CN203519969U - Color filter substrate and touch display device - Google Patents

Abstract

The utility model discloses a color film substrate and a touch display device. The color film substrate of a touch screen comprises a lining substrate, a black matrix, color resistors, a first electrode wire assembly, a second electrode wire assembly and isolating mats, wherein the black matrix is located above the lining substrate, the black matrix comprises light-permeable areas and light-shading areas, the color resistors are located in the light-permeable areas of the black matrix, the first electrode wire assembly and the second electrode wire assembly are located above the black matrix and the color resistors and arranged in a crossing mode, the first electrode wire assembly includes a plurality of first electrodes which are connected in series through bridging wires, the second electrode wire assembly includes a plurality of second electrodes which are connected in series through connecting wires, the bridging wires and the connecting wires are arranged in a crossing mode, the positions of crossing areas correspond to the positions of the light-shading areas of the black matrix, and the isolation mats are arranged between the bridging wires and the connecting wires and insulate and isolate the bridging wires from the connecting wires. According to the structure scheme, the manufacturing process of the color film substrate in the touch screen is greatly simplified, the consumption of mask plates is reduced, and manufacturing cost is reduced.

Description

Translated fromChinese

彩膜基板及触控显示装置Color filter substrate and touch display device

技术领域technical field

本实用新型涉及触控显示技术领域，特别是涉及一种触摸屏的彩膜基板及触控显示装置。The utility model relates to the technical field of touch display, in particular to a color filter substrate of a touch screen and a touch display device.

背景技术Background technique

目前，大多数互电容式触摸屏为外挂式，即触摸屏与显示屏分开制作然后贴合在一起。这种技术存在制作成本较高、光透过率较低、模组较厚的缺点。随着科技的发展，内嵌触摸屏技术逐渐成为研发新宠，其是指：用于实现触控功能的驱动电极线和探测电极线设置在显示屏的基板上。采用内嵌触摸屏技术的触控显示装置相比外挂式触控显示装置，具有厚度更薄、性能更高、成本更低的优势。At present, most mutual capacitive touch screens are plug-in, that is, the touch screen and the display screen are manufactured separately and then bonded together. This technology has the disadvantages of high production cost, low light transmittance, and thick module. With the development of science and technology, embedded touch screen technology has gradually become a new favorite of research and development, which means that the driving electrode lines and detection electrode lines used to realize the touch function are arranged on the substrate of the display screen. Compared with the external touch display device, the touch display device adopting the embedded touch screen technology has the advantages of thinner thickness, higher performance and lower cost.

如图1所示，现有的一种内嵌式触摸屏的彩膜基板包括：透明基板10，以及在透明基板10之上依次形成的驱动电极11和探测电极线12、第一钝化层13、金属桥14、第二钝化层15、黑矩阵16、彩色光阻17、平坦层18和隔垫物19，其中，驱动电极11通过金属桥14搭接组成驱动电极线，驱动电极线与探测电极线12交叉设置并在交叉处通过第一钝化层13绝缘隔离。该现有技术存在的缺陷在于，彩膜基板需要至少采用六次掩模构图工艺制作完成，每一次构图工艺通常包括光刻胶涂敷、曝光、显影、刻蚀、光刻胶剥离等工序，这就对应需要至少六张掩模板，彩膜基板的整体制作工艺不但较为复杂，并且制作成本较高。As shown in FIG. 1 , an existing color filter substrate of an in-cell touch screen includes: atransparent substrate 10 , and sequentially formed on thetransparent substrate 10 aredrive electrodes 11 ,detection electrode lines 12 , and afirst passivation layer 13 . ,metal bridge 14,second passivation layer 15,black matrix 16,color photoresist 17,planar layer 18 andspacer 19, wherein, drivingelectrode 11 forms driving electrode line by overlappingmetal bridge 14, driving electrode line and Thedetection electrode lines 12 are arranged to intersect and are insulated and isolated by thefirst passivation layer 13 at the intersections. The disadvantage of this existing technology is that the color filter substrate needs to be fabricated by at least six mask patterning processes, and each patterning process usually includes processes such as photoresist coating, exposure, development, etching, and photoresist stripping. This corresponds to the need for at least six masks, and the overall manufacturing process of the color filter substrate is not only relatively complicated, but also the manufacturing cost is relatively high.

实用新型内容Utility model content

本实用新型提供了一种触摸屏的彩膜基板及触控显示装置，以简化触摸屏中彩膜基板的制作工艺，降低制作成本。The utility model provides a color film substrate of a touch screen and a touch display device, so as to simplify the manufacturing process of the color film substrate in the touch screen and reduce the manufacturing cost.

本实用新型实施例提供的触摸屏的彩膜基板，包括：The color filter substrate of the touch screen provided by the embodiment of the utility model includes:

衬底基板；Substrate substrate;

位于所述衬底基板上方的黑矩阵，所述黑矩阵包括透光区域和遮光区域；a black matrix located above the base substrate, the black matrix including a light-transmitting area and a light-shielding area;

位于所述黑矩阵的透光区域内的彩色光阻；a color photoresist located in the light-transmitting region of the black matrix;

位于所述黑矩阵和所述彩色光阻上方且交叉设置的一组第一电极线和一组第二电极线，所述第一电极线包括通过桥接线串接的多个第一电极，所述第二电极线包括通过连接线串接的多个第二电极，所述桥接线和所述连接线交叉设置且交叉区域与黑矩阵的遮光区域位置相对；A set of first electrode lines and a set of second electrode lines arranged above the black matrix and the color photoresist and intersecting, the first electrode lines include a plurality of first electrodes connected in series through bridge lines, so The second electrode line includes a plurality of second electrodes connected in series through a connecting line, the bridging line and the connecting line are intersected, and the crossing area is opposite to the light-shielding area of the black matrix;

位于所述桥接线和所述连接线之间将所述桥接线和所述连接线绝缘隔离的隔垫物。A spacer located between the bridging wire and the connecting wire to insulate and isolate the bridging wire and the connecting wire.

在该技术方案中，利用彩膜基板的隔垫物将第一电极线的桥接线和第二电极线的连接线绝缘隔离，相比于现有技术，桥接线和连接线之间无需另外通过构图工艺形成第一钝化层，这大大简化了触摸屏中彩膜基板的制作工艺，减少了掩模板的使用数量，降低了制作成本。In this technical solution, the spacer of the color filter substrate is used to insulate and isolate the bridge line of the first electrode line and the connection line of the second electrode line. Compared with the prior art, there is no need for additional passage between the bridge line and the connection line. The patterning process forms the first passivation layer, which greatly simplifies the manufacturing process of the color filter substrate in the touch screen, reduces the number of masks used, and reduces the manufacturing cost.

优选的，所述第一电极、第二电极和所述连接线位于同层；所述桥接线位于所述连接线的上方，或者，所述连接线位于所述桥接线的上方。作为可选方案，第一电极、第二电极和连接线所在层结构与桥接线所在层结构的位置可互换，无论采用哪一种结构形式，彩膜基板的制作工艺均较为简化，制作成本较低。Preferably, the first electrode, the second electrode and the connection line are located on the same layer; the bridge line is located above the connection line, or the connection line is located above the bridge line. As an optional solution, the positions of the layer structure where the first electrode, the second electrode, and the connection line are located, and the layer structure where the bridge line is located can be interchanged. No matter which structural form is adopted, the manufacturing process of the color filter substrate is relatively simplified, and the manufacturing cost is relatively low. lower.

优选的，彩膜基板还包括：位于所述黑矩阵和所述彩色光阻上方且位于所述一组第一电极线、一组第二电极线和隔垫物所组成的结构下方的覆盖基板的第一平坦层。第一平坦层可以将黑矩阵和彩色光阻的表面平坦化，有利于在其上进行下一步构图工艺。Preferably, the color filter substrate further includes: a cover substrate located above the black matrix and the color photoresist and below the structure composed of the set of first electrode lines, the set of second electrode lines and spacers the first flat layer. The first planar layer can planarize the surfaces of the black matrix and the color photoresist, which is beneficial for the next patterning process on them.

优选的，彩膜基板还包括：位于所述一组第一电极线、一组第二电极线和隔垫物所组成的结构上方的覆盖基板的第二平坦层。第二平坦层可以使彩膜基板表面平坦化，并能够起到保护基板的作用。Preferably, the color filter substrate further includes: a second planar layer covering the substrate located above the structure composed of the set of first electrode lines, the set of second electrode lines and the spacers. The second flat layer can flatten the surface of the color filter substrate and can protect the substrate.

本实用新型实施例还提供了一种触控显示装置，包括前述任一技术方案所述的触摸屏的彩膜基板，具有较低的制作成本。The embodiment of the present invention also provides a touch display device, which includes the color filter substrate of the touch screen described in any one of the aforementioned technical solutions, and has a relatively low manufacturing cost.

附图说明Description of drawings

图1为现有触摸屏的彩膜基板截面结构示意图（电极线交叉区域）；FIG. 1 is a schematic cross-sectional structure diagram of a color filter substrate of an existing touch screen (electrode line intersection area);

图2为本实用新型触摸屏的彩膜基板一实施例的俯视结构示意图；Fig. 2 is a top view structural diagram of an embodiment of the color filter substrate of the touch screen of the present invention;

图3为图2在A-A处的截面结构示意图；Fig. 3 is the schematic cross-sectional structure diagram at A-A place of Fig. 2;

图4本实用新型触摸屏的彩膜基板另一实施例的截面结构示意图（电极线交叉区域）；Fig. 4 is a cross-sectional schematic diagram of another embodiment of the color filter substrate of the touch screen of the present invention (electrode line intersection area);

图5为制作图4所示实施例的彩膜基板的方法流程示意图；Fig. 5 is a schematic flow chart of a method for manufacturing the color filter substrate of the embodiment shown in Fig. 4;

图6a为形成黑矩阵之前的衬底基板截面结构示意图；FIG. 6a is a schematic diagram of a cross-sectional structure of a substrate substrate before forming a black matrix;

图6b为形成黑矩阵之后的基板截面结构示意图；6b is a schematic diagram of a cross-sectional structure of a substrate after forming a black matrix;

图6c为形成红色光阻后的基板截面结构示意图；FIG. 6c is a schematic diagram of a cross-sectional structure of a substrate after forming a red photoresist;

图6d为形成红绿蓝三色光阻后的基板截面结构示意图；Fig. 6d is a schematic diagram of the cross-sectional structure of the substrate after forming red, green and blue photoresists;

图6e为形成第一平坦层后的基板截面结构示意图；Fig. 6e is a schematic diagram of the cross-sectional structure of the substrate after forming the first flat layer;

图6f为形成桥接线后的基板截面结构示意图；Fig. 6f is a schematic diagram of the cross-sectional structure of the substrate after the bridging line is formed;

图6g为形成隔垫物后的基板截面结构示意图；6g is a schematic diagram of a cross-sectional structure of a substrate after forming a spacer;

图6h为形成第一电极、第二电极和连接线后的基板截面结构示意图。Fig. 6h is a schematic diagram of the cross-sectional structure of the substrate after forming the first electrode, the second electrode and the connecting wire.

附图标记：Reference signs:

10-透明基板    11-驱动电极  12-探测电极线10-Transparent substrate 11-Drive electrode 12-Detection electrode line

13-第一钝化层  14-金属桥    15-第二钝化层13-First passivation layer 14-Metal bridge 15-Second passivation layer

16-黑矩阵      17-彩色光阻  18-平坦层16-Black matrix 17-Color photoresist 18-Planning layer

19-隔垫物      20-衬底基板  21-第一电极线19-Spacer 20-Substrate substrate 21-First electrode wire

22-第二电极线  23-桥接线    24-第一电极22-Second electrode wire 23-Bridge wire 24-First electrode

25-连接线      26-第二电极  27-第一平坦层25-connecting wire 26-second electrode 27-first flat layer

28-第二平坦层28 - second flat layer

具体实施方式Detailed ways

为了简化触摸屏中彩膜基板的制作工艺，降低制作成本，本实用新型实施例提供了一种触摸屏的彩膜基板及触控显示装置。在本实用新型技术方案中，利用彩膜基板的隔垫物将第一电极线的桥接线和第二电极线的连接线绝缘隔离，相比于现有技术，桥接线和连接线之间无需另外通过构图工艺形成第一钝化层，这大大简化了触摸屏中彩膜基板的制作工艺，减少了掩模板的使用数量，降低了制作成本。为使本实用新型的目的、技术方案和优点更加清楚，以下举实施例对本实用新型作进一步详细说明。In order to simplify the manufacturing process of the color filter substrate in the touch screen and reduce the manufacturing cost, the embodiments of the present invention provide a color filter substrate of the touch screen and a touch display device. In the technical solution of the utility model, the spacer of the color filter substrate is used to insulate and isolate the bridge line of the first electrode line and the connection line of the second electrode line. Compared with the prior art, there is no need In addition, the first passivation layer is formed through a patterning process, which greatly simplifies the manufacturing process of the color filter substrate in the touch screen, reduces the number of masks used, and reduces the manufacturing cost. In order to make the purpose, technical solutions and advantages of the utility model clearer, the following examples are given to further describe the utility model in detail.

如图2和图3所示的一实施例，其中，图2为彩膜基板的俯视结构示意图；图3为图2在A-A处的截面结构示意图。本实用新型触摸屏的彩膜基板，包括：An embodiment is shown in FIG. 2 and FIG. 3 , wherein FIG. 2 is a schematic top view structure of the color filter substrate; FIG. 3 is a schematic cross-sectional structure schematic diagram at A-A in FIG. 2 . The color film substrate of the touch screen of the utility model includes:

衬底基板20；substrate substrate 20;

位于衬底基板20上方的黑矩阵16，黑矩阵16包括透光区域和遮光区域；Ablack matrix 16 located above thebase substrate 20, theblack matrix 16 includes a light-transmitting area and a light-shielding area;

位于黑矩阵16的透光区域内的彩色光阻17；Acolor photoresist 17 located in the light-transmitting region of theblack matrix 16;

位于黑矩阵16和彩色光阻17上方且交叉设置的一组第一电极线21和一组第二电极线22，第一电极线21包括通过桥接线23串接的多个第一电极24，第二电极线22包括通过连接线25串接的多个第二电极26，桥接线23和连接线25交叉设置且交叉区域与黑矩阵16的遮光区域位置相对；A set offirst electrode lines 21 and a set ofsecond electrode lines 22 located above theblack matrix 16 and thecolor photoresist 17 and intersecting. Thefirst electrode lines 21 include a plurality offirst electrodes 24 connected in series throughbridge lines 23, Thesecond electrode line 22 includes a plurality ofsecond electrodes 26 connected in series through theconnection line 25, thebridge line 23 and theconnection line 25 are intersected and the intersection area is opposite to the light-shielding area of theblack matrix 16;

位于桥接线23和连接线25之间将桥接线23和连接线25绝缘隔离的隔垫物19。Aspacer 19 located between the bridgingwire 23 and the connectingwire 25 to insulate and isolate thebridging wire 23 and the connectingwire 25 .

衬底基板20的材质不限，例如可以选用透明的玻璃、树脂等等。黑矩阵16的主要作用是利用遮光区域遮挡杂散光，防止透光区域所对应的像素之间产生漏光；彩色光阻17包括R（Red，红色）光阻、G（Green，绿色）光阻和B（Blue，蓝色）光阻，主要作用是利用滤光的方式产生红绿蓝三原色，再将红绿蓝三原色以不同的强弱比例混合，从而呈现出各种色彩，使薄膜晶体管液晶显示屏可以显示出全彩。这里需要说明的是，在液晶显示领域中，彩色光阻并不限于RGB（Red Green Blue，红绿蓝）三色，还可以为RGBW（Red Green BlueWhite，红绿蓝白）、RGBY（Red Green Blue Yellow，红绿蓝黄）和CMYK（CyanMagenta Yellow Black，青品红黄黑）等多种颜色组合。The material of thebase substrate 20 is not limited, for example, transparent glass, resin and the like can be selected. The main function of theblack matrix 16 is to use the light-shielding area to block stray light and prevent light leakage between pixels corresponding to the light-transmitting area; thecolor photoresist 17 includes R (Red, red) photoresist, G (Green, green) photoresist and B (Blue, blue) photoresist, the main function is to use the way of filtering to generate the three primary colors of red, green and blue, and then mix the three primary colors of red, green and blue in different strength ratios, so as to present various colors, so that the thin film transistor liquid crystal display The screen can display full color. What needs to be explained here is that in the field of liquid crystal display, the color photoresist is not limited to the three colors of RGB (Red Green Blue, red, green and blue), and can also be RGBW (Red Green Blue White, red, green, blue and white), RGBY (Red Green Blue Yellow, red green blue yellow) and CMYK (CyanMagenta Yellow Black, cyan magenta yellow black) and other color combinations.

内嵌式触摸屏是指用于实现触控功能的驱动电极线和探测电极线设置在显示屏的基板上。在本方案中，第一电极线21和第二电极线22均设置在彩膜基板上，第一电极线21可以为驱动电极线，则第二电极线22为探测电极线；或者，第一电极线21为探测电极线，则第二电极线22为驱动电极线，在此不作具体限定。桥接线23的具体材质不限，当第一电极线21为驱动电极线时，桥接线23优选采用铜等金属（也称为金属桥），这样有利于降低驱动电极线的电阻。而连接线25则可以采用与第一电极24、第二电极26相同的材质，例如氧化铟锡等透明导电材料。The in-cell touch screen means that the driving electrode lines and detection electrode lines for realizing the touch function are arranged on the substrate of the display screen. In this solution, thefirst electrode lines 21 and thesecond electrode lines 22 are both arranged on the color filter substrate, thefirst electrode lines 21 can be driving electrode lines, and thesecond electrode lines 22 are detection electrode lines; or, the first The electrode lines 21 are detecting electrode lines, and thesecond electrode lines 22 are driving electrode lines, which are not specifically limited here. The specific material of thebridge wire 23 is not limited. When thefirst electrode wire 21 is a driving electrode wire, thebridge wire 23 is preferably made of metal such as copper (also called a metal bridge), which is beneficial to reduce the resistance of the driving electrode wire. Theconnection wire 25 can be made of the same material as thefirst electrode 24 and thesecond electrode 26 , such as transparent conductive material such as indium tin oxide.

隔垫物是显示装置在装配过程中用到的辅助物，主要用于控制彩膜基板和阵列基板之间的间隙，如果想要获得大面积、均匀厚度的液晶层，需要在彩膜基板和阵列基板之间均匀的设置隔垫物。在本实用新型实施例的方案中，隔垫物19在彩膜基板的制作过程中形成，隔垫物19设置在第一电极线21和第二电极线22的交叉区域，位于桥接线23和连接线25之间并将桥接线23和连接线25绝缘隔离，从而使桥接线23和连接线25之间形成互感电容。The spacer is an auxiliary material used in the assembly process of the display device. It is mainly used to control the gap between the color filter substrate and the array substrate. Spacers are evenly arranged between the array substrates. In the scheme of the embodiment of the present utility model, thespacer 19 is formed during the manufacturing process of the color filter substrate, and thespacer 19 is arranged at the intersection area of thefirst electrode line 21 and thesecond electrode line 22, and is located between thebridge line 23 and the second electrode line. The connectingwires 25 are insulated and isolated from thebridging wire 23 and the connectingwire 25 , so that a mutual inductance capacitance is formed between the bridgingwire 23 and the connectingwire 25 .

在本实用新型实施例的技术方案中，利用彩膜基板的隔垫物19将第一电极线21的桥接线23和第二电极线22的连接线25绝缘隔离，相比于现有技术，桥接线23和连接线25之间无需另外通过构图工艺形成第一钝化层，这大大简化了触摸屏中彩膜基板的制作工艺，减少了掩模板的使用数量，降低了制作成本。In the technical solution of the embodiment of the utility model, thespacer 19 of the color filter substrate is used to insulate and isolate thebridge line 23 of thefirst electrode line 21 and the connectingline 25 of thesecond electrode line 22. Compared with the prior art, There is no need to form a first passivation layer through a patterning process between thebridge line 23 and the connectingline 25, which greatly simplifies the manufacturing process of the color filter substrate in the touch screen, reduces the number of masks used, and reduces the manufacturing cost.

第一电极24、第二电极26和连接线25可以位于同层；桥接线23可以位于连接线25的上方（如图3所示），或者，连接线25位于桥接线23的上方（如图4所示）。具有该结构的彩膜基板，第一电极24、第二电极26和连接线25可以在同一次构图工艺中形成。当桥接线23位于连接线25的上方时，桥接线23的层结构位于第一电极24、第二电极26和连接线25所在层结构的上方；当连接线25位于桥接线23的上方时，第一电极24、第二电极26和连接线25所在层结构位于桥接线23的层结构上方。作为可选方案，第一电极24、第二电极26和连接线25所在层结构与桥接线23所在层结构的位置可互换，无论采用哪一种结构形式，彩膜基板的制作工艺均较为简化，制作成本较低。Thefirst electrode 24, thesecond electrode 26 and theconnection line 25 can be located on the same layer; thebridge line 23 can be located above the connection line 25 (as shown in FIG. 3 ), or theconnection line 25 can be located above the bridge line 23 (as shown in FIG. 4). In the color filter substrate with this structure, thefirst electrode 24, thesecond electrode 26 and theconnection line 25 can be formed in the same patterning process. When thebridging line 23 is located above the connectingline 25, the layer structure of thebridging line 23 is located above the layer structure where thefirst electrode 24, thesecond electrode 26 and the connectingline 25 are located; when the connectingline 25 is located above the bridgingline 23, The layer structure where thefirst electrode 24 , thesecond electrode 26 and the connectingwire 25 are located is located above the layer structure of thebridge wire 23 . As an optional solution, the positions of the layer structure where thefirst electrode 24, thesecond electrode 26 and the connectingwire 25 are located and the layer structure where thebridging line 23 is located can be interchanged. Simplified, lower production cost.

如图3和图4所示，优选的，彩膜基板还包括：位于黑矩阵16和彩色光阻17上方且位于一组第一电极线21、一组第二电极线22和隔垫物19所组成的结构下方的覆盖基板的第一平坦层27。第一平坦层27可以将黑矩阵16和彩色光阻17的表面平坦化，有利于在其上进行下一步构图工艺。如图3所示实施例，当设置第一平坦层27后，第一电极24、第二电极和连接线25可以形成在同一平面，制作工艺的难度大大降低。As shown in FIGS. 3 and 4 , preferably, the color filter substrate further includes: a set offirst electrode lines 21 , a set ofsecond electrode lines 22 , andspacers 19 located above theblack matrix 16 and the color photoresist 17 A firstplanar layer 27 of the covering substrate is formed below the structure. The firstplanar layer 27 can planarize the surfaces of theblack matrix 16 and thecolor photoresist 17 , which is beneficial for the next patterning process on them. In the embodiment shown in FIG. 3 , after the firstflat layer 27 is provided, thefirst electrode 24 , the second electrode and theconnection line 25 can be formed on the same plane, and the difficulty of the manufacturing process is greatly reduced.

进一步，彩膜基板还包括：位于一组第一电极线21、一组第二电极线22和隔垫物19所组成的结构上方的覆盖基板的第二平坦层28。第二平坦层28可以使彩膜基板表面平坦化，并能够起到保护电极的作用。第一平坦层27和第二平坦层28的材质不限，例如可以为树脂、氮化硅等。Further, the color filter substrate further includes: a secondplanar layer 28 covering the substrate above the structure composed of a group offirst electrode lines 21 , a group ofsecond electrode lines 22 andspacers 19 . The secondflat layer 28 can flatten the surface of the color filter substrate, and can function as a protective electrode. The material of the firstplanar layer 27 and the secondplanar layer 28 is not limited, for example, it can be resin, silicon nitride and the like.

本实用新型实施例还提供了一种触控显示装置，包括前述任一实施例的触摸屏的彩膜基板，由于彩膜基板的制作工艺较现有技术简化，具有较低的制作成本，因此，包含该彩膜基板的触控显示装置也具有较低的制作成本。The embodiment of the present utility model also provides a touch display device, which includes the color filter substrate of the touch screen in any of the foregoing embodiments. Since the manufacturing process of the color filter substrate is simpler than the prior art, it has a lower manufacturing cost. Therefore, The touch display device including the color filter substrate also has lower manufacturing cost.

如图5所示，本实用新型实施例还提供了一种制作彩膜基板的方法，包括以下步骤：As shown in Figure 5, the embodiment of the present invention also provides a method for manufacturing a color filter substrate, including the following steps:

步骤101、通过构图工艺在衬底基板之上形成包括透光区域和遮光区域的黑矩阵的图案；Step 101, forming a pattern of a black matrix including a light-transmitting region and a light-shielding region on the base substrate through a patterning process;

步骤102、通过构图工艺形成至少覆盖黑矩阵的透光区域的彩色光阻的图案；Step 102, forming a color photoresist pattern covering at least the light-transmitting area of the black matrix through a patterning process;

步骤103、通过构图工艺在黑矩阵和彩色光阻的上方形成桥接线的图案；Step 103, forming a pattern of bridging lines above the black matrix and the color photoresist through a patterning process;

步骤104、通过构图工艺在桥接线的层结构上方形成隔垫物的图案；Step 104, forming a spacer pattern above the layer structure of the bridging line through a patterning process;

步骤105、通过构图工艺在隔垫物的层结构上方形成第一电极、第二电极和连接线的图案。Step 105 , forming patterns of the first electrode, the second electrode and the connecting wire above the layer structure of the spacer through a patterning process.

其中，在步骤102之后，步骤103之前，该方法还可进一步包括：形成覆盖基板的第一平坦层；在步骤105之后，该方法还可进一步包括：形成覆盖基板的第二平坦层。第一平坦层和第二平坦层能够起到平坦基板表面及保护基板的作用，有利于彩膜基板的构图制作。Wherein, afterstep 102 and beforestep 103, the method may further include: forming a first planar layer covering the substrate; afterstep 105, the method may further include: forming a second planar layer covering the substrate. The first flat layer and the second flat layer can function to flatten the surface of the substrate and protect the substrate, which is beneficial to the patterning of the color filter substrate.

为了进一步降低彩膜基板的制作成本，步骤102可具体包括：采用同一张掩模板依次制作各个颜色的彩色光阻图案，且每制作一种颜色的彩色光阻图案后，掩模板偏移设定距离。这样制作彩色光阻仅采用一张掩模板，具有较低的制作成本。In order to further reduce the production cost of the color filter substrate,step 102 may specifically include: using the same mask to sequentially produce color photoresist patterns of each color, and after each color photoresist pattern is produced, the mask offset setting distance. In this way, only one mask is used to manufacture the color photoresist, which has a lower manufacturing cost.

如图6a至图6h所示，制作图4所示实施例的彩膜基板可具体通过如下过程实现：As shown in Fig. 6a to Fig. 6h, the fabrication of the color filter substrate of the embodiment shown in Fig. 4 can be realized through the following process:

在玻璃基板（即图6a所示的衬底基板20）上沉积黑色光阻膜层，通过第一次构图工艺形成黑矩阵16的图案（这里需要使用第一张掩模板），如图6b所示。Deposit a black photoresist film layer on the glass substrate (that is, thebase substrate 20 shown in Figure 6a), and form the pattern of theblack matrix 16 through the first patterning process (the first mask board is required here), as shown in Figure 6b Show.

在完成上述步骤的基板上沉积红色光阻膜层，使用第二张掩模板对基板进行曝光，经显影后得到红色光阻的图案，如图6c所示。这里需要说明的是，彩色光阻可以为正性感光材质（曝光区域显影后去除，未曝光区域显影后保留），也可以为负性感光材质（未曝光区域显影后去除，曝光区域显影后保留），第二张掩模板的具体结构需要根据彩色光阻的材质进行具体设计，这些均为现有技术，这里不再详细赘述。Deposit a red photoresist film layer on the substrate after the above steps, use the second mask to expose the substrate, and obtain a red photoresist pattern after development, as shown in FIG. 6c. What needs to be explained here is that the color photoresist can be a positive photosensitive material (the exposed area is removed after development, and the unexposed area is retained after development), or it can be a negative photosensitive material (the unexposed area is removed after development, and the exposed area is retained after development. ), the specific structure of the second mask needs to be specifically designed according to the material of the color photoresist, these are all existing technologies, and will not be described in detail here.

在完成上述步骤的基板上沉积绿色光阻膜层，将第二张掩模板偏移设定距离，然后对基板进行曝光，经显影后得到绿色光阻的图案。该设定距离与黑矩阵透光区域的宽度相关，例如将第二张掩模板沿彩膜基板的长度方向偏移一个透光区域的宽度。Deposit a green photoresist film layer on the substrate after the above steps, shift the second mask by a set distance, then expose the substrate, and obtain a green photoresist pattern after development. The set distance is related to the width of the light-transmitting area of the black matrix, for example, the second mask is shifted along the length direction of the color filter substrate by the width of the light-transmitting area.

在完成上述步骤的基板上沉积蓝色光阻膜层，将第二张掩模板再次偏移设定距离，然后对基板进行曝光，经显影后得到蓝色光阻的图案，如图6d所示。以上形成彩色光阻17的过程只需使用一张掩模板，因此，该过程可称为第二次构图工艺。Deposit a blue photoresist film layer on the substrate after the above steps, shift the second mask by a set distance again, then expose the substrate, and obtain a blue photoresist pattern after development, as shown in Figure 6d. The above process of forming thecolor photoresist 17 only needs to use a mask, so this process can be called the second patterning process.

在完成上述步骤的基板上旋涂第一平坦层27，如图6e所示；Spin-coat the firstflat layer 27 on the substrate after the above steps, as shown in FIG. 6e;

在完成上述步骤的基板上，通过第三次构图工艺（这里需要使用第三张掩模板）形成桥接线23的图案，如图6f所示；On the substrate that has completed the above steps, a pattern ofbridge lines 23 is formed through a third patterning process (a third mask is required here), as shown in FIG. 6f;

在完成上述步骤的基板上，通过第四次构图工艺（这里需要使用第四张掩模板）形成隔垫物19的图案，如图6g所示；On the substrate that has completed the above steps, a pattern ofspacers 19 is formed through the fourth patterning process (a fourth mask is required here), as shown in FIG. 6g;

在完成上述步骤的基板上，通过第五次构图工艺（这里需要使用第五张掩模板）形成第一电极24、第二电极和连接线25的图案，此时，桥接线23将两侧的第一电极24搭接，如图6h所示。On the substrate that has completed the above steps, the pattern of thefirst electrode 24, the second electrode and theconnection line 25 is formed through the fifth patterning process (a fifth mask is required here). At this time, the bridgingline 23 connects the Thefirst electrodes 24 overlap, as shown in Figure 6h.

在完成上述步骤的基板上涂覆第二平坦层28，至此完成彩膜基板的制作，如图4所示。The secondflat layer 28 is coated on the substrate after the above steps, so far the production of the color filter substrate is completed, as shown in FIG. 4 .

可见，该过程仅采用五次构图工艺形成触摸屏的彩膜基板，相比于现有技术，简化了制作工艺，减少了掩模板的使用数量，降低了制作成本。It can be seen that this process only uses five patterning processes to form the color filter substrate of the touch screen. Compared with the prior art, the manufacturing process is simplified, the number of masks used is reduced, and the manufacturing cost is reduced.

本实用新型实施例还提供了一种制作图3所示彩膜基板的方法，包括以下步骤：The embodiment of the utility model also provides a method for manufacturing the color filter substrate shown in Fig. 3, including the following steps:

通过构图工艺在衬底基板之上形成包括透光区域和遮光区域的黑矩阵的图案；Forming a pattern of a black matrix including a light-transmitting region and a light-shielding region on the base substrate through a patterning process;

通过构图工艺形成至少覆盖黑矩阵的透光区域的彩色光阻的图案；forming a color photoresist pattern covering at least the light-transmitting area of the black matrix through a patterning process;

通过构图工艺在黑矩阵和彩色光阻的上方形成第一电极、第二电极和连接线的图案；Forming the pattern of the first electrode, the second electrode and the connection line above the black matrix and the color photoresist through a patterning process;

通过构图工艺在第一电极、第二电极和连接线的层结构上方形成隔垫物的图案；forming a pattern of spacers above the layer structure of the first electrode, the second electrode and the connecting wire by a patterning process;

通过构图工艺在隔垫物的层结构上方形成桥接线的图案。A pattern of bridging lines is formed over the layer structure of the spacer by a patterning process.

与图5所示的方法实施例同理，该技术方案最少可采用五次构图工艺形成触摸屏的彩膜基板，相比于现有技术，简化了制作工艺，减少了掩模板的使用数量，降低了制作成本。Similar to the method embodiment shown in Figure 5, this technical solution can use at least five patterning processes to form the color filter substrate of the touch screen. Compared with the prior art, it simplifies the manufacturing process, reduces the number of masks used, and reduces production cost.

优选的，在形成彩色光阻的图案之后，形成第一电极、第二电极和连接线的图案之前，该方法还进一步包括：形成覆盖基板的第一平坦层；在形成桥接线的图案之后，该方法还进一步包括：形成覆盖基板的第二平坦层。第一平坦层和第二平坦层可以起到基板平坦化和保护电极的作用。Preferably, after forming the pattern of the color photoresist and before forming the pattern of the first electrode, the second electrode and the connection line, the method further includes: forming a first planar layer covering the substrate; after forming the pattern of the bridging line, The method still further includes: forming a second planar layer covering the substrate. The first planar layer and the second planar layer can function to planarize the substrate and protect electrodes.

优选的，通过构图工艺形成彩色光阻的图案，具体包括：采用同一张掩模板依次制作各个颜色的彩色光阻图案，且每制作一种颜色的彩色光阻图案后，掩模板偏移设定距离。制作彩色光阻仅采用一张掩模板，具有较低的制作成本。Preferably, the pattern of the color photoresist is formed through a patterning process, which specifically includes: using the same mask to sequentially fabricate color photoresist patterns of each color, and after each color photoresist pattern of a color is produced, the mask offset is set distance. Only one mask is used to make color photoresist, which has low production cost.

显然，本领域的技术人员可以对本实用新型进行各种改动和变型而不脱离本实用新型的精神和范围。这样，倘若本实用新型的这些修改和变型属于本实用新型权利要求及其等同技术的范围之内，则本实用新型也意图包含这些改动和变型在内。Obviously, those skilled in the art can make various changes and modifications to the utility model without departing from the spirit and scope of the utility model. In this way, if these modifications and variations of the utility model fall within the scope of the claims of the utility model and equivalent technologies thereof, the utility model is also intended to include these modifications and variations.

Claims (5)

Translated fromChinese

1.一种触摸屏的彩膜基板，其特征在于，包括：1. A color filter substrate of a touch screen, characterized in that, comprising:衬底基板；Substrate substrate;位于所述衬底基板上方的黑矩阵，所述黑矩阵包括透光区域和遮光区域；a black matrix located above the base substrate, the black matrix including a light-transmitting area and a light-shielding area;位于所述黑矩阵的透光区域内的彩色光阻；a color photoresist located in the light-transmitting region of the black matrix;位于所述黑矩阵和所述彩色光阻上方且交叉设置的一组第一电极线和一组第二电极线，所述第一电极线包括通过桥接线串接的多个第一电极，所述第二电极线包括通过连接线串接的多个第二电极，所述桥接线和所述连接线交叉设置且交叉区域与黑矩阵的遮光区域位置相对；A set of first electrode lines and a set of second electrode lines located above the black matrix and the color photoresist and intersecting, the first electrode lines include a plurality of first electrodes connected in series through bridge lines, so The second electrode line includes a plurality of second electrodes connected in series through connecting lines, the bridging line and the connecting line are intersected, and the crossing area is opposite to the light-shielding area of the black matrix;位于所述桥接线和所述连接线之间将所述桥接线和所述连接线绝缘隔离的隔垫物。A spacer located between the bridging wire and the connecting wire to insulate and isolate the bridging wire and the connecting wire.2.如权利要求1所述的彩膜基板，其特征在于，所述第一电极、第二电极和所述连接线位于同层；2. The color filter substrate according to claim 1, wherein the first electrode, the second electrode and the connecting wire are located on the same layer;所述桥接线位于所述连接线的上方，或者，所述连接线位于所述桥接线的上方。The bridging line is located above the connecting line, or the connecting line is located above the bridging line.3.如权利要求1或2所述的彩膜基板，其特征在于，还包括：位于所述黑矩阵和所述彩色光阻上方，且位于所述一组第一电极线、一组第二电极线和隔垫物所组成的结构下方的覆盖基板的第一平坦层。3. The color filter substrate according to claim 1 or 2, further comprising: above the black matrix and the color photoresist, and on the set of first electrode lines, a set of second The first flat layer covering the substrate under the structure composed of electrode lines and spacers.4.如权利要求3所述的彩膜基板，其特征在于，还包括：位于所述一组第一电极线、一组第二电极线和隔垫物所组成的结构上方的覆盖基板的第二平坦层。4. The color filter substrate according to claim 3, further comprising: a first covering substrate located above the structure composed of the group of first electrode lines, the group of second electrode lines and spacers. Two flat layers.5.一种触控显示装置，其特征在于，包括如权利要求1～4任一项所述的触摸屏的彩膜基板。5 . A touch display device, characterized by comprising the color filter substrate of the touch screen according to any one of claims 1 to 4 .

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