)*2023-02-012024-09-01荷蘭商Asm Ip私人控股有限公司Susceptor assembly, reactor system, and depositing method
JP2024118119A (en)*2023-02-202024-08-30キオクシア株式会社 Jig, semiconductor manufacturing apparatus, and method for operating semiconductor manufacturing apparatus

Cited By (4)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
USD1082730S1 (en)*2023-01-112025-07-08Nuflare Technology, Inc.Cover base for susceptors
USD1082731S1 (en)*2023-01-112025-07-08Nuflare Technology, Inc.Susceptor
USD1082729S1 (en)*2023-01-112025-07-08Nuflare Technology, Inc.Susceptor cover
USD1082728S1 (en)*2023-01-112025-07-08Nuflare Technology, Inc.Susceptor

Also Published As

Publication numberPublication date
USD1094323S1 (en)2025-09-23

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