Carbon nitride ultrahard film plated target material and preparation method thereofTechnical field
The present invention relates to a kind of plated target material and preparation method thereof, relate to a kind of carbon nitride ultrahard film plated target material and preparation method thereof particularly.
Background technology
Carbonitride is the novel superhard material of the nineties exploitation, and its hardness is approaching or surpass diamond, and chemical stability and thermostability are excellent more.When carbonitride is sandwiched between two-layer titanium nitride (chromium) lattice, will be forced to crystalization, need plate one deck titanium nitride (TiN) earlier at workpiece surface when carbon nitride ultrahard film plated (multiple arc plasma body plating), plate carbonitride (C again3N4), titanium-nitride (TiN) again is clipped in the middle carbonitride at last, forces it to form the carbonitride (C of superhard perfect crystal3N4).Carbon nitride ultrahard film plated employing titanium alloy target or Chrome metal powder target (optional one), graphite target, two kinds of targets are placed on simultaneously in the multiple arc plasma body plating equipment workpiece are carried out plating, make workpiece surface plating superhard material carbon nitride films.The key problem in technology problem that exists is at present: the carbonitride rete effect less stable that forms in the plating process, particularly obtaining aspect the crystalline membrane, aspect raising nitrogen content and microhardness stability, and at the graphite, class graphite structure such as the rhombohedral carbonitride (C that eliminate coatings3N4) aspect all needs bigger improvement, the repeatability of plating technic and reliability await further raising, so just might realize real industrialization.
Summary of the invention
The object of the present invention is to provide that a kind of plating carbon nitride films crystal property is good, good stability, repeatable strong carbon nitride ultrahard film plated target material and preparation method thereof.
To achieve these goals, technical scheme of the present invention is: carbon nitride ultrahard film plated target material by two kinds of target combinations, is respectively titanium alloy target or Chrome metal powder target and graphite target, it is characterized in that respectively adding rare earth, it is 0.01-5 that content of rare earth accounts for total weight percent.
Aforesaid rare earth is that lanthanum (La) is or yttrium (Y).
Add rare earth in the aforesaid titanium alloy target and be called the rare earth titanium alloy target, the rare earth titanium alloy target comprises titanium, manganese or chromium, rare earth, and the each component weight percent is:
Titanium 85-95
Manganese or chromium 4-10
Rare earth 0.01-5.
Add rare earth in the aforesaid Chrome metal powder target and be called rare earth Chrome metal powder target, rare earth Chrome metal powder target comprises chromium, copper or titanium, rare earth, and the each component weight percent is:
Chromium 85-95
Copper or titanium 4-10
Rare earth 0.01-5.
Add rare earth in the aforesaid graphite target and be called the rare earth graphite target, the rare earth graphite target comprises graphite, rare earth, and the each component weight percent is:
Graphite 95-99.09
Rare earth 0.01-5.
The preparation method of carbon nitride ultrahard film plated target material: 1, addition manner: with direct doping and physical chemistry coprecipitation mode interpolation indirectly; 2, add form: add with rare earth compound and rare earth intermediate alloy powder mode; 3, addition: it is 0.01-5 that rare earth accounts for total weight percent.
The present invention utilizes the special physicochemical performances such as sex change, microalloying, purifying, absorption and catalytic activation of rare earth element, has improved the stable and repeatable of carbonitride plating technic performance greatly, and plating carbon nitride films crystal property is good.Sex change, microalloying, purifying, absorption and catalytic activation make at the bottom of titanium nitride (TiN) and the workpiece and carbonitride (C3N4) between in conjunction with more firm, the coating difficult drop-off; Sex change, microalloying, purifying, absorption and catalytic activation make carbonitride crystalline form and coating more complete, purer, have eliminated impurity, and stability is better.Add the carbonitride (C that has eliminated imperfect crystal behind the rare earth effectively3N4) and rhombohedral carbonitride (C3N4) class graphite and soft graphite structure, superhard property and stability rise significantly.After adopting the present invention, nitrogen content average statistical in the carbonitride plating rete improves 10-20% than the analog value after handling without rare earth, corresponding film microhardness HV primary system meter average improves 5 units, reach 64-70Gpa, be up to 76Gpa, the correlation intensity value of workpiece improves 10%, and improve 20% the work-ing life of workpiece, and the plating reliability reaches more than 95%.
Embodiment
Carbon nitride ultrahard film plated target material by two kinds of target combinations, is respectively titanium alloy target or Chrome metal powder target and graphite target, and each adds rare earth, and it is 0.01-5 that content of rare earth accounts for total weight percent.
Aforesaid rare earth is that lanthanum (La) is or yttrium (Y).
Add rare earth in the aforesaid titanium alloy target and be called the rare earth titanium alloy target, the rare earth titanium alloy target comprises titanium, manganese or chromium, rare earth, and the each component weight percent is:
Titanium 85-95
Manganese or chromium 4-10
Rare earth 0.01-5.
Add rare earth in the aforesaid Chrome metal powder target and be called rare earth Chrome metal powder target, rare earth Chrome metal powder target comprises chromium, copper or titanium, rare earth, and the each component weight percent is:
Chromium 85-95
Copper or titanium 4-10
Rare earth 0.01-5.
Add rare earth in the aforesaid graphite target and be called the rare earth graphite target, the rare earth graphite target comprises graphite, rare earth, and the each component weight percent is:
Graphite 95-99.09
Rare earth 0.01-5.
The preparation method of carbon nitride ultrahard film plated target material: 1, addition manner: with direct doping and physical chemistry coprecipitation mode interpolation indirectly; 2, add form: add with rare earth compound and rare earth intermediate alloy powder mode; 3, addition: it is 0.01-5 that rare earth accounts for total weight percent.
Use: plating technic adopts multiple arc plasma body plating equipment (Wuhan University is existing), rare earth titanium alloy target or rare earth Chrome metal powder target (optional one) be placed in the multiple arc plasma body plating equipment simultaneously with the rare earth graphite target carry out, make workpiece surface plating superhard material carbon nitride films the workpiece plating.Workpiece is as: the rings on the gear of mechanical industry, cutter and the textile equipment, steel ring, spindle and various wearing piece, cutter and the mould that has wear resistance, hardness to require.