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EP0239376A3 - Contrast enhanced photolithography - Google Patents

Contrast enhanced photolithographyDownload PDF

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Publication number
EP0239376A3
EP0239376A3EP87302555AEP87302555AEP0239376A3EP 0239376 A3EP0239376 A3EP 0239376A3EP 87302555 AEP87302555 AEP 87302555AEP 87302555 AEP87302555 AEP 87302555AEP 0239376 A3EP0239376 A3EP 0239376A3
Authority
EP
European Patent Office
Prior art keywords
layer
photoresist
photobleachable
contrast enhanced
contrast
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP87302555A
Other languages
German (de)
French (fr)
Other versions
EP0239376A2 (en
Inventor
Clive Trundle
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BAE Systems Electronics Ltd
Original Assignee
GEC Marconi Ltd
GE Healthcare UK Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB868607715Aexternal-prioritypatent/GB8607715D0/en
Priority claimed from GB868613420Aexternal-prioritypatent/GB8613420D0/en
Application filed by GEC Marconi Ltd, GE Healthcare UK LtdfiledCriticalGEC Marconi Ltd
Publication of EP0239376A2publicationCriticalpatent/EP0239376A2/en
Publication of EP0239376A3publicationCriticalpatent/EP0239376A3/en
Withdrawnlegal-statusCriticalCurrent

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Abstract

The contrast and sharpness of photoresist images is enhanced by depositing a layer of a photobleachable com­pound onto the photoresist layer. The photobleachable layer is sensitive to the light used to expose the photoresist and forms a contrast enhancement layer (CEL) on the photoresist layer. Fulgides and photochromic butyrolactones are selected for forming the photobleachable layer. Such compounds can be deposited from a hydrocarbon solution, such as toluene, and are soluble in the standard alkali, photoresist developers. The process is particularly advantageous for producing in­tegrated circuits.
EP87302555A1986-03-271987-03-24Contrast enhanced photolithographyWithdrawnEP0239376A3 (en)

Applications Claiming Priority (4)

Application NumberPriority DateFiling DateTitle
GB868607715AGB8607715D0 (en)1986-03-271986-03-27Contrast enhanced photolithography
GB86077151986-03-27
GB868613420AGB8613420D0 (en)1986-06-031986-06-03Photochromic gamma butyrolactones
GB86134201987-06-03

Publications (2)

Publication NumberPublication Date
EP0239376A2 EP0239376A2 (en)1987-09-30
EP0239376A3true EP0239376A3 (en)1988-05-11

Family

ID=26290550

Family Applications (1)

Application NumberTitlePriority DateFiling Date
EP87302555AWithdrawnEP0239376A3 (en)1986-03-271987-03-24Contrast enhanced photolithography

Country Status (2)

CountryLink
US (1)US4942113A (en)
EP (1)EP0239376A3 (en)

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US5643356A (en)1993-08-051997-07-01Kimberly-Clark CorporationInk for ink jet printers
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US5773182A (en)1993-08-051998-06-30Kimberly-Clark Worldwide, Inc.Method of light stabilizing a colorant
US6211383B1 (en)1993-08-052001-04-03Kimberly-Clark Worldwide, Inc.Nohr-McDonald elimination reaction
US5645964A (en)1993-08-051997-07-08Kimberly-Clark CorporationDigital information recording media and method of using same
US5721287A (en)1993-08-051998-02-24Kimberly-Clark Worldwide, Inc.Method of mutating a colorant by irradiation
US6017471A (en)1993-08-052000-01-25Kimberly-Clark Worldwide, Inc.Colorants and colorant modifiers
US5681380A (en)1995-06-051997-10-28Kimberly-Clark Worldwide, Inc.Ink for ink jet printers
US6017661A (en)1994-11-092000-01-25Kimberly-Clark CorporationTemporary marking using photoerasable colorants
US5685754A (en)1994-06-301997-11-11Kimberly-Clark CorporationMethod of generating a reactive species and polymer coating applications therefor
US5739175A (en)1995-06-051998-04-14Kimberly-Clark Worldwide, Inc.Photoreactor composition containing an arylketoalkene wavelength-specific sensitizer
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US6071979A (en)1994-06-302000-06-06Kimberly-Clark Worldwide, Inc.Photoreactor composition method of generating a reactive species and applications therefor
US6008268A (en)1994-10-211999-12-28Kimberly-Clark Worldwide, Inc.Photoreactor composition, method of generating a reactive species, and applications therefor
US5811199A (en)1995-06-051998-09-22Kimberly-Clark Worldwide, Inc.Adhesive compositions containing a photoreactor composition
US5786132A (en)1995-06-051998-07-28Kimberly-Clark CorporationPre-dyes, mutable dye compositions, and methods of developing a color
ES2148776T3 (en)1995-06-052000-10-16Kimberly Clark Co PRE-DYES AND COMPOUNDS THAT CONTAIN THEM.
US5798015A (en)1995-06-051998-08-25Kimberly-Clark Worldwide, Inc.Method of laminating a structure with adhesive containing a photoreactor composition
US5849411A (en)1995-06-051998-12-15Kimberly-Clark Worldwide, Inc.Polymer film, nonwoven web and fibers containing a photoreactor composition
US5747550A (en)1995-06-051998-05-05Kimberly-Clark Worldwide, Inc.Method of generating a reactive species and polymerizing an unsaturated polymerizable material
BR9609295A (en)1995-06-281999-05-18Kimberly Clark Co New coloring substances and coloring substance modifiers
EP0854896B1 (en)1995-11-282002-04-03Kimberly-Clark Worldwide, Inc.Light-stabilized dyestuff compositions
US5855655A (en)1996-03-291999-01-05Kimberly-Clark Worldwide, Inc.Colorant stabilizers
US5782963A (en)1996-03-291998-07-21Kimberly-Clark Worldwide, Inc.Colorant stabilizers
US6099628A (en)1996-03-292000-08-08Kimberly-Clark Worldwide, Inc.Colorant stabilizers
US5891229A (en)1996-03-291999-04-06Kimberly-Clark Worldwide, Inc.Colorant stabilizers
US6017680A (en)1997-08-052000-01-25Hitachi, Ltd.Method for pattern formation and process for preparing semiconductor device
US6524379B2 (en)1997-08-152003-02-25Kimberly-Clark Worldwide, Inc.Colorants, colorant stabilizers, ink compositions, and improved methods of making the same
JP2002517523A (en)1998-06-032002-06-18キンバリー クラーク ワールドワイド インコーポレイテッド Novel photoinitiator and its use
EP1062285A2 (en)1998-06-032000-12-27Kimberly-Clark Worldwide, Inc.Neonanoplasts and microemulsion technology for inks and ink jet printing
AU5219299A (en)1998-07-202000-02-07Kimberly-Clark Worldwide, Inc.Improved ink jet ink compositions
US6265458B1 (en)1998-09-282001-07-24Kimberly-Clark Worldwide, Inc.Photoinitiators and applications therefor
ATE238393T1 (en)1999-01-192003-05-15Kimberly Clark Co DYES, DYE STABILIZERS, INK COMPOSITIONS AND METHOD FOR THE PRODUCTION THEREOF
IT1310000B1 (en)*1999-01-262002-02-05Consiglio Nazionale Ricerche OPTICAL FIBER SENSOR AND PHOTOCROMIC TRANSDUCER FOR PHOTOMETRY ERADIOMETRY AND RELATED METHOD
US6331056B1 (en)1999-02-252001-12-18Kimberly-Clark Worldwide, Inc.Printing apparatus and applications therefor
US6294698B1 (en)1999-04-162001-09-25Kimberly-Clark Worldwide, Inc.Photoinitiators and applications therefor
US6368395B1 (en)1999-05-242002-04-09Kimberly-Clark Worldwide, Inc.Subphthalocyanine colorants, ink compositions, and method of making the same
ATE333471T1 (en)2000-06-192006-08-15Kimberly Clark Co NEW PHOTO INITIATORS
US7022452B2 (en)*2002-09-042006-04-04Agilent Technologies, Inc.Contrast enhanced photolithography
WO2006046475A1 (en)*2004-10-262006-05-04Tokyo Institute Of TechnologyHigh resolution pattern transfer method
US7166420B2 (en)*2005-05-272007-01-23Xerox CorporationProtection of transient documents using a photochromic protective layer
US7736825B2 (en)*2005-06-022010-06-15Asml Holding N.V.Lithographic apparatus and device manufacturing method utilizing a resettable or reversible contrast enhancing layer in a multiple exposure system
US7622246B2 (en)*2006-09-222009-11-24Massachusetts Institute Of TechnologyContrast enhancing layers
US7875408B2 (en)2007-01-252011-01-25International Business Machines CorporationBleachable materials for lithography
US20080318153A1 (en)*2007-06-192008-12-25Qimonda AgPhotosensitive layer stack
WO2010005892A1 (en)*2008-07-082010-01-14Massachusetts Institute Of TechnologyResist composition and lithographic process using said composition
US8158338B2 (en)2008-07-082012-04-17Massachusetts Institute Of TechnologyResist sensitizer
CA3082211A1 (en)*2020-06-022021-12-02Techinsights Inc.Contrast-enhancing staining system and method and imaging methods and systems related thereto

Citations (4)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
GB1464603A (en)*1974-07-311977-02-16Heller HSubstituted organic photochromic compounds and processes for their preparation
WO1983000568A1 (en)*1981-08-011983-02-17Heller, Harlod, GeorgePhotochromic materials
EP0110165A2 (en)*1982-11-011984-06-13MicroSi, Inc. (a Delaware corporation)A method of enhancing the contrast of images and materials therefor
EP0140540A2 (en)*1983-09-071985-05-08THE PLESSEY COMPANY plcPhotochromic compounds and their uses in photoreactive lenses

Family Cites Families (4)

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Publication numberPriority datePublication dateAssigneeTitle
LU58793A1 (en)*1969-06-031971-07-07
US4702996A (en)*1983-09-281987-10-27General Electric CompanyMethod of enhancing the contrast of images and materials therefor
US4663275A (en)*1984-09-041987-05-05General Electric CompanyPhotolithographic method and combination including barrier layer
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Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
GB1464603A (en)*1974-07-311977-02-16Heller HSubstituted organic photochromic compounds and processes for their preparation
WO1983000568A1 (en)*1981-08-011983-02-17Heller, Harlod, GeorgePhotochromic materials
EP0110165A2 (en)*1982-11-011984-06-13MicroSi, Inc. (a Delaware corporation)A method of enhancing the contrast of images and materials therefor
EP0140540A2 (en)*1983-09-071985-05-08THE PLESSEY COMPANY plcPhotochromic compounds and their uses in photoreactive lenses

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
G.H. BROWN: "Techniques of Chemistry", vol. 111, "Photochromism", 1971, pages 381-382,741-744,595-597, John Wiley & Sons, Inc., New York, US;*
JOURNAL OF IMAGING SCIENCE, vol. 30, March/April 1986, pages 65-68, Society of Photographic Scientists and Engineers, Springfied, Virginia, US; P.R. WEST et al.: "Contrast enhanced photolithography: application of photobleaching processes in microlithography"*
SOLID STATE TECHNOLOGY, vol. 28, no. 5, May 1985, pages 152-157, Port Washinton, New York, US; B.F. GRIFFING et al.: "Contrast enhanced lithography"*

Also Published As

Publication numberPublication date
US4942113A (en)1990-07-17
EP0239376A2 (en)1987-09-30

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Effective date:19911003

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Inventor name:TRUNDLE, CLIVE
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