Movatterモバイル変換


[0]ホーム

URL:


CN114132062A - A kind of micro-nano latent image anti-counterfeiting device and its preparation method and plate roller - Google Patents

A kind of micro-nano latent image anti-counterfeiting device and its preparation method and plate roller
Download PDF

Info

Publication number
CN114132062A
CN114132062ACN202010917318.1ACN202010917318ACN114132062ACN 114132062 ACN114132062 ACN 114132062ACN 202010917318 ACN202010917318 ACN 202010917318ACN 114132062 ACN114132062 ACN 114132062A
Authority
CN
China
Prior art keywords
micro
layer
nano
latent image
plate roller
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202010917318.1A
Other languages
Chinese (zh)
Inventor
刘晓宁
刘海峰
王成华
朱昊枢
陈林森
朱志坚
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SVG Tech Group Co Ltd
Original Assignee
SVG Tech Group Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SVG Tech Group Co LtdfiledCriticalSVG Tech Group Co Ltd
Priority to CN202010917318.1ApriorityCriticalpatent/CN114132062A/en
Publication of CN114132062ApublicationCriticalpatent/CN114132062A/en
Pendinglegal-statusCriticalCurrent

Links

Images

Classifications

Landscapes

Abstract

The invention discloses a micro-nano latent image anti-counterfeiting device, a preparation method thereof and a printing roller, wherein the micro-nano latent image anti-counterfeiting device comprises the following steps: forming a target pattern by dot-matrix arrangement design, and manufacturing a plate roller matched with the target pattern, wherein the plate roller is provided with bulges which are adapted to the target pattern; coating a shielding material layer on the raised surface, transferring the shielding material layer to a structure layer to be plated through a roller coated with the shielding material layer on the surface, and forming a transfer shielding layer on the structure layer to be plated, wherein the shape and position distribution of the transfer shielding layer on the structure layer to be plated is consistent with the target pattern; and forming a coating on the surface of the structural layer to be plated, wherein the shape and position distribution of the coating on the structural layer to be plated is complementary with that of the transfer printing shielding layer. The preparation method of the invention realizes the small-size and high-precision patterning of the metal layer of the packaging material, and has better aesthetic effect and anti-counterfeiting function.

Description

Micro-nano latent image anti-counterfeiting device, preparation method thereof and printing roller
Technical Field
The invention relates to the technical field of anti-counterfeiting devices, in particular to a micro-nano latent image anti-counterfeiting device, a preparation method thereof and a printing roller for preparing the micro-nano latent image anti-counterfeiting device.
Background
The earliest application in the field of domestic anti-counterfeiting is a mould pressing laser technology. The technology can be applied to the anti-counterfeiting field, and is mainly technically characterized by extremely strong information bearing capacity besides the factors of low price, convenient identification and the like. Embossed holograms can record the state of the hologram, the nature of the optical components used, the conditions of post-processing, the nature of the photosensitive material, etc., and their complex optical features cannot be efficiently replicated. Because of the strong information bearing capacity, the micro technology with extremely high difficulty for the printing ink printing method is much simpler for the die pressing laser holography.
Holography has many advantages as a security technique. First, it takes much time and money to produce a source holographic product, but mass replication is relatively inexpensive. Second, the equipment and techniques necessary for mass production of holographic products at an early stage were difficult to obtain. Third, holographic products appear to be very different from printed trademarks. Fourth, the tools (camera and printer) traditionally used by counterfeiters for counterfeiting do not work with holograms.
The holographic anti-counterfeiting technology has the characteristics of easy identification, high technological content, easy batch production and difficult copying, and is widely applied to the anti-counterfeiting field. The early holographic anti-counterfeiting technology is a grating effect prepared by interference of two beams of light, and later, the pixel photoetching technology realizes automatic photoetching. The diffraction grating effect of monochrome, homothetic different image, dynamic and the like is expanded to the new optical effects of zero-order diffraction anti-counterfeiting technology, purple light effect, platinum relief, lens reproduction and the like. The holographic anti-counterfeiting technology is developed to the present, and the new optical anti-counterfeiting technology is widely applied to the aspects of national certificates, cigarette packet packaging and brand protection.
However, with the development of technology, the requirements for holographic anti-counterfeiting technology in real life are higher and higher. The more commonly used aluminum washing process is the water aluminum washing technique, i.e. the surface of the mould pressing layer with the optical microstructure is printed with aluminum washing ink (the ink is soluble in water), then aluminum is plated, and then the optical film is immersed in water, the aluminum layer of the area containing the aluminum washing ink is dissolved in water together with the aluminum washing ink and falls off, while the area without the aluminum washing ink remains the aluminum layer, so as to form a local aluminum washing pattern. The aluminum washing precision of the method depends on the registration precision of the aluminum washing ink and the holographic pattern, and the registration precision of the method can only reach +/-0.2 mm, so that the high-precision registration printing effect cannot be obtained. Meanwhile, the process is complex because aluminum is plated firstly and then washed.
And the pattern hollowed-out dimension realized by traditional local aluminizing and large-area pattern shielding aluminizing is large and not fine enough, and the material with a micro-nano-scale precise hollowed-out metal layer structure is difficult to achieve at present.
Therefore, it is necessary to provide a new technical solution to solve the problems in the prior art.
Disclosure of Invention
The invention aims to solve the problems in the prior art, and on one hand, provides a preparation method of a micro-nano latent image anti-counterfeiting device, which is used for solving the problems that a micro-nano structure is easy to damage and a structural layer is difficult to prepare when a product is subjected to demoulding in the prior art, and adopts the following technical scheme:
a preparation method of a micro-nano latent image anti-counterfeiting device comprises the following steps:
manufacturing a plate roller matched with a target pattern, wherein the plate roller is provided with a bulge, and the pattern formed on the plate roller by the bulge is matched with the target pattern;
coating a shielding material layer on the raised surface, transferring the shielding material layer to a structure layer to be plated through a roller coated with the shielding material layer on the surface, and forming a transfer shielding layer on the structure layer to be plated, wherein the shape and position distribution of the transfer shielding layer on the structure layer to be plated is consistent with the target pattern;
and forming a coating on the surface of the structural layer to be plated, wherein the shape and position distribution of the coating on the structural layer to be plated is complementary with that of the transfer printing shielding layer.
In the foregoing technical solution, the target pattern includes a plurality of pattern units arranged in a dot matrix, and the shape of the pattern unit includes one or a combination of a plurality of circular, oval, triangular, square, diamond, pentagonal, and hexagonal shapes.
Further, the target pattern comprises a first graph area and/or a second graph area, the first graph area and/or the second graph area comprises a plurality of circular pattern units,
further, the distance between two adjacent circular pattern units in the first pattern area is 100 to 200 micrometers,
further, a plurality of circular pattern units in the second graph area are distributed according to the shape of the target pattern.
Furthermore, the diameter of the pattern unit is 50-80 microns.
Further, the plate roller comprises a plate roller body and a plurality of protrusions arranged on the surface of the plate roller body, the plate roller body and the protrusions are integrally formed, the height of each protrusion is 0.8-1.2 microns, and the size and the shape of each protrusion are consistent with those of the target pattern.
Further, the plate roller comprises a rubber plate roller,
further, the plate roller body is a cylinder, the protrusions protrude outwards from the surface of the plate roller body, and a gap is formed between every two adjacent protrusions.
Furthermore, the shielding material layer is a volatile material, the shielding material layer comprises silicone oil,
further, the silicone oil is coated on the convex surface.
Further, the structure layer to be plated comprises a structure layer with a micro-nano structure formed on the surface through nano imprinting,
further, silicone oil coated on the surface of the plate roller is transferred to the surface of the micro-nano structure on the structural layer, and a transfer printing shielding layer is formed on the surface of the micro-nano structure.
Further, forming a plating layer on the surface of the structure layer to be plated specifically includes:
and depositing metal on the surface of the structure layer to be plated at a high temperature to form a metal plating layer on the surface of the structure layer to be plated, and volatilizing the transfer printing shielding layer at a high temperature to form a hollow pattern on the surface of the structure layer to be plated to obtain the micro-nano latent image anti-counterfeiting device.
Further, transferring the silicone oil coated on the surface of the plate roller to the surface of the micro-nano structure and forming a coating on the surface of the structure layer to be coated synchronously, wherein the silicone oil transferring speed is 500-600 m/min,
furthermore, the time for forming a plating layer with the target thickness on the surface of the structure layer to be plated is consistent with the time for completely volatilizing the transfer printing shielding layer at high temperature.
Further, the metal deposited on the surface of the structure layer to be plated comprises aluminum, and the thickness of the deposited metal layer is 350-450 angstroms.
On the other hand, the invention also provides a micro-nano latent image anti-counterfeiting device prepared by the technical scheme, which comprises the following components:
a micro-nano structure layer as a pattern carrier of the micro-nano latent image anti-counterfeiting device, wherein the surface of the micro-nano structure layer is provided with a micro-nano structure,
and the graphic layer is attached to the surface of the micro-nano structure, and forms a pattern on the surface of the micro-nano structure.
On the other hand, the invention also provides a plate roller for manufacturing the micro-nano latent image anti-counterfeiting device, which comprises:
the printing roller comprises a printing roller body and a plurality of bulges arranged on the surface of the printing roller body, wherein the bulges outwards protrude from the surface of the printing roller body, and a gap is formed between every two adjacent bulges;
further, the plate roller body comprises a cylinder, the protrusion protrudes outwards from the surface of the cylinder body of the cylinder, and the plate roller and the protrusion are integrally formed;
furthermore, the height of the protrusion is 0.8-1.2 microns, and the size and the shape of the protrusion are consistent with those of a target pattern on the micro-nano latent image anti-counterfeiting device.
Compared with the prior art, the invention has one or more of the following beneficial effects:
1. the invention provides a preparation method of a micro-nano latent image anti-counterfeiting device, which is characterized in that a shielding material layer is transferred to a micro-nano structure layer through a printing roller, a bulge on the printing roller is matched with the micro-nano structure, the printing roller is used for transferring, and the micro-nano structure layer is printed and moved immediately, and only one high-level micro-nano structure is needed on the surface of the micro-nano structure layer.
2. The invention also provides a printing roller for preparing the micro-nano latent image anti-counterfeiting device, the printing roller is matched with the micro-nano structure, the shape and position distribution and the size of the bulge of the distribution printing roller are designed according to a target pattern designed by the micro-nano latent image anti-counterfeiting device, the printing roller can be a cylinder printing roller or a plate surface printing roller, the cylinder printing roller can be coated with a transfer printing shielding material layer in a rolling mode, the processing speed is high, the efficiency is high, the printing roller is extremely suitable for flexible materials with periodically distributed pattern structures, the plate surface printing roller is more suitable for plane products with incompletely corresponding patterns, the plate surface printing roller is more regular, the alignment is accurate, and the processing precision is high.
3. The preparation method of the micro-nano latent image anti-counterfeiting device realizes the patterning of the metal layer with small size and high precision of the packaging material, the pattern on the prepared micro-nano latent image anti-counterfeiting device is not easy to be found under normal visual observation, and can be clearly shown under the backlight source condition, so that the micro-nano latent image anti-counterfeiting device has better aesthetic effect and anti-counterfeiting function.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only some embodiments of the present invention, and other drawings can be obtained by those skilled in the art without creative efforts.
FIG. 1 is a schematic plan view of a target pattern designed in the process of manufacturing a micro-nano latent image anti-counterfeiting device according to an embodiment of the invention;
fig. 2 is a schematic view of the micro-nano latent image anti-counterfeiting device manufacturing method according to the embodiment of the invention, wherein a shielding material layer is transferred on the metal layer to be plated by using the plate roller;
fig. 3 is a schematic plan view of a micro-nano latent image anti-counterfeiting device manufactured by using the method for manufacturing a micro-nano latent image anti-counterfeiting device according to an embodiment of the invention;
fig. 4 is a schematic structural diagram of a micro-nano latent image anti-counterfeiting device manufactured in an embodiment of the invention.
Wherein, 10-version roller; 11-a bump; 20-a layer of shielding material; 21-transfer shield layer; 30-a structural layer to be plated; 40-metal plating; 50-a first graphic area; 60-a second graphic area; 70-micro-nano structure layer; 80-graphics layer.
Detailed Description
The technical solutions of the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings of the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
In the description of the present invention, it is to be understood that the terms "upper", "lower", "top", "bottom", "inner", "outer", and the like, indicate orientations or positional relationships based on those shown in the drawings, and are used only for convenience in describing the present invention and for simplicity in description, and do not indicate or imply that the referenced devices or elements must have a particular orientation, be constructed and operated in a particular orientation, and thus, are not to be construed as limiting the present invention. In the description of the present invention, "a plurality" means two or more unless specifically defined otherwise.
In the present invention, unless otherwise expressly stated or limited, the terms "mounted," "connected," "secured," and the like are to be construed broadly and can, for example, be fixedly connected, detachably connected, or integrally formed; can be mechanically or electrically connected; either directly or indirectly through intervening media, either internally or in any other relationship. The specific meanings of the above terms in the present invention can be understood by those skilled in the art according to specific situations.
The gist of the present invention will be further explained below with reference to the accompanying drawings and examples.
Example (b):
referring to fig. 1 to 4, an aspect of the present invention is to provide a method for manufacturing a micro-nano latent image anti-counterfeit device, including:
the lattice-type arrangement design forms a target pattern,
manufacturing aplate roller 10 matched with the target pattern, wherein theplate roller 10 is provided withbulges 11, and the pattern formed on theplate roller 10 by thebulges 11 is matched with the target pattern;
coating a shielding material layer 20 on the surface of theprotrusion 11, transferring the shielding material layer 20 onto astructure layer 30 to be plated through aplate roller 10 coated with the shielding material layer 20 on the surface, forming atransfer shielding layer 21 on thestructure layer 30 to be plated, wherein the shape and position distribution of thetransfer shielding layer 21 on thestructure layer 30 to be plated is consistent with the target pattern;
and forming a metal coating on the surface of thestructure layer 30 to be plated, wherein the shape and position distribution of the metal coating on thestructure layer 30 to be plated is complementary with the transferprinting shielding layer 21.
In an embodiment, refer to fig. 1, which is a schematic plan view of a target pattern designed when the micro-nano latent image anti-counterfeiting device is prepared according to the present invention, where the target pattern includes a plurality of pattern units arranged in a dot matrix. The shape of the pattern unit can be one or a combination of more than one of circle, ellipse, triangle, square, diamond, pentagon and hexagon.
In one embodiment, with continued reference to FIG. 1, the target pattern includes a firstgraphic area 50 and a secondgraphic area 60, each of the firstgraphic area 50 and the secondgraphic area 60 including a number of circular pattern elements. Thefirst pattern area 50 can be called an array area, thesecond pattern area 60 can be called a pattern area, the array area and the pattern area are both composed of a plurality of circular pattern units (the circular pattern units can be regarded as dots), the dots in the array area are arranged according to an array rule, namely, are arranged in a dot matrix mode, the distance between the adjacent dots is 100-200 micrometers, and the distance between the adjacent dots in the pattern area is distributed according to design requirements and is combined into patterns, characters, letters and the like. The diameter of the pattern unit may be 50 to 80 micrometers.
And continuing to refer to fig. 2, manufacturing a plate roller for preparing the micro-nano latent image anti-counterfeiting device. In one embodiment, theplate roller 10 includes a plate roller body and a plurality ofprotrusions 11 disposed on a surface of the plate roller body, the plate roller body and theprotrusions 11 are integrally formed, a height of eachprotrusion 11 is 0.8 to 1.2 micrometers, and a size and a shape of eachprotrusion 11 are consistent with a size and a shape of the target pattern.
In one embodiment, theprinting roll 10 comprises aflexographic roll 10, the body of the printing roll may be a cylindrical structure, i.e., as shown in fig. 2, theprotrusions 11 protrude outward from the surface of the body of the printing roll, and a gap is formed between twoadjacent protrusions 11. When the micro-nano latent image anti-counterfeiting device is applied to a flexible material, a cylinder plate roller can be adopted for roll-to-roll printing, so that the processing efficiency is improved, and theplate roller 10 can also be a plate roller. Certainly, the gap between twoadjacent bumps 11 on theplate roller 10 is determined according to the target pattern on the micro-nano latent image anti-counterfeiting device, the distribution mode of thebumps 11 on theplate roller 10, the height of the bumps, the surface shape of the bumps, and other parameters are determined by the target pattern, and theplate roller 10 can also be said to be a printing template.
In one embodiment, a shielding material layer 20 is coated on the surface of theprotrusion 11, and the shielding material layer 20 is a volatile material, such as silicone oil. Silicone oil may be applied to the surface of theprotrusions 11.
In an embodiment, the structure layer to be plated 30 may be a flexible structure layer with a micro-nano structure formed on a nano-imprinting surface, and the silicone oil coated on the surface of theplate roller 10 is transferred to the surface of the micro-nano structure on the flexible structure layer, so as to form atransfer shielding layer 21 on the surface of the micro-nano structure.
In one embodiment, the step of forming ametal plating layer 40 on the surface of thestructure layer 30 to be plated specifically includes:
depositing metal on the surface of thestructure layer 30 to be plated at a high temperature to form ametal plating layer 40 on the surface of thestructure layer 30 to be plated, and volatilizing the transferprinting shielding layer 21 at a high temperature to form a hollow pattern on the surface of thestructure layer 30 to be plated to obtain the micro-nano latent image anti-counterfeiting device. The silicone oil coated on the surface of theplate roller 10 is transferred to the surface of the micro-nano structure and themetal coating 40 is formed on the surface of thestructure layer 30 to be plated, preferably, the silicone oil transfer speed is 500-600 m/mi n in a preferred embodiment, and in order to obtain a hollow structure with a better effect, the time for forming themetal coating 40 with a target thickness on the surface of thestructure layer 30 to be plated is preferably consistent with the time for completely volatilizing thetransfer shielding layer 21 at a high temperature, so that the deposition of the metal coating is also completed while the transfer shielding layer 21 (silicone oil material) is volatilized, and a good hollow effect is ensured.
In one embodiment, the metal deposited on the surface of thestructure layer 30 to be plated may be aluminum, and the thickness of the deposited metal aluminum layer may reach 350 to 450 angstroms.
The preparation method of the micro-nano latent image anti-counterfeiting device comprises the steps of designing a target pattern, representing the target pattern by a plurality of dots (including designing the diameter of each dot, the distance between two adjacent dots and the like), completely presenting the target pattern, manufacturing a matched plate roller according to the target pattern, designing a bulge on the plate roller, wherein the bulge is a template printed in an alignment mode with the dots, coating a shielding material layer on the surface of the bulge of the plate roller after the plate roller is manufactured, transferring the shielding material layer on the bulge of the plate roller onto a structure layer to be plated, depositing metal on the structure layer to be plated during transfer printing, completely volatilizing the shielding material layer under a high-temperature condition after the deposited metal reaches the target thickness, forming the target pattern by the deposited metal plating layer, and using the target pattern layer as the finally obtained micro-nano latent image anti-counterfeiting device, and the part of the shielding material layer is exposed to form a hollow pattern. It is worth mentioning that the printing of the shielding material layer and the aluminum plating are performed synchronously, metal is deposited on the surface of the structure layer to be plated without the shielding material layer, no metal is deposited on the surface with the shielding material layer, because the aluminum plating is performed at a high temperature, the material of the shielding material layer is continuously volatilized at a high temperature until the material completely disappears, a hollow effect is finally formed on the surface with the shielding material layer, a device with a nano latent image anti-counterfeiting function is formed on the surface of the material, and a plane schematic diagram of the finally prepared micro-nano latent image anti-counterfeiting device object is shown in fig. 3. Comparing fig. 1 and fig. 3, the original dot area on the target pattern has darker brightness due to no metal coating plated on the surface, and finally forms a dark area in the real image, while the other areas without dots have bright area in the real image due to metal coating plated on the surface.
In another aspect, the present invention further provides a micro-nano latent image anti-counterfeiting device manufactured by the method for manufacturing a micro-nano latent image anti-counterfeiting device, which can be seen in fig. 4, where fig. 4 is a schematic structural diagram of a micro-nano latent image anti-counterfeiting device manufactured by the method of the present invention in one embodiment, and the method includes:
themicro-nano structure layer 70 is used as a pattern carrier of a micro-nano latent image anti-counterfeiting device, a micro-nano structure is arranged on the surface of themicro-nano structure layer 70, the micro-nano structure can be a concave-convex structure and can be of any reasonable height, in one embodiment, a shielding material layer is printed and coated on the protrusions of the surface of the micro-nano structure, if metal is deposited on the concave structures of the surface of the micro-nano structure, apattern layer 80 is finally formed on the concave structures of the surface of the micro-nano structure, thepattern layer 80 forms patterns on the surface of the micro-nano structure, and the protruding parts of the surface of the micro-nano structure can form a hollow effect. Generally, the size of the protrusion on the plate roller should be much larger than that of the micro-nano structure, so according to the target pattern, the protrusion on the surface of some micro-nano structures can be completely printed with the shielding material, some micro-nano structures are partially printed, and some micro-nano structures are not printed, so that not only the concave structure on the surface of the micro-nano structure can be provided with the metal coating, but also part or all of the protrusion on the surface of some micro-nano structures are provided with the metal coating, therefore, fig. 4 is only a structural schematic diagram of the micro-nano latent image anti-counterfeiting device manufactured by using the method in one embodiment, and the method cannot be understood as limiting the invention.
In another aspect, with continued reference to fig. 2, the present invention further provides aprinting roller 10 for manufacturing a micro-nano latent image anti-counterfeiting device, including:
the printing roller comprises a printing roller body and a plurality ofbulges 11 arranged on the surface of the printing roller body, wherein thebulges 11 protrude outwards from the surface of the printing roller body, and a gap is formed between every twoadjacent bulges 11.
In one embodiment, the plate roll body may be a cylinder, that is, as shown in fig. 2, theprotrusions 11 protrude outward from the cylindrical surface of the cylinder, and theplate roll 10 and theprotrusions 11 may be integrally formed, with a gap between twoadjacent protrusions 11. Of course, the gap is determined according to the target pattern on the micro-nano latent image anti-counterfeiting device, the distribution mode of theprotrusions 11 on theplate roller 10, the height of the protrusions, the surface shape of the protrusions, and other parameters are determined by the target pattern, and theplate roller 10 can also be said to be a printing template. The height range of theprotrusions 11 is 0.8-1.2 micrometers, and the size and the shape of theprotrusions 11 are consistent with those of target patterns on the micro-nano latent image anti-counterfeiting device.
The printing roller is matched with the micro-nano structure, the shape and position distribution and the size of the bulge of the printing roller are designed according to a target pattern designed by a micro-nano latent image anti-counterfeiting device, the printing roller can be a cylinder printing roller or a plate surface printing roller, the cylinder printing roller can be used for coating a transfer printing shielding material layer in a rolling mode, the processing speed is high, the efficiency is high, the printing roller is extremely suitable for flexible pattern structures with periodic distribution, the plate surface printing roller is more suitable for plane products with incompletely corresponding patterns, the plate surface printing roller is more regular, the alignment is accurate, and the processing precision is high.
The invention provides a preparation method of a micro-nano latent image anti-counterfeiting device, which is characterized in that a shielding material layer is transferred to a micro-nano structure layer through a printing roller, a bulge on the printing roller is matched with the micro-nano structure, the printing roller is used for transferring, and the micro-nano structure layer is printed and moved immediately, and only one high-level micro-nano structure is needed on the surface of the micro-nano structure layer.
In conclusion, the preparation method of the micro-nano latent image anti-counterfeiting device provided by the invention realizes the patterning of the metal layer with small size and high precision of the packaging material, the pattern on the prepared micro-nano latent image anti-counterfeiting device is not easy to find under normal visual observation, and can be clearly shown under the backlight source condition, so that the micro-nano latent image anti-counterfeiting device has better aesthetic effect and anti-counterfeiting function.
In the description herein, references to the description of the term "one embodiment," "some embodiments," "an example," "a specific example" or "some examples" or the like are intended to mean that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the invention. In this specification, the schematic representations of the terms used above are not necessarily intended to refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples. Furthermore, various embodiments or examples described in this specification can be combined and combined by one skilled in the art.
While embodiments of the present invention have been shown and described above, it is to be understood that the above embodiments are exemplary and not to be construed as limiting the present invention, and that changes, modifications and variations may be made therein by those of ordinary skill in the art within the scope of the present invention.

Claims (13)

Translated fromChinese
1.一种微纳米潜影防伪器件的制备方法,其特征在于,其包括:1. a preparation method of micro-nano latent image anti-counterfeiting device, is characterized in that, it comprises:制作与目标图案相匹配的版辊(10),所述版辊(10)上具有凸起(11),所述凸起(11)在所述版辊(10)上形成的图案与所述目标图案相适应;A plate roller (10) matching the target pattern is produced, the plate roller (10) is provided with protrusions (11), and the pattern formed by the protrusions (11) on the plate roller (10) is the same as that of the plate roller (10). target pattern adaptation;于所述凸起(11)的表面涂布一层屏蔽材料层(20),通过表面涂布有屏蔽材料层(20)的版辊(10)将该屏蔽材料层(20)转印至待镀结构层(30)上,于所述待镀结构层(30)上形成转印屏蔽层(21),所述转印屏蔽层(21)在所述待镀结构层(30)上的形位分布与所述目标图案一致;A layer of shielding material (20) is coated on the surface of the protrusion (11), and the shielding material layer (20) is transferred to the surface to be On the plating structure layer (30), a transfer shielding layer (21) is formed on the to-be-plated structural layer (30), and the transfer shielding layer (21) has a shape on the to-be-plated structural layer (30). The bit distribution is consistent with the target pattern;于所述待镀结构层(30)表面形成一层镀层,所述镀层在所述待镀结构层(30)上的形位分布与所述转印屏蔽层(21)互补。A plating layer is formed on the surface of the structural layer to be plated (30), and the shape and position distribution of the plating layer on the structural layer to be plated (30) is complementary to the transfer shielding layer (21).2.根据权利要求1所述的微纳米潜影防伪器件的制备方法,其特征在于,所述目标图案包括若干个点阵式排列的图案单元,所述图案单元的形状包括圆形、椭圆形、三角形、方形、菱形、五边形、六边形中的一种或多种的组合。2 . The method for preparing a micro-nano latent image anti-counterfeiting device according to claim 1 , wherein the target pattern comprises several pattern units arranged in a dot matrix, and the shape of the pattern unit comprises a circle, an ellipse , a combination of one or more of triangles, squares, rhombus, pentagons, and hexagons.3.根据权利要求2所述的微纳米潜影防伪器件的制备方法,其特征在于,所述目标图案包括第一图形区(50)和/或第二图形区(60),所述第一图形区(50)和/或第二图形区(60)包括若干个圆形的图案单元,3. The method for preparing a micro-nano latent image anti-counterfeiting device according to claim 2, wherein the target pattern comprises a first pattern area (50) and/or a second pattern area (60), the first pattern The graphic area (50) and/or the second graphic area (60) includes several circular pattern units,所述第一图形区(50)中的相邻的两个圆形图案单元的间距为100~200微米,The distance between two adjacent circular pattern units in the first pattern area (50) is 100-200 microns,所述第二图形区(60)中的若干个圆形的图案单元根据所述目标图案的形状分布。Several circular pattern units in the second graphic area (60) are distributed according to the shape of the target pattern.4.根据权利要求3所述的微纳米潜影防伪器件的制备方法,其特征在于,所述图案单元的直径为50~80微米。4 . The method for preparing a micro-nano latent image anti-counterfeiting device according to claim 3 , wherein the pattern unit has a diameter of 50-80 microns. 5 .5.根据权利要求1所述的微纳米潜影防伪器件的制备方法,其特征在于,所述版辊(10)包括版辊本体以及设置在所述版辊本体表面的若干凸起(11),所述版辊本体与所述凸起(11)一体成型,所述凸起(11)的高度为0.8~1.2微米,所述凸起(11)的尺寸、形状与所述目标图案的尺寸、形状一致。5. The preparation method of the micro-nano latent image anti-counterfeiting device according to claim 1, wherein the plate roller (10) comprises a plate roller body and several protrusions (11) arranged on the surface of the plate roller body , the plate roller body and the protrusion (11) are integrally formed, the height of the protrusion (11) is 0.8-1.2 microns, the size and shape of the protrusion (11) are the same as the size of the target pattern , the same shape.6.根据权利要求5所述的微纳米潜影防伪器件的制备方法,其特征在于,所述版辊(10)包括橡胶版辊(10),6. The preparation method of the micro-nano latent image anti-counterfeiting device according to claim 5, wherein the plate roller (10) comprises a rubber plate roller (10),所述版辊本体为柱体,所述凸起(11)自所述版辊本体的表面向外凸出,相邻两个所述凸起(11)之间具有间隙。The plate roller body is a cylinder, the protrusions (11) protrude outward from the surface of the plate roller body, and there is a gap between two adjacent protrusions (11).7.根据权利要求1所述的微纳米潜影防伪器件的制备方法,其特征在于,所述屏蔽材料层(20)为易挥发材料,所述屏蔽材料层(20)的材料包括硅油,7. The method for preparing a micro-nano latent image anti-counterfeiting device according to claim 1, wherein the shielding material layer (20) is a volatile material, and the material of the shielding material layer (20) comprises silicone oil,将所述硅油涂布于所述凸起(11)表面。The silicone oil is coated on the surface of the protrusion (11).8.根据权利要求7所述的微纳米潜影防伪器件的制备方法,其特征在于,所述待镀结构层(30)包括通过纳米压印表面形成有微纳结构的结构层,8. The method for preparing a micro-nano latent image anti-counterfeiting device according to claim 7, wherein the to-be-plated structural layer (30) comprises a structural layer having a micro-nano structure formed on the surface by nano-imprinting,将版辊(10)表面涂布的硅油转印至所述结构层上的微纳结构表面,于所述微纳结构表面形成转印屏蔽层(21)。The silicone oil coated on the surface of the plate roller (10) is transferred to the surface of the micro-nano structure on the structure layer, and a transfer shielding layer (21) is formed on the surface of the micro-nano structure.9.根据权利要求8所述的微纳米潜影防伪器件的制备方法,其特征在于,于所述待镀结构层(30)表面形成一层镀层具体包括:9. The method for preparing a micro-nano latent image anti-counterfeiting device according to claim 8, wherein forming a layer of coating on the surface of the to-be-plated structural layer (30) specifically comprises:在高温条件下于所述待镀结构层(30)表面沉积金属,以在所述待镀结构层(30)表面形成金属镀层(40),且所述转印屏蔽层(21)在高温下挥发以在所述待镀结构层(30)表面形成镂空图案,获得微纳米潜影防伪器件。Metal is deposited on the surface of the structural layer to be plated (30) under a high temperature condition to form a metal plating layer (40) on the surface of the structural layer to be plated (30), and the transfer shielding layer (21) is exposed to the high temperature Volatilize to form a hollow pattern on the surface of the to-be-plated structural layer (30) to obtain a micro-nano latent image anti-counterfeiting device.10.根据权利要求9所述的微纳米潜影防伪器件的制备方法,其特征在于,将版辊(10)表面涂布的硅油转印至所述微纳结构表面与于所述待镀结构层(30)表面形成一层镀层同步进行,硅油转印的速度为500~600m/min,10 . The method for preparing a micro-nano latent image anti-counterfeiting device according to claim 9 , wherein the silicone oil coated on the surface of the plate roller (10) is transferred to the surface of the micro-nano structure and to the structure to be plated. 11 . A layer of coating is formed on the surface of the layer (30) simultaneously, and the transfer speed of the silicone oil is 500-600 m/min.于所述待镀结构层(30)表面形成目标厚度的镀层的时间与所述转印屏蔽层(21)在高温下完全挥发的时间一致。The time for forming a plating layer with a target thickness on the surface of the to-be-plated structural layer (30) is consistent with the time for the transfer shielding layer (21) to completely volatilize at a high temperature.11.根据权利要求9所述的微纳米潜影防伪器件的制备方法,其特征在于,于所述待镀结构层(30)表面沉积的金属包括铝,沉积的金属层的厚度为350~450埃。11 . The method for preparing a micro-nano latent image anti-counterfeiting device according to claim 9 , wherein the metal deposited on the surface of the to-be-plated structural layer ( 30 ) comprises aluminum, and the thickness of the deposited metal layer is 350-450 . Egypt.12.根据权利要求1~11任一所述的微纳米潜影防伪器件的制备方法制得的微纳米潜影防伪器件,其特征在于,其包括:12. The micro-nano latent image anti-counterfeiting device prepared by the method for preparing a micro-nano latent image anti-counterfeiting device according to any one of claims 1 to 11, wherein the device comprises:微纳结构层(70),其作为微纳米潜影防伪器件的图案载体,所述微纳结构层(70)表面具有微纳结构,A micro-nano structure layer (70), which is used as a pattern carrier of a micro-nano latent image anti-counterfeiting device, the surface of the micro-nano structure layer (70) has a micro-nano structure,图形层(80),其附着在所述微纳结构表面,且所述图形层(80)在所述微纳结构表面形成图案。A graphic layer (80) is attached to the surface of the micro-nano structure, and the graphic layer (80) forms a pattern on the surface of the micro-nano structure.13.一种用于制作微纳米潜影防伪器件的版辊,其特征在于,其包括:13. A plate roller for making a micro-nano latent image anti-counterfeiting device, characterized in that it comprises:版辊本体,以及设置在所述版辊本体表面的若干凸起(11),所述凸起(11)自所述版辊本体的表面向外凸出,相邻两个所述凸起(11)之间具有间隙;A plate roller body, and a plurality of protrusions (11) arranged on the surface of the plate roller body, the protrusions (11) protrude outward from the surface of the plate roller body, and two adjacent protrusions ( 11) There is a gap between;所述版辊本体包括柱体,所述凸起(11)自所述柱体的柱身表面向外凸出,所述版辊(10)与所述凸起(11)为一体成型;The plate roller body includes a cylinder, the protrusions (11) protrude outward from the surface of the cylinder body, and the plate roller (10) and the protrusions (11) are integrally formed;所述凸起(11)的高度为0.8~1.2微米,所述凸起(11)的尺寸、形状与微纳米潜影防伪器件上的目标图案的尺寸、形状一致。The height of the protrusion (11) is 0.8-1.2 microns, and the size and shape of the protrusion (11) are consistent with the size and shape of the target pattern on the micro-nano latent image anti-counterfeiting device.
CN202010917318.1A2020-09-032020-09-03 A kind of micro-nano latent image anti-counterfeiting device and its preparation method and plate rollerPendingCN114132062A (en)

Priority Applications (1)

Application NumberPriority DateFiling DateTitle
CN202010917318.1ACN114132062A (en)2020-09-032020-09-03 A kind of micro-nano latent image anti-counterfeiting device and its preparation method and plate roller

Applications Claiming Priority (1)

Application NumberPriority DateFiling DateTitle
CN202010917318.1ACN114132062A (en)2020-09-032020-09-03 A kind of micro-nano latent image anti-counterfeiting device and its preparation method and plate roller

Publications (1)

Publication NumberPublication Date
CN114132062Atrue CN114132062A (en)2022-03-04

Family

ID=80438399

Family Applications (1)

Application NumberTitlePriority DateFiling Date
CN202010917318.1APendingCN114132062A (en)2020-09-032020-09-03 A kind of micro-nano latent image anti-counterfeiting device and its preparation method and plate roller

Country Status (1)

CountryLink
CN (1)CN114132062A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
CN115230314A (en)*2022-07-292022-10-25湖北华工图像技术开发有限公司Die pressing structure of single-plate seamless bright silver-bottom special laser film

Citations (4)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US20070036951A1 (en)*2005-08-102007-02-153M Innovative Properties CompanyMicrofabrication using replicated patterned topography and self-assembled monolayers
US20080095988A1 (en)*2006-10-182008-04-243M Innovative Properties CompanyMethods of patterning a deposit metal on a polymeric substrate
CN108682284A (en)*2018-05-242018-10-19武汉华工图像技术开发有限公司It is a kind of accurately to wash optical anti-counterfeiting film of aluminium and preparation method thereof
CN109291673A (en)*2018-09-252019-02-01武汉华工图像技术开发有限公司A kind of patterning holographic false proof device and preparation method thereof accurately aluminized

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US20070036951A1 (en)*2005-08-102007-02-153M Innovative Properties CompanyMicrofabrication using replicated patterned topography and self-assembled monolayers
US20080095988A1 (en)*2006-10-182008-04-243M Innovative Properties CompanyMethods of patterning a deposit metal on a polymeric substrate
CN108682284A (en)*2018-05-242018-10-19武汉华工图像技术开发有限公司It is a kind of accurately to wash optical anti-counterfeiting film of aluminium and preparation method thereof
CN109291673A (en)*2018-09-252019-02-01武汉华工图像技术开发有限公司A kind of patterning holographic false proof device and preparation method thereof accurately aluminized

Cited By (2)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
CN115230314A (en)*2022-07-292022-10-25湖北华工图像技术开发有限公司Die pressing structure of single-plate seamless bright silver-bottom special laser film
CN115230314B (en)*2022-07-292023-12-01湖北华工图像技术开发有限公司Mould pressing structure of special version laser film at bottom of seamless smooth silver of single version

Similar Documents

PublicationPublication DateTitle
RU2314209C2 (en)Method for deep printing from steel plates for manufacturing a forgery-protected document, and also steel printing form for deep printing and intermediate parts for its manufacture and method for making these
CN104191860B (en)Colored dynamic solid moir é pattern thin film based on micro-printing and preparation method thereof
CN109291673B (en)Accurately aluminized patterned holographic anti-counterfeiting device and preparation method thereof
CN102269927B (en)Anti-counterfeiting microstructure pigment and manufacturing process thereof
EP2297617B1 (en)Imaging of deep structures or reliefs for shallow relief embossing
CN114132062A (en) A kind of micro-nano latent image anti-counterfeiting device and its preparation method and plate roller
CN111942070A (en)Micro-carving gold stamping plate for gold stamping of tipping paper and gold stamping process
CN103730339B (en)The manufacture method of micro/nano-scale figure stricture of vagina impressing mould
CA2554149C (en)Security device
JP5824878B2 (en) Method for producing anti-counterfeit particles
US20210318621A1 (en)Fabrication method of holographic security label
CN111638568A (en)Dynamic display film and preparation method thereof
WO2012165193A1 (en)Counterfeit prevention particles and method for manufacturing same, counterfeit prevention ink, counterfeit prevention sheet, securities certificate, card
CN114637164A (en)Method for manufacturing latent image anti-counterfeiting device
TWI239043B (en)Method of forming light-reflection pattern and its manufactured product
JP2012051227A (en)Method for manufacturing latent image intaglio printed matter
WO2020187286A1 (en)Optical anti-counterfeiting element and optical anti-counterfeiting product
KR100913200B1 (en) Display panel and manufacturing method thereof
JPWO2013176029A1 (en) Patterned roll and method for producing the same
CN222116398U (en) A naked eye 3D film and paper
JP2003165288A (en) Diffraction structure transfer foil, manufacturing method thereof, transfer method thereof, and transfer product
JP5786459B2 (en) Method for producing metal particles
JP5930091B2 (en) Method for producing metal particles
JP5458519B2 (en) Anti-counterfeit structure and anti-counterfeit medium using the same
CN106547044A (en)A kind of process equipment and manufacture method of polaroid

Legal Events

DateCodeTitleDescription
PB01Publication
PB01Publication
SE01Entry into force of request for substantive examination
SE01Entry into force of request for substantive examination

[8]ページ先頭

©2009-2025 Movatter.jp