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CN110854300A - Display device, display panel and manufacturing method thereof - Google Patents

Display device, display panel and manufacturing method thereof
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CN110854300A
CN110854300ACN201911180989.8ACN201911180989ACN110854300ACN 110854300 ACN110854300 ACN 110854300ACN 201911180989 ACN201911180989 ACN 201911180989ACN 110854300 ACN110854300 ACN 110854300A
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display panel
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display
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崔颖
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BOE Technology Group Co Ltd
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Abstract

Translated fromChinese

本公开是关于显示技术领域,涉及一种显示面板、显示面板的制造方法与显示装置,该显示面板包括:衬底、显示层和封装层,显示层设于所述衬底的一侧,封装层设于所述显示层远离所述衬底的一侧,所述封装层为金属材料,所述金属层的表面上形成有疏水的微纳结构。本公开提供的显示面板,封装层具有超疏水性,能够有效阻挡水汽渗入到显示面板内部,从而改善显示面板的封装效果,延长显示面板寿命。

The present disclosure relates to the field of display technology, and relates to a display panel, a method for manufacturing the display panel, and a display device. The display panel includes: a substrate, a display layer and an encapsulation layer, wherein the display layer is provided on one side of the substrate, and the encapsulation layer is The layer is arranged on the side of the display layer away from the substrate, the encapsulation layer is made of metal material, and a hydrophobic micro-nano structure is formed on the surface of the metal layer. In the display panel provided by the present disclosure, the encapsulation layer has super-hydrophobicity, which can effectively block the infiltration of water vapor into the display panel, thereby improving the encapsulation effect of the display panel and prolonging the life of the display panel.

Description

Translated fromChinese
显示装置、显示面板及其制造方法Display device, display panel and manufacturing method thereof

技术领域technical field

本公开涉及显示技术领域,具体而言,涉及一种显示面板、显示面板的制造方法与显示装置。The present disclosure relates to the field of display technology, and in particular, to a display panel, a method for manufacturing the display panel, and a display device.

背景技术Background technique

有机发光二极管(Organic Light-Emitting Diode,OLED)显示装置由于具有薄、轻、宽视角、主动发光、发光颜色连续可调、成本低、响应速度快、能耗小、驱动电压低、工作温度范围宽、生产工艺简单、发光效率高及可柔性显示等优点,已被列为极具发展前景的下一代显示技术。Organic Light-Emitting Diode (OLED) display devices are thin, light, wide viewing angle, active light-emitting, continuously adjustable light-emitting color, low cost, fast response speed, low energy consumption, low driving voltage, and operating temperature range. Wide, simple production process, high luminous efficiency and flexible display and other advantages, has been listed as a promising next-generation display technology.

OLED器件对水汽和氧气等外界因素非常敏感,例如一旦发生氧化反应,OLED器件的稳定性就会变差并且寿命会大幅度降低,因此采用有效的封装结构阻止水汽、氧气侵入,可以延长OLED器件的使用寿命。OLED devices are very sensitive to external factors such as water vapor and oxygen. For example, once the oxidation reaction occurs, the stability of the OLED device will deteriorate and the lifespan will be greatly reduced. Therefore, the use of an effective packaging structure to prevent the intrusion of water vapor and oxygen can prolong the OLED device. service life.

需要说明的是,在上述背景技术部分公开的信息仅用于加强对本公开的背景的理解,因此可以包括不构成对本领域普通技术人员已知的现有技术的信息。It should be noted that the information disclosed in the above Background section is only for enhancement of understanding of the background of the present disclosure, and therefore may contain information that does not form the prior art that is already known to a person of ordinary skill in the art.

发明内容SUMMARY OF THE INVENTION

本公开的目的在于提供一种显示面板、显示面板的制造方法与显示装置,能够有效阻挡水汽渗入到显示面板内部,从而改善显示面板的封装效果,延长显示面板寿命。The purpose of the present disclosure is to provide a display panel, a manufacturing method of the display panel, and a display device, which can effectively prevent water vapor from infiltrating into the display panel, thereby improving the packaging effect of the display panel and prolonging the life of the display panel.

根据本公开的一个方面,提供了一种显示面板,该显示面板包括:According to one aspect of the present disclosure, there is provided a display panel including:

衬底;substrate;

显示层,设于所述衬底的一侧;a display layer, disposed on one side of the substrate;

封装层,设于所述显示层远离所述衬底的一侧,所述封装层为金属材料,所述金属层的表面上形成有疏水的微纳结构。The encapsulation layer is arranged on the side of the display layer away from the substrate, the encapsulation layer is made of metal material, and a hydrophobic micro-nano structure is formed on the surface of the metal layer.

在本公开的一种示例性实施例中,所述微纳结构包括从所述封装层表面上延伸出的多个微纳柱。In an exemplary embodiment of the present disclosure, the micro/nano structure includes a plurality of micro/nano pillars extending from the surface of the encapsulation layer.

在本公开的一种示例性实施例中,所述微纳柱的直径为10nm~1000nm。In an exemplary embodiment of the present disclosure, the diameter of the micro-nano-pillar is 10 nm˜1000 nm.

在本公开的一种示例性实施例中,所述微纳柱的高度为10nm~1000nm。In an exemplary embodiment of the present disclosure, the height of the micro/nano-pillar is 10 nm˜1000 nm.

在本公开的一种示例性实施例中,相邻的两个所述微纳柱之间的中心距为10nm~500nm。In an exemplary embodiment of the present disclosure, the center-to-center distance between two adjacent micro-nano-pillars is 10 nm˜500 nm.

在本公开的一种示例性实施例中,所述微纳结构与水汽的浸润角度为110°~160°。In an exemplary embodiment of the present disclosure, the infiltration angle between the micro-nano structure and the water vapor is 110°˜160°.

在本公开的一种示例性实施例中,所述封装层的层厚为150nm~1000nm。In an exemplary embodiment of the present disclosure, the layer thickness of the encapsulation layer is 150 nm˜1000 nm.

在本公开的一种示例性实施例中,所述封装层的材料包括铝、钕、铜、银中的至少一种。In an exemplary embodiment of the present disclosure, the material of the encapsulation layer includes at least one of aluminum, neodymium, copper, and silver.

根据本公开的另一个方面,提供了一种显示面板的制造方法,该制造方法包括:According to another aspect of the present disclosure, there is provided a manufacturing method of a display panel, the manufacturing method comprising:

提供一衬底;providing a substrate;

在所述衬底的一侧形成显示层;forming a display layer on one side of the substrate;

在所述显示层远离所述衬底的一侧形成封装层,所述封装层为金属材料;An encapsulation layer is formed on the side of the display layer away from the substrate, and the encapsulation layer is a metal material;

在所述封装层的表面上形成疏水的微纳结构。A hydrophobic micro-nano structure is formed on the surface of the encapsulation layer.

根据本公开的又一个方面,提供了一种显示装置,该显示装置包括上述的显示面板。According to yet another aspect of the present disclosure, there is provided a display device including the above-mentioned display panel.

本公开提供的显示面板,封装层采用金属材料形成,金属材料的表面上形成有疏水的微纳结构,表面具有微纳结构的封装层即起到封装的作用,又可以有效阻挡水汽渗入到显示器件内部,从而改善器件封装效果,延长器件寿命。In the display panel provided by the present disclosure, the encapsulation layer is formed of a metal material, and a hydrophobic micro-nano structure is formed on the surface of the metal material. inside the device, thereby improving the packaging effect of the device and prolonging the life of the device.

应当理解的是,以上的一般描述和后文的细节描述仅是示例性和解释性的,并不能限制本公开。It is to be understood that the foregoing general description and the following detailed description are exemplary and explanatory only and are not restrictive of the present disclosure.

附图说明Description of drawings

此处的附图被并入说明书中并构成本说明书的一部分,示出了符合本公开的实施例,并与说明书一起用于解释本公开的原理。显而易见地,下面描述中的附图仅仅是本公开的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate embodiments consistent with the disclosure and together with the description serve to explain the principles of the disclosure. Obviously, the drawings in the following description are only some embodiments of the present disclosure, and for those of ordinary skill in the art, other drawings can also be obtained from these drawings without creative effort.

图1为本公开的一种实施例提供的显示面板的剖面示意图;FIG. 1 is a schematic cross-sectional view of a display panel according to an embodiment of the present disclosure;

图2为本公开的一种实施例提供的显示面板的制造方法的流程图。FIG. 2 is a flowchart of a method for manufacturing a display panel according to an embodiment of the present disclosure.

具体实施方式Detailed ways

现在将参考附图更全面地描述示例实施方式。然而,示例实施方式能够以多种形式实施,且不应被理解为限于在此阐述的范例;相反,提供这些实施方式使得本公开将更加全面和完整,并将示例实施方式的构思全面地传达给本领域的技术人员。所描述的特征、结构或特性可以以任何合适的方式结合在一个或更多实施方式中。在下面的描述中,提供许多具体细节从而给出对本公开的实施方式的充分理解。然而,本领域技术人员将意识到,可以实践本公开的技术方案而省略所述特定细节中的一个或更多,或者可以采用其它的方法、步骤等。在其它情况下,不详细示出或描述公知技术方案以避免喧宾夺主而使得本公开的各方面变得模糊。Example embodiments will now be described more fully with reference to the accompanying drawings. Example embodiments, however, can be embodied in various forms and should not be construed as limited to the examples set forth herein; rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the concept of example embodiments to those skilled in the art. The described features, structures, or characteristics may be combined in any suitable manner in one or more embodiments. In the following description, numerous specific details are provided in order to give a thorough understanding of the embodiments of the present disclosure. However, those skilled in the art will appreciate that the technical solutions of the present disclosure may be practiced without one or more of the specific details, or other methods, steps, etc. may be employed. In other instances, well-known solutions have not been shown or described in detail to avoid obscuring aspects of the present disclosure.

用语“一个”、“一”、“该”和“所述”用以表示存在一个或多个要素/组成部分/等;用语“包括”和“具有”用以表示开放式的包括在内的意思并且是指除了列出的要素/组成部分/等之外还可存在另外的要素/组成部分/等;用语“第一”、“第二”等仅作为标记使用,不是对其对象的数量限制。The terms "a", "an", "the" and "said" are used to indicate the presence of one or more elements/components/etc; the terms "including" and "having" are used to indicate open-ended inclusive means and means that additional elements/components/etc may be present in addition to the listed elements/components/etc; the terms "first", "second", etc. are used only as labels, not as numbers to their objects limit.

本示例实施方式中首先提供了一种显示面板,如图1所示,该显示面板包括:衬底10、显示层30和封装层60,显示层30设于衬底10的一侧,封装层60设于显示层30远离衬底10的一侧,封装层60为金属材料,金属层的表面上形成有疏水的微纳结构,疏水的微纳结构可为封装层60上具有疏水特性的凹凸不平的表面。This exemplary embodiment first provides a display panel. As shown in FIG. 1 , the display panel includes: asubstrate 10 , adisplay layer 30 and anencapsulation layer 60 . Thedisplay layer 30 is provided on one side of thesubstrate 10 , and theencapsulation layer 60 is disposed on the side of thedisplay layer 30 away from thesubstrate 10 , theencapsulation layer 60 is made of metal material, and a hydrophobic micro-nano structure is formed on the surface of the metal layer, and the hydrophobic micro-nano structure can be a concavo-convex with hydrophobic properties on theencapsulation layer 60 uneven surface.

本公开提供的显示面板,封装层采用金属材料形成,金属材料的表面上形成有疏水的微纳结构,表面具有微纳结构的封装层即起到封装的作用,又可以有效阻挡水汽渗入到显示器件内部,从而改善器件封装效果,延长器件寿命。In the display panel provided by the present disclosure, the encapsulation layer is formed of a metal material, and a hydrophobic micro-nano structure is formed on the surface of the metal material. inside the device, thereby improving the packaging effect of the device and prolonging the life of the device.

具体地,通过在封装层60的表面上形成具有超疏水性质的凹凸不平的微纳结构,使得封装层60的表面形成一纳米级的极薄空气层,当外部水分接触到封装层60时,由于隔着空气层,因此可以减少水分与封装层60的直接接触,从而提升封装层的水氧阻隔能力。Specifically, by forming an uneven micro-nano structure with super-hydrophobic properties on the surface of theencapsulation layer 60, the surface of theencapsulation layer 60 forms a nanometer-scale ultra-thin air layer. When the external moisture contacts theencapsulation layer 60, Due to the separation of the air layer, the direct contact of moisture with theencapsulation layer 60 can be reduced, thereby improving the water and oxygen barrier capability of the encapsulation layer.

如图1所示,微纳结构包括从封装层60的表面上延伸出的多个微纳柱。其中,微纳柱直径为10nm~1000nm,例如10nm、100nm、200nm、500nm、700nm、1000nm等,在此不一一列举;微纳柱的高度为10nm~1000nm,例如10nm、100nm、200nm、500nm、700nm、1000nm等,在此不一一列举;相邻的两个微纳柱之间的中心距为10nm~500nm,例如10nm、100nm、200nm、300nm、400nm、500nm等,在此不一一列举。当然,微纳柱直径也可小于10nm或大于1000nm,微纳柱的高度也可小于10nm或大于1000nm,相邻的两个微纳柱之间的中心距也可小于10nm或大于500nm,本公开对此不做限制。As shown in FIG. 1 , the micro-nano structure includes a plurality of micro-nano pillars extending from the surface of theencapsulation layer 60 . Among them, the diameter of the micro-nano column is 10nm~1000nm, such as 10nm, 100nm, 200nm, 500nm, 700nm, 1000nm, etc., which are not listed here one by one; the height of the micro-nano column is 10nm~1000nm, such as 10nm, 100nm, 200nm, 500nm , 700nm, 1000nm, etc. are not listed here; the center distance between two adjacent micro-nano columns is 10nm ~ 500nm, such as 10nm, 100nm, 200nm, 300nm, 400nm, 500nm, etc., which are not listed here. enumerate. Of course, the diameter of the micro-nano pillars can also be smaller than 10 nm or larger than 1000 nm, the height of the micro-nano pillars can also be smaller than 10 nm or larger than 1000 nm, and the center-to-center distance between two adjacent micro-nano pillars can also be smaller than 10 nm or larger than 500 nm. There is no restriction on this.

此外,微纳结构可包括从封装层60的表面上延伸出的多个三角形、半球形、梯形或其它不规则的纳米级的微纳结构,本公开对此不做限制,凡是微纳结构上的变换,均属于本公开的保护范围。In addition, the micro-nano structure may include a plurality of triangular, hemispherical, trapezoidal or other irregular nano-scale micro-nano structures extending from the surface of theencapsulation layer 60 , which is not limited in the present disclosure. The transformations are all within the protection scope of the present disclosure.

具体地,封装层60的层厚为150nm~1000nm,以保证微纳结构的形成。封装层60的层厚例如可为150nm、200nm、400nm、500nm、700nm、1000nm等,在此不一一列举,当然,封装层60的层厚也可小于150nm或大于500nm,本公开对此不做限制。Specifically, the thickness of theencapsulation layer 60 is 150 nm˜1000 nm to ensure the formation of the micro-nano structure. The thickness of theencapsulation layer 60 may be, for example, 150 nm, 200 nm, 400 nm, 500 nm, 700 nm, 1000 nm, etc., which are not listed here. make restrictions.

具体地,微纳结构与水汽的浸润角度为110°~160°,以保证封装层60白表面的微纳结构具备较好的疏水性。微纳结构与水汽的浸润角度例如可为110°、120°、130°、140°、150°、160°等,在此不一一列举。当然,微纳结构与水汽的浸润角度也可小于110°或大于160°,本公开对此不做限制。Specifically, the infiltration angle between the micro-nano structure and the water vapor is 110°˜160°, so as to ensure that the micro-nano structure on the white surface of theencapsulation layer 60 has good hydrophobicity. The infiltration angle between the micro-nano structure and the water vapor may be, for example, 110°, 120°, 130°, 140°, 150°, 160°, etc., which are not listed here. Of course, the infiltration angle between the micro-nano structure and the water vapor may also be less than 110° or greater than 160°, which is not limited in the present disclosure.

其中,封装层60的材料包括铝、钕、铜、银中的至少一种。选取上述金属材料形成封装层60,便于在封装层60的表面形成微纳结构。当然,还可以为其它金属材料,例如锌,本公开对此不做限制。The material of theencapsulation layer 60 includes at least one of aluminum, neodymium, copper, and silver. The above-mentioned metal materials are selected to form theencapsulation layer 60 , so that a micro-nano structure can be formed on the surface of theencapsulation layer 60 . Of course, it can also be other metal materials, such as zinc, which is not limited in the present disclosure.

具体地,衬底10可以为无机材料的衬底,也可以为有机材料的衬底。举例而言,在本公开的一种实施方式中,衬底10的材料可以为钠钙玻璃(soda-lime glass)、石英玻璃、蓝宝石玻璃等玻璃材料,或者可以为不锈钢、铝、镍等金属材料。在本公开的另一种实施方式中,衬底10的材料可以为聚甲基丙烯酸甲酯(Polymethyl methacrylate,PMMA)、聚乙烯醇(Polyvinyl alcohol,PVA)、聚乙烯基苯酚(Polyvinyl phenol,PVP)、聚醚砜(Polyethersulfone,PES)、聚酰亚胺、聚酰胺、聚缩醛、聚碳酸酯(Poly carbonate,PC)、聚对苯二甲酸乙二酯(Polyethylene terephthalate,PET)、聚萘二甲酸乙二酯(Polyethylenenaphthalate,PEN)或其组合。在本公开的另一种实施方式中,衬底10也可以为柔性衬底,例如衬底的材料可以为聚酰亚胺(polyimide,PI)。Specifically, thesubstrate 10 may be a substrate of an inorganic material or a substrate of an organic material. For example, in one embodiment of the present disclosure, the material of thesubstrate 10 may be glass materials such as soda-lime glass, quartz glass, sapphire glass, etc., or may be metals such as stainless steel, aluminum, nickel, etc. Material. In another embodiment of the present disclosure, the material of thesubstrate 10 may be polymethyl methacrylate (PMMA), polyvinyl alcohol (PVA), polyvinyl phenol (PVP) ), Polyethersulfone (PES), Polyimide, Polyamide, Polyacetal, Polycarbonate (PC), Polyethylene terephthalate (PET), Polynaphthalene Polyethylenenaphthalate (PEN) or a combination thereof. In another embodiment of the present disclosure, thesubstrate 10 may also be a flexible substrate, for example, the material of the substrate may be polyimide (PI).

具体地,显示层30用于实现图案显示,在显示层30中,显示单元可以为有机发光二极管(OLED)、液晶显示单元、发光二极管(LED)或者其他可行的可显示单元。可以理解的是,显示单元可以实现自主发光,例如有机发光二极管或者发光二极管,也可以借助背光源并实现发光控制,例如液晶显示单元可以控制背光源的光线是否通过发光区域而实现显示。Specifically, thedisplay layer 30 is used to realize pattern display, and in thedisplay layer 30, the display unit may be an organic light emitting diode (OLED), a liquid crystal display unit, a light emitting diode (LED) or other feasible displayable units. It can be understood that the display unit can realize self-illumination, such as organic light emitting diodes or light emitting diodes, and can also realize light emission control with the help of a backlight source.

进一步地,显示层30中还可以包括驱动层20,用于驱动各个发光单元40。驱动层20中可以包括薄膜晶体管和电容器,其中,薄膜晶体管可以为LTPS-TFT(低温多晶硅-薄膜晶体管)或者oxide-TFT(氧化物-薄膜晶体管),例如可以为IGZO-TFT(铟镓锌氧-薄膜晶体管),本公开对此不做限定。薄膜晶体管可以为顶栅型或者底栅型,本公开也不做限定。Further, thedisplay layer 30 may further include adriving layer 20 for driving each light-emittingunit 40 . Thedriving layer 20 may include thin film transistors and capacitors, wherein the thin film transistors may be LTPS-TFT (low temperature polysilicon-thin film transistor) or oxide-TFT (oxide-thin film transistor), for example, may be IGZO-TFT (indium gallium zinc oxide (Indium Gallium Zinc Oxide) - thin film transistor), which is not limited in the present disclosure. The thin film transistor may be of a top gate type or a bottom gate type, which is not limited in the present disclosure.

具体地,显示层30远离衬底10的一侧设有公共电极层50,公共电极层50可为公共阴极或公共阳极。其中,公共电极层50的材料可为金属材料举例来说,金属可以是铂、金、银、铝、铬、钡、钠、钯、铁、锰或其组合。也就是说,封装层60与公共电极层50可为相同的金属材料,可通过沉积工艺形成金属层作为公共电极层50与封装层60,可直接金属层的表面的形成微纳结构,以使金属层的上层区域作为封装层60。Specifically, a side of thedisplay layer 30 away from thesubstrate 10 is provided with acommon electrode layer 50 , and thecommon electrode layer 50 may be a common cathode or a common anode. The material of thecommon electrode layer 50 may be a metal material, for example, the metal may be platinum, gold, silver, aluminum, chromium, barium, sodium, palladium, iron, manganese or a combination thereof. That is to say, theencapsulation layer 60 and thecommon electrode layer 50 can be made of the same metal material, and a metal layer can be formed as thecommon electrode layer 50 and theencapsulation layer 60 through a deposition process, and a micro-nano structure can be formed directly on the surface of the metal layer, so that the The upper region of the metal layer serves as theencapsulation layer 60 .

此外,显示面板还可包括设于封装层60远离衬底10一侧的钝化层和保护膜层,本公开对此不做限制。In addition, the display panel may further include a passivation layer and a protective film layer disposed on the side of theencapsulation layer 60 away from thesubstrate 10 , which is not limited in the present disclosure.

下述为本公开方法实施例,可以用于执行本公开装置实施例。对于本公开方法实施例中未披露的细节,请参照本公开装置实施例。The following method embodiments of the present disclosure can be used to implement the device embodiments of the present disclosure. For details not disclosed in the method embodiments of the present disclosure, please refer to the device embodiments of the present disclosure.

本公开的实施例还提供了一种显示面板的制造方法,如图2所示,包括:Embodiments of the present disclosure also provide a method for manufacturing a display panel, as shown in FIG. 2 , including:

步骤S100、提供一衬底;Step S100, providing a substrate;

步骤S200、在衬底的一侧形成显示层;Step S200, forming a display layer on one side of the substrate;

步骤S300、在显示层远离衬底的一侧形成封装层,封装层为金属材料;Step S300, forming an encapsulation layer on the side of the display layer away from the substrate, and the encapsulation layer is a metal material;

步骤S400、在封装层的表面上形成疏水的微纳结构。Step S400 , forming a hydrophobic micro-nano structure on the surface of the encapsulation layer.

本公开提供的显示面板,封装层采用金属材料形成,在金属材料的表面上形成有疏水的微纳结构,表面具有微纳结构的封装层即起到封装的作用,又可以有效阻挡水汽渗入到显示器件内部,从而改善器件封装效果,延长器件寿命。In the display panel provided by the present disclosure, the encapsulation layer is formed of a metal material, and a hydrophobic micro-nano structure is formed on the surface of the metal material. Display the inside of the device, thereby improving the packaging effect of the device and prolonging the life of the device.

下面,将对本示例实施方式中显示面板的制造方法的各步骤进行进一步的说明。Next, each step of the manufacturing method of the display panel in the present exemplary embodiment will be further described.

在步骤S100中,提供一衬底。In step S100, a substrate is provided.

具体地,如图1所示,可通过沉积等工艺形成衬底10,衬底10的材料可以是无机材料或有机材料,例如,无机材料可以是钠钙玻璃、石英玻璃、蓝宝石玻璃等玻璃材料,或是不锈钢、铝、镍等各种金属或其合金的金属材料;有机材料可以是聚甲基丙烯酸甲酯、聚乙烯醇、聚乙烯基苯酚、聚醚砜、聚酰亚胺、聚酰胺或其组合。其中,衬底10可为柔性衬底。Specifically, as shown in FIG. 1 , thesubstrate 10 can be formed by a process such as deposition, and the material of thesubstrate 10 can be an inorganic material or an organic material, for example, the inorganic material can be a glass material such as soda lime glass, quartz glass, sapphire glass, etc. , or metal materials of various metals such as stainless steel, aluminum, nickel or their alloys; organic materials can be polymethyl methacrylate, polyvinyl alcohol, polyvinyl phenol, polyethersulfone, polyimide, polyamide or a combination thereof. Wherein, thesubstrate 10 may be a flexible substrate.

在步骤S200中,在衬底的一侧形成显示层。In step S200, a display layer is formed on one side of the substrate.

具体地,在衬底10一侧可通过沉积、喷涂等工艺形成缓冲层,缓冲层的材料可以是氧化硅、氮氧化硅、氮化硅或上述材料的组合;接着在缓冲层上形成驱动层20,驱动层20包括多个薄膜晶体管。当然,也可在衬底10上直接形成驱动层20。驱动层20具体包括通过物理气相沉积法、化学气相沉积法、旋涂法或其组合形成于缓冲层上远离衬底10一侧的有源层,有源层部分覆盖缓冲层;在缓冲层远离衬底10的一侧通过物理气相沉积法、化学气相沉积法、旋涂法或其组合形成覆盖缓冲层与有源层的栅绝缘层,在栅绝缘层远离衬底10的一侧上通过沉积等工艺形成栅极层;接着在栅绝缘层上远离衬底10的一侧通过沉积等工艺形成覆盖栅绝缘层与栅极层的层间介质层;接在通过曝光显示、刻蚀等工艺在层间介质层、栅绝缘层上形成源漏极过孔,源极过孔与漏极过孔分别位于栅极层的两侧,且与有源层连通;接着在源极过孔与漏极过孔中通过沉积等工艺形成源极与漏极,从而形成薄膜晶体管。Specifically, a buffer layer can be formed on one side of thesubstrate 10 by deposition, spraying and other processes, and the material of the buffer layer can be silicon oxide, silicon oxynitride, silicon nitride or a combination of the above materials; then a driving layer is formed on thebuffer layer 20. Thedriving layer 20 includes a plurality of thin film transistors. Of course, thedriving layer 20 can also be directly formed on thesubstrate 10 . Thedriving layer 20 specifically includes an active layer formed on the buffer layer away from thesubstrate 10 by physical vapor deposition, chemical vapor deposition, spin coating or a combination thereof, and the active layer partially covers the buffer layer; A gate insulating layer covering the buffer layer and the active layer is formed on one side of thesubstrate 10 by physical vapor deposition, chemical vapor deposition, spin coating or a combination thereof, and on the side of the gate insulating layer away from thesubstrate 10 by deposition and other processes to form a gate layer; then, on the side of the gate insulating layer away from thesubstrate 10, an interlayer dielectric layer covering the gate insulating layer and the gate layer is formed by processes such as deposition; Source and drain vias are formed on the interlayer dielectric layer and the gate insulating layer. The source vias and the drain vias are respectively located on both sides of the gate layer and communicate with the active layer; then the source vias and the drain are formed. A source electrode and a drain electrode are formed in the via hole through deposition and other processes, thereby forming a thin film transistor.

接着在层间介质层远离衬底10的一侧通过沉积等工艺形成平坦层;接着通过刻蚀等工艺在平坦层上形成露出漏极的过孔,接着在平坦层远离衬底10的一侧通过沉积等工艺形成第一电极层,第一电极层包括多个第一电极,各第一电极通过过孔与各漏极一一对应连接;接着在平坦层远离衬底10的一侧通过沉积等工艺形成像素界定层,像素界定层上通过刻蚀等工艺形成多个通孔,各通孔露出各第一电极层;接着在像素界定层上形成发光单元40,发光单元40可包括空穴注入层、空穴传输层、发光材料层、电子传输层与电子注入层;接着在发光单元40远离衬底10的一侧上通过沉积等工艺形成第二电极层,第二电极层为公共电极层50,其中,第一电极层可为阳极层,第二电极层可为透明的公共阴极层。Next, a flat layer is formed on the side of the interlayer dielectric layer away from thesubstrate 10 by a process such as deposition; then a via hole exposing the drain is formed on the flat layer by a process such as etching, and then on the side of the flat layer away from thesubstrate 10 The first electrode layer is formed by a process such as deposition. The first electrode layer includes a plurality of first electrodes, and each first electrode is connected to each drain electrode one-to-one through a via hole; and other processes to form a pixel defining layer, on which a plurality of through holes are formed by etching and other processes, and each through hole exposes each first electrode layer; then alight emitting unit 40 is formed on the pixel defining layer, and thelight emitting unit 40 may include holes injection layer, hole transport layer, light-emitting material layer, electron transport layer and electron injection layer; then a second electrode layer is formed on the side of the light-emittingunit 40 away from thesubstrate 10 by deposition and other processes, and the second electrode layer is acommon electrode Layer 50, wherein the first electrode layer may be an anode layer, and the second electrode layer may be a transparent common cathode layer.

在步骤S300中,在显示层远离衬底的一侧形成封装层,封装层为金属材料。In step S300, an encapsulation layer is formed on the side of the display layer away from the substrate, and the encapsulation layer is a metal material.

具体地,通过物理气相沉积法、化学气相沉积法、旋涂法或其组合在显示层30远离衬底10的一侧采用金属材料形成封装层60,接着通过采用激光刻蚀技术在封装层60的金属表面形成纳米微结构,采用光栅扫描聚焦飞秒激光脉冲照射金属表面,在金属表面形成从表面上延伸出的多个疏水的微纳柱。此外,也可以采用沉积法实现,如物理气相沉积和化学气相沉积,该方法主要是利用气相发生的物理化学过程,在表面形成疏水型金属层,可以用来实现微纳米结构涂层的制造,以及仿生模版,离子刻蚀等技术实现。本领域技术人员还可采用其他方法在封装层表面形成微纳结构,例如阳极氧化法,本公开对此不做限制。Specifically, a metal material is used to form theencapsulation layer 60 on the side of thedisplay layer 30 away from thesubstrate 10 by a physical vapor deposition method, a chemical vapor deposition method, a spin coating method or a combination thereof, and then theencapsulation layer 60 is formed on theencapsulation layer 60 by using a laser etching technology. The metal surface forms a nano-micro structure, and the raster scanning focused femtosecond laser pulse is used to irradiate the metal surface, and a plurality of hydrophobic micro-nano columns extending from the surface are formed on the metal surface. In addition, deposition methods can also be used, such as physical vapor deposition and chemical vapor deposition. This method mainly uses the physical and chemical process of gas phase generation to form a hydrophobic metal layer on the surface, which can be used to realize the fabrication of micro-nano structured coatings. As well as bionic templates, ion etching and other technologies to achieve. Those skilled in the art may also use other methods to form micro-nano structures on the surface of the encapsulation layer, such as anodization, which is not limited in the present disclosure.

此外,公共电极层50可为公共阴极或公共阳极。其中,公共电极层50的材料可为金属材料举例来说,金属可以是铂、金、银、铝、铬、钡、钠、钯、铁、锰或其组合。也就是说,封装层60与公共电极层50可为相同的金属材料,可通过一次沉积工艺形成金属层作为公共电极层50与封装层60,可直接金属层的表面的形成微纳结构,以使金属层的上层区域作为封装层60,减少了显示面板的制造工艺的工艺步骤,提高了显示面板的制造效率,降低了制造成本。In addition, thecommon electrode layer 50 may be a common cathode or a common anode. The material of thecommon electrode layer 50 may be a metal material, for example, the metal may be platinum, gold, silver, aluminum, chromium, barium, sodium, palladium, iron, manganese or a combination thereof. That is to say, theencapsulation layer 60 and thecommon electrode layer 50 can be made of the same metal material, and a metal layer can be formed as thecommon electrode layer 50 and theencapsulation layer 60 through a single deposition process, and a micro-nano structure can be formed directly on the surface of the metal layer to form a micro-nano structure. Using the upper region of the metal layer as theencapsulation layer 60 reduces the process steps in the manufacturing process of the display panel, improves the manufacturing efficiency of the display panel, and reduces the manufacturing cost.

其中,通过在封装层60的表面上形成具有超疏水性质的凹凸不平的微纳结构,使得封装层60的表面形成一纳米级的极薄空气层,当外部水分接触到封装层60时,由于隔着空气层,因此可以减少水分与封装层60的直接接触,从而提升封装层的水氧阻隔能力。Wherein, by forming the uneven micro-nano structure with super-hydrophobicity on the surface of theencapsulation layer 60, the surface of theencapsulation layer 60 forms a nanometer-scale ultra-thin air layer. When the external moisture contacts theencapsulation layer 60, due to The air layer is separated, so the direct contact between moisture and theencapsulation layer 60 can be reduced, thereby improving the water and oxygen barrier capability of the encapsulation layer.

其中,微纳柱直径为10nm~1000nm,例如10nm、100nm、200nm、500nm、700nm、1000nm等,在此不一一列举;微纳柱的高度为10nm~1000nm,例如10nm、100nm、200nm、500nm、700nm、1000nm等,在此不一一列举;相邻的两个微纳柱之间的中心距为10nm~500nm,例如10nm、100nm、200nm、300nm、400nm、500nm等,在此不一一列举。当然,微纳柱直径也可小于10nm或大于1000nm,微纳柱的高度也可小于10nm或大于1000nm,相邻的两个微纳柱之间的中心距也可小于10nm或大于500nm,本公开对此不做限制。Among them, the diameter of the micro-nano column is 10nm~1000nm, such as 10nm, 100nm, 200nm, 500nm, 700nm, 1000nm, etc., which are not listed here one by one; the height of the micro-nano column is 10nm~1000nm, such as 10nm, 100nm, 200nm, 500nm , 700nm, 1000nm, etc. are not listed here; the center distance between two adjacent micro-nano columns is 10nm ~ 500nm, such as 10nm, 100nm, 200nm, 300nm, 400nm, 500nm, etc., which are not listed here. enumerate. Of course, the diameter of the micro-nano pillars can also be smaller than 10 nm or larger than 1000 nm, the height of the micro-nano pillars can also be smaller than 10 nm or larger than 1000 nm, and the center-to-center distance between two adjacent micro-nano pillars can also be smaller than 10 nm or larger than 500 nm. There is no restriction on this.

此外,微纳结构可包括封装层60表面上延伸出的多个三角形、半球形、梯形或其他不规则的纳米级的微纳结构,本公开对此不做限制,凡是微纳结构上的变换,均属于本公开的保护范围。In addition, the micro-nano structure may include a plurality of triangular, hemispherical, trapezoidal or other irregular nano-scale micro-nano structures extending from the surface of theencapsulation layer 60, which is not limited in the present disclosure. , all belong to the protection scope of the present disclosure.

其中,封装层60的层厚为150nm~1000nm,以保证微纳结构的形成。封装层60的层厚例如可为150nm、200nm、400nm、500nm、700nm、1000nm等,在此不一一列举,当然,封装层60的层厚也可小于150nm或大于500nm,本公开对此不做限制。The thickness of theencapsulation layer 60 is 150 nm˜1000 nm to ensure the formation of the micro-nano structure. The thickness of theencapsulation layer 60 may be, for example, 150 nm, 200 nm, 400 nm, 500 nm, 700 nm, 1000 nm, etc., which are not listed here. make restrictions.

其中,微纳结构与水汽的浸润角度为110°~160°,以保证封装层60白表面的微纳结构具备较好的疏水性。微纳结构与水汽的浸润角度例如可为110°、120°、130°、140°、150°、160°等,在此不一一列举。当然,微纳结构与水汽的浸润角度也可小于110°或大于160°,本公开对此不做限制。The infiltration angle between the micro-nano structure and the water vapor is 110°˜160°, so as to ensure that the micro-nano structure on the white surface of theencapsulation layer 60 has good hydrophobicity. The infiltration angle between the micro-nano structure and the water vapor may be, for example, 110°, 120°, 130°, 140°, 150°, 160°, etc., which are not listed here. Of course, the infiltration angle between the micro-nano structure and the water vapor may also be less than 110° or greater than 160°, which is not limited in the present disclosure.

其中,封装层60的材料包括铝、钕、铜、银中的至少一种。选取上述金属材料形成封装层60,便于在封装层60的表面形成微纳结构。当然,还可以为其它金属材料,例如锌,本公开对此不做限制。The material of theencapsulation layer 60 includes at least one of aluminum, neodymium, copper, and silver. The above-mentioned metal materials are selected to form theencapsulation layer 60 , so that a micro-nano structure can be formed on the surface of theencapsulation layer 60 . Of course, it can also be other metal materials, such as zinc, which is not limited in the present disclosure.

此外,显示面板的制造方法还包括在封装层60远离衬底10一侧形成层叠的钝化层和保护膜层,本领域技术人员还可设置更多的其它层,例如盖板,本公开对此不做限制。In addition, the manufacturing method of the display panel further includes forming a stacked passivation layer and a protective film layer on the side of theencapsulation layer 60 away from thesubstrate 10. Those skilled in the art can also set more other layers, such as a cover plate. This does not limit.

应当注意,尽管在附图中以特定顺序描述了本公开中方法的各个步骤,但是,这并非要求或者暗示必须按照该特定顺序来执行这些步骤,或是必须执行全部所示的步骤才能实现期望的结果。附加的或备选的,可以省略某些步骤,将多个步骤合并为一个步骤执行,以及/或者将一个步骤分解为多个步骤执行等。It should be noted that although the various steps of the methods of the present disclosure are depicted in the figures in a particular order, this does not require or imply that the steps must be performed in that particular order, or that all illustrated steps must be performed to achieve the desired the result of. Additionally or alternatively, certain steps may be omitted, multiple steps may be combined into one step for execution, and/or one step may be decomposed into multiple steps for execution, and the like.

本公开的实施例还提供了一种显示装置,该显示装置包括上述实施方式的显示面板。该显示装置可以是于手机、平板电脑、电视或其它具有显示面板的终端设备,其有益效果可参考上述显示面板的有益效果,在此不再详述。Embodiments of the present disclosure also provide a display device including the display panel of the above-mentioned embodiments. The display device can be used in a mobile phone, a tablet computer, a TV, or other terminal equipment having a display panel, and its beneficial effects can be referred to the beneficial effects of the above-mentioned display panel, which will not be described in detail here.

本领域技术人员在考虑说明书及实践这里公开的发明后,将容易想到本公开的其它实施方案。本申请旨在涵盖本公开的任何变型、用途或者适应性变化,这些变型、用途或者适应性变化遵循本公开的一般性原理并包括本公开未公开的本技术领域中的公知常识或惯用技术手段。说明书和实施例仅被视为示例性的,本公开的真正范围和精神由所附的权利要求指出。Other embodiments of the present disclosure will readily occur to those skilled in the art upon consideration of the specification and practice of the invention disclosed herein. This application is intended to cover any variations, uses, or adaptations of the present disclosure that follow the general principles of the present disclosure and include common knowledge or techniques in the technical field not disclosed by the present disclosure . The specification and examples are to be regarded as exemplary only, with the true scope and spirit of the disclosure being indicated by the appended claims.

Claims (10)

Translated fromChinese
1.一种显示面板,其特征在于,包括:1. A display panel, characterized in that, comprising:衬底;substrate;显示层,设于所述衬底的一侧;a display layer, disposed on one side of the substrate;封装层,设于所述显示层远离所述衬底的一侧,所述封装层为金属材料,所述封装层的表面上形成有疏水的微纳结构。The encapsulation layer is arranged on the side of the display layer away from the substrate, the encapsulation layer is made of metal material, and a hydrophobic micro-nano structure is formed on the surface of the encapsulation layer.2.根据权利要求1所述的显示面板,其特征在于,所述微纳结构包括从所述封装层的表面上延伸出的多个微纳柱。2 . The display panel according to claim 1 , wherein the micro-nano structure comprises a plurality of micro-nano pillars extending from the surface of the encapsulation layer. 3 .3.根据权利要求2所述的显示面板,其特征在于,所述微纳柱的直径为10nm~1000nm。3 . The display panel according to claim 2 , wherein the diameter of the micro-nano-pillars is 10 nm˜1000 nm. 4 .4.根据权利要求2所述的显示面板,其特征在于,所述微纳柱的高度为10nm~1000nm。4 . The display panel according to claim 2 , wherein the height of the micro-nano pillars is 10 nm˜1000 nm. 5 .5.根据权利要求2所述的显示面板,其特征在于,相邻的两个所述微纳柱之间的中心距为10nm~500nm。5 . The display panel according to claim 2 , wherein a center-to-center distance between two adjacent micro-nano pillars is 10 nm˜500 nm. 6 .6.根据权利要求1所述的显示面板,其特征在于,所述微纳结构与水汽的浸润角度为110°~160°。6 . The display panel according to claim 1 , wherein the infiltration angle between the micro-nano structure and the water vapor is 110°˜160°. 7 .7.根据权利要求1所述的显示面板,其特征在于,所述封装层的层厚为150nm~1000nm。7 . The display panel according to claim 1 , wherein the encapsulation layer has a layer thickness of 150 nm to 1000 nm. 8 .8.根据权利要求1所述的显示面板,其特征在于,所述封装层的材料包括铝、钕、铜、银中的至少一种。8. The display panel according to claim 1, wherein the material of the encapsulation layer comprises at least one of aluminum, neodymium, copper, and silver.9.一种显示面板的制造方法,其特征在于,包括:9. A method for manufacturing a display panel, comprising:提供一衬底;providing a substrate;在所述衬底的一侧形成显示层;forming a display layer on one side of the substrate;在所述显示层远离所述衬底的一侧形成封装层,所述封装层为金属材料;An encapsulation layer is formed on the side of the display layer away from the substrate, and the encapsulation layer is a metal material;在所述封装层的表面上形成疏水的微纳结构。A hydrophobic micro-nano structure is formed on the surface of the encapsulation layer.10.一种显示装置,其特征在于,包括权利要求1-8任一项所述的显示面板。10. A display device, comprising the display panel according to any one of claims 1-8.
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