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GB1441781A - Electric circuit fabrication - Google Patents

Electric circuit fabrication

Info

Publication number
GB1441781A
GB1441781AGB5028773AGB5028773AGB1441781AGB 1441781 AGB1441781 AGB 1441781AGB 5028773 AGB5028773 AGB 5028773AGB 5028773 AGB5028773 AGB 5028773AGB 1441781 AGB1441781 AGB 1441781A
Authority
GB
United Kingdom
Prior art keywords
layer
resist
portions
substrate
exposed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB5028773A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines CorpfiledCriticalInternational Business Machines Corp
Publication of GB1441781ApublicationCriticalpatent/GB1441781A/en
Expiredlegal-statusCriticalCurrent

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Abstract

1441781 Printed circuits INTERNATIONAL BUSINESS MACHINES CORP 29 Oct 1973 [30 Nov 1972] 50287/73 Heading H1R A process for manufacturing a printed circuit board having closely spaced, fine line circuitry comprises depositing on a substrate 2 a metal layer 6, optionally after a metal an interlayer 4 which improves bonding of layer 6, covering the coated substrate with a liquid positive photoresist, allowing the resist layer to dry partially for 15 sees to 45 mins, spinning the assembly to produce uniform resist coating, baking, exposing and developing the resist to produce a desired circuit pattern, electroplating the exposed portions of layer 6 to the thickness of resist layer 8, removing the resist, and etching the non-plated portions of layer 6 and of layer 4 if present. The substrate may be glass, ceramic, a silicon wafer or, for miniature recording heads, magnetic material, e.g. permalloy. Layer 4 may be evaporated Ta, Ti, W, Nb or Cr, and layer 6 evaporated Cu or Au. If the desired circuit pattern is not uniformly distributed on the substrate, "dummy" portions of layer 6 may also be exposed to provide a more even distribution of plating current and these portions are subsequently removed by a masking and etching process. The plated layer may be gold or copper with a surface layer of gold. In the case of magnetic recording heads the plated layer is covered with an insulating layer then a layer of magnetic material. Prior to plating, a second resist coating may be applied, baked, exposed and developed using an identically aligned mask.
GB5028773A1972-11-301973-10-29Electric circuit fabricationExpiredGB1441781A (en)

Applications Claiming Priority (1)

Application NumberPriority DateFiling DateTitle
US31100672A1972-11-301972-11-30

Publications (1)

Publication NumberPublication Date
GB1441781Atrue GB1441781A (en)1976-07-07

Family

ID=23204973

Family Applications (1)

Application NumberTitlePriority DateFiling Date
GB5028773AExpiredGB1441781A (en)1972-11-301973-10-29Electric circuit fabrication

Country Status (3)

CountryLink
JP (1)JPS5733703B2 (en)
FR (1)FR2209216B1 (en)
GB (1)GB1441781A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
GB2213325A (en)*1987-12-041989-08-09Marconi Electronic DevicesA method of forming electrical conductors on an insulating substrate
US5407530A (en)*1992-11-181995-04-18Mitsumi Electric Co., Ltd.Method of preparing fine conductive pattern
WO2022184038A1 (en)*2021-03-022022-09-09苏州太阳井新能源有限公司Manufacturing method for electrode of photovoltaic cell, and photovoltaic cell
CN115449861A (en)*2022-09-292022-12-09东莞奕创表面处理科技有限公司Manufacturing method of flexible titanium metal part capable of being rolled

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
NL7704186A (en)*1977-04-181978-10-20Philips Nv PROCEDURE FOR GALVANIC REINFORCEMENT OF A CONDUCTIVE BASIC PATTERN AND EQUIPMENT OBTAINED USING THE PROCESS.
JPS5580819A (en)*1978-12-141980-06-18Mitsubishi Electric CorpManufacture of thin film magnetic head
JPS5691494A (en)*1979-12-251981-07-24Nippon Electric CoMethod of forming conductor pattern
JPS5766523A (en)*1980-10-131982-04-22Hitachi LtdThin-film magnetic head
IE51854B1 (en)*1980-12-031987-04-15Memorex CorpMethod of fabricating a metallic pattern on a substrate
JPS57164413A (en)*1981-03-311982-10-09Fujitsu LtdManufacture of thin film magnetic head
JPS5819716A (en)*1981-07-271983-02-04Hitachi Ltd Thin film magnetic head and its manufacturing method
US4375390A (en)*1982-03-151983-03-01Anderson Nathaniel CThin film techniques for fabricating narrow track ferrite heads
JPH05235173A (en)*1992-02-241993-09-10Nec CorpSemiconductor device and manufacturing method thereof
JPH0644531A (en)*1993-02-241994-02-18Hitachi LtdThin film magnetic head
JPH07273118A (en)*1994-03-281995-10-20Toshiba Corp Wiring and electrode formation method
CN114501833B (en)*2020-10-232024-05-14深南电路股份有限公司Processing method of solder mask layer on circuit board
CN114173510B (en)*2021-12-082022-12-13上海交通大学Miniature multi-layer heat insulation structure with air heat insulation layer and preparation and application thereof

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US3154450A (en)*1960-01-271964-10-27Bendix CorpMethod of making mesas for diodes by etching
US3474021A (en)*1966-01-121969-10-21IbmMethod of forming openings using sequential sputtering and chemical etching
US3507756A (en)*1967-08-041970-04-21Bell Telephone Labor IncMethod of fabricating semiconductor device contact

Cited By (5)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
GB2213325A (en)*1987-12-041989-08-09Marconi Electronic DevicesA method of forming electrical conductors on an insulating substrate
GB2213325B (en)*1987-12-041992-01-02Marconi Electronic DevicesA method of forming electrical conductors
US5407530A (en)*1992-11-181995-04-18Mitsumi Electric Co., Ltd.Method of preparing fine conductive pattern
WO2022184038A1 (en)*2021-03-022022-09-09苏州太阳井新能源有限公司Manufacturing method for electrode of photovoltaic cell, and photovoltaic cell
CN115449861A (en)*2022-09-292022-12-09东莞奕创表面处理科技有限公司Manufacturing method of flexible titanium metal part capable of being rolled

Also Published As

Publication numberPublication date
JPS4983868A (en)1974-08-12
JPS5733703B2 (en)1982-07-19
FR2209216A1 (en)1974-06-28
FR2209216B1 (en)1977-09-30

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Legal Events

DateCodeTitleDescription
PSPatent sealed
PCNPPatent ceased through non-payment of renewal fee

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