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CN112658960A - Polishing method for ceramic part with irregular inner wall - Google Patents

Polishing method for ceramic part with irregular inner wall
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Publication number
CN112658960A
CN112658960ACN202011623013.6ACN202011623013ACN112658960ACN 112658960 ACN112658960 ACN 112658960ACN 202011623013 ACN202011623013 ACN 202011623013ACN 112658960 ACN112658960 ACN 112658960A
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CN
China
Prior art keywords
polishing
ceramic
polishing medium
medium
irregular inner
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
CN202011623013.6A
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Chinese (zh)
Inventor
黄明臻
陈简
杨永强
谢怀婷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Suzhou Sailantec High Tech Ceramic Co ltd
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Suzhou Sailantec High Tech Ceramic Co ltd
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Priority to CN202011623013.6ApriorityCriticalpatent/CN112658960A/en
Publication of CN112658960ApublicationCriticalpatent/CN112658960A/en
Withdrawnlegal-statusCriticalCurrent

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Abstract

The invention discloses a polishing method of a ceramic part with an irregular inner wall, which comprises the following steps of S1, preparing a polishing medium, wherein the polishing medium is slurry formed by zirconium oxide particles, diamond powder and water; s2, placing the ceramic piece to be polished and the polishing medium in a polishing vibration machine, and starting the polishing vibration machine to enable the ceramic piece to rotate in the polishing medium, so that the polishing medium polishes the surface of the ceramic piece. The invention has the following outstanding effects: batch polishing is realized, the number of processed workpieces reaches 3000 pieces each time, the polished surface is uniform, the precision reaches Ra <0.25 mu m, and once the polishing medium is prepared, the polishing medium can be repeatedly used for many times, so that the polishing medium is economic and environment-friendly.

Description

Polishing method for ceramic part with irregular inner wall
Technical Field
The invention belongs to the technical field of ceramic part processing, and particularly relates to a polishing method for a ceramic part with an irregular inner wall.
Background
Because of its high strength, high hardness, stability, wear resistance, corrosion resistance, high temperature resistance, etc., alumina is often made into various ceramic parts for high-end fields such as superfine grinding equipment, fine chemical engineering, electronic slurry, semiconductors, new energy, medical instruments, precision casting, optical fiber connectors, etc. For some products requiring high precision, the surface of the product needs to be polished before application. When the roughness of the ceramic piece with the irregular surfaces such as the spiral inner wall and the like or the inner wall of the narrow hole needs to be processed to Ra less than 0.3 mu m, a mechanical grinding machine hard processing method is generally adopted, namely, a product to be processed is fixed on a tool clamp, and a grinding head and other tools are adopted to achieve the polishing effect through the grinding principle. In this way, the precision is high, and the ceramic surface can be polished to Ra <0.1 μm. However, the method needs to clamp the product, has low efficiency, and is difficult to process the inner wall of the product with the inner diameter of 1.0 mm. Or adopting the Schmann fluid polishing machine to extrude the abrasive to the surface and the inner hole of the workpiece, and uniformly reciprocating the inner hole and the inner hole, so as to achieve the effects of finishing the roughness of the workpiece and removing burrs and fins by continuously grinding abrasive particles. However, because the abrasive is semifluid and has certain viscosity, when pressure is generated, the abrasive can not only grind on the surface of a workpiece, but also can penetrate into inner holes and micro holes of the workpiece, and the problem of complex polishing and deburring which cannot be completed by a common polishing scheme is solved. Although the polishing problem of small-aperture special-shaped parts is solved, the polishing device has the advantages of low efficiency, low speed, high machine equipment investment and high processing cost, and is difficult to produce in large scale. Because of the super-hard physical properties of alumina ceramics, the Rockwell hardness is about 90 (about 1800 Vickers hardness), the Rockwell hardness of metals is generally only about 50, and the economical and suitable polishing medium is also the difficulty of polishing the surface of ceramics.
Disclosure of Invention
In view of the above-mentioned drawbacks of the prior art, the present invention aims to provide a polishing method for a ceramic part with an irregular inner wall.
The purpose of the invention is realized by the following technical scheme:
the polishing method of the ceramic piece with the irregular inner wall comprises the following steps,
s1, preparing a polishing medium, wherein the polishing medium is a slurry formed by zirconia particles, diamond powder and water;
s2, placing the ceramic piece to be polished and the polishing medium in a polishing vibration machine, starting the polishing vibration machine to enable the ceramic piece to rotate in the polishing medium, so that the polishing medium polishes the surface of the ceramic piece, wherein the addition amount of the polishing medium and the ceramic piece to be polished are in a volume ratio of less than or equal to 10: 1.
preferably, the polishing medium is proportionally prepared zirconia particles, diamond powder and water, wherein the input of the diamond powder is not less than 0.05 percent and the input of the water is not less than 0.3 percent per kilogram of the zirconia particles.
Preferably, the water is an aqueous solution that does not contain iron ions.
Preferably, the zirconia grains have a diameter less than 1/3 of the pores of the ceramic article to be polished.
Preferably, the diamond powder has an average particle size of < 0.5 μm.
Preferably, the vibration frequency of the polishing vibrator is more than or equal to 35 Hz.
Preferably, the polishing time is in the range of 48-72 hours/cycle.
The invention has the following outstanding effects: batch polishing is realized, the number of processed workpieces reaches 3000 pieces each time, the polished surface is uniform, the precision reaches Ra <0.25 mu m, and once the polishing medium is prepared, the polishing medium can be repeatedly used for many times, so that the polishing medium is economic and environment-friendly.
The following detailed description of the embodiments of the present invention is provided in connection with the examples to facilitate understanding and understanding of the technical solutions of the present invention.
Detailed Description
The invention discloses a polishing method of a ceramic part with an irregular inner wall, which comprises the following steps of firstly, preparing a polishing medium, wherein the polishing medium is slurry formed by zirconia particles, diamond powder and water; the polishing medium comprises zirconium oxide particles, diamond powder and water which are prepared according to a proportion, wherein the diamond powder is not less than 0.05 percent and the water is not less than 0.3 percent of each kilogram of zirconium oxide particles. The water is an aqueous solution containing no iron ions. The zirconia grains have a diameter less than 1/3 of the pores of the ceramic article to be polished. The average grain diameter of the diamond powder is less than 0.5 mu m. Placing a ceramic piece to be polished and a polishing medium in a polishing vibration machine, starting the polishing vibration machine to enable the ceramic piece to rotate in the polishing medium, so that the polishing medium polishes the surface of the ceramic piece, wherein the addition amount of the polishing medium and the ceramic piece to be polished are in a volume ratio of less than or equal to 10: 1. the vibration frequency of the polishing vibrator is more than or equal to 35 Hz. The polishing time in the present invention is in the range of 48 to 72 hours per cycle.
Example 1
The weight ratio of the zirconia particles is as follows: diamond powder: the polishing method comprises the steps of preparing a polishing medium by water =10:0.5:1, putting the polishing medium into a polishing vibration machine by using the polishing vibration machine with the vibration frequency of 55Hz, putting a ceramic piece to be polished into the polishing vibration machine, wherein the volume ratio of the ceramic piece to the polishing medium is 1:3, taking out the ceramic piece after polishing for 72 hours to observe the polishing effect, wherein the spiral inner wall of the ceramic piece is smooth and meets the requirement, and the polishing precision Ra of the ceramic piece is less than 0.25 mu m.
Example 2
The weight ratio of the zirconia particles is as follows: diamond powder: the polishing method comprises the steps of preparing a polishing medium by using water =10:0.8:2, putting the polishing medium into a polishing vibration machine by using the polishing vibration machine with the vibration frequency of 65Hz, putting a ceramic piece to be polished into the polishing vibration machine, wherein the volume ratio of the ceramic piece to the polishing medium is 1:5, taking out the ceramic piece after polishing for 48 hours, observing the polishing effect, enabling the spiral inner wall to be smooth, meeting the requirement, and enabling the polishing precision Ra to be less than 0.25 mu m.
Example 3
The weight ratio of the zirconia particles is as follows: diamond powder: the polishing method comprises the steps of preparing a polishing medium by using water =20:1.8:5, putting the polishing medium into a polishing vibration machine by using the polishing vibration machine with the vibration frequency of 75Hz, putting a ceramic piece to be polished into the polishing vibration machine, wherein the volume ratio of the ceramic piece to the polishing medium is 1:8, taking out the ceramic piece after polishing for 48 hours, observing the polishing effect, enabling the spiral inner wall to be smooth, meeting the requirement, and enabling the polishing precision Ra to be less than 0.25 mu m.
The invention has various embodiments, and all technical solutions formed by adopting equivalent transformation or equivalent transformation are within the protection scope of the invention.

Claims (7)

CN202011623013.6A2020-12-312020-12-31Polishing method for ceramic part with irregular inner wallWithdrawnCN112658960A (en)

Priority Applications (1)

Application NumberPriority DateFiling DateTitle
CN202011623013.6ACN112658960A (en)2020-12-312020-12-31Polishing method for ceramic part with irregular inner wall

Applications Claiming Priority (1)

Application NumberPriority DateFiling DateTitle
CN202011623013.6ACN112658960A (en)2020-12-312020-12-31Polishing method for ceramic part with irregular inner wall

Publications (1)

Publication NumberPublication Date
CN112658960Atrue CN112658960A (en)2021-04-16

Family

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Family Applications (1)

Application NumberTitlePriority DateFiling Date
CN202011623013.6AWithdrawnCN112658960A (en)2020-12-312020-12-31Polishing method for ceramic part with irregular inner wall

Country Status (1)

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CN (1)CN112658960A (en)

Citations (4)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US5249395A (en)*1991-04-301993-10-05Hoya CorporationMethod of polishing dental instrument
JPH05293753A (en)*1992-04-201993-11-09Toshiba Ceramics Co LtdPolishing method for ceramics member
JPH05309556A (en)*1992-05-071993-11-22Showa Shell Sekiyu KkAbrasive material and polishing method for minute parts
CN104708525A (en)*2015-03-262015-06-17蓝思科技股份有限公司Polishing method for tiny ceramic product

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US5249395A (en)*1991-04-301993-10-05Hoya CorporationMethod of polishing dental instrument
JPH05293753A (en)*1992-04-201993-11-09Toshiba Ceramics Co LtdPolishing method for ceramics member
JPH05309556A (en)*1992-05-071993-11-22Showa Shell Sekiyu KkAbrasive material and polishing method for minute parts
CN104708525A (en)*2015-03-262015-06-17蓝思科技股份有限公司Polishing method for tiny ceramic product

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Application publication date:20210416

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