Movatterモバイル変換


[0]ホーム

URL:


EP3268979A4 - Apparatus of plural charged-particle beams - Google Patents

Apparatus of plural charged-particle beams
Download PDF

Info

Publication number
EP3268979A4
EP3268979A4EP16762718.1AEP16762718AEP3268979A4EP 3268979 A4EP3268979 A4EP 3268979A4EP 16762718 AEP16762718 AEP 16762718AEP 3268979 A4EP3268979 A4EP 3268979A4
Authority
EP
European Patent Office
Prior art keywords
particle beams
plural charged
plural
charged
beams
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
EP16762718.1A
Other languages
German (de)
French (fr)
Other versions
EP3268979A1 (en
Inventor
Weiming Ren
Shuai LI
Xuedong Liu
Zhongwei Chen
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
Hermes Microvision Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hermes Microvision IncfiledCriticalHermes Microvision Inc
Publication of EP3268979A1publicationCriticalpatent/EP3268979A1/en
Publication of EP3268979A4publicationCriticalpatent/EP3268979A4/en
Pendinglegal-statusCriticalCurrent

Links

Classifications

Landscapes

EP16762718.1A2016-04-132016-04-13Apparatus of plural charged-particle beamsPendingEP3268979A4 (en)

Applications Claiming Priority (1)

Application NumberPriority DateFiling DateTitle
PCT/US2016/027267WO2016145458A1 (en)2015-03-102016-04-13Apparatus of plural charged-particle beams

Publications (2)

Publication NumberPublication Date
EP3268979A1 EP3268979A1 (en)2018-01-17
EP3268979A4true EP3268979A4 (en)2019-05-08

Family

ID=61141517

Family Applications (1)

Application NumberTitlePriority DateFiling Date
EP16762718.1APendingEP3268979A4 (en)2016-04-132016-04-13Apparatus of plural charged-particle beams

Country Status (4)

CountryLink
EP (1)EP3268979A4 (en)
JP (1)JP6550478B2 (en)
CN (1)CN108292583B (en)
WO (1)WO2016145458A1 (en)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
KR102651558B1 (en)2015-07-222024-03-26에이에스엠엘 네델란즈 비.브이.Apparatus of plural charged-particle beams
US10141160B2 (en)2015-11-302018-11-27Hermes Microvision, Inc.Apparatus of plural charged-particle beams
CN113192815B (en)2016-01-272024-10-29Asml荷兰有限公司Apparatus for multiple charged particle beams
KR102460680B1 (en)*2017-10-022022-10-28에이에스엠엘 네델란즈 비.브이. Apparatus using charged particle beams
US10741354B1 (en)2018-02-142020-08-11Kla-Tencor CorporationPhotocathode emitter system that generates multiple electron beams
EP3576128A1 (en)*2018-05-282019-12-04ASML Netherlands B.V.Electron beam apparatus, inspection tool and inspection method
WO2020030483A1 (en)2018-08-092020-02-13Asml Netherlands B.V.An apparatus for multiple charged-particle beams
DE102018124219A1 (en)*2018-10-012020-04-02Carl Zeiss Microscopy Gmbh Multi-beam particle beam system and method for operating such a system
US10748739B2 (en)*2018-10-122020-08-18Kla-Tencor CorporationDeflection array apparatus for multi-electron beam system
CN112889127B (en)*2018-10-192024-12-13Asml荷兰有限公司 System and method for aligning electron beams in a multi-beam inspection device
JP7516366B2 (en)*2018-11-162024-07-16エーエスエムエル ネザーランズ ビー.ブイ. Electromagnetic composite lens and charged particle optical system equipped with such lens - Patents.com
KR102756503B1 (en)2018-12-312025-01-21에이에스엠엘 네델란즈 비.브이.Multi-beam Inspection Apparatus
US10748743B1 (en)*2019-02-122020-08-18ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbHDevice and method for operating a charged particle device with multiple beamlets
WO2020200745A1 (en)2019-03-292020-10-08Asml Netherlands B.V.Multi-beam inspection apparatus with single-beam mode
DE102019004124B4 (en)*2019-06-132024-03-21Carl Zeiss Multisem Gmbh Particle beam system for the azimuthal deflection of individual particle beams and its use and method for azimuth correction in a particle beam system
JP7303052B2 (en)*2019-07-162023-07-04株式会社ニューフレアテクノロジー Continuity inspection method for multipole aberration corrector and continuity inspection apparatus for multipole aberration corrector
US11056312B1 (en)*2020-02-052021-07-06Kla CorporationMicro stigmator array for multi electron beam system
WO2021175685A1 (en)*2020-03-052021-09-10Asml Netherlands B.V.Beam array geometry optimizer for multi-beam inspection system
DE102020107738B3 (en)*2020-03-202021-01-14Carl Zeiss Multisem Gmbh Particle beam system with a multipole lens sequence for the independent focusing of a large number of single particle beams, its use and associated process
JP7442376B2 (en)*2020-04-062024-03-04株式会社ニューフレアテクノロジー Multi-electron beam inspection device and multi-electron beam inspection method
JP7514677B2 (en)*2020-07-132024-07-11株式会社ニューフレアテクノロジー Pattern inspection apparatus and method for acquiring contour position of pattern
CN111883408B (en)*2020-08-132025-03-14深圳市奥谱太赫兹技术研究院 Multi-electron beam focusing device and control method
JP2025021788A (en)*2023-08-012025-02-14株式会社ニューフレアテクノロジー Multi-electron beam irradiation device and multi-electron beam irradiation method

Citations (4)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US6175122B1 (en)*1998-01-092001-01-16International Business Machines CorporationMethod for writing a pattern using multiple variable shaped electron beams
US20040232349A1 (en)*2003-03-102004-11-25Pieter KruitApparatus for generating a plurality of beamlets
US20080054184A1 (en)*2003-09-052008-03-06Carl Zeiss Smt AgParticle-optical systems and arrangements and particle-optical components for such systems and arrangements
EP2879155A1 (en)*2013-12-022015-06-03ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbHMulti-beam system for high throughput EBI

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US6630681B1 (en)*1999-07-212003-10-07Nikon CorporationCharged-particle-beam microlithography apparatus and methods including correction of aberrations caused by space-charge effects
WO2001039243A1 (en)*1999-11-232001-05-31Ion Diagnostics, Inc.Electron optics for multi-beam electron beam lithography tool
JP4041742B2 (en)*2001-05-012008-01-30株式会社荏原製作所 Electron beam apparatus and device manufacturing method using the electron beam apparatus
JP2003331772A (en)*2002-05-162003-11-21Ebara CorpElectron beam equipment and device manufacturing method
US7528614B2 (en)*2004-12-222009-05-05Applied Materials, Inc.Apparatus and method for voltage contrast analysis of a wafer using a tilted pre-charging beam
CN101414128B (en)*2002-10-302012-04-04迈普尔平版印刷Ip有限公司Electron beam exposure system
JP3728315B2 (en)*2003-12-162005-12-21キヤノン株式会社 Electron beam exposure apparatus, electron beam exposure method, and device manufacturing method
KR20070116260A (en)*2005-03-222007-12-07가부시키가이샤 에바라 세이사꾸쇼 Electron beam
CN102232237B (en)*2008-10-012014-09-24迈普尔平版印刷Ip有限公司 electrostatic lens member
JP5498488B2 (en)*2009-05-272014-05-21株式会社日立ハイテクノロジーズ Charged particle beam application apparatus and sample observation method
EP2722868B2 (en)*2012-10-162025-03-26ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbHOctopole device and method for spot size improvement
JP2014082171A (en)*2012-10-182014-05-08Canon IncIrradiation system, drawing device and method of manufacturing article
JP2014229481A (en)*2013-05-222014-12-08株式会社日立ハイテクノロジーズCharged particle ray application device

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US6175122B1 (en)*1998-01-092001-01-16International Business Machines CorporationMethod for writing a pattern using multiple variable shaped electron beams
US20040232349A1 (en)*2003-03-102004-11-25Pieter KruitApparatus for generating a plurality of beamlets
US20080054184A1 (en)*2003-09-052008-03-06Carl Zeiss Smt AgParticle-optical systems and arrangements and particle-optical components for such systems and arrangements
EP2879155A1 (en)*2013-12-022015-06-03ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbHMulti-beam system for high throughput EBI

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references ofWO2016145458A1*

Also Published As

Publication numberPublication date
JP2018513543A (en)2018-05-24
CN108292583B (en)2020-03-20
EP3268979A1 (en)2018-01-17
CN108292583A (en)2018-07-17
JP6550478B2 (en)2019-07-24
WO2016145458A1 (en)2016-09-15

Similar Documents

PublicationPublication DateTitle
IL289373A (en)Apparatus of plural charged-particle beams
EP3325950A4 (en)Apparatus of plural charged-particle beams
EP3268979A4 (en)Apparatus of plural charged-particle beams
SG11201707178RA (en)Apparatus of plural charged-particle beams
IL267670A (en)An apparatus using multiple charged particle beams
AU2017301985B2 (en)Method of generating aerosol
SI3433285T1 (en)An improved process for the preparation of sugammadex
EP3289697A4 (en)Apparatus, system and method of beamforming
EP3295737A4 (en)Methods and devices for beam selection
EP3369458A4 (en)Method for evaluating irradiation angle of beam
EP3483333A4 (en)Clothes-handling apparatus
EP3409354A4 (en)Reaction apparatus
EP3166931A4 (en)An improved process for the preparation of enzalutamide
EP3280408A4 (en)Process for the preparation of dicycloplatin
EP3130374A4 (en)Particle beam irradiation apparatus
EP3348360A4 (en)Robot apparatus
EP3270884A4 (en)Method of making an optically-activated system
EP3312141A4 (en)Plate-shaped-material exfoliating apparatus comprising microchannel
EP3354034B8 (en)Secure distribution of an image
EP3376235A4 (en)Reaction method
EP3375484A4 (en)Particle beam therapy system
EP3208203A4 (en)Electron beam sterilisation equipment
EP3394873A4 (en)Methods and devices for producing an electron beam
EP3093045A4 (en)Particle beam irradiation apparatus
ZA201805871B (en)An improved process for the preparation of lacosamide

Legal Events

DateCodeTitleDescription
STAAInformation on the status of an ep patent application or granted ep patent

Free format text:STATUS: THE INTERNATIONAL PUBLICATION HAS BEEN MADE

PUAIPublic reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text:ORIGINAL CODE: 0009012

STAAInformation on the status of an ep patent application or granted ep patent

Free format text:STATUS: REQUEST FOR EXAMINATION WAS MADE

17PRequest for examination filed

Effective date:20170901

AKDesignated contracting states

Kind code of ref document:A1

Designated state(s):AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

AXRequest for extension of the european patent

Extension state:BA ME

RIC1Information provided on ipc code assigned before grant

Ipc:H01J 37/147 20060101ALI20181212BHEP

Ipc:H01J 49/00 20060101AFI20181212BHEP

Ipc:G21K 5/10 20060101ALI20181212BHEP

Ipc:G21K 7/00 20060101ALI20181212BHEP

Ipc:H01J 37/28 20060101ALI20181212BHEP

Ipc:G01N 23/00 20060101ALI20181212BHEP

A4Supplementary search report drawn up and despatched

Effective date:20190404

RIC1Information provided on ipc code assigned before grant

Ipc:G21K 7/00 20060101ALI20190329BHEP

Ipc:H01J 37/147 20060101ALI20190329BHEP

Ipc:H01J 37/28 20060101ALI20190329BHEP

Ipc:H01J 49/00 20060101AFI20190329BHEP

Ipc:G21K 5/10 20060101ALI20190329BHEP

Ipc:G01N 23/00 20060101ALI20190329BHEP

DAVRequest for validation of the european patent (deleted)
DAXRequest for extension of the european patent (deleted)
RAP1Party data changed (applicant data changed or rights of an application transferred)

Owner name:CHEN, ZHONGWEI

Owner name:LI, SHUAI

Owner name:LIU, XUEDONG

Owner name:REN, WEIMING

Owner name:ASML NETHERLANDS B.V.

STAAInformation on the status of an ep patent application or granted ep patent

Free format text:STATUS: EXAMINATION IS IN PROGRESS

17QFirst examination report despatched

Effective date:20230316

P01Opt-out of the competence of the unified patent court (upc) registered

Effective date:20230414


[8]ページ先頭

©2009-2025 Movatter.jp