技术领域Technical Field
本发明涉及抛光设备技术领域，更具体地说，涉及一种集群磁流变研磨抛光装置。此外，本发明还涉及一种上述集群磁流变研磨抛光装置的使用方法。The present invention relates to the technical field of polishing equipment, and more specifically, to a cluster magnetorheological grinding and polishing device. In addition, the present invention also relates to a method for using the cluster magnetorheological grinding and polishing device.
背景技术Background technique
在光学元件、半导体晶片、LED基板及液晶显示板等技术领域，通常采用磁流变抛光技术对工件进行抛光加工，以满足光学元件及半导体基片的平面平坦化需求。In technical fields such as optical components, semiconductor chips, LED substrates and liquid crystal display panels, magnetorheological polishing technology is usually used to polish the workpiece to meet the surface flattening requirements of optical components and semiconductor substrates.
磁流变抛光技术的抛光效果好，不会对工件表面造成次表面损伤，尤其适用于硬脆材料的超精密加工。Magnetorheological polishing technology has good polishing effect and will not cause sub-surface damage to the workpiece surface. It is especially suitable for ultra-precision machining of hard and brittle materials.
集群磁流变抛光的原理是：基于磁流变效应，在磁流变液中加入磨料粒子形成抛光液，以小尺寸磁性体为基体形成磁流变效应，游离磨料被俘获、约束、聚集在呈链状分布的磁性粒子之间形成“微磨头”；在集群作用下多点磁流变效应“微磨头”阵列组合构成柔性抛光垫，以对工件表面进行研磨抛光。The principle of cluster magnetorheological polishing is: based on the magnetorheological effect, abrasive particles are added to the magnetorheological fluid to form a polishing fluid, and a small-sized magnetic body is used as the matrix to form a magnetorheological effect. The free abrasive is captured, constrained, and gathered between the chain-distributed magnetic particles to form a "micro-grinding head"; under the action of the cluster, a multi-point magnetorheological effect "micro-grinding head" array is combined to form a flexible polishing pad to grind and polish the workpiece surface.
现有技术中的集群磁流变研磨抛光装置，通常包括抛光盘、集群磁性体、磁流变抛光工作液、抛光头主轴以及装夹装置。集群磁性体均匀分布于抛光盘的下方，用于使磁流变抛光工作液在磁场作用下产生磁流变微磨头；抛光头主轴用于设置工件，装夹装置用于装夹抛光头主轴，抛光头主轴和装夹装置设于抛光盘上方，工作时，抛光头主轴带动工件转动，同时，集群磁性体移动，使抛光盘上的磁流变抛光工作液产生磁流变微磨头，工件转动时，与磁流变微磨头相对运动，利用磁流变微磨头的顶部对工件的下表面进行研磨抛光。The cluster magnetorheological grinding and polishing device in the prior art usually includes a polishing disc, a cluster magnetic body, a magnetorheological polishing working fluid, a polishing head spindle and a clamping device. The cluster magnetic body is evenly distributed below the polishing disc, and is used to make the magnetorheological polishing working fluid generate a magnetorheological micro-grinding head under the action of a magnetic field; the polishing head spindle is used to set the workpiece, and the clamping device is used to clamp the polishing head spindle. The polishing head spindle and the clamping device are arranged above the polishing disc. When working, the polishing head spindle drives the workpiece to rotate, and at the same time, the cluster magnetic body moves, so that the magnetorheological polishing working fluid on the polishing disc generates a magnetorheological micro-grinding head. When the workpiece rotates, it moves relative to the magnetorheological micro-grinding head, and the top of the magnetorheological micro-grinding head is used to grind and polish the lower surface of the workpiece.
然而，现有技术中的这种集群磁流变研磨抛光装置，需要抛光盘盛放磁流变抛光工作液的同时，还需要抛光头主轴以及装夹装置来实现工件的装夹，以此来保证工件相对磁流变抛光工作液的位置，结构复杂。同时，由于工件设置在抛光头主轴上，需要通过调节主轴的高度，来保证工件下表面与磁流变微磨头顶部接触，而调节主轴的操作不便。再者，加工过程中，主轴做旋转运动的同时，抛光盘同步运动，运动控制复杂且机器机构庞大，造价成本高。另外，由于形成的磁流变微磨头为“山字形”结构，也即，磁流变微磨头的顶部面积最小，因此，采用磁流变微磨头的顶部对工件进行微切削，抛光面积小，磨料利用率及抛光效率均较低。再加上，磁流变抛光液中由于磁性颗粒的排异性行为，导致柔性抛光垫靠近磁铁的一面聚集大量磁性颗粒，而远离磁铁的一端聚集大量磨料粒子，加工效率不高且无法保证加工均匀性。最后，磁流变抛光工作液的磨粒在离心力和切削力的作用下逃逸出加工区域实现磨料更新自锐，该结构中的磁流变抛光工作液的磨粒更新速率较慢且利用率较低。However, the cluster magnetorheological grinding and polishing device in the prior art requires a polishing disc to hold the magnetorheological polishing working fluid, and also requires a polishing head spindle and a clamping device to clamp the workpiece, so as to ensure the position of the workpiece relative to the magnetorheological polishing working fluid, and the structure is complex. At the same time, since the workpiece is arranged on the polishing head spindle, it is necessary to adjust the height of the spindle to ensure that the lower surface of the workpiece is in contact with the top of the magnetorheological micro-grinding head, and the operation of adjusting the spindle is inconvenient. Furthermore, during the processing, while the spindle is rotating, the polishing disc moves synchronously, the motion control is complex, the machine mechanism is huge, and the cost is high. In addition, since the magnetorheological micro-grinding head formed is a "mountain-shaped" structure, that is, the top area of the magnetorheological micro-grinding head is the smallest, therefore, the top of the magnetorheological micro-grinding head is used to micro-cut the workpiece, the polishing area is small, and the abrasive utilization rate and polishing efficiency are low. In addition, due to the exclusion behavior of magnetic particles in the magnetorheological polishing fluid, a large number of magnetic particles are gathered on the side of the flexible polishing pad close to the magnet, and a large number of abrasive particles are gathered on the end away from the magnet, the processing efficiency is not high and the processing uniformity cannot be guaranteed. Finally, the abrasive particles of the magnetorheological polishing working fluid escape from the processing area under the action of centrifugal force and cutting force to achieve abrasive renewal and self-sharpening. The abrasive particle renewal rate of the magnetorheological polishing working fluid in this structure is slow and the utilization rate is low.
综上所述，如何提供一种结构简单、操作方便、加工效率高且磨粒更新自锐的速率较高的集群磁流变研磨抛光装置，是目前本领域技术人员亟待解决的问题。In summary, how to provide a cluster magnetorheological grinding and polishing device with a simple structure, convenient operation, high processing efficiency and high abrasive renewal and self-sharpening rate is a problem that needs to be urgently solved by technical personnel in this field.
发明内容Summary of the invention
有鉴于此，本发明的目的是提供一种集群磁流变研磨抛光装置，结构简单、操作方便、加工效率高且磨粒更新自锐的速率较高。In view of this, an object of the present invention is to provide a cluster magnetorheological grinding and polishing device with a simple structure, convenient operation, high processing efficiency and a high rate of self-sharpening of abrasive grains.
本发明的另一个目的是提供一种上述集群磁流变研磨抛光装置的使用方法。Another object of the present invention is to provide a method for using the above-mentioned cluster magnetorheological grinding and polishing device.
为了实现上述目的，本发明提供如下技术方案：In order to achieve the above object, the present invention provides the following technical solutions:
一种集群磁流变研磨抛光装置，包括：A cluster magnetorheological grinding and polishing device, comprising:
抛光盘，所述抛光盘的底面设有至少一个凹槽，所述凹槽内设有用于设置工件的抛光吸附垫，所述抛光吸附垫设有至少一个用于容纳工件的工件承置槽；所述抛光盘的侧壁与所述底面形成用于盛放磁流变抛光液的腔体，以使所述磁流变抛光液完全浸过工件表面；所述磁流变抛光液的磨料包括纳米磨料粒子、结合剂和微米磁性颗粒，所述纳米磨料粒子在所述结合剂的作用下包裹在所述微米磁性颗粒的外表面；A polishing disc, wherein at least one groove is provided on the bottom surface of the polishing disc, a polishing adsorption pad for arranging a workpiece is provided in the groove, and the polishing adsorption pad is provided with at least one workpiece receiving groove for accommodating the workpiece; the side wall of the polishing disc and the bottom surface form a cavity for containing a magnetorheological polishing liquid, so that the magnetorheological polishing liquid completely immerses the surface of the workpiece; the abrasive of the magnetorheological polishing liquid comprises nano-abrasive particles, a binder and micron magnetic particles, and the nano-abrasive particles are wrapped on the outer surface of the micron magnetic particles under the action of the binder;
设于所述抛光盘的下方、用于为所述磁流变抛光液提供磁场的至少一个磁铁组件，每个所述磁铁组件均包括至少两个按预设规律排布的磁铁，以使所述磁流变抛光液形成的柔性抛光垫完全覆盖工件的表面；At least one magnet assembly disposed below the polishing plate and used to provide a magnetic field for the magnetorheological polishing fluid, each of the magnet assemblies comprising at least two magnets arranged according to a preset rule, so that the flexible polishing pad formed by the magnetorheological polishing fluid completely covers the surface of the workpiece;
与所述磁铁组件相连、用于驱动所述磁铁组件自转及公转的磁极驱动装置；A magnetic pole driving device connected to the magnet assembly and used to drive the magnet assembly to rotate and revolve;
用于设置所述抛光盘、所述磁铁组件和所述磁极驱动装置的支撑装置，所述抛光盘高度可调的设于所述支撑装置上，以通过调整所述抛光盘的高度来改变所述抛光盘与所述磁铁组件之间的间隙，以调整抛光压力。A supporting device is used to set the polishing disc, the magnet assembly and the magnetic pole driving device. The height of the polishing disc is adjustable on the supporting device, so that the gap between the polishing disc and the magnet assembly can be changed by adjusting the height of the polishing disc to adjust the polishing pressure.
优选地，所述磁极驱动装置包括：Preferably, the magnetic pole driving device comprises:
用于输出旋转运动的旋转驱动装置；A rotary drive device for outputting a rotary motion;
与所述旋转驱动装置的输出主轴相连的主动外齿轮；a driving external gear connected to the output spindle of the rotary drive device;
与所述主动外齿轮同轴设置的内齿轮；An internal gear coaxially arranged with the driving external gear;
分别与所述主动外齿轮和所述内齿轮啮合传动的行星齿轮，所述行星齿轮的数量与所述磁铁组件的数量相同，所述磁铁组件与所述行星齿轮一一对应相连。The planetary gears are respectively meshed with the driving external gear and the internal gear for transmission, the number of the planetary gears is the same as the number of the magnet assemblies, and the magnet assemblies are connected to the planetary gears in a one-to-one correspondence.
优选地，每个所述磁铁组件均还包括磁铁保持架，所述磁铁保持架设有：Preferably, each of the magnet assemblies further comprises a magnet holder, wherein the magnet holder comprises:
至少两个用于设置所述磁铁的磁铁偏心套；at least two magnet eccentric sleeves for arranging the magnets;
与所述磁铁偏心套相连的连接轴，所述连接轴通过偏心套筒与所述行星齿轮的轴孔套接。A connecting shaft connected to the magnet eccentric sleeve, wherein the connecting shaft is sleeved with the shaft hole of the planetary gear through an eccentric sleeve.
优选地，所述行星齿轮的一端设有第一端盖，所述连接轴与所述第一端盖的对应位置设有至少一对定位槽，所述连接轴与所述第一端盖通过与所述定位槽配合的定位销固定相连。Preferably, a first end cover is provided at one end of the planetary gear, at least one pair of positioning grooves are provided at corresponding positions of the connecting shaft and the first end cover, and the connecting shaft and the first end cover are fixedly connected via a positioning pin that cooperates with the positioning groove.
优选地，所述旋转驱动装置包括：Preferably, the rotation drive device comprises:
用于提供旋转动力的驱动电机；A drive motor for providing rotational power;
与所述驱动电机的动力轴相连的主动带轮；A driving pulley connected to the power shaft of the driving motor;
与所述主动带轮通过传动带传动的从动带轮；所述输出主轴包括与所述从动带轮固定连接的传动轴和与所述主动外齿轮固定连接的偏心轴，所述偏心轴与所述传动轴偏心设置，且所述偏心轴与所述传动轴通过过渡轴相连。A driven pulley driven by a transmission belt with the driving pulley; the output main shaft includes a transmission shaft fixedly connected to the driven pulley and an eccentric shaft fixedly connected to the driving external gear, the eccentric shaft is eccentrically arranged with the transmission shaft, and the eccentric shaft is connected to the transmission shaft through a transition shaft.
优选地，所述抛光吸附垫包括自下而上依次设置的电工纯铁薄层、PET膜层、多孔膜层和表面保护膜层，所述电工纯铁薄层与所述PET膜层之间以及所述PET膜层与所述多孔膜层之间均通过双面胶粘接。Preferably, the polishing adsorption pad comprises an electrical pure iron thin layer, a PET film layer, a porous film layer and a surface protection film layer arranged in sequence from bottom to top, and the electrical pure iron thin layer and the PET film layer, as well as the PET film layer and the porous film layer are bonded by double-sided tape.
优选地，所述抛光盘与所述支撑装置通过调节旋钮相连，以通过所述调节旋钮的正反向转动，使所述抛光盘靠近或远离所述磁铁组件。Preferably, the polishing disc is connected to the supporting device via an adjusting knob, so that the polishing disc can be moved closer to or farther away from the magnet assembly by rotating the adjusting knob in a forward and reverse direction.
优选地，所述侧壁的顶部设有用于防止所述磁流变抛光液在加工过程中飞溅的挡板。Preferably, a baffle is provided on the top of the side wall to prevent the magnetorheological polishing fluid from splashing during the processing.
一种集群磁流变研磨抛光装置的使用方法，应用于上述任意一种集群磁流变研磨抛光装置，包括：A method for using a cluster magnetorheological grinding and polishing device, applied to any of the above cluster magnetorheological grinding and polishing devices, comprising:
根据加工工件的尺寸要求，选择合适尺寸、合适数量和合适磁场强度的磁铁，将所有所述磁铁按照预设规律排布，形成一个磁铁组件，以形成局部集群磁铁动态磁场发生装置；According to the size requirements of the workpiece to be processed, magnets of appropriate size, quantity and magnetic field strength are selected, and all the magnets are arranged according to a preset rule to form a magnet assembly to form a local cluster magnet dynamic magnetic field generating device;
确定合适数量的所述磁铁组件，将所有所述磁铁组件设于抛光盘下方的预设位置处，并使所述磁铁组件与磁极驱动装置相连，以形成全局集群磁铁动态磁场发生装置；Determine a suitable number of the magnet assemblies, place all the magnet assemblies at preset positions below the polishing plate, and connect the magnet assemblies to a magnetic pole driving device to form a global cluster magnet dynamic magnetic field generating device;
根据加工工件的尺寸要求，选择合适的抛光吸附垫，将所述抛光吸附垫放置在所述抛光盘上的凹槽内，并将加工工件放置在所述抛光吸附垫上的工件承置槽内；According to the size requirements of the workpiece to be processed, a suitable polishing adsorption pad is selected, the polishing adsorption pad is placed in the groove on the polishing disc, and the workpiece to be processed is placed in the workpiece receiving groove on the polishing adsorption pad;
配置磁流变抛光液，将制成的磁流变抛光液注入到所述抛光盘的腔体内，直至磁流变抛光液完全浸过工件表面；Preparing a magnetorheological polishing liquid, and injecting the prepared magnetorheological polishing liquid into the cavity of the polishing disc until the magnetorheological polishing liquid completely soaks the surface of the workpiece;
启动磁极驱动装置，使磁极驱动装置带动所述磁铁组件中的各个所述磁铁自转及公转，所述磁流变抛光液在所述磁铁的作用下形成动态柔性磨头，多个所述动态柔性磨头集群形成动态柔性抛光垫；Starting the magnetic pole driving device, so that the magnetic pole driving device drives each of the magnets in the magnet assembly to rotate and revolve, the magnetorheological polishing fluid forms a dynamic flexible grinding head under the action of the magnet, and a plurality of the dynamic flexible grinding heads are clustered to form a dynamic flexible polishing pad;
通过调整所述抛光盘的高度，来调整所述抛光盘与所述磁铁组件之间的间隙，以保证研磨抛光压力并使所述动态柔性抛光垫稳定形成；By adjusting the height of the polishing plate, the gap between the polishing plate and the magnet assembly is adjusted to ensure the grinding and polishing pressure and to ensure the stable formation of the dynamic flexible polishing pad;
所述动态柔性抛光垫跟随所述磁铁自转和公转，以实现所述磁流变抛光液的磨粒的更新和自锐，使所述动态柔性抛光垫对工件表面进行微切削，完成对工件表面的研磨抛光。The dynamic flexible polishing pad follows the rotation and revolution of the magnet to achieve the renewal and self-sharpening of the abrasive particles of the magnetorheological polishing fluid, so that the dynamic flexible polishing pad performs micro-cutting on the workpiece surface to complete the grinding and polishing of the workpiece surface.
本发明提供的集群磁流变研磨抛光装置，在抛光盘上设置有抛光吸附垫，工件设置在抛光吸附垫的工件承置槽内，磁流变抛光液注入抛光盘的腔体内，并完全浸过工件表面，工作时，在磁极驱动装置的作用下，驱动磁铁组件自转和公转，使抛光盘中的磁流变抛光液形成两个以上的柔性磨头，利用柔性磨头的底部对工件上表面进行研磨抛光。The cluster magnetorheological grinding and polishing device provided by the present invention has a polishing adsorption pad arranged on the polishing disk, the workpiece is arranged in the workpiece receiving groove of the polishing adsorption pad, the magnetorheological polishing liquid is injected into the cavity of the polishing disk and completely immerses the surface of the workpiece, and when working, under the action of the magnetic pole driving device, the magnet assembly is driven to rotate and revolve, so that the magnetorheological polishing liquid in the polishing disk forms more than two flexible grinding heads, and the bottom of the flexible grinding head is used to grind and polish the upper surface of the workpiece.
相比于现有技术，该集群磁流变研磨抛光装置利用抛光吸附垫来吸附固定工件，无需采用抛光头主轴以及装夹装置来实现工件的装夹，结构简单；而且，只需要通过磁极驱动装置驱动磁铁组件自转和公转即可，无需再增加驱动装置驱动工件转动，运动简单；另外，可通过在抛光盘设置多个凹槽，并在抛光吸附垫设置多个工件承置槽来大大提高一次性参与研磨抛光的工件的数量。Compared with the existing technology, the cluster magnetorheological grinding and polishing device uses a polishing adsorption pad to adsorb and fix the workpiece. There is no need to use a polishing head spindle and a clamping device to clamp the workpiece, and the structure is simple. Moreover, it is only necessary to drive the magnet assembly to rotate and revolve through a magnetic pole driving device. There is no need to add a driving device to drive the workpiece to rotate, and the movement is simple. In addition, the number of workpieces involved in grinding and polishing at one time can be greatly increased by arranging multiple grooves on the polishing disk and multiple workpiece receiving grooves on the polishing adsorption pad.
同时，由于磁流变抛光液完全浸过工件表面，磁流变抛光液形成的柔性磨头位于工件上方，也即，本发明采用柔性磨头的底部对工件进行微切削，由于柔性磨头的底部面积最大，因此，增大了抛光面积，提高了磨料利用率及抛光效率。At the same time, since the magnetorheological polishing fluid completely immerses the surface of the workpiece, the flexible grinding head formed by the magnetorheological polishing fluid is located above the workpiece. That is, the present invention uses the bottom of the flexible grinding head to perform micro-cutting on the workpiece. Since the bottom area of the flexible grinding head is the largest, the polishing area is increased, and the abrasive utilization and polishing efficiency are improved.
另外，本发明中的抛光盘高度可调的设于支撑装置上，通过调整抛光盘的高度，来调整抛光盘与磁铁组件之间的间隙，从而可调节所形成的柔性抛光垫对工件的抛光压力，结合着磁极驱动装置输出的公转转速及自转转速，可改变工件与柔性抛光垫的结合强度，从而形成稳定的柔性抛光垫。In addition, the height-adjustable polishing disc in the present invention is arranged on the supporting device. By adjusting the height of the polishing disc, the gap between the polishing disc and the magnet assembly can be adjusted, thereby adjusting the polishing pressure of the flexible polishing pad on the workpiece. Combined with the orbital speed and rotational speed output by the magnetic pole driving device, the bonding strength between the workpiece and the flexible polishing pad can be changed, thereby forming a stable flexible polishing pad.
再者，由于本发明中的磁流变抛光液的磨料包括纳米磨料粒子、结合剂和微米磁性颗粒，纳米磨料粒子在结合剂的作用下包裹在微米磁性颗粒的外表面。因此，可避免磁性颗粒的排异性行为，避免柔性抛光垫靠近磁铁的一面聚集大量磁性颗粒，而远离磁铁的一端聚集大量磨料粒子的现象，从而可以提高加工效率，保证工件研磨的均匀性。Furthermore, since the abrasive of the magnetorheological polishing fluid in the present invention includes nano-abrasive particles, a binder and micron magnetic particles, the nano-abrasive particles are wrapped on the outer surface of the micron magnetic particles under the action of the binder. Therefore, the repulsive behavior of the magnetic particles can be avoided, and the phenomenon that a large number of magnetic particles are gathered on the side of the flexible polishing pad close to the magnet and a large number of abrasive particles are gathered on the end away from the magnet can be avoided, thereby improving the processing efficiency and ensuring the uniformity of workpiece grinding.
最后，由于单个磁铁组件包括两个以上的磁铁，在磁极驱动装置驱动磁铁组件自转和公转时，使抛光盘中的磁流变抛光液形成两个以上的柔性磨头，相比于现有技术中单个整块的磁铁，在磁极驱动装置带着磁铁组件自转和公转的过程中，各个磁铁对应的柔性磨头的磨粒在离心力和切削力的作用下更容易逃逸出加工区域，实现磨料的更新自锐，同时，可通过改变磁铁组件的自转速度及公转速度，来提高磨料的更新自锐速度。因此，该集群磁流变研磨抛光装置能够实现磁流变抛光液的快速更新与磨料的快速自锐。Finally, since a single magnet assembly includes more than two magnets, when the magnetic pole driving device drives the magnet assembly to rotate and revolve, the magnetorheological polishing fluid in the polishing disk forms more than two flexible grinding heads. Compared with a single whole magnet in the prior art, in the process of the magnetic pole driving device driving the magnet assembly to rotate and revolve, the abrasive particles of the flexible grinding heads corresponding to each magnet are more likely to escape from the processing area under the action of centrifugal force and cutting force, thereby realizing the renewal and self-sharpening of the abrasive. At the same time, the renewal and self-sharpening speed of the abrasive can be increased by changing the rotation speed and revolution speed of the magnet assembly. Therefore, the cluster magnetorheological grinding and polishing device can realize the rapid renewal of magnetorheological polishing fluid and the rapid self-sharpening of abrasive.
本发明提供的集群磁流变研磨抛光装置的使用方法，应用于上述集群磁流变研磨抛光装置，具有上述有益效果。The method for using the cluster magnetorheological grinding and polishing device provided by the present invention is applied to the above-mentioned cluster magnetorheological grinding and polishing device and has the above-mentioned beneficial effects.
附图说明BRIEF DESCRIPTION OF THE DRAWINGS
为了更清楚地说明本发明实施例或现有技术中的技术方案，下面将对实施例或现有技术描述中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本发明的实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据提供的附图获得其他的附图。In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on the provided drawings without paying creative work.
图1为本发明具体实施例所提供的集群磁流变研磨抛光装置的结构示意图；FIG1 is a schematic structural diagram of a cluster magnetorheological grinding and polishing device provided in a specific embodiment of the present invention;
图2为图1中抛光盘的俯视图；FIG2 is a top view of the polishing disc in FIG1 ;
图3为图1中磁铁组件的俯视图；FIG3 is a top view of the magnet assembly in FIG1 ;
图4为图1中行星齿轮的分布示意图；FIG4 is a schematic diagram of the distribution of the planetary gears in FIG1 ;
图5为图1中抛光盘中的磁流变抛光液形成的柔性磨头的示意图；FIG5 is a schematic diagram of a flexible grinding head formed by the magnetorheological polishing fluid in the polishing disk of FIG1 ;
图6为图1中抛光吸附垫的俯视图；FIG6 is a top view of the polishing adsorption pad in FIG1 ;
图7为图6所示抛光吸附垫的剖视图。FIG. 7 is a cross-sectional view of the polishing adsorption pad shown in FIG. 6 .
图1至图7中的附图标记如下：The reference numerals in Figures 1 to 7 are as follows:
1为抛光盘、11为挡板、12为凹槽、13为凸台、2为磁铁组件、21为磁铁、22为磁铁保持架、221为磁铁偏心套、222为连接轴、31为输出主轴、32为主动外齿轮、33为内齿轮、34为行星齿轮、341为第一端盖、342为端盖支撑架、35为驱动电机、36为主动带轮、37为从动带轮、38为传动带、4为偏心套筒、5为定位销、6为抛光吸附垫、61为电工纯铁薄层、62为PET膜层、63为多孔膜层、64为表面保护膜层、65为双面胶、71为支撑架、72为固定架、721为散热孔、73为底座、8为调节旋钮、91为磁流变抛光液、92为柔性磨头、01为工件。1 is a polishing disc, 11 is a baffle, 12 is a groove, 13 is a boss, 2 is a magnet assembly, 21 is a magnet, 22 is a magnet holder, 221 is a magnet eccentric sleeve, 222 is a connecting shaft, 31 is an output spindle, 32 is an active external gear, 33 is an internal gear, 34 is a planetary gear, 341 is a first end cover, 342 is an end cover support frame, 35 is a driving motor, 36 is a driving pulley, 37 is a driven pulley, 38 is a transmission belt, 4 is an eccentric sleeve, 5 is a positioning pin, 6 is a polishing adsorption pad, 61 is an electrical pure iron thin layer, 62 is a PET film layer, 63 is a porous film layer, 64 is a surface protection film layer, 65 is a double-sided tape, 71 is a support frame, 72 is a fixing frame, 721 is a heat dissipation hole, 73 is a base, 8 is an adjustment knob, 91 is a magnetorheological polishing fluid, 92 is a flexible grinding head, and 01 is a workpiece.
具体实施方式Detailed ways
下面将结合本发明实施例中的附图，对本发明实施例中的技术方案进行清楚、完整地描述，显然，所描述的实施例仅仅是本发明一部分实施例，而不是全部的实施例。基于本发明中的实施例，本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例，都属于本发明保护的范围。The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.
本发明的核心是提供一种集群磁流变研磨抛光装置，结构简单、操作方便、加工效率高且磨粒更新自锐的速率较高。本发明的另一核心是提供一种上述集群磁流变研磨抛光装置的使用方法。The core of the present invention is to provide a cluster magnetorheological grinding and polishing device, which has a simple structure, convenient operation, high processing efficiency and a high rate of self-sharpening of abrasive particles. Another core of the present invention is to provide a method for using the cluster magnetorheological grinding and polishing device.
请参考图1-图7，图1为本发明具体实施例所提供的集群磁流变研磨抛光装置的结构示意图；图2为抛光盘的俯视图；图3为磁铁组件的俯视图；图4为行星齿轮的分布示意图；图5为抛光盘中的磁流变抛光液形成的柔性磨头的示意图；图6为抛光吸附垫的俯视图；图7为图6所示抛光吸附垫的剖视图。Please refer to Figures 1-7, Figure 1 is a structural schematic diagram of a cluster magnetorheological grinding and polishing device provided in a specific embodiment of the present invention; Figure 2 is a top view of the polishing disk; Figure 3 is a top view of the magnet assembly; Figure 4 is a distribution schematic diagram of the planetary gears; Figure 5 is a schematic diagram of the flexible grinding head formed by the magnetorheological polishing fluid in the polishing disk; Figure 6 is a top view of the polishing adsorption pad; Figure 7 is a cross-sectional view of the polishing adsorption pad shown in Figure 6.
本发明提供一种集群磁流变研磨抛光装置，主要用于对晶圆表面进行研磨抛光，包括抛光盘1、磁铁组件2、磁极驱动装置和支撑装置。The present invention provides a cluster magnetorheological grinding and polishing device, which is mainly used for grinding and polishing the surface of a wafer, and comprises a polishing disc 1, a magnet assembly 2, a magnetic pole driving device and a supporting device.
抛光盘1用于设置工件01并盛放磁流变抛光液91，也就是说，抛光盘1上设置有用于放置工件01的工位，且抛光盘1具有周向侧壁，以形成用于容纳磁流变抛光液91的腔体。The polishing disc 1 is used to place the workpiece 01 and contain the magnetorheological polishing liquid 91 , that is, a station for placing the workpiece 01 is provided on the polishing disc 1 , and the polishing disc 1 has a circumferential side wall to form a cavity for containing the magnetorheological polishing liquid 91 .
具体地，抛光盘1的底面设有至少一个凹槽12，凹槽12内设有用于设置工件01的抛光吸附垫6，抛光吸附垫6设有至少一个用于容纳工件01的工件承置槽。抛光盘1的侧壁与底面形成用于盛放磁流变抛光液91的腔体，以使磁流变抛光液91完全浸过工件01表面。Specifically, at least one groove 12 is provided on the bottom surface of the polishing disc 1, and a polishing adsorption pad 6 for arranging the workpiece 01 is provided in the groove 12, and the polishing adsorption pad 6 is provided with at least one workpiece receiving groove for accommodating the workpiece 01. The side wall and the bottom surface of the polishing disc 1 form a cavity for containing the magnetorheological polishing liquid 91, so that the magnetorheological polishing liquid 91 completely immerses the surface of the workpiece 01.
优选地，抛光盘1的中心部设有凸台13，抛光盘1围绕中心部的环形区域设有四个用于设置抛光吸附垫6的凹槽12。Preferably, a boss 13 is provided at the center of the polishing disc 1 , and four grooves 12 for arranging the polishing adsorption pad 6 are provided in an annular area around the center of the polishing disc 1 .
优选地，抛光吸附垫6为圆形抛光吸附垫6，对应地，凹槽12为圆形凹槽。Preferably, the polishing adsorption pad 6 is a circular polishing adsorption pad 6 , and correspondingly, the groove 12 is a circular groove.
在加工时，将工件01放置在抛光吸附垫6的工件承置槽内，并将磁流变抛光液91注入到抛光盘1的腔体中，使磁流变抛光液91完全浸没工件01表面，以便于后续在磁铁组件2中的磁铁21作用下，使磁流变抛光液91形成的柔性抛光垫能够完全覆盖工件01表面，从而对工件01表面进行磨削加工。During processing, the workpiece 01 is placed in the workpiece receiving groove of the polishing adsorption pad 6, and the magnetorheological polishing fluid 91 is injected into the cavity of the polishing disk 1, so that the magnetorheological polishing fluid 91 is completely immersed in the surface of the workpiece 01, so that under the subsequent action of the magnet 21 in the magnet assembly 2, the flexible polishing pad formed by the magnetorheological polishing fluid 91 can completely cover the surface of the workpiece 01, thereby grinding the surface of the workpiece 01.
磁铁组件2设置在抛光盘1的下方，用于为磁流变抛光液91提供磁场，以使磁流变抛光液91在磁铁组件2的磁场作用下，发生磁流变而形成柔性抛光垫。The magnet assembly 2 is disposed below the polishing disc 1 and is used to provide a magnetic field for the magnetorheological polishing fluid 91 so that the magnetorheological polishing fluid 91 undergoes magnetorheology under the magnetic field of the magnet assembly 2 to form a flexible polishing pad.
需要说明的是，磁铁组件2的数量为至少一个，本领域技术人员可以根据实际需要来选择，磁铁组件2的数量越多，则加工效率越高。优选地，磁铁组件2的数量为四个。It should be noted that the number of the magnet assembly 2 is at least one, and those skilled in the art can select it according to actual needs. The more the number of the magnet assemblies 2 is, the higher the processing efficiency is. Preferably, the number of the magnet assemblies 2 is four.
每个磁铁组件2均包括至少两个磁铁21，单个磁铁组件2中的所有磁铁21朝向抛光盘1的端面在同一个平面内，磁铁21优选为强力柱状磁铁21，磁铁21的磁场强度优选为0.1T～2T，磁铁21的直径优选为5mm～50mm，磁铁21的具体数量及尺寸可根据待加工工件01的尺寸来合理选择；另外，需要说明的是，单个磁铁组件2中的所有磁铁21按预设规律排布，以使磁流变抛光液91形成的柔性抛光垫能够完全覆盖工件01表面。Each magnet assembly 2 includes at least two magnets 21. The end faces of all the magnets 21 in a single magnet assembly 2 facing the polishing disk 1 are in the same plane. The magnets 21 are preferably strong cylindrical magnets 21. The magnetic field strength of the magnets 21 is preferably 0.1T~2T. The diameter of the magnets 21 is preferably 5mm~50mm. The specific number and size of the magnets 21 can be reasonably selected according to the size of the workpiece 01 to be processed; in addition, it should be noted that all the magnets 21 in a single magnet assembly 2 are arranged according to a preset rule so that the flexible polishing pad formed by the magnetorheological polishing fluid 91 can completely cover the surface of the workpiece 01.
可以理解的是，单个磁铁组件2中的各个磁铁21均能使磁流变抛光液91形成柔性磨头92，单个磁铁组件2中的所有磁铁21对应的柔性磨头92集群形成柔性抛光垫，本领域技术人员可以根据需要选择合适尺寸、合适数量的磁铁21，并按预设规律排布，以便形成覆盖于工件01表面的连续的抛光垫。It can be understood that each magnet 21 in a single magnet assembly 2 can make the magnetorheological polishing fluid 91 form a flexible grinding head 92, and the flexible grinding heads 92 corresponding to all the magnets 21 in the single magnet assembly 2 are clustered to form a flexible polishing pad. Those skilled in the art can select magnets 21 of appropriate size and quantity as needed, and arrange them according to a preset pattern to form a continuous polishing pad covering the surface of the workpiece 01.
需要说明的是，本发明对单个磁铁组件2中的所有磁铁21的预设排布规律不做限定，例如，优选地，单个磁铁组件2中的磁铁21的数量为六个，则以一个磁铁21为圆心，其它五个磁铁21绕中间的磁铁21的周向均匀分布；进一步地，中间的磁铁21朝向抛光盘1的磁极与外围的五个磁铁21朝向抛光盘1的磁极相反，也即，外围的磁铁21朝向抛光盘1的磁极保持一致，以便形成连续的抛光垫。It should be noted that the present invention does not limit the preset arrangement pattern of all the magnets 21 in a single magnet assembly 2. For example, preferably, the number of magnets 21 in a single magnet assembly 2 is six, and with one magnet 21 as the center, the other five magnets 21 are evenly distributed circumferentially around the middle magnet 21; further, the magnetic pole of the middle magnet 21 facing the polishing disk 1 is opposite to the magnetic poles of the five outer magnets 21 facing the polishing disk 1, that is, the magnetic poles of the outer magnets 21 facing the polishing disk 1 remain consistent so as to form a continuous polishing pad.
磁极驱动装置与磁铁组件2相连，用于驱动磁铁组件2自转和公转，磁铁组件2自转时，形成局部的动态磁场发生装置，从而使磁流变抛光液91形成局部集群的柔性抛光垫；磁铁组件2公转时，形成全局的动态磁场发生装置，从而使磁流变抛光液91形成全局集群的动态柔性抛光垫，以利用动态柔性抛光垫对工件01表面进行微切削，以达到对工件01表面进行研磨抛光的目的。The magnetic pole driving device is connected to the magnet assembly 2, and is used to drive the magnet assembly 2 to rotate and revolve. When the magnet assembly 2 rotates, a local dynamic magnetic field generating device is formed, so that the magnetorheological polishing fluid 91 forms a local cluster of flexible polishing pads; when the magnet assembly 2 revolves, a global dynamic magnetic field generating device is formed, so that the magnetorheological polishing fluid 91 forms a global cluster of dynamic flexible polishing pads, so as to utilize the dynamic flexible polishing pad to perform micro-cutting on the surface of the workpiece 01, so as to achieve the purpose of grinding and polishing the surface of the workpiece 01.
可以理解的是，由于单个磁铁组件2包括两个以上的磁铁21，形成两个以上的柔性磨头92，相比于现有技术中单个整块的磁铁21，在磁极驱动装置带着磁铁组件2自转和公转的过程中，各个磁铁21对应的柔性磨头92的磨粒在离心力和切削力的作用下更容易逃逸出加工区域，实现磨料的更新自锐，同时，可通过改变磁铁组件2的自转速度及公转速度，来提高磨料的更新自锐速度。因此，该集群磁流变研磨抛光装置能够实现磁流变抛光液91的快速更新与磨料的快速自锐。It is understandable that, since a single magnet assembly 2 includes more than two magnets 21, forming more than two flexible grinding heads 92, compared to a single integral magnet 21 in the prior art, during the process of the magnetic pole drive device carrying the magnet assembly 2 to rotate and revolve, the abrasive particles of the flexible grinding heads 92 corresponding to each magnet 21 are more likely to escape from the processing area under the action of centrifugal force and cutting force, thereby realizing the renewal and self-sharpening of the abrasive. At the same time, the renewal and self-sharpening speed of the abrasive can be increased by changing the rotation speed and revolution speed of the magnet assembly 2. Therefore, the cluster magnetorheological grinding and polishing device can realize the rapid renewal of the magnetorheological polishing liquid 91 and the rapid self-sharpening of the abrasive.
需要说明的是，本实施例对磁极驱动装置的具体结构不做限定，只要能够驱动磁铁组件2自转及公转即可。It should be noted that the present embodiment does not limit the specific structure of the magnetic pole driving device, as long as it can drive the magnet assembly 2 to rotate and revolve.
支撑装置主要起到承载的作用，用于支撑或固定抛光盘1、磁铁组件2和磁极驱动装置。本发明对支撑装置的具体结构不做限定，本领域技术人员可以根据实际需要来选择。The supporting device mainly plays a bearing role and is used to support or fix the polishing plate 1, the magnet assembly 2 and the magnetic pole driving device. The present invention does not limit the specific structure of the supporting device, and those skilled in the art can select it according to actual needs.
为了调整磁流变抛光液91形成的柔性抛光垫对工件01施加的抛光压力，抛光盘1高度可调的设于支撑装置上，以通过调整抛光盘1的高度来改变抛光盘1与磁铁组件2之间的间隙，从而方便调整柔性抛光垫对工件01的抛光压力。In order to adjust the polishing pressure applied by the flexible polishing pad formed by the magnetorheological polishing fluid 91 to the workpiece 01, the height-adjustable polishing disc 1 is arranged on the supporting device, so that the gap between the polishing disc 1 and the magnet assembly 2 can be changed by adjusting the height of the polishing disc 1, thereby facilitating the adjustment of the polishing pressure of the flexible polishing pad on the workpiece 01.
本发明通过调整抛光盘1与磁铁组件2之间的间隙，来改变柔性抛光垫对工件01的抛光压力。The present invention changes the polishing pressure of the flexible polishing pad on the workpiece 01 by adjusting the gap between the polishing disc 1 and the magnet assembly 2 .
可以理解的是，抛光盘1与磁铁组件2之间的间隙越小，则磁场强度越大，柔性抛光垫的结合强度越大，从而对工件01施加的抛光压力越大。本领域技术人员可以根据实际需要来调整抛光盘1与磁铁组件2之间的间隙，以使柔性抛光垫对工件01施加合适的抛光压力，结合着调整磁极驱动装置输出的公转转速及自转转速，可改变工件01与柔性抛光垫的结合强度，从而使磁流变抛光液91形成稳定的柔性抛光垫。It is understandable that the smaller the gap between the polishing disc 1 and the magnet assembly 2, the greater the magnetic field strength, the greater the bonding strength of the flexible polishing pad, and thus the greater the polishing pressure applied to the workpiece 01. Those skilled in the art can adjust the gap between the polishing disc 1 and the magnet assembly 2 according to actual needs so that the flexible polishing pad applies a suitable polishing pressure to the workpiece 01, and by adjusting the revolution speed and rotation speed output by the magnetic pole drive device, the bonding strength between the workpiece 01 and the flexible polishing pad can be changed, so that the magnetorheological polishing fluid 91 forms a stable flexible polishing pad.
另外，相比于现有技术，该集群磁流变研磨抛光装置利用抛光吸附垫6来吸附固定工件01，无需采用抛光头主轴以及装夹装置来实现工件01的装夹，结构简单；而且，只需要通过磁极驱动装置驱动磁铁组件2自转和公转即可，无需再增加驱动装置驱动工件01转动，运动简单；另外，可通过在抛光盘1设置多个凹槽12，并在抛光吸附垫6设置多个工件承置槽来大大提高一次性参与研磨抛光的工件01的数量。In addition, compared with the prior art, the cluster magnetorheological grinding and polishing device uses a polishing adsorption pad 6 to adsorb and fix the workpiece 01, and there is no need to use a polishing head spindle and a clamping device to clamp the workpiece 01, and the structure is simple; moreover, it is only necessary to drive the magnet assembly 2 to rotate and revolve through the magnetic pole driving device, and there is no need to add a driving device to drive the workpiece 01 to rotate, and the movement is simple; in addition, by setting a plurality of grooves 12 on the polishing disk 1 and a plurality of workpiece receiving grooves on the polishing adsorption pad 6, the number of workpieces 01 involved in grinding and polishing at one time can be greatly increased.
同时，由于磁流变抛光液91完全浸过工件01表面，磁流变抛光液91形成的柔性磨头92位于工件01上方，也即，本发明采用柔性磨头92的底部对工件01进行微切削，由于柔性磨头92的底部面积最大，因此，增大了抛光面积，提高了磨料利用率及抛光效率。At the same time, since the magnetorheological polishing fluid 91 completely immerses the surface of the workpiece 01, the flexible grinding head 92 formed by the magnetorheological polishing fluid 91 is located above the workpiece 01. That is, the present invention uses the bottom of the flexible grinding head 92 to perform micro-cutting on the workpiece 01. Since the bottom area of the flexible grinding head 92 is the largest, the polishing area is increased, and the abrasive utilization and polishing efficiency are improved.
考虑到磁极驱动装置具体结构的实现，在上述实施例的基础之上，磁极驱动装置包括旋转驱动装置、主动外齿轮32、行星齿轮34和内齿轮33，旋转驱动装置用于输出旋转运动，主动外齿轮32与旋转驱动装置的输出主轴31相连，内齿轮33与主动外齿轮32同轴设置，行星齿轮34分别与主动外齿轮32和内齿轮33啮合连接，行星齿轮34的数量与磁铁组件2的数量相同，磁铁组件2与行星齿轮34一一对应相连。Taking into account the implementation of the specific structure of the magnetic pole drive device, on the basis of the above embodiment, the magnetic pole drive device includes a rotation drive device, a driving external gear 32, a planetary gear 34 and an internal gear 33. The rotation drive device is used to output rotational motion. The driving external gear 32 is connected to the output main shaft 31 of the rotation drive device. The internal gear 33 is coaxially arranged with the driving external gear 32. The planetary gears 34 are respectively meshed with the driving external gear 32 and the internal gear 33. The number of planetary gears 34 is the same as the number of magnet assemblies 2, and the magnet assemblies 2 are connected to the planetary gears 34 in a one-to-one correspondence.
工作时，在旋转驱动装置的作用下，输出主轴31带动主动外齿轮32转动，从而使行星齿轮34分别与主动外齿轮32和内齿轮33啮合传动，实现行星齿轮34的自转和公转，进而使行星齿轮34带动磁铁组件2进行同步自转和公转，抛光盘1中的磁流变抛光液91在磁铁组件2中的磁铁21作用下，形成动态柔性磨头92，两个以上的动态柔性磨头92集群形成动态的柔性抛光垫，动态的柔性抛光垫跟随磁铁组件2自转和公转，从而对工件01表面进行研磨抛光，且实现磨粒的更新和自锐，使工件01表面加工的更加均匀和光滑。During operation, under the action of the rotating drive device, the output spindle 31 drives the active outer gear 32 to rotate, so that the planetary gear 34 meshes with the active outer gear 32 and the inner gear 33 respectively, realizes the rotation and revolution of the planetary gear 34, and then the planetary gear 34 drives the magnet assembly 2 to rotate and revolve synchronously. The magnetorheological polishing fluid 91 in the polishing disc 1 forms a dynamic flexible grinding head 92 under the action of the magnet 21 in the magnet assembly 2. More than two dynamic flexible grinding heads 92 cluster to form a dynamic flexible polishing pad. The dynamic flexible polishing pad follows the rotation and revolution of the magnet assembly 2, thereby grinding and polishing the surface of the workpiece 01, and realizing the renewal and self-sharpening of the abrasive particles, so that the surface of the workpiece 01 is processed more evenly and smoothly.
需要说明的是，本实施例对旋转驱动装置的具体结构不做限定，只要能够输出旋转运动即可。It should be noted that the present embodiment does not limit the specific structure of the rotation drive device, as long as it can output rotational motion.
考虑到运动的平稳性，在上述实施例的基础之上，旋转驱动装置包括驱动电机35、主动带轮36、从动带轮37和传动带38，驱动电机35用于提供旋转动力，主动带轮36与驱动电机35的动力轴相连，主动带轮36与从动带轮37通过传动带38实现运动的传递，从动带轮37与输出主轴31相连，以通过输出主轴31将传动带38传递的驱动电机35的旋转动力转变为主动外齿轮32的转动。Taking into account the smoothness of movement, on the basis of the above embodiment, the rotation drive device includes a drive motor 35, a driving pulley 36, a driven pulley 37 and a transmission belt 38. The drive motor 35 is used to provide rotational power. The driving pulley 36 is connected to the power shaft of the drive motor 35. The driving pulley 36 and the driven pulley 37 transmit motion through the transmission belt 38. The driven pulley 37 is connected to the output main shaft 31 to convert the rotational power of the drive motor 35 transmitted by the transmission belt 38 into rotation of the driving external gear 32 through the output main shaft 31.
优选地，主动带轮36通过第一平键固定在驱动电机35的动力轴上。Preferably, the driving pulley 36 is fixed on the power shaft of the driving motor 35 via a first flat key.
优选地，从动带轮37通过第一固定螺钉固定在输出主轴31远离主动外齿轮32的一端。Preferably, the driven pulley 37 is fixed to an end of the output main shaft 31 away from the driving external gear 32 by a first fixing screw.
为了提高主动外齿轮32的线速度，作为一种优选方案，输出主轴31包括传动轴、偏心轴和过渡轴，偏心轴与传动轴的轴线不共线，也即，偏心轴与传动轴偏心设置，传动轴与从动带轮37固定连接，偏心轴与主动外齿轮32固定连接，过渡轴设于传动轴和偏心轴之间，用于实现传动轴与偏心轴的间接连接。In order to increase the linear speed of the active external gear 32, as a preferred solution, the output main shaft 31 includes a transmission shaft, an eccentric shaft and a transition shaft. The axes of the eccentric shaft and the transmission shaft are not colinear, that is, the eccentric shaft and the transmission shaft are eccentrically arranged, the transmission shaft is fixedly connected to the driven pulley 37, the eccentric shaft is fixedly connected to the active external gear 32, and the transition shaft is arranged between the transmission shaft and the eccentric shaft to realize an indirect connection between the transmission shaft and the eccentric shaft.
也即，本实施例通过偏心轴的偏心设置，来提高偏心轴轴心处的线速度，以此来提高主动外齿轮32的线速度。That is, in this embodiment, the linear velocity of the eccentric shaft center is increased by eccentrically setting the eccentric shaft, thereby increasing the linear velocity of the driving external gear 32 .
优选地，主动外齿轮32通过第二平键固定到偏心轴上。Preferably, the driving external gear 32 is fixed to the eccentric shaft via a second flat key.
考虑到磁铁组件2的具体结构的实现，在上述各个实施例的基础之上，每个磁铁组件2均还包括磁铁保持架22，磁铁保持架22设有磁铁21容纳套和连接轴222，磁铁21容纳套用于设置磁铁21，磁铁21容纳套的数量与磁铁21的数量相同，为至少两个；连接轴222与磁铁21容纳套相连，用于将磁铁保持架22固定在行星齿轮34上，连接轴222与行星齿轮34的轴孔套接固定。Taking into account the implementation of the specific structure of the magnet assembly 2, on the basis of the above-mentioned embodiments, each magnet assembly 2 also includes a magnet holder 22, the magnet holder 22 is provided with a magnet 21 accommodating sleeve and a connecting shaft 222, the magnet 21 accommodating sleeve is used to set the magnet 21, and the number of the magnet 21 accommodating sleeves is the same as the number of magnets 21, which is at least two; the connecting shaft 222 is connected to the magnet 21 accommodating sleeve, and is used to fix the magnet holder 22 on the planetary gear 34, and the connecting shaft 222 is fixedly sleeved with the shaft hole of the planetary gear 34.
为了提高磁铁21的线速度，作为一种优选方案，磁铁21容纳套为磁铁偏心套221，也就是说，磁铁21的轴心与磁铁偏心套221的轴心不共线。In order to increase the linear velocity of the magnet 21 , as a preferred solution, the housing of the magnet 21 is a magnet eccentric housing 221 , that is, the axis of the magnet 21 is not colinear with the axis of the magnet eccentric housing 221 .
进一步地，为了避免漏磁，磁铁偏心套221为抗磁质磁铁偏心套221，例如，磁铁偏心套221包括不锈钢磁铁偏心套221、铜合金磁铁偏心套221或陶瓷磁铁偏心套221。Furthermore, in order to avoid magnetic leakage, the magnet eccentric sleeve 221 is a diamagnetic magnet eccentric sleeve 221 , for example, the magnet eccentric sleeve 221 includes a stainless steel magnet eccentric sleeve 221 , a copper alloy magnet eccentric sleeve 221 or a ceramic magnet eccentric sleeve 221 .
为了提高磁铁保持架22整体的线速度，作为一种优选方案，连接轴222通过偏心套筒4与行星齿轮34的轴孔套接固定。In order to increase the overall linear velocity of the magnet holder 22 , as a preferred solution, the connecting shaft 222 is fixedly sleeved with the shaft hole of the planetary gear 34 through the eccentric sleeve 4 .
考虑到连接轴222与行星齿轮34连接的紧固性，避免连接轴222与行星齿轮34的轴孔相对转动，在上述实施例的基础之上，行星齿轮34的一端设有第一端盖341，连接轴222与第一端盖341的对应位置设有至少一对定位槽，连接轴222与第一端盖341通过与定位槽配合的定位销5固定相连。Taking into account the tightness of the connection between the connecting shaft 222 and the planetary gear 34 to avoid relative rotation between the connecting shaft 222 and the shaft hole of the planetary gear 34, on the basis of the above embodiment, a first end cover 341 is provided at one end of the planetary gear 34, and at least one pair of positioning grooves are provided at corresponding positions of the connecting shaft 222 and the first end cover 341, and the connecting shaft 222 and the first end cover 341 are fixedly connected by a positioning pin 5 that cooperates with the positioning groove.
也就是说，本实施例通过定位销5与定位槽的配合连接，来实现连接轴222与第一端盖341的固定连接，以此来保持两者的相对位置关系不变，避免在转动过程中连接轴222在行星齿轮34的轴孔内转动。That is to say, in this embodiment, the connecting shaft 222 is fixedly connected to the first end cover 341 by the matching connection of the positioning pin 5 and the positioning groove, so as to keep the relative position relationship between the two unchanged and prevent the connecting shaft 222 from rotating in the shaft hole of the planetary gear 34 during rotation.
考虑到第一端盖341与行星齿轮34的连接关系，优选地，第一端盖341通过第二固定螺钉与行星齿轮34远离磁铁保持架22的一端相连。Considering the connection relationship between the first end cover 341 and the planetary gear 34 , preferably, the first end cover 341 is connected to an end of the planetary gear 34 away from the magnet holder 22 via a second fixing screw.
为了提高抛光吸附垫6对工件支撑的稳定性，确保工件的平面度，在上述各个实施例的基础之上，抛光吸附垫6包括自下而上依次设置的电工纯铁薄层61、PET膜层62、多孔膜层63和表面保护膜层64，电工纯铁薄层61与PET膜层62之间以及PET膜层62与多孔膜层63之间均通过双面胶65粘接。In order to improve the stability of the polishing adsorption pad 6 in supporting the workpiece and ensure the flatness of the workpiece, on the basis of the above-mentioned embodiments, the polishing adsorption pad 6 includes an electrical pure iron thin layer 61, a PET film layer 62, a porous film layer 63 and a surface protection film layer 64 arranged in sequence from bottom to top, and the electrical pure iron thin layer 61 and the PET film layer 62 as well as the PET film layer 62 and the porous film layer 63 are bonded by double-sided tape 65.
可以理解的是，电工纯铁薄层61可以增强磁场强度，保证磁流变抛光液91粒子被约束在抛光吸附垫6表面，形成柔性抛光垫，从而提高对工件01表面的研磨抛光效果。It is understandable that the thin layer of electrical pure iron 61 can enhance the magnetic field strength, ensuring that the particles of the magnetorheological polishing fluid 91 are confined on the surface of the polishing adsorption pad 6 to form a flexible polishing pad, thereby improving the grinding and polishing effect on the surface of the workpiece 01.
PET膜层62用于构建支撑工件01的承置位，以便于支撑工件01。The PET film layer 62 is used to construct a support position for the workpiece 01 so as to support the workpiece 01 .
多孔膜层63的表面具有很多微孔结构，其性能就像真空状态，能够吸附住工件01，使工件固定的更稳定，从而能够更好的保证工件的平面度；多孔膜层63包括聚氨酯垫多孔膜层63、纤维织物垫多孔膜层63、聚乙烯垫多孔膜层63、各种粗布垫多孔膜层63及绒毛布垫多孔膜层63中的一种或两种以上的组合。The surface of the porous membrane layer 63 has many microporous structures, and its performance is like a vacuum state. It can adsorb the workpiece 01, making the workpiece more stably fixed, thereby better ensuring the flatness of the workpiece; the porous membrane layer 63 includes a polyurethane pad porous membrane layer 63, a fiber fabric pad porous membrane layer 63, a polyethylene pad porous membrane layer 63, various coarse cloth pad porous membrane layers 63 and a fluff cloth pad porous membrane layer 63, one or a combination of more than two.
表面保护膜层64用于收集加工去除物、传送磁流变抛光液91以及提高抛光吸附垫6的抗腐蚀磨损性能等。The surface protection film layer 64 is used to collect processing removal materials, transmit magnetorheological polishing fluid 91, and improve the corrosion and wear resistance of the polishing adsorption pad 6.
电工纯铁薄层61与PET膜层62之间以及PET膜层62与多孔膜层63之间均设有双面胶65，以实现层与层之间的连接。Double-sided adhesive tape 65 is provided between the electrical pure iron thin layer 61 and the PET film layer 62 and between the PET film layer 62 and the porous film layer 63 to achieve connection between the layers.
考虑到抛光盘1与磁铁组件2之间间隙调整的方便性，在上述实施例的基础之上，抛光盘1与支撑装置通过调节旋钮8相连，以通过调节旋钮8的正反向转动，使抛光盘1靠近或远离磁铁组件2。Taking into account the convenience of adjusting the gap between the polishing disc 1 and the magnet assembly 2, on the basis of the above embodiment, the polishing disc 1 is connected to the supporting device through an adjusting knob 8, so that the polishing disc 1 can be moved closer to or away from the magnet assembly 2 by rotating the adjusting knob 8 in the forward and reverse directions.
优选地，支撑装置包括用于支撑抛光盘1的支撑架71，支撑架71与抛光盘1通过调节旋钮8相连。Preferably, the supporting device comprises a supporting frame 71 for supporting the polishing disc 1 , and the supporting frame 71 is connected to the polishing disc 1 via an adjusting knob 8 .
也就是说，本实施例通过调节旋钮8的正向和反向转动，可实现抛光盘1的升降，以此来调整抛光盘1与磁铁组件2之间的间隙，从而达到改变抛光压力的目的。That is to say, in this embodiment, by adjusting the forward and reverse rotation of the knob 8, the polishing disc 1 can be raised and lowered, thereby adjusting the gap between the polishing disc 1 and the magnet assembly 2, thereby achieving the purpose of changing the polishing pressure.
另外，可以理解的是，加工过程中，在动态磁场的作用下，磁流变抛光液91在离心力的作用下，具有向抛光盘1的边缘部飞溅的趋势，为了避免磁流变抛光液91在加工过程中飞溅，在上述各个实施例的基础之上，抛光盘1的边缘部的上方设有用于防止磁流变抛光液91在加工过程中飞溅的挡板11。In addition, it can be understood that during the processing, under the action of the dynamic magnetic field, the magnetorheological polishing fluid 91 has a tendency to splash toward the edge of the polishing disk 1 under the action of centrifugal force. In order to avoid the magnetorheological polishing fluid 91 from splashing during the processing, on the basis of the above-mentioned embodiments, a baffle 11 is provided above the edge of the polishing disk 1 to prevent the magnetorheological polishing fluid 91 from splashing during the processing.
优选地，挡板11通过第三螺钉固定在抛光盘1上。Preferably, the baffle 11 is fixed to the polishing plate 1 by a third screw.
另一方面，考虑到磁极驱动装置与支撑装置的固定方式，在上述实施例的基础之上，支撑装置还包括底座73和固定架72，固定架72通过第四螺钉固定在底座73上，支撑架71通过第五螺钉固定在固定架72上。On the other hand, considering the fixing method of the magnetic pole driving device and the supporting device, based on the above embodiment, the supporting device also includes a base 73 and a fixing frame 72, the fixing frame 72 is fixed to the base 73 by a fourth screw, and the supporting frame 71 is fixed to the fixing frame 72 by a fifth screw.
优选地，驱动电机35固定座通过第六螺钉固定在底座73上；驱动电机35固定在驱动电机35固定座上。Preferably, the fixing seat of the driving motor 35 is fixed to the base 73 by a sixth screw; and the driving motor 35 is fixed to the fixing seat of the driving motor 35 .
考虑到驱动电机35的散热问题，优选地，固定架72靠近驱动电机35的一侧开设有若干个散热孔721。Considering the heat dissipation problem of the driving motor 35 , preferably, a plurality of heat dissipation holes 721 are provided on a side of the fixing frame 72 close to the driving motor 35 .
进一步优选地，固定架72设有用于设置输出主轴31的中空腔体，输出主轴31通过轴承与中空腔体相连。Further preferably, the fixing frame 72 is provided with a hollow cavity for arranging the output spindle 31 , and the output spindle 31 is connected to the hollow cavity via a bearing.
优选地，轴承的数量为一对，分别设于输出主轴31的传动轴的两端。Preferably, the number of bearings is a pair, which are respectively arranged at both ends of the transmission shaft of the output main shaft 31 .
优选地，还包括分别用于定位轴承的内圈和外圈的内套筒和外套筒，内套筒与传动轴套接，外套筒套设在中空腔体内。Preferably, it also includes an inner sleeve and an outer sleeve for positioning the inner ring and outer ring of the bearing respectively, the inner sleeve is sleeved with the transmission shaft, and the outer sleeve is sleeved in the hollow cavity.
进一步优选地，输出主轴31的过渡轴的外周部套设有主轴端盖，主轴端盖通过第七螺钉固定在固定架72上。Further preferably, a spindle end cover is sleeved on the outer periphery of the transition shaft of the output spindle 31 , and the spindle end cover is fixed to the fixing frame 72 by a seventh screw.
进一步优选地，还包括用于支撑行星齿轮34的第一端盖341的端盖支撑架34271，端盖支撑架34271通过第八螺钉固定在固定架72上。Further preferably, it further comprises an end cover support frame 34271 for supporting the first end cover 341 of the planetary gear 34 , and the end cover support frame 34271 is fixed to the fixing frame 72 by an eighth screw.
需要说明的是，本发明对磁流变抛光液91中的磨料不做具体限定，可直接选用现有技术中的常规磁流变抛光液91磨料。然而，由于现有常规磁流变抛光液91磨料的磁性颗粒的排异性行为，导致柔性抛光垫靠近磁铁21的一面聚集大量磁性颗粒，而远离磁铁21的一端聚集大量磨料粒子，从而需要较大的抛光压力，才能有效研磨抛光工件01表面，为解决这一问题，在上述各个实施例的基础之上，磁流变抛光液91的磨料包括纳米磨料粒子、结合剂和微米磁性颗粒，纳米磨料粒子在结合剂的作用下包裹在微米磁性颗粒的外表面。It should be noted that the present invention does not specifically limit the abrasive in the magnetorheological polishing liquid 91, and the conventional magnetorheological polishing liquid 91 abrasive in the prior art can be directly selected. However, due to the repulsive behavior of the magnetic particles in the conventional magnetorheological polishing liquid 91 abrasive, a large number of magnetic particles are gathered on the side of the flexible polishing pad close to the magnet 21, while a large number of abrasive particles are gathered on the end away from the magnet 21, so that a larger polishing pressure is required to effectively grind and polish the surface of the workpiece 01. To solve this problem, on the basis of the above-mentioned embodiments, the abrasive of the magnetorheological polishing liquid 91 includes nano-abrasive particles, a binder and micron magnetic particles, and the nano-abrasive particles are wrapped on the outer surface of the micron magnetic particles under the action of the binder.
优选地，纳米磨料粒子包括碳化硅纳米磨料粒子、金刚石纳米磨料粒子、蓝宝石纳米磨料粒子、二氧化硅纳米磨料粒子、二氧化铈纳米磨料粒子中的一种或任意两种以上的组合。Preferably, the nano-abrasive particles include one or a combination of any two or more of silicon carbide nano-abrasive particles, diamond nano-abrasive particles, sapphire nano-abrasive particles, silicon dioxide nano-abrasive particles, and ceria nano-abrasive particles.
优选地，微米磁性颗粒包括铁粉微米磁性颗粒、羰基铁粉微米磁性颗粒、还原铁粉微米磁性颗粒中的一种或任意两种以上的组合。Preferably, the micron magnetic particles include one or a combination of any two or more of iron powder micron magnetic particles, carbonyl iron powder micron magnetic particles, and reduced iron powder micron magnetic particles.
需要说明的是，结合剂为本领域的常规结合剂，本发明不做具体限定。It should be noted that the binder is a conventional binder in the art and is not specifically limited in the present invention.
进一步地，纳米磨料粒子在结合剂的作用下，通过烧结法、凝胶法、或喷雾法包裹在微米磁性颗粒的外表面。Furthermore, the nano-abrasive particles are coated on the outer surface of the micron magnetic particles by sintering, gelling or spraying under the action of the binder.
除了上述集群磁流变研磨抛光装置，本发明还提供一种上述实施例公开的集群磁流变研磨抛光装置的使用方法，该使用方法包括以下步骤：In addition to the cluster magnetorheological grinding and polishing device described above, the present invention also provides a method for using the cluster magnetorheological grinding and polishing device disclosed in the above embodiment, and the method for using the cluster magnetorheological grinding and polishing device comprises the following steps:
根据加工工件01的尺寸要求，选择合适尺寸、合适数量和合适磁场强度的磁铁21，将所有磁铁21按照预设规律排布，形成一个磁铁组件2，以形成局部集群磁铁动态磁场发生装置；According to the size requirements of the workpiece 01 to be processed, magnets 21 of appropriate size, quantity and magnetic field strength are selected, and all magnets 21 are arranged according to a preset rule to form a magnet assembly 2 to form a local cluster magnet dynamic magnetic field generating device;
确定合适数量的磁铁组件2，将所有磁铁组件2设于抛光盘1下方的预设位置处，并使磁铁组件2与磁极驱动装置相连，以形成全局集群磁铁动态磁场发生装置；Determine a suitable number of magnet assemblies 2, place all magnet assemblies 2 at preset positions below the polishing plate 1, and connect the magnet assemblies 2 to a magnetic pole driving device to form a global cluster magnet dynamic magnetic field generating device;
根据加工工件01的尺寸要求，选择合适的抛光吸附垫6，将抛光吸附垫6放置在抛光盘1上的凹槽12内，并将加工工件01放置在抛光吸附垫6上的工件承置槽内；According to the size requirements of the workpiece 01, a suitable polishing adsorption pad 6 is selected, the polishing adsorption pad 6 is placed in the groove 12 on the polishing plate 1, and the workpiece 01 is placed in the workpiece receiving groove on the polishing adsorption pad 6;
配置磁流变抛光液91，将制成的磁流变抛光液91注入到抛光盘1的腔体内，直至磁流变抛光液91完全浸过工件表面；Prepare a magnetorheological polishing liquid 91, and inject the prepared magnetorheological polishing liquid 91 into the cavity of the polishing plate 1 until the magnetorheological polishing liquid 91 completely immerses the surface of the workpiece;
启动磁极驱动装置，使磁极驱动装置带动磁铁组件2中的各个磁铁21自转及公转，磁流变抛光液91在磁铁21的作用下形成动态柔性磨头92，多个动态柔性磨头92集群形成动态柔性抛光垫；The magnetic pole driving device is started to drive each magnet 21 in the magnet assembly 2 to rotate and revolve, and the magnetorheological polishing fluid 91 forms a dynamic flexible grinding head 92 under the action of the magnet 21, and a plurality of dynamic flexible grinding heads 92 are clustered to form a dynamic flexible polishing pad;
通过调整抛光盘1的高度，来调整抛光盘与磁铁组件2之间的间隙，以保证研磨抛光压力并使动态柔性抛光垫稳定形成；By adjusting the height of the polishing disc 1, the gap between the polishing disc and the magnet assembly 2 is adjusted to ensure the grinding and polishing pressure and to form a dynamic flexible polishing pad stably;
动态柔性抛光垫跟随磁铁21自转和公转，以实现磁流变抛光液的磨粒的更新和自锐，使动态柔性抛光垫对工件01表面进行微切削，完成对工件表面的研磨抛光。The dynamic flexible polishing pad follows the rotation and revolution of the magnet 21 to achieve the renewal and self-sharpening of the abrasive particles of the magnetorheological polishing fluid, so that the dynamic flexible polishing pad performs micro-cutting on the surface of the workpiece 01 to complete the grinding and polishing of the workpiece surface.
下面以图1所示的集群磁流变研磨抛光装置为例，来详细介绍该集群磁流变研磨抛光装置的使用方法。The following takes the cluster magnetorheological grinding and polishing device shown in FIG. 1 as an example to introduce in detail the method for using the cluster magnetorheological grinding and polishing device.
步骤S1：根据加工工件01的尺寸要求，选择合适尺寸、合适数量和合适磁场强度的磁铁21，按照预设规律排布在磁铁保持架22上，形成一个磁铁组件2，从而形成局部集群磁铁21动态磁场发生装置。Step S1: According to the size requirements of the workpiece 01 to be processed, magnets 21 of appropriate size, quantity and magnetic field strength are selected, and arranged on the magnet holder 22 according to a preset rule to form a magnet assembly 2, thereby forming a local cluster magnet 21 dynamic magnetic field generating device.
例如，在加工两英寸的单晶硅基片时，选择二十四个直径为15mm且磁场强度为0.5T的平头圆柱形强力磁铁21。For example, when processing a two-inch single crystal silicon substrate, twenty-four flat cylindrical strong magnets 21 with a diameter of 15 mm and a magnetic field strength of 0.5 T are selected.
在加工四英寸的碳化硅基片时，选择二十四个直径为30mm且磁场强度为0.5T的平头圆柱形强力磁铁21。When processing a four-inch silicon carbide substrate, twenty-four flat-head cylindrical strong magnets 21 with a diameter of 30 mm and a magnetic field strength of 0.5 T are selected.
步骤S2：确定合适数量的磁铁组件2，选择与磁铁组件2数量相同的行星齿轮34，使行星齿轮34分别与主动外齿轮32和内齿轮33啮合安装，将磁铁保持架22与行星齿轮34固定连接，以形成全局集群磁铁21动态磁场发生装置。Step S2: Determine an appropriate number of magnet assemblies 2, select the same number of planetary gears 34 as the magnet assemblies 2, make the planetary gears 34 mesh with the active external gear 32 and the internal gear 33 respectively, and fix the magnet holder 22 to the planetary gears 34 to form a global cluster magnet 21 dynamic magnetic field generating device.
步骤S3：根据加工工件01的尺寸要求，选择合适的抛光吸附垫6，将抛光吸附垫6放置在抛光盘1上的凹槽12内，并将加工工件01放置在抛光吸附垫6上的工件承置槽内。Step S3: Select a suitable polishing adsorption pad 6 according to the size requirement of the workpiece 01 , place the polishing adsorption pad 6 in the groove 12 on the polishing plate 1 , and place the workpiece 01 in the workpiece receiving groove on the polishing adsorption pad 6 .
例如，在加工两英寸的单晶硅基片时，选择设有四个工件承置槽的抛光吸附垫6；优选地，抛光吸附垫6选用聚氨酯质抛光吸附垫6。For example, when processing a two-inch single crystal silicon substrate, a polishing adsorption pad 6 with four workpiece receiving grooves is selected; preferably, the polishing adsorption pad 6 is a polyurethane polishing adsorption pad 6.
在加工四英寸的碳化硅基片时，选择设有三个工件承置槽的抛光吸附垫6；优选地，抛光吸附垫6选用聚氨酯质抛光吸附垫6。When processing a four-inch silicon carbide substrate, a polishing adsorption pad 6 with three workpiece receiving grooves is selected; preferably, the polishing adsorption pad 6 is a polyurethane polishing adsorption pad 6.
步骤S4：在去离子水中加入浓度为2％～20％的上述磁流变抛光液91的磨料，浓度为1％～10％的分散剂和浓度为1％～10％的防锈剂，充分搅拌均匀后，通过超声振荡5min～30min，制成复合磁流变抛光液91。Step S4: Add 2% to 20% of the abrasive of the magnetorheological polishing liquid 91, 1% to 10% of the dispersant and 1% to 10% of the rust inhibitor into deionized water, stir well, and then oscillate ultrasonically for 5 minutes to 30 minutes to prepare a composite magnetorheological polishing liquid 91.
优选地，在加工两英寸的单晶硅基片时，磁流变抛光液91的磨料包括100nm～500nm的金刚石纳米磨料粒子和5μm～10μm的羰基铁粉微米磁性颗粒。Preferably, when processing a two-inch single-crystal silicon substrate, the abrasive of the magnetorheological polishing fluid 91 includes 100nm-500nm diamond nano-abrasive particles and 5μm-10μm carbonyl iron powder micron magnetic particles.
在加工四英寸的碳化硅基片时，磁流变抛光液91的磨料包括50nm～100nm的金刚石纳米磨料粒子和2μm～5μm的羰基铁粉微米磁性颗粒。When processing a four-inch silicon carbide substrate, the abrasive of the magnetorheological polishing fluid 91 includes 50nm-100nm diamond nano-abrasive particles and 2μm-5μm carbonyl iron powder micron magnetic particles.
步骤S5：将制成的复合磁流变抛光液91加入到送料装置的容器中，然后启动送料装置，使复合磁流变抛光液91流入到抛光盘1的腔体内，直至复合磁流变抛光液91完全浸过工件01表面9mm～11mm，优选地，复合磁流变抛光液91完全浸过工件01表面10mm。Step S5: Add the prepared composite magnetorheological polishing liquid 91 into the container of the feeding device, and then start the feeding device to allow the composite magnetorheological polishing liquid 91 to flow into the cavity of the polishing disk 1 until the composite magnetorheological polishing liquid 91 completely immerses 9mm to 11mm of the surface of the workpiece 01. Preferably, the composite magnetorheological polishing liquid 91 completely immerses 10mm of the surface of the workpiece 01.
步骤S6：启动驱动电机35，驱动电机35的动力轴通过第一平键带动主动带轮36转动，主动带轮36通过传动带38带动从动带轮37转动，从而使从动带轮37带动输出主轴31的传动轴一起旋转，进而使输出主轴31的偏心轴转动；偏心轴通过第二平键将其旋转运动传递至主动外齿轮32，从而使偏心轴带动主动外齿轮32转动，进而使行星齿轮34分别与主动外齿轮32和内齿轮33啮合传动，实现行星齿轮34的自转和公转，同时，磁铁保持架22随行星齿轮34一起自转和公转。Step S6: Start the driving motor 35. The power shaft of the driving motor 35 drives the driving pulley 36 to rotate through the first flat key. The driving pulley 36 drives the driven pulley 37 to rotate through the transmission belt 38, so that the driven pulley 37 drives the transmission shaft of the output main shaft 31 to rotate together, and then the eccentric shaft of the output main shaft 31 rotates; the eccentric shaft transmits its rotational motion to the driving external gear 32 through the second flat key, so that the eccentric shaft drives the driving external gear 32 to rotate, and then the planetary gear 34 is meshed with the driving external gear 32 and the internal gear 33 for transmission, so as to realize the self-rotation and revolution of the planetary gear 34. At the same time, the magnet holder 22 rotates and revolves together with the planetary gear 34.
步骤S7：行星齿轮34带动磁铁保持架22实现自转和公转，从而使磁铁组件2中的各个磁铁21实现自转和公转，抛光盘1中的磁流变抛光液91在磁铁21的作用下形成动态柔性磨头92，多个柔性磨头92集群形成动态柔性抛光垫。Step S7: The planetary gear 34 drives the magnet holder 22 to realize self-rotation and revolution, so that each magnet 21 in the magnet assembly 2 realizes self-rotation and revolution. The magnetorheological polishing fluid 91 in the polishing disk 1 forms a dynamic flexible grinding head 92 under the action of the magnet 21, and multiple flexible grinding heads 92 are clustered to form a dynamic flexible polishing pad.
步骤S8：通过调节旋钮8调整抛光盘1的高度，从而调整抛光盘1与磁铁组件2之间的间隙，以此来调整研磨抛光压力并使动态柔性抛光垫稳定形成。Step S8: The height of the polishing disc 1 is adjusted by adjusting the knob 8, thereby adjusting the gap between the polishing disc 1 and the magnet assembly 2, so as to adjust the grinding and polishing pressure and stably form the dynamic flexible polishing pad.
优选地，在加工两英寸的单晶硅基片时，调整抛光盘1与磁铁组件2之间的间隙，使得磁铁21的表面距抛光吸附垫6上表面的距离为10mm～15mm。Preferably, when processing a two-inch single crystal silicon substrate, the gap between the polishing plate 1 and the magnet assembly 2 is adjusted so that the distance between the surface of the magnet 21 and the upper surface of the polishing adsorption pad 6 is 10 mm to 15 mm.
在加工四英寸的碳化硅基片时，调整抛光盘1与磁铁组件2之间的间隙，使得磁铁21的表面距抛光吸附垫6上表面的距离优选为15mm～20mm。When processing a four-inch silicon carbide substrate, the gap between the polishing plate 1 and the magnet assembly 2 is adjusted so that the distance between the surface of the magnet 21 and the upper surface of the polishing adsorption pad 6 is preferably 15 mm to 20 mm.
步骤S9：动态柔性抛光垫跟随磁铁21自转和公转，从而实现磨粒的更新和自锐，动态柔性抛光垫对工件01表面进行微切削，实现工件01表面的超光滑均匀加工。Step S9: The dynamic flexible polishing pad follows the rotation and revolution of the magnet 21 to achieve renewal and self-sharpening of the abrasive particles. The dynamic flexible polishing pad performs micro-cutting on the surface of the workpiece 01 to achieve ultra-smooth and uniform processing of the surface of the workpiece 01.
还需要说明的是，在本说明书中，诸如第一和第二等之类的关系术语仅仅用来将一个实体或者操作与另一个实体或操作区分开来，而不一定要求或者暗示这些实体或操作之间存在任何这种实际的关系或者顺序。It should also be noted that, in this specification, relational terms such as first and second, etc. are merely used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any actual relationship or order between these entities or operations.
本说明书中各个实施例采用递进的方式描述，每个实施例重点说明的都是与其他实施例的不同之处，各个实施例之间相同相似部分互相参见即可。The various embodiments in this specification are described in a progressive manner, and each embodiment focuses on the differences from other embodiments. The same or similar parts between the various embodiments can be referenced to each other.
以上对本发明所提供的集群磁流变研磨抛光装置及其使用方法进行了详细介绍。本文中应用了具体个例对本发明的原理及实施方式进行了阐述，以上实施例的说明只是用于帮助理解本发明的方法及其核心思想。应当指出，对于本技术领域的普通技术人员来说，在不脱离本发明原理的前提下，还可以对本发明进行若干改进和修饰，这些改进和修饰也落入本发明权利要求的保护范围内。The cluster magnetorheological grinding and polishing device and its use method provided by the present invention are introduced in detail above. Specific examples are used in this article to illustrate the principles and implementation methods of the present invention. The description of the above embodiments is only used to help understand the method of the present invention and its core idea. It should be pointed out that for ordinary technicians in this technical field, without departing from the principle of the present invention, several improvements and modifications can be made to the present invention, and these improvements and modifications also fall within the scope of protection of the claims of the present invention.
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| CN201910676443.5ACN110281085B (en) | 2019-07-25 | 2019-07-25 | Cluster magnetorheological grinding and polishing device and application method thereof |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110722428B (en)* | 2019-10-23 | 2021-09-07 | 中国科学院光电技术研究所 | A magnetorheological sub-aperture polishing device suitable for large-diameter optical components |
| CN110900322B (en)* | 2019-12-23 | 2024-04-09 | 广东工业大学 | electro-Fenton cluster magnetorheological composite grinding and polishing device and method |
| CN111941156B (en)* | 2020-09-04 | 2025-02-28 | 深圳市金洲精工科技股份有限公司 | Micro drill bit polishing method and polishing device |
| CN112975585B (en)* | 2021-03-04 | 2022-12-27 | 上海理工大学 | Fluid-supplementing type magnetic composite fluid polishing device |
| CN113561035B (en)* | 2021-07-30 | 2023-04-11 | 西安工业大学 | Point cloud alternating magnetorheological polishing device and method |
| CN114178975B (en)* | 2021-12-14 | 2022-11-11 | 安镁金属制品（深圳）有限公司 | Novel dual-cycle magnetic grinding machine |
| CN114800253B (en)* | 2022-06-06 | 2022-10-21 | 浙江大学杭州国际科创中心 | Grinding device and method for silicon carbide wafer |
| CN115157020B (en)* | 2022-06-29 | 2023-05-12 | 大连理工大学 | Multi-field auxiliary abrasive scouring and polishing method and device |
| CN115194564B (en)* | 2022-07-01 | 2023-04-28 | 广东工业大学 | Magnetic control grinding and polishing integrated disc for semiconductor wafer and use method thereof |
| CN115415907B (en)* | 2022-07-29 | 2024-08-27 | 广东炬森智能装备有限公司 | Magnetic control flexible cleaning device and method for foreign matters of PCB (printed circuit board) electrode |
| CN115831735A (en)* | 2022-10-10 | 2023-03-21 | 上海中欣晶圆半导体科技有限公司 | Attaching and matching method for improving polishing flatness and productivity |
| CN117182755A (en)* | 2023-08-18 | 2023-12-08 | 南方科技大学 | fluid circulation system |
| CN117428580B (en)* | 2023-12-15 | 2024-03-19 | 成都市凯林机械贸易有限责任公司 | Polishing device for valve machining |
| CN118143835B (en)* | 2024-05-11 | 2024-07-26 | 四川航天职业技术学院(四川航天高级技工学校) | Self-adaptive polishing equipment |
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN210549948U (en)* | 2019-07-25 | 2020-05-19 | 广东工业大学 | A cluster magnetorheological grinding and polishing device |
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6555017B1 (en)* | 2000-10-13 | 2003-04-29 | The Regents Of The University Of Caliofornia | Surface contouring by controlled application of processing fluid using Marangoni effect |
| JP2005186239A (en)* | 2003-12-26 | 2005-07-14 | Hinomoto Kenmazai Kk | Grinding method using magnetic abrasive grain, and grinder |
| CN103273385B (en)* | 2013-06-09 | 2015-05-27 | 湖南大学 | Surface contact magneto-rheological flat polishing device and method with uniform magnetic field |
| CN105328516B (en)* | 2015-11-18 | 2018-03-30 | 广东工业大学 | The dynamic magnetic field of magnetic rheologic flexible polishing pad is from sharp burnishing device and its polishing method |
| CN105458840B (en)* | 2015-12-29 | 2017-12-29 | 广东工业大学 | A kind of magnetostatic dynamic field MRF mechanism experimental rig and its processing method |
| CN107877269B (en)* | 2017-10-26 | 2023-10-03 | 广东工业大学 | Device and method for efficiently polishing and processing high-precision balls through cluster magneto-rheological technology |
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN210549948U (en)* | 2019-07-25 | 2020-05-19 | 广东工业大学 | A cluster magnetorheological grinding and polishing device |
| Publication number | Publication date |
|---|---|
| CN110281085A (en) | 2019-09-27 |
| Publication | Publication Date | Title |
|---|---|---|
| CN110281085B (en) | Cluster magnetorheological grinding and polishing device and application method thereof | |
| CN105328516B (en) | The dynamic magnetic field of magnetic rheologic flexible polishing pad is from sharp burnishing device and its polishing method | |
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