Disclosure of Invention
The invention aims to provide an objective pollution prevention device, which can form a stable and uniform air curtain protection layer in the device to play a good pollution prevention effect.
In order to achieve the above object, the following technical scheme is provided:
an objective contamination prevention apparatus, the objective contamination prevention apparatus comprising:
The air inlet body is internally provided with an air inlet flow passage, the bottom surface of the air inlet body is provided with a containing groove, and the air inlet flow passage is arranged on the periphery of the containing groove;
The baffle body is arranged in the accommodating groove, the top surface of the baffle body and the groove bottom of the accommodating groove are arranged at intervals, a first air outlet flow passage is formed in the top surface of the baffle body, a second air outlet flow passage with a wide upper part and a narrow lower part is formed in the center of the baffle body in a penetrating manner, and the first air outlet flow passage is arranged around the periphery of the second air outlet flow passage and is communicated with the air inlet flow passage.
Optionally, the second air outlet flow channel has a truncated cone structure.
Optionally, the air inlet channel is communicated with the bottom of the first air outlet channel, and the first air outlet channel is in a wedge-shaped structure with a narrow upper part and a wide lower part.
Optionally, a circle of first vent holes are formed in a side wall, close to one side of the first air outlet channel, of the air inlet channel, a circle of second vent holes are formed in a side wall, close to one side of the air inlet channel, of the first air outlet channel, the number of the first vent holes corresponds to the number of the second vent holes one by one, and the first vent holes are communicated with the corresponding second vent holes.
Optionally, the circumference of the baffle body is provided with a first position and a second position which are symmetrical in center, and a third position which is arranged between the first position and the second position, wherein the first position is an air inlet position, the aperture of the second vent hole is gradually reduced in the direction from the first position to the third position, and/or the aperture depth of the second vent hole is gradually prolonged, and the aperture of the second vent hole is gradually increased in the direction from the third position to the second position, and/or the aperture depth of the second vent hole is gradually reduced.
Optionally, a buffer flow channel is further arranged between the outer peripheral surface of the baffle body and the circumferential groove wall of the accommodating groove, and the buffer flow channel is simultaneously communicated with the first vent hole and the second vent hole.
Optionally, a third air vent is formed in the circumferential side wall of the second air outlet channel, and the third air vent is horizontally communicated with the first air outlet channel and the second air outlet channel.
Optionally, a circle of fourth air holes are formed in the bottom surface of the baffle body, and the fourth air holes are communicated with the first air outlet flow channel.
Optionally, a light transmitting part is formed at the center of the air inlet body, and light of the objective lens is transmitted to the to-be-photoetched piece through the light transmitting part and the second air outlet flow channel in sequence.
Optionally, the light-transmitting part comprises a first light-transmitting through hole arranged on the air inlet body, the first light-transmitting through hole is communicated with the accommodating groove, and the first light-transmitting through hole can be selectively sealed by adopting a light-transmitting piece.
Optionally, the objective pollution prevention device further comprises a light shielding plate, wherein the light shielding plate is arranged at the bottom of the baffle body and is used for partially shielding a hollow area in the center of the baffle body so as to form a target exposure field of view.
Optionally, the bottom circumference of baffle body is provided with round spacing boss, the body that admits air and spacing boss looks butt, in order to restrict the baffle body is in the depth of placing in the holding tank.
Compared with the prior art, the invention has the beneficial effects that:
the objective pollution prevention device provided by the invention has the advantages that the air flow firstly enters the accommodating groove at the top of the baffle body from bottom to top through the air inlet flow channel and the first air outlet flow channel, the air flow can be buffered and homogenized in the process, the purpose of stabilizing the flow is achieved, the first air outlet flow channel is arranged around the second air outlet flow channel, the air flow in the circumferential direction of the second air outlet flow channel is simultaneously converged towards the center of the baffle body along with the continuous input of the air and the flow guiding effect of the second air outlet flow channel with wide upper part and narrow lower part, and finally the air flow escapes from top to bottom, so that the air outlet is realized, a complete and stable air curtain protection layer is formed, pollutants are blocked by the air curtain protection layer and cannot diffuse towards the objective lens, and the effective isolation between a to-be-photoetched piece and the objective lens is realized.
Detailed Description
For the purpose of making the objects, technical solutions and advantages of the embodiments of the present invention more apparent, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention, and it is apparent that the described embodiments are some embodiments of the present invention, but not all embodiments of the present invention. The components of the embodiments of the present invention generally described and illustrated in the figures herein may be arranged and designed in a wide variety of different configurations.
Thus, the following detailed description of the embodiments of the invention, as presented in the figures, is not intended to limit the scope of the invention, as claimed, but is merely representative of selected embodiments of the invention. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
It should be noted that like reference numerals and letters refer to like items in the following figures, and thus once an item is defined in one figure, no further definition or explanation thereof is necessary in the following figures.
In the description of the present invention, it should be noted that, directions or positional relationships indicated by terms such as "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", etc., are directions or positional relationships based on those shown in the drawings, or are directions or positional relationships conventionally put in use of the inventive product, are merely for convenience of describing the present invention and simplifying the description, and are not indicative or implying that the apparatus or element to be referred to must have a specific direction, be configured and operated in a specific direction, and thus should not be construed as limiting the present invention. Furthermore, the terms "first," "second," "third," and the like are used merely to distinguish between descriptions and should not be construed as indicating or implying relative importance. In the description of the present invention, unless otherwise indicated, the meaning of "a plurality" is two or more.
In the description of the present invention, it should also be noted that, unless explicitly stated and limited otherwise, the terms "disposed" and "connected" are to be construed broadly, and may be, for example, fixedly connected, detachably connected, integrally connected, mechanically connected, or electrically connected. The specific meaning of the above terms in the present invention will be understood in specific cases by those of ordinary skill in the art.
In the present invention, unless expressly stated or limited otherwise, a first feature "above" or "below" a second feature may include both the first and second features being in direct contact, as well as the first and second features not being in direct contact but being in contact with each other through additional features therebetween. Moreover, a first feature being "above," "over" and "on" a second feature includes the first feature being directly above and obliquely above the second feature, or simply indicating that the first feature is higher in level than the second feature. The first feature being "under", "below" and "beneath" the second feature includes the first feature being directly under and obliquely below the second feature, or simply means that the first feature is less level than the second feature.
Embodiments of the present invention are described in detail below, examples of which are illustrated in the accompanying drawings, wherein like or similar reference numerals refer to like or similar elements or elements having like or similar functions throughout. The embodiments described below by referring to the drawings are illustrative only and are not to be construed as limiting the invention.
Example 1
As shown in fig. 1 to 8, the present embodiment is to provide an objective lens contamination prevention device capable of being provided on an objective lens to prevent contaminants volatilized from a photoresist to be etched from diffusing onto a lens of the objective lens, the objective lens contamination prevention device including an air intake body 10. Referring to fig. 4 to 6, an intake runner 11 is provided in the interior of the intake body 10, a receiving groove 12 opened downward is provided in the bottom surface of the intake body 10, and the intake runner 11 is annularly provided at the outer periphery of the receiving groove 12. Referring to fig. 4,5 and 7, the objective contamination prevention apparatus further includes a barrier body 20 having a ring-shaped structure, the barrier body 20 is disposed in the receiving groove 12, and a top surface of the barrier body 20 is spaced apart from a bottom of the receiving groove 12. The top surface of the baffle body 20 is provided with a first air outlet flow passage 21, the center of the baffle body 20 is communicated with a second air outlet flow passage 22 with a wide upper part and a narrow lower part, and the first air outlet flow passage 21 is arranged around the periphery of the second air outlet flow passage 22 and is communicated with the air inlet flow passage 11. The gas escapes from the bottom of the baffle body 20 after passing through the air inlet flow channel 11, the first air outlet flow channel 21, the accommodating groove 12 and the second air outlet flow channel 22 in sequence, so as to form an air curtain protection layer between the objective lens and the to-be-photoetched piece.
According to the objective pollution prevention device provided by the embodiment, air flow firstly enters the accommodating groove 12 at the top of the baffle body 20 from bottom to top through the air inlet flow channel 11 and the first air outlet flow channel 21, and the process can buffer and homogenize the air flow, so that the purpose of stabilizing the flow is achieved. Because the first air outlet flow channel 21 is arranged around the second air outlet flow channel 22, along with continuous input of gas, and the flow guiding function of the second air outlet flow channel 22 with wide upper part and narrow lower part, the air flow in the circumferential direction of the second air outlet flow channel 22 is simultaneously converged to the center of the baffle body 20, and finally air is discharged from top to bottom, so that a complete and stable air curtain protection layer is formed, pollutants are blocked by the air curtain protection layer and cannot be diffused to the inside of the device (namely, the direction of the objective lens), and effective isolation between a to-be-photoetched piece and the objective lens is realized. Optionally, the second air outlet flow channel 22 has a truncated cone structure, that is, any horizontal section shape of the second air outlet flow channel 22 is circular, so that the air curtain protection layer is more stable and uniform when the air flow is converged at all positions in the circumferential direction. The air curtain in the prior art can only be formed by a mode of single-side air outlet and opposite-side air suction at the air outlet, so that the stability of the air curtain is poor, the air flow is slightly overlarge, or the air field is disturbed by the outside, the air curtain is easily disturbed, the integrity of the air curtain is damaged, and the local pollution of an objective lens is easily caused. In the embodiment, the air curtain protection layer is formed by uniformly conveying air flow to an upper area for stabilizing flow and then enabling the air flow to flow towards the center and the lower area, the air flow is distributed in the circumferential 360-degree range, the stability, the integrity and the uniformity of the whole air curtain protection layer can be ensured, and the antifouling effect is better. In specific implementation, the objective pollution prevention device can be arranged on the lens seat of the objective lens so as to be attached to the lens of the objective lens as much as possible, and the lens can be fully isolated from pollutants through the air curtain protection layer.
Alternatively, the intake runner 11 may be annular, specifically may be annular, and referring to fig. 1, an intake port 14 is provided on the outer peripheral surface of the intake body 10, the intake runner 11 communicates with the intake port 14, and the outside air is taken into the intake runner 11 through the intake port 14. For the annular intake runner 11, one intake port 14 is generally provided. Further alternatively, the accommodating groove 12 is a circular groove, and referring to fig. 4 and 5, the outer peripheral surface of the baffle body 20 is in sealing fit with the circumferential groove wall of the accommodating groove 12, so that gas is prevented from leaking from the circumferential groove wall, and the gas cannot be transmitted to the first air outlet flow channel 21 according to a normal path, and the normal formation of the air curtain protection layer is affected. Optionally, the air inlet body 10 has a circular structure, so that the air inlet channel 11 and the accommodating groove 12 are conveniently arranged, and the air inlet body is more convenient to assemble with the objective lens. Further, the central axes of the intake body 10, the intake runner 11 and the baffle body 20 coincide with each other.
The air inlet flow channel 11 is communicated with the bottom of the first air outlet flow channel 21, so that air flow enters from the bottom of the first air outlet flow channel 21, and the air flow can be diffused upwards after being buffered and homogenized in the first air outlet flow channel 21 to be beneficial to improving the stability of the air flow. Further, referring to fig. 5, the first air outlet channel 21 has a wedge structure with a narrow top and a wide bottom, which can further prolong the buffering time of the air flow in the first air outlet channel 21, thereby being more beneficial to the homogenization operation of the air flow. Specifically, referring to fig. 4-7, a circle of first ventilation holes 13 is arranged on a side wall of the air inlet channel 11 close to the first air outlet channel 21, a circle of second ventilation holes 24 is arranged on a side wall of the first air outlet channel 21 close to the air inlet channel 11, the number of the first ventilation holes 13 corresponds to the number of the second ventilation holes 24 one by one, the first ventilation holes 13 are communicated with the corresponding second ventilation holes 24, and further the communication between the air inlet channel 11 and the first air outlet channel 21 is achieved.
Since only one air inlet 14 is provided, after the air enters the air inlet channel 11 from the air inlet 14, the air outlet amount of the air in the circumferential direction of the air inlet channel 11 is not uniform, that is, the air outlet amount of the second air outlet holes 24 is also non-uniform in the circumferential direction, wherein the air outlet amount is minimum at the position which is distributed in a central symmetry manner with the air inlet 14, and the air outlet amount is maximum at the position which is arranged at an included angle of 90 degrees with the air inlet 14. Referring to fig. 7 and 8, in the present embodiment, the baffle body 20 has a first position P1 and a second position P2 which are symmetrical with each other in the center, and a third position P3 which is located between the first position P1 and the second position P2, and the air inlet 14 and the first position P1 are located in the same radial direction, that is, the first position P1 is an air inlet position for the baffle body 20, and in the direction from the first position P1 to the third position P3, the aperture of the second air vent 24 gradually decreases, or the aperture depth of the second air vent 24 gradually becomes longer, or the aperture depth of the second air vent 24 gradually increases while the aperture depth of the second air vent 24 gradually decreases, and in the direction from the third position P3 to the second position P3, the aperture depth of the second air vent 24 gradually decreases, or the aperture depth of the second air vent 24 gradually increases while the aperture depth of the second air vent 24 gradually decreases. Because the larger the aperture is, the smaller the hole depth is, the larger the gas outlet amount is, and the smaller the aperture is, the longer the hole depth is, and the gas outlet amount is also, therefore, the arrangement is that when the gas is discharged from the second vent hole 24, the gas outlet amount at the position which is arranged at an included angle of 90 degrees with the gas inlet 14 is reduced, the gas outlet amount at the position which is symmetrically distributed with the center of the gas inlet 14 is increased, the gas outlet amounts of different areas are balanced, uniform gas outlet is realized as much as possible, and the uniformity degree of the gas flow, the uniformity and the stability of the gas curtain isolation layer are improved.
Since the second ventilation holes 24 need to penetrate through the side wall of the first air outlet flow channel 21 near the air inlet flow channel 11, in order to adapt to the arrangement of the second ventilation holes 24 with different hole depths, referring to fig. 8, it can be seen that the wall thickness of the side wall of the first air outlet flow channel 21 near the air inlet flow channel 11 is uneven, the wall thickness of the side wall of the first air outlet flow channel 21 far from the air inlet flow channel 11 is also uneven, and the wall thickness of the side wall of the first air outlet flow channel 21 near the air inlet flow channel 11 is in a complementary relationship, so as to ensure that the width of the first air outlet flow channel 21 in the circumferential direction is uniform, and ensure that the cross section of the second air outlet flow channel 22 is regular round, thereby ensuring that the distribution of air flow in the circumferential direction is more uniform.
Referring to fig. 5, a buffer flow channel 23 is further provided between the outer peripheral surface of the baffle body 20 and the circumferential groove wall of the accommodating groove 12, the buffer flow channel 23 is simultaneously communicated with the first vent hole 13 and the second vent hole 24, and the gas of the inlet flow channel 11 sequentially enters the first outlet flow channel 21 through the first vent hole 13, the buffer flow channel 23 and the second vent hole 24. Since the air inlet 14 is generally only disposed in the circumferential direction of the air inlet body 10, most of the air flow enters the first air outlet flow channel 21 adjacent to the air inlet 14 after being input by the air inlet 14, and the smaller the air flow in the corresponding first air outlet flow channel 21 is, the more easily the air flow in the circumferential direction is distributed unevenly, which affects the uniformity and stability of the air curtain protection layer. Therefore, a buffer flow channel 23 is arranged between the baffle body 20 and the air inlet body 10, so that the air flow from the air inlet flow channel 11 can be further buffered and homogenized, the air flow is more uniformly distributed in the circumferential direction, and the stable formation of the air curtain protection layer is finally facilitated. Optionally, the outer peripheral surface of the baffle body 20 is recessed inwards to form a wedge-shaped space with a narrow upper part and a wide lower part between the baffle body 20 and the air inlet body 10, the wedge-shaped space can be used as the buffer flow channel 23, and the structural arrangement of the narrow upper part and the wide lower part is used for adapting to the structure of the first air outlet flow channel 21 so as to ensure that the air flow enters the bottom of the second air outlet flow channel 22 after being fully stabilized and homogenized at the bottom. When the buffer flow channel 23 is formed, it should be ensured that the portion of the outer peripheral surface of the baffle body 20 where the buffer flow channel 23 is not formed is still in sealing engagement with the intake body 10, i.e., the wedge-shaped space is formed only by a portion of the outer peripheral surface of the baffle body 20.
Further, the circumferential side wall of the second air outlet flow channel 22 is provided with a third air vent, and the third air vent is horizontally communicated with the first air outlet flow channel 21 and the second air outlet flow channel 22, so that air flow can directly flow out from the first air outlet flow channel 21 along the radial direction of the baffle body 20, the radial velocity component of the air curtain protection layer is increased, the stability of the air curtain protection layer is higher, and the blocking capability to pollutants is improved. Similarly, a circle of fourth air holes are formed on the bottom surface of the baffle body 20, and the fourth air holes are communicated with the first air outlet flow channel 21, so that air flow can also directly flow out of the first air outlet flow channel 21 through the fourth air holes, namely, a gas protection layer is formed at the bottom of the baffle body 20, and the gas protection layer is matched with the gas protection layer, so that the effect of further blocking the diffusion of pollutants to the objective lens is achieved.
In particular, the center of the air inlet body 10 is formed with a light transmitting portion, and the light of the objective lens is transmitted to the to-be-etched piece through the light transmitting portion and the second air outlet flow channel 22 in sequence, so as to ensure the normal operation of the exposure process. Further, the light transmission part comprises a first light transmission through hole formed in the center of the air inlet body 10, optionally, referring to fig. 4, the light transmission part further comprises a light transmission piece 16, the light transmission piece 16 seals the first light transmission through hole, so that the effect of isolating pollutants by adopting a solid structure is achieved while normal light transmission is ensured, and the antifouling effect is improved. In this embodiment, the light-transmitting member 16 may be a protective film, and under the action of the air curtain protective layer, fewer contaminants can escape to the protective film, so that the service life of the protective film can be greatly prolonged and the replacement frequency is obviously reduced. Optionally, the top surface of the air intake body 10 is provided with a mounting boss 15, the first light-transmitting through hole penetrates through the mounting boss 15 and is communicated with the accommodating groove 12, the protective film is arranged in the first air-transmitting through hole of the mounting boss 15, the protective film is prevented from interfering with the baffle body 20, and a sufficient gas buffering space is ensured above the baffle body 20.
Optionally, referring to fig. 5 and 7, a circle of limiting boss 25 is circumferentially arranged at the bottom of the baffle body 20, and when the baffle body 20 is placed in the accommodating groove 12 for assembly, the air inlet body 10 abuts against the limiting boss 25 to limit the placement depth of the baffle body 20 in the accommodating groove 12, so as to ensure that a sufficient gas buffer space is provided above the baffle body 20. Alternatively, the baffle body 20 is connected with the air intake body 10 through a bolt structure.
Referring to fig. 2, 4 and 8, the objective contamination prevention apparatus further includes a light shielding plate 30, the light shielding plate 30 being provided at the bottom of the shutter body 20 for forming a target exposure field of view. In specific implementation, the exposure field of view projected onto the to-be-etched part should be rectangular, but for uniform formation of the air curtain protection layer, the cross-section of the second air outlet flow channel 22 is circular, and the light passes through the whole objective anti-pollution device to form a circular field of view, so that a light shielding plate 30 is required to be arranged, a second light-transmitting through hole with the same shape as the target field of view is arranged in the center of the light shielding plate 30, after the light shielding plate 30 is mounted on the baffle body 20, the hollow area in the center of the baffle body 20 is partially shielded, and then the light of the objective can only pass through the second light-transmitting through hole on the light shielding plate 30 to be transmitted, and then the target exposure field of view is formed on the to-be-etched part. Further, the light shielding plate 30 shields the baffle body 20, and simultaneously reduces the air outlet area at the bottom of the baffle body 20, thereby increasing the air outlet speed of the air flow and enabling the pollutant resistance capability to be stronger. Optionally, a mounting groove is formed on the bottom surface of the baffle body 20, and the light shielding plate 30 is mounted in the mounting groove to compress the thickness of the whole baffle body 20.
Example two
The present embodiment also provides an objective lens contamination prevention device, which has substantially the same structure as the first embodiment compared to the first embodiment, except that in the present embodiment, the light transmitting portion includes only a first light transmitting through hole, the first light transmitting through hole is directly communicated with the accommodating groove 12, and the light transmitting member 16 is not used for sealing, i.e. the area in the center of the air intake body 10 is directly exposed for light transmission. Because the air curtain protective layer formed by the objective pollution-preventing device can fully isolate the objective lens from the to-be-photoetched piece, the light transmittance of photoetching can be improved on the premise of meeting the pollution-preventing requirement without arranging the light-transmitting piece 16, and meanwhile, the manufacturing process can be simplified, and the cost is reduced.
Note that the above is only a preferred embodiment of the present invention and the technical principle applied. It will be understood by those skilled in the art that the present invention is not limited to the particular embodiments described herein, but is capable of various obvious changes, rearrangements and substitutions as will now become apparent to those skilled in the art without departing from the scope of the invention. Therefore, while the invention has been described in connection with the above embodiments, the invention is not limited to the embodiments, but may be embodied in many other equivalent forms without departing from the spirit or scope of the invention, which is set forth in the following claims.