Micro-nano latent image anti-counterfeiting device, preparation method thereof and printing rollerTechnical Field
The invention relates to the technical field of anti-counterfeiting devices, in particular to a micro-nano latent image anti-counterfeiting device, a preparation method thereof and a printing roller for preparing the micro-nano latent image anti-counterfeiting device.
Background
The earliest application in the field of domestic anti-counterfeiting is a mould pressing laser technology. The technology can be applied to the anti-counterfeiting field, and is mainly technically characterized by extremely strong information bearing capacity besides the factors of low price, convenient identification and the like. Embossed holograms can record the state of the hologram, the nature of the optical components used, the conditions of post-processing, the nature of the photosensitive material, etc., and their complex optical features cannot be efficiently replicated. Because of the strong information bearing capacity, the micro technology with extremely high difficulty for the printing ink printing method is much simpler for the die pressing laser holography.
Holography has many advantages as a security technique. First, it takes much time and money to produce a source holographic product, but mass replication is relatively inexpensive. Second, the equipment and techniques necessary for mass production of holographic products at an early stage were difficult to obtain. Third, holographic products appear to be very different from printed trademarks. Fourth, the tools (camera and printer) traditionally used by counterfeiters for counterfeiting do not work with holograms.
The holographic anti-counterfeiting technology has the characteristics of easy identification, high technological content, easy batch production and difficult copying, and is widely applied to the anti-counterfeiting field. The early holographic anti-counterfeiting technology is a grating effect prepared by interference of two beams of light, and later, the pixel photoetching technology realizes automatic photoetching. The diffraction grating effect of monochrome, homothetic different image, dynamic and the like is expanded to the new optical effects of zero-order diffraction anti-counterfeiting technology, purple light effect, platinum relief, lens reproduction and the like. The holographic anti-counterfeiting technology is developed to the present, and the new optical anti-counterfeiting technology is widely applied to the aspects of national certificates, cigarette packet packaging and brand protection.
However, with the development of technology, the requirements for holographic anti-counterfeiting technology in real life are higher and higher. The more commonly used aluminum washing process is the water aluminum washing technique, i.e. the surface of the mould pressing layer with the optical microstructure is printed with aluminum washing ink (the ink is soluble in water), then aluminum is plated, and then the optical film is immersed in water, the aluminum layer of the area containing the aluminum washing ink is dissolved in water together with the aluminum washing ink and falls off, while the area without the aluminum washing ink remains the aluminum layer, so as to form a local aluminum washing pattern. The aluminum washing precision of the method depends on the registration precision of the aluminum washing ink and the holographic pattern, and the registration precision of the method can only reach +/-0.2 mm, so that the high-precision registration printing effect cannot be obtained. Meanwhile, the process is complex because aluminum is plated firstly and then washed.
And the pattern hollowed-out dimension realized by traditional local aluminizing and large-area pattern shielding aluminizing is large and not fine enough, and the material with a micro-nano-scale precise hollowed-out metal layer structure is difficult to achieve at present.
Therefore, it is necessary to provide a new technical solution to solve the problems in the prior art.
Disclosure of Invention
The invention aims to solve the problems in the prior art, and on one hand, provides a preparation method of a micro-nano latent image anti-counterfeiting device, which is used for solving the problems that a micro-nano structure is easy to damage and a structural layer is difficult to prepare when a product is subjected to demoulding in the prior art, and adopts the following technical scheme:
a preparation method of a micro-nano latent image anti-counterfeiting device comprises the following steps:
manufacturing a plate roller matched with a target pattern, wherein the plate roller is provided with a bulge, and the pattern formed on the plate roller by the bulge is matched with the target pattern;
coating a shielding material layer on the raised surface, transferring the shielding material layer to a structure layer to be plated through a roller coated with the shielding material layer on the surface, and forming a transfer shielding layer on the structure layer to be plated, wherein the shape and position distribution of the transfer shielding layer on the structure layer to be plated is consistent with the target pattern;
and forming a coating on the surface of the structural layer to be plated, wherein the shape and position distribution of the coating on the structural layer to be plated is complementary with that of the transfer printing shielding layer.
In the foregoing technical solution, the target pattern includes a plurality of pattern units arranged in a dot matrix, and the shape of the pattern unit includes one or a combination of a plurality of circular, oval, triangular, square, diamond, pentagonal, and hexagonal shapes.
Further, the target pattern comprises a first graph area and/or a second graph area, the first graph area and/or the second graph area comprises a plurality of circular pattern units,
further, the distance between two adjacent circular pattern units in the first pattern area is 100 to 200 micrometers,
further, a plurality of circular pattern units in the second graph area are distributed according to the shape of the target pattern.
Furthermore, the diameter of the pattern unit is 50-80 microns.
Further, the plate roller comprises a plate roller body and a plurality of protrusions arranged on the surface of the plate roller body, the plate roller body and the protrusions are integrally formed, the height of each protrusion is 0.8-1.2 microns, and the size and the shape of each protrusion are consistent with those of the target pattern.
Further, the plate roller comprises a rubber plate roller,
further, the plate roller body is a cylinder, the protrusions protrude outwards from the surface of the plate roller body, and a gap is formed between every two adjacent protrusions.
Furthermore, the shielding material layer is a volatile material, the shielding material layer comprises silicone oil,
further, the silicone oil is coated on the convex surface.
Further, the structure layer to be plated comprises a structure layer with a micro-nano structure formed on the surface through nano imprinting,
further, silicone oil coated on the surface of the plate roller is transferred to the surface of the micro-nano structure on the structural layer, and a transfer printing shielding layer is formed on the surface of the micro-nano structure.
Further, forming a plating layer on the surface of the structure layer to be plated specifically includes:
and depositing metal on the surface of the structure layer to be plated at a high temperature to form a metal plating layer on the surface of the structure layer to be plated, and volatilizing the transfer printing shielding layer at a high temperature to form a hollow pattern on the surface of the structure layer to be plated to obtain the micro-nano latent image anti-counterfeiting device.
Further, transferring the silicone oil coated on the surface of the plate roller to the surface of the micro-nano structure and forming a coating on the surface of the structure layer to be coated synchronously, wherein the silicone oil transferring speed is 500-600 m/min,
furthermore, the time for forming a plating layer with the target thickness on the surface of the structure layer to be plated is consistent with the time for completely volatilizing the transfer printing shielding layer at high temperature.
Further, the metal deposited on the surface of the structure layer to be plated comprises aluminum, and the thickness of the deposited metal layer is 350-450 angstroms.
On the other hand, the invention also provides a micro-nano latent image anti-counterfeiting device prepared by the technical scheme, which comprises the following components:
a micro-nano structure layer as a pattern carrier of the micro-nano latent image anti-counterfeiting device, wherein the surface of the micro-nano structure layer is provided with a micro-nano structure,
and the graphic layer is attached to the surface of the micro-nano structure, and forms a pattern on the surface of the micro-nano structure.
On the other hand, the invention also provides a plate roller for manufacturing the micro-nano latent image anti-counterfeiting device, which comprises:
the printing roller comprises a printing roller body and a plurality of bulges arranged on the surface of the printing roller body, wherein the bulges outwards protrude from the surface of the printing roller body, and a gap is formed between every two adjacent bulges;
further, the plate roller body comprises a cylinder, the protrusion protrudes outwards from the surface of the cylinder body of the cylinder, and the plate roller and the protrusion are integrally formed;
furthermore, the height of the protrusion is 0.8-1.2 microns, and the size and the shape of the protrusion are consistent with those of a target pattern on the micro-nano latent image anti-counterfeiting device.
Compared with the prior art, the invention has one or more of the following beneficial effects:
1. the invention provides a preparation method of a micro-nano latent image anti-counterfeiting device, which is characterized in that a shielding material layer is transferred to a micro-nano structure layer through a printing roller, a bulge on the printing roller is matched with the micro-nano structure, the printing roller is used for transferring, and the micro-nano structure layer is printed and moved immediately, and only one high-level micro-nano structure is needed on the surface of the micro-nano structure layer.
2. The invention also provides a printing roller for preparing the micro-nano latent image anti-counterfeiting device, the printing roller is matched with the micro-nano structure, the shape and position distribution and the size of the bulge of the distribution printing roller are designed according to a target pattern designed by the micro-nano latent image anti-counterfeiting device, the printing roller can be a cylinder printing roller or a plate surface printing roller, the cylinder printing roller can be coated with a transfer printing shielding material layer in a rolling mode, the processing speed is high, the efficiency is high, the printing roller is extremely suitable for flexible materials with periodically distributed pattern structures, the plate surface printing roller is more suitable for plane products with incompletely corresponding patterns, the plate surface printing roller is more regular, the alignment is accurate, and the processing precision is high.
3. The preparation method of the micro-nano latent image anti-counterfeiting device realizes the patterning of the metal layer with small size and high precision of the packaging material, the pattern on the prepared micro-nano latent image anti-counterfeiting device is not easy to be found under normal visual observation, and can be clearly shown under the backlight source condition, so that the micro-nano latent image anti-counterfeiting device has better aesthetic effect and anti-counterfeiting function.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only some embodiments of the present invention, and other drawings can be obtained by those skilled in the art without creative efforts.
FIG. 1 is a schematic plan view of a target pattern designed in the process of manufacturing a micro-nano latent image anti-counterfeiting device according to an embodiment of the invention;
fig. 2 is a schematic view of the micro-nano latent image anti-counterfeiting device manufacturing method according to the embodiment of the invention, wherein a shielding material layer is transferred on the metal layer to be plated by using the plate roller;
fig. 3 is a schematic plan view of a micro-nano latent image anti-counterfeiting device manufactured by using the method for manufacturing a micro-nano latent image anti-counterfeiting device according to an embodiment of the invention;
fig. 4 is a schematic structural diagram of a micro-nano latent image anti-counterfeiting device manufactured in an embodiment of the invention.
Wherein, 10-version roller; 11-a bump; 20-a layer of shielding material; 21-transfer shield layer; 30-a structural layer to be plated; 40-metal plating; 50-a first graphic area; 60-a second graphic area; 70-micro-nano structure layer; 80-graphics layer.
Detailed Description
The technical solutions of the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings of the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
In the description of the present invention, it is to be understood that the terms "upper", "lower", "top", "bottom", "inner", "outer", and the like, indicate orientations or positional relationships based on those shown in the drawings, and are used only for convenience in describing the present invention and for simplicity in description, and do not indicate or imply that the referenced devices or elements must have a particular orientation, be constructed and operated in a particular orientation, and thus, are not to be construed as limiting the present invention. In the description of the present invention, "a plurality" means two or more unless specifically defined otherwise.
In the present invention, unless otherwise expressly stated or limited, the terms "mounted," "connected," "secured," and the like are to be construed broadly and can, for example, be fixedly connected, detachably connected, or integrally formed; can be mechanically or electrically connected; either directly or indirectly through intervening media, either internally or in any other relationship. The specific meanings of the above terms in the present invention can be understood by those skilled in the art according to specific situations.
The gist of the present invention will be further explained below with reference to the accompanying drawings and examples.
Example (b):
referring to fig. 1 to 4, an aspect of the present invention is to provide a method for manufacturing a micro-nano latent image anti-counterfeit device, including:
the lattice-type arrangement design forms a target pattern,
manufacturing aplate roller 10 matched with the target pattern, wherein theplate roller 10 is provided withbulges 11, and the pattern formed on theplate roller 10 by thebulges 11 is matched with the target pattern;
coating a shielding material layer 20 on the surface of theprotrusion 11, transferring the shielding material layer 20 onto astructure layer 30 to be plated through aplate roller 10 coated with the shielding material layer 20 on the surface, forming atransfer shielding layer 21 on thestructure layer 30 to be plated, wherein the shape and position distribution of thetransfer shielding layer 21 on thestructure layer 30 to be plated is consistent with the target pattern;
and forming a metal coating on the surface of thestructure layer 30 to be plated, wherein the shape and position distribution of the metal coating on thestructure layer 30 to be plated is complementary with the transferprinting shielding layer 21.
In an embodiment, refer to fig. 1, which is a schematic plan view of a target pattern designed when the micro-nano latent image anti-counterfeiting device is prepared according to the present invention, where the target pattern includes a plurality of pattern units arranged in a dot matrix. The shape of the pattern unit can be one or a combination of more than one of circle, ellipse, triangle, square, diamond, pentagon and hexagon.
In one embodiment, with continued reference to FIG. 1, the target pattern includes a firstgraphic area 50 and a secondgraphic area 60, each of the firstgraphic area 50 and the secondgraphic area 60 including a number of circular pattern elements. Thefirst pattern area 50 can be called an array area, thesecond pattern area 60 can be called a pattern area, the array area and the pattern area are both composed of a plurality of circular pattern units (the circular pattern units can be regarded as dots), the dots in the array area are arranged according to an array rule, namely, are arranged in a dot matrix mode, the distance between the adjacent dots is 100-200 micrometers, and the distance between the adjacent dots in the pattern area is distributed according to design requirements and is combined into patterns, characters, letters and the like. The diameter of the pattern unit may be 50 to 80 micrometers.
And continuing to refer to fig. 2, manufacturing a plate roller for preparing the micro-nano latent image anti-counterfeiting device. In one embodiment, theplate roller 10 includes a plate roller body and a plurality ofprotrusions 11 disposed on a surface of the plate roller body, the plate roller body and theprotrusions 11 are integrally formed, a height of eachprotrusion 11 is 0.8 to 1.2 micrometers, and a size and a shape of eachprotrusion 11 are consistent with a size and a shape of the target pattern.
In one embodiment, theprinting roll 10 comprises aflexographic roll 10, the body of the printing roll may be a cylindrical structure, i.e., as shown in fig. 2, theprotrusions 11 protrude outward from the surface of the body of the printing roll, and a gap is formed between twoadjacent protrusions 11. When the micro-nano latent image anti-counterfeiting device is applied to a flexible material, a cylinder plate roller can be adopted for roll-to-roll printing, so that the processing efficiency is improved, and theplate roller 10 can also be a plate roller. Certainly, the gap between twoadjacent bumps 11 on theplate roller 10 is determined according to the target pattern on the micro-nano latent image anti-counterfeiting device, the distribution mode of thebumps 11 on theplate roller 10, the height of the bumps, the surface shape of the bumps, and other parameters are determined by the target pattern, and theplate roller 10 can also be said to be a printing template.
In one embodiment, a shielding material layer 20 is coated on the surface of theprotrusion 11, and the shielding material layer 20 is a volatile material, such as silicone oil. Silicone oil may be applied to the surface of theprotrusions 11.
In an embodiment, the structure layer to be plated 30 may be a flexible structure layer with a micro-nano structure formed on a nano-imprinting surface, and the silicone oil coated on the surface of theplate roller 10 is transferred to the surface of the micro-nano structure on the flexible structure layer, so as to form atransfer shielding layer 21 on the surface of the micro-nano structure.
In one embodiment, the step of forming ametal plating layer 40 on the surface of thestructure layer 30 to be plated specifically includes:
depositing metal on the surface of thestructure layer 30 to be plated at a high temperature to form ametal plating layer 40 on the surface of thestructure layer 30 to be plated, and volatilizing the transferprinting shielding layer 21 at a high temperature to form a hollow pattern on the surface of thestructure layer 30 to be plated to obtain the micro-nano latent image anti-counterfeiting device. The silicone oil coated on the surface of theplate roller 10 is transferred to the surface of the micro-nano structure and themetal coating 40 is formed on the surface of thestructure layer 30 to be plated, preferably, the silicone oil transfer speed is 500-600 m/mi n in a preferred embodiment, and in order to obtain a hollow structure with a better effect, the time for forming themetal coating 40 with a target thickness on the surface of thestructure layer 30 to be plated is preferably consistent with the time for completely volatilizing thetransfer shielding layer 21 at a high temperature, so that the deposition of the metal coating is also completed while the transfer shielding layer 21 (silicone oil material) is volatilized, and a good hollow effect is ensured.
In one embodiment, the metal deposited on the surface of thestructure layer 30 to be plated may be aluminum, and the thickness of the deposited metal aluminum layer may reach 350 to 450 angstroms.
The preparation method of the micro-nano latent image anti-counterfeiting device comprises the steps of designing a target pattern, representing the target pattern by a plurality of dots (including designing the diameter of each dot, the distance between two adjacent dots and the like), completely presenting the target pattern, manufacturing a matched plate roller according to the target pattern, designing a bulge on the plate roller, wherein the bulge is a template printed in an alignment mode with the dots, coating a shielding material layer on the surface of the bulge of the plate roller after the plate roller is manufactured, transferring the shielding material layer on the bulge of the plate roller onto a structure layer to be plated, depositing metal on the structure layer to be plated during transfer printing, completely volatilizing the shielding material layer under a high-temperature condition after the deposited metal reaches the target thickness, forming the target pattern by the deposited metal plating layer, and using the target pattern layer as the finally obtained micro-nano latent image anti-counterfeiting device, and the part of the shielding material layer is exposed to form a hollow pattern. It is worth mentioning that the printing of the shielding material layer and the aluminum plating are performed synchronously, metal is deposited on the surface of the structure layer to be plated without the shielding material layer, no metal is deposited on the surface with the shielding material layer, because the aluminum plating is performed at a high temperature, the material of the shielding material layer is continuously volatilized at a high temperature until the material completely disappears, a hollow effect is finally formed on the surface with the shielding material layer, a device with a nano latent image anti-counterfeiting function is formed on the surface of the material, and a plane schematic diagram of the finally prepared micro-nano latent image anti-counterfeiting device object is shown in fig. 3. Comparing fig. 1 and fig. 3, the original dot area on the target pattern has darker brightness due to no metal coating plated on the surface, and finally forms a dark area in the real image, while the other areas without dots have bright area in the real image due to metal coating plated on the surface.
In another aspect, the present invention further provides a micro-nano latent image anti-counterfeiting device manufactured by the method for manufacturing a micro-nano latent image anti-counterfeiting device, which can be seen in fig. 4, where fig. 4 is a schematic structural diagram of a micro-nano latent image anti-counterfeiting device manufactured by the method of the present invention in one embodiment, and the method includes:
themicro-nano structure layer 70 is used as a pattern carrier of a micro-nano latent image anti-counterfeiting device, a micro-nano structure is arranged on the surface of themicro-nano structure layer 70, the micro-nano structure can be a concave-convex structure and can be of any reasonable height, in one embodiment, a shielding material layer is printed and coated on the protrusions of the surface of the micro-nano structure, if metal is deposited on the concave structures of the surface of the micro-nano structure, apattern layer 80 is finally formed on the concave structures of the surface of the micro-nano structure, thepattern layer 80 forms patterns on the surface of the micro-nano structure, and the protruding parts of the surface of the micro-nano structure can form a hollow effect. Generally, the size of the protrusion on the plate roller should be much larger than that of the micro-nano structure, so according to the target pattern, the protrusion on the surface of some micro-nano structures can be completely printed with the shielding material, some micro-nano structures are partially printed, and some micro-nano structures are not printed, so that not only the concave structure on the surface of the micro-nano structure can be provided with the metal coating, but also part or all of the protrusion on the surface of some micro-nano structures are provided with the metal coating, therefore, fig. 4 is only a structural schematic diagram of the micro-nano latent image anti-counterfeiting device manufactured by using the method in one embodiment, and the method cannot be understood as limiting the invention.
In another aspect, with continued reference to fig. 2, the present invention further provides aprinting roller 10 for manufacturing a micro-nano latent image anti-counterfeiting device, including:
the printing roller comprises a printing roller body and a plurality ofbulges 11 arranged on the surface of the printing roller body, wherein thebulges 11 protrude outwards from the surface of the printing roller body, and a gap is formed between every twoadjacent bulges 11.
In one embodiment, the plate roll body may be a cylinder, that is, as shown in fig. 2, theprotrusions 11 protrude outward from the cylindrical surface of the cylinder, and theplate roll 10 and theprotrusions 11 may be integrally formed, with a gap between twoadjacent protrusions 11. Of course, the gap is determined according to the target pattern on the micro-nano latent image anti-counterfeiting device, the distribution mode of theprotrusions 11 on theplate roller 10, the height of the protrusions, the surface shape of the protrusions, and other parameters are determined by the target pattern, and theplate roller 10 can also be said to be a printing template. The height range of theprotrusions 11 is 0.8-1.2 micrometers, and the size and the shape of theprotrusions 11 are consistent with those of target patterns on the micro-nano latent image anti-counterfeiting device.
The printing roller is matched with the micro-nano structure, the shape and position distribution and the size of the bulge of the printing roller are designed according to a target pattern designed by a micro-nano latent image anti-counterfeiting device, the printing roller can be a cylinder printing roller or a plate surface printing roller, the cylinder printing roller can be used for coating a transfer printing shielding material layer in a rolling mode, the processing speed is high, the efficiency is high, the printing roller is extremely suitable for flexible pattern structures with periodic distribution, the plate surface printing roller is more suitable for plane products with incompletely corresponding patterns, the plate surface printing roller is more regular, the alignment is accurate, and the processing precision is high.
The invention provides a preparation method of a micro-nano latent image anti-counterfeiting device, which is characterized in that a shielding material layer is transferred to a micro-nano structure layer through a printing roller, a bulge on the printing roller is matched with the micro-nano structure, the printing roller is used for transferring, and the micro-nano structure layer is printed and moved immediately, and only one high-level micro-nano structure is needed on the surface of the micro-nano structure layer.
In conclusion, the preparation method of the micro-nano latent image anti-counterfeiting device provided by the invention realizes the patterning of the metal layer with small size and high precision of the packaging material, the pattern on the prepared micro-nano latent image anti-counterfeiting device is not easy to find under normal visual observation, and can be clearly shown under the backlight source condition, so that the micro-nano latent image anti-counterfeiting device has better aesthetic effect and anti-counterfeiting function.
In the description herein, references to the description of the term "one embodiment," "some embodiments," "an example," "a specific example" or "some examples" or the like are intended to mean that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the invention. In this specification, the schematic representations of the terms used above are not necessarily intended to refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples. Furthermore, various embodiments or examples described in this specification can be combined and combined by one skilled in the art.
While embodiments of the present invention have been shown and described above, it is to be understood that the above embodiments are exemplary and not to be construed as limiting the present invention, and that changes, modifications and variations may be made therein by those of ordinary skill in the art within the scope of the present invention.