EP1573395A4 - Scatterometry alignment for imprint lithography - Google Patents

Scatterometry alignment for imprint lithography

Info

Publication number: EP1573395A4
Authority: EP; European Patent Office
Prior art keywords: scatterometry; alignment; imprint lithography; imprint; lithography
Prior art date: 2002-08-01
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Withdrawn

Other versions

Inventor

Michael P C Watts

Ian Mcmackin

Sidlgata V Sreenivasan

Byung-Jin Choi

Ronald D Voisin

Norman E Schumaker

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Canon Nanotechnologies Inc

Original Assignee

Molecular Imprints Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2002-08-01

Filing date

2003-07-31

Publication date

2010-09-29

2002-08-01Priority claimed from US10/210,894external-prioritypatent/US7070405B2/en

2002-08-01Priority claimed from US10/210,780external-prioritypatent/US6916584B2/en

2002-08-01Priority claimed from US10/210,785external-prioritypatent/US7027156B2/en

2003-07-31Application filed by Molecular Imprints IncfiledCriticalMolecular Imprints Inc

2005-09-14Publication of EP1573395A2publicationCriticalpatent/EP1573395A2/en

2010-09-29Publication of EP1573395A4publicationCriticalpatent/EP1573395A4/en

StatusWithdrawnlegal-statusCriticalCurrent

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7049—Technique, e.g. interferometric
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7065—Production of alignment light, e.g. light source, control of coherence, polarization, pulse length, wavelength

Landscapes

Engineering & Computer Science (AREA)
Chemical & Material Sciences (AREA)
Physics & Mathematics (AREA)
Nanotechnology (AREA)
General Physics & Mathematics (AREA)
Crystallography & Structural Chemistry (AREA)
Condensed Matter Physics & Semiconductors (AREA)
Manufacturing & Machinery (AREA)
Composite Materials (AREA)
Materials Engineering (AREA)
Mathematical Physics (AREA)
Theoretical Computer Science (AREA)
Shaping Of Tube Ends By Bending Or Straightening (AREA)
Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Micromachines (AREA)

EP03767009A2002-08-012003-07-31Scatterometry alignment for imprint lithographyWithdrawnEP1573395A4 (en)

Applications Claiming Priority (7)

Application Number	Priority Date	Filing Date	Title
US10/210,894US7070405B2 (en)	2002-08-01	2002-08-01	Alignment systems for imprint lithography
US210785		2002-08-01
US210780		2002-08-01
US10/210,780US6916584B2 (en)	2002-08-01	2002-08-01	Alignment methods for imprint lithography
US10/210,785US7027156B2 (en)	2002-08-01	2002-08-01	Scatterometry alignment for imprint lithography
US210894		2002-08-01
PCT/US2003/023948WO2004013693A2 (en)	2002-08-01	2003-07-31	Scatterometry alignment for imprint lithography

Publications (2)

Publication Number	Publication Date
EP1573395A2 EP1573395A2 (en)	2005-09-14
EP1573395A4true EP1573395A4 (en)	2010-09-29

Family

ID=31499238

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
EP03767009AWithdrawnEP1573395A4 (en)	2002-08-01	2003-07-31	Scatterometry alignment for imprint lithography

Country Status (6)

Country	Link
EP (1)	EP1573395A4 (en)
JP (2)	JP2006516065A (en)
KR (1)	KR20050026088A (en)
AU (1)	AU2003261317A1 (en)
TW (1)	TWI266970B (en)
WO (1)	WO2004013693A2 (en)

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2003
- 2003-07-31WOPCT/US2003/023948patent/WO2004013693A2/enactiveSearch and Examination
- 2003-07-31EPEP03767009Apatent/EP1573395A4/ennot_activeWithdrawn
- 2003-07-31JPJP2004526254Apatent/JP2006516065A/enactivePending
- 2003-07-31TWTW092120993Apatent/TWI266970B/ennot_activeIP Right Cessation
- 2003-07-31AUAU2003261317Apatent/AU2003261317A1/ennot_activeAbandoned
- 2003-07-31KRKR1020057001792Apatent/KR20050026088A/ennot_activeWithdrawn
2010
- 2010-11-05JPJP2010248314Apatent/JP5421221B2/ennot_activeExpired - Lifetime

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Publication number	Publication date
AU2003261317A8 (en)	2004-02-23
TWI266970B (en)	2006-11-21
TW200406651A (en)	2004-05-01
AU2003261317A1 (en)	2004-02-23
JP5421221B2 (en)	2014-02-19
JP2011101016A (en)	2011-05-19
EP1573395A2 (en)	2005-09-14
WO2004013693A2 (en)	2004-02-12
KR20050026088A (en)	2005-03-14
WO2004013693A3 (en)	2006-01-19
JP2006516065A (en)	2006-06-15

Publication	Publication Date	Title
AU2003261317A8 (en)	2004-02-23	Scatterometry alignment for imprint lithography
GB0308958D0 (en)	2003-05-28	Overlay metrology using scatterometry profilng
SG133553A1 (en)	2007-07-30	Alignment for imprint lithography
AU2003299002A8 (en)	2004-04-08	Photolithography mask repair
AU2003265611A8 (en)	2004-03-11	Continuous direct-write optical lithography
SG123748A1 (en)	2006-07-26	Imprint lithography
AU2003227574A8 (en)	2003-11-17	Lighting system, particularly for use in extreme ultraviolet (euv) lithography
AU2003230676A1 (en)	2003-09-29	Laser assisted direct imprint lithography
AU2003236640A8 (en)	2003-12-02	Illumination system for microlithography
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DE60221180D1 (en)	2007-08-30	Lithographic apparatus
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SG118222A1 (en)	2006-01-27	Lithographic apparatus
IL157373A0 (en)	2009-02-11	Projecting reticle image
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SG120080A1 (en)	2006-03-28	Advanced illumination system for use in microlithography
TW547674U (en)	2003-08-11	Adjusting apparatus for projection lamp
AU2003255936A8 (en)	2004-03-19	Lithographic method for small line printing

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