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CN111304613B - Magnetron rotating and lifting mechanism and magnetron sputtering equipment - Google Patents

Magnetron rotating and lifting mechanism and magnetron sputtering equipment
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Publication number
CN111304613B
CN111304613BCN202010241265.6ACN202010241265ACN111304613BCN 111304613 BCN111304613 BCN 111304613BCN 202010241265 ACN202010241265 ACN 202010241265ACN 111304613 BCN111304613 BCN 111304613B
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rotary
lifting
magnetron
rotating
shaft
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CN111304613A (en
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张立茂
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Beijing Naura Microelectronics Equipment Co Ltd
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Beijing Naura Microelectronics Equipment Co Ltd
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Priority to TW110110076Aprioritypatent/TWI827920B/en
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Abstract

The invention provides a magnetron rotating and lifting mechanism and magnetron sputtering equipment, wherein the mechanism is connected with a base arranged at the top of a reaction chamber and comprises a rotating driving device, a lifting driving device and a lifting connecting piece connected with the lifting driving device, the lifting driving device is fixed on the base and comprises a rotating driving source, a transmission assembly and a rotating shaft, wherein the rotating shaft can be arranged on the lifting connecting piece in a way of rotating around the axial direction of the rotating shaft, and the rotating shaft is used for being connected with a magnetron; the rotating bearing is fixed on the lifting connecting piece through a bearing seat; the rotary driving source is fixed on the base; the transmission assembly is used for transmitting the rotary power provided by the rotary driving source to the rotary shaft, and the transmission assembly is set to be capable of synchronously lifting with the rotary shaft when the lifting connecting piece drives the rotary shaft to lift, and is always connected with the rotary driving source. The magnetron rotating and lifting mechanism provided by the invention can reduce the deformation degree of the lifting connecting piece, thereby ensuring the levelness of the magnetron.

Description

Magnetron rotating and lifting mechanism and magnetron sputtering equipment
Technical Field
The invention relates to the technical field of semiconductor processing, in particular to a magnetron rotating and lifting mechanism and magnetron sputtering equipment.
Background
The magnetron sputtering method is one of physical vapor deposition methods, is generally applied to preparing materials such as metals, semiconductors, insulators and the like, and has the advantages of simple equipment, easy control, large film coating area, strong adhesive force and the like. The magnetron sputtering method is to introduce a magnetic field on the surface of a target cathode, and the plasma density is improved by utilizing the constraint of the magnetic field on charged particles, thereby achieving the purpose of increasing the sputtering efficiency.
The sputtering process of the target is completed along with the rotation of the magnetron arranged on one side of the back surface of the target, and the magnetron rotates at a constant speed for one period on one side of the back surface of the target, which is equal to the whole target subjected to one-time full-target sputtering.
At present, the magnetron is driven to rotate and lift by a rotary lifting mechanism, which generally comprises a rotary driving device and a lifting driving device, wherein the lifting driving device is fixed on a base at the top of the reaction chamber, the lifting driving device is connected with the rotary driving device through a lifting connecting piece, and the rotary driving device is connected with the magnetron. The rotary driving device and the magnetron synchronously do lifting motion under the driving of the lifting driving device. The rotation driving device is used for driving the magnetron to rotate.
However, the above-described rotary elevating mechanism inevitably has the following problems in practical use:
the lifting connection member is usually of a cantilever structure, i.e. one end is connected to the lifting drive device and the other end is a free end, in which case the lifting connection member is easily deformed under the action of gravity of the rotary drive device and the control tube, thereby affecting the levelness of the magnetron and further adversely affecting the process.
Disclosure of Invention
The invention aims to at least solve one technical problem in the prior art, and provides a magnetron rotating and lifting mechanism and magnetron sputtering equipment, which can reduce the deformation degree of a lifting connecting piece, thereby ensuring the levelness of a magnetron.
In order to achieve the above object, the present invention provides a magnetron rotary lifting mechanism, which is connected to a base disposed at the top of a reaction chamber, and includes a lifting driving device and a lifting connecting member connected to the lifting driving device, the lifting driving device being fixed to the base, and a rotary driving device including a rotary driving source, a transmission assembly and a rotary shaft, wherein,
the rotating shaft is arranged on the lifting connecting piece in a manner of rotating around the axial direction of the rotating shaft, and the rotating shaft is used for being connected with the magnetron;
the rotary driving source is fixed on the base and is connected with the rotary shaft through the transmission assembly;
the transmission assembly is used for transmitting the rotary power provided by the rotary driving source to the rotary shaft, and the transmission assembly is set to be capable of synchronously lifting with the rotary shaft when the lifting connecting piece drives the rotary shaft to lift, and simultaneously is always connected with the rotary driving source.
Optionally, the transmission assembly comprises a first pulley, a second pulley and a synchronous belt, wherein,
the first belt pulley is sleeved on the rotating shaft;
the second belt wheel is sleeved on a driving shaft of the rotary driving source;
the synchronous belt is wound on the first belt wheel and the second belt wheel and is matched with the first belt wheel and the second belt wheel through gears, and the width of the synchronous belt in the lifting direction of the rotating shaft is smaller than that of the second belt wheel in the lifting direction.
Optionally, still be provided with two on the second band pulley and block the chimb, two block the chimb border the direction of lift interval sets up two edges of the gear face of second band pulley are used for blockking the hold-in range breaks away from when going up and down the second band pulley.
Optionally, the width of the second pulley in the lifting direction is greater than the sum of the width of the synchronous belt in the lifting direction and the maximum displacement of the lifting connecting plate in the lifting direction.
Optionally, the rotary driving device further includes a fixing bracket, the fixing bracket includes a bracket body and a supporting leg, the upper end of the supporting leg is connected to the bracket body, the lower end of the supporting leg is fixedly connected to the base, and a first through hole penetrating through the bracket body along the lifting direction is formed in the bracket body; the rotary driving source is fixed at the bottom of the support body, and a driving shaft of the rotary driving source penetrates through the first through hole from bottom to top and is fixedly connected with the second belt wheel above the support body.
Optionally, the rotary driving device further comprises a bearing seat and a rotary bearing, wherein,
the rotary bearing is fixed on the lifting connecting piece through the bearing seat;
the rotating shaft penetrates through the rotating bearing and is in rotating fit with the rotating bearing.
Optionally, the magnetron rotary lifting mechanism further includes at least two guide rods arranged at intervals, second through holes penetrating along the lifting direction of the magnetron rotary lifting mechanism are arranged in the lifting connecting piece in a one-to-one correspondence manner, the lower end of each guide rod is fixedly connected with the base, the upper end of each guide rod penetrates through the corresponding second through hole from bottom to top, and each guide rod is matched with the corresponding second through hole in a relatively movable manner.
Optionally, a guide bearing is disposed in each second through hole, and the corresponding guide rod is matched with the guide bearing.
Optionally, each guide bearing is fixed in the second through hole through a flange, and the flange is overlapped on the upper surface of the lifting connecting piece and is fixedly connected with the lifting connecting piece through a screw.
As another technical solution, the present invention further provides a magnetron sputtering apparatus, including a reaction chamber and a base disposed at the top of the reaction chamber, wherein the base has a cavity for containing deionized water, a magnetron is disposed in the cavity through a rotary lifting mechanism, and the rotary lifting mechanism adopts the magnetron rotary lifting mechanism provided by the present invention.
The invention has the beneficial effects that:
the magnetron rotation lifting mechanism provided by the invention can reduce the gravity borne by the lifting connecting piece, eliminate the pressure of the lifting connecting piece deviating to one side and reduce the deformation degree of the lifting connecting piece by fixing the rotation driving source on the base, thereby ensuring the levelness of the magnetron. And the transmission assembly is used for transmitting the rotary power provided by the rotary driving source to the rotary shaft, and is set to be capable of synchronously lifting with the rotary shaft when the lifting connecting piece drives the rotary shaft to lift, and simultaneously is always connected with the rotary driving source, so that the lifting connecting piece can drive the rotary shaft to lift to realize the lifting of the magnetron, and the rotary driving source can drive the rotary shaft and the magnetron to synchronously rotate through the transmission assembly, thereby ensuring the levelness of the magnetron and ensuring the functions of driving the magnetron to lift and rotate by the rotary lifting mechanism.
According to the magnetron sputtering device provided by the invention, the magnetron rotating and lifting mechanism provided by the invention is adopted, so that the functions of driving the magnetron to lift and rotate by the rotating and lifting mechanism are ensured while the levelness of the magnetron is ensured.
Drawings
Fig. 1 is a sectional view of a magnetron rotary elevating mechanism according to a first embodiment of the present invention;
fig. 2A is a schematic view showing the installation of a rotary drive source used in the first embodiment of the present invention;
FIG. 2B is a schematic structural diagram of a fixing bracket according to the first embodiment of the present invention;
FIG. 3 is a bottom view of a fixing bracket used in the first embodiment of the present invention;
FIG. 4 is a schematic structural diagram of a transmission assembly employed in the first embodiment of the present invention;
fig. 5 is a structural view of a second pulley employed in the first embodiment of the present invention;
fig. 6 is a sectional view of a magnetron rotary elevating mechanism provided in a second embodiment of the present invention;
FIG. 7 is a structural view of a guide bar employed in the second embodiment of the present invention;
fig. 8 is a sectional view showing the connection of a guide bar and a lifting link according to a second embodiment of the present invention.
Detailed Description
In order to make those skilled in the art better understand the technical solution of the present invention, the magnetron rotating and lifting mechanism and the magnetron sputtering apparatus provided by the present invention are described in detail below with reference to the accompanying drawings.
Referring to fig. 1, a magnetron rotary lifting mechanism according to a first embodiment of the present invention is connected to abase 9 disposed at the top of a reaction chamber (not shown), wherein thebase 9 is located at a side of the back surface of a target, and thebase 9 has a cavity for containing deionized water, and amagnetron 8 is located in the cavity and mounted on thebase 9 through the magnetron rotary lifting mechanism.
The magnetron rotary lifting mechanism comprises alifting driving device 1, a lifting connectingpiece 2 connected with thelifting driving device 1 and a rotary driving device. Wherein, thelifting driving device 1 is fixed on thebase 9, and thelifting driving device 1 can be a lifting motor, a lifting cylinder or a lifting hydraulic cylinder, etc.
In this embodiment, thelifting connection member 2 is a flat plate structure and is horizontally disposed (perpendicular to the moving direction of thelifting driving device 1 for driving thelifting connection member 2 to lift), and one end of thelifting connection member 2 is connected to thelifting driving device 1, and thelifting connection member 2 can move up and down under the driving of thelifting driving device 1.
The rotation driving device includes a rotation driving source 3, a transmission assembly 4, and arotation shaft 6. Wherein, the rotatingshaft 6 is vertically arranged (parallel to the movement direction of thelifting driving device 1 for driving the lifting connectingpiece 2 to lift), the lower end of the rotating shaft is fixedly connected with themagnetron 8 through agear box 7, and the upper end of the rotating shaft is connected with the transmission component 4; and, arotation shaft 6 is rotatably provided on theelevation joint member 2 around the axial direction thereof. In this embodiment, the rotation driving device further includes a bearinghousing 5 and a rotation bearing (not shown in the figure), wherein the rotation bearing is fixed on thelifting link 2 through thebearing housing 5; the rotatingshaft 6 is inserted into the rotating bearing and is rotatably matched with the rotating bearing. Specifically, thebearing seat 5 comprises a main body and a flange arranged at one end of the main body, wherein the main body is sleeved around the rotary bearing and penetrates through the lifting connectingpiece 2 along the vertical direction; the flange is superposed on the lifting connectingpiece 2 and is fixedly connected with the lifting connectingpiece 2 through a screw.
The rotary drive source 3 is fixed to thebase 9. Thus, the gravity borne by the lifting connectingpiece 2 can be reduced, the pressure of the lifting connecting piece to one side is eliminated, the deformation degree of the lifting connectingpiece 2 is reduced, and the levelness of themagnetron 8 can be ensured.
In the present embodiment, as shown in fig. 1 and 2A, the rotation driving device further includes afixing bracket 34 for fixing the rotation driving source 3 on thebase 9. Specifically, as shown in fig. 2B, thefixing bracket 34 includes abracket body 341 and twolegs 342, wherein the twolegs 342 are respectively located at two sides of thebracket body 341, and an upper end of eachleg 342 is connected to thebracket body 341 and a lower end thereof is fixedly connected to thebase 9, and specifically, as shown in fig. 3, afixing hole 322 is provided in eachleg 342 to enable theleg 342 to be fixedly connected to thebase 9 by a screw. Also, a first throughhole 323 penetrating theholder body 341 in the ascending and descending direction (i.e., the moving direction in which the ascending and descendingdriving device 1 drives the ascending and descendinglink 2 to ascend and descend) is provided in theholder body 341.
In the present embodiment, as shown in fig. 2B, the rotation driving source 3 includes arotation motor 33 and a decelerator 32, wherein therotation motor 33 is fixed at the bottom of theholder body 341, and specifically, as shown in fig. 3, a plurality of mountingholes 321 are provided in theholder body 341 around the first throughhole 323 to enable theholder body 341 and therotation motor 33 to be fixedly connected by screws. The drivingshaft 31 of the speed reducer 32 passes through the first throughhole 323 from the bottom to the top and is connected to the transmission assembly 4.
It should be noted that the present invention is not limited to the manner of fixing the rotation driving source 3 to thebase 9 provided in the above-described embodiment. In practical applications, the rotary drive source 3 may be fixed to thebase 9 in any other manner.
In the present embodiment, the transmission assembly 4 is used for transmitting the rotation power provided by the rotation driving source 3 to therotation shaft 6, and the transmission assembly 4 is configured to be capable of lifting and lowering synchronously with therotation shaft 6 when the lifting and lowering connectingmember 2 drives therotation shaft 6 to lift and lower, and simultaneously keep connected with the rotation driving source 3 all the time. Therefore, thelifting connecting piece 2 can drive therotating shaft 6 to lift so as to drive themagnetron 8 to lift, and the rotating driving source 3 can drive therotating shaft 6 and themagnetron 8 to synchronously rotate through the transmission component 4, so that the functions of driving the magnetron to lift and rotate by the rotating lifting mechanism are ensured while the levelness of themagnetron 8 is ensured.
Specifically, as shown in fig. 1 and 4, the transmission assembly 4 includes afirst pulley 41, asecond pulley 43 and atiming belt 42, wherein thefirst pulley 41 is sleeved on therotating shaft 6 and can drive therotating shaft 6 to rotate synchronously; thesecond belt pulley 43 is sleeved on the driving shaft of the rotation driving source 3, in this embodiment, thesecond belt pulley 43 is sleeved on the drivingshaft 31 of the speed reducer 32, and the drivingshaft 31 can drive thesecond belt pulley 43 to rotate synchronously under the driving of therotation motor 33; thetiming belt 42 is wound around thefirst pulley 41 and thesecond pulley 43 and gear-engaged with both, and a width of thetiming belt 42 in a lifting direction of the rotary shaft 6 (i.e., a moving direction in which thelifting drive device 1 drives thelifting link 2 to lift) is smaller than a width of thesecond pulley 43 in the lifting direction.
When therotation shaft 6 moves up and down along with thelifting driving member 2, the end of thetiming belt 42 wound around thefirst pulley 41 is lifted up and down along with therotation shaft 6, and the width of thetiming belt 42 in the lifting direction of therotation shaft 6 is smaller than the width of thesecond pulley 43 in the lifting direction, so that thetiming belt 42 can be allowed to incline within a certain range, and meanwhile, the end of thetiming belt 42 wound around thesecond pulley 43 is allowed to move relative to thesecond pulley 43 during the movement, thereby realizing the lifting of the drivingmagnetron 8 and ensuring that the transmission assembly 4 and the rotation driving source 3 are always connected.
Optionally, as shown in fig. 5, two blockingflanges 431 are further disposed on thesecond pulley 43, and the two blockingflanges 431 are disposed at two edges of thegear surface 432 of thesecond pulley 43 at intervals along the ascending and descending direction (i.e., the moving direction in which the ascending and descendingdriving device 1 drives the ascending and descending connectingmember 2 to ascend and descend) to block thetiming belt 42 from being separated from thesecond pulley 43 during ascending and descending.
Alternatively, the width of thesecond pulley 43 in the lifting direction (i.e., the movement direction in which thelifting drive device 1 drives thelifting link 2 to lift) is larger than the sum of the width of thetiming belt 42 in the lifting direction and the maximum displacement amount of the liftinglink plate 2 in the lifting direction. In this way, it is possible to ensure that the moving range of theelevation connecting plate 2 is not limited by thetiming belt 42 while thesecond pulley 43 is kept connected to the drive shaft of the rotation drive source 3.
It should be noted that the present invention is not limited to the structure of the transmission assembly 4 provided in this embodiment, and in practical applications, any other transmission structure may be adopted as long as it has the function of moving up and down along with therotation shaft 6 and keeping connection with the rotation driving source 3.
Referring to fig. 6, a magnetron rotation elevating mechanism according to a second embodiment of the present invention is further improved based on the first embodiment. Specifically, the magnetron rotary lifting mechanism further comprises at least twoguide rods 10 arranged at intervals, in the embodiment, the twoguide rods 10 are symmetrically distributed on two sides of therotating shaft 6 close to and far from the rotary driving source 3, so that the condition that thelifting connecting piece 2 is not supported in the directions of the two sides of therotating shaft 6 close to and far from the rotary driving source 3 can be changed, the movement stability of thelifting connecting plate 2 is improved, and the deformation generated by thelifting connecting plate 2 can be effectively reduced, and the levelness of the lifting connecting plate is improved.
At least two second through holes penetrating in the lifting direction of thelifting link 2 are provided, and the second through holes are provided in one-to-one correspondence with theguide rods 10. As shown in fig. 7, eachguide rod 10 includes anoptical axis portion 101 and astud portion 102 disposed at a lower end of theoptical axis portion 101, wherein thestud portion 102 is fixedly connected to thebase 9 by means of screw connection, an upper end of theoptical axis portion 101 passes through a second through hole corresponding to theoptical axis portion 101 in the liftingconnector 2 from bottom to top, and eachoptical axis portion 101 and the corresponding second through hole are engaged in a relatively movable manner, such as in a clearance fit.
For example, as shown in fig. 8, in the present embodiment, abearing 11 is provided in each second through hole of theelevation linking member 2, and theguide bar 10 corresponding to the second through hole is fitted to thebearing 11. Because the steel ball in thebearing 11 is in point contact with the bearing outer sleeve, the steel ball can roll with the minimum friction resistance, the friction is small, and the steel ball is stable, so that theguide rod 10 is matched with the bearing 11 to enable thelifting connecting plate 2 to move smoothly.
Alternatively, each bearing 11 has a flange which overlaps the upper surface of thelifting link 2 and is fixedly connected to thelifting link 2 in order to be able to fix thebearing 11 in the second through-opening of thelifting link 2. The flange can be fixedly connected with thelifting connecting piece 2 through screws.
Optionally, theoptical axis portion 101 has a diameter of 20mm and a length of 100mm, and thestud portion 102 has an external thread dimension of M12 and a length of 20 mm. Theguide bar 10 may be made of stainless steel.
With the help ofguide bar 10, can provide certain holding power to lifting connectingplate 2 to a certain extent to not only can change the cantilever structure of lifting connectingplate 2, increase lifting connectingplate 2's motion stationarity, but also can effectively reduce the deformation that lifting connectingplate 2 produced, improve its levelness.
In summary, the magnetron rotation lifting mechanism provided by the invention can reduce the gravity borne by the lifting connecting piece and the deformation degree of the lifting connecting piece by fixing the rotation driving source on the base, thereby ensuring the levelness of the magnetron. And the transmission assembly is used for transmitting the rotary power provided by the rotary driving source to the rotary shaft, and is set to be capable of synchronously lifting with the rotary shaft when the lifting connecting piece drives the rotary shaft to lift, and simultaneously is always connected with the rotary driving source, so that the lifting connecting piece can drive the rotary shaft to lift to realize the lifting of the magnetron, and the rotary driving source can drive the rotary shaft and the magnetron to synchronously rotate through the transmission assembly, thereby ensuring the levelness of the magnetron and ensuring the functions of driving the magnetron to lift and rotate by the rotary lifting mechanism.
The invention also provides magnetron sputtering equipment which comprises a reaction chamber and a base arranged at the top of the reaction chamber, wherein the base is provided with a cavity containing deionized water, and a magnetron is arranged in the cavity through a rotary lifting mechanism. The rotary lifting mechanism adopts the magnetron rotary lifting mechanism provided by the above embodiments of the invention.
According to the magnetron sputtering device provided by the invention, by adopting the magnetron rotating and lifting mechanism provided by each embodiment of the invention, the functions of driving the magnetron to lift and rotate by the rotating and lifting mechanism can be ensured while the levelness of the magnetron is ensured.
It will be understood that the above embodiments are merely exemplary embodiments taken to illustrate the principles of the present invention, which is not limited thereto. It will be apparent to those skilled in the art that various modifications and improvements can be made without departing from the spirit and substance of the invention, and these modifications and improvements are also considered to be within the scope of the invention.

Claims (9)

CN202010241265.6A2020-03-312020-03-31Magnetron rotating and lifting mechanism and magnetron sputtering equipmentActiveCN111304613B (en)

Priority Applications (2)

Application NumberPriority DateFiling DateTitle
CN202010241265.6ACN111304613B (en)2020-03-312020-03-31Magnetron rotating and lifting mechanism and magnetron sputtering equipment
TW110110076ATWI827920B (en)2020-03-312021-03-19 Magnetron rotation and lifting mechanism and magnetron sputtering equipment

Applications Claiming Priority (1)

Application NumberPriority DateFiling DateTitle
CN202010241265.6ACN111304613B (en)2020-03-312020-03-31Magnetron rotating and lifting mechanism and magnetron sputtering equipment

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CN111304613Btrue CN111304613B (en)2022-06-14

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CN118460983B (en)*2024-07-102024-09-06深圳市新凯来工业机器有限公司Lifting device for accurately lifting magnetron and semiconductor device

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CN111304613A (en)2020-06-19
TWI827920B (en)2024-01-01

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