CN114504147A - Gauze mask made of knitted fabric - Google Patents

Abstract

A mask made of knitted fabric comprises a piece of knitted fabric and two ear hooks, wherein the two ear hooks and the knitted fabric are knitted together and are respectively positioned on two sides of the knitted fabric. The knitted fabric is composed of a double-layer knitting structure and a single-layer knitting structure, the double-layer knitting structure is used for forming the foundation of the knitted fabric, the single-layer knitting structure defines at least one bending line, the single-layer knitting structure is only connected with one of two surface-layer textures to which the double-layer knitting structure belongs, and the bending line is a valley folding line or a mountain folding line determined by the connection of the single-layer knitting structure and the double-layer knitting structure. The present invention is formed by the double-layer knitting structure and the single-layer knitting structure, so that the knitted fabric can define the at least one bending line by utilizing the single-layer knitting structure, and the knitted fabric can be folded.

Description

Gauze mask made of knitted fabric

Technical Field

The invention relates to a mask made of knitted fabric, in particular to a mask with knitted fabric consisting of a double-layer knitted structure and a single-layer knitted structure.

Background

There are various masks, such as cloth Mask made of cotton cloth, and Pitta Mask made of polyurethane material and manufactured by ARAX of Japan. Wherein, to cloth gauze mask, this type of gauze mask is constituteed with the mode of concatenation between the fabric more, and cloth cover concatenation line easily produces the friction with the face of wearer after the person of wearing cloth gauze mask, and causes the wearer uncomfortable. In addition, although the Pitta Mask is an integrally formed structure, the product cannot be folded randomly, and the folded Mask is difficult to reduce in size after a wearer takes off the Mask, so that the Mask is inconvenient for the wearer to store.

Furthermore, although taiwan patent TW I511758 discloses a fabric mask capable of improving portability and storage, it can be found from the description of the present application that after knitting, the mask needs to be shaped by ultrasonic welding to form a fold, which results in a complicated manufacturing process. In addition, the two ear hooks used by the mask are additionally sewn on the mask body after the mask body is knitted, the extra ear hook sewing step makes the production steps complicated, and when the ear hooks are carelessly and not really connected to the mask body or a wearer pulls the ear hooks with great force, the ear hooks are easy to separate from the mask body.

Disclosure of Invention

The invention mainly aims to solve the problem that the existing cloth mask or the mask made of polyurethane material cannot be folded.

The invention also aims to solve the problem that the process steps of the existing foldable fabric mask are complicated.

The present invention provides a mask made of knitted fabric, comprising a knitted fabric and two hangers respectively knitted with the knitted fabric at the two sides of the knitted fabric, wherein the knitted fabric is composed of a double-layer knitting structure and a single-layer knitting structure, the double-layer knitting structure is the basis for forming the knitted fabric, the single-layer knitting structure defines at least one bending line for folding the knitted fabric, the single-layer knitting structure is connected with only one of the two side-layer knitting structures of the double-layer knitting structure, and the bending line is a valley folding line or a mountain folding line determined by the connection of the single-layer knitting structure and the double-layer knitting structure.

In one embodiment, the two ear loops are tubular fabrics formed by knitting bags, and the two ear loops are connected with the knitted fabrics by intarsia knitting.

In one embodiment, the single-layer knitted structure forms a plurality of the bending lines, the bending lines include a plurality of longitudinal bending lines arranged at intervals and a plurality of oblique bending lines respectively connected between any two adjacent longitudinal bending lines, and each oblique bending line intersects with another oblique bending line on one of the longitudinal bending lines.

In an embodiment, a plurality of rhombus images arranged in succession are formed on the surface of the knitted fabric by the oblique bending lines, and the rhombus images are larger than the other rhombus images in the center of the knitted fabric.

In one embodiment, the knitted fabric has an antimicrobial yarn added by plating knitting on one side of the double knit structure.

In one embodiment, the antimicrobial yarn is a graphene yarn.

In one embodiment, the two opposite sides of the knitted fabric not adjacent to the two ear loops are different in shape.

In one embodiment, the two ear loops define two parallel imaginary lines respectively connecting the two ear loops, the two imaginary lines divide the knitted fabric into a first side block, a middle block and a second side block from top to bottom, and the knitted fabric is knitted by a reverse knitting on a portion of the first side block close to the center line of the knitted fabric and a portion of the second side block close to the center line of the knitted fabric.

Compared with the prior art, the invention has the following characteristics: the double-layer knitting structure and the single-layer knitting structure are formed on the knitted fabric, so that the knitted fabric takes the single-layer knitting structure as the at least one bending line, and the knitted fabric is prevented from being unable to be accommodated and presenting a loose state when not being used.

The invention is described in detail below with reference to the drawings and specific examples, but the invention is not limited thereto.

Drawings

Fig. 1 is a schematic front view of a fabric mask in accordance with an embodiment of the present invention;

fig. 2 is a schematic view of an unfolded knitted fabric structure according to an embodiment of the present invention;

fig. 3 is a schematic view of a folded knitted fabric structure according to an embodiment of the present invention;

fig. 4 is a schematic view of the mask according to an embodiment of the present invention after being folded.

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Detailed Description

The present invention is described in detail and technical content with reference to the accompanying drawings, wherein:

referring to fig. 1 to 4, the present invention provides amask 10 made of knitted fabric, themask 10 includes a knittedfabric 11 and twoear loops 13, 14, the twoear loops 13, 14 are respectively located on the knittedfabric 11

On both sides, the twoear loops 13, 14 are not disposed on the knittedfabric 11 in an extra splicing manner, but are integrally formed on the knittedfabric 11, that is, the twoear loops 13, 14 and the knittedfabric 11 are knitted together.

Further, the knittedfabric 11 is composed of a double-layer knittedstructure 111 and a single-layer knittedstructure 112. The double-layer knittedstructure 111 is a basis for forming the knittedfabric 11, the double-layer knittedstructure 111 includes twosurface layer textures 113 and 114 and across-linked texture 115 cross-linking the twosurface layer textures 113 and 114, the single-layer knittedstructure 112 has only a singlesurface layer texture 116, thesurface layer texture 116 to which the single-layer knittedstructure 112 belongs is connected to only one of the twosurface layer textures 113 and 114 to which the double-layer knittedstructure 111 belongs, and thesurface layer texture 116 to which the single-layer knittedstructure 112 belongs may be integrally formed with one of the twosurface layer textures 113 and 114 to which the double-layer knittedstructure 111 belongs. For purposes of fig. 2, theshell side stitch 116 of the single-layer knittedstructure 112 may be connected to theshell side stitch 113 of the double-layer knittedstructure 111, or theshell side stitch 116 of the single-layer knittedstructure 112 may be connected to theshell side stitch 114 of the double-layer knittedstructure 111. Moreover, since the Flexural rigidity (Flexural rigidity) of the single-layer knittedstructure 112 is less than that of the double-layer knittedstructure 111, the single-layer knittedstructure 112 defines at least onebending line 117 to allow the knittedfabric 11 to be folded, and the at least onebending line 117 is a valley fold line or a mountain fold line determined by the connection between the single-layer knittedstructure 112 and the double-layer knittedstructure 111. For example, referring to fig. 2, if thebending line 117 is the mountain folding line, the single-layer knittedstructure 112 is connected to thesurface layer structure 113 of the double-layer knittedstructure 111, and thebending line 117 makes the double-layer knittedstructure 111 present an inverted V-shaped bending. On the contrary, when thebending line 117 is the valley folding line, the single-layer knittedstructure 112 is connected to thesurface layer structure 114 of the double-layer knittedstructure 111, and thebending line 117 makes the double-layer knittedstructure 111 to be bent in a V-shape, as shown in fig. 3.

In the invention, the knittedfabric 11 is composed of the double-layer knittedstructure 111 and the single-layer knittedstructure 112, so that the knittedfabric 11 defines thebending line 117 by the single-layer knittedstructure 112, and the knittedfabric 11 can be folded to improve the portability of themask 10. Furthermore, the present invention forms the double-layer knitting structure 111 and the single-layer knitting structure 112 simultaneously when knitting the knittedfabric 11, that is, the present invention forms thebending line 117 simultaneously during the knitting process, without forming thebending line 117 by using the existing additional process steps, thereby simplifying the process of the knittedfabric 11.

In an embodiment, the twoear loops 13, 14 are respectively atubular fabric 131 formed by knitting a bag, and the twoear loops 13, 14 are connected to the knittedfabric 11 by an Intarsia knitting (Intarsia). The art of intarsia knitting is well known to those skilled in the art and will not be described herein.

Referring to fig. 1 to 4, in one embodiment, the single-layerknitted structure 112 forms a plurality of thebending lines 117, the bendinglines 117 include a plurality oflongitudinal bending lines 118 and a plurality ofoblique bending lines 119, thelongitudinal bending lines 118 are disposed at intervals, and thelongitudinal bending lines 118 can be the mountain folding lines or the valley folding lines, respectively. Moreover, theoblique bending lines 119 are respectively connected between any two adjacentlongitudinal bending lines 118, and eachoblique bending line 119 intersects with anotheroblique bending line 119 on one of the longitudinal bending lines 118. In one embodiment, theoblique bending lines 119 can be the mountain bending lines, respectively.

Further, referring to fig. 1 again, in an embodiment, a plurality of diamond-shapedimages 122 are formed on the surface of the knittedfabric 11 by a portion of thediagonal bending lines 119, the diamond-shapedimages 122 are arranged in succession at positions of the knittedfabric 11 that are not adjacent to the edges, and the diamond-shapedimages 122 are located at the center of the knittedfabric 11 and are larger than the remaining diamond-shapedimages 122. Furthermore, the remainingoblique bending lines 119 are respectively connected to a side of one of the diamond-shapedimages 122 away from another of the diamond-shapedimages 122.

In another aspect, in an embodiment of the present invention, the knittedfabric 11 is configured to fit the nose and the chin of the wearer, and the two opposite sides of the knittedfabric 11 not adjacent to the twoear loops 13, 14 have different shapes. Specifically, the twoear loops 13, 14 define twoimaginary lines 132, 133 which are parallel to each other and respectively connect the twoear loops 13, 14, and the knittedfabric 11 divides afirst side block 123, amiddle block 124 and a second side block from top to bottom by the twoimaginary lines 132, 133. Further, assuming that the direction of the knittedfabric 11 is shown in the drawing of fig. 1, thefirst side block 123 corresponds to the nose of the wearer, thesecond side block 125 corresponds to the chin of the wearer, and the area of thefirst side block 123 is larger than the area of thesecond side block 125, so that the knittedfabric 11 can be specifically matched with the face of the wearer, and the wearer can further determine the wearing direction of themask 10 by the difference between thefirst side block 123 and thesecond side block 125. Further, the knittedfabric 11 is knitted by a Partial knitting (Partial knitting) at a portion of thefirst side block 123 close to thecentral line 126 of the knittedfabric 11 and at a portion of thesecond side block 125 close to thecentral line 126 of the knittedfabric 11, so that the portion of the knittedfabric 11 close to thecentral line 126 of the knittedfabric 11 at thefirst side block 123 and the portion of thesecond side block 125 close to thecentral line 126 of the knittedfabric 11 have a curvature, thereby fitting the nose and the chin of a wearer.

In addition, in an embodiment, in order to enhance the antibacterial function of the knittedfabric 11, the knittedfabric 11 has an antibacterial yarn on one side of the double-layer knitting structure 111, and the antibacterial yarn is added to the knittedfabric 11 by plating knitting during the knitting process of the knittedfabric 11. In one embodiment, the antimicrobial yarn is a graphene yarn.

The present invention may be embodied in other specific forms without departing from the spirit or essential attributes thereof, and it should be understood that various changes and modifications can be effected therein by one skilled in the art without departing from the spirit and scope of the invention as defined in the appended claims.

Claims (10)

1. A mask made of a knitted fabric, comprising:

a knitted fabric, which is composed of a double-layer knitting structure and a single-layer knitting structure, wherein the double-layer knitting structure is used for forming the foundation of the knitted fabric, the single-layer knitting structure defines at least one bending line so that the knitted fabric can be folded, the single-layer knitting structure is only connected with one of two surface layer tissues to which the double-layer knitting structure belongs, and the bending line is a valley fold line or a mountain fold line determined by the connection of the single-layer knitting structure and the double-layer knitting structure; and

and the two ear hangers are knitted together with the knitted fabric, and are respectively positioned on two sides of the knitted fabric.

2. The mask made of knitted fabric according to claim 1, wherein the two ear loops are respectively a tubular fabric formed by knitting a bag, and the two ear loops are connected with the knitted fabric by an intarsia knitting.

3. The mask made of knitted fabric according to claim 1 or 2, wherein the single-layer knitted structure forms a plurality of the bending lines, the bending lines include a plurality of longitudinal bending lines arranged at intervals, and a plurality of diagonal bending lines respectively connected between any two adjacent longitudinal bending lines, and each diagonal bending line intersects with another diagonal bending line on one of the longitudinal bending lines.

4. The mask made of knitted fabric according to claim 3, wherein a portion of the plurality of diagonal bending lines form a plurality of diamond-shaped patterns arranged in succession on the surface of the knitted fabric, and the diamond-shaped patterns located at the center of the knitted fabric are larger than the remaining diamond-shaped patterns.

5. The mask made of knitted fabric according to claim 1 or 2, wherein the knitted fabric has an antibacterial yarn added by plating knitting on one side of the double knit structure.

6. The mask of claim 5 wherein the antimicrobial yarn is a graphene yarn.

7. The mask made of knitted fabric according to claim 6, wherein the knitted fabric is different in shape between two opposite sides of the knitted fabric not adjacent to the two ear loops.

8. The mask made of knitted fabric according to claim 7, wherein the two ear loops define two parallel imaginary lines connecting the two ear loops, respectively, the two imaginary lines are a first side block, a middle block and a second side block from top to bottom, the knitted fabric is knitted by a back-leading knitting on the portion of the first side block near the center line of the knitted fabric and on the portion of the second side block near the center line of the knitted fabric.

9. The mask made of knitted fabric according to claim 1 or 2, wherein the two opposite sides of the knitted fabric not adjacent to the two ear loops are different in shape.

10. The mask made of knitted fabric according to claim 9, wherein the two ear loops define two parallel imaginary lines connecting the two ear loops, respectively, the two imaginary lines are a first side block, a middle block and a second side block from top to bottom, the knitted fabric is knitted by a back-leading knitting on the portion of the first side block near the center line of the knitted fabric and on the portion of the second side block near the center line of the knitted fabric.

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