Detailed Description
The following is a preferred embodiment of the present application, and it should be noted that, for those skilled in the art, several improvements and modifications can be made without departing from the principle of the present application, and these improvements and modifications are also considered as the protection scope of the present application.
The following disclosure provides many different embodiments or examples for implementing different features of the application. In order to simplify the disclosure of the present application, specific example components and arrangements are described below. Of course, they are merely examples and are not intended to limit the present application. Moreover, the present application may repeat reference numerals and/or letters in the various examples, such repetition is for the purpose of simplicity and clarity and does not in itself dictate a relationship between the various embodiments and/or configurations discussed. In addition, examples of various specific processes and materials are provided herein, but one of ordinary skill in the art may recognize applications of other processes and/or use of other materials.
Referring to fig. 1, fig. 1 is a schematic structural diagram of a cover plate assembly according to an embodiment of the present application, in which thecover plate assembly 100 includes awindow area 101 and anon-window area 102 adjacent to thewindow area 101; theelectrochromic layer 40, theelectrochromic layer 40 is set in thewindow area 101, theelectrochromic layer 40 has a colored state and a transparent state, wherein, when theelectrochromic layer 40 is in the colored state, the color difference value delta E between thewindow area 101 and thenon-window area 102 is less than or equal to 4, and the difference value between the reflectivity of thewindow area 101 and the reflectivity of thenon-window area 102 under the same incident light condition is less than or equal to 10%. It is understood that incident light irradiates the outer surface of thecover plate assembly 100 and generates reflected light on the outer surface of thecover plate assembly 100, and the color difference between thewindow area 101 and thenon-window area 102 of thecover plate assembly 100 and the reflectivity refer to the result observed and detected from the outer surface of thecover plate assembly 100. By arranging theelectrochromic layer 40 in thewindow area 101, when theelectrochromic layer 40 is in a colored state, the color difference value Δ E between thewindow area 101 and thenon-window area 102 is less than or equal to 4, that is, the colors of thewindow area 101 and thenon-window area 102 are substantially the same; meanwhile, under the same incident light condition, the difference between the reflectivity of thewindow area 101 and the reflectivity of thenon-window area 102 is less than or equal to 10%, that is, the reflectivity spectrums of thewindow area 101 and thenon-window area 102 are substantially the same, that is, the metamerism phenomenon is effectively avoided for thewindow area 101 and thenon-window area 102, and therefore, when theelectrochromic layer 40 is in a colored state, the appearance color of thecover plate assembly 100 is the same, and an integrated visual effect is presented.
It is understood that the Lab color model is a device-independent color model, and is also a color model based on physiological characteristics. The Lab color model consists of L, a and b elements. L is used to represent the luminance of the pixel and has a value in the range of 0,100]From pure black to pure white; a represents the range from green to red, with values ranging from-128, 127](ii) a b represents the range from blue to yellow, and the value range is [ -128, 127 ]]. Each kind ofThe color has a Lab value and the difference between the two colors (color difference value) is represented by Δ E. For example, if the L value of the first color is L1, the a value is a1, the b value is b1, the L value of the second color is L2, the a value is a2, and the b value is b2, the lightness difference Δ L ═ L1-L2 |, the red/green difference Δ a ═ a1-a2 |, the yellow/blue difference Δ b ═ b1-b2 |, and the color difference Δ E between the two colors ═ is (Δ L ═ b1-b2 | (Δ L)2+Δa2+Δb2)1/2. When the difference in Lab values, i.e., Δ E, is less than or equal to 4, the difference between the two colors is not clearly visible to the human eye. In the present application, the color difference Δ E between thewindow area 101 and thenon-window area 102 is set to be less than or equal to 4, i.e. Δ E is less than or equal to 4, so that thecover plate assembly 100 exhibits an integrated effect. Furthermore, the color difference value delta E between thewindow area 101 and thenon-window area 102 is set to be less than or equal to 2, namely delta E is less than or equal to 2, so that the colors of thewindow area 101 and thenon-window area 102 are better consistent, and the integration effect is better and remarkable.
It will be appreciated that metamerism is simply the same colour, but the spectral composition is different. The reproduction of one color has a relationship with the light source characteristics of the observed color, and two substances appear to be the same color under one light source but appear to be different colors under the other light source. The reflectance spectrum graph represents the reflectance of each wavelength in the incident light band. The same incident ray means that the incident angle, the intensity and the wavelength of the incident ray are the same. In the present application, while ensuring that the colors of thewindow area 101 and thenon-window area 102 are substantially consistent, it is also desirable that the reflectance spectra of thewindow area 101 and thenon-window area 102 are substantially consistent under the same incident light condition and the same wavelength. Therefore, the difference between the reflectivity of thewindow area 101 and the reflectivity of thenon-window area 102 under the same incident light condition is set to be less than or equal to 10%, so that the reflectivity spectrograms of thewindow area 101 and thenon-window area 102 are substantially consistent, the phenomenon that the colors of thewindow area 101 and thenon-window area 102 are different under different light sources can be effectively avoided, i.e., the metamerism phenomenon is avoided, when theelectrochromic layer 40 is in a colored state, the colors of thewindow area 101 and thenon-window area 102 of thecover plate assembly 100 under different light sources are still substantially the same, the metamerism phenomenon is avoided, and the outer surface of thecover plate assembly 100 presents an integrated visual effect. Furthermore, the difference value of the reflectivity of the window area and the reflectivity of the non-window area under the same incident light condition is less than or equal to 8 percent, so that the metamerism phenomenon is further effectively avoided.
In the present application, thecover plate assembly 100 includes awindow area 101 and anon-window area 102 adjacent to thewindow area 101. It will be appreciated that the abutment may be provided around or on one side. Optionally, anon-window area 102 is provided around thewindow area 101. Optionally, thenon-window area 102 is located on one side of thewindow area 101. In one embodiment of the present application, thewindow area 101 includes one or more viewable areas. When thewindow area 101 includes a plurality of visual areas, the plurality of visual areas are spaced apart.
In an embodiment of the present application, thecover plate assembly 100 further includes atransparent cover plate 10, thetransparent cover plate 10 having an inner surface and an outer surface disposed opposite to each other, and theelectrochromic layer 40 disposed on the inner surface of thetransparent cover plate 10. It is understood that thetransparent cover plate 10 has a certain light transmittance, and the specific shape and size thereof are not particularly limited and can be selected and designed according to actual needs. Optionally, the material of thetransparent cover plate 10 includes at least one of an organic polymer compound and an inorganic non-metallic material, so as to meet different application requirements. For example, thetransparent cover plate 10 is made of at least one of sapphire, plastic, glass, and ceramic. It will be appreciated that thecover member 100 has awindow area 101 and anon-window area 102 adjacent to thewindow area 101, that is, thetransparent cover 10 has awindow area 101 and anon-window area 102 adjacent to thewindow area 101. It will be appreciated that the abutment may be provided around or on one side. Specifically, when thecover plate assembly 100 is used in combination with a lighting device or a light emitting device, each of the visible areas corresponds to one of the lighting device or the light emitting device. When thecover plate assembly 100 is used in cooperation with a lighting device or a light emitting device, the lighting device or the light emitting device needs to collect or emit light from the visible region of thetransparent cover plate 10, optionally, the optical transmittance of thetransparent cover plate 10 is greater than 90%, so that the light penetration capability is improved, and the lighting device or the light emitting device can work better. Wherein the optical transmittance is the transmittance of light in the wavelength range of 380nm-780 nm. The optical transmittance of thetransparent cover plate 10 is greater than 90%, so that light can penetrate through thetransparent cover plate 10 to the maximum extent, light scattering, light absorption and light reflection are reduced, and the light transmission amount is ensured. Further, the optical transmittance of thetransparent cover plate 10 is greater than 91%. In the present application, the shape of thetransparent cover plate 10 may be a 2D shape, a 2.5D shape, or a 3D shape. Specifically, when thetransparent cover 10 has a 2.5D shape or a 3D shape, the overall appearance of thecover assembly 100 can be enhanced, and thecover assembly 100 has a more three-dimensional appearance. In the present application, thetransparent cover plate 10 includes an inner surface and an outer surface that are opposite to each other, where the inner surface and the outer surface are referred to as a usage state of thetransparent cover plate 10, that is, when thetransparent cover plate 10 is applied to an electronic device, a surface facing the inside of the electronic device is the inner surface, and a surface facing the outside of the electronic device is the outer surface. In particular, thetransparent cover 10 may be, but is not limited to, a front panel and/or a rear case of an electronic device.
In the present application, thecover plate assembly 100 further includes alight shielding layer 30, and thelight shielding layer 30 is located in thenon-window area 102. As can be appreciated, the light-shielding layer 30 defines awindow region 101 and anon-window region 102. In an embodiment of the present application, thelight shielding layer 30 is disposed on an inner surface of thetransparent cover plate 10, and is used for defining awindow area 101 and anon-window area 102 on thetransparent cover plate 10. That is, the orthographic projection of the light-shielding layer 30 on thetransparent cover plate 10 completely coincides with thenon-viewing window area 102. The thickness of the light-shielding layer 30 is not particularly limited, and those skilled in the art can flexibly select the thickness as needed as long as the requirement is satisfied. Optionally, the thickness of thelight shielding layer 30 is less than 15 μm. Further, the light-shielding layer 30 has a thickness of 5 μm to 12 μm. Optionally, the optical transmittance of thelight shielding layer 30 is less than 20%, so that thetransparent cover plate 10 forms thenon-window area 102. Further, the optical transmittance of the light-shielding layer 30 is less than 10%. When thecover assembly 100 is used in an electronic device, thelight shielding layer 30 can more easily shield the electronic component disposed corresponding thereto. The color of thelight shielding layer 30 is not particularly limited, and may be flexibly selected by those skilled in the art as needed, and may include, but is not limited to, red, orange, gray, black, etc. Therefore, any different colors can be selected to meet the use requirements of different users. Specifically, when thecover assembly 100 is applied to a mobile phone, the color of thelight shielding layer 30 may be gray or black. In an embodiment of the present invention, thelight shielding layer 30 is an ink layer, and may include, but is not limited to, screen printing or inkjet printing. For example, by forming thelight shielding layer 30 by screen printing the ink, the method can be applied to various types of inks, has strong ink layer covering power, is not limited by the surface shape and the area size of the substrate, and has great flexibility and wide applicability.
In the present application, thecover plate assembly 100 further includes anoptical film layer 20, theoptical film layer 20 being disposed in thenon-viewing area 102. In an embodiment of the present application, theoptical film layer 20 is disposed on the inner surface of thetransparent cover plate 10, and an orthographic projection of theoptical film layer 20 on thetransparent cover plate 10 completely covers thenon-window area 102. In another embodiment of the present application, theoptical film layer 20 is disposed between thetransparent cover plate 10 and thelight shielding layer 30. It will be appreciated thatoptical film layer 20 is a layer of optical media material that transmits light through its interface. Theoptical film layer 20 is disposed corresponding to thenon-viewing area 102, so that reflection, refraction and the like of light passing through theoptical film layer 20 can be changed, and further, the reflectivity, the refractive index and the transmittance of thenon-viewing area 102 of thecover plate assembly 100 are affected, and meanwhile, the appearance of thetransparent cover plate 10 is changed in gloss. Further, the reflectivity, refractive index and light transmittance of theoptical film layer 20 can be changed by changing the material, thickness and the like of theoptical film layer 20, so as to meet the requirements under different scenes.
In the present application, the material of theoptical film layer 20 is selected from materials that can provide theoptical film layer 20 with a certain optical effect, and specifically, the material may be, but is not limited to, a material that provides theoptical film layer 20 with a certain refractive index, transmittance, reflectance, and the like. The material of theoptical film layer 20 may be inorganic or organic. Optionally, the inorganic substance includes at least one of a metal simple substance, an inorganic oxide, and an inorganic fluoride. Optionally, the organic substance comprises at least one of a polyether, a polyester, a fluoropolymer, and a silicon-containing polymer. When theoptical film layer 20 is made of organic materials, theoptical film layer 20 has good flexibility and good bendability, and can be cut to obtain theoptical film layer 20 with a required size. In an embodiment of the present disclosure, the material of theoptical film layer 20 includes at least one of a simple metal, an inorganic oxide, and an inorganic fluoride. Further, the inorganic oxide includes at least one of a metal oxide and a non-metal oxide. Specifically, the metal simple substance may be, but is not limited to, aluminum, yttrium, germanium, and the like, the inorganic oxide may be, but is not limited to, magnesium oxide, titanium dioxide, titanium pentoxide, silicon dioxide, silicon monoxide, zirconium dioxide, aluminum oxide, tantalum pentoxide, and niobium monoxide, and the inorganic fluoride may be, but is not limited to, magnesium fluoride, calcium fluoride, and the like. In an embodiment of the present application, the thickness of theoptical film layer 20 is 5nm to 800nm, and theoptical film layer 20 with a nano-scale thickness can provide a certain optical effect for thecover plate assembly 100 and does not affect the overall thickness of thecover plate assembly 100. Further, the thickness of theoptical film layer 20 is 10nm to 600 nm. Specifically, the thickness of theoptical film layer 20 may be, but not limited to, 10nm, 50nm, 100nm, 220nm, 390nm, 470nm, 560nm, and the like. In the present application, theoptical film layer 20 may be a single-layer film structure or a multi-layer film structure. When theoptical film layer 20 is a multi-layer film structure, the material and thickness of each layer and the coordination among the layers can be controlled to achieve the desired functions. Alternatively, theoptical film layer 20 is formed by alternately laminating at least two optical films having different refractive indexes. That is, when theoptical film layer 20 is composed of a plurality of optical films, the refractive indices of the adjacent optical films are different. Further, theoptical film layer 20 is formed by alternately laminating at least two kinds of thin films having different refractive indexes periodically. The plurality of optical films may be made of the same material or have different thicknesses. The optical properties of a plurality of optical films are different, and after light passes through a plurality of optical films, the surface of each light film can be reflected and refracted, so that a richer appearance effect is generated. Optionally, the optical film has a thickness of 5nm to 250 nm. In particular, theoptical film layer 20 may include, but is not limited to, 2, 3, 4, 5, or 6 optical films. For example, theoptical film layer 20 is formed by alternately laminating three silicon oxide optical films and three aluminum oxide optical films. As another example, a silica optical film and a niobium monoxide optical film are laminated to form a 100nm optical film layer. In the present application, the material, thickness and number of optical thin films of theoptical film layer 20 may be selected according to the required reflectivity, refractive index or light transmittance of theoptical film layer 20.
With continued reference to fig. 1, thecover assembly 100 includes atransparent cover 10, thetransparent cover 10 having awindow area 101 and anon-window area 102 adjacent to thewindow area 101; theoptical film layer 20, theoptical film layer 20 is disposed on the inner surface of thetransparent cover plate 10, and the orthographic projection of theoptical film layer 20 on thetransparent cover plate 10 completely covers thenon-window area 102; theshading layer 30 is arranged on the surface of theoptical film layer 20 far away from thetransparent cover plate 10, and the orthographic projection of theshading layer 30 on thetransparent cover plate 10 completely covers thenon-window area 102; anelectrochromic layer 40, wherein theelectrochromic layer 40 is arranged on the inner surface of thetransparent cover plate 10, and the orthographic projection of theelectrochromic layer 40 on thetransparent cover plate 10 completely covers thewindow area 101. At this time, the structure of thenon-viewing window region 102 includes thetransparent cover plate 10, theoptical film layer 20, thelight shielding layer 30 and theelectrochromic layer 40, and since thenon-viewing window region 102 is defined by thelight shielding layer 30, the layer structure located on the surface of thelight shielding layer 30 away from thetransparent cover plate 10 is shielded by thelight shielding layer 30, and the Lab value and the reflectivity thereof are negligible. When considering the overall color difference value and the reflectance, the Lab value and the reflectance of thetransparent cover plate 10, theoptical film layer 20, and thelight shielding layer 30 need to be considered for thenon-viewing window region 102, the Lab value and the reflectance of thetransparent cover plate 10 and theelectrochromic layer 40 need to be considered for theviewing window region 101, and when thenon-viewing window region 102 and theviewing window region 101 both have thetransparent cover plate 10, the Lab value and the reflectance of theoptical film layer 20 and thelight shielding layer 30 in thenon-viewing window region 102, and the Lab value and the reflectance of theelectrochromic layer 40 in theviewing window region 101 need to be considered comprehensively. Therefore, the second Lab value and the reflectivity spectrum of theelectrochromic layer 40 can be measured by the colorimeter and the reflectivity detector, and the first Lab value and the reflectivity spectrum superposed on theoptical film layer 20 and thelight shielding layer 30 can be adjusted, so that the color difference value Δ E and the reflectivity of thewindow area 101 and thenon-window area 102 are more easily similar or even identical, and further, when theelectrochromic layer 40 is in a colored state, the integrated visual effect of thecover plate assembly 100 is more easily and effectively realized. In a specific embodiment of the present application, the Lab value and the reflectance spectrum of theelectrochromic layer 40 are detected, and then the preparation conditions of the material, the thickness, and the like of theoptical film layer 20 and thelight shielding layer 30 are controlled, so that the color difference value Δ E and the reflectance spectrum of thewindow area 101 and thenon-window area 102 are the same, thereby achieving the integrated visual effect of thecover plate assembly 100.
Please refer to fig. 2, which is a schematic structural diagram of a cover plate assembly according to another embodiment of the present application, which is substantially the same as the cover plate assembly provided in fig. 1, except that an orthographic projection of theoptical film layer 20 on thetransparent cover plate 10 covers thewindow area 101. At this time, the structure of thenon-viewing window area 102 corresponding to thetransparent cover plate 10 includes theoptical film layer 20 and thelight shielding layer 30, the structure of theviewing window area 101 corresponding to thetransparent cover plate 10 includes theoptical film layer 20 and theelectrochromic layer 40, the first Lab value and the reflectance spectrum superposed on theoptical film layer 20 and thelight shielding layer 30 are adjusted by detecting the second Lab value and the reflectance spectrum of theelectrochromic layer 40, so that the first Lab value and the reflectance spectrum are substantially consistent, and further, the color difference value Δ E and the reflectance of theviewing window area 101 and thenon-viewing window area 102 have a small difference, and thecover plate assembly 100 can still realize an integrated effect when theelectrochromic layer 40 is in a colored state. Optionally, the optical transmittance of the area corresponding to thewindow area 101 of theoptical film 20 is greater than 90%, which is beneficial to improving the intensity of light passing through thecover plate assembly 100 when thecover plate assembly 100 is used in cooperation with a lighting device or a light emitting device, and meets the working requirements of the lighting device or the light emitting device. Further, the optical transmittance of theoptical film layer 20 in the region corresponding to thewindow region 101 is greater than 91%.
In the present application, theelectrochromic layer 40 undergoes a stable and reversible color change phenomenon under the action of an applied electric field, which is visually represented by reversible changes in color and transparency, that is, theelectrochromic layer 40 has a transparent state and a colored state. Referring to fig. 3, which is a schematic structural diagram of an electrochromic layer according to an embodiment of the present disclosure, anelectrochromic layer 40 includes a first transparentconductive layer 41, a second transparentconductive layer 42, and anelectrochromic material layer 43 disposed between the first transparentconductive layer 41 and the second transparentconductive layer 42, where the first transparentconductive layer 41 is disposed near a surface of theelectrochromic material layer 43 of thetransparent cover 10. Specifically, the first transparentconductive layer 41 and the second transparentconductive layer 42 may be, but not limited to, an Indium Tin Oxide (ITO) film, a nano silver wire film, a metal mesh film, a graphene film, or a conductive polymer film. In the present application, the thicknesses of theelectrochromic layer 40, the first transparentconductive layer 41, the second transparentconductive layer 42 and theelectrochromic material layer 43 are not limited, and may be specifically selected according to actual needs. Optionally, the thickness of theelectrochromic material layer 43 is less than 150 μm. Further, the thickness of theelectrochromic material layer 43 is 10 μm to 120 μm. Specifically, the thickness of theelectrochromic material layer 43 may be, but is not limited to, 20 μm, 50 μm, 75 μm, or 90 μm. Optionally, the thickness of the first transparentconductive layer 41 is 70 μm to 150 μm, and the thickness of the second transparentconductive layer 42 is 70 μm to 150 μm. Specifically, the thickness of the first transparentconductive layer 41 and the second transparentconductive layer 42 may be, but is not limited to, 75 μm, 90 μm, 112 μm, or 135 μm.
In an embodiment of the present application, referring to fig. 3, theelectrochromic material layer 43 includes arubber frame 431 and an electrochromic material solution, therubber frame 431 is disposed between the first transparentconductive layer 41 and the second transparentconductive layer 42, so that a containingcavity 432 is formed between the first transparentconductive layer 41 and the second transparentconductive layer 42, the electrochromic material solution is disposed in the containingcavity 432, and at this time, theelectrochromic layer 40 is a solution type electrochromic layer. Therubber frame 431 has insulation properties. Optionally, the solute of the electrochromic material solution includes at least one of an inorganic electrochromic material and an organic electrochromic material. It is understood that the solvent in the electrochromic solution can be selected as desired, and in particular, the solvent in the electrochromic material solution can include at least one of dimethylformamide, diethyl carbonate, ethylene carbonate, propylene carbonate, dimethyl sulfoxide, water, acetonitrile, propionitrile, benzonitrile, N-methylpyrrolidone, and sulfolane. Optionally, the concentration of the electrochromic material solution is 0.2mol/L to 1mol/L, which is beneficial for theelectrochromic layer 40 to work better. Further, the electrochromic material solution also comprises an electrolyte, and the electrolyte comprises at least one of lithium perchlorate, potassium hydroxide, sodium hydroxide and sodium silicate. Fig. 4 is a schematic structural diagram of an electrochromic layer according to another embodiment of the present application, which is substantially the same as fig. 3, except that theelectrochromic material layer 43 includes anion storage layer 433, anelectrolyte layer 434, and anelectrochromic film 435, which are sequentially stacked. In the present application, the material of theelectrochromic film 435 includes at least one of an inorganic electrochromic material and an organic electrochromic material. In one embodiment of the present application, the inorganic electrochromic material includes at least one of an oxide, sulfide, chloride, hydroxide of a transition element, an oxide, sulfide, chloride, hydroxide of a halogen, oxygen, nitrogen, alkaline earth. Wherein the transition element comprises scandium subgroup, titanium subgroup, chromium subgroup, manganese subgroup, iron group, copper subgroup, zinc subgroup or platinum group. Specifically, the inorganic electrochromic material may be, but is not limited to, ferrous chloride, ferric chloride, titanium trichloride, titanium tetrachloride, bismuth chloride, or copper chloride. In an embodiment of the present application, the organic electrochromic material includes at least one of an organic small molecule electrochromic material and a conductive polymer electrochromic. Specifically, the organic electrochromic material may include, but is not limited to, at least one of methylene blue, viologen compounds, sodium diphenylamine sulfonate, polyaniline, anthraquinone, polyacetylene, polyaniline, polypyrrole, polythiophene, polyfuran, polyphenylene sulfide, and polyphenylacetylene. In a specific embodiment of the present application, the electrochromic material solution includes polyaniline and viologen, and the concentration ratio of the polyaniline to the viologen is 1.5: 1, the concentration of the electrochromic material solution is 0.25 mol/L.
In an embodiment of the present application, theelectrochromic layer 40 is disposed on a side of thelight shielding layer 30 away from thetransparent cover plate 10, and an orthographic projection of theelectrochromic layer 40 on thetransparent cover plate 10 completely covers thewindow area 101. I.e. the orthographic projection of theelectrochromic layer 40 on thetransparent cover plate 10 completely coincides with theviewing window area 101, or the orthographic projection of theelectrochromic layer 40 on thetransparent cover plate 10 is larger than theviewing window area 101. Referring to fig. 1, an orthographic projection of theelectrochromic layer 40 on thetransparent cover plate 10 is larger than thewindow area 101. At this time, only theelectrochromic layer 40 capable of covering thewindow area 101 needs to be prepared, and the size of theelectrochromic layer 40 does not need to be specifically controlled, so that the method is more convenient; in addition, when theelectrochromic layer 40 is a solution type electrochromic layer, it is necessary to make the orthographic projection of theaccommodating cavity 432 for accommodating the electrochromic material solution on thetransparent cover plate 10 cover thewindow area 101, so as to prevent the orthographic projection of theglue frame 431 on thetransparent cover plate 10 from falling into thewindow area 101, prevent the color inconsistency in thewindow area 101, and facilitate the realization of the integrated effect of thecover plate assembly 100. In another embodiment of the present application, when theelectrochromic material layer 43 in theelectrochromic layer 40 includes theion storage layer 433, theelectrolyte layer 434 and theelectrochromic film 435, the orthographic projection of theelectrochromic layer 40 on thetransparent cover plate 10 may be set to be completely coincident with thewindow region 101.
In the present application, theelectrochromic layer 40 may be reversibly changed between a transparent state and a colored state under the action of an applied electric field. The voltage of the applied electric field is selected according to actual needs, and may be, for example, but not limited to, 0.9V. It is understood that the optical transmittance of theelectrochromic layer 40 in the transparent state and the colored state is changed by selecting the material and thickness of theelectrochromic layer 40. Optionally, theelectrochromic layer 40 has an optical transmittance of greater than 85% in the transparent state and less than 20% in the colored state. The greater the optical transmittance of theelectrochromic layer 40 in the transparent state, the more light that passes through thecover plate assembly 100, which is advantageous for the application of thecover plate assembly 100. Further, theelectrochromic layer 40 has an optical transmittance of greater than 85.5% in the transparent state. In particular, theelectrochromic layer 40 may have an optical transmittance of, but not limited to, 86% to 88% in the transparent state. The smaller the optical transmittance of theelectrochromic layer 40 in the colored state, the stronger the hiding power of electronic components inside the electronic device when thecover plate assembly 100 is used in the electronic device. Specifically, theelectrochromic layer 40 has an optical transmittance of less than 18% in the colored state. Specifically, the optical transmittance of theelectrochromic layer 40 in the colored state may be, but is not limited to, 11% to 16%.
Referring to fig. 5, a schematic view of reflected light of the cover plate assembly 100 of fig. 1 is shown, wherein the cover plate assembly 100 includes a transparent cover plate 10, an optical film layer 20, a light shielding layer 30 and an electrochromic layer 40, it can be seen that the reflected light in the non-window area 102 includes reflected light 1, reflected light 2 and reflected light 3, and the reflected light in the window area 101 includes reflected light 1 and reflected light 4, therefore, a difference between a first reflectance setting of overlapping the optical film layer 20 and the light shielding layer 30 and a second reflectance setting of the electrochromic layer 40 in a colored state is less than or equal to 10%, so that reflectance spectra of the two are substantially consistent, that is, the reflectance spectra of the window area 101 and the non-window area 102 are substantially consistent, and a phenomenon that a color of a composite layer of the optical film layer 20 and the light shielding layer 30 is different from that of the electrochromic layer 40 under different light sources, that is, i.e., a metamerism phenomenon is avoided, when the electrochromic layer 40 is in the colored state, the colors of the window area 101 and the non-window area 102 of the cover plate assembly 100 under different light sources are still basically the same, and no metamerism occurs, so that the outer surface of the cover plate assembly 100 presents an integrated visual effect. Further, the first reflectance at which theoptical film layer 20 and thelight shielding layer 30 are superimposed is set to be less than or equal to 8% different from the second reflectance of theelectrochromic layer 40 in the colored state. Meanwhile, the color difference value between the first Lab value obtained by superposing theoptical film layer 20 and thelight shielding layer 30 and the second Lab value obtained by superposing theelectrochromic layer 40 in the colored state is less than or equal to 4, namely, Δ E is less than or equal to 4, so that the color of the superposedoptical film layer 20 and thelight shielding layer 30 is basically consistent with the color of theelectrochromic layer 40 in the colored state, and the difference cannot be obviously seen, thereby being beneficial to realizing the effect of integrating thecover plate assembly 100. Further, the color difference value between the first Lab value obtained by superposing theoptical film layer 20 and thelight shielding layer 30 and the second Lab value obtained by superposing theelectrochromic layer 40 in the colored state is less than or equal to 2, that is, Δ E is less than or equal to 2, so that the color of the superposedoptical film layer 20 and thelight shielding layer 30 is almost consistent with the color of theelectrochromic layer 40 in the colored state, and the integration effect is better and remarkable. In the application, theelectrochromic layer 40 is arranged at the position corresponding to thewindow area 101, the second Lab value and the reflectance spectrogram of theelectrochromic layer 40 in the colored state are detected, and then the material and the thickness of theoptical film layer 20 and the material and the thickness of thelight shielding layer 30 are controlled, so that the first Lab value and the second Lab value of the superposition of theoptical film layer 20 and thelight shielding layer 30 are basically consistent, and the colors of thewindow area 101 and thenon-window area 102 are basically consistent; meanwhile, under the same incident light condition and the same wavelength, the first reflectance of the superposition of theoptical film layer 20 and theshading layer 30 is set to be basically consistent with the second reflectance of theelectrochromic layer 40 in the colored state, so that the Lab value and the reflectance spectrogram of thewindow area 101 and thenon-window area 102 are basically consistent, and the integral appearance effect of thecover plate assembly 100 is favorably realized. It can be understood that, by controlling the Lab value, the effect of thecover plate assembly 100 being integrated with black, gray, etc. can be realized, and the selection and the setting can be specifically performed according to the actual requirement. It is understood that the first Lab value of theoptical film layer 20 and thelight shielding layer 30 can be calculated according to the existing color superposition algorithm, and the first reflectivity of theoptical film layer 20 and thelight shielding layer 30 can be calculated according to the existing multilayer structure reflectivity superposition algorithm, which is not limited in this respect.
With continued reference to fig. 1, thecover plate assembly 100 further includes anoptical glue layer 50, wherein theoptical glue layer 50 is disposed between thetransparent cover plate 10 and theelectrochromic layer 40 for connecting thetransparent cover plate 10 and theelectrochromic layer 40. In the present application, the orthographic projection of theoptical glue layer 50 on thetransparent cover plate 10 covers thewindow area 101. The opticaladhesive layer 50 may be prepared by coating optical adhesive (OCA) or optical liquid adhesive (OCR) and curing. OCA and OCR are adhesives for cementing optical elements, generally have the characteristics of colorless transparency, light transmittance of more than 90 percent, good cementing strength, capability of being cured at room temperature or intermediate temperature, small curing shrinkage and the like. In an embodiment of the present application, an orthographic projection of the opticaladhesive layer 50 on thetransparent cover plate 10 at least partially coincides with an orthographic projection of thelight shielding layer 30 on thetransparent cover plate 10, that is, the opticaladhesive layer 50 is partially disposed on an inner surface of thetransparent cover plate 10 corresponding to thewindow area 101, and partially disposed on a surface of thelight shielding layer 30 away from thetransparent cover plate 10, so as to better connect theelectrochromic layer 40. At this time, an orthographic projection of theelectrochromic layer 40 on thetransparent cover plate 10 completely coincides with thewindow area 101, or the orthographic projection of theelectrochromic layer 40 on thetransparent cover plate 10 is larger than thewindow area 101. When the orthographic projection of theelectrochromic layer 40 on thetransparent cover plate 10 is larger than theviewing window area 101, the orthographic projection of theelectrochromic layer 40 on thetransparent cover plate 10 may completely overlap, encompass, or fall within the orthographic projection of theoptical glue layer 50 on thetransparent cover plate 10. Referring to fig. 2, an orthographic projection of the opticaladhesive layer 50 on thetransparent cover plate 10 is completely overlapped with thewindow area 101, and a surface of the opticaladhesive layer 50 away from thetransparent cover plate 10 is flush with a surface of thelight shielding layer 30 away from thetransparent cover plate 10. At this time, only the opticaladhesive layer 50 is disposed on the inner surface of thetransparent cover plate 10 corresponding to thewindow area 101, which is beneficial to control the optical adhesive or the optical liquid adhesive during coating, and prevent the optical adhesive or the optical liquid adhesive from flowing into other layer structures before curing, which affects the overall quality of thecover plate assembly 100. In the present application, the thickness of the opticaladhesive layer 50 can be selected according to actual requirements. Optionally, the thickness of the opticaladhesive layer 50 is 6 μm to 15 μm. When thecover assembly 100 has the opticaladhesive layer 50, since the opticaladhesive layer 50 is colorless and transparent, and the opticaladhesive layer 50 does not significantly affect the reflectance spectrum of theentire window area 101, the integrated visual effect of thecover assembly 100 can still be achieved.
Referring to fig. 6, a schematic structural diagram of a cover plate assembly according to another embodiment of the present disclosure is substantially the same as the cover plate assembly in fig. 1, except that aprimer layer 60 is further included, theprimer layer 60 is disposed on a surface of thelight shielding layer 30 away from thetransparent cover plate 10, and a surface tension of theprimer layer 60 is greater than 36 mN/m. At this time, theprimer layer 60 has a higher surface tension, i.e., has a higher dyne value, which may facilitate the connection between thecap assembly 100 and other layer structures when thecap assembly 100 is used in an electronic device. In particular, but not limited to, to facilitate attachment of the adhesive backing to thecover plate assembly 100. Further, the surface tension of theprimer layer 60 is more than 40 mN/m. Optionally, the thickness of theprimer layer 60 is smaller than that of thelight shielding layer 30. Optionally, the matte ink is applied to the surface of thelight shielding layer 30 far away from thetransparent cover plate 10, and is cured to form theprimer layer 60.
Referring to fig. 7, a schematic structural diagram of a cover plate assembly according to another embodiment of the present application is substantially the same as the cover plate assembly of fig. 1, except that anantireflection film 70 is further included, and theantireflection film 70 is disposed in thewindow area 101. In one embodiment, theantireflection film 70 is disposed on the outer surface of thetransparent cover plate 10, and the orthographic projection of theantireflection film 70 on thetransparent cover plate 10 covers thewindow area 101. Theantireflection film 70 uses the principle of light interference, and light reflected on the front surface and the rear surface of the film interferes with each other, so that the light intensity of the transmission region is changed by changing the light intensity of the reflection region, thereby improving the optical transmittance of thewindow region 101. Optionally, theantireflection film 70 completely covers the outer surface of thetransparent cover plate 10. In the present application, the material of theantireflection film 70 is the same as the material of theoptical film layer 20, and the selection range of the preparation method is the same. Alternatively,antireflection film 70 may be formed by alternately laminating at least two optical films having different refractive indices. In an embodiment of the application, the thickness of theantireflection film 70 is 100nm to 800nm, which may be specifically selected according to actual needs. Optionally, the optical transmittance of theantireflection film 70 is greater than 93%, which is beneficial to light transmission. The optical transmittance of theantireflection film 70 is more than 94.5%, which is further beneficial to light transmission. In the present application, theantireflection film 70 having a desired transmittance may be prepared by controlling the material and thickness of theantireflection film 70.
Referring to fig. 8, a schematic structural diagram of a cover plate assembly according to another embodiment of the present application is substantially the same as the cover plate assembly of fig. 1, except that ananti-fingerprint film 80 is further included, and theanti-fingerprint film 80 covers an outer surface of thetransparent cover plate 10. Theanti-fingerprint film 80 has the functions of preventing stains and fingerprints from adhering, and theanti-fingerprint film 80 covers the outer surface of thetransparent cover plate 10 to prevent fingerprints or various pollutants from adhering to the surface of thetransparent cover plate 10. Optionally, theanti-fingerprint film 80 completely covers the outer surface of thetransparent cover plate 10. Specifically, the contact angle of the surface of theanti-fingerprint film 80 can be, but is not limited to, larger than 105 degrees, which is beneficial to improving the capability of anti-fingerprint and pollutant attaching to the surface. Optionally, the optical transmittance of theanti-fingerprint layer 60 is greater than 90%, and light penetration is not affected. Specifically, the thickness of theanti-fingerprint film 80 may be, but is not limited to, 5nm to 20 nm.
The present application also provides a method of making a cover plate assembly, which makes thecover plate assembly 100 of any of the embodiments described above. Referring to fig. 9, fig. 9 is a schematic flow chart illustrating a method for manufacturing a cover plate assembly according to an embodiment of the present application, including the following steps:
s110: providing a transparent cover plate, wherein the transparent cover plate is provided with a window area and a non-window area adjacent to the window area.
In S110, thetransparent cover plate 10 has a certain light transmittance, and the shape, size, material, and the like thereof are not limited and selected according to actual needs. In one embodiment, thetransparent cover plate 10 has an optical transmittance greater than 90%, which increases the amount of light passing through thetransparent cover plate 10, which is advantageous for the application of thecover plate assembly 100. In one embodiment, patterns, characters, and the like, particularly, trademark patterns (Logo) and the like, may be silk-printed on the inner surface of thetransparent cover plate 10, so as to improve the visual effect of thecover plate assembly 100.
S120: forming an electrochromic layer on the inner surface of the transparent cover plate so that the orthographic projection of the electrochromic layer on the transparent cover plate completely covers the window area to obtain a cover plate component, wherein the electrochromic layer has a coloring state and a transparent state, when the electrochromic layer is in the coloring state, the color difference value delta E between the window area and the non-window area is less than or equal to 4, and the reflectivity difference value between the window area and the non-window area under the same incident light condition is less than or equal to 10%.
In S120, theelectrochromic layer 40 includes a first transparentconductive layer 41, a second transparentconductive layer 42, and anelectrochromic material layer 43 disposed between the first transparentconductive layer 41 and the second transparentconductive layer 42. In an embodiment, arubber frame 431 is disposed on an edge of a surface of the first transparentconductive layer 41 close to the second transparentconductive layer 42, so that anaccommodating cavity 432 can be formed between the first transparentconductive layer 41 and the second transparentconductive layer 42, and an electrochromic material solution is encapsulated in theaccommodating cavity 432, so as to obtain a solution type electrochromic layer. In another embodiment, theelectrochromic layer 40 is formed by sequentially laminating anion storage layer 433, anelectrolyte layer 434, anelectrochromic film 435, and a second transparentconductive layer 42 on the first transparentconductive layer 41. Under the action of an applied electric field, ion migration occurs between the layers, so that theelectrochromic layer 40 realizes reversible changes between a colored state and a transparent state. Specifically, theion storage layer 433 may be directly formed and then attached to the first transparentconductive layer 41, or theion storage layer 433 may be directly deposited on the first transparentconductive layer 41 to form theion storage layer 433. The specific type of the material ofion storage layer 433 is not particularly limited and may be selected according to practical needs. In one embodiment, the thickness of theion storage layer 433 is on the order of nanometers. Optionally,ion storage layer 433 is 200nm to 800nm thick. In one embodiment,electrolyte layer 434 is formed by applying a gel-like electrolyte, which is cured. Specifically, the gel-like electrolyte may be, but is not limited to, an organolithium ion gel. Optionally, the curing temperature is 50 ℃ to 200 ℃. Compared with the liquid electrolyte, the gel electrolyte has better stability, can avoid the occurrence of poor sites such as liquid leakage, bubbling and the like, and improves the quality of the electrochromic layer 40And (5) service life. In an embodiment, theelectrochromic layer 40 is formed by magnetron sputtering, electrochemical deposition, spin coating or spray coating of an electrochromic material. In one embodiment, before molding theelectrochromic layer 40 on the inner surface of thetransparent cover plate 10, the method further includes: the inner surface of thetransparent cover plate 10 is coated with an optical cement and is cured to form anoptical cement layer 50 to connect thetransparent cover plate 10 and theelectrochromic layer 40, so as to improve the bonding force between theelectrochromic layer 40 and thecover plate assembly 100. Optionally, the optical adhesive is an ultraviolet light curing adhesive. Specifically, the light intensity can be, but is not limited to, 3000-4500mJ/cm at the integrated light intensity2Curing to form a film.
In the present application, by providing theelectrochromic layer 40, the color difference value and the reflectivity spectrum of thewindow area 101 and thenon-window area 102 are adjusted to be similar or even identical, so that the integrated visual effect of thecover plate assembly 100 can be realized.
In another embodiment of the present application, the method for preparing thecover plate assembly 100 further includes: a light-shielding layer 30 is formed on the inner surface of thetransparent cover plate 10 for defining awindow area 101 and anon-window area 102 on thetransparent cover plate 10. Wherein the light-shielding layer 30 may be formed by, but not limited to, screen printing or inkjet printing followed by curing. Optionally, the curing is carried out at 100-150 ℃ for 30-60 min. Specifically, thelight shielding layer 30 is formed by screen printing bright black ink and curing. In an embodiment, after forming the light-shielding layer 30, the light-shielding layer 30 is hollowed out, which may be but not limited to etching, laser etching, etc., to define thewindow region 101. It can be understood that, after thelight shielding layer 30 is hollowed out, theoptical film layer 20 is deplated to ensure the light transmittance of thewindow area 101.
In another embodiment of the present application, the method for preparing thecover plate assembly 100 further includes: and applying the matte ink to the surface of theshading layer 30 far away from thetransparent cover plate 10, and curing to form aprimer layer 60, wherein the surface tension of theprimer layer 60 is more than 36 mN/m. The formation of theprimer layer 60 on the surface of the light-shielding layer 30 remote from thetransparent cover plate 10, wherein theprimer layer 60 has an excellent surface tension, i.e. has a higher dyne value, may facilitate the connection between thecover plate assembly 100 and other layer structures when thecover plate assembly 100 is used in an electronic device. In particular, but not limited to, to facilitate attachment of the adhesive backing to thecover plate assembly 100.
In another embodiment of the present application, the method for preparing thecover plate assembly 100 further includes: theoptical film layer 20 is molded on the inner surface of thetransparent cover plate 10 such that the orthographic projection of theoptical film layer 20 on thetransparent cover plate 10 completely covers thenon-viewing area 102. The material of theoptical film layer 20 is selected from materials that can make theoptical film layer 20 have a certain optical effect, and specific examples thereof include, but are not limited to, making theoptical film layer 20 have a certain refractive index, transmittance, reflectance, and the like. Theoptical film layer 20 may have a single-layer film structure or a multi-layer film structure. Alternatively, theoptical film layer 20 is formed by alternately laminating at least two optical films having different refractive indexes. In one embodiment, theoptical film 20 can be prepared by vacuum evaporation, magnetron sputtering, ion plating, electroplating, coating, casting, or thermoplastic method. Alternatively, theoptical film layer 20 is directly deposited, plated, coated or cast on the inner surface of thetransparent cover plate 10. Optionally, theoptical film layer 20 is formed by deposition, electroplating, coating or casting on the substrate, and then peeled off, and theoptical film layer 20 is attached to the inner surface of thetransparent cover plate 10. In one embodiment, theoptical film 20 is prepared by a non-conductive plating process. In another embodiment, theoptical film layer 20 is prepared by vacuum evaporation. Optionally, vacuum evaporation is carried out at 10 atm-4Pa-10-2Pa, at a temperature of between 50 and 300 ℃. Specifically, the material may be selected according to the evaporation material and the properties of thetransparent cover plate 10. In the present application, when the orthographic projection of theoptical film layer 20 on thetransparent cover plate 10 covers thenon-window area 102 and thewindow area 101, no other operation is required after theoptical film layer 20 is molded on the inner surface of thetransparent cover plate 10. When the orthographic projection of theoptical film layer 20 on thetransparent cover plate 10 completely overlaps with thenon-window area 102, after theoptical film layer 20 is formed on the inner surface of thetransparent cover plate 10, theoptical film layer 20 needs to be deplated to remove the portion corresponding to thewindow area 101. Specifically, the deplating treatment may be, but is not limited to, etching or laser engraving. Specifically, but not limited to, the deplating treatment can be performed by a solution of 5 to 15 mass percent of sodium metasilicate pentahydrate and 1 to 5 mass percent of sodium dodecyl benzene sulfonate. OptionalThe deplating treatment is carried out at the temperature of 50-75 ℃ for 10-20 min. In another embodiment, the method of preparing thecap plate assembly 100 further comprises: the light-shielding layer 30 is formed on the surface of theoptical film layer 20 away from thetransparent cover plate 10, so that the orthographic projection of the light-shielding layer 30 on thetransparent cover plate 10 completely covers thenon-window area 102.
In another embodiment of the present application, the method for preparing thecover plate assembly 100 further includes: anantireflection film 70 is formed on the outer surface of thetransparent cover plate 10, and the orthographic projection of theantireflection film 70 on thetransparent cover plate 10 covers thewindow area 101. Theanti-reflection film 70 is disposed on the outer surface of thetransparent cover plate 10 corresponding to thewindow area 101 to increase the amount of light passing through thetransparent cover plate 10, which is beneficial to increasing the amount of light entering the electronic device when thecover plate assembly 100 is applied to the electronic device, so as to meet the working requirement of the electronic device. Specifically, theantireflection film 70 may be directly attached to the outer surface of thetransparent cover plate 10, or theantireflection film 70 may be formed on thetransparent cover plate 10 by deposition, coating, or the like.
In another embodiment of the present application, the method for preparing thecover plate assembly 100 further includes: ananti-fingerprint film 80 is formed on the outer surface of thetransparent cover plate 10, and theanti-fingerprint film 80 covers the outer surface of thetransparent cover plate 10. Theanti-fingerprint film 80 has functions of preventing stains and fingerprints from adhering, and can prevent fingerprints or various pollutants from adhering to the surface of thetransparent cover plate 10. Specifically, theanti-fingerprint film 80 may be directly attached to the outer surface of thetransparent cover plate 10, or theanti-fingerprint film 80 may be formed on thetransparent cover plate 10 by deposition, coating, or the like.
The present application further provides an electronic device comprising thecover plate assembly 100 of any of the above embodiments. The electronic device includes a lighting device and/or a light emitting device, and the lighting device and/or the light emitting device are disposed on the inner surface of thecover plate assembly 100 and are disposed corresponding to the window area. During the operation of the lighting device and/or the light emitting device, theelectrochromic layer 40 is adjusted to be transparent, so as to allow light to pass through thecover plate assembly 100, and the lighting device and/or the light emitting device can operate normally; when the lighting device and/or the light emitting device do not need to work, theelectrochromic layer 40 is adjusted to be in a colored state, so that thewindow area 101 and thenon-window area 102 of thetransparent cover plate 10 are consistent in color, a metamerism phenomenon does not exist, the integrated visual effect of thecover plate assembly 100 is realized, and then a shielding effect is generated on the lighting device and/or the light emitting device, so that the electronic equipment has the integrated visual effect. Specifically, when thecover plate assembly 100 is manufactured, the color of theelectrochromic layer 40 in the colored state, such as black, gray, etc., can be controlled to achieve the integrated effect of integrated black, integrated gray, etc., and the integrated visual effect for different scenes and different requirements can be achieved.
It is understood that the electronic device may be, but is not limited to, a cell phone, a tablet, a laptop, a watch, MP3, MP4, GPS navigator, digital camera, etc. The following description will be given taking a mobile phone as an example.
Referring to fig. 10, fig. 10 is a schematic structural diagram of an electronic device according to an embodiment of the present disclosure, the electronic device includes adisplay screen 200, and a cover plate assembly and arear housing 300 disposed on two opposite sides of thedisplay screen 200, the cover plate assembly is thecover plate assembly 100 in any of the embodiments, and thedisplay screen 200 is disposed on one side of an inner surface of thecover plate assembly 100 and corresponds to thewindow area 101. When thedisplay screen 200 works, theelectrochromic layer 40 is simultaneously adjusted to be in a transparent state to allow light to pass through thecover plate assembly 100, so that the normal work of thedisplay screen 200 is ensured; when the screen is extinguished, theelectrochromic layer 40 is adjusted to the colored state at the same time, and thedisplay screen 200 in the screen extinguishing state is shielded, so that thewindow area 101 and thenon-window area 102 of thetransparent cover plate 10 are consistent in color, and thecover plate assembly 100 presents an integrated visual effect, so that the electronic device has better appearance expressive force.
Referring to fig. 11, fig. 11 is a schematic structural diagram of an electronic device according to another embodiment of the present application, the electronic device includes acover plate assembly 100 according to any of the above embodiments, and acamera module 400, thecamera module 400 is disposed on an inner surface side of thecover plate assembly 100 and corresponds to thewindow area 101. When thecamera module 400 works, theelectrochromic layer 40 is adjusted to be transparent at the same time, so that light rays are allowed to pass through thecover plate assembly 100, and the normal work of thecamera module 400 is ensured; whencamera module 400 need not the during operation, transferelectrochromic layer 40 to the colouring state simultaneously, shelter fromcamera module 400 forwindow area 101 and thenon-window area 102 colour oftransparent cover plate 10 are unanimous, andapron subassembly 100 presents the visual effect of integration, makes electronic equipment have better outward appearance expressive force.
It can be understood that the electronic device may include both thedisplay screen 200 and thecamera module 400, and at least one of thedisplay screen 200 and thecamera module 400 is disposed corresponding to thewindow area 101. Meanwhile, the electronic device may further include other lighting devices and/or light emitting devices, such as a light sensor, and the like, and may also be disposed corresponding to thewindow area 101, so as to further improve the integrated visual effect of the electronic device.
Example 1
Providing an electrochromic material solution comprising polyaniline and viologen, wherein the concentration ratio of the polyaniline to the viologen is 1.5: 1, the concentration of the electrochromic material solution is 0.25 mol/L. Providing a first transparent conductive substrate and a second transparent conductive substrate of 0.15mm, and encapsulating an electrochromic material solution between the first transparent conductive substrate and the second transparent conductive substrate through a rubber frame, wherein the thickness of an electrochromic layer is 50 μm. When an external electric field of 0.9V is applied, the electrochromic layer is changed from a transparent state to a colored state, the optical transmittance of the electrochromic layer in the colored state is 11-16%, and the optical transmittance of the electrochromic layer in the transparent state is 86-88%.
The transparent glass is provided, and the materials and the thicknesses of the optical film and the light shielding layer are selected according to the properties of the electrochromic layer. And evaporating an NbO layer with the thickness of 8nm-12nm on the transparent glass to be used as an optical film layer, silk-screen printing ink on the NbO layer to form a shading layer, and carrying out laser etching treatment on the shading layer and the NbO layer to define a window area and a non-window area of the transparent glass.
And correspondingly arranging the electrochromic layer corresponding to the window area of the transparent glass through the optical adhesive layer to obtain the cover plate assembly.
Example 2
The same electrochromic layer as in example 1 was provided.
Transparent glass was provided and inks of different compositions from example 1 were selected depending on the nature of the electrochromic layer. And evaporating an NbO layer with the thickness of 8nm-12nm on the transparent glass to be used as an optical film layer, silk-screen printing ink on the NbO layer to form a shading layer, and carrying out laser etching treatment on the shading layer and the NbO layer to define a window area and a non-window area of the transparent glass.
And correspondingly arranging the electrochromic layer corresponding to the window area of the transparent glass through the optical adhesive layer to obtain the cover plate assembly.
Example 3
The same electrochromic layer as in example 1 was provided.
Providing transparent glass, and evaporating a NbO layer with the thickness of 10nm-20nm on the transparent glass to be used as an optical film layer. The same ink as in example 1 was selected, the ink was screen printed on the NbO layer to form a light shield layer, and the light shield layer and the NbO layer were laser etched to define a window region and a non-window region of the transparent glass.
And correspondingly arranging the electrochromic layer corresponding to the window area of the transparent glass through the optical adhesive layer to obtain the cover plate assembly.
Example 4
The same electrochromic layer as in example 1 was provided.
Providing transparent glass, and evaporating a NbO layer with the thickness of 10nm-20nm on the transparent glass to be used as an optical film layer. The same ink as in example 2 was selected, the ink was screen printed on the NbO layer to form a light shield layer, and the light shield layer and the NbO layer were laser etched to define the window and non-window regions of the transparent glass.
And correspondingly arranging the electrochromic layer corresponding to the window area of the transparent glass through the optical adhesive layer to obtain the cover plate assembly.
Example 5
The same electrochromic layer as in example 1 was provided.
Providing transparent glass, and evaporating an optical film layer with the thickness of 80nm-120nm on the transparent glass, wherein the optical film layer is made of SiO2Layers and NbO layers are alternately stacked. The same ink as in example 1 was selected, the ink was screen printed on the optical film layer to form a light-shielding layer, and the light-shielding layer and the optical film layer were subjected to laser etching to define a window region and a non-window region of the transparent glass.
And correspondingly arranging the electrochromic layer corresponding to the window area of the transparent glass through the optical adhesive layer to obtain the cover plate assembly.
Example 6
The same electrochromic layer as in example 1 was provided.
Providing transparent glass, and evaporating an optical film layer with the thickness of 250nm-350nm on the transparent glass, wherein the optical film layer is made of SiO2The layers and NbO layers are alternately stacked and have different refractive indices from those of the optical film layers in examples 6 and 7 to reduce the reflectivity in the wavelength band above 600 nm. The same ink as in example 1 was selected, the ink was screen printed on the optical film layer to form a light-shielding layer, and the light-shielding layer and the optical film layer were subjected to laser etching to define a window region and a non-window region of the transparent glass.
And correspondingly arranging the electrochromic layer corresponding to the window area of the transparent glass through the optical adhesive layer to obtain the cover plate assembly.
The electrochromic layers of examples 1-6 were adjusted to a colored state, the Lab values of the window regions and the non-window regions of examples 1-6 were measured in the SCE mode using a d/8 ° colorimeter, and the color difference value Δ E was calculated, as shown in table 1, in which the Lab values of the window regions of examples 1-6 were identical. Meanwhile, the reflectances of the window regions and the non-window regions in examples 1 to 6 were detected, and reflectance spectra were plotted, and the results are shown in fig. 12, in which the reflectance spectra of the window regions in examples 1 to 6 were identical, the icon "window region" represents the reflectance spectra of the window regions in examples 1 to 6, and the remaining icons represent the reflectance spectra of the non-window regions in the corresponding examples.
TABLE 1 Lab values for the Window and non-Window Zones of the cover plate assemblies of examples 1-6
As can be seen from table 1 and fig. 12, when the electrochromic layer is in the colored state, the Lab values of the viewing window area and the non-viewing window area are not much different, and Δ E is not greater than 4, so that the viewing window area and the non-viewing window area can have the same color, and the reflectance spectrogram difference is small, thereby effectively avoiding the metamerism phenomenon and achieving the integrated visual effect.
The foregoing detailed description has provided for the embodiments of the present application, and the principles and embodiments of the present application have been presented herein for purposes of illustration and description only and to facilitate understanding of the methods and their core concepts; meanwhile, for a person skilled in the art, according to the idea of the present application, there may be variations in the specific embodiments and the application scope, and in summary, the content of the present specification should not be construed as a limitation to the present application.