CN114318525A

Movatterモバイル変換

Info

Publication number: CN114318525A
Application number: CN202111591468.9A
Authority: CN
Inventors: 仲光宇
Original assignee: Beijing Naura Microelectronics Equipment Co Ltd
Current assignee: Beijing Naura Microelectronics Equipment Co Ltd
Priority date: 2021-12-23
Filing date: 2021-12-23
Publication date: 2022-04-12

Abstract

The invention provides a semiconductor epitaxial device and a method for adjusting the coaxiality of a base and a preheating ring of the semiconductor epitaxial device, wherein the semiconductor epitaxial device comprises a coaxiality adjusting system which is used for adjusting the coaxiality between the base and the preheating ring, and the coaxiality adjusting system comprises: the distance measuring device is used for detecting actual gaps between a plurality of preset positions on the edge of the base and the preheating ring in the radial direction of the preheating ring, and the plurality of preset positions are distributed at intervals in the circumferential direction of the base; the adjusting mechanism is used for adjusting the positions of the base in a plurality of radial directions of the preheating ring, and the plurality of radial directions correspond to the plurality of preset positions one by one; and the controller is used for acquiring a target gap between the base and the preheating ring, and controlling the adjusting mechanism to adjust the position of the base in the corresponding radial direction according to the difference value of the target gap and the actual gap corresponding to each preset position, so that the coaxiality of the base and the preheating ring meets the requirement, automatic detection and automatic adjustment are realized, and the precision and the efficiency are high.

Description

Semiconductor epitaxial equipment and method for adjusting coaxiality of base and preheating ring of semiconductor epitaxial equipment

Technical Field

The invention relates to the technical field of semiconductor processing, in particular to semiconductor epitaxial equipment and a method for adjusting the coaxiality of a base and a preheating ring of the semiconductor epitaxial equipment.

Background

Chemical Vapor Deposition (CVD) is widely used in the field of semiconductor processing, and specifically refers to a process in which one or more gases introduced through an inlet line are chemically reacted at a certain temperature to produce a solid substance that is deposited on the surface of a substrate (e.g., a wafer) to form a coating or film.

The CVD epitaxial apparatus is an important apparatus for performing a wafer epitaxial growth process by using a CVD technique, and a reaction chamber of the CVD epitaxial apparatus is generally provided with a susceptor for supporting a wafer and a preheating ring surrounding the susceptor, wherein the preheating ring absorbs heat from a heat source and radiates near the edge of the susceptor to achieve uniform heating of the susceptor and/or gas in the chamber. In order to meet the controllability and stability of the technological process, the coaxiality of the base and the preheating ring is ensured to meet the requirement as the premise of the uniformity of the airflow field on the surface of the wafer.

In the prior art, when adjusting the coaxiality of the susceptor and the preheating ring, an operator is usually required to manually measure the actual gap between the susceptor and the preheating ring by using a measuring tool such as a vernier caliper, and then manually adjust a micrometer of the susceptor adjusting mechanism to change the position of the susceptor, and then measure the actual gap again, and so on until the actual gap between the susceptor and the preheating ring meets the standard gap corresponding to the required coaxiality. However, whether the actual gap is measured manually or the base position is adjusted manually, the actual gap needs to be determined by observation with the naked eye of an operator, and the accuracy and the repeatability are poor. In addition, the above adjustment method requires repeated adjustment, and the adjustment efficiency is low.

Disclosure of Invention

The invention aims to at least solve one technical problem in the prior art, and provides semiconductor epitaxial equipment and a method for adjusting the coaxiality of a base and a preheating ring of the semiconductor epitaxial equipment.

In a first aspect, the present invention provides a semiconductor epitaxial apparatus, including a reaction chamber, a susceptor and a preheating ring surrounding the susceptor in the reaction chamber, the semiconductor epitaxial apparatus further including a coaxiality adjusting system for adjusting a coaxiality between the susceptor and the preheating ring, the coaxiality adjusting system including: the distance measuring device is arranged outside the top of the reaction chamber and is positioned above the base and the preheating ring, the top of the reaction chamber is provided with a light-transmitting part, and the distance measuring device can detect actual gaps between a plurality of preset positions on the edge of the base and the preheating ring in the radial direction of the preheating ring through the light-transmitting part, wherein the preset positions are distributed at intervals in the circumferential direction of the base; the adjusting mechanism is arranged on the outer side of the bottom of the reaction chamber and used for adjusting the positions of the base in a plurality of radial directions of the preheating ring, wherein the plurality of radial directions correspond to the plurality of preset positions one by one; and the controller is arranged outside the reaction chamber, is in communication connection with the distance measuring device and the adjusting mechanism, and is used for acquiring a target gap between the base and the preheating ring and controlling the adjusting mechanism to adjust the position of the base in the corresponding radial direction according to the difference value of the target gap and the actual gap corresponding to each preset position so as to enable the coaxiality of the base and the preheating ring to meet the requirement.

Further, the plurality of preset positions at least comprise a first preset position and a second preset position, the radial directions corresponding to the first preset position and the second preset position are a first radial direction and a second radial direction respectively, and the first radial direction and the second radial direction are perpendicular to each other; the adjusting mechanism comprises a first adjusting unit and a second adjusting unit, the controller is in communication connection with the first adjusting unit and the second adjusting unit, and the first adjusting unit and the second adjusting unit are respectively used for adjusting the position of the base in the first radial direction and the second radial direction.

Further, still including rotating connecting piece and back shaft, the back shaft is connected in order to support the base in the below of base, it is located reaction chamber's the bottom outside to rotate the connecting piece, the back shaft is worn out the back outwards by reaction chamber's bottom and is connected with the rotation connecting piece, first regulating unit includes first rotating electrical machines and first transmission structure, first transmission structure connects between first rotating electrical machines and rotation connecting piece, and can convert the rotary motion of first rotating electrical machines output into the linear movement who rotates the connecting piece along first radial direction, with this drive back shaft motion, thereby adjust the position of base in first radial direction.

Further, the first transmission structure includes: the first rotating motor is in driving connection with the worm so as to drive the worm to rotate around a first rotating shaft extending along a first radial direction, and the worm is driven to rotate around a second rotating shaft perpendicular to the first rotating shaft through meshing transmission of the worm and the worm wheel and simultaneously move along the first radial direction; the middle transmission part comprises a worm wheel matching part and a moving support matching part, wherein the worm wheel matching part is matched with the worm wheel, and circumferential limiting is performed between the worm wheel matching part and the worm wheel so that the middle transmission part and the worm wheel can synchronously move; the movable support matching part is matched with the movable support, the movable support matching part can rotate freely relative to the movable support, and the middle transmission part can drive the movable support to move along the first radial direction through the movable support matching part when moving along the first radial direction of the worm wheel.

Furthermore, the first transmission structure further comprises a fixed support, the intermediate transmission member further comprises a fixed support matching portion, a first tooth portion is arranged on the fixed support matching portion, the first tooth portion extends along the circumferential direction of the intermediate transmission member, a second tooth portion is arranged on the fixed support, the second tooth portion extends along the first radial direction, and the first tooth portion is meshed with the second tooth portion so that the fixed support matching portion can move on the fixed support.

Further, the movable support is movably arranged on the fixed support, the movable support comprises a main body part and a bending part connected to at least one end of the main body part, the rotating connecting piece is connected with the main body part, the fixed support is provided with a penetrating groove which is formed in a penetrating mode along the extending direction of the second rotating shaft, the second tooth part is arranged on one side groove wall of the penetrating groove, the penetrating groove is arranged between the bending part and the worm wheel, the fixed support matching part of the intermediate transmission part is arranged in the penetrating groove, and the movable support matching part of the intermediate transmission part is matched with the bending part after penetrating through the penetrating groove.

Furthermore, the through grooves are two symmetrically arranged relative to the plane of the worm wheel, and the bending parts are two symmetrically arranged relative to the plane of the worm wheel.

Further, the second adjusting unit comprises a base, a guide structure, a second rotating motor and a second transmission structure, the first adjusting unit is arranged on the base, the base is movably arranged on the guide structure along the second radial direction, the second transmission structure is connected between the second rotating motor and the base, and the rotating motion output by the second rotating motor can be converted into linear motion of the base along the second radial direction, so that the position of the base in the second radial direction is adjusted.

Further, the distance measuring device comprises a laser distance measuring sensor or an infrared distance measuring sensor.

In a second aspect, the present invention further provides a method for adjusting the coaxiality of a susceptor and a preheating ring of a semiconductor epitaxial apparatus, which is applied to the semiconductor epitaxial apparatus, and comprises the following steps: detecting actual gaps between a plurality of preset positions on the edge of the base and the preheating ring in the radial direction of the preheating ring, wherein the plurality of preset positions are distributed at intervals in the circumferential direction of the base; acquiring a target gap between the base and the preheating ring; and controlling the adjusting mechanism to adjust the position of the base in the corresponding radial direction according to the difference value of the target gap and the actual gap corresponding to each preset position, so that the coaxiality of the base and the preheating ring meets the requirement.

The invention has the following beneficial effects:

compared with the conventional manual gap measurement and manual base position adjustment modes, the coaxiality adjusting system of the semiconductor epitaxial equipment has the advantages that the distance measuring device of the coaxiality adjusting system can automatically and quickly detect actual gaps between a plurality of preset positions on the edge of the base and the preheating ring, and is high in precision and good in repeatability; in addition, through the cooperation of the distance measuring device, the adjusting mechanism and the controller of the coaxiality adjusting system, the automatic position adjustment of the base can be realized according to the result of automatically detecting the actual gap and the corresponding target gap, so that the coaxiality adjustment between the base and the preheating ring is finally realized, the automation degree is higher, the adjusting precision and the adjusting efficiency are effectively improved, and the operability of hardware debugging of equipment is improved.

Drawings

FIG. 1 is a schematic diagram of a susceptor and a preheating ring in the prior art;

FIG. 2 is a schematic sectional view taken along line A-A of the susceptor and preheat ring of FIG. 1;

FIG. 3 is a schematic structural diagram of a susceptor, a preheating ring, a supporting shaft and a susceptor adjusting structure in the prior art;

FIG. 4 is a schematic view of the base adjustment structure of FIG. 3;

FIG. 5 is a schematic cross-sectional view of the base adjustment structure of FIG. 4 taken along line B-B;

fig. 6 is a schematic structural view of a susceptor and a preheat ring of a semiconductor epitaxial apparatus according to an embodiment of the present invention;

FIG. 7 is a schematic view showing the positional relationship between the susceptor and the preheating ring of FIG. 6 when they are coaxial, showing the positional relationship among the distance measuring device for detecting the gap between the susceptor and the preheating ring, the reaction chamber, and the supporting structure (the rotary connector and the supporting shaft);

FIG. 8 is a schematic diagram showing the relationship between the susceptor and the preheating ring in FIG. 6;

fig. 9 is a schematic structural view of an adjustment mechanism of a semiconductor epitaxial apparatus according to an embodiment of the present invention;

FIG. 10 is a schematic view of the adjusting mechanism of FIG. 9 from the perspective of direction H;

FIG. 11 is a schematic structural view of a fixed bracket of the adjustment mechanism of FIG. 9;

FIG. 12 is a schematic structural view of a fixing bracket (also viewed in the H direction) of the adjustment mechanism of FIG. 10;

FIG. 13 is a schematic view of the intermediate drive of the adjustment mechanism of FIG. 9;

FIG. 14 is a schematic view of another angle of the intermediate drive of FIG. 13;

FIG. 15 is a schematic structural view of a moving bracket of the adjustment mechanism of FIG. 9;

FIG. 16 is a schematic cross-sectional view taken along line C-C of the mobile carriage of FIG. 15;

fig. 17 is a schematic flow diagram of a method for adjusting the concentricity of a susceptor and a preheat ring of a semiconductor epitaxial apparatus in accordance with one embodiment of the present invention;

FIG. 18 is a control flow diagram of adjusting the coaxiality of the X-axis extension direction in the method of FIG. 17;

fig. 19 is a control flow chart for adjusting the coaxiality in the Y-axis extending direction in the method of fig. 17.

Detailed Description

In order to make those skilled in the art better understand the technical solution of the present invention, the semiconductor epitaxial apparatus and the method for adjusting the coaxiality of the susceptor and the preheating ring thereof provided by the present invention are described in detail below with reference to the accompanying drawings.

As shown in fig. 1 and 2, a susceptor 1 and apreheating ring 2 are disposed in a reaction chamber of a conventional semiconductor epitaxial apparatus, thepreheating ring 2 surrounds the susceptor 1, the edge of the susceptor 1 is not in contact with thepreheating ring 2, and a space therebetween forms a gap between the susceptor 1 and thepreheating ring 2. When the coaxiality of the susceptor 1 and thepreheating ring 2 is satisfactory, the gap between the susceptor 1 and thepreheating ring 2 is used as a standard gap. For example, if the inner diameter of the preheatingring 2 is D and the diameter of the susceptor 1 is D, the standard clearance is (D-D)/2. After the actual gap between the base 1 and thepreheating ring 2 is manually measured by using a measuring tool such as a vernier caliper, the actual gap is compared with the standard gap, the base adjusting mechanism is manually adjusted, the actual gap is measured again after the position of the base is adjusted, and the steps are repeated until the measured actual gap meets the standard gap (the actual gap is equal to the standard gap or the error of the actual gap and the standard gap is within an allowable range), and the coaxiality is considered to meet the requirement.

As shown in fig. 3 to 5, the conventional base adjustment mechanism includes atray 3, anX-direction adjustment block 4, anX-direction micrometer 5, a Y-direction adjustment block 6, a Y-direction micrometer 7, an adjustmentblock fixing plate 8, and a fixing screw. Wherein, Xdirection regulating block 4 and Ydirection regulating block 6 set up intray 3 top, and regulating block fixeddisk 8 sets up intray 3 below, and Xdirection regulating block 4 and Ydirection regulating block 6 all are through set screw and 8 fixed connection of regulating block fixed disk. TheX-direction micrometer 5 drives theX-direction adjustment block 4 to move in the X-axis direction relative to thetray 3, and the Y-direction micrometer 7 drives the Y-direction adjustment block 6 to move in the Y-axis direction relative to thetray 3. The X-direction adjustingblock 4 and the Y-direction adjusting block 6 are arranged in a crossed manner, a space for accommodating the universal ball head 9-1 is formed at the crossed position of the X-direction adjusting block and the Y-direction adjusting block, and the universal ball head 9-1 is installed in the space. The first end of the supporting shaft 9-2 is inserted into the universal ball head 9-1, the second end is connected with the base 1, the supporting shaft 9-2 is positioned at a certain position between the two ends for limiting and fixing to form a fulcrum, and the supporting shaft 9-2 can swing around the fulcrum.

It is assumed that it is judged from the measured actual gap that the susceptor 1 should be shifted in the positive X-axis direction. At the moment, theX-direction micrometer 5 is rotated clockwise, theX-direction adjusting block 4 is driven to move towards the X-axis negative direction, the adjustingblock fixing disc 8, the Y-direction adjusting block 6 and the universal ball head 9-1 are driven to move towards the X-axis negative direction in the same direction, the universal ball head 9-1 drives the first end of the supporting shaft 9-2 to move towards the X-axis negative direction, and due to the existence of the supporting points, the second end of the supporting shaft 9-2 can move towards the opposite X-axis positive direction, so that the base 1 is driven to deviate along the X-axis positive direction. When the base 1 needs to be shifted along the X-axis negative direction, theX-direction micrometer 5 is rotated anticlockwise. In addition, the operation process requiring the positive/negative shift of the base 1 along the Y-axis is similar to the above-described process, and will not be described again.

However, the conventional adjusting method for the coaxiality of the susceptor 1 and the preheatingring 2 requires an operator to observe and determine the actual gap manually or adjust the position of the susceptor manually, and is poor in precision and repeatability. In addition, the above adjustment method requires repeated adjustment, and the adjustment efficiency is low.

In order to solve the above problems in the prior art, the present invention provides a semiconductor epitaxial apparatus capable of quickly and accurately adjusting the coaxiality between a susceptor and a preheating ring.

As illustrated in fig. 6 and 7, in some embodiments, the semiconductor epitaxial apparatus includes areaction chamber 100, and the inside of thereaction chamber 100 is provided with asusceptor 10 and apreheating ring 20 surrounding thesusceptor 10. Thesusceptor 10 is used to support a workpiece (e.g., a wafer), and thepreheating ring 20 is used to absorb heat from a heat source and radiate near the edge of thesusceptor 10 to achieve uniform heating of thesusceptor 10 and/or the gas in thereaction chamber 100. The preheatingring 20 is generally fixedly disposed in thereaction chamber 100, for example, the outer edge of the preheatingring 20 is fixedly connected to the circumferential wall of thereaction chamber 100, the position of the preheatingring 20 does not change, and the position of thesusceptor 10 in thereaction chamber 100 can be adjusted. The edge of thesusceptor 10 is not in contact with the preheatingring 20, and a space, which forms a gap between the susceptor 10 and the preheatingring 20, exists between the edge of thesusceptor 10 and the inner side edge of the preheatingring 20.

It is understood that the preheatingring 20 has a plurality of radial directions (i.e., linear directions along the diameter of the preheating ring 20), and any one position on the edge of thesusceptor 10 corresponds to one radial direction of the preheatingring 20, and in this one radial direction, the space between the position on the edge of thesusceptor 10 and the inner side edge of the preheatingring 20 forms a gap between the position and the preheatingring 20.

As shown in fig. 6 and 7, in some embodiments, the outer contour of thesusceptor 10 is adapted to the inner circumference of the preheatingring 20, for example, both are circular. The semiconductor epitaxial apparatus further includes asupport structure 50, and thesupport structure 50 is attached below thesusceptor 10 to support it. When the central axis of thesusceptor 10 and the central axis of the preheatingring 20 are completely coincident, the coaxiality of the two is optimal, and the gaps between the respective positions of the edge of thesusceptor 10 and the preheatingring 20 are equal, and the gaps can be regarded as target gaps.

For example, as shown in FIG. 7, in the case where the coaxiality of thesusceptor 10 and the preheatingring 20 is optimal, two positions opposed to each other on the edge of thesusceptor 10 are L₁And L₂The connection position of thebase 10 and the supportingstructure 50 is L₀Position L₁Clearance from thepreheat ring 20 and location L₂Equal to the gap between the preheating rings 20, which is the target gap. Further, as shown in fig. 8, thesusceptor 10 may have poor coaxiality with the preheatingring 20 in a practical case, and two positions opposite to each other on the edge of thesusceptor 10 are L₁L and L₂L, the connection position of thebase 10 and the supportingstructure 50 is L₀"position L₁The gap between the preheatingring 20 is far larger than the position L₂Preheating and preheatingThe gap between therings 20, at which point the position L can be set₂The gap between the ″ and the preheatingring 20 is used as an actual gap, and the position of thesusceptor 10 is adjusted according to the difference between the target gap and the actual gap with reference to the target gap, so that thesusceptor 10 can be located at a position where the coaxiality is satisfactory as shown in fig. 7, for example.

It should be noted that the "coaxiality is satisfactory" is not limited to thesusceptor 10 and the preheatingring 20 having their central axes completely coincident, and in other embodiments, if the central axis of thesusceptor 10 and the central axis of the preheatingring 20 have a slight deviation, but the deviation is within the allowable range, the coaxiality of the two can be considered satisfactory. At this time, gaps between the respective positions of the edge of thesusceptor 10 and the preheatingring 20 may be different, that is, there may be a plurality of target gaps having different values. In this case, when the coaxiality is adjusted, after the actual gap is measured for a certain position on the edge of thesusceptor 10, a target gap corresponding to the position may be selected as a reference.

Specifically, the semiconductor epitaxial apparatus further includes a coaxiality adjusting system for adjusting the coaxiality between the susceptor 10 and the preheatingring 20. As shown in fig. 6 to 8, the coaxiality adjusting system includes adistance measuring device 30, and thedistance measuring device 30 is used for detecting actual gaps between a plurality of preset positions on the edge of thesusceptor 10 and the preheatingring 20 in the radial direction of the preheatingring 20. Wherein a plurality of preset positions are distributed at intervals along the circumferential direction of thebase 10. The number of the predetermined positions is not limited and can be selected according to practical needs, but at least two positions are ensured, so that the effective adjustment of the coaxiality of thesusceptor 10 and the preheatingring 20 can be realized. In addition, the specific type of thedistance measuring device 30 is not limited, and may be any device capable of detecting the actual gap and automatically outputting the detection result to the controller.

As shown in fig. 7, in some embodiments, thedistance measuring device 30 is disposed outside the top of thereaction chamber 100 and above thesusceptor 10 and the preheatingring 20, the top of thereaction chamber 100 has a light-transmitting portion, and thedistance measuring device 30 can detect an actual gap between a plurality of preset positions on the edge of thesusceptor 10 and the preheatingring 20 in a radial direction of the preheatingring 20 through the light-transmitting portion. Thedistance measuring device 30 is a non-contact photoelectric distance measuring sensor, such as a laser distance measuring sensor, an infrared distance measuring sensor, etc. Further, in the specific embodiment shown in fig. 7, thereaction chamber 100 includes achamber body 101 and atransparent cover 102, the top of thechamber body 101 has an opening, thetransparent cover 102 is disposed on the top of thechamber body 101 to close the opening, thechamber body 101 and thetransparent cover 102 jointly enclose an inner cavity of thereaction chamber 100, thetransparent cover 102 forms the light-transmitting portion, and thedistance measuring device 30 is installed on a side of thetransparent cover 102 facing away from thechamber body 101. Thetransparent cover 102 may be made of transparent material such as acryl, quartz, etc. The light beam emitted from thedistance measuring device 30 can be aligned to the gap corresponding to the preset position through thetransparent cover 102, so that the actual gap corresponding to the preset position can be detected.

It should be noted that thedistance measuring devices 30 may be provided in multiple numbers, and the number of thedistance measuring devices 30 is the same as the number of the preset positions, and the multipledistance measuring devices 30 are respectively used for detecting the actual gaps of the multiple preset positions; alternatively, the number of thedistance measuring devices 30 is one or more, and the number of thedistance measuring devices 30 is less than the number of the preset positions, at this time, the position of at least one of thedistance measuring devices 30 on thetransparent cover 102 is adjustable, and the actual gap between different preset positions can be detected by adjusting the position of thedistance measuring device 30.

In addition, the light-transmitting portion of the top of thereaction chamber 100 is not limited to thetransparent cover 102, and in other embodiments not shown in the drawings, the light-transmitting portion may be formed in other manners, for example, thereaction chamber 100 includes a chamber body having an opening at the top and a cover body for blocking the opening, the cover body is provided with a transparent window, the transparent window vertically corresponds to the gap between the base 10 and the preheatingring 20, and the rest of the cover body except the transparent window is made of a non-transparent material. Thedistance measuring device 30 can also detect the actual gap between the susceptor 10 and the preheatingring 20 through the transparent window.

As shown in fig. 9 and 10, the coaxiality adjustment system further includes anadjustment mechanism 40 and a controller (not shown in the drawings). Anadjusting mechanism 40 is provided outside the bottom of thereaction chamber 100, and theadjusting mechanism 40 is used to adjust the position of thesusceptor 10 in a plurality of radial directions of the preheatingring 20. The plurality of radial directions correspond to the plurality of preset positions one to one. A controller is disposed outside thereaction chamber 100 and is communicatively coupled to thedistance measuring device 30 and theadjustment mechanism 40. The controller is used for acquiring a target gap between the susceptor 10 and the preheatingring 20, and controlling theadjusting mechanism 40 to adjust the position of thesusceptor 10 in the corresponding radial direction according to the difference value of the target gap and the actual gap corresponding to each preset position, so that the coaxiality of thesusceptor 10 and the preheatingring 20 meets the requirement. As can be seen from the foregoing, the phrase "proper coaxiality" means that the central axis of thesusceptor 10 and the central axis of the preheatingring 20 are completely coincident, i.e., the coaxiality of the two is optimal; alternatively, the central axis of thesusceptor 10 is slightly deviated from the central axis of the preheatingring 20, but the deviation is within an allowable range.

Compared with the existing mode of manually measuring the gap and manually adjusting the position of the base, thedistance measuring device 30 can automatically and quickly detect the actual gaps between a plurality of preset positions on the edge of thebase 10 and the preheatingring 20, and has high precision and good repeatability; in addition, through the cooperation of thedistance measuring device 30, the adjustingmechanism 40 and the controller, the position of the base 10 can be automatically adjusted according to the result of automatically detecting the actual gap and the corresponding target gap, so that the adjustment of the coaxiality between the base 10 and the preheatingring 20 is finally realized, the automation degree is higher, the adjusting precision and the adjusting efficiency are effectively improved, and the operability of hardware debugging of equipment is improved.

As shown in fig. 6, in some embodiments, the plurality of preset positions includes at least a first preset position and a second preset position. The radial directions corresponding to the first preset position and the second preset position are a first radial direction and a second radial direction respectively. The first radial direction and the second radial direction are perpendicular to each other, the first radial direction may be, for example, an X-axis extending direction, and the second radial direction may be, for example, a Y-axis extending direction. Accordingly, twodistance measuring devices 30 may be provided, and the twodistance measuring devices 30 are respectively used for detecting the actual gaps corresponding to the first preset position and the second preset position. In addition, the adjustingmechanism 40 includes a first adjusting unit and a second adjusting unit, and the controller is connected to the first adjusting unit and the second adjusting unit in a communication manner. The first and second adjusting units are used to adjust the position of the base 10 in the first and second radial directions, respectively.

Specifically, an actual gap between a first preset position on the edge of thesusceptor 10 and the preheatingring 20 in the first radial direction is a first actual gap, an actual gap between a second preset position on the edge of thesusceptor 10 and the preheatingring 20 in the second radial direction is a second actual gap, and the controller controls the first adjusting unit to adjust the position of thesusceptor 10 in the first radial direction according to the difference between the target gap and the first actual gap, and controls the second adjusting unit to adjust the position of thesusceptor 10 in the second radial direction according to the difference between the target gap and the second actual gap, so that the coaxiality of thesusceptor 10 and the preheatingring 20 is finally satisfied. The positions of the base 10 in different radial directions are respectively adjusted through the first adjusting unit and the second adjusting unit, the controller can independently control the first adjusting unit or the second adjusting unit, the control mode is simpler, and the first adjusting unit and the second adjusting unit can achieve corresponding functions by adopting simpler structures. Of course, in other embodiments, the adjustingmechanism 40 may not be divided into a plurality of adjusting units, and the position of the base 10 in different directions may be adjusted by changing the matching relationship between the internal components of theadjusting mechanism 40, but the structure is generally complicated and is not conducive to manufacturing.

It should be noted that the preset position is not limited to the first preset position and the second preset position, and other positions may be used as the preset position according to actual needs, for example, another position opposite to the first preset position along the extending direction of the X axis is used as one preset position; or taking the other position opposite to the second preset position along the Y-axis extension direction as a preset position; alternatively, a certain position or positions between the first preset position and the second preset position along the circumferential direction of the edge of the base 10 may be used as the preset positions. Accordingly, when other positions than the first preset position and the second preset position are taken as the preset positions, the adjustingmechanism 40 may further include other adjusting units than the first adjusting unit and the second adjusting unit.

As shown in fig. 7, 9 and 10, in some embodiments, the supportingstructure 50 includes a rotatingconnector 51 and a supportingshaft 52, the supportingshaft 52 is connected below thesusceptor 10 to support thesusceptor 10, the rotatingconnector 51 is located at the outer side of the bottom of thereaction chamber 100, and the supportingshaft 52 is connected to the rotatingconnector 51 after passing through the bottom of thereaction chamber 100. The first adjusting unit includes a first rotatingelectrical machine 41 and a first transmission structure, the first transmission structure is connected between the first rotatingelectrical machine 41 and the rotating connectingmember 51, and can convert the rotating motion output by the first rotatingelectrical machine 41 into linear motion of the rotating connectingmember 51 along a first radial direction (i.e., the extending direction of the X axis), and the movement of the rotating connectingmember 51 drives the supportingshaft 52 to move (for example, the supportingshaft 52 swings around a certain fulcrum, or the supportingshaft 52 moves as a whole, etc.), so as to adjust the position of the base 10 in the first radial direction. The controller is in communication connection with the firstrotating motor 41, and the rotation angle or the number of rotations output by the firstrotating motor 41 can be precisely controlled by the controller, so that the precise control of the position of thepedestal 10 in the first radial direction is realized. The specific structure of the first transmission structure is not limited, and any transmission structure can be used to convert the rotational motion output by the first rotatingelectrical machine 41 into the linear motion along the first radial direction.

As shown in fig. 9, 10, 13-16, in some embodiments, the first transmission structure includes aworm 421, aworm wheel 422, anintermediate transmission 43, and a movingbracket 44. The output shaft of the firstrotating motor 41 extends along a first radial direction (i.e., the extending direction of the X axis), and the firstrotating motor 41 is connected to theworm 421 in a driving manner to drive theworm 421 to rotate around a first rotating shaft extending along the first radial direction, and drive theworm wheel 422 to rotate around a second rotating shaft perpendicular to the first rotating shaft through the meshing transmission between theworm 421 and theworm wheel 422, and move along the first radial direction at the same time. In general, the position of theworm 421 in the first radial direction is not changed, and theworm 421 rotates along the first rotation axis only by the driving of the first rotatingelectrical machine 41, and at this time, theworm wheel 422 can be regarded as rolling along the extending direction (i.e., the first radial direction) of theworm 421 along with the rotation of theworm 421.

The central axis ofintermediate transfer member 43 coincides with the second pivot, andintermediate transfer member 43 includes wormwheel cooperation portion 431, and wormwheel cooperation portion 431 cooperatees withworm wheel 422 and carries out circumference spacing between the two to makeintermediate transfer member 43 can move withworm wheel 422 is synchronous, rotate around the second pivot in step promptly and move along first radial direction.

Specifically, in the specific embodiment shown in fig. 9, 13 and 14, theintermediate transmission member 43 is cylindrical, the worm wheelfitting portion 431 is formed in the middle portion of theintermediate transmission member 43, theconnection key 4311 is arranged on the worm wheelfitting portion 431, the worm wheelfitting portion 431 penetrates into the middle hole of theworm wheel 422, and is circumferentially limited and matched with theworm wheel 422 through theconnection key 4311, so that the structure is simple, and the assembly and the disassembly are convenient. Of course, in other embodiments not shown in the drawings, the wormwheel matching part 431 and theworm wheel 422 can be matched in other manners, for example, the wormwheel matching part 431 and theworm wheel 422 can be directly and fixedly connected into a whole structure.

Therotary connector 51 of thesupport structure 50 is connected to the movingbracket 44, and theintermediate transmission member 43 includes a movingbracket engaging portion 432, and the movingbracket engaging portion 432 is engaged with the movingbracket 44. The movablesupport matching portion 432 is freely rotatable relative to themovable support 44, and when theintermediate transmission member 43 moves along the first radial direction along with theworm gear 422, themovable support 44 can be driven to move along the first radial direction by the movablesupport matching portion 432, so as to drive thesupport structure 50 connected to themovable support 44 to move along the first radial direction.

Specifically, in the embodiment shown in fig. 9, 10, and 14 to 16, theintermediate transmission member 43 is cylindrical, the end of theintermediate transmission member 43 forms a movablebracket matching portion 432, no protruding structure is disposed on the circumferential side wall of the movablebracket matching portion 432, themovable bracket 44 is provided with a limitinghole 4421, the diameter of the limitinghole 4421 is matched with the diameter of the movablebracket matching portion 432, and after the movablebracket matching portion 432 is inserted into the limitinghole 4421, on one hand, the movablebracket matching portion 432 can freely rotate around its central axis (coinciding with the second rotating shaft) in the limitinghole 4421, and on the other hand, when theintermediate transmission member 43 moves along the first radial direction (perpendicular to the second rotating shaft), the movablebracket matching portion 432 can abut against the hole wall of the limitinghole 4421, so as to drive themovable bracket 44 to move along the first radial direction. Of course, in other embodiments not shown in the drawings, the engagement between the movingrack engaging portion 432 and the movingrack 44 can also be implemented in other manners, for example, a rotating disk capable of freely rotating around the second rotation axis is provided on the movingrack 44, and the movingrack engaging portion 432 is fixedly connected to the rotating disk.

Above-mentioned first transmission structure passes throughworm 421,worm wheel 422,intermediate transfer member 43 and the mutual cooperation of movingsupport 44, the realization converts the rotary motion of first rotatingelectrical machines 41 output into the rectilinear movement of bearingstructure 50 along first radial direction, and the output shaft of first rotatingelectrical machines 41 can extend the setting along first radial direction, and at this moment, the output shaft of first rotatingelectrical machines 41 is parallel to each other with bearingstructure 50's moving direction, can make overall structure more compact like this, thereby reduce occupation space, more be favorable to spatial arrangement.

Of course, in other embodiments not shown in the drawings, the first transmission structure may also adopt a mode that the moving directions of the output shaft of the first rotatingelectric machine 41 and the supportingstructure 50 are perpendicular to each other, that is, the output shaft of the first rotatingelectric machine 41 extends along the direction of the second rotating shaft, and at this time, the specific structure of the first transmission structure may change, for example, the first transmission structure includes a gear and a rack, the output shaft of the first rotatingelectric machine 41 is connected with the gear in a driving manner so as to drive the gear to rotate around the second rotating shaft, and drive the rack engaged with the gear to move along the first radial direction, and the supportingstructure 50 is fixedly connected with the rack so as to realize the movement of the supportingstructure 50.

In addition, even if the output shaft of the first rotatingelectrical machine 41 and the moving direction of the supportingstructure 50 are still parallel to each other, the implementation is not limited to the above, for example, the output shaft of the first rotatingelectrical machine 41 extends along the first radial direction, the first transmission structure includes a lead screw and a nut, the output shaft of the first rotatingelectrical machine 41 is connected with the lead screw in a driving manner to drive the lead screw to rotate around the first rotating shaft, and drive the nut sleeved on the lead screw to move along the first radial direction, and the supportingstructure 50 and the nut are fixedly connected to realize the movement of the supportingstructure 50.

As shown in fig. 9-14, in some embodiments, the first transmission structure further includes a fixedbracket 45. Theintermediate transmission member 43 further includes a fixedbracket engaging portion 433, afirst tooth portion 4331 is disposed on the fixedbracket engaging portion 433, and thefirst tooth portion 4331 extends along a circumferential direction of theintermediate transmission member 43. The fixedbracket 45 is provided with asecond tooth portion 451, and thesecond tooth portion 451 extends in the first radial direction. Thefirst tooth portion 4331 is engaged with thesecond tooth portion 451 to allow the fixed bracketfitting portion 433 to move on the fixedbracket 45. On one hand, when theintermediate transmission member 43, theworm wheel 422 and the movingbracket 44 move synchronously along the first radial direction, thefirst tooth part 4331 is meshed with thesecond tooth part 451 to play a certain guiding role in the movement; on the other hand, thefirst tooth portion 4331 and thesecond tooth portion 451 which are engaged with each other are tightly fitted, so that the fixedbracket 45 can also support theintermediate transmission member 43, theworm wheel 422 and the movingbracket 44, and especially when theintermediate transmission member 43 extends in the vertical direction (fig. 9 is a top view of theadjusting mechanism 40, at this time, theintermediate transmission member 43 extends in the vertical direction), the tight fitting of thefirst tooth portion 4331 and thesecond tooth portion 451 can prevent theintermediate transmission member 43 from loosening or falling off in the vertical direction.

Specifically, in the embodiment shown in fig. 9 to 14, theintermediate transmission member 43 is cylindrical, a fixedbracket engaging portion 433 is formed on a portion of theintermediate transmission member 43 located between the wormwheel engaging portion 431 and the movingbracket engaging portion 432, and afirst tooth portion 4331 extending along a circumferential direction of the fixedbracket engaging portion 433 is provided. The movingbracket 44 is movably provided on the fixedbracket 45 in a first radial direction (i.e., an X-axis extending direction). Themovable bracket 44 includes amain body portion 441 and abent portion 442 connected to at least one end of themain body portion 441. Therotational connector 51 of thesupport structure 50 is connected to thebody portion 441. The fixingbracket 45 is provided with a throughgroove 452 penetrating along the extending direction of the second rotating shaft, and the throughgroove 452 is located between the bendingportion 442 and theworm wheel 422.

It can be understood that, as shown in fig. 9 and 10, in the extending direction of the Y axis, themain body portion 441 of the movingbracket 44 is located on the side of theworm wheel 422 facing away from theworm 421, in the extending direction of the second rotating shaft, thebent portion 442 is located on the side of the fixingbracket 45 facing away from theworm wheel 422, and meanwhile, the throughgroove 452 on the fixingbracket 45 is located between theworm wheel 422 and thebent portion 442. Theintermediate transmission member 43 is installed and matched with the intermediate hole of theworm wheel 422 through the wormwheel matching part 431, meanwhile, theintermediate transmission member 43 can also be arranged in the penetratinggroove 452 in a penetrating manner from inside to outside, the fixingsupport matching part 433 of theintermediate transmission member 43 is positioned in the penetratinggroove 452, thesecond tooth part 451 is positioned on the groove wall on one side of the penetratinggroove 452, and thefirst tooth part 4331 on the fixingsupport matching part 433 is meshed with thesecond tooth part 451. The throughgroove 452 extends along a first radial direction (i.e., the extending direction of the X axis), and the fixingbracket matching portion 433 can move along the first radial direction in the throughgroove 452 by engaging thefirst tooth portion 4331 with thesecond tooth portion 451. In addition, the movablebracket engaging portion 432 at the end of theintermediate transmission member 43 is engaged with thebent portion 442 after passing through the throughgroove 452, and the movablebracket engaging portion 432 is rotatable with respect to thebent portion 442. For example, the bendingportion 442 is provided with aposition limiting hole 4421, and the movingbracket engaging portion 432 can be freely rotated in theposition limiting hole 4421 after being inserted into theposition limiting hole 4421.

It should be noted that the arrangement manner of thesecond tooth portion 451 is not limited to this, and in other embodiments not shown in the drawings, thesecond tooth portion 451 may be arranged on the fixedbracket 45 in other manners as long as it is ensured that thesecond tooth portion 451 and thefirst tooth portion 4331 can be accurately meshed. For example, the fixingbracket 45 may be directly provided with thesecond tooth portion 451 on an outer surface of the fixingbracket 45 without providing the throughgroove 452, and thesecond tooth portion 451 may be accurately engaged with thefirst tooth portion 4331 by properly designing the dimensional structure of the fixingbracket 45 and the positional relationship with theintermediate transmission member 43.

Preferably, as shown in fig. 10, 12, 14 and 15, in some embodiments, the throughgrooves 452 are two symmetrically disposed with respect to the plane of theworm wheel 422, and thebent portions 442 are two symmetrically disposed with respect to the plane of theworm wheel 422. Correspondingly, the movingsupport matching portions 432 and the fixedsupport matching portions 433 of theintermediate transmission member 43 are also two symmetrically disposed portions, the two fixedsupport matching portions 433 are respectively matched with the two throughgrooves 452, and the two movingsupport matching portions 432 are respectively matched with the two bendingportions 442. The above arrangement is favorable for balancing the stress, so that the movement of theintermediate transmission member 43, theworm wheel 422 and the movingbracket 44 is more stable. In addition, as shown in fig. 10, when the bendingportions 442 are symmetrically disposed, the movingbracket 44 is U-shaped as a whole, the movingbracket 44 is equivalently sleeved on the fixedbracket 45, the fixedbracket 45 can be regarded as a guide rail for supporting the movingbracket 44, and when the movingbracket 44 moves along the first radial direction, the main structure of the fixedbracket 45 itself can also play a certain role in guiding the movingbracket 44.

Of course, in other embodiments not shown in the drawings, the throughgroove 452 and/or thebent portion 442 may be provided only on one side of theworm wheel 422, and accordingly, the movingbracket engaging portion 432 and the fixedbracket engaging portion 433 of theintermediate transmission member 43 may be changed. In addition, the position relationship between themovable bracket 44 and the fixedbracket 45 is not limited to this, and in other embodiments not shown in the figures, thebent portion 442 of themovable bracket 44 may be located inside the fixedbracket 45, i.e. between the fixedbracket 45 and theworm wheel 422, and at this time, the movablebracket engaging portion 432 of theintermediate transmission member 43 should be located between the fixedbracket engaging portion 433 and the wormwheel engaging portion 431.

Fig. 9 is a plan view of theadjustment mechanism 40, and fig. 10 is a schematic structural view of theadjustment mechanism 40 in fig. 9, taken from the H direction. As shown in fig. 9 and 10, in some embodiments, therotating connection member 51 is mounted on themain body portion 441, therotating connection member 51 includes auniversal ball head 511, two mountinghousings 512, and a fixingscrew 513, each mountinghousing 512 is substantially hemispherical, and the two mountinghousings 512 are locked by the fixingscrew 513 after being abutted, and a mounting space for placing theuniversal ball head 511 can be formed inside the two mounting housings. That is, at least one of the two mountingcases 512 is fixedly connected to themain body portion 441, theuniversal ball 511 is wrapped by the two mountingcases 512, theuniversal ball 511 can freely rotate inside theuniversal ball 511, and an avoiding hole for exposing the insertion hole of theuniversal ball 511 is formed after the two mountingcases 512 are butted, so that thesupport shaft 52 can be conveniently inserted into the insertion hole of theuniversal ball 511.

When themovable bracket 44 moves in the first radial direction, the rotary joint 51 moves together with themovable bracket 44. In some embodiments, the first end of the supportingshaft 52 is inserted into the ball-gimbal-head 511, the second end is connected to thebase 10, and the supportingshaft 52 is fixed at a position between the two ends to form a pivot point, and the supportingshaft 52 can swing around the pivot point. At this time, the moving direction of thepivotal connection 51 is opposite to the moving direction of thebase 10. For example, when thepivotal connection 51 is moved in the positive direction in the first radial direction, the first end of thesupport shaft 52 is also moved in the positive direction in the first radial direction, the ball-and-socket joint 511 for inserting the first end of thesupport shaft 52 is rotated, and thesupport shaft 52 is swung about the fulcrum, thereby moving the second end of thesupport shaft 52 and the base 10 in the negative direction in the first radial direction.

Of course, it is understood that the specific structure of the rotatingconnector 51 is not limited thereto, and in other embodiments not shown in the drawings, the rotatingconnector 51 may also adopt other structures capable of realizing rotating connection, such as a connecting hinge. In addition, the movement mode of thesupport shaft 52 is not limited to this, and in other embodiments not shown in the drawings, thesupport shaft 52 may move in the same direction as the movingbracket 44 as a whole.

As shown in fig. 9 and 10, in some embodiments, the second adjustment unit includes abase 46, aguide structure 47, a second rotatingelectrical machine 48, and asecond transmission structure 49. Wherein the first adjusting unit is provided on thebase 46. Theseat 46 is movably arranged in a second radial direction on aguide structure 47. Thesecond transmission structure 49 is connected between the secondrotating motor 48 and thebase 46, and is capable of converting the rotational motion output by the secondrotating motor 48 into a linear movement of the base 46 in the second radial direction (i.e., the Y-axis extending direction), thereby adjusting the position of the base 10 in the second radial direction. The controller is in communication with the second rotatingelectrical machine 48, and the rotation angle or the number of rotations output by the second rotatingelectrical machine 48 can be precisely controlled by the controller, so that the precise control of the position of thepedestal 10 in the second radial direction is realized. Theguide structure 47 serves to guide the movement of thebase 46, thereby achieving smooth movement of thebase 46.

The specific form of the guidingstructure 47 is not limited, and may be any structure capable of implementing movement guiding, for example, the guidingstructure 47 includes at least two guide rails, at least two guide rails are arranged at intervals along the first radial direction, each guide rail is arranged to extend along the second radial direction, and the base 46 slides on the at least two guide rails. The specific structure of the second transmission structure is not limited, and any transmission structure can be used as long as it can convert the rotational motion output by the second rotatingelectrical machine 48 into the linear motion in the second radial direction.

In the specific embodiment shown in fig. 9 to 12, thebase 46 is located in the X-axis and Y-axis forming plane, the first rotatingelectric machine 41 is fixedly mounted on thebase 46, thebase 46 is provided with a first mountingseat 461 and a second mountingseat 462, the first mountingseat 461 and the second mountingseat 462 are arranged at intervals along the first radial direction, two ends of theworm 421 are respectively rotatably mounted (for example, mounted through a rotating bearing) on the first mountingseat 461 and the second mountingseat 462, and an output shaft of the first rotatingelectric machine 41 is in driving connection with theworm 421 through a coupling, so that theworm 421 can be limited along the first radial direction while theworm 421 rotates. The fixingbracket 45 includes two fixingportions 453 and two notchedportions 454, the two fixingportions 453 and the two notchedportions 454 are spaced apart in the first radial direction, and the two notchedportions 454 are connected between the two fixingportions 453. The throughgroove 452 is disposed on thegrooved portion 454, and the two fixingportions 453 are respectively fixedly mounted on a side of the first mountingseat 461 facing away from theworm 421 and a side of the second mountingseat 462 facing away from theworm 421.

In addition, thesecond transmission structure 49 includes agear 491 and arack 492, the second rotatingelectric machine 48 is fixedly disposed on a mounting base body different from thebase 46, an output shaft of the second rotatingelectric machine 48 extends along the first radial direction, and the output shaft of the second rotatingelectric machine 48 is engaged with a middle hole of thegear 491 by a connection key or the like, therack 492 extends along the second radial direction and is disposed on thebase 46, for example, therack 492 and the base 46 may be disposed as an integral structure. The secondrotating motor 48 drives thegear 491 to rotate around a third rotating shaft extending along the first radial direction, and drives therack 492 to move along the second radial direction through the meshing of thegear 491 and therack 492, so as to drive thebase 46 and the first adjusting unit mounted thereon to move along the second radial direction as a whole, and further drive the base 10 to move along the second radial direction through the supportingstructure 50. The specific structure of the supportingstructure 50 and the manner of moving thebase 10 are described in detail above, and are not described herein again.

It should be noted that the specific structure of thesecond transmission structure 49 is not limited to thegear 491 and therack 492, and in other embodiments not shown in the drawings, it may be any transmission structure capable of converting the rotary motion output by the second rotatingelectrical machine 48 into the linear motion of the base 46 in the second radial direction (i.e., thesecond transmission structure 49 may include a lead screw nut, a worm gear, etc., for example.

In the coaxiality adjusting system of the semiconductor epitaxial device, a first actual gap between a first preset position on the edge of thesusceptor 10 and the preheatingring 20 in a first radial direction (i.e., the extending direction of the X axis) and a second actual gap between a second preset position on the edge of thesusceptor 10 and the preheatingring 20 in a second radial direction (i.e., the extending direction of the Y axis) are respectively detected by the twodistance measuring devices 30, and the first actual gap and the second actual gap are used as the basis for the coaxiality adjusting system to adjust the coaxiality between the susceptor 10 and the preheatingring 20. Thereafter, the coaxiality adjusting system adjusts the positions of therotary connector 51 in the first and second radial directions by controlling the first and second

rotary motors

41 and 48 through the controller, thereby adjusting the coaxiality between the susceptor 10 and the preheatingring 20.

As shown in fig. 17, the present invention also provides a method for adjusting the coaxiality of thesusceptor 10 and the preheatingring 20 of the semiconductor epitaxial apparatus, which is applied to the semiconductor epitaxial apparatus described above, and comprises the following steps:

step S10: detecting actual gaps between a plurality of preset positions on the edge of thesusceptor 10 and the preheatingring 20 in the radial direction of the preheatingring 20, wherein the plurality of preset positions are distributed at intervals in the circumferential direction of thesusceptor 10;

step S20: acquiring a target gap between the susceptor 10 and the preheatingring 20;

step S30: according to the difference value between the target gap and the actual gap corresponding to each preset position, the adjustingmechanism 40 is controlled to adjust the position of thesusceptor 10 in the corresponding radial direction, so that the coaxiality of thesusceptor 10 and the preheatingring 20 is in accordance with the requirement.

Compared with the existing mode of manually measuring the gap and manually adjusting the position of the base, the method can automatically and quickly detect the actual gaps between the plurality of preset positions on the edge of thebase 10 and the preheatingring 20, and has high precision and good repeatability; in addition, the method can also realize automatic adjustment of the position of thepedestal 10 according to the result of automatic detection of the actual gap and the corresponding target gap, so that the adjustment of the coaxiality between thepedestal 10 and the preheatingring 20 is finally realized, the automation degree is higher, the adjustment precision and the adjustment efficiency are effectively improved, and the operability of hardware debugging of the equipment is improved.

When the above-described method is applied to the semiconductor epitaxial apparatus of the specific embodiment shown in fig. 9 to 16, the controller may be a PLC (programmable logic controller), and the rotating motor involved in theadjusting mechanism 40 for adjusting the position of thesusceptor 10 may be a stepping motor driven by a motor driver, and the PLC is communicatively connected to the motor driver and thedistance measuring device 30. In this case, the specific control procedure is as follows:

the parameters involved in the control process are:

inner diameter D of preheatingring 2, diameter D of susceptor 1, pitch P ofworm 421_XFirst actual clearance delta_XTarget pulse p of first rotatingelectric machine 41_X1Motor electronic gear ratio F of first rotatingelectric machine 41 and second rotatingelectric machine 48, radius r ofgear 491_YSecond actual clearance delta_YTarget pulse p of second rotatingelectric machine 48_Y1。

The electronic gear ratio of the motor represents the number of pulses of each rotation of the motor, the number of pulses divided by 360 degrees is the number of pulses occupied by each 1 degree, and the number of pulses is multiplied by a corresponding angle to obtain the number of pulses corresponding to the angle, so that the motor needs to move to a target pulse position at the relative position.

As shown in fig. 18, thedistance measuring device 30 detects a first actual gap Δ between the first preset position of thesusceptor 10 and the preheatingring 20 in the first radial direction (i.e., the extending direction of the X axis)_XAnd sent to the PLC. The target gap between the susceptor 10 and the preheatingring 20 is known to be (D-D)/2, when (D-D)/2 > Δ_XWhen thebase 10 is biased to the positive X-axis direction, theworm wheel 422 is controlled to move in the negative X-axis direction (D-D)/2-delta_XI.e., the arc length of theworm wheel 422 rolling in the negative X-axis direction is (D-D)/2-delta_XTherefore, it can be considered that the distance traveled by a certain point on the outer peripheral surface of theworm 421 is (D-D)/2- Δ_X. Knowing the pitch P of theworm 421_XThe number of turns of theworm 421 can be calculated as [ (D-D)/2-Delta_X]/P_XI.e. the number of revolutions of the first rotatingelectrical machine 41, to determine the target pulse p of the first rotatingelectrical machine 41_X1＝[(D-d)/2-Δ_X]·F/P_XThe PLC applies a target pulse p_X1A first motor driver sent to the firstrotating motor 41, thereby realizing automatic adjustment of the coaxiality in the X-axis extending direction.

As shown in fig. 19, thedistance measuring device 30 detects a second actual gap Δ between the second preset position of thesusceptor 10 and the preheatingring 20 in the second radial direction (i.e., the Y-axis extending direction)_YAnd sent to the PLC. The target gap between the susceptor 10 and the preheatingring 20 is known to be (D-D)/2, when (D-D)/2 > Δ_YWhen thebase 10 is biased to the positive Y-axis direction, therack 492 is controlled to move in the negative Y-axis direction (D-D)/2-delta_YThe distance of (D) that is, the arc length of thegear 491 rolling in the negative Y-axis direction is (D-D)/2-delta_YTherefore, the angle θ through which thegear 491 rotates can be calculated_Y＝[(D-d)/2-Δ_Y]/r_YThereby determining the second rotating electrical machine 48Target pulse p of_Y1＝F·θ_Y/360°＝F·[(D-d)/2-Δ_Y]·/360°/r_YThe PLC applies a target pulse p_Y1And a second motor driver sent to the secondrotating motor 48, thereby achieving automatic adjustment of the coaxiality in the Y-axis extending direction.

It will be understood that the above embodiments are merely exemplary embodiments taken to illustrate the principles of the present invention, which is not limited thereto. It will be apparent to those skilled in the art that various modifications and improvements can be made without departing from the spirit and substance of the invention, and these modifications and improvements are also considered to be within the scope of the invention.

Claims

1. A semiconductor epitaxial apparatus comprising a reaction chamber provided inside with a susceptor and a preheating ring surrounding the susceptor, characterized in that the semiconductor epitaxial apparatus further comprises a coaxiality adjusting system for adjusting a coaxiality between the susceptor and the preheating ring, the coaxiality adjusting system comprising:

the distance measuring device is arranged outside the top of the reaction chamber and is positioned above the base and the preheating ring, the top of the reaction chamber is provided with a light-transmitting part, and the distance measuring device can detect actual gaps between a plurality of preset positions on the edge of the base and the preheating ring in the radial direction of the preheating ring through the light-transmitting part, wherein the preset positions are distributed at intervals in the circumferential direction of the base;

the adjusting mechanism is arranged at the outer side of the bottom of the reaction chamber and is used for adjusting the position of the base in a plurality of radial directions of the preheating ring, wherein the plurality of radial directions correspond to the plurality of preset positions one by one;

the controller is arranged outside the reaction chamber, is in communication connection with the distance measuring device and the adjusting mechanism, and is used for acquiring a target gap between the pedestal and the preheating ring and controlling the adjusting mechanism to adjust the position of the pedestal in the corresponding radial direction according to the difference value of the target gap and the actual gap corresponding to each preset position, so that the coaxiality of the pedestal and the preheating ring meets the requirement.

2. Semiconductor epitaxy apparatus according to claim 1, wherein the plurality of preset positions comprises at least a first preset position and a second preset position, the radial directions corresponding to the first preset position and the second preset position being a first radial direction and a second radial direction, respectively, wherein the first radial direction and the second radial direction are perpendicular to each other;

the adjusting mechanism comprises a first adjusting unit and a second adjusting unit, the controller is in communication connection with the first adjusting unit and the second adjusting unit, and the first adjusting unit and the second adjusting unit are respectively used for adjusting the positions of the base in the first radial direction and the second radial direction.

3. The semiconductor epitaxial device according to claim 2, further comprising a rotation connector and a support shaft, wherein the support shaft is connected below the susceptor to support the susceptor, the rotation connector is located outside the bottom of the reaction chamber, the support shaft is connected to the rotation connector after passing out from the bottom of the reaction chamber, the first adjustment unit comprises a first rotating motor and a first transmission structure, the first transmission structure is connected between the first rotating motor and the rotation connector and can convert the rotation motion output by the first rotating motor into linear movement of the rotation connector along the first radial direction, so as to drive the support shaft to move, thereby adjusting the position of the susceptor in the first radial direction.

4. Semiconductor epitaxy apparatus according to claim 3, characterised in that the first transmission structure comprises:

the first rotating motor is in driving connection with the worm so as to drive the worm to rotate around a first rotating shaft extending along the first radial direction, and the worm is driven to rotate around a second rotating shaft perpendicular to the first rotating shaft through meshing transmission of the worm and the worm wheel and simultaneously move along the first radial direction;

the rotating connecting piece is connected with the movable support, the central axis of the intermediate transmission piece is superposed with the second rotating shaft, the intermediate transmission piece comprises a worm wheel matching part and a movable support matching part, wherein,

the worm wheel matching part is matched with the worm wheel, and circumferential limiting is carried out between the worm wheel matching part and the worm wheel, so that the intermediate transmission part and the worm wheel can synchronously move;

the movable support matching part is matched with the movable support, the movable support matching part can freely rotate relative to the movable support, and when the intermediate transmission part moves along the first radial direction along with the worm wheel, the movable support can be driven by the movable support matching part to move along the first radial direction.

5. The semiconductor epitaxial apparatus according to claim 4, wherein the first transmission structure further comprises a fixed bracket, the intermediate transmission member further comprises a fixed bracket engagement portion, the fixed bracket engagement portion is provided with a first tooth portion extending in a circumferential direction of the intermediate transmission member, the fixed bracket is provided with a second tooth portion extending in the first radial direction, and the first tooth portion is engaged with the second tooth portion so that the fixed bracket engagement portion can move on the fixed bracket.

6. The semiconductor epitaxial device according to claim 5, wherein the movable bracket is movably disposed on the fixed bracket, the movable bracket includes a main body portion and a bending portion connected to at least one end of the main body portion, the rotating connecting member is connected to the main body portion, the fixed bracket is provided with a through groove penetrating in an extending direction of the second rotating shaft, the second tooth portion is disposed on a side groove wall of the through groove, the through groove is disposed between the bending portion and the worm wheel, the fixed bracket engaging portion of the intermediate transmission member is disposed in the through groove, and the movable bracket engaging portion of the intermediate transmission member is engaged with the bending portion after passing through the through groove.

7. The semiconductor epitaxial device according to claim 6, wherein the through grooves are two symmetrically disposed with respect to a plane in which the worm wheel is located, and the bent portions are two symmetrically disposed with respect to a plane in which the worm wheel is located.

8. Semiconductor epitaxial apparatus according to any of claims 2 to 7, characterized in that the second adjustment unit comprises a base, a guide structure, a second rotation motor and a second transmission structure, the first adjustment unit being arranged on the base, the base being movably arranged on the guide structure in the second radial direction, the second transmission structure being connected between the second rotation motor and the base and being capable of converting a rotational movement output by the second rotation motor into a linear movement of the base in the second radial direction, thereby adjusting the position of the base in the second radial direction.

9. Semiconductor epitaxy apparatus according to claim 1, characterised in that the distance measuring means comprise a laser distance measuring sensor or an infrared distance measuring sensor.

10. A method for adjusting the coaxiality of a susceptor and a preheating ring of a semiconductor epitaxial apparatus, applied to the semiconductor epitaxial apparatus of any one of claims 1 to 9, the method comprising:

detecting actual gaps between a plurality of preset positions on the edge of the susceptor and the preheating ring in the radial direction of the preheating ring, wherein the plurality of preset positions are distributed at intervals in the circumferential direction of the susceptor;

acquiring a target gap between the base and the preheating ring;

and controlling the adjusting mechanism to adjust the position of the susceptor in the corresponding radial direction according to the difference value of the target gap and the actual gap corresponding to each preset position, so that the coaxiality of the susceptor and the preheating ring meets the requirement.