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CN116514261A - Device and method for treating sewage by ionizing radiation - Google Patents

Device and method for treating sewage by ionizing radiation
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Publication number
CN116514261A
CN116514261ACN202310479796.2ACN202310479796ACN116514261ACN 116514261 ACN116514261 ACN 116514261ACN 202310479796 ACN202310479796 ACN 202310479796ACN 116514261 ACN116514261 ACN 116514261A
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sewage
electron beam
catalyst
container
treated
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欧阳晓平
曹留烜
陈静
王金斌
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Xiamen University
Xiangtan University
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Xiamen University
Xiangtan University
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Abstract

The invention relates to the field of sewage treatment, in particular to a device and a method for treating sewage by ionizing radiation. A sewage treatment apparatus comprising: a container for carrying sewage; a spraying part which is positioned on the side wall of the container and is used for spraying sewage to be treated into the container in a parabolic manner; an electron beam irradiation part for generating an electron beam, and irradiating the electron beam on a paraboloid of the sewage to be treated; and a catalyst supporting member for supporting a catalyst; the catalyst-carrying member is positioned in the middle and/or bottom of the vessel such that the catalyst is in contact with the paraboloid and/or with the sewage at the bottom of the vessel. The device and the method for treating sewage by ionizing radiation can obviously change the absorption dose distribution in the sewage, improve the energy utilization rate of the electron beam and simultaneously maintain the degradation rate of pollutants.

Description

Translated fromChinese
一种电离辐射处理污水的装置及方法A device and method for ionizing radiation treatment of sewage

技术领域technical field

本发明涉及污水处理领域,具体涉及一种电离辐射处理污水的装置及方法。The invention relates to the field of sewage treatment, in particular to a device and method for treating sewage with ionizing radiation.

背景技术Background technique

随着我国生态环境文明思想的贯彻,污水收集处理及资源化利用能力提升逐步成为城镇水环境优化的中心话题。城镇污水来源众多,其中石化、电力、造纸、垃圾填埋与处理、冶金及纺织等领域所排放的污水包含大量高浓度、难降解的高分子有机物,处理尤为困难。根据环境统计年报最新数据,我国全国城镇污水排放已高达2.7亿吨/日,年污水处理量超800亿吨,且目前仍具有上涨趋势,这是工业化进展的导向所至,因此对难降解污水进行深度处理,使其达到环境排放要求并用于循环系统中便成了新能源和新兴创新工艺的发展趋势。With the implementation of my country's ecological and environmental civilization thought, the improvement of sewage collection, treatment and resource utilization capabilities has gradually become the central topic of urban water environment optimization. There are many sources of urban sewage. Among them, the sewage discharged from petrochemical, electric power, papermaking, landfill and treatment, metallurgy and textile industries contains a large amount of high-concentration, refractory high-molecular organic matter, which is particularly difficult to treat. According to the latest data from the Environmental Statistical Annual Report, my country's national urban sewage discharge has reached 270 million tons per day, and the annual sewage treatment capacity has exceeded 80 billion tons, and it is still on an upward trend. This is the direction of industrialization progress. Therefore, the refractory sewage It has become the development trend of new energy and emerging innovative processes to carry out advanced treatment to meet the environmental emission requirements and use it in the circulation system.

电子束辐照是一种新型污水处理技术。电子束辐照通过快速产生羟基自由基,造成长链有机物断链或者解开苯环,直接降解部分有机污染物,且对长链有机物作用无差异性,该技术具有高效处理污水且处理效果良好的特性,打破了传统工艺的部分处理瓶颈。Electron beam irradiation is a new sewage treatment technology. Electron beam irradiation quickly generates hydroxyl radicals, causing long-chain organic compounds to break chains or untie benzene rings, directly degrades some organic pollutants, and has no difference in the effect on long-chain organic compounds. This technology has high-efficiency sewage treatment and good treatment effect The characteristic breaks some of the processing bottlenecks of the traditional process.

目前工业上的电离辐照污水处理的技术应用较少,主要集中于在电离辐照过程添加消耗性的试剂,以及和其它传统工艺的耦合与集成。在其中专门针对改进束下装置提高电子束利用率的方法还未报道。At present, there are few technical applications of ionizing radiation sewage treatment in industry, mainly focusing on adding consumable reagents in the ionizing radiation process, as well as coupling and integration with other traditional processes. The method of improving the electron beam utilization rate specifically for improving the under-beam device has not been reported yet.

因此,发现一种电离辐射处理工业污水的装置及方法以提升电子束辐照能量效率对污水处理领域有重要意义。Therefore, it is of great significance to the field of sewage treatment to find a device and method for treating industrial sewage with ionizing radiation to improve the energy efficiency of electron beam irradiation.

发明内容Contents of the invention

本发明的目的在于克服现有技术存在的上述问题,提供一种电离辐射处理污水的装置及方法。本发明的电离辐射处理污水的装置及方法可以显著改变污水中的吸收剂量分布,提升电子束能量利用率,同时保持对污染物的降解率。The purpose of the present invention is to overcome the above-mentioned problems in the prior art, and provide a device and method for treating sewage with ionizing radiation. The device and method for treating sewage with ionizing radiation of the present invention can significantly change the absorbed dose distribution in sewage, improve the utilization rate of electron beam energy, and maintain the degradation rate of pollutants at the same time.

本发明的第一方面提供了一种污水处理装置,包括:容器,用于承载污水;喷射部件,位于所述容器的侧壁上,用于使待处理污水呈抛物面喷射入所述容器中;电子束辐照部件,用于产生电子束,并且所述电子束照射于所述待处理污水的抛物面上;催化剂承载部件,用于承载催化剂;所述催化剂承载部件位于所述容器的中部和/或底部,以使得催化剂与所述抛物面接触和/或与容器底部的污水接触。The first aspect of the present invention provides a sewage treatment device, comprising: a container, used to carry sewage; a spraying part, located on the side wall of the container, used to spray the sewage to be treated into the container in the form of a parabola; An electron beam irradiating part is used to generate an electron beam, and the electron beam is irradiated on the parabolic surface of the sewage to be treated; a catalyst carrying part is used to carry a catalyst; the catalyst carrying part is located in the middle of the container and/or Or the bottom, so that the catalyst is in contact with the parabolic surface and/or with the sewage at the bottom of the container.

本发明的第二方面提供了一种污水处理的方法,在本发明第一方面提供的装置中进行,所述方法包括:待处理污水经过喷射部件呈抛物面状喷出,经过电子束辐照部件发出的电子束的辐照后落入容器中;所述待处理污水在被电子束辐照的同时与催化剂承载部件上的催化剂接触,和/或所述待处理污水在容器底部与催化剂承载部件上的催化剂接触。The second aspect of the present invention provides a sewage treatment method, carried out in the device provided by the first aspect of the present invention, the method includes: the sewage to be treated is sprayed in a parabolic shape through the spraying part, and then passed through the electron beam irradiation part After being irradiated by the emitted electron beam, it falls into the container; the sewage to be treated contacts the catalyst on the catalyst carrying part while being irradiated by the electron beam, and/or the sewage to be treated contacts the catalyst carrying part at the bottom of the container contact with the catalyst.

通过上述技术方案,本发明与现有技术相比至少具有以下优势:Through the above technical solution, the present invention has at least the following advantages compared with the prior art:

(1)本发明的电离辐射处理污水的装置及方法可以显著改变污水中的吸收剂量分布,从而将几乎全部的电子束能量都利用起来;(1) The device and method for treating sewage with ionizing radiation of the present invention can significantly change the absorbed dose distribution in sewage, thereby utilizing almost all electron beam energy;

(2)本发明的电离辐射处理污水的装置及方法能够使污水中的高浓度、难降解、长链的高分子有机化合物被有效地降解,从而极大地提高污水处理的效率;(2) The device and method for treating sewage by ionizing radiation of the present invention can effectively degrade high-concentration, refractory, and long-chain macromolecular organic compounds in sewage, thereby greatly improving the efficiency of sewage treatment;

(3)本发明的电离辐射处理污水的装置及方法可以与各种污水处理的操作方式相配合,例如芬顿、臭氧催化氧化、膜过滤、絮凝、反渗透等;但是实际上,本发明的电离辐射处理污水的装置及方法仅通过所述电离催化单元配合常规的生化单元便可以实现令人满意的水处理效果。(3) The device and method for treating sewage by ionizing radiation of the present invention can be matched with various sewage treatment operating modes, such as Fenton, ozone catalytic oxidation, membrane filtration, flocculation, reverse osmosis, etc.; but in fact, the present invention The device and method for treating sewage by ionizing radiation can achieve a satisfactory water treatment effect only by combining the ionization catalytic unit with a conventional biochemical unit.

在本文中所披露的范围的端点和任何值都不限于该精确的范围或值,这些范围或值应当理解为包含接近这些范围或值的值。对于数值范围来说,各个范围的端点值之间、各个范围的端点值和单独的点值之间,以及单独的点值之间可以彼此组合而得到一个或多个新的数值范围,这些数值范围应被视为在本文中具体公开。Neither the endpoints nor any values of the ranges disclosed herein are limited to such precise ranges or values, and these ranges or values are understood to include values approaching these ranges or values. For numerical ranges, between the endpoints of each range, between the endpoints of each range and individual point values, and between individual point values can be combined with each other to obtain one or more new numerical ranges, these values Ranges should be considered as specifically disclosed herein.

附图说明Description of drawings

图1所示为本发明一实施例的装置示意图;Fig. 1 shows the device schematic diagram of an embodiment of the present invention;

图2所示为单一电子束辐照在污水中的吸收剂量分布;Figure 2 shows the absorbed dose distribution of single electron beam irradiation in sewage;

图3所示为本发明一实施例中电子束在污水中的吸收剂量分布;Figure 3 shows the absorbed dose distribution of electron beams in sewage in an embodiment of the present invention;

图4所示为发明一实施例中电子束在污水中的总吸收剂量分布(区域I-目前电子束辐照利用的能量、区域II-本发明增加的电子束辐照利用的能量);Fig. 4 shows the total absorbed dose distribution of electron beams in sewage in an embodiment of the invention (area I-energy utilized by current electron beam irradiation, area II-energy utilized by electron beam irradiation increased by the present invention);

图5所示为本发明一实施例的喷射部件的喷射口的示意图。FIG. 5 is a schematic diagram of an injection port of an injection member according to an embodiment of the present invention.

附图标记说明Explanation of reference signs

1-污水,2-喷射部件,3-水膜,4-容器,5-出料口,6-电子束。1-sewage, 2-jet parts, 3-water film, 4-container, 5-outlet, 6-electron beam.

具体实施方式Detailed ways

以下对本发明的具体实施方式进行详细说明。应当理解的是,此处所描述的具体实施方式仅用于说明和解释本发明,并不用于限制本发明。Specific embodiments of the present invention will be described in detail below. It should be understood that the specific embodiments described here are only used to illustrate and explain the present invention, and are not intended to limit the present invention.

本发明的发明人发现电子束辐照技术工艺存在以下问题:一方面,电子束辐照在污水中的吸收剂量随入射深度衰减(如图2所示);另一方面,污水中有机污染物的降解率与电子束吸收剂量正相关。因此,为了使降解效果达到一定的标准,电子束吸收剂量需要超过一定阈值,这造成能够利用的电子束能量只能是入射射程的前半部分。后半段的电子束能量是浪费的,这提升了能耗。同时剩余的电子束能量造成辐射引起材料升温等损伤,提高了材料的损耗率。而且对剩余电子束能量造成的辐射需要额外的屏蔽手段。The inventors of the present invention have found that the electron beam irradiation technology has the following problems: on the one hand, the absorbed dose of electron beam irradiation in sewage decays with the incident depth (as shown in Figure 2); on the other hand, the organic pollutants in sewage The degradation rate is positively correlated with the electron beam absorbed dose. Therefore, in order to make the degradation effect reach a certain standard, the absorbed dose of the electron beam needs to exceed a certain threshold, which results in that the energy of the electron beam that can be used can only be the first half of the incident range. The electron beam energy in the second half is wasted, which increases energy consumption. At the same time, the remaining electron beam energy causes radiation to cause damage such as material heating, which increases the loss rate of the material. Moreover, additional shielding measures are required for the radiation caused by the remaining electron beam energy.

本发明的第一方面提供了一种污水处理装置(如图1所示),包括:容器4,用于承载污水;喷射部件2,位于所述容器的侧壁上,用于使待处理污水1呈抛物面喷射入所述容器中;电子束辐照部件,用于产生电子束6,并且所述电子束6照射于所述待处理污水的抛物面3上;催化剂承载部件,用于承载催化剂;所述催化剂承载部件位于所述容器的中部和/或底部,以使得催化剂与所述抛物面接触和/或与容器底部的污水接触。A first aspect of the present invention provides a sewage treatment device (as shown in Figure 1), comprising: a container 4 for carrying sewage; a spraying part 2 located on the side wall of the container for making the sewage to be treated 1 is sprayed into the container in the form of a parabola; an electron beam irradiating part is used to generate an electron beam 6, and the electron beam 6 is irradiated on the parabolic surface 3 of the sewage to be treated; a catalyst carrying part is used to carry a catalyst; The catalyst carrying part is located in the middle and/or bottom of the container, so that the catalyst contacts with the parabolic surface and/or contacts with the sewage at the bottom of the container.

所述容器底部还设置有出料口5。The bottom of the container is also provided with a discharge port 5 .

将所述污水进行电子束辐照和污水与催化剂接触的步骤,可以同时进行,也可以经过间隔时间先后进行。当间隔时间先后进行时,所述间隔时间≤1min,优选地≤30s,更优选地≤10s。The steps of irradiating the sewage with electron beams and contacting the sewage with the catalyst can be carried out at the same time or successively after an interval. When the interval time is carried out successively, the interval time is ≤1min, preferably ≤30s, more preferably ≤10s.

所述催化剂承载部件与所述污水的接触方式不限,所述催化剂承载部件可以已经存在于所述污水之中;也可以所述污水先经过电子束辐照装置进行电子束辐照,然后流经一段存在有催化剂承载部件的流路。The method of contacting the catalyst carrying part with the sewage is not limited, and the catalyst carrying part may already exist in the sewage; or the sewage may first be irradiated with an electron beam by an electron beam irradiation device, and then flow into the sewage. Through a section, there is a flow path in which a catalyst carrying member exists.

在一实例中,所述催化剂承载部件可以已经存在于所述污水之中。In an example, the catalyst carrying member may already be present in the sewage.

所述电子束辐照部件包括电子加速器和出束口。The electron beam irradiating part includes an electron accelerator and a beam outlet.

在一实例中,所述电子束辐照部件包括两个或多个出束口,使得所述电子束辐照部件发出两个或多个不同方向的电子束。In one example, the electron beam irradiating part includes two or more beam outlets, so that the electron beam irradiating part emits electron beams in two or more different directions.

发出的电子束可以是一台电子加速器发出,然后经过两个出束口分成两束;也可以是两台电子加速器分别发出,然后分别经过两个出束口。The emitted electron beam can be emitted by one electron accelerator, and then divided into two beams through two beam exits; it can also be emitted by two electron accelerators, and then passed through two beam exits respectively.

在一实例中,所述电子束辐照部件至少发出一对相对方向的第一电子束和第二电子束,其中所述第一电子束自上而下照向所述容器的底面,所述第二电子束自下而上照向所述容器的顶面,所述第一电子束和所述第二电子束的出束口分别位于所述抛物面的两侧。In one example, the electron beam irradiating part emits at least a pair of first electron beam and second electron beam in opposite directions, wherein the first electron beam irradiates the bottom surface of the container from top to bottom, and the The second electron beam is irradiated to the top surface of the container from bottom to top, and beam exits of the first electron beam and the second electron beam are respectively located on two sides of the paraboloid.

所述容器的顶面、底面和所述污水的抛物面呈基本平行的状态,当所述第一电子束自上而下照向所述容器的底面以及所述第二电子束自下而上照向所述容器的顶面时,所述第一电子束和所述第二电子束分别自上而下、自下而上照向所述待处理污水的抛物面。The top surface and the bottom surface of the container are substantially parallel to the parabolic surface of the sewage. When the first electron beam irradiates the bottom surface of the container from top to bottom and the second electron beam irradiates from bottom to top When heading toward the top surface of the container, the first electron beam and the second electron beam illuminate the paraboloid of the sewage to be treated from top to bottom and bottom to top, respectively.

本发明通过设计上下相对的电子束出束口,使得两个电子束在污水的总吸收剂量具有较均匀的分布(如图3和图4所示),图4中区域I为目前电子束辐照利用的能量、区域II为本发明增加的电子束辐照利用的能量。通过配合污水的流速,可以在较大的穿透深度范围内获得较均匀的吸收剂量分布,从而有效提升电子束的能量利用效率。The present invention makes the total absorbed dose of the two electron beams in the sewage have a relatively uniform distribution (as shown in Figure 3 and Figure 4 ) by designing the electron beam exit ports facing up and down. The energy utilized by the irradiation, and the region II is the energy utilized by the increased electron beam irradiation of the present invention. By matching the flow rate of the sewage, a more uniform absorbed dose distribution can be obtained within a larger penetration depth range, thereby effectively improving the energy utilization efficiency of the electron beam.

所述第一电子束和所述第二电子束的入射方向和所述抛物面呈一定角度,如锐角、直角等。The incident directions of the first electron beam and the second electron beam form a certain angle with the paraboloid, such as an acute angle, a right angle, and the like.

在一实例中,所述第一电子束和所述第二电子束垂直照射所述抛物面的两侧。如图1所示所述电子束6入射方向为平行于纸面方向,所述抛物面方向为垂直于纸面方向。In an example, the first electron beam and the second electron beam irradiate two sides of the paraboloid vertically. As shown in FIG. 1 , the incident direction of the electron beam 6 is parallel to the plane of the paper, and the direction of the parabolic plane is perpendicular to the plane of the paper.

所述喷嘴的长度(图5中的L)与电子束的扫描宽度(图5中的a)匹配,所述喷嘴的宽度(图5中W)取决于电子束的能量。The length of the nozzle (L in FIG. 5 ) matches the scanning width of the electron beam (a in FIG. 5 ), and the width of the nozzle (W in FIG. 5 ) depends on the energy of the electron beam.

即所述喷嘴的长度与电子束的扫描宽度相同,所述喷嘴的宽度根据电子束能量的穿透能力确定。That is, the length of the nozzle is the same as the scanning width of the electron beam, and the width of the nozzle is determined according to the penetration ability of the electron beam energy.

一般情况下为提高对所述电子束能量的利用率,设置的水膜较薄,因此所述喷嘴具有较大的长宽比。Generally, in order to improve the utilization rate of the electron beam energy, the water film is thinner, so the nozzle has a larger aspect ratio.

在一实例中,所述喷嘴的出水口的长度为50cm-200cm(例如50cm、80cm、100cm、120cm、150cm、180cm、200cm),宽度为0.5cm-5cm(例如0.5cm、1cm、2cm、3cm、4cm、5cm),且长宽比为(25-400):1(例如25:1、50:1、100:1、150:1、200:1、250:1、300:1、350:1、400:1)。In one example, the length of the water outlet of the nozzle is 50cm-200cm (such as 50cm, 80cm, 100cm, 120cm, 150cm, 180cm, 200cm), and the width is 0.5cm-5cm (such as 0.5cm, 1cm, 2cm, 3cm , 4cm, 5cm), and the aspect ratio is (25-400):1 (such as 25:1, 50:1, 100:1, 150:1, 200:1, 250:1, 300:1, 350: 1. 400:1).

优选地所述喷嘴长度为80cm-150cm,宽度为0.5cm-3cm。Preferably, the nozzle has a length of 80cm-150cm and a width of 0.5cm-3cm.

本发明的第二方面提供了一种污水处理的方法,在本发明第一方面提供的装置中进行,所述方法包括:The second aspect of the present invention provides a method of sewage treatment, carried out in the device provided by the first aspect of the present invention, said method comprising:

待处理污水1经过喷射部件2呈抛物面状3喷出,电子束辐照部件发出的电子束6的辐照后落入容器4中;所述待处理污水在被电子束辐照的同时与催化剂承载部件上的催化剂接触,和/或所述待处理污水在容器底部与催化剂承载部件上的催化剂接触。The sewage to be treated 1 is ejected in a parabolic shape 3 through the injection part 2, and falls into the container 4 after being irradiated by the electron beam 6 emitted by the electron beam irradiation part; The catalyst on the carrying part contacts, and/or the sewage to be treated contacts the catalyst on the catalyst carrying part at the bottom of the container.

所述污水经过电子束6辐照后从出料口5流出,进入后续的处理步骤。The sewage flows out from the outlet 5 after being irradiated by the electron beam 6, and enters the subsequent treatment steps.

本发明的发明人发现当抛物面的水膜厚度以及污水流速按照如下公式进行设置时,当第一电子束和第二电子束为相对辐照时能够达到最佳的电子束能量利用率。The inventors of the present invention found that when the water film thickness of the paraboloid and the sewage flow rate are set according to the following formula, the best electron beam energy utilization can be achieved when the first electron beam and the second electron beam are irradiated relative to each other.

在一实例中,所述抛物面的水膜厚度为符合公式1即h=9×10-9E-0.005。In an example, the water film thickness of the paraboloid conforms to Formula 1, that is, h=9×10−9 E−0.005.

其中,E为平均能量,单位eV;h为污水束下反应器需要设计水膜厚度,单位m。Among them, E is the average energy, the unit is eV; h is the thickness of the water film that needs to be designed for the reactor under the sewage beam, the unit is m.

通过两束电子束的相互配合,使得优化的水膜厚度能够暴露在相应的辐照能量下,实现效能最大化。在相同能量消耗下,能够在更短时间内处理更多的污水。Through the mutual cooperation of the two electron beams, the optimized water film thickness can be exposed to the corresponding irradiation energy to maximize the efficiency. Under the same energy consumption, more sewage can be treated in a shorter time.

在一实例中,所述污水流速符合公式2,即v=IE/(2000xelh)。In an example, the sewage flow rate conforms to Formula 2, ie v=IE/(2000xelh).

其中,I为电子束的平均束流强度,单位A;l为待处理污水的抛物面的水膜宽度,单位m;v为污水流速,单位m/s;x为待处理污水达到排放标准需要的吸收剂量,单位为Gy;E为平均能量,单位eV;e为电子电量,为常数1.6×10-19C,需说明的是,E的单位eV中也含有e,因此该e可以被E的单位eV除去,例如当电子束的平均能量为1MeV时,E/e为1M。Among them, I is the average beam intensity of the electron beam, unit A; l is the water film width of the parabolic surface of the sewage to be treated, unit m; v is the flow velocity of sewage, unit m/s; x is the required time for the sewage to be treated to meet the discharge standard Absorbed dose, the unit is Gy; E is the average energy, the unit is eV; e is the electron charge, which is a constant 1.6×10-19 C. It should be noted that the unit eV of E also contains e, so this e can be used by E The unit eV is removed, for example, when the average energy of the electron beam is 1MeV, E/e is 1M.

其中x是根据水质等因素确定的,对于x的具体数值本领域技术人员可以根据电子束辐照单元对污染物的降解负荷确定。常见污水中,x在0.5kGy-10kGy的范围内取值。Where x is determined according to factors such as water quality, and the specific value of x can be determined by those skilled in the art according to the degradation load of pollutants by the electron beam irradiation unit. In common sewage, x takes a value in the range of 0.5kGy-10kGy.

电子束流的能量和束流强度决定了降解污染物时的作用效果。电子束流的能量越高,它在污水中的穿透力就越强,与污染物的作用就越充分;电子束流的强度越大,则代表着有更多用于污染物降解的电子,对应的降解效率也就越高。The energy and beam intensity of the electron beam determine the effect of degrading pollutants. The higher the energy of the electron beam, the stronger its penetrating power in the sewage, and the more fully the interaction with the pollutants; the greater the intensity of the electron beam, it means that there are more electrons for the degradation of pollutants. , the corresponding degradation efficiency is higher.

通常认为,水流速度与处理效果相关,水流较慢时,处理效果较好,但处理水量低,成本高;水流较快时,处理效果较差,但处理水量大。本发明的发明人发现,通过使用公式能够将水流速度控制在恰好的程度,从而使得污水均能够能到很好的处理,从而在保证处理效果的前提下实现更大的处理水量和更低的成本。It is generally believed that the water flow rate is related to the treatment effect. When the water flow is slow, the treatment effect is better, but the water volume is low and the cost is high; when the water flow is fast, the treatment effect is poor, but the water volume is large. The inventors of the present invention found that by using the formula, the water flow velocity can be controlled to an appropriate level, so that the sewage can be treated very well, so as to achieve a greater amount of treated water and a lower cost while ensuring the treatment effect. cost.

在一实例中,所述电子束的能量为0.5-15MeV(例如0.5MeV、1MeV、2MeV、3MeV、4MeV、5MeV、6MeV、7MeV、8MeV、9MeV、10MeV、11MeV、12MeV、13MeV、14MeV、15MeV)。In an example, the energy of the electron beam is 0.5-15MeV (for example, 0.5MeV, 1MeV, 2MeV, 3MeV, 4MeV, 5MeV, 6MeV, 7MeV, 8MeV, 9MeV, 10MeV, 11MeV, 12MeV, 13MeV, 14MeV, 15MeV) .

在一实例中,所述电子束的能量为2.5-10.0MeV。In one example, the energy of the electron beam is 2.5-10.0 MeV.

在一实例中,所述电子束的束流强度1-300mA(例如1mA、2mA、3mA、4mA、5mA、10mA、20mA、30mA、40mA、50mA、100mA、200mA、300mA)。In one example, the beam intensity of the electron beam is 1-300mA (eg 1mA, 2mA, 3mA, 4mA, 5mA, 10mA, 20mA, 30mA, 40mA, 50mA, 100mA, 200mA, 300mA).

在一实例中,所述电子束的贯穿水膜厚度为0.5-5cm(例如0.5cm、1cm、1.5cm、2cm、2.5cm、3cm、3.5cm、4cm、4.5cm、5cm)。In one example, the thickness of the electron beam penetrating the water film is 0.5-5 cm (eg 0.5 cm, 1 cm, 1.5 cm, 2 cm, 2.5 cm, 3 cm, 3.5 cm, 4 cm, 4.5 cm, 5 cm).

术语“贯穿水膜厚度”指所述电子束能量能够穿透的水膜厚度。The term "through the water film thickness" refers to the water film thickness through which the electron beam energy is able to penetrate.

在一实例中,所述第一电子束和第二电子束的能量差别为50%以内,所述第一电子束和第二电子束的束流强度差别为30%以内。In an example, the energy difference between the first electron beam and the second electron beam is within 50%, and the beam current intensity difference between the first electron beam and the second electron beam is within 30%.

在一实例中,所述第一电子束和第二电子束的能量差别为20%以内,所述第一电子束和第二电子束的束流强度差别为20%以内。In an example, the energy difference between the first electron beam and the second electron beam is within 20%, and the beam current intensity difference between the first electron beam and the second electron beam is within 20%.

在一实例中,所述第一电子束和第二电子束的能量差别为10%以内,所述第一电子束和第二电子束的束流强度差别为10%以内。In an example, the energy difference between the first electron beam and the second electron beam is within 10%, and the beam current intensity difference between the first electron beam and the second electron beam is within 10%.

在一实例中,所述第一电子束和第二电子束的能量相同,所述第一电子束和第二电子束的束流强度相同。In an example, the first electron beam and the second electron beam have the same energy, and the first electron beam and the second electron beam have the same beam current intensity.

本发明中电离辐射处理污水的方法中配合催化剂使用能够更有效去除污水中的污染物。In the method for treating sewage by ionizing radiation in the present invention, the catalyst can be used together with the pollutants in the sewage to be more effectively removed.

在一实例中,所述催化剂包括活性金属元素和任选的载体,所述活性金属元素选自碱土金属和过渡金属中的一种或多种,所述活性金属元素以不溶性的固体形态存在。In one example, the catalyst includes an active metal element and an optional support, the active metal element is selected from one or more of alkaline earth metals and transition metals, and the active metal element exists in an insoluble solid form.

在一实例中,所述催化剂为与电子束辐照协同催化降解高分子有机化合物的催化剂。In one example, the catalyst is a catalyst that synergistically catalyzes the degradation of high-molecular organic compounds with electron beam irradiation.

在一实例中,所述污水为含有高分子有机化合物的污水。In one example, the sewage is sewage containing high molecular weight organic compounds.

本发明中电离辐射处理污水的装置和方法尤其适用于处理含有高分子有机化合物污水。The device and method for treating sewage by ionizing radiation in the present invention are especially suitable for treating sewage containing high molecular organic compounds.

本发明的应用范围对“高分子有机化合物”的范围没有特别的限定,对各种高分子有机化合物都有催化降解的效果,例如COD较高的废水中常见的一些有机化合物。所述“高分子”的分子量没有特别的范围限制,但是从本发明的催化剂发挥作用的角度理解,凡是能够被降解或者需要被降解的有机化合物都可以理解为“高分子的”,例如分子量在5KDa以上的。The scope of application of the present invention has no special limitation on the scope of "macromolecular organic compounds", and has catalytic degradation effect on various macromolecular organic compounds, such as some organic compounds commonly found in wastewater with high COD. The molecular weight of the "high molecular weight" is not limited in particular, but from the perspective of the function of the catalyst of the present invention, any organic compound that can be degraded or needs to be degraded can be understood as "high molecular weight", for example, the molecular weight is between More than 5KDa.

本发明中催化剂与电子束相配合,能够进一步提升催化剂和电子束辐照在降解高分子有机化合物的使用效果,使高浓度、难降解、长链的高分子有机化合物更容易被降解。In the present invention, the combination of the catalyst and the electron beam can further improve the effect of the catalyst and the electron beam irradiation in degrading the macromolecular organic compound, so that the high-concentration, difficult-to-degrade, and long-chain macromolecular organic compound can be more easily degraded.

本发明的电离辐射处理污水的装置及方法可配合粗滤单元、生化单元、细滤单元等,最终得到处理合格的污水。The device and method for treating sewage by ionizing radiation of the present invention can cooperate with a coarse filter unit, a biochemical unit, a fine filter unit, etc., and finally obtain qualified sewage.

在发明中,术语“第一”、“第二”、“底面”、“顶面”等是用于区别类似的对象,而不用于描述特定的顺序或先后次序。In the invention, the terms "first", "second", "bottom", "top" and the like are used to distinguish similar objects, not to describe a specific order or sequence.

下面将结合本发明实施例中的附图,对本发明实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅是本发明一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例,都属于本发明保护的范围。The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some of the embodiments of the present invention, not all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

实施例所用待处理污水的水质指标如表1所示。另外,表1还包含了根据GB18918-2002《城镇污水处理厂污染物排放标准》所规定的分级指标。The water quality index of the sewage to be treated used in the embodiment is shown in Table 1. In addition, Table 1 also includes the grading indicators stipulated in GB18918-2002 "Pollutant Discharge Standards for Urban Sewage Treatment Plants".

表1Table 1

在以下实施例和对比例中,理论水膜厚度通过公式1即h=9×10-9E-0.005计算得到,其中,E为平均能量,单位eV;h为污水束下反应器需要设计水膜厚度,单位m。实际水膜厚度为实际测量得到的水膜厚度。In the following examples and comparative examples, the theoretical water film thickness is calculated by formula 1, i.e. h=9×10-9 E-0.005, where E is the average energy in eV; h is the design water required for the reactor under the sewage beam Film thickness, in m. The actual water film thickness is the actual measured water film thickness.

理论污水流速通过公式2即v=IE/(2000xelh)计算得到,其中,I为电子束的平均束流强度,单位A;l为待处理污水的抛物面的水膜宽度,单位m;v为污水流速,单位m/s;x为待处理污水达到排放标准需要的吸收剂量,单位为Gy;E为平均能量,单位eV;e为电子电量。实际污水流速为实际测量得到的污水流速。Theoretical sewage flow velocity is calculated by formula 2 i.e. v=IE/(2000xelh), wherein, I is the average beam intensity of the electron beam, unit A; l is the water film width of the paraboloid of sewage to be treated, unit m; v is sewage Flow velocity, unit m/s; x is the absorbed dose required for the sewage to be treated to meet the discharge standard, unit is Gy; E is the average energy, unit eV; e is the electronic power. The actual sewage flow rate is the actual measured sewage flow rate.

实施例1Example 1

将待处理印染污水依次经过以下步骤:The printing and dyeing wastewater to be treated will go through the following steps in sequence:

(1)粗滤单元:向污水加入聚合物,进行曝气处理,进入泥水分离装置去除固形物;(1) Coarse filtration unit: add polymer to the sewage, perform aeration treatment, and enter the mud-water separation device to remove solids;

(2)生化单元:好氧生化反应器,其中设置有酶浮填料,停留时间为2小时;(2) Biochemical unit: an aerobic biochemical reactor, wherein an enzyme floating filler is arranged, and the residence time is 2 hours;

(3)电离辐照催化单元:采用电子加速器从两个出束口分别为从上往下和从下往上进行辐照,污水通过喷射部件呈抛物面状喷出,经过电子束的辐照后落入容器中,其中负载有多元金属催化剂的凝胶分散在污水中,之后将固体凝胶成分进行过滤;(3) Ionizing radiation catalytic unit: The electron accelerator is used to irradiate from the two beam outlets from top to bottom and from bottom to top respectively. The sewage is sprayed out in a parabolic shape through the injection parts. Falling into a container, wherein the gel loaded with a multi-element metal catalyst is dispersed in the sewage, and then the solid gel component is filtered;

两个出束口的能量和束流强度相同,具体为:能量为10MeV,束流强度2mA,束流扫描宽度80cm;计算理论水膜厚度为8.5cm,将实际水膜厚度调整为8.5cm;待处理污水达到排放标准需要的吸收剂量x为0.5kGy(以下实施例的x均与实施例1相同,因为使用相同的污水),计算理论污水流速为0.3m/s,将水流速度调整为与理论污水流速相同;The energy and beam intensity of the two beam outlets are the same, specifically: the energy is 10MeV, the beam intensity is 2mA, and the beam scanning width is 80cm; the calculated theoretical water film thickness is 8.5cm, and the actual water film thickness is adjusted to 8.5cm; The absorbed dose x required to treat the sewage to reach the discharge standard is 0.5kGy (the x in the following examples are all the same as in Example 1, because the same sewage is used), and the calculated theoretical sewage flow velocity is 0.3m/s, and the water flow velocity is adjusted to be the same as the theoretical one. The flow rate of sewage is the same;

(4)生化单元:兼氧/好氧生化反应器,其中设置有酶浮填料,停留时间为10小时;(4) Biochemical unit: a facultative/aerobic biochemical reactor, wherein an enzyme floating filler is arranged, and the residence time is 10 hours;

(5)细滤单元:用活性砂滤去除残留污染物,收集细滤单元出口的水待检测。(5) Fine filter unit: use active sand filter to remove residual pollutants, and collect the water at the outlet of the fine filter unit for detection.

实施例2Example 2

参照实施例1进行,不同的是,改变两个出束口的参数(两个出束口参数相同),具体地:能量为2.5MeV,束流强度20mA,束流扫描宽度80cm;Carry out with reference to Example 1, the difference is that the parameters of the two beam exits are changed (the parameters of the two beam exits are the same), specifically: the energy is 2.5 MeV, the beam intensity is 20mA, and the beam scanning width is 80cm;

计算理论水膜厚度为1.8cm,将实际水膜厚度设置为1.8cm;计算理论污水流速为3.6m/s,将水流速度调整为与理论污水流速相同;The theoretical water film thickness is calculated as 1.8cm, and the actual water film thickness is set to 1.8cm; the theoretical sewage flow velocity is calculated as 3.6m/s, and the water flow velocity is adjusted to be the same as the theoretical sewage flow velocity;

实施例3Example 3

参照实施例1进行,不同的是,将实际水膜厚度调整为与理论水膜厚度有显著差异的4cm。Carry out with reference to Example 1, the difference is that the actual water film thickness is adjusted to 4cm which is significantly different from the theoretical water film thickness.

实施例4Example 4

参照实施例1进行,不同的是,将实际水流速度调整为与理论水流速度有显著差异的1m/s。With reference to Example 1, the difference is that the actual water flow velocity is adjusted to 1m/s which is significantly different from the theoretical water flow velocity.

实施例5Example 5

参照实施例1进行,不同的是,步骤(3)电离辐照催化单元中采用一个出束口从上往下进行辐照,出束口参数不变。Carry out with reference to Example 1, the difference is that step (3) in the ionizing radiation catalytic unit uses a beam outlet to irradiate from top to bottom, and the parameters of the beam outlet remain unchanged.

实施例6Example 6

参照实施例1进行,不同的是,采用目前商用的工艺单面辐照,水膜厚度较薄,仅仅利用能量较高部分电子束流。水膜厚度为4cm。通过提高流速达到实施例1的处理量。流速为0.625m/s。Referring to Example 1, the difference is that the current commercial process is used for single-sided irradiation, the thickness of the water film is thinner, and only the part of the electron beam with higher energy is used. The water film thickness is 4cm. The throughput of Example 1 was achieved by increasing the flow rate. The flow velocity is 0.625m/s.

对比例1Comparative example 1

参照实施例1进行,不同的是,省略步骤(3)电离辐照催化单元。Carry out with reference to Example 1, the difference is that step (3) ionizing radiation irradiating the catalytic unit is omitted.

上述实施例所得处理后水进行水质检测,结果汇总于表2中。The treated water obtained in the above examples was tested for water quality, and the results are summarized in Table 2.

表2Table 2

从表2可以看出,通过本发明的污水处理工艺,能够有效地降解高分子有机污染物,使水质达到一级A排放标准。从结果可以看出,本发明中所述的装置,通过提升电子束辐照单元的能量利用率,在相同处理水量情况下,提升对有机污染物的降解效果,可以显著提高整体工艺的处理能力。在相同处理效果下,能够提升处理水量,降低处理成本。As can be seen from Table 2, the sewage treatment process of the present invention can effectively degrade high-molecular organic pollutants, so that the water quality can reach the first-class A discharge standard. It can be seen from the results that the device described in the present invention can significantly improve the treatment capacity of the overall process by improving the energy utilization rate of the electron beam irradiation unit and improving the degradation effect on organic pollutants under the same treatment water volume. . Under the same treatment effect, the treated water volume can be increased and the treatment cost can be reduced.

以上详细描述了本发明的优选实施方式,但是,本发明并不限于此。在本发明的技术构思范围内,可以对本发明的技术方案进行多种简单变型,包括各个技术特征以任何其它的合适方式进行组合,这些简单变型和组合同样应当视为本发明所公开的内容,均属于本发明的保护范围。The preferred embodiments of the present invention have been described in detail above, however, the present invention is not limited thereto. Within the scope of the technical concept of the present invention, various simple modifications can be made to the technical solution of the present invention, including the combination of various technical features in any other suitable manner, and these simple modifications and combinations should also be regarded as the disclosed content of the present invention. All belong to the protection scope of the present invention.

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丁瑞;茅泽育;王建龙;: "电子束辐照水处理反应器研究进展", 化工进展, no. 02, 28 February 2017 (2017-02-28)*

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