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CN203415580U - Electrode structure of power semiconductor chip - Google Patents

Electrode structure of power semiconductor chip
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Publication number
CN203415580U
CN203415580UCN201320478215.5UCN201320478215UCN203415580UCN 203415580 UCN203415580 UCN 203415580UCN 201320478215 UCN201320478215 UCN 201320478215UCN 203415580 UCN203415580 UCN 203415580U
Authority
CN
China
Prior art keywords
electrode slice
power semiconductor
semiconductor chip
destressing
electrode structure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
CN201320478215.5U
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Chinese (zh)
Inventor
王民安
黄富强
王日新
汪杏娟
叶民强
项建辉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Huangshan Core Microelectronics Co ltd
Original Assignee
HUANGSHAN ELECTRIC APPLIANCE CO Ltd QIMEN COUNTY ANHUI PROV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by HUANGSHAN ELECTRIC APPLIANCE CO Ltd QIMEN COUNTY ANHUI PROVfiledCriticalHUANGSHAN ELECTRIC APPLIANCE CO Ltd QIMEN COUNTY ANHUI PROV
Priority to CN201320478215.5UpriorityCriticalpatent/CN203415580U/en
Application grantedgrantedCritical
Publication of CN203415580UpublicationCriticalpatent/CN203415580U/en
Anticipated expirationlegal-statusCritical
Expired - Lifetimelegal-statusCriticalCurrent

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Abstract

The utility model discloses an electrode structure of a power semiconductor chip. The electrode structure comprises an electrode slice, the electrode slice comprises an electrode slice body and a current output end, and a group of destressing grooves is formed in the electrode slice body, wherein the destressing grooves are arranged at two opposite sides of the electrode slice body in a staggered manner. The electrode structure of the power semiconductor chip solves the problem that crack of a silicon chip due to thermal expansion is likely to happen in the electrode slice made of common metal and the silicon chip because difference between the expansion coefficients of the metal and the silicon chip is great, the structure is simple, processing is convenient, the structure of the electrode slice can be adjusted according the output current, and the electrode structure can be widely applied to the field of power semiconductor chips.

Description

A kind of power semiconductor chip electrode structure
Technical field
The utility model relates to a kind of power semiconductor chip, relates in particular to a kind of power semiconductor chip electrode structure.
Background technology
High power semi-conductor chip is provided with upper/lower electrode, and the selected material of electrode approaches with silicon chip coefficient of linear expansion as far as possible, pyroconductivity material higher, that resistivity is low, as molybdenum sheet, tungsten.But molybdenum, tungsten material price are high, belong to rare metal.For reducing costs, can select common metal, such as copper, iron etc.Copper has advantages of than the better pyroconductivity of molybdenum, low resistivity.But it is large that shortcoming is coefficient of linear expansion, only adapt to the upper/lower electrode of making small-power chip, copper price is approximately 20 percent of molybdenum.
Therefore, need to consider how common metal is carried out to structural improvement, solve because coefficient of linear expansion is large and silicon chip mismatch problem.
Utility model content
The purpose of this utility model is to provide a kind of power semiconductor chip electrode structure, solves common metal and silicon chip coefficient of expansion difference large, the problem of silicon chip thermal expansion drawing crack.
The utility model solves the technical scheme that its technical problem adopts: a kind of power semiconductor chip electrode structure, comprise electrode slice, and described electrode slice comprises electrode slice body and current output terminal; On described electrode slice body, be provided with one group of destressing groove.
Preferably, described destressing groove is arranged on electrode slice body two opposite side, and the destressing groove Heterogeneous Permutation on two opposite side.
Further, described electrode slice is copper sheet, and the hem width of described electrode slice body is 2~8mm, and described is 2~6mm with the distance between the upper adjacent two destressing grooves in one side.The width of described destressing groove is 0.1~3mm, destressinggroove depth 2~8mm.
Preferably, the hem width of described electrode slice body is 5mm, and described is 4mm with the distance between the upper adjacent two destressing grooves in one side.The width of described destressing groove is 0.7mm, destressing groove depth 3mm.
For meeting the requirement of different electric current output to electrode slice, described electrode slice at least arranges one group of electrode slice body, and the output size of the number of described electrode slice body and power semiconductor chip electric current is suitable.
The beneficial effects of the utility model: by destressing groove is set on electrode slice body, the telescopic variation of destressing groove after being heated by electrode slice, makes the thermal coefficient of expansion of electrode slice and silicon chip more approaching, avoid the be heated problem of easy drawing crack of silicon chip.Described destressing groove Heterogeneous Permutation, destressing better effects if.Described electrode slice is copper sheet, and cost is low, and thermal conductivity is good, and resistivity is low, chip operation can be produced to heat and conduct in time, reduces the loss causing because of the pressure drop producing on electrode.
Below in conjunction with drawings and Examples, the utility model is described in further detail.
Accompanying drawing explanation
Fig. 1 is front view of the present utility model.
Fig. 2 is the front view that a plurality of electrode slice bodies are arranged in juxtaposition.
Embodiment
Embodiment 1: as shown in Figure 1, a kind of power semiconductor chip electrode structure, comprises electrode slice, and described electrode slice compriseselectrode slice body 1 andcurrent output terminal 2; On describedelectrode slice body 1, be provided with one group of destressing groove 3.Described electrode slice is copper sheet, and destressinggroove 3 is arranged ondestressing groove 3 Heterogeneous Permutations on 1 liang of opposite side of electrode slice body and on two opposite side.
The hem width of describedelectrode slice body 1 is 2~8mm, and the described distance with 3 of the upper adjacent two destressing grooves in one side is 2~6mm.The width of describeddestressing groove 3 is 0.1~3mm, the dark 2~8mm ofdestressing groove 3.
Preferably, the hem width of describedelectrode slice body 1 is 5mm, and the described distance with 3 of the upper adjacent two destressing grooves in one side is 4mm.The width of describeddestressing groove 3 is 0.7mm, the dark 3mm ofdestressing groove 3.
As shown in Figure 2, described electrode slice at least arranges one group ofelectrode slice body 1, and the output size of the number of describedelectrode slice body 1 and power semiconductor chip electric current is suitable.According to electric current output size, a plurality ofelectrode slice bodies 1 arranged side by side can be set.

Claims (8)

CN201320478215.5U2013-08-062013-08-06Electrode structure of power semiconductor chipExpired - LifetimeCN203415580U (en)

Priority Applications (1)

Application NumberPriority DateFiling DateTitle
CN201320478215.5UCN203415580U (en)2013-08-062013-08-06Electrode structure of power semiconductor chip

Applications Claiming Priority (1)

Application NumberPriority DateFiling DateTitle
CN201320478215.5UCN203415580U (en)2013-08-062013-08-06Electrode structure of power semiconductor chip

Publications (1)

Publication NumberPublication Date
CN203415580Utrue CN203415580U (en)2014-01-29

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ID=49978448

Family Applications (1)

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CN201320478215.5UExpired - LifetimeCN203415580U (en)2013-08-062013-08-06Electrode structure of power semiconductor chip

Country Status (1)

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CN (1)CN203415580U (en)

Cited By (14)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
CN105940774A (en)*2014-01-312016-09-14巨石材料公司 Plasma torch design
US11149148B2 (en)2016-04-292021-10-19Monolith Materials, Inc.Secondary heat addition to particle production process and apparatus
US11203692B2 (en)2014-01-302021-12-21Monolith Materials, Inc.Plasma gas throat assembly and method
US11492496B2 (en)2016-04-292022-11-08Monolith Materials, Inc.Torch stinger method and apparatus
US11591477B2 (en)2014-01-302023-02-28Monolith Materials, Inc.System for high temperature chemical processing
US11665808B2 (en)2015-07-292023-05-30Monolith Materials, Inc.DC plasma torch electrical power design method and apparatus
US11760884B2 (en)2017-04-202023-09-19Monolith Materials, Inc.Carbon particles having high purities and methods for making same
US11926743B2 (en)2017-03-082024-03-12Monolith Materials, Inc.Systems and methods of making carbon particles with thermal transfer gas
US11939477B2 (en)2014-01-302024-03-26Monolith Materials, Inc.High temperature heat integration method of making carbon black
US11987712B2 (en)2015-02-032024-05-21Monolith Materials, Inc.Carbon black generating system
US11998886B2 (en)2015-02-032024-06-04Monolith Materials, Inc.Regenerative cooling method and apparatus
US12030776B2 (en)2017-08-282024-07-09Monolith Materials, Inc.Systems and methods for particle generation
US12119133B2 (en)2015-09-092024-10-15Monolith Materials, Inc.Circular few layer graphene
US12378124B2 (en)2017-08-282025-08-05Monolith Materials, Inc.Particle systems and methods

Cited By (21)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US11939477B2 (en)2014-01-302024-03-26Monolith Materials, Inc.High temperature heat integration method of making carbon black
US11203692B2 (en)2014-01-302021-12-21Monolith Materials, Inc.Plasma gas throat assembly and method
US11591477B2 (en)2014-01-302023-02-28Monolith Materials, Inc.System for high temperature chemical processing
US11866589B2 (en)2014-01-302024-01-09Monolith Materials, Inc.System for high temperature chemical processing
US12144099B2 (en)2014-01-312024-11-12Monolith Materials, Inc.Plasma torch design
CN110505745A (en)*2014-01-312019-11-26巨石材料公司The design of plasma torch
US11304288B2 (en)2014-01-312022-04-12Monolith Materials, Inc.Plasma torch design
CN105940774A (en)*2014-01-312016-09-14巨石材料公司 Plasma torch design
US12286540B2 (en)2015-02-032025-04-29Monolith Materials, Inc.Carbon black generating system
US11987712B2 (en)2015-02-032024-05-21Monolith Materials, Inc.Carbon black generating system
US11998886B2 (en)2015-02-032024-06-04Monolith Materials, Inc.Regenerative cooling method and apparatus
US11665808B2 (en)2015-07-292023-05-30Monolith Materials, Inc.DC plasma torch electrical power design method and apparatus
US12250764B2 (en)2015-07-292025-03-11Monolith Materials, Inc.DC plasma torch electrical power design method and apparatus
US12119133B2 (en)2015-09-092024-10-15Monolith Materials, Inc.Circular few layer graphene
US11492496B2 (en)2016-04-292022-11-08Monolith Materials, Inc.Torch stinger method and apparatus
US11149148B2 (en)2016-04-292021-10-19Monolith Materials, Inc.Secondary heat addition to particle production process and apparatus
US12012515B2 (en)2016-04-292024-06-18Monolith Materials, Inc.Torch stinger method and apparatus
US11926743B2 (en)2017-03-082024-03-12Monolith Materials, Inc.Systems and methods of making carbon particles with thermal transfer gas
US11760884B2 (en)2017-04-202023-09-19Monolith Materials, Inc.Carbon particles having high purities and methods for making same
US12030776B2 (en)2017-08-282024-07-09Monolith Materials, Inc.Systems and methods for particle generation
US12378124B2 (en)2017-08-282025-08-05Monolith Materials, Inc.Particle systems and methods

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Legal Events

DateCodeTitleDescription
C14Grant of patent or utility model
GR01Patent grant
CP03Change of name, title or address

Address after:245000 No. 449 Xinxing Road, Qimen County, Anhui, Huangshan City

Patentee after:Huangshan core Microelectronics Co.,Ltd.

Address before:245600 No. 449 Xinxing Road, Qimen County, Anhui, Huangshan City

Patentee before:HUANGSHAN ELECTRIC APPLIANCE Co.,Ltd.

CP03Change of name, title or address
CX01Expiry of patent term

Granted publication date:20140129

CX01Expiry of patent term

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