技术领域technical field
本申请涉及显示技术领域，具体涉及触控显示技术领域，尤其涉及阵列基板、触控显示面板及触控显示装置。The present application relates to the field of display technology, in particular to the field of touch display technology, especially to an array substrate, a touch display panel and a touch display device.
背景技术Background technique
内嵌式触摸显示屏上设有公共电极。在触摸检测时公共电极复用为触控发射电极，接收触控驱动信号，触摸检测电路根据显示屏上电容的变化确定触摸点。公共电极可以采用ITO导电玻璃制作。在内嵌式触摸显示屏中，触控显示面板上的公共电极呈条状平行排布。由于公共电极的面积较大，其电阻值较高，对触摸检测电路的精度影响较大。Common electrodes are arranged on the embedded touch display screen. During touch detection, the common electrode is multiplexed as a touch emission electrode to receive a touch driving signal, and the touch detection circuit determines a touch point according to a change in capacitance on the display screen. The common electrode can be made of ITO conductive glass. In the in-cell touch display panel, the common electrodes on the touch display panel are arranged in strips in parallel. Since the area of the common electrode is relatively large, its resistance value is relatively high, which greatly affects the accuracy of the touch detection circuit.
一般地，内嵌式触摸显示屏可以包括多个金属层，包括用于形成扫描线的第一金属层、用于形成数据线的第二金属层，以及用于形成公共电极线的第三金属层。通常，第三金属层与第一金属层和第二金属层不同层设置。公共电极与形成于第三金属层上的公共电极线并联连接，可以有效地减小公共电极的阻值。Generally, an in-cell touch display screen may include multiple metal layers, including a first metal layer for forming scan lines, a second metal layer for forming data lines, and a third metal layer for forming common electrode lines. layer. Usually, the third metal layer is disposed in a different layer from the first metal layer and the second metal layer. The common electrode is connected in parallel with the common electrode line formed on the third metal layer, which can effectively reduce the resistance of the common electrode.
在上述采用在第三金属层上形成公共电极线与公共电极并联以减小公共电极电阻的方法中，需要在显示屏制作过程中单独形成第三金属层。而为了避免第三金属层与其他导电层(例如第二金属层和公共电极)之间形成电场，还需要在第三金属层与其他导电层之间制作绝缘层，不仅增加了显示屏的厚度，也增加了工艺复杂度。In the above-mentioned method of forming a common electrode line on the third metal layer and connecting the common electrode in parallel to reduce the resistance of the common electrode, the third metal layer needs to be formed separately during the manufacturing process of the display screen. In order to avoid forming an electric field between the third metal layer and other conductive layers (such as the second metal layer and the common electrode), it is also necessary to make an insulating layer between the third metal layer and other conductive layers, which not only increases the thickness of the display screen , also increases the process complexity.
实用新型内容Utility model content
有鉴于此，期望能够提供一种制作工艺简单且降低公共电极电阻的阵列基板。为了解决上述技术问题，本申请提供了阵列基板、触控显示面板及触控显示装置。In view of this, it is desired to provide an array substrate with a simple fabrication process and reduced common electrode resistance. In order to solve the above technical problems, the present application provides an array substrate, a touch display panel and a touch display device.
第一方面，本申请提供了一种阵列基板，包括：衬底基板，包括显示区和非显示区；在垂直于所述衬底基板的方向上排列的多个金属层；所述多个金属层包括第一金属层和第二金属层；所述第一金属层用于形成所述阵列基板的扫描线；所述第二金属层用于形成所述阵列基板的数据线；所述显示区内设有多个像素单元，所述像素单元呈阵列排布，所述像素单元的行方向为所述扫描线的延伸方向,所述像素单元的列方向为数据线的延伸方向；触控电极层，所述触控电极层包括多个触控电极；多条触控信号线，所述触控信号线与一个所述触控电极电相连，为所述触控电极传输触控信号；所述触控信号线与至少一层所述多个金属层同层设置。In a first aspect, the present application provides an array substrate, including: a base substrate including a display area and a non-display area; a plurality of metal layers arranged in a direction perpendicular to the base substrate; the plurality of metal layers The layers include a first metal layer and a second metal layer; the first metal layer is used to form the scan lines of the array substrate; the second metal layer is used to form the data lines of the array substrate; the display area There are a plurality of pixel units inside, and the pixel units are arranged in an array. The row direction of the pixel units is the extension direction of the scanning lines, and the column direction of the pixel units is the extension direction of the data lines; the touch electrode Layer, the touch electrode layer includes a plurality of touch electrodes; a plurality of touch signal lines, the touch signal line is electrically connected to one of the touch electrodes, and transmits touch signals for the touch electrodes; The touch signal line and at least one layer of the plurality of metal layers are arranged in the same layer.
第二方面，本申请提供了如本申请第一方面所提供的阵列基板以及与所述阵列基板相对设置的彩膜基板。In a second aspect, the present application provides an array substrate as provided in the first aspect of the present application and a color filter substrate disposed opposite to the array substrate.
第三方面，本申请提供了一种触控显示装置，包括如本申请第二方面所提供的触控显示面板。In a third aspect, the present application provides a touch display device, including the touch display panel as provided in the second aspect of the present application.
本申请提供的阵列基板、触控显示面板及触控显示装置，通过将与触控电极并联的触控信号线与阵列基板上已有的金属层同层设置，在制作过程中，可以通过同一道工序形成触控电极所在金属层上的所有线路图形，在降低触控电极电阻的同时简化了工艺。The array substrate, touch display panel, and touch display device provided by the present application are arranged on the same layer as the touch signal lines connected in parallel with the touch electrodes and the existing metal layer on the array substrate. All circuit patterns on the metal layer where the touch electrodes are located are formed in one process, which simplifies the process while reducing the resistance of the touch electrodes.
附图说明Description of drawings
通过阅读参照以下附图所作的对非限制性实施例详细描述，本申请的其它特征、目的和优点将会变得更明显：Other characteristics, objects and advantages of the present application will become more apparent by reading the detailed description of non-limiting embodiments made with reference to the following drawings:
图1是本申请提供的阵列基板的一个局部剖面图；FIG. 1 is a partial cross-sectional view of an array substrate provided by the present application;
图2是本申请提供的阵列基板的一个实施例的结构示意图；FIG. 2 is a schematic structural view of an embodiment of an array substrate provided by the present application;
图3是图2所示阵列基板的局部剖面图；3 is a partial cross-sectional view of the array substrate shown in FIG. 2;
图4是本申请提供的阵列基板的另一个实施例的结构示意图；FIG. 4 is a schematic structural view of another embodiment of the array substrate provided by the present application;
图5是图4所示阵列基板的局部剖面图；5 is a partial cross-sectional view of the array substrate shown in FIG. 4;
图6A是本申请提供的阵列基板的又一个实施例的结构示意图；FIG. 6A is a schematic structural view of another embodiment of the array substrate provided by the present application;
图6B是本申请提供的阵列基板的再一个实施例的结构示意图；FIG. 6B is a schematic structural view of another embodiment of the array substrate provided by the present application;
图7A是图6A所示阵列基板的局部剖面图；7A is a partial cross-sectional view of the array substrate shown in FIG. 6A;
图7B是图6B所示阵列基板的局部剖面图；7B is a partial cross-sectional view of the array substrate shown in FIG. 6B;
图8是本申请提供的阵列基板的再一个实施例的结构示意图；FIG. 8 is a schematic structural diagram of another embodiment of the array substrate provided by the present application;
图9是图8所示阵列基板的局部剖面图；9 is a partial cross-sectional view of the array substrate shown in FIG. 8;
图10是本申请提供的触控显示面板的一个实施例的局部剖面图。FIG. 10 is a partial cross-sectional view of an embodiment of a touch display panel provided by the present application.
具体实施方式detailed description
下面结合附图和实施例对本申请作进一步的详细说明。可以理解的是，此处所描述的具体实施例仅仅用于解释相关实用新型，而非对该实用新型的限定。另外还需要说明的是，为了便于描述，附图中仅示出了与有关实用新型相关的部分。The application will be further described in detail below in conjunction with the accompanying drawings and embodiments. It can be understood that the specific embodiments described here are only used to explain the relevant utility model, rather than to limit the utility model. It should also be noted that, for the convenience of description, only the parts related to the utility model are shown in the drawings.
需要说明的是，在不冲突的情况下，本申请中的实施例及实施例中的特征可以相互组合。下面将参考附图并结合实施例来详细说明本申请。It should be noted that, in the case of no conflict, the embodiments in the present application and the features in the embodiments can be combined with each other. The present application will be described in detail below with reference to the accompanying drawings and embodiments.
请参考图1，其示出了本申请提供的阵列基板的一个局部剖面图。如图1所示，阵列基板100包括衬底基板10，衬底基板10包括显示区101和非显示区102。阵列基板100还包括在垂直于衬底基板10的方向上排列的多个金属层。多个金属层至少包括第一金属层11和第二金属层12。其中，第一金属层11用于形成阵列基板100的扫描线111(图1中仅示出一条)，第二金属层12用于形成阵列基板100的数据线121。显示区101内设有多个呈阵列排布的像素单元。像素单元的行方向为扫描线111的延伸方向，像素单元的列方向为数据线121的延伸方向。阵列基板100还包括触控电极层13和多条触控信号线。触控电极层13包括多个触控电极131。触控信号线与一个触控电极131电相连，为触控电极131传输触控信号。触控信号线与至少一层上述多个金属层同层设置。如图1中，触控信号线112可以与第一金属层11同层设置。在其他的实施例中，触控信号线112也可以与第二金属层12同层设置。Please refer to FIG. 1 , which shows a partial cross-sectional view of the array substrate provided by the present application. As shown in FIG. 1 , the array substrate 100 includes a base substrate 10 , and the base substrate 10 includes a display area 101 and a non-display area 102 . The array substrate 100 also includes a plurality of metal layers arranged in a direction perpendicular to the base substrate 10 . The plurality of metal layers includes at least a first metal layer 11 and a second metal layer 12 . Wherein, the first metal layer 11 is used to form the scan lines 111 of the array substrate 100 (only one is shown in FIG. 1 ), and the second metal layer 12 is used to form the data lines 121 of the array substrate 100 . A plurality of pixel units arranged in an array are arranged in the display area 101 . The row direction of the pixel units is the extending direction of the scanning lines 111 , and the column direction of the pixel units is the extending direction of the data lines 121 . The array substrate 100 also includes a touch electrode layer 13 and a plurality of touch signal lines. The touch electrode layer 13 includes a plurality of touch electrodes 131 . The touch signal line is electrically connected to a touch electrode 131 and transmits a touch signal for the touch electrode 131 . The touch signal line is arranged on the same layer as at least one of the plurality of metal layers. As shown in FIG. 1 , the touch signal line 112 can be disposed on the same layer as the first metal layer 11 . In other embodiments, the touch signal line 112 may also be disposed on the same layer as the second metal layer 12 .
阵列基板100的非显示区102内设有驱动电路，阵列基板100的显示区101内设有多个像素单元，每个像素单元包括一个薄膜晶体管，扫描线111的一端与薄膜晶体管的栅极电相连，扫描线111的另一端与栅极驱动电路113电相连；数据线121的一端与薄膜晶体管的源极电相连，数据线121的另一端与源极驱动电路123电相连；在进行一幅画面的显示时，栅极驱动电路能够发出驱动扫描信号，通过扫描线111控制薄膜晶体管的导通和断开，当薄膜晶体管被导通，显示信号通过数据线121输入显示像素中，从而进行一幅画面的显示。栅极驱动电路113可以与第一金属层11同层设置，源极驱动电路123可以与第二金属层12同层设置。A drive circuit is provided in the non-display area 102 of the array substrate 100, and a plurality of pixel units are provided in the display area 101 of the array substrate 100, each pixel unit includes a thin film transistor, and one end of the scan line 111 is connected to the gate electrode of the thin film transistor. The other end of the scan line 111 is electrically connected to the gate drive circuit 113; one end of the data line 121 is electrically connected to the source of the thin film transistor, and the other end of the data line 121 is electrically connected to the source drive circuit 123; When the picture is displayed, the gate drive circuit can send a driving scanning signal to control the on and off of the thin film transistor through the scanning line 111. When the thin film transistor is turned on, the display signal is input into the display pixel through the data line 121, thereby performing a screen display. The gate drive circuit 113 can be provided on the same layer as the first metal layer 11 , and the source drive circuit 123 can be provided on the same layer as the second metal layer 12 .
在本实施例中，触控电极131可以用于实现包含阵列基板100的显示面板的触控功能。在互容式触控显示面板中，触控电极131可以用作互容式触控电极，例如作为触控发射电极，通过触控信号线112接收触控信号，与触控接收电极形成互电容，通过检测互电容的变化来确定触摸点。在自容式触摸显示面板中，触控电极131可以用作自容式触控电极，通过触控信号线112接收触控信号，并将在检测到触摸点时将由于自电容变化而产生的感应信号通过触控信号线112传递至触摸检测电路。In this embodiment, the touch electrodes 131 can be used to realize the touch function of the display panel including the array substrate 100 . In a mutual capacitive touch display panel, the touch electrode 131 can be used as a mutual capacitive touch electrode, for example, as a touch transmitter electrode, which receives a touch signal through the touch signal line 112 and forms a mutual capacitance with the touch receiver electrode. , to determine the touch point by detecting changes in mutual capacitance. In a self-capacitive touch display panel, the touch electrode 131 can be used as a self-capacitive touch electrode, and receives a touch signal through the touch signal line 112, and when a touch point is detected, the The sensing signal is transmitted to the touch detection circuit through the touch signal line 112 .
本实施例提供的阵列基板100，通过将触控信号线与阵列基板上已有的金属层同层设置，省去了触控信号线金属层的制作，在制作阵列基板时可以降低工艺复杂度。In the array substrate 100 provided in this embodiment, by arranging the touch signal lines and the existing metal layer on the array substrate in the same layer, the fabrication of the metal layer of the touch signal lines is omitted, and the process complexity can be reduced when manufacturing the array substrate. .
进一步参考图2，其示出了本申请提供的阵列基板的一个实施例的结构示意图。如图2所示，阵列基板200包括呈阵列排布的像素单元203、沿像素单元203的行方向延伸的扫描线211以及沿像素单元203的列方向延伸的数据线221。在本实施例中，用于向触控电极传输触控信号的触控信号线212与扫描线所在的第一金属层同层设置。触控信号线212设置于相邻两行像素单元203之间，与显示区内的扫描线211绝缘且走线方向一致。在图2中，触控信号线212与扫描线211平行。在显示阶段，扫描线211接收栅极扫描电路输出的扫描信号，此时触控信号线212可以作为公共电极线为公共电极传输显示所需要的公共电压。由于扫描线211和触控信号线212绝缘，扫描线211和触控信号线212上的信号互不干扰，避免形成寄生电容影响显示效果，并且可以使用一道工序同时形成触控信号线212与扫描线211，降低了工艺成本，也减少了显示面板的膜层数量。Further referring to FIG. 2 , it shows a schematic structural diagram of an embodiment of the array substrate provided by the present application. As shown in FIG. 2 , the array substrate 200 includes pixel units 203 arranged in an array, scan lines 211 extending along the row direction of the pixel units 203 , and data lines 221 extending along the column direction of the pixel units 203 . In this embodiment, the touch signal lines 212 for transmitting touch signals to the touch electrodes are disposed on the same layer as the first metal layer where the scan lines are located. The touch signal lines 212 are arranged between two adjacent rows of pixel units 203 , are insulated from the scanning lines 211 in the display area, and run in the same direction. In FIG. 2 , the touch signal lines 212 are parallel to the scan lines 211 . In the display stage, the scan line 211 receives the scan signal output by the gate scan circuit, and the touch signal line 212 can serve as a common electrode line to transmit the common voltage required for display to the common electrodes. Since the scan line 211 and the touch signal line 212 are insulated, the signals on the scan line 211 and the touch signal line 212 do not interfere with each other, avoiding the formation of parasitic capacitance affecting the display effect, and the touch signal line 212 and the scan line can be formed simultaneously in one process. The line 211 reduces the process cost and also reduces the number of film layers of the display panel.
在本实施例的一些可选的实现方式中，阵列基板还包括形成于第一金属层和触控电极层之间的第一绝缘层。第一绝缘层上设有贯穿第一绝缘层的至少一个第一导通孔241，触控信号线212通过至少一个第一导通孔241与多个触控电极电连接。In some optional implementation manners of this embodiment, the array substrate further includes a first insulating layer formed between the first metal layer and the touch electrode layer. The first insulating layer is provided with at least one first via hole 241 penetrating through the first insulating layer, and the touch signal line 212 is electrically connected to a plurality of touch electrodes through the at least one first via hole 241 .
进一步参考图3，其示出了图2所示阵列基板的局部剖面图。图3所示为沿图2中与数据线221平行线的S1剖开的切面示意图。如图3所示，阵列基板200包括衬底基板20，衬底基板20包括显示区201和非显示区202。阵列基板200还包括在垂直于衬底基板20的方向上排列的第一金属层21和第二金属层22。其中，第一金属层21用于形成阵列基板200的扫描线211，第二金属层22用于形成阵列基板200的数据线221。显示区201内设有多个呈阵列排布的像素单元。像素单元的行方向为扫描线211的延伸方向，像素单元的列方向为数据线221的延伸方向。阵列基板200还包括触控电极层23和触控信号线212。触控信号线212与第一金属层21同层设置。触控电极层23包括多个触控电极231。触控信号线212与一个触控电极231电相连，为触控电极231传输触控信号。Further referring to FIG. 3 , it shows a partial cross-sectional view of the array substrate shown in FIG. 2 . FIG. 3 is a schematic diagram of a cross section taken along a line S1 parallel to the data line 221 in FIG. 2 . As shown in FIG. 3 , the array substrate 200 includes a base substrate 20 , and the base substrate 20 includes a display area 201 and a non-display area 202 . The array substrate 200 further includes a first metal layer 21 and a second metal layer 22 arranged in a direction perpendicular to the base substrate 20 . Wherein, the first metal layer 21 is used to form the scan lines 211 of the array substrate 200 , and the second metal layer 22 is used to form the data lines 221 of the array substrate 200 . A plurality of pixel units arranged in an array are arranged in the display area 201 . The row direction of the pixel units is the extending direction of the scanning lines 211 , and the column direction of the pixel units is the extending direction of the data lines 221 . The array substrate 200 also includes a touch electrode layer 23 and a touch signal line 212 . The touch signal line 212 is disposed on the same layer as the first metal layer 21 . The touch electrode layer 23 includes a plurality of touch electrodes 231 . The touch signal line 212 is electrically connected to a touch electrode 231 and transmits a touch signal to the touch electrode 231 .
在本实施的一些可选的实现方式中，阵列基板200还包括形成于第一金属层21和触控电极层23之间的第一绝缘层24。第一绝缘层24上设有贯穿第一绝缘层24的至少一个第一导通孔241。触控信号线212通过至少一个第一导通孔241与多个触控电极231电连接。In some optional implementations of this embodiment, the array substrate 200 further includes a first insulating layer 24 formed between the first metal layer 21 and the touch electrode layer 23 . At least one first via hole 241 penetrating through the first insulating layer 24 is disposed on the first insulating layer 24 . The touch signal line 212 is electrically connected to the plurality of touch electrodes 231 through at least one first via hole 241 .
如图3所示，第一绝缘层24可以形成于第一金属层21和触控电极层23之间。第一绝缘层可以为多个，例如当第二金属层22形成于第一金属层21和触控电极层23之间时，第一金属层21和第二金属层22之间、以及第二金属层22和触控电极层23之间可以均设有第一绝缘层24。在制作阵列基板时，可以沿垂直于衬底基板方向依次形成：第一金属层21、第一层第一绝缘层、第二金属层22、第二层第一绝缘层、触控电极层23，并在第一层第一绝缘层和第二层第一绝缘层相对的位置上设置第一导通孔。触控信号线212形成于第一金属层21上，通过贯穿第一层第一绝缘层和第二层第一绝缘层的第一导通孔241与触控电极231电连接。As shown in FIG. 3 , the first insulating layer 24 may be formed between the first metal layer 21 and the touch electrode layer 23 . There may be multiple first insulating layers. For example, when the second metal layer 22 is formed between the first metal layer 21 and the touch electrode layer 23, between the first metal layer 21 and the second metal layer 22, and the second A first insulating layer 24 may be provided between the metal layer 22 and the touch electrode layer 23 . When fabricating the array substrate, the first metal layer 21, the first insulating layer of the first layer, the second metal layer 22, the first insulating layer of the second layer, and the touch electrode layer 23 can be sequentially formed along the direction perpendicular to the base substrate. , and a first via hole is provided at a position opposite to the first insulating layer of the first layer and the first insulating layer of the second layer. The touch signal line 212 is formed on the first metal layer 21 and is electrically connected to the touch electrode 231 through the first via hole 241 penetrating through the first insulating layer of the first layer and the first insulating layer of the second layer.
在本实施例的一些可选的实现方式中，在第一绝缘层24上可以设有多个并联的第一导通孔241。多个并联的第一导通孔不仅可以进一步减小触控电极的电阻，还可以在触控信号线无法通过一个第一导通孔向触控电极传输信号时其他第一导通孔可以保证触控信号线与触控电极的电连接的稳定性。In some optional implementation manners of this embodiment, a plurality of first via holes 241 connected in parallel may be provided on the first insulating layer 24 . A plurality of first via holes connected in parallel can not only further reduce the resistance of the touch electrode, but also ensure that the other first via holes can ensure The stability of the electrical connection between the touch signal line and the touch electrode.
在进一步的实现方式中，第一导通孔241设置于相邻的两个像素单元之间。在本实施例中，可以以一定长度间隔设置第一导通孔。任意两个第一导通孔241之间相隔多个像素单元的长度，即多个像素单元之间仅设置一个导通孔，有利于提升阵列基板的开口率。In a further implementation manner, the first via hole 241 is disposed between two adjacent pixel units. In this embodiment, the first via holes may be arranged at intervals of a certain length. The distance between any two first via holes 241 is the length of multiple pixel units, that is, only one via hole is provided between multiple pixel units, which is beneficial to increase the aperture ratio of the array substrate.
需要说明的是，阵列基板200的非显示区202内设有栅极驱动电路、源极驱动电路以及薄膜晶体管，这些公知的结构在图2中并未示出。It should be noted that, the non-display area 202 of the array substrate 200 is provided with a gate driving circuit, a source driving circuit and a thin film transistor, and these known structures are not shown in FIG. 2 .
请参考图4，其示出了本申请提供的阵列基板的另一个实施例的结构示意图。如图4所示，阵列基板400包括呈阵列排布的像素单元403、沿像素单元403的行方向延伸的扫描线411以及沿像素单元403的列方向延伸的数据线421。在本实施例中，用于向触控电极传输触控信号的触控信号线422与数据线421所在的第二金属层同层设置。触控信号线422设置于相邻两列像素单元403之间，与显示区内的数据线421绝缘且走线方向一致。在图4中，触控信号线422与数据线421平行。在显示阶段，数据线421接收驱动电路输出的数据信号，此时触控信号线422作为公共电极线为公共电极传输显示所需要的公共电压。由于数据线421和触控信号线422绝缘，数据线421和触控信号线422上的信号互不干扰，避免形成寄生电容影响显示效果。并且可以使用一道工序同时形成触控信号线422与数据线421，降低了工艺成本，也减少了显示面板的膜层数量。Please refer to FIG. 4 , which shows a schematic structural diagram of another embodiment of the array substrate provided by the present application. As shown in FIG. 4 , the array substrate 400 includes pixel units 403 arranged in an array, scan lines 411 extending along the row direction of the pixel units 403 , and data lines 421 extending along the column direction of the pixel units 403 . In this embodiment, the touch signal lines 422 for transmitting touch signals to the touch electrodes are disposed on the same layer as the second metal layer where the data lines 421 are located. The touch signal line 422 is disposed between two adjacent rows of pixel units 403 , is insulated from the data line 421 in the display area, and runs in the same direction. In FIG. 4 , the touch signal line 422 is parallel to the data line 421 . In the display stage, the data line 421 receives the data signal output by the driving circuit, and at this time, the touch signal line 422 serves as a common electrode line and transmits a common voltage required for display to the common electrodes. Since the data line 421 and the touch signal line 422 are insulated, the signals on the data line 421 and the touch signal line 422 do not interfere with each other, avoiding the formation of parasitic capacitance and affecting the display effect. Moreover, the touch signal line 422 and the data line 421 can be formed simultaneously in one process, which reduces the process cost and the number of film layers of the display panel.
在本实施例的一些可选的实现方式中，阵列基板还包括形成于第二金属层和触控电极层之间的第二绝缘层。第二绝缘层上设有贯穿第二绝缘层的至少一个第二导通孔441，触控信号线422通过至少一个第二导通孔441与多个触控电极电连接。In some optional implementation manners of this embodiment, the array substrate further includes a second insulating layer formed between the second metal layer and the touch electrode layer. The second insulating layer is provided with at least one second via hole 441 penetrating through the second insulating layer, and the touch signal line 422 is electrically connected to a plurality of touch electrodes through the at least one second via hole 441 .
进一步参考图5，其示出了图4所示阵列基板的局部剖面图。图5所示为沿图4中与扫描线411平行的线S2剖开的切面示意图。如图5所示，阵列基板400包括衬底基板40，衬底基板40包括显示区401和非显示区402。阵列基板400还包括在垂直于衬底基板40的方向上排列的第一金属层41和第二金属层42。其中，第一金属层41用于形成阵列基板400的扫描线411，第二金属层42用于形成阵列基板400的数据线421。显示区401内设有多个呈阵列排布的像素单元。像素单元的行方向为扫描线411的延伸方向,像素单元的列方向为数据线421的延伸方向。阵列基板400还包括触控电极层43和触控信号线422。触控信号线422与第二金属层42同层设置。触控电极层43包括多个触控电极431。触控信号线422与一个触控电极431电相连，为触控电极431传输触控信号。Further referring to FIG. 5 , it shows a partial cross-sectional view of the array substrate shown in FIG. 4 . FIG. 5 is a schematic cross-sectional view taken along a line S2 parallel to the scan line 411 in FIG. 4 . As shown in FIG. 5 , the array substrate 400 includes a base substrate 40 , and the base substrate 40 includes a display area 401 and a non-display area 402 . The array substrate 400 further includes a first metal layer 41 and a second metal layer 42 arranged in a direction perpendicular to the base substrate 40 . Wherein, the first metal layer 41 is used to form the scan lines 411 of the array substrate 400 , and the second metal layer 42 is used to form the data lines 421 of the array substrate 400 . A plurality of pixel units arranged in an array are arranged in the display area 401 . The row direction of the pixel unit is the extending direction of the scan line 411 , and the column direction of the pixel unit is the extending direction of the data line 421 . The array substrate 400 also includes a touch electrode layer 43 and a touch signal line 422 . The touch signal line 422 is disposed on the same layer as the second metal layer 42 . The touch electrode layer 43 includes a plurality of touch electrodes 431 . The touch signal line 422 is electrically connected to a touch electrode 431 and transmits a touch signal to the touch electrode 431 .
在本实施的一些可选的实现方式中，阵列400还包括形成于第二金属层42和触控电极层43之间的第二绝缘层44。第二绝缘层44上设有贯穿第二绝缘层的至少一个第二导通孔441。触控信号线422通过至少一个第二导通孔441与多个触控电极431电连接。In some optional implementations of this embodiment, the array 400 further includes a second insulating layer 44 formed between the second metal layer 42 and the touch electrode layer 43 . At least one second via hole 441 penetrating through the second insulating layer is disposed on the second insulating layer 44 . The touch signal line 422 is electrically connected to the plurality of touch electrodes 431 through at least one second via hole 441 .
如图5所示，第二绝缘层44可以形成于第二金属层42和触控电极层43之间。在本实施例的一些可选的实现方式中，在第二绝缘层44上可以设有多个并联的第二导通孔441。多个并联的第一导通孔不仅可以进一步减小触控电极的电阻，还可以保证触控信号线与触控电极的连接的稳定性。As shown in FIG. 5 , the second insulating layer 44 may be formed between the second metal layer 42 and the touch electrode layer 43 . In some optional implementation manners of this embodiment, a plurality of second via holes 441 connected in parallel may be provided on the second insulating layer 44 . The plurality of first via holes connected in parallel can not only further reduce the resistance of the touch electrode, but also ensure the stability of the connection between the touch signal line and the touch electrode.
在进一步的实现方式中，第二导通孔441设置于相邻的两个像素单元之间。在本实施例中，任意两个第二导通孔441之间可以相隔多个像素单元的长度，多个公共电极可以共用一个第二导通孔，有利于提升阵列基板的开口率。In a further implementation manner, the second via hole 441 is disposed between two adjacent pixel units. In this embodiment, any two second via holes 441 may be separated by the length of multiple pixel units, and multiple common electrodes may share one second via hole, which is beneficial to increase the aperture ratio of the array substrate.
在一些实施例中，如果阵列基板用于LTPS(LowTemperaturePoly-silicon，低温多晶硅)屏幕，则阵列基板还可以包括TFT(ThinFilmTransistor，薄膜晶体管)遮光金属层，用于遮挡阵列基板上与像素单元连接的TFT，避免TFT受到光照后产生漏电流影响像素单元的扫描和显示。In some embodiments, if the array substrate is used for an LTPS (LowTemperaturePoly-silicon, low-temperature polysilicon) screen, the array substrate may also include a TFT (ThinFilmTransistor, thin-film transistor) light-shielding metal layer, which is used to shield the pixels connected to the pixel units on the array substrate. TFT, to prevent the leakage current generated by the TFT after being exposed to light to affect the scanning and display of the pixel unit.
进一步参考图6A，其示出了本申请提供的阵列基板的又一个实施例的结构示意图。如图6A所示，阵列基板600A包括呈阵列排布的像素单元603、沿像素单元603的行方向延伸的扫描线611以及沿像素单元603的列方向延伸的数据线621。TFT遮光金属层在衬底基板上具有正投影，且正投影将TFT遮挡，避免TFT受到光照。在本实施例中，用于向触控电极传输触控信号的触控信号线652与TFT遮光金属651所在的TFT遮光金属层同层设置。触控信号线652设置于相邻两行像素单元603之间，与显示区内的扫描线611绝缘且走线方向一致。在图6A中，触控信号线652与扫描线611平行。在显示阶段，扫描线611接收栅极驱动电路输出的扫描信号，此时触控信号线652作为公共电极线为公共电极传输显示所需要的公共电压。由于TFT遮光金属层仅用于遮挡薄膜晶体管，其与阵列基板上的其他导电层之间设有绝缘层，故而TFT遮光金属层与第一金属层、第二金属层、触控电极层以及其他导电层(例如像素电极层)之间彼此绝缘，与TFT遮光金属层同层设置的触控信号线652与形成于第一金属层61上的扫描线绝缘，触控信号线652与扫描线611上的信号互不干扰，从而可以避免形成寄生电容影响显示效果。另外，与TFT遮光金属层同层设置的触控信号线652与设置于其他导电层的信号线(例如数据线、栅线、源极驱动电路中的信号线、栅极驱动电路中的信号线等)之间不会发生短路，从而保证阵列基板显示效果的稳定性。Further referring to FIG. 6A , it shows a schematic structural diagram of yet another embodiment of the array substrate provided by the present application. As shown in FIG. 6A , the array substrate 600A includes pixel units 603 arranged in an array, scan lines 611 extending along the row direction of the pixel units 603 , and data lines 621 extending along the column direction of the pixel units 603 . The TFT light-shielding metal layer has an orthographic projection on the base substrate, and the orthographic projection shields the TFT to prevent the TFT from being exposed to light. In this embodiment, the touch signal lines 652 for transmitting touch signals to the touch electrodes are disposed on the same layer as the TFT light-shielding metal layer where the TFT light-shielding metal 651 is located. The touch signal line 652 is disposed between two adjacent rows of pixel units 603 , is insulated from the scanning line 611 in the display area, and runs in the same direction. In FIG. 6A , the touch signal line 652 is parallel to the scan line 611 . In the display stage, the scan line 611 receives the scan signal output by the gate driving circuit, and at this time, the touch signal line 652 serves as a common electrode line to transmit a common voltage required for display to the common electrodes. Since the TFT light-shielding metal layer is only used to shield the thin film transistors, and an insulating layer is provided between it and other conductive layers on the array substrate, the TFT light-shielding metal layer is closely related to the first metal layer, the second metal layer, the touch electrode layer and others. The conductive layers (such as the pixel electrode layer) are insulated from each other, and the touch signal line 652 provided on the same layer as the TFT light-shielding metal layer is insulated from the scanning line formed on the first metal layer 61. The touch signal line 652 is connected to the scanning line 611 The signals on the circuit do not interfere with each other, so that the formation of parasitic capacitance can be avoided to affect the display effect. In addition, the touch signal line 652 provided on the same layer as the TFT light-shielding metal layer and the signal lines provided on other conductive layers (such as data lines, gate lines, signal lines in the source driver circuit, and signal lines in the gate driver circuit) etc.) will not be short-circuited, thereby ensuring the stability of the display effect of the array substrate.
继续参考图6B，其示出了本申请提供的阵列基板的再一个实施例的结构示意图。如图6B所示，阵列基板600B包括呈阵列排布的像素单元603、沿像素单元603的行方向延伸的扫描线611以及沿像素单元603的列方向延伸的数据线621。TFT遮光金属层在衬底基板上的具有正投影，且正投影将TFT遮挡，避免TFT受到光照。在本实施例中，用于向触控电极传输触控信号的触控信号线653与TFT遮光金属651所在的TFT遮光金属层同层设置。触控信号线653设置于相邻两列像素单元603之间，与显示区内的数据线611绝缘且走线方向一致。在图6B中，触控信号线653与数据线621平行。在显示阶段，数据线621接收驱动电路输出的数据信号，此时触控信号线653作为公共电极线为公共电极传输显示所需要的公共电压。由于数据线621和触控信号线653绝缘，数据线621和触控信号线653上的信号互不干扰，从而可以避免形成寄生电容影响显示效果。Continue to refer to FIG. 6B , which shows a schematic structural diagram of another embodiment of the array substrate provided by the present application. As shown in FIG. 6B , the array substrate 600B includes pixel units 603 arranged in an array, scan lines 611 extending along the row direction of the pixel units 603 , and data lines 621 extending along the column direction of the pixel units 603 . The TFT light-shielding metal layer has an orthographic projection on the base substrate, and the orthographic projection shields the TFT to prevent the TFT from being illuminated. In this embodiment, the touch signal lines 653 for transmitting touch signals to the touch electrodes are disposed on the same layer as the TFT light-shielding metal layer where the TFT light-shielding metal 651 is located. The touch signal line 653 is disposed between two adjacent rows of pixel units 603 , is insulated from the data line 611 in the display area, and runs in the same direction. In FIG. 6B , the touch signal line 653 is parallel to the data line 621 . In the display stage, the data line 621 receives the data signal output by the driving circuit, and at this time, the touch signal line 653 serves as a common electrode line and transmits a common voltage required for display to the common electrodes. Since the data line 621 and the touch signal line 653 are insulated, the signals on the data line 621 and the touch signal line 653 do not interfere with each other, thereby avoiding the formation of parasitic capacitance and affecting the display effect.
在图6A或图6B所示的实施例中，阵列基板600A或600B还可以包括形成于TFT遮光金属层和触控电极层之间的第三绝缘层。第三绝缘层上设有贯穿第三绝缘层的至少一个第三导通孔641或651，触控信号线通过至少一个第三导通孔641或651与多个触控电极电连接。In the embodiment shown in FIG. 6A or FIG. 6B , the array substrate 600A or 600B may further include a third insulating layer formed between the TFT light-shielding metal layer and the touch electrode layer. The third insulating layer is provided with at least one third via hole 641 or 651 penetrating through the third insulating layer, and the touch signal line is electrically connected to the plurality of touch electrodes through the at least one third via hole 641 or 651 .
进一步参考图7A，其示出了图6A所示阵列基板的局部剖面图。图7A所示为沿图6A中与数据线621平行的线S3剖开的切面。如图7A所示，阵列基板600A包括衬底基板60，衬底基板60包括显示区601和非显示区602。阵列基板600A还包括在垂直于衬底基板60的方向上排列的第一金属层61、第二金属层62和TFT遮光金属层65。其中，第一金属层61用于形成阵列基板600A的扫描线611和TFT的栅极612，第二金属层62用于形成阵列基板600A的数据线621。显示区601内设有多个呈阵列排布的像素单元。像素单元的行方向为扫描线611的延伸方向，像素单元的列方向为数据线621的延伸方向。阵列基板600A还包括触控电极层63和与TFT遮光金属层65同层设置的触控信号线652。触控电极层63包括多个触控电极631。触控信号线652与一个触控电极631电相连，为触控电极631传输触控信号。Further referring to FIG. 7A , it shows a partial cross-sectional view of the array substrate shown in FIG. 6A . FIG. 7A shows a section along a line S3 parallel to the data line 621 in FIG. 6A . As shown in FIG. 7A , the array substrate 600A includes a base substrate 60 , and the base substrate 60 includes a display area 601 and a non-display area 602 . The array substrate 600A further includes a first metal layer 61 , a second metal layer 62 and a TFT light-shielding metal layer 65 arranged in a direction perpendicular to the base substrate 60 . Wherein, the first metal layer 61 is used to form the scan line 611 of the array substrate 600A and the gate 612 of the TFT, and the second metal layer 62 is used to form the data line 621 of the array substrate 600A. A plurality of pixel units arranged in an array are arranged in the display area 601 . The row direction of the pixel unit is the extending direction of the scan line 611 , and the column direction of the pixel unit is the extending direction of the data line 621 . The array substrate 600A further includes a touch electrode layer 63 and a touch signal line 652 disposed on the same layer as the TFT light-shielding metal layer 65 . The touch electrode layer 63 includes a plurality of touch electrodes 631 . The touch signal line 652 is electrically connected to a touch electrode 631 and transmits a touch signal for the touch electrode 631 .
在本实施的一些可选的实现方式中，阵列基板600A还包括形成于TFT遮光金属层65和触控电极层63之间的第三绝缘层64。第三绝缘层64上设有贯穿第三绝缘层的至少一个第三导通孔641。触控信号线652通过至少一个第三导通孔641与多个触控电极631电连接。In some optional implementations of this embodiment, the array substrate 600A further includes a third insulating layer 64 formed between the TFT light-shielding metal layer 65 and the touch electrode layer 63 . At least one third via hole 641 penetrating through the third insulating layer is disposed on the third insulating layer 64 . The touch signal line 652 is electrically connected to the plurality of touch electrodes 631 through at least one third via hole 641 .
进一步参考图7B，其示出了图6B所示阵列基板的局部剖面图。图7B所示为沿图6B中与扫描线611平行的线S4剖开的切面示意图。如图7B所示，阵列基板600B包括衬底基板60，衬底基板60包括显示区601和非显示区602。阵列基板600B还包括在垂直于衬底基板60的方向上排列的第一金属层61、第二金属层62和TFT遮光金属层65。其中，第一金属层61用于形成阵列基板600B的扫描线611和TFT的栅极612，第二金属层62用于形成阵列基板600B的数据线621以及TFT的源极622和漏极623。显示区601内设有多个呈阵列排布的像素单元。像素单元的行方向为扫描线611的延伸方向，像素单元的列方向为数据线621的延伸方向。阵列基板600B还包括触控电极层63和与TFT遮光金属层65同层设置的触控信号线653。触控电极层63包括多个触控电极631。触控信号线653与一个触控电极631电相连，为触控电极631传输触控信号。Further referring to FIG. 7B , it shows a partial cross-sectional view of the array substrate shown in FIG. 6B . FIG. 7B is a schematic cross-sectional view taken along a line S4 parallel to the scan line 611 in FIG. 6B . As shown in FIG. 7B , the array substrate 600B includes a base substrate 60 , and the base substrate 60 includes a display area 601 and a non-display area 602 . The array substrate 600B further includes a first metal layer 61 , a second metal layer 62 and a TFT light-shielding metal layer 65 arranged in a direction perpendicular to the base substrate 60 . Wherein, the first metal layer 61 is used to form the scan line 611 of the array substrate 600B and the gate 612 of the TFT, and the second metal layer 62 is used to form the data line 621 of the array substrate 600B and the source 622 and the drain 623 of the TFT. A plurality of pixel units arranged in an array are arranged in the display area 601 . The row direction of the pixel unit is the extending direction of the scan line 611 , and the column direction of the pixel unit is the extending direction of the data line 621 . The array substrate 600B further includes a touch electrode layer 63 and a touch signal line 653 disposed on the same layer as the TFT light-shielding metal layer 65 . The touch electrode layer 63 includes a plurality of touch electrodes 631 . The touch signal line 653 is electrically connected to a touch electrode 631 and transmits a touch signal for the touch electrode 631 .
在本实施的一些可选的实现方式中，阵列基板600B还包括形成于TFT遮光金属层65和触控电极层63之间的第三绝缘层64。第三绝缘层64上设有贯穿第三绝缘层的至少一个第三导通孔642。触控信号线653通过至少一个第三导通孔642与多个触控电极631电连接。In some optional implementations of this embodiment, the array substrate 600B further includes a third insulating layer 64 formed between the TFT light-shielding metal layer 65 and the touch electrode layer 63 . At least one third via hole 642 penetrating through the third insulating layer is disposed on the third insulating layer 64 . The touch signal line 653 is electrically connected to the plurality of touch electrodes 631 through at least one third via hole 642 .
如图7A和图7B所示，第三绝缘层64可以形成于TFT遮光金属层65和触控电极层63之间。第三绝缘层可以为多个，例如当第一金属层61和第二金属层62形成于触控电极层63和TFT遮光金属层65之间时，TFT遮光金属层和第一金属层61之间、第一金属层61和第二金属层62之间、第二金属层62和触控电极层63之间均设有第三绝缘层64。在制作阵列基板时，可以沿垂直于衬底基板方向依次形成：TFT遮光金属层65、第一层第三绝缘层64、第一金属层61、第二层第三绝缘层64、第二金属层62、第三层第三绝缘层64、触控电极层63，并在第一层第三绝缘层64、第二层第三绝缘层64和第三层第三绝缘层64的相对的位置上设置有第三导通孔。触控信号线652或653形成于TFT遮光金属层65上，通过第三导通孔与触控电极631电连接。在本实施例的一些可选的实现方式中，在第三绝缘层64上可以设有多个并联的第三导通孔。多个并联的第三导通孔不仅可以进一步减小触控电极的电阻，还可以进一步增强触控信号线与触控电极的连接的稳定性。As shown in FIG. 7A and FIG. 7B , the third insulating layer 64 may be formed between the TFT light-shielding metal layer 65 and the touch electrode layer 63 . There may be multiple third insulating layers. For example, when the first metal layer 61 and the second metal layer 62 are formed between the touch electrode layer 63 and the TFT light-shielding metal layer 65, the gap between the TFT light-shielding metal layer and the first metal layer 61 A third insulating layer 64 is provided between the first metal layer 61 and the second metal layer 62 , and between the second metal layer 62 and the touch electrode layer 63 . When fabricating the array substrate, it can be formed sequentially along the direction perpendicular to the base substrate: TFT light-shielding metal layer 65, first layer and third insulating layer 64, first metal layer 61, second layer and third insulating layer 64, second metal layer Layer 62, the third layer and the third insulating layer 64, the touch electrode layer 63, and in the relative positions of the first layer and the third insulating layer 64, the second layer and the third insulating layer 64 and the third layer and the third insulating layer 64 A third via hole is provided on it. The touch signal line 652 or 653 is formed on the TFT light-shielding metal layer 65 and is electrically connected to the touch electrode 631 through the third via hole. In some optional implementation manners of this embodiment, a plurality of third via holes connected in parallel may be provided on the third insulating layer 64 . The plurality of third via holes connected in parallel can not only further reduce the resistance of the touch electrode, but also further enhance the stability of the connection between the touch signal line and the touch electrode.
在进一步的实现方式中，第三导通孔641或642设置于相邻的两个像素单元之间。在本实施例中，任意两个第三导通孔之间可以相隔多个像素单元的长度，多个公共电极可以共用一个第三导通孔，以提升阵列基板的开口率。In a further implementation manner, the third via hole 641 or 642 is disposed between two adjacent pixel units. In this embodiment, any two third via holes may be separated by a length of multiple pixel units, and multiple common electrodes may share one third via hole to increase the aperture ratio of the array substrate.
请参考图8，其示出了本申请提供的阵列基板的再一个实施例的结构示意图。如图8所示，阵列基板800包括显示区801和非显示区802。阵列基板800上设有呈阵列排布的像素单元803、沿像素单元803的行方向延伸的扫描线811以及沿像素单元803的列方向延伸的数据线821。在本实施例中，阵列基板800上还设有多个触控电极831。用于向触控电极831传输触控信号的触控信号线822与数据线821所在的第二金属层同层设置，且触控信号线822设置于非显示区802内。触控信号线822与数据线821在非显示区的部分绝缘且与任意相邻的数据线无交叉。如图8所示，数据线821在非显示区802的延伸方向与像素单元的列方向不一致。在非显示区802内，数据线821与设置于非显示区802的驱动芯片(图8中未示出)连接。驱动芯片设置于非显示区802的一个子区域8021中。数据线821在非显示区802的子区域8021中的走线可以形成一个扇形结构。图8中示出了该扇形结构的一部分区域内部分数据线821和部分触控信号线822的走线方向。触控电极831通过设置于非显示区802的触控信号线连接至驱动芯片。每条触控信号线822与其相邻的数据线821在非显示区802的走线方向近似平行，且相互绝缘。在显示时数据线821接收驱动电路输出的数据信号，此时触控信号线822作为公共电极线为公共电极传输显示所需要的公共电压。由于数据线821和触控信号线822绝缘，数据线821和触控信号线822上的信号互不干扰，避免形成寄生电容影响显示效果。Please refer to FIG. 8 , which shows a schematic structural diagram of another embodiment of the array substrate provided by the present application. As shown in FIG. 8 , the array substrate 800 includes a display area 801 and a non-display area 802 . The array substrate 800 is provided with pixel units 803 arranged in an array, scan lines 811 extending along the row direction of the pixel units 803 , and data lines 821 extending along the column direction of the pixel units 803 . In this embodiment, a plurality of touch electrodes 831 are further disposed on the array substrate 800 . The touch signal lines 822 for transmitting touch signals to the touch electrodes 831 are disposed on the same layer as the second metal layer where the data lines 821 are located, and the touch signal lines 822 are disposed in the non-display area 802 . The touch signal line 822 is insulated from the data line 821 in the non-display area and does not cross any adjacent data line. As shown in FIG. 8 , the extending direction of the data line 821 in the non-display area 802 is not consistent with the column direction of the pixel units. In the non-display area 802 , the data line 821 is connected to a driver chip (not shown in FIG. 8 ) disposed in the non-display area 802 . The driver chip is disposed in a sub-area 8021 of the non-display area 802 . The routing of the data lines 821 in the sub-area 8021 of the non-display area 802 may form a fan-shaped structure. FIG. 8 shows the routing directions of part of the data lines 821 and part of the touch signal lines 822 in a part of the fan-shaped structure. The touch electrodes 831 are connected to the driving chip through touch signal lines disposed in the non-display area 802 . The routing direction of each touch signal line 822 and its adjacent data line 821 in the non-display area 802 is approximately parallel and insulated from each other. When displaying, the data line 821 receives the data signal output by the driving circuit, and at this time, the touch signal line 822 serves as a common electrode line and transmits a common voltage required for display to the common electrodes. Since the data line 821 and the touch signal line 822 are insulated, the signals on the data line 821 and the touch signal line 822 do not interfere with each other, avoiding the formation of parasitic capacitance and affecting the display effect.
在图8所示的实施例中，触控信号线822设置于由数据线821在非显示区内的走线部分形成的扇形结构中。且触控信号线822的走线方向与显示区801内的扫描线811的走线方向形成≤90°的角度。各触控信号线822之间可以互不平行。在沿着扇形结构的中心向两边方向上，各触控信号线822的走线方向与显示区801内的扫描线811的走线方向形成的夹角逐渐增大。在扇形结构的中心部分，触控信号线822的走线方向与显示区801内的数据线821方向一致。In the embodiment shown in FIG. 8 , the touch signal line 822 is arranged in a fan-shaped structure formed by the routing part of the data line 821 in the non-display area. Moreover, the routing direction of the touch signal lines 822 and the routing direction of the scanning lines 811 in the display area 801 form an angle of ≦90°. The touch signal lines 822 may not be parallel to each other. Along the direction from the center of the fan-shaped structure to both sides, the included angle formed by the routing direction of each touch signal line 822 and the routing direction of the scanning line 811 in the display area 801 gradually increases. In the central part of the fan-shaped structure, the routing direction of the touch signal lines 822 is consistent with the direction of the data lines 821 in the display area 801 .
在本实施例中，将触控信号线822设置于非显示区，且与数据线互不相交，可以进一步地减少显示区的走线数量。通过采用本实施例提供的阵列基板，无需在显示区为触控信号线设置走线空间，能够进一步简化显示区内的走线设计，减小工艺复杂度。同时，将触控信号线设置于与数据线在非显示区的走线部分形成的扇形结构中，可以简化非显示区内的走线设计，减小非显示区内触控信号线所占用的空间，有利于窄边框的设计。In this embodiment, the touch signal lines 822 are arranged in the non-display area and do not intersect with the data lines, which can further reduce the number of wires in the display area. By adopting the array substrate provided in this embodiment, there is no need to provide a wiring space for the touch signal lines in the display area, which can further simplify the wiring design in the display area and reduce the complexity of the process. At the same time, setting the touch signal lines in the fan-shaped structure formed with the data lines in the non-display area can simplify the design of the lines in the non-display area and reduce the space occupied by the touch signal lines in the non-display area. space, which is conducive to the design of narrow borders.
在现有的阵列基板的设计中，触控信号线位于显示区内，为了避免触控信号线与数据线之间产生寄生电容或发生短路影响显示效果和触摸检测精度，通常将两条数据线设置在相邻两个像素单元之间的同一刻缝内，触控信号线排布于未设置数据线的相邻两个像素单元之间的刻缝内。这样，在同一刻缝内的相邻两条数据线通过同一条连接线先后接收数据信号时，悬空的一条数据线会受到相邻的被驱动的数据线上的信号的影响。通过采用本实施例所描述的方案，将触控信号线822与第二金属层82同层设置，且设置于非显示区内，可以在任意两条相邻数据线之间设置触控信号线。则在显示区内相邻两列像素单元之间可以仅设置一条数据线。在通过同一条信号线对数据线先后驱动时悬空的数据线不会受到被驱动的数据线上的信号的影响，避免了对显示效果造成的影响。In the existing design of the array substrate, the touch signal line is located in the display area. In order to avoid the parasitic capacitance or short circuit between the touch signal line and the data line from affecting the display effect and the touch detection accuracy, two data lines are usually The touch signal lines are arranged in the same slit between two adjacent pixel units, and the touch signal lines are arranged in the slit between two adjacent pixel units without data lines. In this way, when two adjacent data lines in the same slit receive data signals successively through the same connection line, the suspended data line will be affected by the signal of the adjacent driven data line. By adopting the solution described in this embodiment, the touch signal line 822 is arranged on the same layer as the second metal layer 82, and is arranged in the non-display area, and the touch signal line can be arranged between any two adjacent data lines. . Then only one data line can be arranged between two adjacent columns of pixel units in the display area. When the data lines are driven successively by the same signal line, the suspended data lines will not be affected by the signals on the driven data lines, thus avoiding the influence on the display effect.
在本实施例的一些可选的实现方式中，阵列基板还包括形成于第二金属层和触控电极层之间的第四绝缘层。第四绝缘层上设有贯穿第四绝缘层的至少一个第四导通孔841，触控信号线822通过至少一个第四导通孔841与多个触控电极电连接。In some optional implementation manners of this embodiment, the array substrate further includes a fourth insulating layer formed between the second metal layer and the touch electrode layer. The fourth insulating layer is provided with at least one fourth via hole 841 penetrating through the fourth insulating layer, and the touch signal line 822 is electrically connected to a plurality of touch electrodes through the at least one fourth via hole 841 .
在本实施的一些可选的实现方式中，阵列基板800还包括多个触控电极线垫832。触控电极线垫832在触控电极层83所在平面具有正投影且正投影位于触控电极层在非显示区802的部分内。触控电极线垫832可以设置于第四绝缘层84上。触控电极线垫832上可以设有与第四导通孔841对应的过孔，触控信号线822通过第四绝缘层上的第四导通孔841以及触控电极线垫832上的过孔与触控电极831电连接。In some optional implementation manners of this embodiment, the array substrate 800 further includes a plurality of touch electrode line pads 832 . The touch electrode line pad 832 has an orthographic projection on the plane where the touch electrode layer 83 is located, and the orthographic projection is located in the part of the touch electrode layer in the non-display area 802 . The touch electrode line pad 832 can be disposed on the fourth insulating layer 84 . The touch electrode line pad 832 may be provided with a via hole corresponding to the fourth via hole 841, and the touch signal line 822 passes through the fourth via hole 841 on the fourth insulating layer and the via hole on the touch electrode line pad 832. The holes are electrically connected to the touch electrodes 831 .
进一步参考图9，其示出了图8所示阵列基板的局部剖面图。图9所示为沿图8中与数据线811平行线的S5剖开的切面示意图。如图9所示，阵列基板800包括衬底基板80，衬底基板80包括显示区801和非显示区802。阵列基板800还包括在垂直于衬底基板80的方向上排列的第一金属层81和第二金属层82。其中，第一金属层81用于形成阵列基板800的扫描线，第二金属层82用于形成阵列基板800的数据线821。显示区801内设有多个呈阵列排布的像素单元。像素单元的行方向为扫描线811的延伸方向,像素单元的列方向为数据线821的延伸方向。阵列基板800还包括触控电极层83和设置于非显示区802的触控信号线822。触控信号线822与第二金属层82同层设置。触控电极层83包括多个触控电极831。触控信号线822与一个触控电极831电相连，为触控电极831传输触控信号。Further referring to FIG. 9 , it shows a partial cross-sectional view of the array substrate shown in FIG. 8 . FIG. 9 is a schematic diagram of a cross section taken along line S5 parallel to the data line 811 in FIG. 8 . As shown in FIG. 9 , the array substrate 800 includes a base substrate 80 , and the base substrate 80 includes a display area 801 and a non-display area 802 . The array substrate 800 further includes a first metal layer 81 and a second metal layer 82 arranged in a direction perpendicular to the base substrate 80 . Wherein, the first metal layer 81 is used to form the scan lines of the array substrate 800 , and the second metal layer 82 is used to form the data lines 821 of the array substrate 800 . A plurality of pixel units arranged in an array are arranged in the display area 801 . The row direction of the pixel unit is the extending direction of the scan line 811 , and the column direction of the pixel unit is the extending direction of the data line 821 . The array substrate 800 further includes a touch electrode layer 83 and a touch signal line 822 disposed in the non-display area 802 . The touch signal line 822 is disposed on the same layer as the second metal layer 82 . The touch electrode layer 83 includes a plurality of touch electrodes 831 . The touch signal line 822 is electrically connected to a touch electrode 831 and transmits a touch signal to the touch electrode 831 .
在本实施的一些可选的实现方式中，阵列基板800还包括形成于第二金属层82和触控电极层83之间的第四绝缘层84以及触控电极线垫832。第四绝缘层84上设有贯穿第四绝缘层的至少一个第四导通孔841。触控信号线822通过至少一个第四导通孔841与多个触控电极831电连接。触控电极线垫832上可以设有与第四导通孔841的位置对应的过孔833。触控信号线822通过第四导通孔841和过孔833与触控电极831电连接。触控信号线822走线的宽度较小，而触控电极831的面积通常较大，通过设置触控电极线垫832，可以增大触控信号线822与触控电极831的接触面积，提升触控信号线822与触控电极831之间的连接的稳定性。In some optional implementations of this embodiment, the array substrate 800 further includes a fourth insulating layer 84 and a touch electrode line pad 832 formed between the second metal layer 82 and the touch electrode layer 83 . At least one fourth via hole 841 penetrating through the fourth insulating layer is disposed on the fourth insulating layer 84 . The touch signal line 822 is electrically connected to the plurality of touch electrodes 831 through at least one fourth via hole 841 . Via holes 833 corresponding to the positions of the fourth via holes 841 may be provided on the touch electrode line pads 832 . The touch signal line 822 is electrically connected to the touch electrode 831 through the fourth via hole 841 and the via hole 833 . The width of the touch signal line 822 is small, while the area of the touch electrode 831 is usually large. By setting the touch electrode line pad 832, the contact area between the touch signal line 822 and the touch electrode 831 can be increased, and the touch electrode 831 can be improved. The stability of the connection between the touch signal line 822 and the touch electrode 831 .
在本实施例的一些可选的实现方式中，在第二绝缘层84上可以设有多个并联的第四导通孔841。多个并联的第四导通孔841可以进一步减小触控电极的电阻，还可以保证触控信号线与触控电极电连接的稳定性。In some optional implementation manners of this embodiment, a plurality of parallel fourth via holes 841 may be provided on the second insulating layer 84 . A plurality of fourth via holes 841 connected in parallel can further reduce the resistance of the touch electrode, and can also ensure the stability of the electrical connection between the touch signal line and the touch electrode.
在上述实施例中，设置于触控电极层的多个触控电极彼此绝缘，可选的，触控电极在触控阶段用作触控电极，在显示阶段用作公共电极。如此一来可以将触控功能集成于显示面板当中，大大减小了显示面板的厚度，有利于显示面板的轻薄化。本实施例中触控功能的实现可以通过互容式触控，也可以通过自容式触控。对于互容式触控，包括触控驱动电极和触控检测电极，触控驱动电极被依次输入触控驱动信号，触控检测电极输出检测信号，触控驱动电极和触控检测电极形成电容，当触控显示面板上发生触控时，会影响触摸点附近触控驱动电极和触控检测电极之间的耦合，从而改变触控驱动电极和触控检测电极之间的电容量。检测触摸点位置的方法为，对触控驱动电极依次输入触控驱动信号，触控检测电极同时输出触控检测信号，这样可以得到所有触控驱动电极和触控检测电极交汇点的电容值大小，即整个集成触控显示面板的二维平面的电容大小，根据触控显示面板二维电容变化量数据，可以计算出触摸点的坐标。In the above embodiments, the plurality of touch electrodes disposed on the touch electrode layer are insulated from each other. Optionally, the touch electrodes are used as touch electrodes during the touch phase and as common electrodes during the display phase. In this way, the touch function can be integrated into the display panel, which greatly reduces the thickness of the display panel, which is beneficial to the thinning of the display panel. In this embodiment, the touch function can be realized through mutual capacitive touch or self-capacitive touch. For mutual capacitive touch, including touch drive electrodes and touch detection electrodes, the touch drive electrodes are sequentially input with touch drive signals, the touch detection electrodes output detection signals, and the touch drive electrodes and touch detection electrodes form capacitance. When a touch occurs on the touch display panel, it will affect the coupling between the touch driving electrodes and the touch detection electrodes near the touch point, thereby changing the capacitance between the touch driving electrodes and the touch detection electrodes. The method of detecting the position of the touch point is to input touch driving signals to the touch driving electrodes in sequence, and the touch detection electrodes output touch detection signals at the same time, so that the capacitance values at the intersections of all touch driving electrodes and touch detection electrodes can be obtained , that is, the capacitance of the two-dimensional plane of the entire integrated touch display panel, and the coordinates of the touch point can be calculated according to the two-dimensional capacitance change data of the touch display panel.
在触控阶段，触控电极可以作为触控驱动电极，也可以作为触控检测电极，接收或者输出触控信号。在显示阶段，触控电极复用为公共电极为阵列基板上的像素单元提供显示所需要的电压。进一步地，触控电极可以为条状电极，条状电极的延伸方向与数据线的延伸方向相同。多个条状电极可以沿与数据线相交的方向并列排布，例如可以沿与数据线垂直的方向并列排布，因而可以将控制电路与为显示像素提供显示信号的数据驱动电路设置在同一侧，有利于窄边框的设计。进一步地，触控电极用作触控驱动电极，在触摸检测时接收触控驱动信号。触控驱动信号可以为周期性的脉冲信号。In the touch stage, the touch electrodes can be used as touch drive electrodes or touch detection electrodes to receive or output touch signals. In the display stage, the touch electrodes are multiplexed as common electrodes to provide the pixel units on the array substrate with voltages required for display. Further, the touch electrodes may be strip-shaped electrodes, and the extending direction of the strip-shaped electrodes is the same as that of the data lines. A plurality of strip electrodes can be arranged side by side along the direction intersecting with the data lines, for example, can be arranged side by side along the direction perpendicular to the data lines, so the control circuit and the data driving circuit that provides display signals for the display pixels can be arranged on the same side , which is conducive to the design of narrow bezels. Further, the touch electrodes are used as touch driving electrodes, and receive touch driving signals during touch detection. The touch driving signal can be a periodic pulse signal.
以上结合图2至图9具体描述了本申请提供的各实施例中触控信号线的设置方法，将触控信号线与第一金属层、第二金属层或TFT遮光金属层同层设置，在制作阵列基板时无需再制作触控电极线金属层，触控信号线和阵列基板上其他金属线线路可以同时成形，能够降低工艺复杂度，简化阵列基板的结构。The method for setting the touch signal lines in the various embodiments provided by the present application has been specifically described above in conjunction with FIG. 2 to FIG. When fabricating the array substrate, there is no need to fabricate the metal layer of the touch electrode lines, and the touch signal lines and other metal lines on the array substrate can be formed at the same time, which can reduce the complexity of the process and simplify the structure of the array substrate.
继续参考图10，其示出了本申请提供的触控显示面板的一个实施例的局部剖面图。如图10所示，触控显示面板1000可以包括阵列基板1和与阵列基板相对设置的彩膜基板2。其中，阵列基板1可以为以上结合图2至图9描述的阵列基板，包括衬底基板1110。衬底基板1110包括显示区1001和非显示区1002。阵列基板1还包括在垂直于衬底基板1110的方向上排列的多个金属层。多个金属层至少包括第一金属层1010和第二金属层1020。其中，第一金属层1010用于形成阵列基板1000的扫描线1011(图1中仅示出一条)，第二金属层1020用于形成阵列基板1000的数据线1021。显示区1001内设有多个呈阵列排布的像素单元。像素单元的行方向为扫描线1011的延伸方向,像素单元的列方向为数据线1021的延伸方向。阵列基板1还包括触控电极层1030和多条触控信号线。触控电极层1030包括多个触控电极1031。触控信号线与一个触控电极1031电相连，为触控电极1031传输触控信号。触控信号线与至少一层上述多个金属层同层设置。如图1中，触控信号线1022可以与第二金属层1020同层设置。在其他实施例中，触控信号线1022也可以与第一金属层1010同层设置。Continue to refer to FIG. 10 , which shows a partial cross-sectional view of an embodiment of the touch display panel provided by the present application. As shown in FIG. 10 , a touch display panel 1000 may include an array substrate 1 and a color filter substrate 2 disposed opposite to the array substrate. Wherein, the array substrate 1 may be the array substrate described above in conjunction with FIG. 2 to FIG. 9 , including the base substrate 1110 . The base substrate 1110 includes a display area 1001 and a non-display area 1002 . The array substrate 1 further includes a plurality of metal layers arranged in a direction perpendicular to the base substrate 1110 . The plurality of metal layers includes at least a first metal layer 1010 and a second metal layer 1020 . Wherein, the first metal layer 1010 is used to form the scan line 1011 of the array substrate 1000 (only one is shown in FIG. 1 ), and the second metal layer 1020 is used to form the data line 1021 of the array substrate 1000 . A plurality of pixel units arranged in an array are arranged in the display area 1001 . The row direction of the pixel unit is the extending direction of the scan line 1011 , and the column direction of the pixel unit is the extending direction of the data line 1021 . The array substrate 1 further includes a touch electrode layer 1030 and a plurality of touch signal lines. The touch electrode layer 1030 includes a plurality of touch electrodes 1031 . The touch signal line is electrically connected to a touch electrode 1031 and transmits a touch signal to the touch electrode 1031 . The touch signal line is arranged on the same layer as at least one of the plurality of metal layers. As shown in FIG. 1 , the touch signal line 1022 can be disposed on the same layer as the second metal layer 1020 . In other embodiments, the touch signal line 1022 can also be disposed on the same layer as the first metal layer 1010 .
阵列基板1的非显示区1002内设有驱动电路。其中，用于扫描阵列基板1上的像素单元的栅极驱动电路与第一金属层1010同层设置，用于向数据线1021传递数据信号以使像素单元根据数据信号进行显示的驱动电路1023可以与第二金属层1020同层设置。A driving circuit is disposed in the non-display area 1002 of the array substrate 1 . Wherein, the gate drive circuit for scanning the pixel units on the array substrate 1 is provided on the same layer as the first metal layer 1010, and the drive circuit 1023 for transmitting data signals to the data lines 1021 so that the pixel units display according to the data signals can be It is set on the same layer as the second metal layer 1020 .
彩膜基板2上可以设有与触控电极1031交叉设置的接收电极1041。接收电极也可以为延伸方向与扫描线1011平行、沿与扫描线相交的方向并列排布的条状电极。接收电极1041用作触控感应电极，与触控电极1031形成互电容。在图10所示的触控显示面板中，触控电极1031可以设置于阵列基板1朝向彩膜基板2的一侧，接收电极1041可以设置在彩膜基板2背离阵列基板1的一侧上。当然不仅限于此种设置，也可以是：触控电极1031可以设置于阵列基板1朝向彩膜基板2的一侧，接收电极1041可以设置在彩膜基板2朝向阵列基板1的一侧上，等等其它可以形成互电容的设置方式。在触摸检测时，通过检测触控电极1031和接收电极1041之间互电容的变化来确定触摸点的位置。The receiving electrodes 1041 intersecting with the touch electrodes 1031 can be arranged on the color filter substrate 2 . The receiving electrodes may also be strip electrodes whose extending direction is parallel to the scanning line 1011 and arranged side by side along the direction intersecting the scanning line. The receiving electrodes 1041 are used as touch sensing electrodes and form mutual capacitance with the touch electrodes 1031 . In the touch display panel shown in FIG. 10 , the touch electrode 1031 can be arranged on the side of the array substrate 1 facing the color filter substrate 2 , and the receiving electrode 1041 can be arranged on the side of the color filter substrate 2 facing away from the array substrate 1 . Of course, it is not limited to this kind of arrangement, and it can also be: the touch electrode 1031 can be arranged on the side of the array substrate 1 facing the color filter substrate 2, and the receiving electrode 1041 can be arranged on the side of the color filter substrate 2 facing the array substrate 1, etc. And other settings that can form mutual capacitance. During touch detection, the position of the touch point is determined by detecting the change of the mutual capacitance between the touch electrode 1031 and the receiving electrode 1041 .
本申请实施例还提供了一种触摸显示屏，包括以上结合图10描述的触控显示面板。The embodiment of the present application also provides a touch display screen, including the touch display panel described above in conjunction with FIG. 10 .
以上描述仅为本申请的较佳实施例以及对所运用技术原理的说明。本领域技术人员应当理解，本申请中所涉及的实用新型范围，并不限于上述技术特征的特定组合而成的技术方案，同时也应涵盖在不脱离所述实用新型构思的情况下，由上述技术特征或其等同特征进行任意组合而形成的其它技术方案。例如上述特征与本申请中公开的(但不限于)具有类似功能的技术特征进行互相替换而形成的技术方案。The above description is only a preferred embodiment of the present application and an illustration of the applied technical principle. Those skilled in the art should understand that the scope of the utility model involved in this application is not limited to the technical solution formed by the specific combination of the above-mentioned technical features, and should also cover the above-mentioned utility models without departing from the concept of the utility model. Other technical solutions formed by any combination of technical features or equivalent features. For example, a technical solution formed by replacing the above-mentioned features with technical features with similar functions disclosed in (but not limited to) this application.
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620094783.9UCN205375436U (en) | 2016-01-29 | 2016-01-29 | Array substrate , touch -control display panel and touch -sensitive display device |
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620094783.9UCN205375436U (en) | 2016-01-29 | 2016-01-29 | Array substrate , touch -control display panel and touch -sensitive display device |
| Publication Number | Publication Date |
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| CN205375436Utrue CN205375436U (en) | 2016-07-06 |
| Application Number | Title | Priority Date | Filing Date |
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| CN201620094783.9UActiveCN205375436U (en) | 2016-01-29 | 2016-01-29 | Array substrate , touch -control display panel and touch -sensitive display device |
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