CN202563241U - Mask plate - Google Patents

Abstract

Translated fromChinese

本实用新型提供一种掩模板，为解决现有技术中光刻工艺中玻璃基台和挡板的移动次数比较多的技术问题而设计。所述掩模板包括：掩模板曝光区域和与所述掩模板曝光区域相邻设置的掩模板非曝光区域；还包括：与所述掩模板曝光区域对应设置的使照射到所述掩模板曝光区域的光发散的光路补偿结构。本实用新型能够增加曝光后形成的图案的面积，从而减少在光刻工艺中玻璃基台和挡板的移动次数。

The utility model provides a mask plate, which is designed to solve the technical problem that the number of times of movement of the glass base platform and the baffle plate is relatively large in the photolithography process in the prior art. The mask plate includes: an exposure area of the mask plate and a non-exposed area of the mask plate adjacent to the exposure area of the mask plate; Optical path compensation structure for light divergence. The utility model can increase the area of the pattern formed after exposure, thereby reducing the moving times of the glass base platform and the baffle plate in the photolithography process.

Description

Mask plate

Technical field

The utility model relates to technical field of lithography, is meant a kind of mask plate especially.

Background technology

Photoetching process is to be material with the photoresist, forms the figure with TFT (Thin Film Transistor, TFT) structure at glass baseplate surface.The effect of this figure is the film of protection below it, and it is not etched away in following one etching procedure, thus the final figure that formation needs on film.

In present TFT photoetching process, same size of producing the mask plate of line fixed, and in order to make larger sized display panel through existing mask plate, adopts the mode of mask plate splicing to make public usually.Tradition Exposure mode flow process is following:

At first, as shown in Figure 1, when mask plate 1 exposure area I,baffle plate 2 blocks area I I and area I II, on PR glue, forms figure 4;

Then, as shown in Figure 2, when mask plate 1 exposure area II,baffle plate 2 blocks area I and area I II, and simultaneouslyglass base station 3 apart from d, forms figure 5 to a side shifting;

Like this, figure 4 is spliced into the large scale figure with figure 5.

Can find out, in the process of splicing, need repeatedly to move glass base station (STAGE) and baffle plate (BLADE), cooperate mask plate splicing figure, cause the production technology more complicated.

The utility model content

The technical matters that the utility model will solve provides a kind of mask plate, can increase the area of the pattern that exposure back forms, thereby reduces the mobile number of times of glass base station and baffle plate in photoetching process.

For solving the problems of the technologies described above, the embodiment of the utility model provides technical scheme following:

A kind of mask plate comprises: the mask plate exposure area and with the territory, mask plate non-exposed area of the adjacent setting in said mask plate exposure area;

Also comprise: the corresponding optical path compensation structure that the light that shines said mask plate exposure area is dispersed that is provided with said mask plate exposure area.

Said optical path compensation structure is the exiting surface of the concavity of said mask plate exposure area.

Said optical path compensation structure is the concavees lens that are arranged on the said mask plate exposure area.

The embodiment of the utility model has following beneficial effect:

In the such scheme, mask plate comprises: the mask plate exposure area and with the territory, mask plate non-exposed area of the adjacent setting in said mask plate exposure area; Also comprise: the corresponding optical path compensation structure that the light that shines said mask plate exposure area is dispersed that is provided with said mask plate exposure area.Through correspondence is provided with the optical path compensation structure in the mask plate exposure area, increased the area of dispersing of the light that shines the mask plate exposure area, make the pattern that in exposure technology, forms become big, thereby reduced the mobile number of times of glass base station and baffle plate.

Description of drawings

Fig. 1 carries out the synoptic diagram of first step when making public for the mode of available technology adopting mask plate splicing;

When making public for the mode of available technology adopting mask plate splicing, carries out by Fig. 2 table the synoptic diagram of second step;

Fig. 3 is the structural representation of first embodiment of the mask plate of the utility model;

Fig. 4 carries out the synoptic diagram of first step for adopting mask board to explosure shown in Figure 3;

Fig. 5 carries out the synoptic diagram of second step for adopting mask board to explosure shown in Figure 3;

Fig. 6 is the structural representation of second embodiment of the mask plate of the utility model;

Fig. 7 carries out the synoptic diagram of first step for adopting mask board to explosure shown in Figure 6;

Fig. 8 carries out the synoptic diagram of second step for adopting mask board to explosure shown in Figure 6.

Embodiment

Technical matters, technical scheme and the advantage that will solve for the embodiment that makes the utility model are clearer, will combine accompanying drawing and specific embodiment to be described in detail below.

The utility model provides a kind of mask plate, comprising: the mask plate exposure area, with the territory, mask plate non-exposed area of the adjacent setting in said mask plate exposure area and with the corresponding optical path compensation structure that the light that shines said mask plate exposure area is dispersed that is provided with in said mask plate exposure area.

Fig. 3 is first embodiment of themask plate 30 of the utility model, comprising: maskplate exposure area 21 and adjacent territory, mask plate non-exposed area 22.Wherein, the exiting surface of part mask plate exposure area 21 (like area I among Fig. 3 and area I II) can be set to concavity, the exiting surface of part mask plate exposure area 21 (like the area I I among Fig. 3) can be set to prior art in identical plane.Certainly, it will be understood by those skilled in the art that the exiting surface of maskplate exposure area 21 can be a concavity all also, look the pattern decision that needs exposure-processed to form in the subsequent process.Exiting surface among the utility model embodiment is set to concavity, is meant at exiting surface originally to make the structure that forms concavity on one's body, and promptly the structure of this concavity and exiting surface are structure as a whole.

In the foregoing description, can confirm the focal length of the exiting surface of concavity according to the imaging formula 1/f=1/u+1/v of concavees lens; Wherein, f is the focal length of concavees lens (exiting surface of concavity); U is an object distance, that is: the distance between mask plate exposure area and the concavees lens (exiting surface of concavity); V is an image distance, that is: the distance between concavees lens (exiting surface of concavity) and the glass base station.When u, v can confirm focal distance f after confirming.And enlargement factor K=f/ (f-u) that is to say, the size of the pattern that exposure back forms be the mask plate exposure area size K doubly.

Describe the flow process of the exposure-processed that adopts mask plate shown in Figure 3 below in conjunction with Fig. 4 and Fig. 5, comprising:

At first, as shown in Figure 4, to the area I exposure ofmask plate 30,baffle plate 24 blocks area I I and area I II, on PR glue, forms first figure 25; Because the exiting surface of maskplate exposure area 21 is a concavity, can be with the divergence of beam that shines area I, thus increase the area of first figure 25.

Then, as shown in Figure 5, to the area I I exposure ofmask plate 30,baffle plate 24 blocks area I and area I II, andglass base station 40 need not to move, and formssecond graph 26;

Like this, first figure 25 is spliced into the large scale figure withsecond graph 26.

As shown in Figure 6, second embodiment for a kind ofmask plate 30 of the utility model comprises:exposure area 21, adjacent territory, mask plate non-exposedarea 22 and be arranged on theconcavees lens 50 on the exposure area 21.It will be understood by those skilled in the art thatconcavees lens 50 can be arranged on eachexposure area 21, also can be arranged on the partial exposure area 21 (like area I among Fig. 3 and area I II).Be arranged on theconcavees lens 50 on theexposure area 21 among the utility model embodiment, be meant thatconvex lens 50 are arranged on theexposure area 21, promptlyconcavees lens 50 are not to be structure as a whole with mask plate.In such cases,concavees lens 50 can as shown in Figure 6ly be set directly at the surface of normal mask plate, also can concaveeslens 50 be arranged in the groove in the corresponding zone of mask plate groove being set.

In the foregoing description, can confirm the focal length of concavees lens according to the imaging formula 1/f=1/u+1/v of concavees lens; Wherein, f is the focal length of concavees lens; U is an object distance, that is: the distance between mask plate exposure area and the concavees lens; V is an image distance, that is: the distance between concavees lens and the glass base station.When u, v can confirm focal distance f after confirming.And enlargement factor K=f/ (f-u) that is to say, the size of the pattern that exposure back forms be the mask plate exposure area size K doubly.

Describe the flow process of the exposure-processed that adopts mask plate shown in Figure 6 below in conjunction with Fig. 7 and Fig. 8, comprising:

At first, as shown in Figure 7, to the area I exposure ofmask plate 30,baffle plate 24 blocks area I I and area I II, on PR glue, forms first figure 25; Owing to be provided withconcavees lens 50 between said mask plate exposure area and the baffle plate, can be with the divergence of beam that shines area I, thus increase the area of first figure 25.

Then, as shown in Figure 8, to the area I I exposure ofmask plate 30,baffle plate 24 blocks area I and area I II, andglass base station 40 need not to move, and formssecond graph 26;

Like this, first figure 25 is spliced into the large scale figure withsecond graph 26.

Existing splicing process is in order to make larger sized display panel through existing mask plate; Usually adopt the mode of mask plate splicing to make public, in the process of splicing, need repeatedly to move glass base station (STAGE) and baffle plate (BLADE) and cooperate mask plate splicing figure.In the process that repeatedly moves, glass can produce micro-displacement, usually for the revisal displacement, adopts the mode of contraposition again to compensate, and this mode not only reduces production capacity, and can not guarantee the precision of making public well.So present mask plate splicing process is difficult to satisfy the volume production demand of large size panel.

The utility model provides a kind of mask plate; The light that said mask plate utilizes the optical path compensation structure to increase to shine the mask plate exposure area disperse area; Make the pattern that in exposure technology, forms become big; Reduce the mobile number of times of glass base station (STAGE) and baffle plate (BLADE), thereby improve the splicing precision and the exposure accuracy of exposure machine, when improving yields, enhance productivity.

The above is the preferred implementation of the utility model; Should be understood that; For those skilled in the art; Under the prerequisite that does not break away from the said principle of the utility model, can also make some improvement and retouching, these improvement and retouching also should be regarded as the protection domain of the utility model.

Claims (3)

Translated fromChinese

1.一种掩模板，包括：掩模板曝光区域和与所述掩模板曝光区域相邻设置的掩模板非曝光区域；其特征在于，还包括：与所述掩模板曝光区域对应设置的使照射到所述掩模板曝光区域的光发散的光路补偿结构。1. A mask, comprising: a mask exposure area and a mask non-exposure area adjacent to the mask exposure area; An optical path compensation structure for light divergence to the exposure area of the mask.2.根据权利要求1所述的掩模板，其特征在于，所述光路补偿结构为所述掩模板曝光区域的凹状的出光面。2 . The reticle according to claim 1 , wherein the optical path compensation structure is a concave light-emitting surface of the exposure area of the reticle. 3 .3.根据权利要求1所述的掩模板，其特征在于，所述光路补偿结构为设置在所述掩模板曝光区域上的凹透镜。3 . The reticle according to claim 1 , wherein the optical path compensation structure is a concave lens disposed on the exposure area of the reticle. 4 .

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